CN115139208A - Surface treatment method for finished target - Google Patents
Surface treatment method for finished target Download PDFInfo
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- CN115139208A CN115139208A CN202210883378.5A CN202210883378A CN115139208A CN 115139208 A CN115139208 A CN 115139208A CN 202210883378 A CN202210883378 A CN 202210883378A CN 115139208 A CN115139208 A CN 115139208A
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- target
- polishing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
A surface treatment method for finished target materials relates to the technical field of alloy target materials; comprising a polishing step comprising: (1) Performing surface treatment on the surface of the target by flocking to obtain a rough machining target; (2) And polishing the rough-processed target material by adopting a plurality of pieces of sand paper with sequentially reduced fineness, and continuously adding polishing cooling liquid in the polishing process to obtain the polished target material with uniform metal luster. The invention adopts a physical polishing method to reduce the pollution to the environment; the abrasive paper which gradually decreases from coarse to fine is adopted to polish the target material, so that the surface of the target material is smooth, the light scattering is reduced, the target material with surface defects can be repaired, the material utilization rate is improved, and the cost is reduced; in the polishing process, the mode of adding cooling liquid reduces the surface oxidation and blackening, obtains the target with good surface finish, simultaneously can keep higher polishing rotation speed, and improves the repair speed of the scratches of the finished target.
Description
Technical Field
The invention belongs to the technical field of alloy targets, and particularly relates to a surface treatment method for a finished target.
Background
The coating target material is a sputtering source which forms various functional films on a substrate by sputtering through a magnetron sputtering, multi-arc ion plating or other types of coating systems under proper process conditions, and is an important material for manufacturing semiconductor electronic devices.
In the prior art, methods for polishing the surface of a target mainly include mechanical methods, electrochemical methods and chemical methods. Electrochemical polishing has limited use due to the requirements placed on the shape and size of the part. The chemical polishing method mainly adopts acidic chemical polishing solution, and the acidic chemical polishing solution has the advantages that: the polishing effect is good, and the surface of the polished part is bright and flat; however, the acidic chemical polishing solution can generate a large amount of NOx gas in the polishing process, and the environmental pollution is serious; and the pickling process is not well controlled, and the phenomenon of excessive pickling is easy to occur.
At present, the target is clamped by clamps mostly during mechanical polishing processing, and is inconvenient to disassemble and fix, so that the polishing processing efficiency of the target is reduced; particularly large-size alloy workpieces, the customized fixture is extremely high in cost, and the target workpieces are very easy to oxidize and blacken on the surface due to the action of heat generated by friction of the polishing wheel rotating on the surface of the target at high speed in the polishing process, so that the attractiveness of products is affected, and the defective rate of the target can be increased. Therefore, a simple polishing method for the alloy target material, which has less environmental pollution and effectively avoids the surface from being oxidized and blackened, is urgently needed to solve the problems.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide a surface treatment method for a finished target, which is simple to operate, has little pollution to the environment and effectively avoids the problem that the polished surface is oxidized and blackened.
The purpose of the invention is realized by adopting the following technical scheme:
a surface treatment method for a finished target material comprises a polishing step, wherein the polishing step comprises the following steps:
(1) Performing surface treatment on the surface of the target by flocking to obtain a rough machining target;
(2) And polishing the rough-processed target material by adopting a plurality of pieces of sand paper with sequentially reduced fineness, and continuously adding polishing cooling liquid in the polishing process to obtain the polished target material with uniform metal luster.
Further, in the step (1), the fineness of the flocking is 200-600 meshes.
Further, in the step (1), circular flocking of 200-240 meshes, 350-450 meshes and 550-600 meshes is adopted in sequence to carry out surface treatment on the surface of the target.
Further, in the step (2), the rough-processed target material is polished by sequentially adopting 800-1200 meshes of sand paper, 1800-2200 meshes of sand paper and 2500-5000 meshes of sand paper.
Further, in the step (2), the rough machining target material is polished by sequentially adopting 800-1200 meshes, 1800-2200 meshes, 2800-3500 meshes, 4500-5500 meshes and 6500-7500 meshes of sand paper.
Further, the surface roughness of the polishing target material is 0.05-0.8 μm.
Further, the cooling liquid is a mixture of 1:7-15 of coolant and water.
Further, the method comprises the following steps:
s1, wiping the surface of a target material to be treated, covering the qualified surface of the target material by using a protective adhesive tape, and enabling the defect surface of the target material to be upward;
s2, wiping the defect surface in the step S1, and measuring the roughness of the defect surface of the target material;
s3, placing the target on a dust removal workbench, removing dust, and then processing according to the polishing step to obtain a polished target;
and S4, cleaning the surface of the polishing target material, and drying to obtain a finished product.
Further, wiping clean by isopropanol in the steps S1 and S2; and S4, cleaning the residues on the surface of the polished target material by using isopropanol.
Further, the polishing step is carried out by using a pneumatic polishing machine, and the peripheral speed of polishing is 20-50m/s.
Compared with the prior art, the invention has the beneficial effects that:
the invention relates to a surface treatment method for a finished target, which adopts a physical polishing method to reduce the pollution to the environment; the abrasive paper which gradually decreases from coarse to fine is adopted to polish the target material, so that the surface of the target material is smooth, the light scattering is reduced, the target material with surface defects can be repaired, the material utilization rate is improved, and the cost is reduced; in the polishing process, the surface oxidation and blackening are reduced by adding cooling liquid, the target with good surface finish is obtained, meanwhile, the higher polishing rotating speed can be kept, and the repair speed of scratches of the finished target is improved; in addition, the surface treatment method of the invention does not need to customize a clamp, thereby greatly reducing the treatment cost, and particularly repairing the surface fracture of the large-size target (with the diameter of 300-600 mm), having good repairing effect and high repairing speed, thereby obtaining the target with exquisite appearance and improving the yield of products.
Drawings
Fig. 1 is a schematic view of a target surface treated with 1000# sandpaper in a surface treatment method for a finished target according to the present invention.
Fig. 2 is a schematic diagram of a target surface treated with # 2000 sandpaper in the method for treating a finished target surface according to the present invention.
Fig. 3 is a comparison of the target surface with 3000# sandpaper in the surface treatment method for the finished target according to the present invention.
Fig. 4 is a schematic surface view of a target treated with # 5000 abrasive paper in the method for surface treatment of a finished target according to the present invention.
FIG. 5 is a schematic representation of a target surface treated with 7000# sandpaper according to one embodiment of the present invention.
Detailed Description
The present invention is further described below with reference to specific embodiments, and it should be noted that, without conflict, any combination between the embodiments or technical features described below may form a new embodiment.
Example 1
A surface treatment method for a finished target comprises the following steps:
s1, placing a target material to be treated (with the diameter of 600 mm) on a pearl cotton pad (with the diameter of 650 mm), wiping the surface of the target material clean with isopropanol, covering a qualified surface of the target material with a protective tape to protect the qualified surface of the target material, and enabling a defect surface of the target material to face upwards;
s2, wiping the defect surface in the step S1 with isopropanol, measuring the surface roughness of the target by using a roughness meter, and determining the roughness range value required by the surface of the target according to the product requirement; the embodiment requires that the surface roughness Ra value of the sputtering target is not more than 1.6 μm, and the local Ra value is not more than 0.8 μm;
s3, preparing 1000ml of cooling liquid, wherein the volume ratio of the cooling liquid is as follows: pure water =1:10; the coolant is O/W type emulsion.
S4, placing the target on a dust removal workbench, removing dust, and then processing according to the polishing step by adopting a handheld pneumatic polishing machine to obtain a polished target;
wherein the polishing step comprises:
(1) Sequentially adopting 220#, 400# and 600# circular flocking scouring pads to perform surface treatment on the surface of the target material, so that the surface is smooth and has no obvious scratches, gouges and scratches, and a rough machining target material is obtained;
(2) Polishing the rough machining target material by using 1000#, 2000#, 3000#, 5000#, and 7000# disc abrasive paper sheets in sequence, wherein the peripheral speed of polishing is 30m/s, and polishing cooling liquid is continuously added in the polishing process to obtain a polishing target material with uniform metal luster;
s4, cleaning the residual dirt on the surface of the polishing target material by using isopropanol, and drying by using dry compressed air to obtain a finished product.
The invention reduces the roughness of the surface of the target material through the action of mechanical polishing so as to obtain a processing method of bright and flat surface; mechanical polishing is a finishing process of a workpiece surface using a polishing tool and abrasive grains, and polishing does not improve the dimensional accuracy or geometric accuracy of the workpiece but aims to obtain a smooth surface or a mirror surface gloss. During polishing, a polishing wheel rotating at a high speed is pressed to a workpiece by using a handheld pneumatic polishing machine, so that the abrasive material rolls and cuts the surface of the workpiece in a micro-scale manner, and a bright processed surface is obtained, wherein the surface roughness of the embodiment reaches the requirement of 0.8-0.3 mu m; since the larger the value of the metal surface roughness Ra, the rougher the metal surface, and the larger the scattering of light, that is, the larger the degree to which light is dispersed after contacting the metal surface, the darker the color of the metal, the smaller the value of the target surface roughness Ra is made by sequentially switching the polishing sandpaper of fine abrasive grains during polishing, thereby improving the target surface glossiness.
In addition, the target material is easy to oxidize and blacken under a certain temperature condition because the polishing wheel rotates on the surface of the target material at a high speed to generate heat in the polishing process.
Example 2
A surface treatment method for a finished target comprises the following steps:
s1, placing a target material to be treated (with the diameter of 600 mm) on a pearl cotton pad (with the diameter of 650 mm), wiping the surface of the target material clean with isopropanol, covering a qualified surface of the target material with a protective tape to protect the qualified surface of the target material, and enabling a defect surface of the target material to face upwards;
s2, wiping the defect surface in the step S1 with isopropanol, measuring the surface roughness of the target by using a roughness meter, and determining the roughness range value required by the surface of the target according to the product requirement; the embodiment requires that the surface roughness Ra value of the sputtering target is not more than 1.6 μm, and the local Ra value is not more than 0.8 μm;
s3, preparing 1000ml of cooling liquid, wherein the volume ratio of the cooling liquid is as follows: pure water =1:10;
s4, placing the target on a dust removal workbench, removing dust, and then processing according to the polishing step by adopting a handheld pneumatic polishing machine to obtain a polished target;
wherein the polishing step comprises:
(1) Sequentially adopting 220#, 400# and 600# circular flocking scouring cloths to perform surface treatment on the surface of the target material, so that the surface is smooth and has no obvious scratches, knocks and scratches, and a rough machining target material is obtained;
(2) Polishing the rough machining target material by using 1000#, 2000#, 3000# disc abrasive paper sheets in sequence, wherein the peripheral speed of polishing is 20m/s, and polishing cooling liquid is continuously added in the polishing process to obtain the polishing target material with uniform metal luster;
s4, cleaning the residual dirt on the surface of the polishing target material by using isopropanol, and drying by using dry compressed air to obtain a finished product.
Performance testing
The aluminum alloy target material was tested by the surface treatment method for finished target material of example 1, the characteristic change of the aluminum alloy target material during the treatment process was observed, and the surface roughness of the target material was measured by a roughness meter, and the results are shown in fig. 1-5 and table 1.
TABLE 1
Referring to fig. 1 to 5 and table 1, during the test, when the cleaning cloth of # 220 to # 600 was used for polishing, the effect of removing the surface scratches was good but the color of the target surface became dull and dull after polishing; when 1000# abrasive paper is used for polishing, the surface of the target starts to gradually present metallic luster, when 3000# abrasive paper is used for polishing, the metallic luster is more ideal, the roughness is 0.05-0.8, and the requirement is met; when 5000# sandpaper is used for polishing, the surface of the target material presents a mirror surface effect, when a roughness measuring instrument is used for measuring the surface roughness, a probe can leave scratches on the surface of the target material, and the roughness is kept between 0.4 and 0.05 mu m; when the target surface is polished by 7000# sandpaper, a more obvious mirror surface effect is shown, when the roughness of the surface is measured by using a roughness meter, a probe can leave scratches on the target surface, and the roughness is still kept between 0.4 and 0.05 mu m. In consideration of the comprehensive cost and performance, the polishing sand paper is selected to be switched to 3000# so that the application value is the highest, the surface roughness of the target can reach 0.8-0.05 mu m, and good surface repairing and polishing effects are achieved.
Referring to fig. 3, the experiment uses local polishing to verify the effect, in the figure, the outer edge part of the target material remains unpolished, and the color is dark and lusterless; the inner side of the target material is in a state of being subjected to rough polishing and fine polishing of 1000#, 2000#, 3000# abrasive paper in sequence, and the target material has uniform metallic luster and ideal glossiness.
The above embodiments are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited thereby, and any insubstantial changes and substitutions made by those skilled in the art based on the present invention are within the protection scope of the present invention.
Claims (10)
1. A surface treatment method for a finished target is characterized by comprising a polishing step, wherein the polishing step comprises the following steps:
(1) Performing surface treatment on the surface of the target by flocking to obtain a rough machining target;
(2) And polishing the rough-processed target material by adopting a plurality of pieces of sand paper with sequentially reduced fineness, and continuously adding polishing cooling liquid in the polishing process to obtain the polished target material with uniform metal luster.
2. The method of claim 1, wherein the step of surface treatment comprises: in the step (1), the fineness of the flocking is 200-600 meshes.
3. The method of claim 2, wherein the step of surface treatment comprises: in the step (1), circular flocking of 200-240 meshes, 350-450 meshes and 550-600 meshes is adopted in sequence to carry out surface treatment on the surface of the target.
4. A method according to claim 1, wherein the surface treatment is performed on a finished target by: in the step (2), the rough-processed target material is polished by sequentially adopting 800-1200 meshes of sand paper, 1800-2200 meshes of sand paper and 2500-5000 meshes of sand paper.
5. The method of claim 1, wherein the step of surface treatment comprises: in the step (2), the rough machining target material is polished by sand paper of 800-1200 meshes, 1800-2200 meshes, 2800-3500 meshes, 4500-5500 meshes and 6500-7500 meshes in sequence.
6. A method according to claim 1, wherein the surface treatment is performed on a finished target by: the surface roughness of the polishing target material is 0.05-0.8 mu m.
7. The method of claim 1, wherein the step of surface treatment comprises: the volume ratio of the cooling liquid is 1:7-15 of coolant and pure water.
8. The method for surface treatment of a finished target according to any of claims 1 to 7, comprising the steps of:
s1, wiping the surface of a target to be processed clean, covering the qualified surface of the target by using a protective tape, and enabling the defect surface of the target to be upward;
s2, wiping the defect surface in the step S1, and measuring the roughness of the defect surface of the target material;
s3, placing the target on a dust removal workbench, removing dust, and then processing according to the polishing step of any one of claims 1-7 to obtain a polished target;
s4, cleaning the surface of the polishing target material, and drying to obtain a finished product.
9. The method of claim 8, wherein the step of surface treating comprises: wiping clean by isopropanol in the steps S1 and S2; and S4, cleaning the residues on the surface of the polished target material by using isopropanol.
10. The method of claim 8, wherein the step of surface treatment comprises: and in the polishing step, a pneumatic polishing machine is adopted for processing, and the peripheral speed of polishing is 20-50m/s.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202210883378.5A CN115139208A (en) | 2022-07-26 | 2022-07-26 | Surface treatment method for finished target |
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| CN202210883378.5A CN115139208A (en) | 2022-07-26 | 2022-07-26 | Surface treatment method for finished target |
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| CN115139208A true CN115139208A (en) | 2022-10-04 |
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| CN202210883378.5A Pending CN115139208A (en) | 2022-07-26 | 2022-07-26 | Surface treatment method for finished target |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106312565A (en) * | 2015-06-15 | 2017-01-11 | 宁波江丰电子材料股份有限公司 | Machining method of target assembly |
| CN107662083A (en) * | 2016-07-27 | 2018-02-06 | 宁波江丰电子材料股份有限公司 | The processing method in target as sputter face |
| CN111775018A (en) * | 2020-07-01 | 2020-10-16 | 宁波江丰电子材料股份有限公司 | Rust removal polishing method for copper target assembly |
| CN112809455A (en) * | 2021-01-04 | 2021-05-18 | 宁波江丰电子材料股份有限公司 | Tungsten silicon target material and polishing method of sputtering surface thereof |
| CN113532979A (en) * | 2021-06-08 | 2021-10-22 | 先导薄膜材料有限公司 | Preparation method of aluminum scandium target material sample |
| CN114434218A (en) * | 2022-02-21 | 2022-05-06 | 合肥江丰电子材料有限公司 | Method for repairing LCD (liquid Crystal display) plane target |
-
2022
- 2022-07-26 CN CN202210883378.5A patent/CN115139208A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106312565A (en) * | 2015-06-15 | 2017-01-11 | 宁波江丰电子材料股份有限公司 | Machining method of target assembly |
| CN107662083A (en) * | 2016-07-27 | 2018-02-06 | 宁波江丰电子材料股份有限公司 | The processing method in target as sputter face |
| CN111775018A (en) * | 2020-07-01 | 2020-10-16 | 宁波江丰电子材料股份有限公司 | Rust removal polishing method for copper target assembly |
| CN112809455A (en) * | 2021-01-04 | 2021-05-18 | 宁波江丰电子材料股份有限公司 | Tungsten silicon target material and polishing method of sputtering surface thereof |
| CN113532979A (en) * | 2021-06-08 | 2021-10-22 | 先导薄膜材料有限公司 | Preparation method of aluminum scandium target material sample |
| CN114434218A (en) * | 2022-02-21 | 2022-05-06 | 合肥江丰电子材料有限公司 | Method for repairing LCD (liquid Crystal display) plane target |
Non-Patent Citations (1)
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