CN114964523B - Wavefront sensor adjustment method for active optical correction system - Google Patents
Wavefront sensor adjustment method for active optical correction system Download PDFInfo
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- G—PHYSICS
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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Abstract
The invention provides a wavefront sensor adjusting method for an active optical correction system, which comprises the following steps: s1: the method comprises the steps of respectively obtaining a test view field position and a test wave aberration of each wavefront sensor through wavefront testing; s2: visualizing a test field of view position of each wavefront sensor; s3: preliminarily installing a wavefront sensing tool; s4: positioning each wavefront sensor on the wavefront sensing tool at a corresponding test field of view position; s5: performing wave aberration test to obtain actual wave aberration of the corresponding wavefront sensor; s6: and comparing the actual wave aberration with the test wave aberration, and adjusting the wave front sensing tool according to the comparison result until the comparison result is smaller than a preset residual error RMS threshold value, thereby finally completing the assembly and adjustment of the precision test assembly. The invention provides a wavefront sensor adjusting method for an active optical correction system, which solves the problem that the wavefront sensor is difficult to install at the correct view field position in the correction capability verification stage of the active optical correction system commonly used at present.
Description
Technical Field
The invention relates to the technical field of optical system adjustment, in particular to a wavefront sensor adjustment method for an active optical correction system.
Background
With the continuous development of science and technology, large-caliber optical imaging systems play a very important role in various fields such as astronomical science, earth science, military application, civil production and the like. The caliber of the optical imaging system is continuously increased, the focal length is continuously increased, the whole envelope size of the optical imaging system is increased, when the supporting structure of the optical imaging system is influenced by factors such as temperature or external force, the structure of the optical imaging system can deform, so that the relative positions of different optical elements in the system are changed, simultaneously, the state between an optical mirror surface and the supporting structure can be changed due to the influence of external factors, the stress change of different parts of the mirror surface can be caused, the deformation of the mirror surface is caused, the problems can cause the reduction of the imaging quality of the optical imaging system, the observation performance of the optical imaging system is reduced, and further, effective data cannot be obtained, so that huge economic loss is caused, and the larger caliber of the optical imaging system is more remarkable due to the influence of external factors such as gravity and environment.
The active optical correction technology is an effective means for ensuring the imaging quality of the optical imaging system, and mainly aims at developing pose and aberration correction of the optical imaging system with reduced imaging quality, so that the imaging quality is restored to a normal working state, and the effective data acquisition of the optical imaging system is ensured. In the conventional active optical correction system, wavefront sensors are generally added at a plurality of positions of an image plane of an optical imaging system which is installed and completed to serve as wavefront receiving devices, when the imaging quality of the optical imaging system is reduced due to the influence of external factors, wavefront aberration data of different visual fields which are reduced are simultaneously acquired by each wavefront detector, vector adjustment between optical elements is calculated by utilizing an active optical algorithm, then an actuator and a multidimensional adjusting table at the back of the optical elements are adjusted according to a calculation result, the relative positions between the optical elements are adjusted to be in a correct state, and real-time adjustment of the imaging quality of the optical imaging system is realized, so that the system wave aberration is ensured to meet the imaging quality requirement. However, in the correction capability verification stage before the actual correction work is performed, the wavefront sensor is difficult to install at the correct view field position in the active optical correction system commonly used at present, so that the measured wave aberration data is easy to deviate, the correction accuracy cannot be ensured, and the test and verification are often required to be carried out through multiple times of disassembly and assembly, which is complex.
Disclosure of Invention
The invention provides a wavefront sensor adjusting method for an active optical correction system, which aims to overcome the technical defect that a wavefront sensor is difficult to install at a correct view field position in a correction capability verification stage of the active optical correction system which is commonly used at present.
In order to solve the technical problems, the technical scheme of the invention is as follows:
a method of tuning a wavefront sensor for an active optical correction system, comprising the steps of:
s1: determining the focal plane position of an optical imaging system to be corrected, placing a laser interferometer on the determined focal plane, setting a standard plane mirror, the optical imaging system and the laser interferometer to form an auto-collimation test light path, and respectively obtaining the test view field position and test wave aberration of each wavefront sensor through wavefront testing;
s2: visualizing a test field of view position of each wavefront sensor;
s3: removing the laser interferometer, initially installing a wavefront sensing tool on the focal plane of the optical imaging system,
the wavefront sensing tool is provided with a plurality of mechanical interfaces for installing a wavefront sensor, and a test point light source is arranged around each mechanical interface in a matching way; the bottom of the wavefront sensing tool is provided with a multidimensional adjusting mechanism for adjusting the pose of the wavefront sensing tool;
s4: utilizing a multidimensional adjusting mechanism to enable each wavefront sensor on the wavefront sensing tool to be positioned at a corresponding test view field position;
s5: respectively utilizing each test point light source to perform wave aberration test of the corresponding field of view to obtain actual wave aberration of the corresponding wavefront sensor;
s6: calculating an actual residual RMS (Root Mean Square) value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold,
if the actual residual error RMS value is smaller than the preset residual error RMS threshold value, fixing the wavefront sensing tool, and finishing adjustment;
and if the actual residual error RMS value is not smaller than the preset residual error RMS threshold value, adjusting the wavefront sensing tool through a multidimensional adjusting mechanism, and returning to the step S5.
In the scheme, the laser interferometer is used for acquiring the test view field position and the test wave aberration of each wavefront sensor, and the test view field position of each wavefront sensor is visualized; then, a wavefront sensing tool is installed according to the visual test view field position, and a wave aberration test is conducted by utilizing a test point light source on the wavefront sensing tool so as to obtain the actual wave aberration of the corresponding wavefront sensor; the actual wave aberration is compared with the test wave aberration, and the wavefront sensing tool is adjusted according to the comparison result until the comparison result is smaller than the preset residual error RMS threshold value, so that the assembly and adjustment of the precision test assembly are finally completed, the wavefront sensor is accurately installed in the correction precision test of the active optical correction system in the initial assembly and adjustment stage of the optical imaging system, and the device has the characteristic of being high in universality.
Preferably, in step S2, the test field position of each wavefront sensor is visualized using a laser tracker and standard spherical mirrors.
Preferably, the specific step of visualizing the test field position of the wavefront sensor is:
s2.1: placing a standard spherical mirror in front of the laser interferometer to form a self-alignment light path, so as to obtain interference fringes;
s2.2: adjusting the position of the standard spherical mirror according to the interference fringes to enable the spherical center of the standard spherical mirror to coincide with the focus of the laser interferometer;
s2.3: placing a test target ball of a laser tracker at any position on a standard spherical mirror surface, recording the position of the test target ball through the laser tracker, and repeating for a plurality of times to obtain a plurality of different positions of the test target ball on the standard spherical mirror surface;
s2.4: fitting the sphere center position of the standard spherical mirror according to the plurality of different positions obtained in the step S2.3, wherein the obtained sphere center position is the test view field position, and completing the visualization of the test view field position.
Preferably, in step S4,
and (3) respectively placing a test target ball of a laser tracker on the surface of each wavefront sensor, acquiring the position of each wavefront sensor through the laser tracker, and then adjusting the multidimensional adjusting mechanism according to the spherical center position of each standard spherical mirror obtained in the step (S2.3) to enable the positions of the wavefront sensors to correspond to the spherical center positions of the standard spherical mirrors one by one, so that each wavefront sensor is positioned at the corresponding test view field position.
Preferably, the multidimensional adjusting mechanism is a six-dimensional adjusting mechanism and is used for adjusting the positions of front and back, left and right, up and down, pitching, swaying and rolling of the wavefront sensing tool.
Preferably, in step S5, the test light beams emitted by the test point light sources sequentially pass through the optical imaging system and the standard plane mirror, and then return in the original path, and are received by the corresponding wavefront sensors, so as to obtain the actual wave aberration.
Preferably, the frame size of the wavefront sensing tool is consistent with the image plane size of the optical imaging system.
Preferably, the test point light source is an LED light source.
Preferably, the number of the wavefront sensors is 2 to 4.
Preferably, the test point light source is 20mm from the edge of the matched wavefront sensor.
Compared with the prior art, the technical scheme of the invention has the beneficial effects that:
the invention provides a wavefront sensor adjusting method for an active optical correction system, which comprises the steps of obtaining a test view field position and a test wave aberration of each wavefront sensor by using a laser interferometer, and visualizing the test view field position of each wavefront sensor; then, a wavefront sensing tool is installed according to the visual test view field position, and a wave aberration test is conducted by utilizing a test point light source on the wavefront sensing tool so as to obtain the actual wave aberration of the corresponding wavefront sensor; the actual wave aberration is compared with the test wave aberration, and the wavefront sensing tool is adjusted according to the comparison result until the comparison result is smaller than the preset residual error RMS threshold value, so that the assembly and adjustment of the precision test assembly are finally completed, the wavefront sensor is accurately installed in the correction precision test of the active optical correction system in the initial assembly and adjustment stage of the optical imaging system, and the device has the characteristic of being high in universality.
Drawings
FIG. 1 is a flow chart of the steps performed in the technical scheme of the invention;
FIG. 2 is a schematic diagram of an auto-collimation test light path formed by a standard plane mirror, an optical imaging system and a laser interferometer in the present invention;
FIG. 3 is a schematic diagram of a self-aligning optical path formed by a standard spherical mirror and a laser interferometer according to the present invention;
FIG. 4 is a schematic diagram of a wave aberration test performed by using each test point light source according to the present invention;
wherein: 1. an optical imaging system; 2. a laser interferometer; 3. a standard plane mirror; 4. a laser tracker; 41. testing a target ball; 5. a standard spherical mirror; 6. a wave front sensing tool; 7. a six-dimensional adjusting mechanism; A. a wavefront sensor a; B. a wavefront sensor B; C. a wavefront sensor C; D. a wavefront sensor D; a. a test point light source a; b. a test point light source b; c. a test point light source c; d. test point light source d.
Detailed Description
The drawings are for illustrative purposes only and are not to be construed as limiting the present patent;
for the purpose of better illustrating the embodiments, certain elements of the drawings may be omitted, enlarged or reduced and do not represent the actual product dimensions;
it will be appreciated by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
The technical scheme of the invention is further described below with reference to the accompanying drawings and examples.
Example 1
As shown in fig. 1, a wavefront sensor tuning method for an active optical correction system includes the steps of:
s1: determining the focal plane position of an optical imaging system 1 to be corrected, placing a laser interferometer 2 on the determined focal plane, and setting a standard plane mirror 3, the optical imaging system 1 and the laser interferometer 2 to form an auto-collimation test light path, wherein the test view field position and the test wave aberration of each wavefront sensor are respectively obtained through wavefront testing as shown in fig. 2;
s2: visualizing a test field of view position of each wavefront sensor;
s3: the laser interferometer 2 is removed, a wavefront sensing tool 6 is initially installed on the focal plane of the optical imaging system 1,
the wavefront sensing tool 6 is provided with a plurality of mechanical interfaces for installing a wavefront sensor, and a test point light source is arranged around each mechanical interface in a matching way; the bottom of the wavefront sensing tool 6 is provided with a multidimensional adjusting mechanism for adjusting the pose of the wavefront sensing tool 6;
s4: each wavefront sensor on the wavefront sensing tool 6 is positioned at a corresponding test view field position by utilizing a multidimensional adjusting mechanism;
s5: respectively utilizing each test point light source to perform wave aberration test of the corresponding field of view to obtain actual wave aberration of the corresponding wavefront sensor;
s6: calculating an actual residual RMS (Root Mean Square) value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold,
if the actual residual error RMS value is smaller than the preset residual error RMS threshold value, fixing the wavefront sensing tool 6, and finishing the adjustment;
if the actual residual RMS value is not less than the preset residual RMS threshold, the wavefront sensing tool 6 is adjusted by the multidimensional adjustment mechanism, and the step S5 is returned.
In the specific implementation process, the laser interferometer 2 is utilized to acquire the test view field position and the test wave aberration of each wavefront sensor, and the test view field position of each wavefront sensor is visualized; then, a wavefront sensing tool 6 is installed according to the visual test view field position, and a wave aberration test is conducted by utilizing a test point light source on the wavefront sensing tool 6 so as to obtain the actual wave aberration of the corresponding wavefront sensor; the actual wave aberration is compared with the test wave aberration, the wavefront sensing tool 6 is adjusted according to the comparison result until the comparison result is smaller than the preset residual error RMS threshold value, so that the assembly and adjustment of the precision test assembly are finally completed, the wavefront sensor is accurately installed in the correction precision test of the active optical correction system in the initial assembly and adjustment stage of the optical imaging system 1, and the device has the characteristic of higher universality.
Example 2
A method of tuning a wavefront sensor for an active optical correction system, comprising the steps of:
s1: determining the focal plane position of an optical imaging system 1 to be corrected, placing a laser interferometer 2 on the determined focal plane, setting a standard plane mirror 3, forming an auto-collimation test light path with the optical imaging system 1 and the laser interferometer 2, and respectively obtaining the test view field position and test wave aberration of each wavefront sensor through wavefront testing;
before wavefront testing, the position of the laser interferometer 2 on the focal plane is adjusted for each wavefront sensor, so that the focal position of the laser interferometer 2 is on the theoretical field of view of the wavefront sensor to be adjusted, and corresponds to the wavefront sensor to be adjusted.
More specifically, the number of the wavefront sensors is 2 to 4.
S2: visualizing a test field of view position of each wavefront sensor;
more specifically, in step S2, the test field positions of the individual wavefront sensors are visualized using a laser tracker 4 and a standard spherical mirror 5.
More specifically, as shown in fig. 3, the specific steps of visualizing the test field position of the wavefront sensor are:
s2.1: placing a standard spherical mirror 5 in front of the laser interferometer 2 to form a self-aligning light path, so as to obtain interference fringes;
s2.2: adjusting the position of the standard spherical mirror 5 according to the interference fringes so that the spherical center of the standard spherical mirror coincides with the focus of the laser interferometer 2;
s2.3: placing the test target ball 41 of the laser tracker 4 at any position on the mirror surface of the standard spherical mirror 5, recording the position of the test target ball 41 through the laser tracker 4, and repeating for a plurality of times to obtain a plurality of different positions of the test target ball 41 on the mirror surface of the standard spherical mirror 5;
in practice, the laser tracker 4 can automatically construct a coordinate system and record the position of the test target ball 41 in the form of coordinates.
S2.4: fitting the sphere center position of the standard spherical mirror 5 according to the plurality of different positions obtained in the step S2.3, wherein the obtained sphere center position is the test view field position, and completing the visualization of the test view field position.
And (3) realizing the position visualization of the test field of view of each wavefront sensor through the steps S2.1-S2.4.
S3: the laser interferometer 2 and the standard spherical mirror 5 arranged in front of the laser interferometer are removed, a wavefront sensing tool 6 is initially arranged on the focal plane of the optical imaging system 1,
the wavefront sensing tool 6 is provided with a plurality of mechanical interfaces for installing the wavefront sensor, a test point light source is arranged around each mechanical interface in a matching way, and the test point light source is a certain distance away from the mechanical interfaces so as to ensure that the test point light source is not blocked after the wavefront sensor is installed; the bottom of the wavefront sensing tool 6 is provided with a multidimensional adjusting mechanism for adjusting the pose of the wavefront sensing tool 6;
s4: each wavefront sensor on the wavefront sensing tool 6 is positioned at a corresponding test view field position by utilizing a multidimensional adjusting mechanism;
more specifically, in step S4,
and (2) respectively placing a test target ball 41 of a laser tracker 4 on the surface of each wavefront sensor, acquiring the position of each wavefront sensor through the laser tracker 4, and then adjusting a multidimensional adjusting mechanism according to the spherical center position of each standard spherical mirror 5 obtained in the step (S2.3) to enable the positions of the wavefront sensors to correspond to the spherical center positions of the standard spherical mirrors 5 one by one, so that each wavefront sensor is positioned at the corresponding test view field position.
S5: respectively utilizing each test point light source to perform wave aberration test of the corresponding field of view to obtain actual wave aberration of the corresponding wavefront sensor;
more specifically, in step S5, the test light beams emitted by the test point light sources sequentially pass through the optical imaging system 1 and the standard plane mirror 3, and then return in the original path, and are received by the corresponding wavefront sensors, so as to obtain the actual wave aberration.
S6: calculating an actual residual RMS (Root Mean Square) value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold,
if the actual residual error RMS value is smaller than the preset residual error RMS threshold value, fixing the wavefront sensing tool 6, and finishing the adjustment;
if the actual residual RMS value is not less than the preset residual RMS threshold, the wavefront sensing tool 6 is adjusted by the multidimensional adjustment mechanism, and the step S5 is returned.
Example 3
A method for tuning wavefront sensors of an active optical correction system, the number of the wavefront sensors being 4, namely a wavefront sensor a, a wavefront sensor B, a wavefront sensor C and a wavefront sensor D, comprising the steps of:
s1: determining the focal plane position of an optical imaging system 1 to be corrected, placing a laser interferometer 2 on the determined focal plane, and setting a standard plane mirror 3;
taking a wavefront sensor A as an example, adjusting the position of the laser interferometer 2 on a focal plane, enabling the focal position of the laser interferometer 2 to be on a theoretical view field of the wavefront sensor A, adjusting a standard plane mirror 3, enabling the standard plane mirror 3, the optical imaging system 1 and the laser interferometer 2 to form an auto-collimation test light path, and obtaining the test view field position and test wave aberration of the wavefront sensor A through wavefront test;
according to the above example, the test field positions and the test wave aberrations of the wavefront sensor B, the wavefront sensor C, and the wavefront sensor D are acquired, respectively;
s2: visualizing a test field of view position of each wavefront sensor;
more specifically, in step S2, the test field positions of the individual wavefront sensors are visualized using a laser tracker 4 and a standard spherical mirror 5.
More specifically, the method comprises the steps of,
taking the wavefront sensor a as an example, the specific steps of making the laser interferometer 2 near the wavefront sensor a and visualizing the position of the test field of view of the wavefront sensor a are as follows:
s2.1: placing a standard spherical mirror 5 in front of the laser interferometer 2 to form a self-aligning light path, so as to obtain interference fringes;
s2.2: adjusting the position of the standard spherical mirror 5 according to the interference fringes so that the spherical center of the standard spherical mirror coincides with the focus of the laser interferometer 2; at this time, the position of the sphere center of the standard spherical mirror 5 is the position of the test field of view corresponding to the wavefront sensor a;
s2.3: placing the test target ball 41 of the laser tracker 4 at any position on the mirror surface of the standard spherical mirror 5, recording the position of the test target ball 41 through the laser tracker 4, and repeating for a plurality of times to obtain a plurality of different positions of the test target ball 41 on the mirror surface of the standard spherical mirror 5;
in this embodiment, 10 different positions of the test target ball 41 on the mirror surface of the standard spherical mirror 5 are obtained by repeating 10 times;
s2.4: fitting the sphere center position of the standard spherical mirror 5 according to the plurality of different positions obtained in the step S2.3, wherein the obtained sphere center position is the test view field position, and completing the visualization of the test view field position.
In accordance with the above example, the test field-of-view positions of the wavefront sensor B, the wavefront sensor C, and the wavefront sensor D are visualized, respectively. The caliber and the curvature radius of the standard spherical mirror 5 adopted by the wavefront sensor at the same horizontal position are the same, and the wavefront sensor comprises but is not limited to adopting the standard spherical mirror 5 with the caliber of 30mm and the curvature radius of 450mm or the standard spherical mirror 5 with the caliber of 20mm and the curvature radius of 300 mm.
S3: the laser interferometer 2 and the standard spherical mirror 5 arranged in front of the laser interferometer are removed, a wavefront sensing tool 6 is initially arranged on the focal plane of the optical imaging system 1,
in this embodiment, the wavefront sensing tool 6 is made of invar material, so as to ensure stability of the structure; the bottom of the wavefront sensing tool 6 is provided with a six-dimensional adjusting mechanism 7 for adjusting the positions and postures of the wavefront sensing tool 6, namely front and back, left and right, up and down, pitching, swaying and rolling, and the six-dimensional adjusting mechanism 7 is used as a main supporting structure of the wavefront sensing tool 6 and has a locking function; the wavefront sensing tool 6 is also provided with an interface connected with the optical platform; the frame size of the wavefront sensing tool 6 is consistent with the image plane size of the optical imaging system 1, the four wavefront sensing fields of view are respectively positioned at four corners of the image plane, such as (-0.9 degrees, 0.9 degrees), 0.9 degrees and 0.9 degrees,) and mechanical interfaces for installing the wavefront sensors are reserved at the positions of each wavefront sensing field of view, the four wavefront sensors are ensured to be stably connected with the wavefront sensing tool 6 through structural design, and the relative positions among the four wavefront sensors are not influenced by the change of surrounding environment; and a test point light source is arranged around each mechanical interface in a matching way, namely a test point light source a, a test point light source b, a test point light source c and a test point light source d, and the test point light source is a certain distance away from the mechanical interface so as to ensure that the test point light source is not blocked after the wavefront sensor is installed.
More specifically, the test point light source is an LED light source.
More specifically, the test point light source is 20mm from the edge of the matched wavefront sensor.
S4: each wavefront sensor on the wavefront sensing tool 6 is positioned at a corresponding test view field position by utilizing a multidimensional adjusting mechanism;
more specifically, in step S4,
and (2) respectively placing a test target ball 41 of a laser tracker 4 on the surface of each wavefront sensor, acquiring the position of each wavefront sensor through the laser tracker 4, and then adjusting a multidimensional adjusting mechanism according to the spherical center position of each standard spherical mirror 5 obtained in the step (S2.3) to enable the positions of the wavefront sensors to correspond to the spherical center positions of the standard spherical mirrors 5 one by one, so that each wavefront sensor is positioned at the corresponding test view field position.
S5: respectively utilizing each test point light source to perform wave aberration test of the corresponding field of view to obtain actual wave aberration of the corresponding wavefront sensor;
more specifically, in step S5, the test light beams emitted by the test point light sources sequentially pass through the optical imaging system 1 and the standard plane mirror 3, and then return in the original path, and are received by the corresponding wavefront sensors, so as to obtain the actual wave aberration.
S6: calculating an actual residual RMS (Root Mean Square) value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold,
if the actual residual error RMS value is smaller than the preset residual error RMS threshold value, fixing the wavefront sensing tool 6, and finishing the adjustment;
if the actual residual RMS value is not less than the preset residual RMS threshold, the wavefront sensing tool 6 is adjusted by the multidimensional adjustment mechanism, and the step S5 is returned.
In the specific implementation process, the range of the residual error RMS threshold value is generally 5-15 nm, the residual error RMS threshold value can be selected or adjusted according to actual conditions, and the residual error RMS threshold value is generally preset to be 10nm, so that the precision is high and the universality is strong.
It is to be understood that the above examples of the present invention are provided by way of illustration only and not by way of limitation of the embodiments of the present invention. Other variations or modifications of the above teachings will be apparent to those of ordinary skill in the art. It is not necessary here nor is it exhaustive of all embodiments. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the invention are desired to be protected by the following claims.
Claims (7)
1. A method for tuning a wavefront sensor of an active optical correction system, comprising the steps of:
s1: determining the focal plane position of an optical imaging system to be corrected, placing a laser interferometer on the determined focal plane, setting a standard plane mirror, the optical imaging system and the laser interferometer to form an auto-collimation test light path, and respectively obtaining the test view field position and test wave aberration of each wavefront sensor through wavefront testing;
s2: visualizing a test field of view position of each wavefront sensor; in step S2, the position of a test field of view of each wavefront sensor is visualized by adopting a laser tracker and a standard spherical mirror;
the specific steps of visualizing the test view field position of the wavefront sensor are as follows:
s2.1: placing a standard spherical mirror in front of the laser interferometer to form a self-alignment light path, so as to obtain interference fringes;
s2.2: adjusting the position of the standard spherical mirror according to the interference fringes to enable the spherical center of the standard spherical mirror to coincide with the focus of the laser interferometer;
s2.3: placing a test target ball of a laser tracker at any position on a standard spherical mirror surface, recording the position of the test target ball through the laser tracker, and repeating for a plurality of times to obtain a plurality of different positions of the test target ball on the standard spherical mirror surface;
s2.4: fitting the sphere center position of the standard spherical mirror according to the plurality of different positions obtained in the step S2.3, wherein the obtained sphere center position is the test view field position, and completing the visualization of the test view field position;
s3: removing the laser interferometer, initially installing a wavefront sensing tool on the focal plane of the optical imaging system,
the wavefront sensing tool is provided with a plurality of mechanical interfaces for installing a wavefront sensor, and a test point light source is arranged around each mechanical interface in a matching way; the bottom of the wavefront sensing tool is provided with a multidimensional adjusting mechanism for adjusting the pose of the wavefront sensing tool;
s4: utilizing a multidimensional adjusting mechanism to enable each wavefront sensor on the wavefront sensing tool to be positioned at a corresponding test view field position; in the step S4 of the process of the present invention,
placing a test target ball of a laser tracker on the surface of each wavefront sensor, acquiring the position of each wavefront sensor through the laser tracker, and then adjusting a multidimensional adjusting mechanism according to the spherical center position of each standard spherical mirror obtained in the step S2.3 to enable the positions of the wavefront sensors to be in one-to-one correspondence with the spherical center positions of the standard spherical mirrors, so that each wavefront sensor is positioned at the corresponding test view field position;
s5: respectively utilizing each test point light source to perform wave aberration test of the corresponding field of view to obtain actual wave aberration of the corresponding wavefront sensor;
s6: calculating an actual residual RMS value of the actual wave aberration and the test wave aberration, and comparing the actual residual RMS value with a preset residual RMS threshold,
if the actual residual error RMS value is smaller than the preset residual error RMS threshold value, fixing the wavefront sensing tool, and finishing adjustment;
and if the actual residual error RMS value is not smaller than the preset residual error RMS threshold value, adjusting the wavefront sensing tool through a multidimensional adjusting mechanism, and returning to the step S5.
2. The method for adjusting a wavefront sensor of an active optical correction system of claim 1, wherein the multi-dimensional adjustment mechanism is a six-dimensional adjustment mechanism for adjusting the positions of the wavefront sensor fixture in front-back, left-right, up-down, pitch, yaw, and roll.
3. The method according to claim 1, wherein in step S5, the test light beams emitted from the test point light sources sequentially pass through the optical imaging system and the standard plane mirror, and are returned to the original path, and received by the corresponding wavefront sensors, so as to obtain the actual wave aberration.
4. The method for adjusting a wavefront sensor of an active optical correction system of claim 1, wherein the frame size of the wavefront sensing tooling is consistent with the image plane size of the optical imaging system.
5. The method of claim 1, wherein the test point light source is an LED light source.
6. The method for adjusting wavefront sensors of claim 1, wherein the number of wavefront sensors is 2-4.
7. A wavefront sensor tuning method for an active optical correction system as in claim 1 wherein said test point light source distance matches 20mm of the edge of the wavefront sensor.
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