CN115193429A - Helium adsorber regeneration system and method thereof - Google Patents

Helium adsorber regeneration system and method thereof Download PDF

Info

Publication number
CN115193429A
CN115193429A CN202210914464.8A CN202210914464A CN115193429A CN 115193429 A CN115193429 A CN 115193429A CN 202210914464 A CN202210914464 A CN 202210914464A CN 115193429 A CN115193429 A CN 115193429A
Authority
CN
China
Prior art keywords
valve
adsorber
helium
line
passage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210914464.8A
Other languages
Chinese (zh)
Inventor
邵东方
熊联友
王广海
徐鹏
李昆鹏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Zhongke Fu Hai Low Temperature Technology Co ltd
Original Assignee
Beijing Zhongke Fu Hai Low Temperature Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Zhongke Fu Hai Low Temperature Technology Co ltd filed Critical Beijing Zhongke Fu Hai Low Temperature Technology Co ltd
Priority to CN202210914464.8A priority Critical patent/CN115193429A/en
Publication of CN115193429A publication Critical patent/CN115193429A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/34Regenerating or reactivating
    • B01J20/3483Regenerating or reactivating by thermal treatment not covered by groups B01J20/3441 - B01J20/3475, e.g. by heating or cooling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/34Regenerating or reactivating
    • B01J20/345Regenerating or reactivating using a particular desorbing compound or mixture
    • B01J20/3458Regenerating or reactivating using a particular desorbing compound or mixture in the gas phase
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/40Further details for adsorption processes and devices
    • B01D2259/40083Regeneration of adsorbents in processes other than pressure or temperature swing adsorption
    • B01D2259/40088Regeneration of adsorbents in processes other than pressure or temperature swing adsorption by heating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/40Further details for adsorption processes and devices
    • B01D2259/40083Regeneration of adsorbents in processes other than pressure or temperature swing adsorption
    • B01D2259/40088Regeneration of adsorbents in processes other than pressure or temperature swing adsorption by heating
    • B01D2259/4009Regeneration of adsorbents in processes other than pressure or temperature swing adsorption by heating using hot gas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Separation Of Gases By Adsorption (AREA)

Abstract

The invention provides a helium adsorber regeneration system and a method thereof, wherein the regeneration system comprises: the adsorption unit comprises at least two first adsorbers and second adsorbers which can be switched to use, and the second adsorbers are regenerated when the first adsorbers are used for adsorption; the gas supply unit is used for supplying raw material helium, and comprises a first passage and a second passage, the raw material helium flowing through the first passage is used for liquefaction, and the raw material helium flowing through the second passage is used for regenerating the second adsorber; and the discharge unit is connected with the adsorption unit and used for discharging the impurity gas in the second adsorber. The regeneration system provided by the invention does not introduce new regeneration gas, so that new impurities cannot be introduced into the raw material helium, and the cleanliness of the raw material helium is ensured.

Description

Helium adsorber regeneration system and method thereof
Technical Field
The embodiment of the invention relates to the technical field of helium refrigeration, in particular to a helium adsorber regeneration system and a method thereof.
Background
In the helium liquefying system, because the boiling point of helium is extremely low, in the process of liquefying helium, high-boiling-point impurities in helium, such as nitrogen, oxygen, water and the like, can be liquefied and solidified, and in order to avoid pipeline blockage and damage to equipment, a helium adsorber is arranged in the helium liquefying system to adsorb the impurities in raw material helium. However, in a low-temperature working environment, the helium adsorber is very easy to adsorb and saturate, and after the helium adsorber adsorbs and saturates, impurities in the helium cannot be removed continuously.
In the prior art, after the helium adsorber is saturated, regeneration gas is usually introduced to discharge impurities in the helium adsorber, but the method has the risk of the regeneration gas polluting the raw material helium.
Therefore, there is a need for a helium adsorber regeneration system and method thereof to solve the above problems.
Disclosure of Invention
The embodiment of the invention provides a helium adsorber regeneration system and a method thereof, which can not introduce new impurities into raw material helium, thereby ensuring the cleanliness of the raw material helium.
In a first aspect, an embodiment of the present invention provides a helium adsorber regeneration system, including:
the adsorption unit comprises at least two first adsorbers and second adsorbers which can be switched to use, and the second adsorbers are regenerated when the first adsorbers are used for adsorption;
the gas supply unit is used for supplying raw material helium, and comprises a first passage and a second passage, wherein the raw material helium flowing through the first passage is used for liquefaction, and the raw material helium flowing through the second passage is used for regenerating the second adsorber;
and the discharge unit is connected with the adsorption unit and is used for discharging the impurity gas in the second adsorber.
In a possible design, a coil is arranged in each of the first adsorber and the second adsorber, the coil is communicated with the second passage, and the raw material helium for regenerating the second adsorber flows in the coil.
In one possible design, the first passage includes a first pipeline and a second pipeline arranged in parallel, a first valve and a second valve arranged on the first pipeline, and a third valve and a fourth valve arranged on the second pipeline;
the first valve and the second valve are used for controlling the on-off of the raw material helium in the first pipeline, and the third valve and the fourth valve are used for controlling the on-off of the raw material helium in the second pipeline.
In one possible design, the second passage includes a third pipeline and a fourth pipeline arranged in parallel, and a fifth valve arranged on the third pipeline and a sixth valve arranged on the fourth pipeline;
the fifth valve is used for controlling the on-off of the raw material helium in the third pipeline, and the sixth valve is used for controlling the on-off of the raw material helium in the fourth pipeline.
In one possible design, the device further comprises a refrigerant supply unit for supplying a refrigerant medium to the raw material helium gas flowing through the first passage.
In one possible design, the refrigeration medium is helium;
a first heater is arranged at the outlet of the second passage;
an outlet of the first heater is connected to an outlet of the refrigerant supply unit.
In one possible design, the bleed unit includes a first bleed line, a second bleed line, a first bleed valve disposed on the first bleed line, a second bleed valve disposed on the second bleed line;
the first drain line is connected to a first line between the first adsorber and the second valve, and the second drain line is connected to a second line between the second adsorber and the fourth valve;
and discharging the impurity gas in the first adsorber and the second adsorber by controlling the opening and closing of the first discharge valve and the second discharge valve.
In one possible design, the bleed unit further includes a second heater disposed on the first bleed line and a third heater disposed on the second bleed line.
In one possible design, the device further comprises a vacuum-pumping unit for pumping vacuum to the second adsorber;
the vacuumizing unit comprises a vacuum pump, a first vacuumizing pipeline, a second vacuumizing pipeline, a first vacuumizing valve arranged on the first vacuumizing pipeline and a second vacuumizing valve arranged on the second vacuumizing pipeline;
the first vacuumizing pipeline is connected to a first discharge pipeline between the second heater and the first discharge valve, and the second vacuumizing pipeline is connected to a second discharge pipeline between the third heater and the second discharge valve;
the vacuum pump is arranged on the outlet side pipelines of the first vacuumizing valve and the second vacuumizing valve along the gas flowing direction.
In a second aspect, an embodiment of the present invention further provides a helium adsorber regeneration method, including:
dividing the gas supply unit into a first passage and a second passage;
providing a source helium gas for liquefaction using the first passageway;
providing feed helium for regeneration of the second adsorber using the second passage;
and discharging the impurity gas in the second adsorber by using the discharge unit.
The application provides a helium adsorber regeneration system, including the adsorption unit, gas supply unit and discharge unit, wherein, the gas supply unit includes first route and second route, through setting up two routes, be used for liquefying the raw materials helium that will flow through first route, be used for regenerating the second adsorber with the raw materials helium that will flow through the second route, utilize raw materials helium to heat the adsorbent in the second adsorber promptly, make the temperature of adsorbent be higher than impurity gas's analytic temperature, so that impurity gas resolves out from the adsorbent, and finally, the impurity gas who resolves out is discharged from discharge unit, accomplish the regeneration of helium adsorber. Therefore, the regeneration system provided by the application does not introduce new regeneration gas, so that new impurities cannot be introduced into the raw material helium, and the cleanliness of the raw material helium is ensured.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a system schematic of a helium adsorber regeneration system provided by an embodiment of the present invention;
FIG. 2 is a schematic flow chart of a helium adsorber regeneration process according to an embodiment of the present invention.
Reference numerals:
1-an adsorption unit;
11-a first adsorber;
12-a second adsorber;
13-a coil pipe;
2-a gas supply unit;
21-a first pathway;
211 — a first conduit;
212-a second conduit;
213-a first valve;
214-a second valve;
215-a third valve;
216-a fourth valve;
217-differential pressure transmitter;
218-a temperature transmitter;
22-a second pathway;
221-third line;
222-a fourth conduit;
223-a fifth valve;
224-a sixth valve;
225-a first heater;
3-a bleed-off unit;
31-a first bleed line;
32-a second bleed line;
33-a first bleed valve;
34-a second bleed valve;
35-a second heater;
36-a third heater;
4-a refrigerant supply unit;
5-a vacuum pumping unit;
51-a vacuum pump;
52-first evacuation line;
53-second evacuation line;
54-a first evacuation valve;
55-second evacuation valve.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer and more complete, the technical solutions in the embodiments of the present invention will be described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention, and based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts belong to the scope of the present invention.
As previously mentioned, regenerating an adsorber saturated with adsorption using a regeneration gas (typically nitrogen) tends to contaminate the feed helium with the regeneration gas, resulting in the introduction of new impurities.
In order to solve the problems, the inventor proposes that the raw material helium can be divided into two paths, one path of helium flows through a liquefaction system for liquefaction, and the other path of helium is used for regenerating an adsorber saturated in adsorption, so that new impurities cannot be introduced, and the cleanliness of the raw material helium is guaranteed.
As shown in FIG. 1, an embodiment of the present invention provides a helium adsorber regeneration system comprising:
the adsorption unit 1 comprises at least two first adsorbers 11 and second adsorbers 12 which can be switched to use, and when the first adsorbers 11 are used for adsorption, the second adsorbers 12 are used for regeneration;
a gas supply unit 2 for supplying a raw material helium gas, the gas supply unit 2 including a first passage 21 and a second passage 22, the raw material helium gas flowing through the first passage 21 being used for liquefaction, and the raw material helium gas flowing through the second passage 22 being used for regeneration of the second adsorber 12;
and the discharge unit 3 is connected with the adsorption unit 1 and is used for discharging the impurity gas in the second adsorber 12.
In this embodiment, the gas supply unit 2 is provided with two passages, the raw material helium gas flowing through the first passage is used for liquefaction, the raw material helium gas flowing through the second passage 22 is used for regeneration of the second adsorber 12, that is, the raw material helium gas is used for heating the adsorbent in the second adsorber 12, so that the temperature of the adsorbent is higher than the desorption temperature of the impurity gas, so that the impurity gas is desorbed from the adsorbent, and finally, the desorbed impurity gas is discharged from the discharge unit 3, thereby completing the regeneration of the helium adsorber. The regeneration system provided by the embodiment does not introduce new regeneration gas, so that new impurities cannot be introduced into the raw material helium, and the cleanliness of the raw material helium is ensured.
It is to be understood that the first adsorber 11 of the embodiment of the present invention is only used for showing the adsorber for adsorbing the impurity gas in the raw material helium gas, and the second adsorber 12 is only used for showing the adsorber which has been saturated by the adsorption and needs to be regenerated. In the next complete operating phase, the first adsorber 11 will assume the role of the second adsorber 12 in the preceding operating phase, while the second adsorber 12 will assume the role of the first adsorber 11 in the preceding operating phase. For the sake of simplicity, the statements relating to the first adsorber 11 and the second adsorber 12 in the exemplary embodiment of the invention are therefore only statements under one complete operating phase.
Generally, the raw helium is a normal temperature gas (about 20-35 ℃), the operating temperature of the adsorber is about-150 ℃ to-200 ℃, and the impurity gas in the raw helium is adsorbed in the pores of the adsorbent. When regeneration of a saturated adsorber is desired, the adsorbent is heated to desorption temperatures (above about-50 ℃) to desorb contaminant gases from the pores of the adsorbent.
Thus, in some embodiments, the inlet of the second passage 22 is connected to the raw helium gas inlet to heat the adsorbent in the second adsorber 12 with the normal temperature raw helium gas until the adsorbent temperature is higher than-50 ℃ to change the impurity gas from the adsorption state to the desorption state to facilitate the impurity gas release.
In some embodiments, a coil 13 is disposed in each of the first adsorber 11 and the second adsorber 12, and the coil 13 is communicated with the second passage 22, so that helium as a raw material for regenerating the second adsorber 12 flows through the coil 13.
In this embodiment, through setting up coil pipe 13, make raw materials helium flow in coil pipe 13, the adsorbent is outside coil pipe 13, and raw materials helium heats the adsorbent with the mode of dividing wall formula heat transfer, so, the impurity gas who parses out from the adsorbent can not pollute raw materials helium, is favorable to the recovery of raw materials helium, the energy saving.
In some embodiments, the first passage 21 includes a first line 211 and a second line 212 arranged in parallel, and a first valve 213 and a second valve 214 arranged on the first line 211, a third valve 215 and a fourth valve 216 arranged on the second line 212;
the first valve 213 and the second valve 214 are used for controlling the on/off of the raw material helium in the first pipeline 211, and the third valve 215 and the fourth valve 216 are used for controlling the on/off of the raw material helium in the second pipeline 212.
In this embodiment, the first valve 213 is provided at the inlet of the first adsorber 11, the second valve 214 is provided at the outlet of the first adsorber 11, the third valve 215 is provided at the inlet of the second adsorber 12, and the fourth valve 216 is provided at the outlet of the first adsorber 11. After the second adsorber 12 is saturated, the third valve 215 and the fourth valve 216 are closed, and the first valve 213 and the second valve 214 are opened, so that the second adsorber 12 can be switched to the first adsorber 11, and then the first adsorber 11 is used to continue adsorbing the impurity gas in the raw helium gas, and the second adsorber 12 is regenerated at the same time, thereby ensuring the continuous operation of the system.
In some embodiments, the inlet and outlet pipes of the first adsorber 11 and the second adsorber 12 are both provided with pressure transducers 217, and whether the adsorbers are saturated or not is determined by the pressure difference between the inlet and outlet pressure transducers 217; in addition, temperature transmitters 218 are provided in both the first adsorber 11 and the second adsorber 12, and whether or not the temperature of the adsorbent has reached the desorption temperature of the impurity gas is determined from the temperature detected by the temperature transmitters 218.
In some embodiments, the second passage 22 includes a third pipe 221 and a fourth pipe 222 arranged in parallel, and a fifth valve 223 arranged on the third pipe 221, a sixth valve 224 arranged on the fourth pipe 222;
the fifth valve 223 is used for controlling the on-off of the raw material helium in the third pipeline 221, and the sixth valve 224 is used for controlling the on-off of the raw material helium in the fourth pipeline 222.
In this embodiment, the sixth valve 224 is opened, and the raw helium gas at normal temperature is introduced into the coil 13 of the second adsorber 12, so that the adsorbent in the second adsorber 12 can be heated by indirect heat exchange until the desorption temperature of the impurity gas is reached, and the gas impurity will not pollute the raw helium gas for regeneration due to the indirect heat exchange, thereby facilitating the recovery of the raw helium gas.
In some embodiments, the outlet of the second passageway 22 may be vented to the atmosphere or to a separate recovery device, and this application is not limited in particular.
In some embodiments, the refrigerant supply unit 4 is further included to supply a refrigeration medium to the raw material helium gas flowing through the first passage 21, and the refrigeration medium may be helium gas, nitrogen gas or hydrogen gas, which is not specifically limited in the present application.
In some embodiments, the refrigeration medium is helium.
The outlet of the second passage 22 is provided with a first heater 225;
an outlet of the first heater 225 is connected to an outlet of the refrigerant supply unit 4.
In this embodiment, the cooling medium (i.e., helium gas) cools the raw material helium gas step by step, and finally reaches the outlet of the refrigerant supply unit 4, at this time, the temperature of the cooling medium is normal temperature, and the cooling medium is recycled. Because the refrigerating medium and the raw material helium for regeneration are the same medium, two pipelines can be connected together to share one set of recovery system, so that the system can be simplified, and the volume of a helium liquefaction system can be reduced. In addition, because the temperature of the raw material helium flowing out of the adsorber is low, the raw material helium can be heated to the normal temperature by arranging the first heater 225, and then can be converged with the refrigeration medium (helium) at the normal temperature, so that the stability of the recovery system is ensured.
In some embodiments, the bleed unit comprises a first bleed line 31, a second bleed line 32, a first bleed valve 333 disposed on the first bleed line 31, a second bleed valve 343 disposed on the second bleed line 32;
the first bleed line 31 is connected to the first line 211 between the first adsorber 11 and the second valve 214, and the second bleed line 32 is connected to the second line 212 between the second adsorber 12 and the fourth valve 216;
the impurity gases in the first adsorber 11 and the second adsorber 12 are purged by controlling the opening and closing of the first purge valve 333 and the second purge valve 343.
In this embodiment, when the second adsorber 12 is being regenerated, the second bleed valve 343 is opened to purge the second adsorber of gaseous impurities.
In some embodiments, the bleed unit further comprises a second heater 35 disposed on the first bleed line 31 and a third heater 36 disposed on the second bleed line 32.
In this embodiment, since the temperature of the medium flowing out of the adsorber is low, a heater needs to be provided in the purge line to heat the discharged gas to room temperature and then purge the gas.
In some embodiments, a vacuum unit 5 is further included for evacuating the second adsorber 12. Preferably, the vacuum pumping unit 5 comprises a vacuum pump 51, a first vacuum pumping line 52, a second vacuum pumping line 53, a first vacuum pumping valve 54 disposed on the first vacuum pumping line 52, and a second vacuum pumping valve 55 disposed on the second vacuum pumping line 53;
the first evacuation line 52 is connected to the first drain line 31 between the second heater 35 and the first drain valve 333, and the second evacuation line 53 is connected to the second drain line 32 between the third heater 36 and the second drain valve 343; the second heater 35 and the third heater 36 are used to heat the extracted gas to a normal temperature and then discharge the heated gas.
The vacuum pump 51 is provided on the outlet side piping of the first evacuation valve 54 and the second evacuation valve 55 in the gas flow direction.
In the embodiment, the pressure relief process can be more thorough through vacuumizing, so that impurities in the adsorber can be completely discharged conveniently, and the regeneration efficiency is ensured. In addition, the first evacuation line 52 is connected to the first drain line 31 between the second heater 35 and the first drain valve 333, and the second evacuation line 53 is connected to the second drain line 32 between the third heater 36 and the second drain valve 343, whereby the second heater 35 and the third heater 36 can be shared by the evacuation unit 5 and the drain unit 3, and the system can be simplified and the investment cost can be reduced.
In some embodiments, in order to realize the on-line automatic switching of the helium adsorber regeneration system, all the valves in the present application are preferably pneumatic valves or electric valves, and may of course be valves with interlocking functions such as hydraulic valves, and the present application does not specifically limit the control form of the valves.
In addition, in order to adjust the flow rate of the raw helium gas in real time according to the requirement of the user and ensure the stability of the regeneration system, the first valve 213, the second valve 214, the third valve 215 and the fourth valve 216 in the embodiments of the present application are preferably valves with regulating functions, so as to adjust the opening degree of the valves according to the actual requirement. The valves other than the above valves are preferably shut-off valves, such as ball valves or butterfly valves, so that the system can respond quickly when the system needs to switch the adsorbers, and the stability and safety of the system are ensured. Of course, the above only provides a preferred mode of the valve, and a user may also determine the valve form by himself or herself as required, and the present application is not limited specifically. Besides, in order to guarantee the service life of the valve, in the low temperature unit, a low temperature resistant valve is preferred, and in the high temperature unit, a high temperature resistant valve is preferred, which is not specifically limited in this application.
In addition, the regeneration system shown in fig. 1 only realizes automatic switching and regeneration of the helium adsorber, and ensures continuous operation of the helium liquefaction system and safety of the device.
As shown in FIG. 2, an embodiment of the present invention provides a helium adsorber regeneration method, comprising:
step 100, dividing the gas supply unit 2 into a first passage 21 and a second passage 22;
step 102, providing raw material helium for liquefaction by using a first passage 21;
104, providing a feed helium gas for regenerating the second adsorber 12 using the second passage 22;
in step 106, the impurity gas in the second adsorber 12 is purged using the purge unit 3.
The regeneration scheme of the regeneration system of the present application will be described in detail below, taking the regeneration of the second adsorber 12 as an example:
step A, switching the adsorbers, opening a first valve 213 and a second valve 214, and switching the first adsorber 11 to a working state; closing the third valve 215 and the fourth valve 216 switches the second adsorber 12 to the regeneration state.
And step B, discharging the helium raw material, opening the second discharge valve 34 and the third heater 36, discharging the helium raw material in the second adsorber 12 after heating to the normal temperature, and closing the second discharge valve 34 and the third heater 36 after discharging.
And step C, regenerating, namely opening a sixth valve 224 and a first heater 225, enabling the raw material helium to flow into the coil 13 of the second adsorber 12 through a fourth pipeline 222 to heat the adsorbent, observing the temperature value of the temperature transmitter 218, judging that the temperature reaches the analytic temperature of the impurity gas when the temperature value is higher than-50 ℃, and closing the sixth valve 224 and the first heater 225.
And step D, discharging, namely opening the second discharge valve 34 and the third heater 36, discharging after heating the gas impurities in the second adsorber 12 to the normal temperature, and closing the second discharge valve 34 and the third heater 36 after discharging.
And E, vacuumizing, namely opening the vacuum pump 51 and the second vacuumizing valve 55, vacuumizing the second adsorber 12, and closing the vacuum pump 51 and the second vacuumizing valve 55 after the vacuum degree reaches the standard.
And step F, pressurizing, namely opening the third valve 215 to a certain opening degree, introducing raw material helium into the second adsorber 12, and closing the third valve 215 after the pressure in the second adsorber 12 reaches a preset pressure.
And then repeating the steps B to E to complete the regeneration, and enabling the second adsorber 12 to enter a standby state.
Of course, the user may determine the number of operations of steps B to F based on the actual result, and the standard for finishing the complete discharge of the impurity gas is set.
Before the adsorber switching, the method further includes:
judging whether the current adsorber is saturated or not, if so, starting the standby adsorber, and simultaneously closing the current adsorber and regenerating; if not, the standby adsorber is not switched to, and the current adsorber continues to work.
In some embodiments, the method for determining whether the adsorber is saturated by adsorption comprises at least the following steps:
first, the pressure difference value detected by the pressure difference transmitter 217 is used for judging, if the pressure difference value is larger than a set value, the current adsorber is judged to be saturated, and at the moment, the automatic switching and regeneration of the adsorber are started in an interlocking mode.
Second, automatic switching and regeneration is performed at regular intervals, such as after 5 days of continuous adsorber operation.
It is understood that the method for regenerating a helium adsorber provided in this embodiment and the system for regenerating a helium adsorber provided in the above embodiments have the same advantages, and therefore, the detailed description thereof is omitted.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one of 8230" does not exclude the presence of additional like elements in a process, method, article, or apparatus comprising the element.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.

Claims (10)

1. A helium adsorber regeneration system, comprising:
an adsorption unit (1) comprising at least two switchable first (11) and second (12) adsorbers, the second adsorber (12) being regenerated while the first adsorber (11) is adsorbing;
a gas supply unit (2) for supplying raw helium gas, wherein the gas supply unit (2) comprises a first passage (21) and a second passage (22), the raw helium gas flowing through the first passage (21) is used for liquefaction, and the raw helium gas flowing through the second passage (22) is used for regeneration of the second adsorber (12);
and the discharge unit (3) is connected with the adsorption unit (1) and is used for discharging the impurity gas in the second adsorber (12).
2. Regeneration system according to claim 1, characterised in that a coil (13) is provided in each of the first adsorber (11) and the second adsorber (12), the coil (13) communicating with the second passage (22), the feed helium for regenerating the second adsorber (12) flowing in the coil (13).
3. The regeneration system according to claim 1, wherein the first passage (21) comprises a first line (211) and a second line (212) arranged in parallel, and a first valve (213) and a second valve (214) arranged on the first line (211), a third valve (215) and a fourth valve (216) arranged on the second line (212);
the first valve (213) and the second valve (214) are used for controlling the on-off of the raw material helium gas in the first pipeline (211), and the third valve (215) and the fourth valve (216) are used for controlling the on-off of the raw material helium gas in the second pipeline (212).
4. The regeneration system according to claim 1, wherein the second passage (22) comprises a third line (221) and a fourth line (222) arranged in parallel, and a fifth valve (223) arranged on the third line (221), a sixth valve (224) arranged on the fourth line (222);
the fifth valve (223) is used for controlling the on-off of the raw material helium gas in the third pipeline (221), and the sixth valve (224) is used for controlling the on-off of the raw material helium gas in the fourth pipeline (222).
5. The regeneration system according to claim 1, further comprising a refrigerant supply unit (4) for supplying a refrigerant medium to the raw helium gas flowing through the first passage (21).
6. The regeneration system of claim 5, wherein the refrigeration medium is helium;
a first heater (225) is arranged at the outlet of the second passage (22);
an outlet of the first heater (225) is connected to an outlet of the refrigerant supply unit (4).
7. Regeneration system according to claim 1, wherein the relief unit (3) comprises a first relief line (31), a second relief line (32), a first relief valve (33) arranged on the first relief line (31), a second relief valve (34) arranged on the second relief line (32);
the first bleed line (31) being connected to a first line (211) between the first adsorber (11) and the second valve (214), the second bleed line (32) being connected to a second line (212) between the second adsorber (12) and the fourth valve (216);
and discharging the impurity gas in the first adsorber (11) and the second adsorber (12) by controlling the opening and closing of the first discharge valve (33) and the second discharge valve (34).
8. Regeneration system according to claim 7, wherein the bleed unit (3) further comprises a second heater (35) arranged on the first bleed line (31) and a third heater (36) arranged on the second bleed line (32).
9. Regeneration system according to claim 1, further comprising an evacuation unit (5) for evacuating the second adsorber (12);
the vacuumizing unit (5) comprises a vacuum pump (51), a first vacuumizing pipeline (52), a second vacuumizing pipeline (53), a first vacuumizing valve (54) arranged on the first vacuumizing pipeline (52) and a second vacuumizing valve (55) arranged on the second vacuumizing pipeline (53);
-the first evacuation line (52) is connected to a first bleed line (31) between the second heater (35) and the first bleed valve (33), -the second evacuation line (53) is connected to a second bleed line (32) between the third heater (36) and the second bleed valve (34);
the vacuum pump (51) is provided on outlet-side lines of the first evacuation valve (54) and the second evacuation valve (55) in a gas flow direction.
10. A helium adsorber regeneration method for use with the helium adsorber regeneration system of any of claims 1-9, the method comprising:
dividing the gas supply unit (2) into a first passage (21) and a second passage (22);
supplying a raw helium gas for liquefaction by using the first passage (21);
providing feed helium for regenerating the second adsorber (12) using the second passage (22);
-bleeding off the impurity gas in the second adsorber (12) by means of the bleed unit (3).
CN202210914464.8A 2022-08-01 2022-08-01 Helium adsorber regeneration system and method thereof Pending CN115193429A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210914464.8A CN115193429A (en) 2022-08-01 2022-08-01 Helium adsorber regeneration system and method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210914464.8A CN115193429A (en) 2022-08-01 2022-08-01 Helium adsorber regeneration system and method thereof

Publications (1)

Publication Number Publication Date
CN115193429A true CN115193429A (en) 2022-10-18

Family

ID=83585221

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210914464.8A Pending CN115193429A (en) 2022-08-01 2022-08-01 Helium adsorber regeneration system and method thereof

Country Status (1)

Country Link
CN (1) CN115193429A (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05111609A (en) * 1991-10-22 1993-05-07 Nippon Sanso Kk Method and equipment for supplying gaseous helium
CN110420538A (en) * 2019-08-08 2019-11-08 广东华特气体股份有限公司 A kind of activation system and method for ultra-pure gases adsorbent
CN113731107A (en) * 2021-10-11 2021-12-03 北京中科富海低温科技有限公司 Online regeneration system
CN114130155A (en) * 2021-11-09 2022-03-04 西南化工研究设计院有限公司 Method for refining high-purity and ultra-pure gas by low-temperature adsorption
CN114538394A (en) * 2022-04-26 2022-05-27 北京中科富海低温科技有限公司 Helium extracting system and method for synthetic ammonia purge gas
CN114562852A (en) * 2022-03-22 2022-05-31 北京中科富海低温科技有限公司 Helium de-neon system and method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05111609A (en) * 1991-10-22 1993-05-07 Nippon Sanso Kk Method and equipment for supplying gaseous helium
CN110420538A (en) * 2019-08-08 2019-11-08 广东华特气体股份有限公司 A kind of activation system and method for ultra-pure gases adsorbent
CN113731107A (en) * 2021-10-11 2021-12-03 北京中科富海低温科技有限公司 Online regeneration system
CN114130155A (en) * 2021-11-09 2022-03-04 西南化工研究设计院有限公司 Method for refining high-purity and ultra-pure gas by low-temperature adsorption
CN114562852A (en) * 2022-03-22 2022-05-31 北京中科富海低温科技有限公司 Helium de-neon system and method thereof
CN114538394A (en) * 2022-04-26 2022-05-27 北京中科富海低温科技有限公司 Helium extracting system and method for synthetic ammonia purge gas

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
朱淑艳: "《化工单元操作 上》", 天津大学出版社, pages: 197 *

Similar Documents

Publication Publication Date Title
AU2016291736B2 (en) Pressure swing adsorbers with flow regulation by orifices
CN113264506B (en) Hydrogen low-temperature adsorber regeneration process of hydrogen liquefying device
KR101687360B1 (en) Air generating system for absorption type dryer
KR20180022621A (en) Non-purge and adsorption type air dryer using a blower
CN114562852B (en) Helium de-neon system and method thereof
JPH0565206B2 (en)
CN115193429A (en) Helium adsorber regeneration system and method thereof
CN114538394A (en) Helium extracting system and method for synthetic ammonia purge gas
KR100869518B1 (en) Method and apparatus for Cryogenic Helium Purification
CN105126536B (en) Purifying device for natural gas, purification system, processing system and adsorbent regeneration method
KR100845518B1 (en) Method and apparatus for separating Krypton gas and Xenon gas
JPWO2010010610A1 (en) Ozone gas concentration method and apparatus
JP2020116545A (en) Low-temperature refining device and operation method of low-temperature refining device
CN105087094B (en) Purifying device for natural gas, purification system, processing system and adsorbent regeneration method
CN110385012B (en) Organic waste gas treatment system containing three-tank two-stage adsorption
US20080271466A1 (en) Method and System for Purifying Liquified Gases
CN113617183A (en) VOCs desorption device and VOCs desorption method of activated carbon assembly
JPH0584418A (en) Pretreatment of air separator and equipment therefor
CN105126532A (en) Method, apparatus and system for controlling natural gas adsorption column
JP3195986B2 (en) Helium gas supply method and device
JP6851839B2 (en) Heat recovery type oxygen nitrogen supply system
CN116558229B (en) Helium purifier capable of continuously working and purifying method
RU2456059C2 (en) Method of gas treatmentand device to this end
JP2023122006A (en) Adsorbent regeneration device and removal system
JP2023122004A (en) Adsorbent regeneration device and removal system

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20221018