CN115094386A - Driving mechanism for planet carrier of multi-shaft combined electron beam evaporation table - Google Patents
Driving mechanism for planet carrier of multi-shaft combined electron beam evaporation table Download PDFInfo
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- CN115094386A CN115094386A CN202210553957.3A CN202210553957A CN115094386A CN 115094386 A CN115094386 A CN 115094386A CN 202210553957 A CN202210553957 A CN 202210553957A CN 115094386 A CN115094386 A CN 115094386A
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- planet carrier
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- electron beam
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- 238000005566 electron beam evaporation Methods 0.000 title claims abstract description 23
- 230000007246 mechanism Effects 0.000 title claims abstract description 19
- 238000009434 installation Methods 0.000 claims abstract description 24
- 230000006835 compression Effects 0.000 claims abstract description 15
- 238000007906 compression Methods 0.000 claims abstract description 15
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims description 4
- 235000017491 Bambusa tulda Nutrition 0.000 claims description 4
- 241001330002 Bambuseae Species 0.000 claims description 4
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims description 4
- 239000011425 bamboo Substances 0.000 claims description 4
- 238000010248 power generation Methods 0.000 claims 1
- 239000002184 metal Substances 0.000 abstract description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 7
- 239000010703 silicon Substances 0.000 abstract description 7
- 230000003139 buffering effect Effects 0.000 abstract description 5
- 238000000034 method Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 11
- 230000008569 process Effects 0.000 description 10
- 239000010408 film Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 5
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a driving mechanism for a planet carrier of a multi-shaft combined electron beam evaporation table, which comprises a base, a fixed plate, a planet carrier, a buffering component and a rotating component, wherein the top of the base is provided with a shell, a vacuum chamber is arranged in the shell, the inner wall of the vacuum chamber is provided with the fixed plate, and the fixed plate is connected with an installation plate through a guide rod. According to the invention, through the design of structures such as the buffer assembly and the like, when the planet carrier is driven, the adjusting rod connected to the bottom of the mounting plate acts on the limiting slide block, the limiting slide block with the surface connected with the extension spring moves inside the limiting frame, the mounting plate with the planet carrier is buffered, and the compression spring is mounted on the surface of the guide rod to act on the surface of the mounting plate, so that the stability of the mounting plate can be ensured; through the design of structures such as the rotating assembly, the planetary plate can revolve and rotate at the same time, so that the silicon wafer is heated uniformly, and the uniformity of a metal film is improved.
Description
Technical Field
The invention belongs to the technical field of planet carriers, and particularly relates to a driving mechanism for a planet carrier of a multi-shaft combined electron beam evaporation table.
Background
The electron beam evaporation method is a method of vacuum evaporation coating, in which an evaporation material is directly heated by an electron beam under a vacuum condition to be vaporized and transported to a substrate, and condensed on the substrate to form a thin film. An electron beam evaporation stage is a nuclear instrument used in the field of physics to metalize semiconductor chips, which is a process of depositing a metal film on an insulating dielectric film during the fabrication of semiconductor chips and then patterning to form metal interconnection metal lines and hole filling plugs of integrated circuits. The electron beam evaporation stage of semiconductor manufacturing equipment is to place the material to be evaporated into a crucible, heat and evaporate it in a vacuum system with electron beams, and then impinge on the surface of a silicon wafer to condense and form a metal film.
But the rotation of the planet carrier among the prior art drives through driving motor's rotation for vibrations can appear in process of production, influence the rotatory stability of electron beam evaporation table planet carrier, lead to the condition that the piece can appear, and current planet dish structure can lead to the silicon chip to be heated inhomogeneously, consequently, need for a multiaxis union formula actuating mechanism for electron beam evaporation table planet carrier.
Disclosure of Invention
The invention aims to provide a driving mechanism for a planet carrier of a multi-shaft combined electron beam evaporation table, which aims to solve the problems in the background art, reduce the vibration to a planet carrier in the process of driving the planet carrier, improve the rotation stability of the planet carrier to a certain extent, reduce the occurrence of fragments, and enable the planet carrier to rotate in the revolution process, so that a silicon wafer is uniformly heated, and the uniformity of a metal film is improved.
In order to achieve the purpose, the invention provides the following technical scheme: a driving mechanism for a planet carrier of a multi-shaft combined electron beam evaporation table comprises a base, a fixed plate, a planet carrier, a buffering assembly and a rotating assembly, wherein a shell is installed at the top of the base, a vacuum chamber is arranged inside the shell, the fixed plate is installed on the inner wall of the vacuum chamber, the fixed plate is connected with an installation plate through a guide rod, an installation frame is installed on the surface of the installation plate, the planet carrier is rotatably installed on the installation frame, and a planet disk is rotatably installed on the planet carrier;
the buffer assembly also comprises a limiting frame and a positioning ring, the positioning ring is arranged on the inner wall of the limiting frame, and the limiting frame is arranged on the surface of the fixing plate;
the rotating assembly further comprises a positioning block and an outer gear ring, the top of the outer gear ring is connected to the bottom of the positioning block, and the positioning block is mounted on the inner wall of the mounting frame.
The buffer assembly further comprises a limiting slide block and a limiting rod, the limiting rod is installed on two sides of the limiting slide block, and the surface of the limiting slide block is connected with the inner wall of the limiting frame in a sliding mode.
The limiting groove is formed in the surfaces of the two sides of the limiting frame, the surface of the limiting rod is connected with the inner wall of the limiting groove in a sliding mode through the limiting sliding block, the inner wall of the positioning ring is connected with the positioning spring, and the other end of the positioning spring is connected with the surface of the limiting sliding block.
The buffer assembly further comprises a positioning shaft and an adjusting rod, the bottom end of the adjusting rod is movably connected with the positioning shaft through a positioning sleeve, and the positioning shaft is installed on the limiting sliding block.
The surface mounting of spacing slider has the connecting rod, the surface connection of connecting rod has extension spring, the bottom of adjusting the pole is connected the locating sleeve's surface, the locating sleeve rotates to be installed on the location epaxially, the top swing joint of adjusting the pole has the connecting block, the bottom at the mounting panel is installed to the connecting block.
The bottom of guide bar is installed at the top of fixed plate, the top of guide bar is connected with the baffle, the surface mounting of guide bar has compression spring, the bottom of guide bar connection baffle is passed through on compression spring's top, compression spring's bottom is connected on the surface of mounting panel.
The top of planet carrier is connected with the connection pad, the roof is installed at the top of mounting bracket, the surface mounting of roof has servo motor, servo motor's output is connected at the top of connection pad.
The rotating assembly further comprises a limiting ring and a limiting ring, the surface of the limiting ring is connected with the limiting ring in a sliding mode, and the limiting ring is installed on the inner wall of the installation frame.
Wherein, the spacing ring is installed on the surface of planet carrier, the surface mounting of planet carrier has a location section of thick bamboo, the surface mounting of planet dish has the installation axle, the surface rotation of installation axle connects a location section of thick bamboo inner wall.
One end of the mounting shaft is connected with a connecting gear, and the connecting gear is meshed with the outer gear ring.
In summary, due to the adoption of the technology, the invention has the beneficial effects that:
according to the invention, through the structural design of the buffer component and the like, the bottom of the adjusting rod is movably connected with the limiting slide block through the positioning sleeve by connecting the mounting connecting block at the bottom of the mounting plate with the top of the adjusting rod, when vibration is generated, the limiting slide block is enabled to move inside the limiting frame through the limiting rod arranged on the surface, the connecting rod arranged on the surface of the limiting slide block is connected through the extension spring, meanwhile, the positioning ring on the inner wall of the limiting frame is connected with the limiting slide block through the positioning spring, the position of the limiting slide block can be limited, the mounting plate is buffered, the vibration caused to a planetary disk in the process of driving the planetary carrier can be reduced, in addition, the position of the mounting plate can be positioned through the guide rod which is in sliding connection with the surface of the mounting plate, and the compression spring is arranged on the surface of the guide rod to act on the surface of the mounting plate, the stability of the mounting plate can be ensured when the planet carrier rotates.
According to the invention, through the structural design of a rotating component and the like, a servo motor arranged on a mounting rack is driven to drive a connecting disc to rotate, so that a limiting ring connected with the surface of a planet carrier rotates in a limiting ring, a planet disc is rotatably arranged on a positioning cylinder of the planet carrier through a mounting shaft, and when the planet carrier rotates, a connecting gear arranged at one end of the mounting shaft is meshed with an outer gear ring arranged on the mounting rack through a positioning block, so that the planet disc is driven to rotate, the planet disc revolves and rotates, a silicon wafer can be uniformly heated, and the uniformity of a metal film is improved.
Drawings
FIG. 1 is a schematic perspective view of a driving mechanism for a planet carrier of a multi-axis combined electron beam evaporation table according to the present invention;
FIG. 2 is a schematic diagram of the internal perspective structure of the present invention;
FIG. 3 is a perspective view of the buffering assembly of the present invention;
FIG. 4 is a perspective view of the mounting bracket of the present invention;
FIG. 5 is a perspective view of the mounting plate of the present invention;
fig. 6 is a schematic perspective view of the planet carrier of the present invention.
In the figure: 1. a base; 2. a housing; 3. a bin gate; 4. a vacuum chamber; 5. a bearing seat; 6. a fixing plate; 7. a guide bar; 8. a baffle plate; 9. a compression spring; 10. a limiting frame; 11. a limiting groove; 12. a limiting slide block; 13. a limiting rod; 14. a positioning ring; 15. a positioning spring; 16. a connecting rod; 17. an extension spring; 18. positioning the shaft; 19. positioning the sleeve; 20. adjusting a rod; 21. connecting blocks; 22. mounting a plate; 23. a vertical baffle; 24. a mounting frame; 25. a top plate; 26. a limiting ring; 27. positioning blocks; 28. an outer ring gear; 29. a servo motor; 30. a connecting disc; 31. a planet carrier; 32. a positioning cylinder; 33. a limiting ring; 34. a planetary plate; 35. installing a shaft; 36. a connecting gear.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
In the description of the present invention, it is to be understood that the terms indicating an orientation or positional relationship are based on the orientations and positional relationships shown in the drawings only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
In the present invention, unless otherwise explicitly stated or limited, the terms "mounted," "connected," "fixed," and the like are to be construed broadly, e.g., as being fixedly connected, detachably connected, or integrated; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or may be connected through the use of two elements or the interaction of two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art from the specification.
The invention provides a driving mechanism for a planet carrier of a multi-shaft combined electron beam evaporation table, which comprises a base 1, a fixed plate 6, a planet carrier 31, a buffer component and a rotating component, wherein the top of the base 1 is provided with a shell 2, a vacuum chamber 4 is arranged in the shell 2, the inner wall of the vacuum chamber 4 is provided with the fixed plate 6, the fixed plate 6 is connected with an installation plate 22 through a guide rod 7, the surface of the installation plate 22 is provided with an installation frame 24, the planet carrier 31 is rotatably arranged on the installation frame 24, and the planet carrier 31 is rotatably provided with a planet disk 34; the vibration caused to the planet disc 34 in the process of driving the planet carrier 31 can be reduced, the rotating stability of the planet carrier 31 is improved to a certain extent, the occurrence of fragments is reduced, and the planet disc 34 can rotate in the revolution process, so that the silicon wafer is heated uniformly, and the uniformity of a metal film is improved.
The buffer assembly also comprises a limit frame 10 and a positioning ring 14, the positioning ring 14 is arranged on the inner wall of the limit frame 10, and the limit frame 10 is arranged on the surface of the fixed plate 6; the buffer assembly further comprises a limiting slide block 12 and a limiting rod 13, the limiting rod 13 is installed on two sides of the limiting slide block 12, and the surface of the limiting slide block 12 is connected with the inner wall of the limiting frame 10 in a sliding mode. The limiting groove 11 is opened on the surface of both sides of the limiting frame 10, the surface of the limiting rod 13 is connected with the inner wall of the limiting groove 11 through the limiting slide block 12 in a sliding manner, the inner wall of the positioning ring 14 is connected with the positioning spring 15, and the other end of the positioning spring 15 is connected with the surface of the limiting slide block 12.
Specifically, stop frame 10 is the effect of leading to stop block 12's position, holding ring 14 carries out spacing effect to positioning spring 15, fixed plate 6 is the subassembly of installing stop frame 10, gag lever post 13 is the subassembly of carrying out spacing to stop block 12 position, spacing groove 11 carries out spacing effect to gag lever post 13, stop block 12 carries out spacing effect to the bottom of adjusting lever 20, thereby make adjusting lever 20 can play the effect of support to mounting panel 22.
The buffering assembly further comprises a positioning shaft 18 and an adjusting rod 20, the bottom end of the adjusting rod 20 is movably connected with the positioning shaft 18 through a positioning sleeve 19, and the positioning shaft 18 is installed on the limiting sliding block 12. The surface mounting of limiting slide block 12 has connecting rod 16, and the surface of connecting rod 16 is connected with extension spring 17, and the surface of adjusting the surface of connecting sleeve 19 is connected to the bottom of pole 20, and locating sleeve 19 rotates and installs on location axle 18, and the top swing joint of adjusting pole 20 has connecting block 21, and connecting block 21 installs the bottom at mounting panel 22.
The bottom of guide bar 7 is installed at the top of fixed plate 6, and the top of guide bar 7 is connected with baffle 8, and the surface mounting of guide bar 7 has compression spring 9, and the bottom of baffle 8 is connected through guide bar 7 in the top of compression spring 9, and the surface at mounting panel 22 is connected to compression spring 9's bottom, and perpendicular baffle 23 is installed to mounting panel 22's bottom, and the surface mounting of casing 2 has door 3, and the internally mounted of vacuum chamber 4 bears seat 5.
In addition, the guide rod 7 plays the effect of spacing direction to mounting panel 22, improves mounting panel 22's stability, and baffle 8 carries out spacing effect to compression spring 9 position, can guarantee mounting panel 22's stability through compression spring 9, can not take place to rock, and vertical baffle 23 can play the effect of protection to buffering subassembly, and the seat 5 that bears is the subassembly of laying the crucible.
It should be noted that the top of the planet carrier 31 is connected with a connecting disc 30, the top of the mounting frame 24 is provided with a top plate 25, the surface of the top plate 25 is provided with a servo motor 29, and the output end of the servo motor 29 is connected with the top of the connecting disc 30. The carrier 31 is a member for mounting the planetary disk 34, the land 30 is a coupling member for coupling the carrier 31 to the servo motor 29, and the top plate 25 is a member for mounting the servo motor 29, so that the servo motor 29 can rotationally drive the carrier 31.
Preferably, the rotating assembly further comprises a positioning block 27 and an outer gear ring 28, the top of the outer gear ring 28 is connected to the bottom of the positioning block 27, and the positioning block 27 is mounted on the inner wall of the mounting frame 24; the rotating assembly further comprises a limiting ring 26 and a limiting ring 33, the surface of the limiting ring 33 is connected with the limiting ring 26 in a sliding mode, and the limiting ring 26 is installed on the inner wall of the installation frame 24. The positioning block 27 is used for mounting the outer ring gear 28, the outer ring gear 28 is a component for the planetary disc 34 to rotate, and the limit ring 26 is a component for the limit ring 33 to rotate and has an effect of positioning the planetary carrier 31.
Further, a limiting ring 33 is mounted on the surface of the planet carrier 31, a positioning cylinder 32 is mounted on the surface of the planet carrier 31, a mounting shaft 35 is mounted on the surface of the planet disc 34, and the surface of the mounting shaft 35 is rotatably connected with the inner wall of the positioning cylinder 32. One end of the mounting shaft 35 is connected with a connecting gear 36, and the connecting gear 36 is meshed with the outer gear ring 28. The positioning cylinder 32 is used for positioning the planetary plate 34, the mounting shaft 35 is a component for mounting the planetary plate 34, and the connecting gear 36 is a component for rotating the planetary plate 34 by matching with the external gear ring 28.
The bottom of the adjusting rod 20 is movably connected with the limiting slide block 12 through the positioning sleeve 19 when vibration is generated by connecting the connecting block 21 at the bottom of the mounting plate 22 with the top end of the adjusting rod 20, so that the limiting slide block 12 moves inside the limiting frame 10 through the limiting rod 13 which is surface mounted, the connecting rod 16 which is surface mounted on the limiting slide block 12 is connected through the extension spring 17, meanwhile, the positioning ring 14 on the inner wall of the limiting frame 10 is connected with the limiting slide block 12 through the positioning spring 15, the position of the limiting slide block 12 can be limited, the mounting plate 22 is buffered, vibration caused to the planetary disc 34 in the process of driving the planetary carrier 31 can be reduced, the position of the mounting plate 22 can be positioned through the guide rod 7 which is in surface sliding connection with the mounting plate 22, and the compression spring 9 is surface mounted on the guide rod 7 to act on the surface of the mounting plate 22, the stability of the mounting plate 22 can be ensured when the carrier 31 rotates.
The servo motor 29 installed on the installation frame 24 is driven to drive the connection disc 30 to rotate, so that the limiting ring 33 connected with the surface of the planet carrier 31 rotates in the limiting ring 26, the planet disc 34 is rotatably installed on the positioning cylinder 32 of the planet carrier 31 through the installation shaft 35, when the planet carrier 31 rotates, the connection gear 36 installed at one end of the installation shaft 35 is meshed with the outer gear ring 28 installed on the installation frame 24 through the positioning block 27, so that the planet disc 34 rotates, the planet disc 34 revolves and rotates, silicon wafers can be heated uniformly, and the uniformity of a metal film is improved.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be able to cover the technical scope of the present invention and the equivalent alternatives or modifications according to the technical solution and the inventive concept of the present invention within the technical scope of the present invention.
It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Claims (10)
1. The utility model provides a multiaxis is combination formula electron beam evaporation platform actuating mechanism for planet carrier, includes base (1), fixed plate (6), planet carrier (31), buffer unit and rotating assembly, its characterized in that: the novel solar photovoltaic power generation device is characterized in that a shell (2) is installed at the top of the base (1), a vacuum chamber (4) is arranged in the shell (2), a fixing plate (6) is installed on the inner wall of the vacuum chamber (4), the fixing plate (6) is connected with an installation plate (22) through a guide rod (7), an installation frame (24) is installed on the surface of the installation plate (22), the planet carrier (31) is rotatably installed on the installation frame (24), and a planet disc (34) is rotatably installed on the planet carrier (31);
the buffer assembly further comprises a limiting frame (10) and a positioning ring (14), the positioning ring (14) is installed on the inner wall of the limiting frame (10), and the limiting frame (10) is installed on the surface of the fixing plate (6);
the rotating assembly further comprises a positioning block (27) and an outer gear ring (28), the top of the outer gear ring (28) is connected to the bottom of the positioning block (27), and the positioning block (27) is mounted on the inner wall of the mounting frame (24).
2. The driving mechanism for the planet carrier of the multi-shaft combined type electron beam evaporation table as claimed in claim 1, wherein: the buffer assembly further comprises a limiting slide block (12) and a limiting rod (13), the limiting rod (13) is installed on two sides of the limiting slide block (12), and the surface of the limiting slide block (12) is connected with the inner wall of the limiting frame (10) in a sliding mode.
3. The driving mechanism for the planet carrier of the multi-shaft combined type electron beam evaporation table as claimed in claim 2, wherein: spacing groove (11) have been seted up on the both sides surface of spacing frame (10), the surface of gag lever post (13) passes through the inner wall sliding connection of spacing slider (12) and spacing groove (11), the inner wall connection of holding ring (14) has positioning spring (15), spacing slider (12) surface is connected to the other end of positioning spring (15).
4. The driving mechanism for planet carrier of multi-axis electron beam evaporation stage as claimed in claim 3, wherein: the buffer assembly further comprises a positioning shaft (18) and an adjusting rod (20), the bottom end of the adjusting rod (20) is movably connected with the positioning shaft (18) through a positioning sleeve (19), and the positioning shaft (18) is installed on the limiting sliding block (12).
5. The driving mechanism for planet carrier of multi-axis electron beam evaporation stage as claimed in claim 4, wherein: the surface mounting of limit slide (12) has connecting rod (16), the surface connection of connecting rod (16) has extension spring (17), the surface of adjusting the bottom connection position sleeve (19) of pole (20), position sleeve (19) rotate to be installed on location axle (18), the top swing joint who adjusts pole (20) has connecting block (21), the bottom at mounting panel (22) is installed in connecting block (21).
6. The driving mechanism for the planet carrier of the multi-shaft combined type electron beam evaporation table as claimed in claim 1, wherein: the bottom mounting of guide bar (7) is at the top of fixed plate (6), the top of guide bar (7) is connected with baffle (8), the surface mounting of guide bar (7) has compression spring (9), the bottom of guide bar (7) connection baffle (8) is passed through on the top of compression spring (9), the surface at mounting panel (22) is connected to the bottom of compression spring (9).
7. The driving mechanism for the planet carrier of the multi-shaft combined type electron beam evaporation table as claimed in claim 1, wherein: the top of planet carrier (31) is connected with connection pad (30), roof (25) are installed at the top of mounting bracket (24), the surface mounting of roof (25) has servo motor (29), the top at connection pad (30) is connected to the output of servo motor (29).
8. The driving mechanism for planet carrier of multi-axis electron beam evaporation stage as claimed in claim 7, wherein: the rotating assembly further comprises a limiting ring (26) and a limiting ring (33), the surface of the limiting ring (33) is connected with the limiting ring (26) in a sliding mode, and the limiting ring (26) is installed on the inner wall of the installation frame (24).
9. The driving mechanism for planet carrier of multi-axis electron beam evaporation stage as claimed in claim 8, wherein: the utility model discloses a planet carrier, including spacing ring (33), planet carrier (31), surface mounting has a location section of thick bamboo (32), the surface mounting of planet dish (34) has installation axle (35), the surface rotation of installation axle (35) connects a location section of thick bamboo (32) inner wall.
10. The driving mechanism for planet carrier of multi-axis electron beam evaporation stage as claimed in claim 9, wherein: one end of the mounting shaft (35) is connected with a connecting gear (36), and the connecting gear (36) is meshed with the outer gear ring (28).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210553957.3A CN115094386A (en) | 2022-05-19 | 2022-05-19 | Driving mechanism for planet carrier of multi-shaft combined electron beam evaporation table |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210553957.3A CN115094386A (en) | 2022-05-19 | 2022-05-19 | Driving mechanism for planet carrier of multi-shaft combined electron beam evaporation table |
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| CN115094386A true CN115094386A (en) | 2022-09-23 |
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| CN202210553957.3A Pending CN115094386A (en) | 2022-05-19 | 2022-05-19 | Driving mechanism for planet carrier of multi-shaft combined electron beam evaporation table |
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| CN104196943A (en) * | 2014-08-20 | 2014-12-10 | 大连华锐重工集团股份有限公司 | Air buffering device for oil pressure disassembly conical surface interference joint |
| CN206916213U (en) * | 2017-06-28 | 2018-01-23 | 天津煋鸟科技有限公司 | A kind of coating machine rack |
| CN210476135U (en) * | 2019-08-27 | 2020-05-08 | 常州锝莱电机有限公司 | Planet carrier assembling equipment |
| CN212223086U (en) * | 2020-06-04 | 2020-12-25 | 无锡芯谱半导体科技有限公司 | Electron beam evaporation table |
| CN212270226U (en) * | 2020-06-04 | 2021-01-01 | 无锡芯谱半导体科技有限公司 | Planetary disc structure for electron beam evaporation table |
| CN214888599U (en) * | 2021-01-26 | 2021-11-26 | 黔南民族职业技术学院 | Shock attenuation formula installation base of electromechanical device |
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