CN115180594B - Recovery process of wastewater from organosilicon slurry residue treatment - Google Patents

Recovery process of wastewater from organosilicon slurry residue treatment Download PDF

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Publication number
CN115180594B
CN115180594B CN202210810281.1A CN202210810281A CN115180594B CN 115180594 B CN115180594 B CN 115180594B CN 202210810281 A CN202210810281 A CN 202210810281A CN 115180594 B CN115180594 B CN 115180594B
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gas phase
flash tank
wastewater
tower
concentration
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CN115180594A (en
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王海毅
周傲
郭圆
疏龙生
刘冰
朱宏
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Xinjiang Western Hesheng Silicon Material Co ltd
Xinjiang Western Hoshine Silicon Industry Co ltd
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Xinjiang Western Hesheng Silicon Material Co ltd
Xinjiang Western Hoshine Silicon Industry Co ltd
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/07—Purification ; Separation
    • C01B7/0706—Purification ; Separation of hydrogen chloride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/07—Purification ; Separation
    • C01B7/0706—Purification ; Separation of hydrogen chloride
    • C01B7/0712—Purification ; Separation of hydrogen chloride by distillation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
    • C02F1/048—Purification of waste water by evaporation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
    • C02F1/06—Flash evaporation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
    • C02F1/16—Treatment of water, waste water, or sewage by heating by distillation or evaporation using waste heat from other processes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/12—Halogens or halogen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/02—Temperature
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/03—Pressure
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00—General aspects of water treatment
    • C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Inorganic Chemistry (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)

Abstract

The invention relates to a recycling process for treating wastewater by using organosilicon residues. A recycling process of organosilicon slurry residue treatment wastewater comprises the following steps: (1) The method comprises the steps that organic silicon slurry and slag treatment wastewater enters a flash tank 1, and after evaporation, a gas phase 1 is collected at the top of the flash tank 1; (2) Feeding the rest liquid phase 1 into a flash tank 2, heating and evaporating by using the gas phase 1, and collecting the gas phase 2 at the top of the flash tank 2; (3) Sending the residual liquid phase 2 into a flash tank 3, heating and evaporating the residual liquid phase 2 by using the gas phase 2, collecting the gas phase 3 at the top of the flash tank 3, and taking the residual liquid phase 3 as wastewater; (4) And (3) sending the gas phase 3 to a concentration tower, heating the tower kettle, and concentrating to obtain high-concentration hydrochloric acid. According to the recovery process for treating wastewater by using the organosilicon slurry residue, more than 95% of hydrogen chloride in the wastewater is recovered by multi-effect evaporation and hydrochloric acid concentration, so that the hydrogen chloride is effectively recovered, and the cost is low.

Description

Recovery process of wastewater from organosilicon slurry residue treatment
Technical Field
The invention belongs to the technical field of organic silicon, and particularly relates to a recycling process of organic silicon slurry slag treatment wastewater.
Background
After copper extraction, a large amount of acid wastewater is generated after the treatment of the organosilicon slurry slag, and the wastewater contains a large amount of impurity salts and silane impurities. The conventional treatment method is to perform evaporation crystallization after neutralization, but a large amount of waste salt dangerous wastes are generated, the treatment is difficult, and the treatment cost is relatively high. Further, the utilization value of a part of the substances in the wastewater is not fully utilized.
In view of the above, the invention provides a new recovery process of treating wastewater by using organosilicon slurry and slag, which effectively recovers useful substances by multi-effect evaporation and hydrochloric acid concentration, reduces dangerous wastes and reduces cost.
Disclosure of Invention
The invention aims to provide a recovery process of wastewater from organosilicon slurry residue treatment, which is characterized in that more than 95% of hydrogen chloride in the wastewater is recovered through multi-effect evaporation and hydrochloric acid concentration, so that the effective recovery of the hydrogen chloride is realized, and the cost is low.
In order to achieve the above purpose, the technical scheme adopted is as follows:
a recycling process of organosilicon slurry residue treatment wastewater comprises the following steps:
(1) The method comprises the steps that organic silicon slurry and slag treatment wastewater enters a flash tank 1, and after evaporation, a gas phase 1 is collected at the top of the flash tank 1;
(2) Feeding the rest liquid phase 1 into a flash tank 2, heating and evaporating by using the gas phase 1, and collecting the gas phase 2 at the top of the flash tank 2;
(3) Sending the residual liquid phase 2 into a flash tank 3, heating and evaporating the residual liquid phase 2 by using the gas phase 2, collecting the gas phase 3 at the top of the flash tank 3, and taking the residual liquid phase 3 as wastewater;
(4) And (3) sending the gas phase 3 to a concentration tower, heating the tower kettle, and concentrating to obtain high-concentration hydrochloric acid.
In the step (4), the heated gas phase 1 and the heated gas phase 2 are cooled and then sent to a concentration tower for concentration.
Still further, the gas phase 1 and the gas phase 2 enter from the top of the concentration tower after being cooled to room temperature.
Further, the evaporation temperature of each of the steps (1) - (3) is smaller than the evaporation temperature of the previous step.
Further, in the step (1), the evaporation temperature is 123+ -5deg.C, and the pressure is 100+ -5 kPag.
Further, in the step (2), the evaporation temperature is not lower than 100 ℃, and the pressure is 0+/-5 kPag.
Further, in the step (3), the evaporation temperature is not lower than 60 ℃, and the pressure is minus 90+/-5 kPag.
Further, in the step (4), the gas phase 3 enters from the middle part of the concentration tower;
the pressure of the concentration tower is minus 90+/-5 kPag, the temperature is 45-60 ℃, and the temperature of the tower top is 32-55 ℃.
Compared with the prior art, the invention has the beneficial effects that:
1. according to the technical scheme, through multi-effect evaporation and hydrochloric acid concentration, more than 95% of hydrogen chloride in the part of wastewater is recovered to prepare high-purity hydrochloric acid, such as more than 23% by weight of hydrochloric acid, and the part of high-purity hydrochloric acid can be directly used in other chemical process production.
2. According to the technical scheme, compared with the traditional evaporation, the energy consumption is reduced by 68% by using multi-effect evaporation, the cost of neutralization and evaporation treatment of wastewater generated by organosilicon slurry residue treatment is greatly reduced, and the hazardous waste is reduced by more than 90%, so that the method has considerable economical efficiency in an organosilicon monomer synthesis process.
3. The traditional hydrochloric acid multi-effect evaporation concentration needs to use a calcium chloride solution as an extracting agent, the consumption steam of each ton of hydrochloric acid in the three-effect evaporation section is about 0.33 ton which is the same as the consumption steam of the three-effect evaporation section in the process, the traditional hydrochloric acid multi-effect evaporation needs to be returned to concentrate the calcium chloride solution, the evaporation of additional water vapor is equal to the evaporation of additional steam, the additional consumption steam is 0.77 ton, and the consumption steam is 1.1 ton for each ton of hydrochloric acid generated by the traditional multi-effect evaporation concentration.
The multiple-effect evaporation section in the process consumes 0.33 ton of steam, the dehydration concentration tower consumes 0.23 ton of steam, the total consumption of steam is 0.56 ton, and the energy consumption is reduced by 49.5 percent compared with the traditional calcium chloride concentration hydrochloric acid method
Drawings
FIG. 1 is a process flow set-up diagram of the recovery process of the present invention; wherein 1 is a one-effect flash tank, 2 is a one-effect heater, 3 is a one-effect forced circulation pump, 4 is a two-effect flash tank, 5 is a two-effect heater, 6 is a two-effect forced circulation pump, 7 is a three-effect flash tank, 8 is a three-effect heater, 9 is a three-effect forced circulation pump, 10 is a dilute acid cooler, 11 is a top condenser of a concentration tower, 12 is a jet vacuum pump, 13 is a concentration tower, and 14 is a reboiler of the concentration tower; a is slurry residue wastewater feeding, B is low-hydrogen chloride wastewater discharging, C is waste acid water, and D is high-purity hydrochloric acid.
Detailed Description
In order to further illustrate a recovery process of wastewater from treatment of silicone slurry residue according to the present invention, to achieve the intended purpose of the present invention, the following description will provide a recovery process of wastewater from treatment of silicone slurry residue according to the present invention, and specific embodiments, structures, features and effects thereof, with reference to the preferred embodiments. In the following description, different "an embodiment" or "an embodiment" do not necessarily refer to the same embodiment. Furthermore, the particular features, structures, or characteristics of one or more embodiments may be combined in any suitable manner.
The following describes in further detail a process for recycling wastewater from the treatment of silicone slurry residue according to the present invention, in combination with specific examples:
the invention discloses a recovery process of wastewater from organosilicon slurry residue treatment, which is a process for preparing high-purity hydrochloric acid from organosilicon slurry residue wastewater, wherein in the process, wastewater containing 10wt% of hydrogen chloride and other impurities generated by organosilicon slurry residue treatment is initially purified by using a triple-effect evaporation process, and then enters a dehydration concentration tower for concentration, high-purity hydrochloric acid is generated for other chemical processes, and byproduct low-concentration waste acid water can be recycled to slurry residue treatment. The technical scheme of the invention is as follows:
a recycling process of organosilicon slurry residue treatment wastewater comprises the following steps:
(1) The method comprises the steps that organic silicon slurry and slag treatment wastewater enters a flash tank 1, and after evaporation, a gas phase 1 is collected at the top of the flash tank 1;
(2) Feeding the rest liquid phase 1 into a flash tank 2, heating and evaporating by using the gas phase 1, and collecting the gas phase 2 at the top of the flash tank 2;
(3) Sending the residual liquid phase 2 into a flash tank 3, heating and evaporating the residual liquid phase 2 by using the gas phase 2, collecting the gas phase 3 at the top of the flash tank 3, and taking the residual liquid phase 3 as wastewater;
(4) And (3) sending the gas phase 3 to a concentration tower, heating the tower kettle, and concentrating to obtain high-concentration hydrochloric acid.
Preferably, in the step (4), the gas phase 1 and the gas phase 2 after being heated are cooled and then sent to a concentration tower for concentration.
The three-effect evaporation separates the impurity salt, the non-volatile matters and the heavy components in the dilute acid (the impurity salt and the metal ions have high boiling point in the solution and cannot be evaporated), the three-effect evaporation evaporates most of water and hydrogen chloride to generate dilute acid and acid vapor, the dehydration concentration tower is used for removing excessive water to concentrate hydrochloric acid to more than 22wt% (the azeotropic point of the hydrochloric acid in a negative pressure state is more than 20 percent), water in the dilute acid can be rectified to the tower top in a negative pressure mode, the silane content in the system is extremely low, most of the heavy components are discharged from the three-effect residual liquid in the three-effect evaporation, and the low-molecular siloxane is synchronously taken away to the waste acid water at the tower top in the negative pressure state along with the water.
The cooled gas phase 1-2 and the gas phase 3 evaporated from the top of the three-effect flash tank directly enter a dehydration concentration tower for distillation and concentration, and the supercooled gas phase 1-2 can largely absorb most of hydrogen chloride in the concentration tower, so that the acid content of water gas discharged from the top of the tower is reduced to below 0.5%. And the concentrating tower does not need to reflux, so that the energy consumption of the process is far lower than that of the traditional hydrochloric acid concentrating process.
Further preferably, after the gas phase 1 and the gas phase 2 are cooled to room temperature, the gas enters from the top of the concentration tower, and 80% of energy in the triple effect can be recycled to the dehydration concentration tower.
Preferably, the evaporation temperature of each of the steps (1) - (3) is less than the evaporation temperature of the previous step.
Preferably, in the step (1), the evaporation temperature is 123+/-5 ℃ and the pressure is 100+/-5 kPag.
Preferably, in the step (2), the evaporation temperature is not lower than 100 ℃ and the pressure is 0+/-5 kPag.
Preferably, in the step (3), the evaporation temperature is not lower than 60 ℃, and the pressure is minus 90+/-5 kPag.
Preferably, in the step (4), the gas phase 3 enters from the middle part of the concentration tower;
the pressure of the concentration tower is minus 90+/-5 kPag, the temperature is 45-60 ℃, and the temperature of the tower top is 32-55 ℃.
The dehydration concentration tower controls the tower pressure to minus 90+/-5 kPag, the tower bottom temperature is controlled to be 45-60 ℃, the tower top temperature is controlled to be 32-55 ℃, the triple-effect evaporation gas is used as stripping gas to carry out heat and mass transfer with supercooled dilute acid fed from the tower top in a one-effect and two-effect manner through the rectification principle, the tower bottom reboiler additionally provides partial evaporation gas to ensure that the tower bottom acid concentration is more than 22wt%, and when the one-effect wastewater evaporation feeding acid concentration is less than 13wt%, the concentration of the acid at the tower top of the dehydration tower is less than 0.5wt%, the triple-effect evaporation gas directly enters the tower bottom to be used as evaporation gas, and meanwhile, the tower top does not need to reflux condensate to ensure that the energy consumption of the system is the lowest.
The organic silicon slurry residue treatment wastewater is wastewater obtained by extracting copper from organic silicon waste residue slurry, and is hydrolyzed by water, and internal silane is hydrolyzed to generate about 10wt% hydrochloric acid after the hydrolysis is completed, but the wastewater contains about 1wt% of salt impurities (sodium chloride, ferric chloride, copper chloride, zinc chloride and the like), and more than 95% of chloride ions in the wastewater are purified into hydrochloric acid by using the process, so that more than 90% of waste salt generated by the treatment of part of wastewater can be reduced.
Example 1.
With reference to fig. 1, the specific operation steps are as follows:
(1) The wastewater from the organosilicon slurry residue treatment enters a one-effect flash tank 1, and is forced to circulate by using a one-effect forced circulation pump 3 and a one-effect heater 2, and the one-effect heater 2 evaporates the wastewater in the one-effect flash tank 1 under the pressure of 100+ -5 kPag and heats the wastewater to 123 ℃.
The top of the one-effect flash tank 1 evaporates 123+/-5 ℃ and 8wt% of hydrogen chloride water vapor, namely gas phase 1.
(2) The liquid phase 1 left by the evaporation of the first-effect flash tank 1 is extracted to the second-effect flash tank 4 by the first-effect forced circulation pump 3, and then forced circulation is carried out by the second-effect forced circulation pump 6 and the second-effect heater 7.
The two-effect heater 5 heats the liquid phase 1 in the two-effect flash tank 4 by using the water vapor of 8wt% hydrogen chloride with the one-effect generation temperature of 123+/-5 ℃, namely the gas phase 1, and evaporates at the temperature of 0+/-5 kPag and 100 ℃.
The top of the two-effect flash tank 4 evaporates 9wt% hydrogen chloride water vapor, i.e., gas phase 2, at 100 ℃.
(3) The liquid phase 2 left by the evaporation of the two-effect flash tank 4 is extracted to the three-effect flash tank 7 through the two-effect forced circulation pump 6, and then forced circulation is carried out by using the three-effect forced circulation pump 9 and the three-effect heater 8.
The three-way heater 8 uses two-way generation of 100 ℃ 9wt% hydrogen chloride water vapor, i.e. the gas phase 2 heats the liquid phase 2 in the three-way flash tank 7, and evaporates at minus 90+ -5 kPag, 60 ℃.
The top of the three-effect flash tank 7 evaporates out hydrogen chloride water vapor of 12wt% at 60 ℃, i.e., the gas phase 3.
The liquid phase 3 left by evaporation in the three-effect flash tank 7 is extracted by the three-effect forced circulation pump 9 for the outward feeding treatment (the extraction amount is only 2-3 percent of the feeding amount).
(4) The gas phase 1 after the use of the two-effect heater 5 (105 ℃ C. And 8wt% hydrochloric acid in this case) and the gas phase 2 after the use of the three-effect heater 7 (60 ℃ C. And 9wt% hydrochloric acid in this case) are mixed and fed into the dilute acid cooler 10, and cooled to 25 ℃ C. To obtain 8.7wt% hydrochloric acid. Then enters from the top of the concentration tower 13 to carry out dehydration concentration.
The gas phase 3 enters the middle part of the concentrating tower 13 for dehydration concentration, and 80% of the energy in the triple effect can be recycled to the dehydration concentrating tower.
The concentration tower 13 is heated by a concentration tower reboiler 14, 23wt% of high-purity hydrochloric acid is extracted from the tower bottom and is sent outwards, water vapor containing 0.5wt% of hydrogen chloride is generated at the top of the tower, and enters a concentration tower top condenser 11 for condensation, so that acid wastewater containing 0.5wt% of hydrogen chloride is obtained.
The lower end of the tower top condenser 11 of the concentration tower is vacuumized to minus 90kPag by using a jet vacuum pump 12, and the generated acid wastewater containing 0.5 weight percent of hydrogen chloride can be recycled to the system before the organosilicon slurry slag treatment.
In the concentration process of the concentration tower, the dehydration concentration tower controls the tower pressure to minus 90+/-5 kPag, the tower kettle temperature to be 45-60 ℃ and the tower top temperature to be 32-55 ℃.
According to the technical scheme provided by the embodiment of the invention, the evaporation and purification section adopts a multi-effect evaporation process, 1.1 ton of steam is consumed for each ton of hydrochloric acid evaporation in the traditional evaporation process, the evaporation process evaporates hydrochloric acid with the feed quantity of more than 95%, only 0.33 ton of steam is consumed for each ton, and compared with the traditional process, the energy is saved by 70%.
In the technical scheme of the embodiment of the invention, a supercooled liquid feeding mode is used at the top of a dehydration concentration tower, and gas phase 1-2 generated in a two-effect one-effect heating process is cooled and then enters a dehydration tower to flow downwards for dehydration stripping; and the gas phase 3 evaporated from the top of the triple-effect flash tank directly enters the middle part of the dehydration concentration tower, and 80% of the energy in the triple-effect can be recycled to the dehydration concentration tower. Directly generating acid-containing water vapor below 0.5wt% after stripping.
The reflux ratio of the traditional dehydration concentration tower needs to be controlled to be 0.5-1, and 0.32-0.4 ton of steam needs to be consumed for rectifying every ton of hydrochloric acid entering the dehydration concentration tower. In the process, a supercooled liquid feeding mode is used at the top of the dehydration concentration tower, a rectifying section is not required to be arranged at the top of the tower, reflux is not required, steam consumption per ton of hydrochloric acid fed is 0.23-0.28 ton, and energy consumption is reduced by more than 32% compared with that of the traditional dehydration concentration process.
According to the technical scheme, more than 95% of components in the wastewater from the treatment of the organic silicon slurry residue can be separated, and 23wt% of hydrochloric acid and 0.5wt% of waste acid water are further separated, so that more than 95% of wastewater generated after the treatment of the organic silicon slurry residue and more than 90% of dangerous waste generated by the treatment of the slurry residue wastewater are reduced.
The foregoing description is only a preferred embodiment of the present invention, and is not intended to limit the embodiment of the present invention in any way, but any simple modification, equivalent variation and modification of the above embodiment according to the technical substance of the embodiment of the present invention still fall within the scope of the technical solution of the embodiment of the present invention.

Claims (3)

1. The recovery process of the organosilicon slurry residue treatment wastewater is characterized by comprising the following steps of:
(1) Introducing the organosilicon slurry residue treatment wastewater into a flash tank 1, evaporating at 123+/-5 ℃ and 100+/-5 kPag, and collecting a gas phase 1 at the top of the flash tank 1;
(2) Feeding the rest liquid phase 1 into a flash tank 2, heating and evaporating by using the gas phase 1, wherein the evaporating temperature is not lower than 100 ℃, the pressure is 0+/-5 kPag, and the gas phase 2 is collected at the top of the flash tank 2;
(3) Delivering the residual liquid phase 2 into a flash tank 3, heating and evaporating the residual liquid phase 2 by using the gas phase 2, wherein the evaporating temperature is not lower than 60 ℃, the pressure is minus 90+/-5 kPag, the top of the flash tank 3 is used for collecting the gas phase 3, and the residual liquid phase 3 is waste water;
and each of the evaporating temperatures in steps (1) - (3) is less than the evaporating temperature of the previous step;
(4) Sending the gas phase 3 to a concentration tower, heating a tower kettle, and concentrating to obtain high-concentration hydrochloric acid;
the gas phase 3 enters from the middle part of the concentration tower;
the pressure of the concentration tower is minus 90+/-5 kPag, the temperature is 45-60 ℃, and the temperature of the tower top is 32-55 ℃.
2. The recycling process according to claim 1, characterized in that,
in the step (4), the heated gas phase 1 and the heated gas phase 2 are cooled and then sent to a concentration tower for concentration.
3. The recycling process according to claim 2, characterized in that,
and the gas phase 1 and the gas phase 2 enter from the top of the concentration tower after being cooled to room temperature.
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CN214693739U (en) * 2021-04-21 2021-11-12 江苏泰特联合环保科技有限公司 A recovery processing device for steel product hydrochloric acid pickling waste liquid
CN114455544A (en) * 2022-03-07 2022-05-10 新疆西部合盛硅业有限公司 Low-energy-consumption hydrochloric acid resolving process
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