CN115267952A - Mid-infrared anti-laser damage depolarization antireflection film - Google Patents
Mid-infrared anti-laser damage depolarization antireflection film Download PDFInfo
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- CN115267952A CN115267952A CN202211091999.6A CN202211091999A CN115267952A CN 115267952 A CN115267952 A CN 115267952A CN 202211091999 A CN202211091999 A CN 202211091999A CN 115267952 A CN115267952 A CN 115267952A
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- 230000028161 membrane depolarization Effects 0.000 title claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 24
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- 238000000576 coating method Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 238000013461 design Methods 0.000 claims abstract description 13
- 230000003287 optical effect Effects 0.000 claims abstract description 11
- 239000005387 chalcogenide glass Substances 0.000 claims abstract description 10
- 238000002360 preparation method Methods 0.000 claims abstract description 10
- 229910017768 LaF 3 Inorganic materials 0.000 claims abstract description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract 2
- 238000007747 plating Methods 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 claims description 10
- 238000010884 ion-beam technique Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000007888 film coating Substances 0.000 claims description 3
- 238000009501 film coating Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 3
- 230000001815 facial effect Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 8
- 238000005516 engineering process Methods 0.000 abstract description 3
- 238000010894 electron beam technology Methods 0.000 abstract description 2
- 238000002207 thermal evaporation Methods 0.000 abstract description 2
- 230000005540 biological transmission Effects 0.000 abstract 4
- 238000000034 method Methods 0.000 description 6
- 230000010287 polarization Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000002999 depolarising effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007723 die pressing method Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000003331 infrared imaging Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention discloses a design and preparation method of a mid-infrared anti-laser damage depolarization antireflection film. The substrate material is alumina or infrared chalcogenide glass with the refractive index of 1.4-2.0, and the low-refractive-index coating material is LaF 3 The refractive index of the high-refractive-index coating material ZnS is 1.55, the refractive index of the high-refractive-index coating material ZnS is 2.16-2.35, the infrared chalcogenide glass with the thickness of 5mm has good transmission effect in a middle infrared band of 3-5 mu m by using an electron beam thermal evaporation technology and setting a proper baking temperature and adopting a double-sided coating mode, wherein the average transmission rate is more than 99% when the incident angle is 0 degrees, the average transmission rate is more than 97% when the incident angle is 45 degrees, and the average transmission rate is more than 90% when the incident angle is 60 degrees. The invention has the advantages of improving the optical efficiency of the intermediate infrared optical system, having wider incidence angle and resisting laser damage.
Description
Technical Field
The invention belongs to the technical field of infrared optical coating, and particularly relates to a design and preparation method of a mid-infrared anti-laser damage depolarization anti-reflection film.
Background
With the continuous progress of the technology, the pixel size of an infrared detector chip shows a miniaturization trend, although the small pixel size such as 12 μm has a plurality of advantages, the too small pixel size can reduce the incident light intensity, which puts higher requirements on an optical system of the infrared detector, and whether a proper infrared antireflection film system can be designed restricts the further development of the infrared detector. Therefore, research into an antireflection film for improving transmittance of an infrared lens has gradually become a hot spot.
In order to widen the field of view, some infrared imaging devices may use lenses with wider field angles, and at a non-zero incident angle, due to the separation of effective optical admittances, a polarization effect may be generated, which may deteriorate an optical system, and thus, a cancellation process for the polarization effect is required.
The existing infrared anti-reflection lens does not have a film system with the functions of laser damage resistance, depolarization and infrared anti-reflection, and the existing product has complex film system structure and high process requirement, for example, chinese patent of the grant No. CN 110749950B discloses a depolarization film system with matched refractive index, the film system structure of the depolarization film system is S | (alpha H beta LaHbLaH beta L alpha H) ^ n And the structure is complex, and the processing difficulty is high. For example, chinese patent No. CN 110146943B discloses a silicon substrate medium wave infrared antireflection film and a preparation method thereof. In the invention patent, for the wave band above the middle infrared, the required film thickness can directly influence the efficiency and the yield of mass production, ybF3 as a low-refractive-index material has poor laser damage resistance, and the laser damage threshold is 0.57J/cm 2 . The Ge material with high refractive index and the monocrystalline silicon used as the substrate have high cost and high processing difficulty. And the imaging device does not have the function of variable-angle incident depolarization, and has poor imaging effect when the incident angle is changed. Therefore, the mid-infrared anti-laser damage depolarization anti-reflection film is provided. The laser damage resistance design of the invention can reach 0.85J/cm 2 . The chalcogenide glass used in the invention adopts a high-precision mould pressing technology, and has low cost and easy processing.
Disclosure of Invention
The invention aims to overcome the existing defects and provide a laser damage resistant intermediate infrared antireflection film capable of eliminating polarization effect, so as to solve the problems of insufficient research on elimination of the polarization effect, complex film system structure and excessively thick film layer of the existing intermediate infrared band antireflection lens in the background.
In order to achieve the purpose, the invention provides the following technical scheme: alternately depositing ZnS and LaF on two surfaces of a high-precision die pressing chalcogenide glass substrate with double-sided polishing 3 And (5) film layer.
The design and preparation scheme of the mid-infrared anti-laser damage depolarization anti-reflection film provided by the invention comprises the following steps:
(1) Design of membrane system
The two-sided film structure is Sub/0.96L0.82H1.12L5.94H2.80L/Air.
Wherein H represents a high-refractive-index coating material ZnS, the refractive index of the high-refractive-index coating material ZnS is 2.16-2.35, L represents a low-refractive-index coating material LaF 3 A refractive index of 1.55;
(2) Cleaning a substrate: cleaning the surface of an element to be coated;
(3) Heating a substrate: vacuum baking and heating the element to be coated;
(4) Ion beam cleaning: carrying out ion beam cleaning on an element to be coated;
(5) Plating a first surface film system: according to the film system structure in the step (1), sequentially plating each film layer on the first surface of the element to be plated with a film;
(6) Plating a second facial film system: and (4) after the first surface film system is plated, taking out the element, and repeating the steps (1) to (4) to plate the film layers of the second surface in sequence.
The plating of the film layer is briefly described as follows:
the ZnS film material is placed in a crucible and plated by adopting an electron beam thermal evaporation deposition method, and the requirement of local vacuum degree is higher than 5 multiplied by 10 -3 Pa, the deposition rate is 1A/s-5A/s.
The beneficial effects of the invention are:
optics at 5mm thickness by means of film system design and process optimizationThe antireflection film system for inhibiting the polarization effect is plated on the two sides of the infrared chalcogenide glass substrate of the window, so that the average transmittance is more than 97 percent when the incident angle is 45 degrees at the angle of 3-5 mu m, and the average transmittance is more than 90 percent when the incident angle is 60 degrees. Use of low refractive index LaF 3 The material is a wide band gap material, and under the same process condition, the wide band gap material has the highest laser damage resistance threshold value, so that the laser damage resistance can be realized.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention without limiting the invention in which:
FIG. 1 is a schematic cross-sectional view of a mid-infrared laser damage resistant depolarizing antireflection film system of an infrared chalcogenide glass substrate with an optical window of 5mm thickness, wherein (1) is a front film system, (2) is an infrared chalcogenide glass substrate, and (3) is a back film system;
FIG. 2 is an enlarged schematic view of the structure at A in FIG. 1, in which (4) is a low refractive index material and (5) is a high refractive index material;
FIG. 3 is a theoretical spectral contrast curve before and after depolarization optimization at an incident angle of 60 degrees for an exemplary embodiment of the present invention;
FIG. 4 is a theoretical spectral curve at incident angles of 0, 45, and 60 according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of separation of S-wave and P-wave.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
Referring to fig. 1, the present invention provides a technical solution: a design and preparation method of an anti-laser-damage mid-infrared antireflection film capable of eliminating polarization effect mainly comprises the following steps:
1. design of membrane system
Determining the film system structure, wherein the two film system structures are as follows: sub/0.96L0.82H1.12L5.94H2.80L/Air, wherein the substrate material is infrared chalcogenide glass, H represents high refractive index coating material ZnS, L represents low refractive index coating material LaF 3 . FIG. 4 is a theoretical spectral curve of the mid-infrared anti-laser damage depolarization anti-reflection film at incident light angles of 0 °, 45 °, and 60 ° in the design of the embodiment, and FIG. 5 is an image of effective optical admittance separation;
2. pretreatment of
Polishing an infrared chalcogenide glass substrate with the thickness of 5mm, and performing surface finish II; cleaning a substrate with acetone before coating, washing with deionized water for 2-3 times, soaking in analytical pure alcohol for 12h before coating, and taking out;
3. preparation before plating
(1) Starting up the machine for preheating, and starting cooling water circulation, an air compressor and a main power supply;
(2) Opening the air valve to inflate the vacuum chamber;
(3) Cleaning the vacuum chamber, and closing the air release valve after opening the vacuum chamber;
(4) Wiping the room once with alcohol, installing or checking an evaporation source, and filling a film material;
(5) After the alcohol on the optical part is volatilized, the optical part is installed;
(6) Opening the film thickness control system and checking whether the film thickness control system is normal or not, and checking whether the workpiece rotates and the baffle is flexible or not;
(7) Vacuumizing:
(1) closing the vacuum chamber, opening a Guan Yu valve, opening a low valve, vacuumizing to be low, and opening a vacuum gauge;
(2) closing the low valve, opening the pre-valve, then opening the high valve, and pumping high vacuum when the vacuum degree reaches the left or right;
(3) after the vacuum degree reaches the magnitude, rotating the workpiece, baking and setting the temperature to be 90-100 ℃, adjusting the monochromator to a corresponding value, checking whether the light path is correct or not, and preheating the film thickness controller for one minute;
(8) The surface treatment vacuum degree of the part to be plated reaches 10 -3 Bombarding by Ar ion beams of about 700-800eV for 5min at about Pa;
4. coating film
(1) ZnS and LaF plating method by electron beam evaporation 3 Respectively plating each film layer on the first surface of an element to be plated according to a film system in the film system design at deposition rates of 3A/s and 5A/s;
(2) Repeating the pretreatment and the preparation before plating, and sequentially plating the film layers on the second surface of the substrate to be plated according to the process of plating the first layer;
(3) After the film coating is finished, opening the vacuum chamber when the baking temperature is close to the room temperature, and taking out the film coating lens;
5. and (3) testing: and measuring the transmittance of the coated lens by using a Fourier infrared spectrometer.
According to GB/T16601.4-2017, in a laser device and laser related equipment, a laser damage threshold testing method is used for carrying out laser damage threshold testing on a finished product film.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (3)
1. A design and preparation method of a mid-infrared anti-laser damage depolarization antireflection film is characterized by comprising the following steps:
designing a membrane system:
(1) The structure of the film coating systems on the two sides of the substrate is Sub/0.96L0.82H1.12L5.94H2.80L/Air;
wherein, the numbers respectively represent the optical thickness coefficient of each layer, and the numerical value is related to the reference wavelength lambda;
(2) Cleaning a substrate: cleaning the surface of an element to be coated;
(3) Heating a substrate: carrying out vacuum baking and heating on an element to be coated;
(4) Ion beam cleaning: carrying out ion beam cleaning on an element to be coated;
(5) Plating a first surface film system: according to the film system structure in the step (1), sequentially plating each film layer on the first surface of the element to be plated;
(6) Plating a second facial film system: and (4) after the first surface film system is plated, taking out the element, and repeating the steps (1) to (4) to plate the film layers of the second surface in sequence.
2. The design and preparation method of the mid-infrared laser damage resistant depolarization antireflection film of claim 1, wherein the substrate is an infrared window material, preferably infrared chalcogenide glass or alumina; the H high-refractive-index coating material is ZnS; the L low refractive index coating material is LaF 3 。
3. The design and preparation method of the mid-infrared anti-laser damage depolarization antireflection film according to claim 1, wherein in the step (1), the two face film systems have the following structures:
Sub/0.96L0.82H1.12L5.94H2.80L/Air; wherein the H high refractive index coating material is ZnS; the L low-refractive-index coating material is LaF 3 。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211091999.6A CN115267952A (en) | 2022-09-07 | 2022-09-07 | Mid-infrared anti-laser damage depolarization antireflection film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211091999.6A CN115267952A (en) | 2022-09-07 | 2022-09-07 | Mid-infrared anti-laser damage depolarization antireflection film |
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| CN202211091999.6A Pending CN115267952A (en) | 2022-09-07 | 2022-09-07 | Mid-infrared anti-laser damage depolarization antireflection film |
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- 2022-09-07 CN CN202211091999.6A patent/CN115267952A/en active Pending
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