CN115003004B - Miniaturized ion synchrotron - Google Patents
Miniaturized ion synchrotron Download PDFInfo
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- CN115003004B CN115003004B CN202210573773.3A CN202210573773A CN115003004B CN 115003004 B CN115003004 B CN 115003004B CN 202210573773 A CN202210573773 A CN 202210573773A CN 115003004 B CN115003004 B CN 115003004B
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- H05H13/00—Magnetic resonance accelerators; Cyclotrons
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- H—ELECTRICITY
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- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
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- H05H7/14—Vacuum chambers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
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- H05H2277/10—Medical devices
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Abstract
The invention relates to a miniaturized ion synchrotron, comprising: an annular vacuum conduit comprising a plurality of linear ion beam segments and a plurality of curvilinear ion beam segments, wherein the plurality of linear ion beam segments and the plurality of curvilinear ion beam segments are arranged alternately; the linear ion beam section comprises a plurality of long straight sections and a plurality of short straight sections; the curved ion beam section comprises a plurality of groups of dipolar magnet assemblies, two adjacent groups of dipolar magnet assemblies are connected through one long straight joint, each group of dipolar magnet assemblies comprises two dipolar magnets, and the two dipolar magnets in each group are connected through one short straight joint; an injection system comprising an injection cutting magnet and either a peel-film system for a peel-off injection regime for the beam current or an injection electrostatic cutter for a multi-turn injection regime for the beam current.
Description
Technical Field
The invention relates to the technical field of synchrotrons, in particular to a miniaturized ion synchrotron.
Background
In recent years, the number of cancer patients per year has continued to increase, and cancer has become a significant threat to the health of residents. Compared with the traditional photon and electron radiotherapy, the ion therapy has the advantages of precise dose distribution, less irradiation times and the like due to the specific deep dose distribution and biological effect of ions. The synchrotron can be used for quickly adjusting the energy of charged ions to meet the requirements of patients.
Fig. 8 shows an example of a conventional medical synchrotron, which includes: 8 normal temperature dipolar magnets (e 1) for deflecting beam current; 12 quadrupole magnets (e 2) 4 for making the beam size not divergent and stably making periodic motion in the accelerator; a cutting magnet (e 3) for deflecting the implant beam; 4 injection convex rail magnets (e 4) for matching stripping injection; the device comprises an electrostatic cutter (e 5), a cutting magnet (e 7) and 3 leading-out convex rail magnets (e 6) which are used for deflecting beam current reaching preset energy and leading out the beam current from the synchrotron. In the injection process of the accelerator, an injection beam enters the synchronous annular accelerator by deflecting through a cutting magnet (e 3), a C5+ injection beam is stripped into C6+ through a stripping film, the deflection radius of the injection beam in a dipolar iron is changed, the beam is injected into the acceptance of a ring, a local convex rail is generated in the injection stage of the injection convex rail, the acceptance of the ring is close to the stripping film, the stripped injection beam is received, the amplitude of the convex rail is continuously reduced during injection, and the frequency of the circulating beam passing through the stripping film is reduced so as to ensure the beam quality. In the extraction process of the accelerator, firstly, an orbit magnet (e 6) is extracted to form a local orbit, the beam current in the ring is close to an electrostatic cutter (e 5) positioned outside a synchronous ring-shaped accelerator pipeline, meanwhile, three-order resonance is carried out through hexapole iron, the beam current forms a stable extraction orbit, particles move outwards along the orbit and enter the electrostatic cutter (e 5), the particles are separated from the beam current still circulating in the accelerator in the ring by a small distance under the action of the horizontal outward deflection force of the electrostatic cutter (e 5), the separated distance is continuously enlarged along with the advancing of the beam current, namely, the extracted beam current is more and more far away from the center of the accelerator pipeline, and after passing through a dipolar iron, when the extracted beam is separated from the circulating beam by a sufficient distance, the extracted beam enters an extraction cutting magnet (e 7) and further deflects outwards horizontally to complete the extraction of the beam current.
However, the conventional synchrotron accelerator has a large number of components, a large floor area, and high investment and operation costs, so that the ion therapy having excellent therapeutic effects is difficult to popularize.
Disclosure of Invention
In view of the above problems, it is an object of the present invention to provide a compact ion synchrotron capable of reducing the number of quadrupole magnets while suppressing an increase in beam size, and optimizing the layout of injection and extraction devices.
In order to achieve the purpose, the invention adopts the following technical scheme:
the miniaturized ion synchrotron of the invention comprises: an annular vacuum conduit comprising a plurality of linear ion beam segments and a plurality of curvilinear ion beam segments, wherein the plurality of linear ion beam segments and the plurality of curvilinear ion beam segments are alternately arranged; the linear ion beam section comprises a plurality of long straight sections and a plurality of short straight sections; the curved ion beam section comprises a plurality of groups of dipolar magnet assemblies, two adjacent groups of dipolar magnet assemblies are connected through one long straight joint, each group of dipolar magnet assemblies comprises two dipolar magnets, and the two dipolar magnets in each group are connected through one short straight joint; an implant system comprising an implant cutting magnet and a peel film system for a peel implant recipe for the beam current or an implant electrostatic cutter for a multi-turn implant recipe for the beam current; the injection cutting magnet is arranged on one of the long straight sections; the release film system is disposed on the dipole magnet adjacent to and downstream of the cutting magnet; the injection electrostatic cutter is arranged on the long straight section where the cutting magnet is located and is positioned at the downstream of the cutting magnet; the leading-out system comprises a leading-out electrostatic cutter, a first leading-out cutting magnet and a second leading-out cutting magnet; the leading-out electrostatic cutter is arranged on the long straight section adjacent to the injection cutting magnet; the first leading-out cutting magnet is arranged on the long straight section opposite to the leading-out electrostatic cutter; the second leading-out cutting magnet and the first leading-out cutting magnet are positioned at the same long straight section and are positioned at the downstream of the first leading-out cutting magnet.
Preferably, the number of the dipole magnet assemblies is four, the number of the dipole magnets is eight, and the dipole magnets are provided with edge angles for focusing and scattering beam current; the number of the long straight sections and the number of the short straight sections are four respectively.
The miniaturized ion synchrotron is characterized in that preferably, a quadrupole magnet is arranged on each long straight section; each short straight section and each long straight section are respectively provided with a beam position detector and a correcting magnet; on the short straight section, the beam position detector and the correcting magnet are superposed; and the beam position detector and the correcting magnet are arranged on the long straight section in an overlapping or separated mode.
The miniaturized ion synchrotron preferably further comprises a plurality of convex rail magnets, and for the stripping injection scheme, two convex rail magnets are arranged on the long straight section where the first lead-out cutting magnet is located, and the rest convex rail magnets are respectively arranged on the rest long straight sections one by one; two convex rail magnets which are arranged on the long straight section where the first leading-out cutting magnet is located are respectively arranged at two ends of the long straight section; the convex rail magnet positioned on the long straight section where the leading-out electrostatic cutter is positioned is arranged at the downstream of the leading-out electrostatic cutter; the convex rail magnet positioned on the long straight section where the injection cutting magnet is positioned is arranged between the quadrupole magnet and the injection cutting magnet on the long straight section; the convex rail magnet on the long straight section opposite to the injection cutting magnet is arranged at the downstream of the quadrupole magnet on the long straight section; or for the multi-circle injection scheme, two convex rail magnets are arranged on the long straight section where the injection cutting magnet is located, and the rest convex rail magnets are respectively arranged on the rest long straight sections one by one; two convex rail magnets which are arranged on the long straight section where the injection cutting magnet is positioned are respectively arranged at two ends of the long straight section; the convex rail magnet positioned on the long straight section where the leading-out electrostatic cutter is positioned is arranged at the downstream of the leading-out electrostatic cutter; the convex rail magnet on the long straight section where the first lead-out cutting magnet is located is arranged on the upstream of the four-pole magnet on the long straight section; a convex rail magnet located on the long straight section opposite the injection cut magnet is disposed downstream of the four-pole magnet on the long straight section.
The miniaturized ion synchrotron is characterized in that preferably, the convex rail magnet arranged on the long straight section where the leading-out electrostatic cutter is positioned and the convex rail magnet arranged between the quadrupole iron of the downstream long straight section and the injection cutting magnet are injection and leading-out common convex rail magnets; the convex rail magnet of the long straight section at the upstream of the leading-out electrostatic cutter is a leading-out convex rail magnet; the other convex track magnets are injection convex track magnets.
The miniaturized ion synchrotron preferably further comprises a transverse high-frequency excitation cavity and a high-frequency acceleration cavity, wherein the transverse high-frequency excitation cavity and the high-frequency acceleration cavity are sequentially arranged on the long straight section opposite to the injection cutting magnet and are positioned between the quadrupole magnet and the convex rail magnet on the long straight section.
The miniaturized ion synchrotron preferably further comprises two resonant hexapole magnets, wherein one resonant hexapole magnet is arranged on the long straight section where the extraction electrostatic cutter is arranged and is positioned at the upstream of the quadrupolar magnet on the long straight section; and the other resonant six-pole magnet is arranged on the long straight section where the first lead-out cutting magnet is positioned and is positioned at the upstream of the four-pole magnet on the long straight section.
Due to the adoption of the technical scheme, the invention has the following advantages:
the invention reduces the number of magnets in the annular synchrotron, simplifies the structure, optimizes the size of the injection and extraction element, greatly reduces the perimeter and the floor area of the ion therapy synchrotron, and realizes the miniaturization of the synchrotron; meanwhile, the invention can accelerate various ions, such as protons, helium ions, carbon ions and the like, and can meet more treatment requirements.
Drawings
Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the invention. Like reference numerals refer to like parts throughout the drawings. In the drawings:
FIG. 1 is an overall layout of a synchrotron employing a strip implant according to a first embodiment of the present invention;
FIG. 2 is an overall layout of a synchrotron employing multi-turn injection according to a second embodiment of the present invention;
FIG. 3 is a view of the beam envelope of the synchrotron of the present invention;
FIG. 4 is a lift-off implantation system layout of the present invention;
FIG. 5 is a multi-turn implantation system layout of the present invention;
FIG. 6 is a beta function of the synchrotron of the present invention;
fig. 7 is an envelope diagram of a circulating beam and an extracted beam current in the synchrotron of the present invention.
Fig. 8 is a block diagram of a prior art synchrotron.
The reference symbols in the drawings denote the following:
1-8: a dipolar magnet;
9-12: a quadrupole magnet;
13. 14: a resonant hexapole magnet;
15: transverse high-frequency excitation;
16: a high-frequency accelerating cavity;
17: leading out an electrostatic cutter;
18: the first block is led out of the cutting magnet;
19: the second block leads out a cutting magnet;
20-24: a convex rail magnet;
25: injecting a cutting magnet;
26: stripping the membrane system;
27: injecting into an electrostatic cutter;
a1-a4: a long straight section;
b1-b4: a short straight section;
c1 to c8: a beam position detector;
d1-d8: and correcting the magnet.
Detailed Description
Exemplary embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the invention are shown in the drawings, it should be understood that the invention can be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
The invention provides a miniaturized ion synchrotron, which is characterized in that the number of magnets in a ring synchrotron is reduced, the size of an injection extraction element is optimized while the structure is simplified, the perimeter and the floor area of the ion therapy synchrotron are greatly reduced, and the miniaturization of the synchrotron is realized.
Example 1:
as shown in fig. 1, the miniaturized ion synchrotron provided by the present invention comprises:
the annular vacuum pipeline comprises eight linear ion beam sections and four curve ion beam sections, wherein the eight linear ion beam sections and the four curve ion beam sections are alternately arranged; the linear ion beam section comprises four long straight sections a1-a4 and four short straight sections b1-b4; the curved ion beam section comprises four groups of dipolar magnet assemblies, two adjacent groups of dipolar magnet assemblies are connected through a long straight joint, each group of dipolar magnet assemblies comprises two dipolar magnets, and the two dipolar magnets in each group are connected through a short straight joint;
specifically, the annular vacuum pipe rotates counterclockwise from six o' clock direction, and is formed by sequentially connecting a long straight section a1, a two-pole magnet 3, a short straight section b2, a two-pole magnet 4, a long straight section a2, a two-pole magnet 5, a short straight section b3, a two-pole magnet 6, a long straight section a3, a two-pole magnet 7, a short straight section b4, a two-pole magnet 8, a long straight section a4, a two-pole magnet 1, a short straight section b1 and a two-pole magnet 2 in series.
An injection system including an injection cutting magnet 25 and a release film system 26, the injection cutting magnet 25 being disposed on the long straight section a 2; the release film system 26 is disposed on the dipolar magnet 5;
the leading-out system comprises a leading-out electrostatic cutter 17, a first leading-out cutting magnet 18 and a second leading-out cutting magnet 19; the leading-out electrostatic cutter 17 is arranged on the long straight section a 1; the first extraction cutting magnet 18 is arranged on the long straight section a 3; the second extraction cutting magnet 19 is located on the same a3 long straight section as the first extraction cutting magnet 18 and is located downstream of the first extraction cutting magnet 18.
In the above embodiment, preferably, the number of the dipole magnet assemblies is four, the number of the dipole magnets is eight, and 22.5 ° and 12.7 ° edge angles are respectively provided at the entrance and the exit of the dipole magnets; the number of the long straight sections and the number of the short straight sections are four respectively.
In the above embodiment, preferably, a four-pole magnet is provided on each long straight section; each short straight section and each long straight section are respectively provided with a beam position detector and a correcting magnet; on the short straight section, the beam position detector and the correcting magnet are superposed; and the beam position detector and the correcting magnet are arranged on the long straight section in an overlapping or separated mode.
Specifically, the four-pole magnet 9 is arranged on the long straight section a1, the four-pole magnet 10 is arranged on the long straight section a2, the four-pole magnet 11 is arranged on the long straight section a3, and the four-pole magnet 12 is arranged on the long straight section a 4; the beam position detector c1 and the correcting magnet d1 are arranged on the short straight section b1 after being superposed, the beam position detector c2 and the correcting magnet d2 are sequentially arranged on the long straight section a1 and positioned at the upstream of the quadrupole magnet 9, the beam position detector c3 and the correcting magnet d3 are arranged on the short straight section b2 after being superposed, the beam position detector c4 and the correcting magnet d4 are sequentially arranged on the long straight section a2 and positioned at the upstream of the quadrupole magnet 10, the beam position detector c5 and the correcting magnet d5 are arranged on the short straight section b3 after being superposed, the correcting magnet d6 and the beam position detector c6 are sequentially arranged on the long straight section a3 and positioned at the downstream of the second extraction cutting magnet, the beam position detector c7 and the correcting magnet d7 are arranged on the short straight section b4 after being superposed, and the beam position detector c8 and the correcting magnet d8 are sequentially arranged on the long straight section a4 and positioned at the upstream of the quadrupole magnet 12.
In the above embodiment, preferably, the present invention further includes convex rail magnets, two of which are disposed on the long straight section where the first leading-out cutting magnet is located, and the rest of the convex rail magnets are respectively disposed on the rest of the long straight sections one by one; two convex rail magnets arranged on the long straight section where the first lead-out cutting magnet is located are respectively arranged on the upstream of the quadrupole magnet on the long straight section and the downstream of the beam position detector; the convex rail magnet positioned on the long straight section where the leading-out electrostatic cutter is positioned is arranged at the downstream of the leading-out electrostatic cutter; the convex rail magnet positioned on the long straight section where the injection cutting magnet is positioned is arranged between the quadrupole magnet and the injection cutting magnet on the long straight section; a convex rail magnet on a long straight segment opposite to the injection cutting magnet is disposed downstream of the quadrupole magnet on the long straight segment.
Specifically, the convex-track magnet 20 is disposed on the long straight section a4, and is located downstream of the four-pole magnet 12; the convex rail magnet 21 is arranged on the long straight section a1 and is positioned at the downstream of the leading-out electrostatic cutter 17; the convex track magnet 22 is arranged on the long straight section a2 and is positioned between the quadrupole magnet 10 and the injection cutting magnet 25; the convex rail magnet 23 and the convex rail magnet 24 are both provided on the long straight section a3, the convex rail magnet 23 is located upstream of the quadrupole magnet 11, and the convex rail magnet 24 is located downstream of the beam position detector c 6.
In the above embodiment, preferably, the two convex rail magnets arranged on the long straight section where the first extraction cutting magnet is located are injection convex rail magnets; the convex rail magnet positioned on the long straight section where the leading-out electrostatic cutter is positioned and the convex rail magnet positioned on the long straight section where the injection cutting magnet is positioned are injection and leading-out common convex rail magnets; and the convex rail magnet positioned on the long straight section opposite to the injection cutting magnet is a lead-out convex rail magnet.
That is, the convex rail magnet 23 and the convex rail magnet 24 are injection convex rail magnets; the convex rail magnet 21 and the convex rail magnet 22 are common convex rail magnets for injection and extraction; the convex rail magnet 20 is a lead-out convex rail magnet.
In the above embodiment, preferably, the present invention further includes a transverse high-frequency excitation 15 and a high-frequency acceleration cavity 16, which are sequentially disposed on the long straight section opposite to the injection cutting magnet and between the four-pole magnet and the convex rail magnet on the long straight section.
That is, the transverse high-frequency excitation 15 and the high-frequency acceleration cavity 16 are sequentially provided on the long straight section a4 between the quadrupole magnet 12 and the convex rail magnet 20.
In the above embodiment, preferably, the present invention further includes two resonant hexapole magnets, wherein one resonant hexapole magnet is disposed on the long straight section where the leading-out electrostatic cutter is located, and is located upstream of the quadrupole magnet on the long straight section; and the other resonant six-pole magnet is arranged on the long straight section where the first lead-out cutting magnet is positioned and is positioned at the upstream of the four-pole magnet on the long straight section.
Specifically, the resonant hexapole magnet 13 is disposed on the long straight section a1, and is located between the quadrupole magnet 9 and the corrector magnet d 2; the resonant hexapole magnet 14 is disposed on the long straight section a3 and between the quadrupole magnet 11 and the convex rail magnet 23.
The lift-off implantation process of this example: the method is characterized in that 4 convex rail magnets 21-24 are used for forming a local convex rail, the acceptance of a ring is close to a stripping film system 26, an implanted beam is deflected by an implanted cutting magnet 25 and enters a synchrotron from the outside of the ring, the implanted beam penetrates through the stripping film system 26, the charge quantity is changed and then enters the acceptance of the ring, the stripped ions reach the position of the stripping film system 26 again after circulating for one circle in the synchrotron, the change of the charge state of the implanted beam is in the acceptance of the ring, so that the limitation of the Liu-Wei theorem can be overcome, the phase space occupied by the circulating beam can be simultaneously occupied by the implanted beam, the ion number in the acceptance is increased, the strength of the convex rail magnets 21-24 is gradually reduced along with the continuous injection of the beam, the horizontal acceptance of the whole ring is finally filled, and the implantation process is completed.
Slow extraction: according to the invention, three-order resonance slow extraction is adopted, a stable triangle is formed in a phase space by using the three-order resonance caused by the hexapole magnets (13, 14), the amplitude of particles entering the boundary of the stable triangle can be rapidly increased along a boundary rail (boundary extension line), when the amplitude is increased to a certain degree, the particles enter the extraction electrostatic cutter (17) to be extracted, and the transverse excitation element (15) has the function of generating a transverse high-frequency electric field, so that the beam emittance originally smaller than the stable triangle is continuously increased, and the beam extraction is continuously and stably carried out. In the invention, 3 convex rail magnets (20, 21, 22) are adopted to form a lead-out convex rail structure, and lead-out beam current approaches a lead-out electrostatic cutter (17) through a local convex rail during lead-out, so that the lead-out electrostatic cutter (17) can be arranged outside the acceptance of a synchrotron, and injection and over-acceleration are avoidedIn-process beam current loss is led out of the electrostatic cutter (17). And the phase shift between the leading-out electrostatic cutter (17) and the leading-out cutting magnet (18) is close to 300 degrees, which is different from the phase shift between the leading-out electrostatic cutter and the leading-out cutting magnet which are generally adopted in the medical synchrotron and is close to 90 degrees. It is often important in extraction design to consider the distance separating the extracted beam from the circulating beam at the entrance of the magnetic cutter after deflection of the extracted beam past the extraction electrostatic cutter, which is used to mount the pole plate of the magnetic cutter, the size of which, in theory, depends on the pole thickness, and determines the angle of deflection of the electrostatic cutter,
wherein θ is the kicking rail angle of the electrostatic cutter, β ES As a function of the horizontal envelope at the electrostatic cutter, beta MS As a function of the horizontal envelope at the magnetic cutter, (μ) MS -μ ES ) Is the phase shift between the magnetic and electrostatic cutters.
In the invention, the leading-out electrostatic cutter 17 and the leading-out cutting magnet 18 are close to the horizontal focusing quadrupole magnet, so the beta functions of the positions of the leading-out electrostatic cutter 17 and the leading-out cutting magnet 18 are maximum, and the phase shift between the leading-out electrostatic cutter 17 and the leading-out cutting magnet 18 is about 300 degrees when the leading-out electrostatic cutter 17 and the leading-out cutting magnet 18 are respectively placed at symmetrical long straight line sections a1 and a3 because the selected working point is about 5/3, and the synchronous accelerator has two periodic structures. The intensity of the two resonant hexapole magnets 13 and 14 can be set to be different, and the horizontal chromaticity is adjusted while the resonant requirement is met, so that the Hardt condition is met, and the beam loss during leading-out is reduced.
Example 2:
as shown in fig. 2, unlike embodiment 1: the stripping film system is removed, an injection electrostatic cutter is added, and the position of the injection convex rail magnet 24 is changed; the injection electrostatic cutter is disposed on the long straight section where the injection cutting magnet is located, that is, the long straight section a2, and is located downstream of the injection cutting magnet. The injection land magnet 24 is located on the long straight section a2 where the injection cut magnet is located, and is located downstream of the injection electrostatic cutter 27.
The multi-turn injection process is as follows: the injected beam enters the synchrotron under the action of the injection cutting magnet 25, is further close to the acceptance of the synchrotron after passing through the injection electrostatic cutter 27, finally falls into the raised acceptance under the action of the convex rail magnets 21-24, when the injection is started, a first circle of beam is injected to the acceptance center, when the first circle of beam is rotated back to be injected into the electrostatic cutter, the convex rail has partially fallen back, and because the working point of the accelerator is not an integer, the first circle of injected beam avoids the polar plate of the injection electrostatic cutter, and a second circle of beam is injected at the position close to the first circle of injected beam in the acceptance, so on, the first injected beam is positioned at the center of the acceptance, and is gradually spirally expanded outwards, and the injected beam can be filled into the acceptance as much as possible by controlling the working point of the synchrotron and the descending curve of the convex rail.
Fig. 3 is an envelope of the beam of the synchrotron, and it can be seen that the envelope of the beam in the horizontal direction is larger than that in the vertical direction because of the strip implantation or multi-turn implantation.
Fig. 4 is a lift-off implantation system layout of example 1, depicting the process of beam injection: the convex rail magnets (21-24) locally protrude the closed track, the injection beam enters a synchrotron through the injection cutting magnet 25, and enters the closed track after electrons are stripped at the stripping film 26;
fig. 5 is a layout of the multi-turn implantation system of example 2, depicting the process of beam injection: raised rail magnets (21-24) raise the closed rail to approach the injection electrostatic cutter 27, the injection beam entering the tolerance of the synchronizer ring under the deflection of injection cutting magnet 25 and injection electrostatic cutter 27;
FIG. 6 is a synchrotron β function, marking the position of the extraction electrostatic cutter 17 and extraction cutting magnet 18 at opposite linear segments, phase shifted by approximately 300, and placed where the respective long linear segments β x are larger; fig. 7 is an envelope diagram of a circulating beam and an extracted beam in the synchrotron, wherein the circulating beam is a track of the last three circles of beams before the beam is extracted, and the extracted beam is extracted from the synchrotron after the extracted beam passes through the action of an extracted electrostatic deflector 17 and an extracted cutting magnet 18.
In the present invention, the injection direction of the synchrotron accelerator is not limited to the injection from the outside of the synchronizer ring, and the pre-stage injector may be placed inside the synchronizer ring and the injection from the inside of the synchronizer ring may be used.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (4)
1. A miniaturized ion synchrotron, comprising:
an annular vacuum conduit comprising a plurality of linear ion beam segments and a plurality of curvilinear ion beam segments, wherein the plurality of linear ion beam segments and the plurality of curvilinear ion beam segments are alternately arranged; the linear ion beam section comprises a plurality of long straight sections and a plurality of short straight sections; the curved ion beam section comprises a plurality of groups of dipolar magnet assemblies, two adjacent groups of dipolar magnet assemblies are connected through one long straight joint, each group of dipolar magnet assemblies comprises two dipolar magnets, and the two dipolar magnets in each group are connected through one short straight joint;
an implant system comprising an implant cutting magnet and a peel film system for a peel implant recipe for the beam current or an implant electrostatic cutter for a multi-turn implant recipe for the beam current;
the injection cutting magnet is arranged on one of the long straight sections; the release film system is disposed on the dipole magnet adjacent to and downstream of the cutting magnet; the injection electrostatic cutter is arranged on the long straight section where the cutting magnet is located and is positioned at the downstream of the cutting magnet;
the leading-out system comprises a leading-out electrostatic cutter, a first leading-out cutting magnet and a second leading-out cutting magnet; the leading-out electrostatic cutter is arranged on the long straight section adjacent to the injection cutting magnet; the first leading-out cutting magnet is arranged on the long straight section opposite to the leading-out electrostatic cutter; the second lead-out cutting magnet and the first lead-out cutting magnet are positioned at the same long straight section and are positioned at the downstream of the first lead-out cutting magnet;
the number of the dipolar magnet assemblies is four, the number of the dipolar magnets is eight, and the dipolar magnets are provided with edge angles for focusing and scattering beam current; the number of the long straight sections and the number of the short straight sections are four respectively;
each long straight section is provided with a four-pole magnet; each short straight section and each long straight section are respectively provided with a beam position detector and a correcting magnet; on the short straight section, the beam position detector and the correcting magnet are superposed; on the long straight section, the beam position detector and the correcting magnet are arranged in an overlapping or separated mode;
for the stripping injection scheme, two convex rail magnets are arranged on the long straight section where the first lead-out cutting magnet is located, and the rest convex rail magnets are respectively arranged on the rest long straight sections one by one; two convex rail magnets which are arranged on the long straight section where the first leading-out cutting magnet is arranged are respectively arranged at two ends of the long straight section; the convex rail magnet positioned on the long straight section where the leading-out electrostatic cutter is positioned is arranged at the downstream of the leading-out electrostatic cutter; the convex rail magnet positioned on the long straight joint where the injection cutting magnet is positioned is arranged between the quadrupole magnet on the long straight joint and the injection cutting magnet; the convex rail magnet on the long straight section opposite to the injection cutting magnet is arranged at the downstream of the quadrupole magnet on the long straight section;
or for the multi-circle injection scheme, two convex rail magnets are arranged on the long straight section where the injection cutting magnet is located, and the rest convex rail magnets are respectively arranged on the rest long straight sections one by one; two convex rail magnets which are arranged on the long straight section where the injection cutting magnet is positioned are respectively arranged at two ends of the long straight section; the convex rail magnet positioned on the long straight section where the leading-out electrostatic cutter is positioned is arranged at the downstream of the leading-out electrostatic cutter; the convex rail magnet on the long straight section where the first lead-out cutting magnet is located is arranged on the upstream of the four-pole magnet on the long straight section; a convex rail magnet located on the long straight section opposite the injection cut magnet is disposed downstream of the four-pole magnet on the long straight section.
2. The miniaturized ion synchrotron of claim 1,
the convex rail magnet arranged on the long straight section where the leading-out electrostatic cutter is positioned, and the convex rail magnet between the quadrupole iron of the downstream long straight section and the injection cutting magnet are injection and leading-out common convex rail magnets; the convex rail magnet of the long straight section at the upstream of the leading-out electrostatic cutter is a leading-out convex rail magnet; the other convex track magnets are injection convex track magnets.
3. The miniaturized ion synchrotron of claim 1 further comprising a transverse high frequency excitation and high frequency acceleration cavity sequentially disposed on the long straight section opposite to the implant-cut magnet and between the quadrupole magnet and the convex-track magnet on the long straight section.
4. The miniaturized ion synchrotron of any one of claims 1 to 3, further comprising two resonant hexapole magnets, wherein one resonant hexapole magnet is disposed on the long straight section on which the extraction electrostatic cutter is disposed, and upstream of the quadrupolar magnet on the long straight section;
and the other resonant six-pole magnet is arranged on the long straight section where the first lead-out cutting magnet is positioned and is positioned at the upstream of the four-pole magnet on the long straight section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210573773.3A CN115003004B (en) | 2022-05-25 | 2022-05-25 | Miniaturized ion synchrotron |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210573773.3A CN115003004B (en) | 2022-05-25 | 2022-05-25 | Miniaturized ion synchrotron |
Publications (2)
| Publication Number | Publication Date |
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| CN115003004A CN115003004A (en) | 2022-09-02 |
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| CN113209501B (en) * | 2021-06-08 | 2023-06-20 | 兰州科近泰基新技术有限责任公司 | Miniaturized ion ray treatment device |
| CN113382529B (en) * | 2021-06-08 | 2024-03-29 | 兰州科近泰基新技术有限责任公司 | Superconducting ion annular synchrotron |
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