CN115167844A - Semiconductor equipment process flow control system and method - Google Patents
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Abstract
The invention provides a semiconductor equipment process flow control system and a method, wherein the system comprises: the workflow engine provides visual controls of all components in the semiconductor equipment; the workflow designer provides a graphical operation interface and is used for receiving a visualization control selected by a user and a parameter configuration instruction and/or an associated point location configuration instruction triggered by the selected visualization control; the process flow generator is used for filling the basic operation codes corresponding to the selected visual controls and converting the basic operation codes corresponding to the selected visual controls into process codes based on the connection relation among the selected visual controls; and the process main control unit is used for executing the flow codes and realizing the flow control of the semiconductor equipment. The invention realizes flexible configuration of the process flow, reduces debugging difficulty and error possibility, improves debugging efficiency and improves reusability of the control system.
Description
Technical Field
The invention relates to the technical field of semiconductors, in particular to a semiconductor equipment process flow control system and method.
Background
In semiconductor manufacturing, semiconductor devices typically include multiple components that play different roles in different process steps. In a debugging stage of a semiconductor device, in a series of process steps executed by the semiconductor device, each step is not strictly executed according to a fixed sequence, and time spent by each step is different to a certain extent, so that the process flow of the semiconductor device needs to be adjusted at any time according to the current performance effect and the production environment, and a high requirement is put forward on flexibility of process flow control.
At present, a control system of a semiconductor device usually encapsulates the overall control logic in a process flow in a hard coding manner, that is, the control codes of each process step involved in a set of process flows are strongly coupled, and each operation and related parameters inside a single process step are also strongly coupled. Therefore, the strong coupling mode is more suitable for the product scheme with fixed and mature business process. However, in the debugging stage of the semiconductor device, the process flow of the semiconductor device varies greatly, and the strong coupling method is relatively weak in flexibility, so that if the process flow needs to be adjusted, an implementer needs to edit and modify the code of the overall control logic, the technical threshold requirement of the implementer is too high, the requirements are difficult to meet in the production environment, the error possibility is high, and the semiconductor device is easily damaged. In addition, because the codes of the whole control logic are required to be edited and modified every time the process flow changes, the adjustment efficiency is low, the time cost in the debugging process is greatly increased, and the progress of putting the semiconductor equipment into actual production is slowed down.
Disclosure of Invention
The invention provides a semiconductor equipment process flow control system and method, which are used for overcoming the defects of poor flexibility, low debugging efficiency and high time cost of a process flow control method in the prior art.
The invention provides a semiconductor equipment process flow control system, comprising:
the workflow engine provides a visual control of each component in the semiconductor equipment, and a basic operation code, a parameter configuration unit and an associated point location configuration unit corresponding to the component are packaged in the visual control of the component;
the workflow designer is used for providing a graphical operation interface and receiving a visualization control selected by a user and a parameter configuration instruction and/or an associated point location configuration instruction triggered by the selected visualization control through the graphical operation interface;
the process flow generator is used for filling the basic operation codes corresponding to the selected visual controls based on the selected visual controls and the parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls, and converting the basic operation codes corresponding to the selected visual controls into process codes based on the connection relationship among the selected visual controls;
and the process main control unit is used for executing the flow codes and realizing the flow control of the semiconductor equipment.
According to the semiconductor equipment process flow control system provided by the invention, the workflow designer further comprises a flow check marking unit;
the process check marking unit is used for adding a starting condition check mark and/or an ending condition check mark to the basic operation code corresponding to the selected visual control based on the process operation executed by the selected visual control; the starting condition check mark is used for adding an interrupt before the basic operation code corresponding to the selected visual control starts to execute; and the end condition check mark is used for adding a check flow before the execution of the basic operation code corresponding to the selected visual control is finished.
According to the semiconductor equipment process flow control system provided by the invention, the process flow generator also comprises a flow check generating unit;
the flow check generating unit is configured to generate an opening condition check code and/or an ending condition check code based on the basic operation code corresponding to the selected visual control, and associate the opening condition check code with the opening condition check mark as an interrupt processing function corresponding to the opening condition check mark, and/or associate the ending condition check code with the ending condition check mark as a flow processing function corresponding to the ending condition check mark.
According to the semiconductor equipment process flow control system provided by the invention, based on the selected visual control and the associated point location configuration instruction triggered by the selected visual control, the basic operation code corresponding to the selected visual control is filled, and the method specifically comprises the following steps:
acquiring a condition judgment branch in a basic operation code corresponding to the selected visual control;
matching a first point location name contained in the conditional judgment branch with a second point location name contained in the associated point location configuration instruction based on the condition judgment branch;
and adding an assignment statement corresponding to the matched first point location name in the conditional judgment branch in the basic operation code corresponding to the selected visual control based on the configuration information of any second point location name contained in the associated point location configuration instruction.
According to the semiconductor equipment process flow control system provided by the invention, based on the selected visual control and the parameter configuration instruction triggered by the selected visual control, the basic operation code corresponding to the selected visual control is filled, and the method specifically comprises the following steps:
matching a first parameter name contained in a basic operation code corresponding to the selected visual control with a second parameter name contained in the parameter configuration instruction;
and adding a corresponding assignment statement for a first parameter name matched with any second parameter name in the basic operation code corresponding to the selected visual control based on the configuration information of any second parameter name contained in the parameter configuration instruction.
According to the semiconductor device process flow control system provided by the invention, the process main control unit is specifically configured to:
in the process of executing the flow codes, after each basic operation code is normally executed, the output result of the currently executed basic operation code is synchronized to a database.
According to the semiconductor device process flow control system provided by the invention, the process main control unit is further configured to:
in the process of executing the flow code, if the currently executed basic operation code is executed abnormally to cause program interruption, data rollback is carried out based on an output result of a previous basic operation code of the currently executed basic operation code stored in the database, and the influence of the currently executed basic operation code is eliminated.
According to the semiconductor device process flow control system provided by the invention, the workflow engine is specifically configured to:
determining components related to the current process type based on a standard process flow recorded in a process description file of the current process type;
and displaying the visual control of the component related to the current process type in a control panel.
According to the semiconductor equipment process flow control system provided by the invention, an electrical schematic diagram of a corresponding component is packaged in the visual control; and when the workflow designer receives a dragging event aiming at any visual control, acquiring an electrical schematic diagram in any visual control and displaying the electrical schematic diagram in a graphical operation interface of the workflow designer.
The invention also provides a semiconductor equipment process flow control method, which comprises the following steps:
displaying visual controls of all components in the semiconductor equipment in a control panel based on a workflow engine, wherein basic operation codes, parameter configuration units and associated point position configuration units corresponding to the components are packaged in the visual controls of the components;
displaying a graphical operation interface based on a workflow designer, and receiving a visual control selected by a user and a parameter configuration instruction and/or an associated point location configuration instruction triggered by the selected visual control through the graphical operation interface;
filling basic operation codes corresponding to the selected visual controls according to the selected visual controls and parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls based on a process flow generator, and converting the basic operation codes corresponding to the selected visual controls into process codes based on the connection relation between the selected visual controls;
and executing the flow codes based on a process main control unit to realize the flow control of the semiconductor equipment.
According to the semiconductor equipment process flow control system and method provided by the invention, the process flow is decomposed into a plurality of process operations corresponding to a plurality of components, so that an implementer can flexibly configure the process flow based on the plurality of process operations corresponding to the components, the process operation can be used as a basic unit for adjustment during debugging, the modification granularity is small, and the change of a software level is reduced as much as possible. In addition, the process operations of different components can be multiplexed in the process flows of various semiconductor devices, so that the reusability degree of the control system is obviously improved when the process flows of different devices are controlled. When debugging the process flow, the implementing personnel only need to modify the visual controls in the graphical operation interface, for example, add or delete the visual controls, modify the connecting lines between the visual controls, or use the parameter configuration instruction and/or the associated point location configuration instruction to perform corresponding configuration modification, and then automatically convert to obtain the debugged flow codes. The implementation personnel do not need to modify the bottom layer code manually, so that the debugging difficulty and the error possibility are reduced, and the debugging efficiency is improved.
Drawings
In order to more clearly illustrate the technical solutions of the present invention or the prior art, the drawings needed for the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and those skilled in the art can also obtain other drawings according to the drawings without creative efforts.
FIG. 1 is a schematic diagram of a process flow control system for a semiconductor device according to the present invention;
FIG. 2 is a schematic flow chart of a process flow control method for a semiconductor device according to the present invention;
FIG. 3 is a flow chart of a code filling method provided by the present invention;
FIG. 4 is a second flowchart of the code filling method provided by the present invention;
fig. 5 is a schematic structural diagram of an electronic device provided in the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings, and it is obvious that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without inventive step based on the embodiments of the present invention, are within the scope of protection of the present invention.
Fig. 1 is a schematic structural diagram of a process flow control system of a semiconductor device according to the present invention, as shown in fig. 1, the system includes: a workflow engine 110, a workflow designer 120, a process flow generator 130, and a process master control unit 140.
The workflow engine 110 provides a visual control of each component in the semiconductor device, and a basic operation code, a parameter configuration unit and an associated point location configuration unit corresponding to the component are encapsulated in the visual control of the component;
the workflow designer 120 provides a graphical operation interface, and is used for receiving a visualization control selected by a user and a parameter configuration instruction and/or an association point configuration instruction triggered by the selected visualization control through the graphical operation interface;
the process flow generator 130 is configured to fill the basic operation codes corresponding to the selected visual controls based on the selected visual controls and the parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls, and convert the basic operation codes corresponding to the selected visual controls into process codes based on the connection relationships between the selected visual controls;
the process main control unit 140 is configured to execute the process code to implement process control of the semiconductor device.
Specifically, in order to improve flexibility and reusability of process flow control of the semiconductor device, the embodiment of the invention performs customized processing based on the workflow operation engine, and performs secondary packaging on the bottom workflow framework. During secondary packaging, the standard process of the process type executed by the semiconductor equipment is decomposed in a fine-grained manner, and the process steps involved in the standard process are divided according to the components responsible for execution to obtain the sub-steps responsible for processing of each component. Here, in consideration of the complexity of the process flow, since a plurality of components may be cooperatively processed in a part of the process steps, even if the process flow is divided into sub-steps in which the respective components are responsible for processing, a plurality of components may be involved in a part of the sub-steps. In this regard, the sub-steps for which each component is responsible for processing may be decomposed again to obtain a plurality of independent process operations corresponding to the sub-steps for which each component is responsible. The execution objects of any process operation (i.e., the object responsible for executing the process operation, but not including other objects in the process operation that may need data communication) are limited to only a single component, such as heating, closing a valve, etc.
By decomposing the process flow into a plurality of process operations corresponding to a plurality of components, an implementer can flexibly configure the process flow based on the plurality of process operations corresponding to the components, and can adjust the process flow by taking the process operations as a basic unit during debugging, so that the modification granularity is small, and the change of a software level is reduced as much as possible. In addition, the process operations of different components can be multiplexed in the process flows of various semiconductor devices, so that the reusability degree of the control system is obviously improved when the process flows of different devices are controlled. Through a flexible configuration mode, all the process steps are packaged into a process flow chart form by software and are provided for maintenance personnel.
And after the decomposition is finished, packaging the basic operation codes of the process operation, the parameter configuration units of the process operation and the associated point location configuration units corresponding to the components into the visual control of the components. Because part of the process operation needs parameter configuration, such as heating time, heating temperature and the like, a corresponding parameter configuration unit is packaged for the process operation, so that an implementer can conveniently and quickly debug different parameters for each process operation. In addition, in some process operations, sensor data needs to be read to perform condition judgment to ensure that the process operations are performed normally, for example, a vacuum pump needs to pump the process chamber to a target vacuum degree during vacuum pumping, so that the reading of a pressure gauge needs to be read in real time to control the time of the vacuum pumping operation. Therefore, the corresponding associated point location configuration unit is packaged for each process operation, and the corresponding sensor point location is set for each process operation by implementing personnel, so that the data of the corresponding sensor can be correctly acquired when the corresponding process operation is executed.
After basic operation codes, parameter configuration units and associated point location configuration units of process operation are packaged to the visual controls, the visual controls corresponding to the components can be loaded by the workflow engine and displayed on the control panel, and an implementer can select the visual controls when configuring the process flow of the semiconductor equipment, so that the process flow can be debugged more intuitively and conveniently.
Besides a control panel provided by the workflow engine and comprising visual controls of all components, the workflow designer also provides a graphical operation interface under the same view. Through the graphical operation interface, an implementer can select a visual control in the control panel, drag the visual control to the graphical operation interface, and perform configuration operation on the selected visual control. For example, the implementer may double-click on the selected visualization control, and then display a corresponding configuration page for parameter configuration or associated point location configuration. After the user configuration is finished, the workflow designer can receive the visualization control selected by the user and the corresponding triggered parameter configuration instruction and/or associated point location configuration instruction. The parameter configuration instruction comprises parameter information configured by a user for the corresponding visual control, and the associated point location configuration instruction comprises configuration information of an associated sensor point location configured by the user.
Subsequently, the workflow designer may transmit the received visualization control selected by the user and the parameter configuration instruction and/or the associated point location configuration instruction triggered by the selected visualization control to the process flow generator. And the process flow generator fills the basic operation codes corresponding to the selected visual controls according to the selected visual controls and the parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls, and converts the filled basic operation codes corresponding to the selected visual controls into flow codes based on the connection relation between the selected visual controls. Specifically, the corresponding parameter or sensor point location in the corresponding basic operation code may be assigned based on the parameter configuration instruction and/or the associated point location configuration instruction. And then, determining the execution sequence of the basic operation codes corresponding to each visual control based on the connection relation of the selected visual controls on the graphical operation interface, converting the execution sequence into the process codes corresponding to the whole process flow, and storing the process codes to a preset file address. The format of the flow code may be determined according to the underlying platform of the control system, and may be an XML file, for example.
Therefore, when debugging the process flow, the implementing personnel only need to modify the visual controls in the graphical operation interface, for example, add or delete the visual controls, modify the connecting lines between the visual controls, or use the parameter configuration instruction and/or the associated point location configuration instruction to perform corresponding configuration modification, and then automatically convert to obtain the debugged flow code. The implementation personnel do not need to modify the bottom layer code manually, so that the debugging difficulty and the error possibility are reduced, and the debugging efficiency is improved.
When a user triggers a process flow execution instruction, the process main control unit can automatically read the flow code generated by the process flow generator and execute the code, so that the flow control of the semiconductor equipment is realized.
According to the system provided by the embodiment of the invention, the process flow is decomposed into the plurality of process operations corresponding to the plurality of components, so that an implementer can flexibly configure the process flow based on the plurality of process operations corresponding to the components, the process operation can be used as a basic unit for adjustment during debugging, the modification granularity is small, and the change of a software layer is reduced as much as possible. In addition, the process operations of different components can be multiplexed in the process flows of various semiconductor devices, so that the reusability degree of the control system is obviously improved when the process flows of different devices are controlled. When the process flow is debugged, the implementer only needs to modify the visual controls in the graphical operation interface, for example, add or delete the visual controls, modify the connecting lines between the visual controls, or perform corresponding configuration modification by using the parameter configuration instruction and/or the associated point location configuration instruction, and then the debugged flow code can be obtained through automatic conversion. The implementation personnel do not need to modify the bottom layer code manually, so that the debugging difficulty and the error possibility are reduced, and the debugging efficiency is improved.
Based on the above embodiment, the workflow designer further includes a flow check marking unit;
the process check marking unit is used for adding a starting condition check mark and/or an ending condition check mark to the basic operation code corresponding to the selected visual control based on the process operation executed by the selected visual control; the starting condition check mark is used for adding an interrupt before the basic operation code corresponding to the selected visual control starts to be executed; and the end condition check mark is used for adding a check flow before the execution of the basic operation code corresponding to the selected visual control is finished.
In particular, in a complex process flow of a semiconductor device, a number of process operations are performed with certain starting conditions and/or technical conditions. For example, the heating operation needs to be performed based on the evacuation operation having evacuated the interior of the process chamber to a target vacuum level, i.e., the heating operation is initiated when the interior of the process chamber reaches the target vacuum level; still taking the heating operation as an example, the heating operation aims at heating the inside of the process chamber to the target temperature, and therefore the operation should be ended when the temperature inside the process chamber reaches the target temperature, that is, the heating operation is ended under the condition that the temperature inside the process chamber reaches the target temperature.
In order to ensure the correct execution of the process flow so as to prevent the semiconductor device or the wafer from being damaged, a flow check mark unit in the workflow designer may be used to add an opening condition check mark and/or an ending condition check mark to the basic operation code corresponding to the selected visual control. The process operation executed by the visualization control can be determined whether a starting condition and/or an ending condition exists according to links of the process operation in the whole standard flow. If the process operation has a start condition and/or an end condition, a start condition check mark and/or an end condition check mark is added to the basic operation code.
Here, the opening condition check mark is used for adding an interrupt before the basic operation code corresponding to the selected visual control starts to execute; and the end condition check mark is used for adding a check flow before the execution of the basic operation code corresponding to the selected visual control is finished. Therefore, when the process main control unit executes the flow code, when the basic operation code corresponding to a certain visual control is executed, if the starting condition check mark is detected, the process main control unit enters an interrupt processing flow, checks the starting condition of the basic operation code, and can start to execute the basic operation code after the checking is passed. If it is detected that any basic operation code has an end condition, an end condition check flow may be added to a partial time node in the execution process of the basic operation code, and the execution of the current basic operation code may be ended after the check is passed. It should be noted that the checking of the start condition will enter the interrupt flow, and the corresponding basic operation code will not be executed when the checking fails, but the checking of the end condition will not stop the execution of the current basic operation code.
Based on any of the above embodiments, the process flow generator further comprises a flow check generating unit;
the process check generating unit is configured to generate a start condition check code and/or an end condition check code based on a basic operation code corresponding to the selected visual control, and associate the start condition check code with the start condition check mark as an interrupt processing function corresponding to the start condition check mark, and/or associate the end condition check code with the end condition check mark as a process processing function corresponding to the end condition check mark.
Specifically, in order to respond to the opening condition check mark and/or the end condition check mark, the process check generating unit in the process flow generator generates a corresponding opening condition check code and/or end condition check code according to the check mark in the basic operation code corresponding to the selected visual control. And then, the opening condition check code is associated to the opening condition check mark to be used as an interrupt processing function corresponding to the opening condition check mark so as to check the starting condition, and/or the ending condition check code is associated to the ending condition check mark to be used as a flow processing function corresponding to the ending condition check mark so as to check the ending condition.
Based on any of the above embodiments, based on the selected visualization control and the associated point location configuration instruction triggered by the selected visualization control, filling the basic operation code corresponding to the selected visualization control specifically includes:
acquiring a condition judgment branch in a basic operation code corresponding to the selected visual control;
matching a first point location name contained in the conditional judgment branch with a second point location name contained in the associated point location configuration instruction based on the condition judgment branch;
and adding an assignment statement corresponding to the matched first point location name in the conditional judgment branch in the basic operation code corresponding to the selected visual control based on the configuration information of any second point location name contained in the associated point location configuration instruction.
Specifically, if a user triggers a related point location configuration instruction, a basic operation code corresponding to a visual control related to the instruction is obtained, and a conditional judgment branch in the basic operation code, such as an if else branch, a switch branch, a while branch, etc., is obtained. And acquiring a first point name contained in the conditional judgment branch and a second point name contained in the associated point configuration instruction, and performing field matching on the first point name and the second point name. Wherein the first point name and the second point name are names of the sensor points. Here, the first point name and the second point name that are matched point to the same sensor point, and the first point name and the second point name may be completely the same, or may have the same prefix and suffix.
Based on the configuration information of any second point location name contained in the associated point location configuration instruction, adding an assignment statement corresponding to the first point location name matched in the conditional judgment branch in the basic operation code corresponding to the visual control associated with the instruction, and realizing the transmission and setting of the sensor point location configuration information. When the process main control unit executes the corresponding basic operation code, the corresponding sensor data can be automatically obtained according to the sensor point position configured by the associated point position configuration instruction through the assignment statement.
Based on any of the above embodiments, based on the selected visualization control and the parameter configuration instruction triggered by the selected visualization control, filling the basic operation code corresponding to the selected visualization control specifically includes:
matching a first parameter name contained in a basic operation code corresponding to the selected visual control with a second parameter name contained in the parameter configuration instruction;
and adding a corresponding assignment statement for a first parameter name matched with any second parameter name in the basic operation code corresponding to the selected visual control based on the configuration information of any second parameter name contained in the parameter configuration instruction.
Specifically, a first parameter name included in a basic operation code corresponding to the selected visual control and a second parameter name included in a corresponding parameter configuration instruction are obtained, and field matching is performed on the first parameter name and the second parameter name. The first parameter name and the second parameter name are names of configuration parameters, such as heating time, valve opening angle, and the like. Here, the first parameter name and the second parameter name that are matched point to the same configuration parameter, and the first parameter name and the second parameter name may be completely the same, or may have the same prefix and suffix, which is not specifically limited in the embodiment of the present invention.
And adding a corresponding assignment statement for the first parameter name matched with the second parameter name in the basic operation code corresponding to the selected visual control based on the configuration information of any second parameter name contained in the parameter configuration instruction, so as to realize the transmission and setting of the parameter configuration information. When the process main control unit executes the corresponding basic operation code, the execution of the corresponding basic operation code can be automatically controlled according to the parameter value configured by the parameter configuration instruction through the assignment statement.
Based on any of the embodiments, the process master control unit is specifically configured to:
in the process of executing the flow codes, after each basic operation code is normally executed, the output result of the currently executed basic operation code is synchronized to the database.
Specifically, the process main control unit records process data in the execution process in real time in the process of executing the flow codes of the whole process flow, and once an abnormality occurs in the execution process, backtracking can be performed according to the recorded process data to locate the specific code segment with the abnormality. After each basic operation code is normally executed, the output result of the currently executed basic operation code can be synchronized to the database. If the execution process is abnormal, backtracking can be performed according to the data in the database, and in addition, data rollback can be performed according to the output result of the basic operation code executed in the last step recorded in the database, so that the program is rolled back to the previous normal state.
Based on any of the above embodiments, the process master control unit is further configured to:
in the process of executing the flow code, if the currently executed basic operation code is executed abnormally to cause program interruption, data rollback is carried out based on an output result of a previous basic operation code of the currently executed basic operation code stored in the database, and the influence of the currently executed basic operation code is eliminated.
Specifically, if, in the process of executing the flow code, the currently executed basic operation code is executed abnormally to cause program interruption, the output result of the previous basic operation code of the currently executed basic operation code stored in the database may be obtained, and data rollback is performed based on the output result, so as to rollback the program to the previous normal state, and eliminate the influence of the currently executed basic operation code, thereby avoiding dirty data in the database.
Based on any of the embodiments above, the workflow engine is specifically configured to:
determining components related to the current process type based on a standard process flow recorded in a process description file of the current process type;
and displaying the visual control of the component related to the current process type in a control panel.
Specifically, in order to improve reusability of the control system and enable the control system to be suitable for various semiconductor devices, a process flow is decomposed into a plurality of process operations corresponding to a plurality of components in the control system, and a basic operation code, a parameter configuration unit and an associated point location configuration unit corresponding to each process operation are packaged into a visual control, so that the visual control corresponding to the process operations of different components can be reused in the process flows of various semiconductor devices.
Here, for the semiconductor device in the current application scenario, the standard process flow of the process type may be read from the process description file of the process type corresponding to the semiconductor device, and the component related to the current process type may be determined according to the standard process flow. And then, the visual control of the component related to the current process type can be displayed in the control panel for the implementation personnel to select.
Based on any one of the embodiments, the visual control is packaged with an electrical schematic diagram of a corresponding component; and when the workflow designer receives a dragging event aiming at any visual control, acquiring an electrical schematic diagram in any visual control and displaying the electrical schematic diagram in a graphical operation interface of the workflow designer.
Specifically, the visual control of each component is further packaged with an electrical schematic diagram of the corresponding component, so that a more visual effect is provided. After the workflow designer receives a dragging event of a user for any visual control (namely, the user drags any visual control to the graphical operation interface from the control panel), an electrical schematic diagram in the visual control can be obtained and displayed in the graphical operation interface of the workflow designer.
The semiconductor device process flow control method provided by the present invention is described below, and the semiconductor device process flow control method described below and the semiconductor device process flow control apparatus described above may be referred to in correspondence with each other.
Based on any of the above embodiments, fig. 2 is a schematic flow chart of a semiconductor device process flow control method provided by the present invention, and as shown in fig. 2, the method includes:
and step 240, executing the flow code based on a process main control unit to realize flow control of the semiconductor equipment.
According to the method provided by the embodiment of the invention, the process flow is decomposed into the plurality of process operations corresponding to the plurality of components, so that an implementer can flexibly configure the process flow based on the plurality of process operations corresponding to the components, the process operation can be used as a basic unit for adjustment during debugging, the modification granularity is small, and the change of a software layer is reduced as much as possible. In addition, the process operations of different components can be multiplexed in the process flows of various semiconductor devices, so that the reusability degree of the control system is obviously improved when the process flows of different devices are controlled. When debugging the process flow, the implementing personnel only need to modify the visual controls in the graphical operation interface, for example, add or delete the visual controls, modify the connecting lines between the visual controls, or use the parameter configuration instruction and/or the associated point location configuration instruction to perform corresponding configuration modification, and then automatically convert to obtain the debugged flow codes. The implementation personnel do not need to modify the bottom layer code manually, so that the debugging difficulty and the error possibility are reduced, and the debugging efficiency is improved.
Based on any of the above embodiments, the method further comprises:
adding a starting condition check mark and/or an ending condition check mark to a basic operation code corresponding to the selected visual control according to the process operation executed by the selected visual control based on a flow check mark unit in the workflow designer; the starting condition check mark is used for adding an interrupt before the basic operation code corresponding to the selected visual control starts to be executed; and the end condition check mark is used for adding a check flow before the execution of the basic operation code corresponding to the selected visual control is finished.
Based on any of the above embodiments, the method further comprises:
and generating a starting condition check code and/or an ending condition check code based on a process check generating unit in the process flow generator according to the basic operation code corresponding to the selected visual control, and associating the starting condition check code to the starting condition check mark as an interrupt processing function corresponding to the starting condition check mark, and/or associating the ending condition check code to the ending condition check mark as a process processing function corresponding to the ending condition check mark.
Based on any of the above embodiments, as shown in fig. 3, based on the selected visualization control and the associated point location configuration instruction triggered by the selected visualization control, filling the basic operation code corresponding to the selected visualization control specifically includes:
310, acquiring a condition judgment branch in a basic operation code corresponding to the selected visual control;
Based on any of the above embodiments, as shown in fig. 4, based on the selected visualization control and the parameter configuration instruction triggered by the selected visualization control, filling the basic operation code corresponding to the selected visualization control specifically includes:
step 410, matching a first parameter name contained in a basic operation code corresponding to the selected visualization control with a second parameter name contained in the parameter configuration instruction;
Based on any of the above embodiments, the executing the flow code specifically includes:
in the process of executing the flow codes, after each basic operation code is normally executed, the output result of the currently executed basic operation code is synchronized to the database.
Based on any of the above embodiments, the executing the flow code further includes:
in the process of executing the flow code, if the currently executed basic operation code is executed abnormally to cause program interruption, data rollback is carried out based on an output result of a previous basic operation code of the currently executed basic operation code stored in the database, and the influence of the currently executed basic operation code is eliminated.
Based on any one of the above embodiments, the displaying of the visual control of each component in the semiconductor device in the control panel specifically includes:
determining components related to the current process type based on a standard process flow recorded in a process description file of the current process type;
and displaying the visual control of the component related to the current process type in a control panel.
Based on any one of the embodiments, the visual control is packaged with an electrical schematic diagram of a corresponding component; and when the workflow designer receives a dragging event aiming at any visual control, acquiring an electrical schematic diagram in any visual control and displaying the electrical schematic diagram in a graphical operation interface of the workflow designer.
Fig. 5 is a schematic structural diagram of an electronic device provided in the present invention, and as shown in fig. 5, the electronic device may include: a processor (processor) 510, a memory (memory) 520, a communication Interface (Communications Interface) 530, and a communication bus 540, wherein the processor 510, the memory 520, and the communication Interface 530 communicate with each other via the communication bus 540. The processor 510 may invoke logic instructions in the memory 520 to perform a semiconductor device process flow control method comprising: displaying visual controls of all components in the semiconductor equipment in a control panel based on a workflow engine, wherein basic operation codes, parameter configuration units and associated point position configuration units corresponding to the components are packaged in the visual controls of the components; displaying a graphical operation interface based on a workflow designer, and receiving a visual control selected by a user and a parameter configuration instruction and/or an associated point location configuration instruction triggered by the selected visual control through the graphical operation interface; filling basic operation codes corresponding to the selected visual controls according to the selected visual controls and parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls based on a process flow generator, and converting the basic operation codes corresponding to the selected visual controls into process codes based on the connection relation between the selected visual controls; and executing the flow codes based on a process main control unit to realize the flow control of the semiconductor equipment.
In addition, the logic instructions in the memory 520 may be implemented in software functional units and stored in a computer readable storage medium when the logic instructions are sold or used as a stand-alone product. Based on such understanding, the technical solution of the present invention may be embodied in the form of a software product, which is stored in a storage medium and includes instructions for causing a computer device (which may be a personal computer, a server, or a network device) to execute all or part of the steps of the method according to the embodiments of the present invention. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk, or an optical disk, and various media capable of storing program codes.
In another aspect, the present invention also provides a computer program product comprising a computer program stored on a non-transitory computer readable storage medium, the computer program comprising program instructions, which when executed by a computer, enable the computer to execute the semiconductor device process flow control method provided by the above methods, the method comprising: displaying visual controls of all components in the semiconductor equipment in a control panel based on a workflow engine, wherein basic operation codes, parameter configuration units and associated point location configuration units corresponding to the components are packaged in the visual controls of the components; displaying a graphical operation interface based on a workflow designer, and receiving a visual control selected by a user and a parameter configuration instruction and/or an associated point location configuration instruction triggered by the selected visual control through the graphical operation interface; filling basic operation codes corresponding to the selected visual controls according to the selected visual controls and parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls based on a process flow generator, and converting the basic operation codes corresponding to the selected visual controls into process codes based on the connection relation between the selected visual controls; and executing the flow codes based on a process main control unit to realize the flow control of the semiconductor equipment.
In still another aspect, the present invention also provides a non-transitory computer readable storage medium, on which a computer program is stored, the computer program being implemented by a processor to perform the semiconductor device process flow control method provided by the above aspects, the method comprising: displaying visual controls of all components in the semiconductor equipment in a control panel based on a workflow engine, wherein basic operation codes, parameter configuration units and associated point position configuration units corresponding to the components are packaged in the visual controls of the components; displaying a graphical operation interface based on a workflow designer, and receiving a visual control selected by a user and a parameter configuration instruction and/or an associated point location configuration instruction triggered by the selected visual control through the graphical operation interface; filling basic operation codes corresponding to the selected visual controls according to the selected visual controls and parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls based on a process flow generator, and converting the basic operation codes corresponding to the selected visual controls into process codes based on the connection relation between the selected visual controls; and executing the flow codes based on a process main control unit to realize the flow control of the semiconductor equipment.
The above-described embodiments of the apparatus are merely illustrative, and the units described as separate parts may or may not be physically separate, and parts displayed as units may or may not be physical units, may be located in one position, or may be distributed on multiple network units. Some or all of the modules may be selected according to actual needs to achieve the purpose of the solution of the present embodiment. One of ordinary skill in the art can understand and implement it without inventive effort.
Through the above description of the embodiments, those skilled in the art will clearly understand that each embodiment can be implemented by software plus a necessary general hardware platform, and certainly can also be implemented by hardware. With this understanding in mind, the above-described technical solutions may be embodied in the form of a software product, which can be stored in a computer-readable storage medium such as ROM/RAM, magnetic disk, optical disk, etc., and includes instructions for causing a computer device (which may be a personal computer, a server, or a network device, etc.) to execute the methods described in the embodiments or some parts of the embodiments.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (10)
1. A semiconductor device process flow control system, comprising:
the workflow engine provides a visual control of each component in the semiconductor equipment, and a basic operation code, a parameter configuration unit and an associated point location configuration unit corresponding to the component are packaged in the visual control of the component;
the workflow designer provides a graphical operation interface, and is used for receiving a visual control selected by a user and a parameter configuration instruction and/or an associated point position configuration instruction triggered by the selected visual control through the graphical operation interface;
the process flow generator is used for filling the basic operation codes corresponding to the selected visual controls based on the selected visual controls and the parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls, and converting the basic operation codes corresponding to the selected visual controls into process codes based on the connection relationship among the selected visual controls;
and the process main control unit is used for executing the flow codes and realizing the flow control of the semiconductor equipment.
2. The semiconductor device process flow control system of claim 1, further comprising a flow check flag unit in the workflow designer;
the process check marking unit is used for adding a starting condition check mark and/or an ending condition check mark to the basic operation code corresponding to the selected visual control based on the process operation executed by the selected visual control; the starting condition check mark is used for adding an interrupt before the basic operation code corresponding to the selected visual control starts to be executed; and the end condition check mark is used for adding a check flow before the execution of the basic operation code corresponding to the selected visual control is finished.
3. The semiconductor device process flow control system according to claim 2, further comprising a flow check generating unit in the process flow generator;
the process check generating unit is configured to generate a start condition check code and/or an end condition check code based on a basic operation code corresponding to the selected visual control, and associate the start condition check code with the start condition check mark as an interrupt processing function corresponding to the start condition check mark, and/or associate the end condition check code with the end condition check mark as a process processing function corresponding to the end condition check mark.
4. The semiconductor device process flow control system according to claim 1, wherein based on the selected visual control and the associated point location configuration instruction triggered by the selected visual control, filling a basic operation code corresponding to the selected visual control specifically includes:
acquiring a condition judgment branch in a basic operation code corresponding to the selected visual control;
matching a first point location name contained in the conditional judgment branch with a second point location name contained in the associated point location configuration instruction based on the condition judgment branch;
and adding an assignment statement corresponding to the matched first point name in the conditional judgment branch in a basic operation code corresponding to the selected visual control based on the configuration information of any second point name contained in the associated point configuration instruction.
5. The semiconductor device process flow control system according to claim 4, wherein the filling of the basic operation code corresponding to the selected visual control based on the selected visual control and the parameter configuration instruction triggered by the selected visual control specifically includes:
matching a first parameter name contained in a basic operation code corresponding to the selected visual control with a second parameter name contained in the parameter configuration instruction;
and adding a corresponding assignment statement for a first parameter name matched with any second parameter name in the basic operation code corresponding to the selected visual control based on the configuration information of any second parameter name contained in the parameter configuration instruction.
6. The semiconductor device process flow control system of claim 1, wherein the process master control unit is specifically configured to:
in the process of executing the flow codes, after each basic operation code is normally executed, the output result of the currently executed basic operation code is synchronized to the database.
7. The semiconductor device process flow control system of claim 6, wherein the process master control unit is further configured to:
in the process of executing the flow code, if the currently executed basic operation code is executed abnormally to cause program interruption, data rollback is carried out based on an output result of a previous basic operation code of the currently executed basic operation code stored in the database, and the influence of the currently executed basic operation code is eliminated.
8. The semiconductor device process flow control system of claim 1, wherein the workflow engine is specifically configured to:
determining components related to the current process type based on a standard process flow recorded in a process description file of the current process type;
and displaying the visual control of the component related to the current process type in a control panel.
9. The semiconductor equipment process flow control system of claim 8, wherein an electrical schematic diagram of corresponding components is encapsulated in the visual control; and when the workflow designer receives a dragging event aiming at any visual control, acquiring an electrical schematic diagram in any visual control and displaying the electrical schematic diagram in a graphical operation interface of the workflow designer.
10. A method for controlling a process flow of a semiconductor device, comprising:
displaying visual controls of all components in the semiconductor equipment in a control panel based on a workflow engine, wherein basic operation codes, parameter configuration units and associated point location configuration units corresponding to the components are packaged in the visual controls of the components;
displaying a graphical operation interface based on a workflow designer, and receiving a visual control selected by a user and a parameter configuration instruction and/or an associated point location configuration instruction triggered by the selected visual control through the graphical operation interface;
filling basic operation codes corresponding to the selected visual controls according to the selected visual controls and parameter configuration instructions and/or associated point location configuration instructions triggered by the selected visual controls based on a process flow generator, and converting the basic operation codes corresponding to the selected visual controls into process codes based on the connection relation between the selected visual controls;
and executing the flow codes based on a process main control unit to realize the flow control of the semiconductor equipment.
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| CN113076155A (en) * | 2020-01-03 | 2021-07-06 | 阿里巴巴集团控股有限公司 | Data processing method and device, electronic equipment and computer storage medium |
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| WO2021217661A1 (en) * | 2020-04-30 | 2021-11-04 | 深圳中砼物联网科技有限公司 | Method and platform for implementing graphical code-free software development, computer device and storage medium |
| CN113886362A (en) * | 2021-10-10 | 2022-01-04 | 浙江力石科技股份有限公司 | Data storage system and storage method based on workflow engine and low-code platform |
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| CN113076155A (en) * | 2020-01-03 | 2021-07-06 | 阿里巴巴集团控股有限公司 | Data processing method and device, electronic equipment and computer storage medium |
| WO2021217661A1 (en) * | 2020-04-30 | 2021-11-04 | 深圳中砼物联网科技有限公司 | Method and platform for implementing graphical code-free software development, computer device and storage medium |
| CN113094037A (en) * | 2021-04-20 | 2021-07-09 | 上海携宁计算机科技股份有限公司 | Interaction method, development platform, equipment and storage medium for forms and workflows |
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