CN114953422A - High-temperature-resistant back plate continuous processing device and processing technology thereof - Google Patents
High-temperature-resistant back plate continuous processing device and processing technology thereof Download PDFInfo
- Publication number
- CN114953422A CN114953422A CN202210570050.8A CN202210570050A CN114953422A CN 114953422 A CN114953422 A CN 114953422A CN 202210570050 A CN202210570050 A CN 202210570050A CN 114953422 A CN114953422 A CN 114953422A
- Authority
- CN
- China
- Prior art keywords
- back plate
- temperature
- roller
- frame structure
- support frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005516 engineering process Methods 0.000 title claims abstract description 21
- 239000002184 metal Substances 0.000 claims abstract description 52
- 229910052751 metal Inorganic materials 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 claims abstract description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000007888 film coating Substances 0.000 claims abstract description 16
- 238000009501 film coating Methods 0.000 claims abstract description 16
- 239000000741 silica gel Substances 0.000 claims abstract description 15
- 229910002027 silica gel Inorganic materials 0.000 claims abstract description 15
- 238000004804 winding Methods 0.000 claims description 45
- 238000001816 cooling Methods 0.000 claims description 44
- 239000000463 material Substances 0.000 claims description 35
- 238000010030 laminating Methods 0.000 claims description 16
- 238000007599 discharging Methods 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 230000010287 polarization Effects 0.000 claims description 8
- 230000032683 aging Effects 0.000 claims description 4
- 230000000452 restraining effect Effects 0.000 claims 1
- 230000009471 action Effects 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 40
- 239000012528 membrane Substances 0.000 description 15
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 11
- 239000004810 polytetrafluoroethylene Substances 0.000 description 11
- 238000005476 soldering Methods 0.000 description 9
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 239000010935 stainless steel Substances 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910000570 Cupronickel Inorganic materials 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 235000014692 zinc oxide Nutrition 0.000 description 5
- 239000011787 zinc oxide Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000003490 calendering Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000012982 microporous membrane Substances 0.000 description 2
- -1 polytetrafluoroethylene Polymers 0.000 description 2
- 240000001398 Typha domingensis Species 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 210000002489 tectorial membrane Anatomy 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
- B29C63/02—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor using sheet or web-like material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
- B29C63/0004—Component parts, details or accessories; Auxiliary operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
- B29C63/0065—Heat treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
- B29C63/48—Preparation of the surfaces
- B29C63/486—Preparation of the surfaces of metal surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H16/00—Unwinding, paying-out webs
- B65H16/02—Supporting web roll
- B65H16/06—Supporting web roll both-ends type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H18/00—Winding webs
- B65H18/02—Supporting web roll
- B65H18/028—Both ends type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H23/00—Registering, tensioning, smoothing or guiding webs
- B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
- B65H23/26—Registering, tensioning, smoothing or guiding webs longitudinally by transverse stationary or adjustable bars or rollers
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention belongs to the technical field of back pole plate production and processing, and particularly relates to a high-temperature-resistant back pole plate continuous processing device and a processing technology thereof. The invention can continuously carry out film coating production on the metal substrate main body and the film main body for producing the high-temperature-resistant back plate, and can coat a film under certain pressure through high temperature under the action of the electromagnetic lower preheating roller, the electromagnetic upper preheating roller, the silica gel roller and the electromagnetic heating roller, thereby achieving the stability during charge electret, ensuring the product consistency of the back plate and greatly improving the production efficiency.
Description
Technical Field
The invention belongs to the technical field of production and processing of back plates, and particularly relates to a high-temperature-resistant back plate continuous processing device and a processing technology thereof.
Background
The PTFE membrane is a microporous membrane produced by adopting polytetrafluoroethylene dispersion resin through special processes such as premixing, extruding, calendaring, biaxial stretching and the like, and is divided into a clothing membrane, a cattail micro waterproof membrane, a filtering membrane and a purifying membrane. The PTFE membrane is a microporous membrane prepared from polytetrafluoroethylene by adopting a special process and adopting methods such as calendering, extruding, biaxial stretching and the like. PTFE membranes can be classified into clothing membranes, air filtration membranes and air purification membranes according to purposes. The PTFE membrane has a fibril-like microporous structure with a porosity of more than 85%, 14 hundred million micropores per square centimeter, and a pore diameter ranging from 0.02 mu m to 15 mu m.
A microphone is an electroacoustic device that converts sound waves into electrical signals. A higher signal-to-noise ratio of a microphone indicates that it produces less noise. The larger the signal-to-noise ratio, the smaller the noise mixed in the signal, the higher the sound quality of the sound playback, otherwise the opposite. The signal-to-noise ratio is the ratio of the microphone sensitivity to the intrinsic noise. The method for improving the signal-to-noise ratio comprises the following steps: the sensitivity is improved and the inherent noise is reduced; the conventional electret condenser microphone is limited by the background noise of circuit components and parts and the thermal noise of the components, so that the inherent noise is difficult to reduce; the signal to noise ratio is improved only by improving the sensitivity; the sensitivity, which represents the acoustoelectric conversion ratio of the microphone, means the open-circuit output of the microphone when an acoustic signal with a sound pressure of 1 Pa (Pa) or 1 microbar (ubar) is applied to the microphone in a free sound field. To increase the sensitivity, it is necessary to increase the open circuit output of the microphone.
The microphone product is widely applied to electronic products such as earphones, conference systems, mobile phones and computers, along with the fact that the requirements of consumer groups on sound are higher and higher, the electret microphone and the back plate serving as a main accessory of the electret microphone are produced, the main manufacturing process is that a metal base material is subjected to surface treatment (generally nickel plating) and then compounded with an FEP film, the metal base material serves as a conductor, the film serves as an insulating layer and has dielectric performance, electret charge is arranged on the film, the consistency and stability of the electret charge can have important influence on the sensitivity of the sound of the microphone, the back plate product is made into a sheet material film at first and cannot meet higher market requirements, particularly along with the rising of various short video platforms, the requirements of various application scenes on the fidelity, the definition and the like of the sound are higher and higher quality back plate products are needed to meet the market requirements.
Industrial manufacturing requires higher and higher automation degree, microphone pastes dress automation and needs high temperature reflow soldering to realize, and after the microphone equipment was accomplished, when the highest high temperature about 265 degrees of traditional FEP film back plate process reflow soldering, electric charge lost basically, leads to the microphone performance inefficacy. The developed PTFE film back plate can still retain the charge quantity enough to realize the performance of the back plate when passing through high temperature of about 265 ℃, and can meet the requirement of high-temperature reflow soldering. The microphone can be more suitable for the change of the environment in the subsequent use, and a large amount of manpower is saved in the manufacturing process.
Therefore, it is very necessary to provide a high temperature resistant back plate continuous processing device and a processing technology thereof.
Disclosure of Invention
In order to solve the technical problems, the invention provides a high-temperature-resistant back plate continuous processing device and a processing technology thereof, which can achieve good consistency and stability of a back plate product and reduce loss of charges.
A high-temperature-resistant back electrode plate continuous processing device comprises a substrate feeding frame structure, a preheating roller assembly, a film coating feeding frame structure, a laminating composition frame structure, a cooling roller structure, a power supporting cabinet, a finished product winding frame structure and a back electrode plate finished product belt, wherein the substrate feeding frame structure, the preheating roller assembly, the film coating feeding frame structure, the laminating composition frame structure, the cooling roller structure and the finished product winding frame structure are sequentially and independently arranged from left to right; the base material feeding frame structure, the preheating roller assembly, the film coating feeding frame structure and the laminating composition frame structure are arranged in a laminating mode, and the mutual distance between the cooling roller structure and the finished product winding frame structure is set to be between thirty centimeters and sixty centimeters according to the production rate of the finished back plate strip; the laminating and placing frame structure and the cooling roller structure are connected to the upper part of the power supporting cabinet through bolts from left to right; the back plate finished product belt is wound on the upper part of the finished product winding frame structure after coming out of the cooling roller structure; the base material discharging frame structure comprises a first supporting frame body, a discharging shaft, a metal base material winding drum and a metal base material main body; the discharging shaft is clamped at the upper part of the inner side of the first support frame body; the metal base material winding drum is sleeved on the outer surface of the discharging shaft; the metal base material main body is wound on the outer side of the metal base material winding drum.
Preferably, the preheating roller assembly comprises a second support frame body, an electromagnetic lower preheating roller, an electromagnetic upper preheating roller and a first tightness adjusting frame, wherein the electromagnetic lower preheating roller is connected to the upper part of the inner side of the second support frame body in a shaft connection mode; the first tightness adjusting frame is connected to the upper part of the second support frame body through a bolt; the electromagnetic preheating roller is connected to the inner side of the first tightness adjusting frame in a rolling mode.
Preferably, the film covering and discharging frame structure comprises a third supporting frame body, a substrate guide rod, a feeding shaft, a film expansion roller, a film winding drum and a film main body, wherein the substrate guide rod is embedded in the lower part of the inner side of the third supporting frame body; the feeding shaft is embedded in the upper side position inside the third support frame body; the film expansion rollers are sleeved on two outer sides of the feeding shaft; the film winding drum is sleeved at the middle position outside the feeding shaft; the film main body is wound on the outer surface of the film reel.
Preferably, the laminating composition frame structure comprises a fourth support frame body, a direction adjusting frame, a silica gel roller, an electromagnetic heating roller and a primary back plate, wherein the direction adjusting frame is connected to the upper part of the fourth support frame body through a screw; the silica gel roller is coupled to the inner side of the direction adjusting frame; the electromagnetic heating roller is embedded in the upper part of the inner side of the fourth support frame body; and the primary back plate penetrates through the space between the silica gel roller and the electromagnetic heating roller.
Preferably, the cooling roller structure comprises a fifth support frame body, a second tightness adjusting frame, a lower cooling roller and an upper cooling roller, and the second tightness adjusting frame is connected to the upper end of the fifth support frame body through bolts; the lower cooling roller is embedded in the upper part of the inner side of the fifth support frame body; and the upper cooling roller is embedded in the upper part of the inner side of the second tightness adjusting frame.
Preferably, the finished product winding frame structure comprises a sixth support frame body, a winding shaft and a finished product winding drum, wherein the winding shaft is clamped at the upper position of the inner side of the sixth support frame body; the finished product winding drum is sleeved on the outer surface of the winding shaft.
Preferably, the lower electromagnetic preheating roller and the upper electromagnetic preheating roller are positioned on the same longitudinal vertical line.
Preferably, the film body is coated on the upper part of the metal substrate body at a high temperature; .
Preferably, the metal substrate main body is one of a nickel-plated copper strip, a stainless steel strip or a zinc white copper strip; the upper part of the metal base material main body is coated with an FEP film as a binder.
Preferably, the membrane body is a PTFE membrane.
Preferably, the heating temperature of the lower electromagnetic preheating roller, the upper electromagnetic preheating roller and the electromagnetic heating roller is set at 350-400 ℃.
Preferably, the lower cooling roller and the upper cooling roller are water-cooled stainless steel cooling rollers.
Preferably, a driving motor is arranged in the power supporting cabinet, the speed parameter of the driving motor is 10-30 m/h, and the pressure between the silica gel roller and the electromagnetic heating roller is 0.2-0.4 MPa.
In addition, the invention relates to a high-temperature-resistant back plate continuous processing device and a processing technology of the high-temperature-resistant back plate produced by the processing technology, which specifically comprise the following steps:
the method comprises the following steps: preparing a high-temperature resistant back plate restraint plate;
step two: fixing the high-temperature resistant back plate;
step three: electret charge of the high-temperature resistant back plate;
step four: detecting the charge of the high-temperature resistant back plate;
step five: high-temperature aging of the high-temperature resistant back plate;
step six: secondary electret charge of the high-temperature resistant back plate;
step seven: and (5) inspecting the finished product of the high-temperature-resistant back plate.
Preferably, in the step one, a proper metal plate restraint plate is prepared according to the difference of the sizes of the back pole plates of the films to be produced; the metal plate constraint plate is a nickel-plated copper belt, or a stainless steel belt, or a zinc white copper belt; the metal plate restraint plate is provided with a clamping groove.
Preferably, in the second step, the back plate is clamped in the clamping groove formed in the metal plate constraint plate, the thin film faces upwards, and the back plates cannot be overlapped.
Preferably, in the third step, the metal plate restraint plate with the back plate is placed on the rail electret charge of the polarization instrument, the polarization voltage is 10000-.
Preferably, in the fourth step, the back electrode plates with the finished charge electret in the third step are placed on the track of the electrostatic potentiometer individually by using tweezers, the charge of each back electrode plate is measured, the data of the surface electret charge of each back electrode plate of the batch of samples is obtained, and the consistency of the electret charge of the batch of products can be judged according to the surface electret charge data of all the tested back electrode plates; and step three is carried out again on the inconsistent ones until the standard is reached.
Preferably, in the fifth step, the metal plate with the electret-finished charge back-plate is placed in an oven with a set temperature of 150 ℃ in the fourth step, and is taken out and cooled after being aged for 30 minutes.
Preferably, in the sixth step, the cooled back plate is tested for electret charge according to the procedure in the third step, so that consistency and stability of electret charge of the batch of products can be obtained.
Preferably, in step seven, the back plate finished by the second electret is subjected to charge inspection and packaged for standby.
The invention relates to a high-temperature-resistant back plate continuous processing device and a processing technology of a high-temperature-resistant back plate produced by the processing technology, which specifically comprise the following steps:
the method comprises the following steps: preparing a high-temperature resistant back plate restraint plate;
step two: fixing the high-temperature resistant back plate;
step three: electret charge of the high-temperature resistant back plate;
step four: detecting the charge of the high-temperature resistant back plate;
step five: high-temperature aging of the high-temperature resistant back plate;
step six: secondary electret charge of the high-temperature resistant back plate;
step seven: and (5) inspecting the finished product high-temperature-resistant back plate.
Preferably, in the step one, a proper metal plate restraint plate is prepared according to the difference of the sizes of the back pole plates of the films to be produced; the metal plate constraint plate is a nickel-plated copper strip, a stainless steel strip or a zinc white copper strip; the metal plate restraint plate is provided with a clamping groove.
Preferably, in the second step, the back plate is clamped in the clamping groove formed in the metal plate constraint plate, the thin film faces upwards, and the back plates cannot be overlapped.
Preferably, in the third step, the metal plate restraint plate with the back plate is placed on the rail electret charge of the polarization instrument, the polarization voltage is 10000-.
Preferably, in the fourth step, the back electrode plates with the finished charge electret in the third step are placed on the track of the electrostatic potentiometer individually by using tweezers, the charge of each back electrode plate is measured, the data of the surface electret charge of each back electrode plate of the batch of samples is obtained, and the consistency of the electret charge of the batch of products can be judged according to the surface electret charge data of all the tested back electrode plates; and step three is carried out again on the inconsistent ones until the standard is reached.
Preferably, in the fifth step, the metal plate with the electret-finished charge back-plate is placed in an oven with a set temperature of 150 ℃ in the fourth step, and is taken out and cooled after being aged for 30 minutes.
Preferably, in the sixth step, the cooled back plate is tested for electret charge according to the flow in the third step, so that consistency and stability of the electret charge of the batch of products can be obtained.
Preferably, in step seven, the back plate finished by the second electret is subjected to charge inspection and packaged for standby.
Compared with the prior art, the invention has the beneficial effects that:
this high temperature resistant back plate continuous type processingequipment can carry out continuous pad pasting production with the metal substrate main part and the film main part of high temperature resistant back plate production usefulness, has avoided one by one to the back plate pad pasting that bonds, has improved production efficiency to preheat the roller under the electromagnetism, preheat the roller on the electromagnetism, under the effect of silica gel roller and electromagnetic heating roller, extrude the laminating tectorial membrane, the effectual product uniformity and the stability that has ensured the back plate.
The charge electret is carried out by using the high-temperature resistant back plate produced by continuous film coating, and the consistency and the stability of the back plate product can be finally good. The requirement of industrial manufacturing on the degree of automation is higher and higher, microphone mounting automation needs high-temperature reflow soldering to realize, and after microphone assembly is completed, when the traditional FEP film back plate passes through the highest high temperature of about 265 degrees of reflow soldering, electric charge is basically lost, and microphone performance is caused to lose efficacy. The developed PTFE film back plate can still retain the charge quantity enough to realize the performance of the back plate when passing through high temperature of about 265 ℃, and can meet the requirement of high-temperature reflow soldering. The microphone can be more suitable for the change of the environment in the subsequent use, and a large amount of manpower is saved in the manufacturing process.
Drawings
Fig. 1 is a first schematic structural diagram of the present invention.
FIG. 2 is a second schematic structural diagram of the present invention.
Fig. 3 is a schematic view of the upper part of the power support cabinet of the present invention.
Fig. 4 is a schematic view of the direction of the production process state of the present invention.
Fig. 5 is an electret process flow diagram of a high temperature resistant back plate produced by the present invention.
In the figure:
1. a base material discharge frame structure; 11. a first support frame body; 12. a discharging shaft; 13. a metal substrate roll; 14. a metal substrate body; 2. preheating the roll assembly; 21. a second support frame body; 22. a preheating roller under electromagnetism; 23. electromagnetically preheating the roller; 24. a first tightness adjusting bracket; 3. a film covering and discharging frame structure; 31. a third support frame body; 32. a substrate guide; 33. a feed shaft; 34. a film expansion roller; 35. a film roll; 36. a film body; 4. laminating to form a frame structure; 41. a fourth support frame body; 42. a direction adjusting frame; 43. a silica gel roller; 44. an electromagnetic heating roller; 45. preliminary back plate; 5. a cooling roll structure; 51. a fifth support frame body; 52. a second tightness adjusting bracket; 53. a lower cooling roll; 54. an upper cooling roll; 6. a power support cabinet; 7. a finished product winding frame structure; 71. a sixth support frame body; 72. a winding shaft; 73. winding a finished product; 8. and (4) a back plate finished product belt.
Detailed Description
The invention is further described below with reference to the accompanying drawings:
example (b):
as shown in fig. 1 to 3, the invention provides a high-temperature-resistant back plate continuous processing device, which comprises a substrate material placing frame structure 1, a preheating roller assembly 2, a film coating material placing frame structure 3, a laminating composition frame structure 4, a cooling roller structure 5, a power supporting cabinet 6, a finished product winding frame structure 7 and a back plate finished product belt 8, wherein the substrate material placing frame structure 1, the preheating roller assembly 2, the film coating material placing frame structure 3, the laminating composition frame structure 4, the cooling roller structure 5 and the finished product winding frame structure 7 are sequentially and independently arranged from left to right; the device comprises a base material feeding frame structure 1, a preheating roller assembly 2, a film coating feeding frame structure 3 and a laminating composition frame structure 4, wherein the distance between a cooling roller structure 5 and a finished product winding frame structure 7 is set between thirty centimeters and sixty centimeters according to the production rate of a back electrode plate finished product belt 8; the laminating and placing frame structure 3 is characterized in that a laminating and forming frame structure 4 and a cooling roller structure 5 are bolted on the upper part of a power supporting cabinet 6 from left to right; the back plate finished product belt 8 is wound on the upper part of the finished product winding frame structure 7 after coming out of the cooling roller structure 5; the base material discharging frame structure 1 comprises a first support frame body 11, a discharging shaft 12, a metal base material winding drum 13 and a metal base material main body 14; the discharging shaft 12 is clamped at the upper part of the inner side of the first support frame 11; the metal base material winding drum 13 is sleeved on the outer surface of the discharging shaft 12; the metal substrate main body 14 is wound on the outer side of the metal substrate reel 13.
In the above embodiment, specifically, the preheating roll assembly 2 includes a second support frame body 21, a lower electromagnetic preheating roll 22, an upper electromagnetic preheating roll 23 and a first slack adjuster 24, wherein the lower electromagnetic preheating roll 22 is axially connected to an upper position of an inner side of the second support frame body 21; the first tightness adjusting bracket 24 is connected to the upper part of the second support bracket body 21 through bolts; the electromagnetic upper preheating roller 23 is coupled to the inner side of the first slack adjuster 24.
In the above embodiment, specifically, the film covering and feeding frame structure 3 includes a third support frame 31, a substrate guide rod 32, a feeding shaft 33, a film expanding roller 34, a film reel 35 and a film main body 36, wherein the substrate guide rod 32 is embedded in the lower position of the inner side of the third support frame 31; the feeding shaft 33 is embedded in the upper position inside the third support frame body 31; the film expansion rollers 34 are sleeved on two outer sides of the feeding shaft 33; the film winding drum 35 is sleeved at the middle position outside the feeding shaft 33; the film body 36 is wound around the outer surface of the film roll 35.
In the above embodiment, specifically, the attaching composition frame structure 4 includes a fourth support frame body 41, a direction adjusting frame 42, a silica gel roller 43, an electromagnetic heating roller 44 and a preliminary back plate 45, wherein the direction adjusting frame 42 is screwed on the upper portion of the fourth support frame body 41; the silica gel roller 43 is axially connected to the inner side of the direction adjusting frame 42; the electromagnetic heating roller 44 is embedded in the upper part of the inner side of the fourth support frame body 41; the preliminary back plate 45 penetrates between the silica gel roller 43 and the electromagnetic heating roller 44.
In the above embodiment, specifically, the cooling roller structure 5 includes a fifth support frame body 51, a second tightness adjusting frame 52, a lower cooling roller 53 and an upper cooling roller 54, and the second tightness adjusting frame 52 is bolted to the upper end of the fifth support frame body 51; the lower cooling roller 53 is embedded in the upper position of the inner side of the fifth support frame body 51; the upper cooling roller 54 is mounted on the inner upper portion of the second slack adjuster bracket 52.
In the above embodiment, specifically, the finished product winding frame structure 7 includes a sixth support frame 71, a winding shaft 72 and a finished product winding drum 73, where the winding shaft 72 is clamped at an upper position of an inner side of the sixth support frame 71; the finished product reel 73 is sleeved on the outer surface of the winding shaft 72.
In the above embodiment, specifically, the electromagnetic lower preheating roll 22 and the electromagnetic upper preheating roll 23 are located on the same vertical longitudinal line; the film main body 36 is coated on the upper part of the metal base material main body 14 at high temperature; .
In the above embodiment, specifically, the metal substrate main body 14 is one of a nickel-plated copper belt, a stainless steel belt or a zinc white copper belt; the upper part of the metal base material main body 14 is coated with an FEP film as a binder; the membrane body 36 is a PTFE membrane.
In the above embodiment, specifically, the heating temperatures of the lower electromagnetic preheating roller 22, the upper electromagnetic preheating roller 23 and the electromagnetic heating roller 44 are set at 350-400 ℃; the lower cooling roller 53 and the upper cooling roller 54 are water-cooled stainless steel cooling rollers; the power supporting cabinet 6 is internally provided with a driving motor, the speed parameter of the driving motor is 10-30 m/h, and the pressure between the silica gel roller 43 and the electromagnetic heating roller 44 is 0.2-0.4 MPa.
As shown in fig. 4, when the present invention is used, the metal substrate reel 13 is sleeved outside the discharge shaft 12, and the metal substrate main body 14 penetrates through the position between the lower electromagnetic preheating roller 22 and the upper electromagnetic preheating roller 23, so as to perform a preliminary preheating operation on the metal substrate main body 14, the film reel 35 is sleeved outside the feed shaft 33, the film main body 36 is attached to the upper part of the metal substrate main body 14, and passes through the position between the silica gel roller 43 and the electromagnetic heating roller 44 together, so as to complete a high-temperature film coating operation under the action of a squeezing force;
the primary back plate 45 after film coating passes between the lower cooling roller 53 and the upper cooling roller 54, and the back plate finished product tape 8 after cooling, shaping and cooling is wound on the finished product reel 73, so that the back plate after film coating is obtained.
In addition, the invention relates to a high-temperature-resistant back plate continuous processing device and a processing technology of the high-temperature-resistant back plate produced by the processing technology, which specifically comprise the following steps:
s101: preparing a high-temperature resistant back plate restraint plate;
s102: fixing the high-temperature resistant back plate;
s103: electret charge of the high-temperature resistant back plate;
s104: detecting the charge of the high-temperature resistant back plate;
s105: high-temperature aging of the high-temperature resistant back plate;
s106: secondary electret charge of the high-temperature resistant back plate;
s107: and (5) inspecting the finished product of the high-temperature-resistant back plate.
In the above embodiment, specifically, in S101, a suitable metal plate constraining plate is prepared according to the difference in size of the back electrode plate to be produced with the coating film; the metal plate constraint plate is a nickel-plated copper strip, a stainless steel strip or a zinc white copper strip; the metal plate restraint plate is provided with a clamping groove.
In the foregoing embodiment, specifically, in S102, the back plate is clamped in the clamping groove of the metal plate constraint plate, the thin film faces upward, and the back plates cannot be overlapped with each other.
In the above embodiment, specifically, in S103, the metal plate constraining plate with the back plate is placed on the rail electret charge of the polarization apparatus, the polarization voltage is 10000-.
In the above embodiment, specifically, in S104, the back plates after the charge electret is completed in S103 are placed on the track of the electrostatic potentiometer individually by using forceps, and the charge of each back plate is measured to obtain the data of the surface electret charge of each back plate of the batch of samples, so that the consistency of the electret charge of the batch of products can be determined according to the data of the surface electret charges of all the back plates tested; and (5) performing S103 again on the inconsistency until the standard is reached.
In the above embodiment, specifically, in S105, in S104, the metal plate on which the electret-completed charge back-plate is placed in an oven at a set temperature of 150 ℃, aged for 30 minutes, and then taken out and cooled.
In the above embodiment, specifically, in S106, the cooled back plate is tested for electret charge according to the procedure in S103, and the consistency and stability of the electret charge of the batch of products can be obtained.
In the above embodiment, specifically, in S107, the back plate after the second electret is performed is subjected to charge check packaging for standby.
Sampling detection is carried out on the high-temperature resistant back plate after electret is finished, and data detection is carried out on the application finished product as shown in the following table I.
Watch 1
The charge electret is carried out by using the high-temperature resistant back plate produced by continuous film coating, and the consistency and the stability of the back plate product can be finally good. The requirement of industrial manufacturing on the degree of automation is higher and higher, microphone mounting automation needs high-temperature reflow soldering to realize, and after microphone assembly is completed, when the traditional FEP film back plate passes through the highest high temperature of about 265 degrees of reflow soldering, electric charge is basically lost, and microphone performance is caused to lose efficacy. The developed PTFE film back plate can still retain the charge quantity enough to realize the performance of the back plate when passing through high temperature of about 265 ℃, and can meet the requirement of high-temperature reflow soldering. The microphone can be more suitable for the change of the environment in the subsequent use, and a large amount of manpower is saved in the manufacturing process.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the equipment or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. The high-temperature-resistant back polar plate continuous processing device is characterized by comprising a substrate material placing frame structure (1), a preheating roller assembly (2), a film coating material placing frame structure (3), a laminating composition frame structure (4), a cooling roller structure (5), a power supporting cabinet (6), a finished product winding frame structure (7) and a back polar plate finished product belt (8), wherein the substrate material placing frame structure (1), the preheating roller assembly (2), the film coating material placing frame structure (3), the laminating composition frame structure (4), the cooling roller structure (5) and the finished product winding frame structure (7) are sequentially and independently arranged from left to right; the device comprises a base material feeding frame structure (1), a preheating roller assembly (2), a film coating feeding frame structure (3) and a laminating composition frame structure (4), wherein the mutual distance between a cooling roller structure (5) and a finished product winding frame structure (7) is set between thirty centimeters and sixty centimeters according to the production rate of a back plate finished product belt (8); the film covering and material placing frame structure (3) is jointed to form a frame structure (4) and a cooling roller structure (5) which are connected to the upper part of the power supporting cabinet (6) through bolts from left to right; the back plate finished product belt (8) is wound on the upper part of the finished product winding frame structure (7) after coming out of the cooling roller structure (5); the base material discharging frame structure (1) comprises a first supporting frame body (11), a discharging shaft (12), a metal base material winding drum (13) and a metal base material main body (14); the discharging shaft (12) is clamped at the upper part of the inner side of the first support frame body (11); the metal base material winding drum (13) is sleeved on the outer surface of the discharging shaft (12); the metal base material main body (14) is wound on the outer side of the metal base material winding drum (13).
2. The continuous processing device and the processing technology of the high temperature resistant back plate according to claim 1, characterized in that the preheating roller assembly (2) comprises a second support frame body (21), a lower electromagnetic preheating roller (22), an upper electromagnetic preheating roller (23) and a first tightness adjusting frame (24), wherein the lower electromagnetic preheating roller (22) is coupled at the upper position of the inner side of the second support frame body (21); the first tightness adjusting frame (24) is connected to the upper part of the second support frame body (21) through bolts; the electromagnetic upper preheating roller (23) is connected with the inner side of the first tightness adjusting frame (24) in an axial mode.
3. The continuous processing device and the processing technology for the high-temperature-resistant back plate according to claim 1, wherein the film-coating material-placing frame structure (3) comprises a third support frame body (31), a substrate guide rod (32), a feeding shaft (33), a film expanding roller (34), a film winding drum (35) and a film main body (36), wherein the substrate guide rod (32) is embedded at the lower position of the inner side of the third support frame body (31); the feeding shaft (33) is embedded in the upper side position inside the third support frame body (31); the film expansion rollers (34) are sleeved on two outer sides of the feeding shaft (33); the film winding drum (35) is sleeved at the middle position outside the feeding shaft (33); the film main body (36) is wound on the outer surface of the film reel (35).
4. The continuous processing device and the processing technology of the high-temperature-resistant back plate as claimed in claim 1, wherein the bonding composition frame structure (4) comprises a fourth support frame body (41), a direction adjusting frame (42), a silica gel roller (43), an electromagnetic heating roller (44) and a primary back plate (45), wherein the direction adjusting frame (42) is connected to the upper part of the fourth support frame body (41) through screws; the silica gel roller (43) is coupled on the inner side of the direction adjusting frame (42); the electromagnetic heating roller (44) is embedded in the upper position of the inner side of the fourth support frame body (41); the preliminary back plate (45) penetrates through the space between the silica gel roller (43) and the electromagnetic heating roller (44).
5. The continuous processing device and the processing technology for the high-temperature-resistant back plate as claimed in claim 1, wherein the cooling roller structure (5) comprises a fifth support frame body (51), a second tightness adjusting frame (52), a lower cooling roller (53) and an upper cooling roller (54), the second tightness adjusting frame (52) is connected to the upper end of the fifth support frame body (51) through bolts; the lower cooling roller (53) is embedded in the upper position of the inner side of the fifth support frame body (51); the upper cooling roller (54) is embedded in the upper position of the inner side of the second tightness adjusting frame (52).
6. The continuous processing device and the processing technology for the high-temperature-resistant back plate according to claim 1, wherein the finished product winding frame structure (7) comprises a sixth support frame body (71), a winding shaft (72) and a finished product winding drum (73), and the winding shaft (72) is clamped at the upper position of the inner side of the sixth support frame body (71); the finished product winding drum (73) is sleeved on the outer surface of the winding shaft (72).
7. The continuous processing device and the processing technology of the high-temperature-resistant back plate as claimed in claim 1, specifically comprising the following steps:
the method comprises the following steps: preparing a high-temperature-resistant back plate restraint plate;
step two: fixing the high-temperature resistant back plate;
step three: electret charge of the high-temperature resistant back plate;
step four: detecting the charge of the high-temperature resistant back plate;
step five: high-temperature aging of the high-temperature resistant back plate;
step six: secondary electret charge of the high-temperature resistant back plate;
step seven: and (5) inspecting the finished product high-temperature-resistant back plate.
8. The continuous processing device and the processing technology for the high temperature resistant back plate as claimed in claim 7, wherein in the third step, the metal plate restraining plate with the back plate is placed on the rail electret charge of the polarization instrument, the polarization voltage is minus 10000-.
9. The continuous processing device and the processing technology for the high-temperature-resistant back plate as claimed in claim 7, wherein in the fourth step, the back plate finished with the charge electret in the third step is placed on the track of the electrostatic potentiometer individually by using tweezers, the charge of each back plate is measured, the data of the surface electret charge of each back plate of the batch of samples is obtained, and the consistency of the electret charge of the batch of products can be judged according to the data of the surface electret charge of all the tested back plate; and step three is carried out again on the inconsistency until the standard is reached.
10. The continuous processing device and the processing technology for the high-temperature-resistant back plate as claimed in claim 7, wherein in the fifth step, the metal plate with the electret charged back plate is placed in an oven with a set temperature of 150 ℃ in the fourth step, and the metal plate is taken out for cooling after being aged for 30 minutes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210570050.8A CN114953422A (en) | 2022-05-24 | 2022-05-24 | High-temperature-resistant back plate continuous processing device and processing technology thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210570050.8A CN114953422A (en) | 2022-05-24 | 2022-05-24 | High-temperature-resistant back plate continuous processing device and processing technology thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114953422A true CN114953422A (en) | 2022-08-30 |
Family
ID=82954817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210570050.8A Pending CN114953422A (en) | 2022-05-24 | 2022-05-24 | High-temperature-resistant back plate continuous processing device and processing technology thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114953422A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4348711A (en) * | 1979-07-06 | 1982-09-07 | The Post Office | Method and apparatus for implanting a charge in an electret foil |
| KR100774303B1 (en) * | 2006-06-05 | 2007-11-08 | (주)상아프론테크 | Electret for high temperature, process for preparing the same, and microphone comprising the electret |
| CN101189908A (en) * | 2005-06-06 | 2008-05-28 | 松下电器产业株式会社 | Method of turning condenser microphone into electret, electret-turning device and method of producing condenser microphone using this |
| CN208742920U (en) * | 2018-07-06 | 2019-04-16 | 江门跨越工贸有限公司 | A kind of efficient coating machine with rubber band rubberizing function |
| CN211808303U (en) * | 2019-12-27 | 2020-10-30 | 江苏宥拓新材料有限公司 | Hot pressing mechanism for attaching PTC (positive temperature coefficient) electric heating film |
| CN211846518U (en) * | 2019-12-27 | 2020-11-03 | 苏州昆岭薄膜工业有限公司 | Winding compression roller device of F-shaped splitting machine |
-
2022
- 2022-05-24 CN CN202210570050.8A patent/CN114953422A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4348711A (en) * | 1979-07-06 | 1982-09-07 | The Post Office | Method and apparatus for implanting a charge in an electret foil |
| CN101189908A (en) * | 2005-06-06 | 2008-05-28 | 松下电器产业株式会社 | Method of turning condenser microphone into electret, electret-turning device and method of producing condenser microphone using this |
| KR100774303B1 (en) * | 2006-06-05 | 2007-11-08 | (주)상아프론테크 | Electret for high temperature, process for preparing the same, and microphone comprising the electret |
| CN208742920U (en) * | 2018-07-06 | 2019-04-16 | 江门跨越工贸有限公司 | A kind of efficient coating machine with rubber band rubberizing function |
| CN211808303U (en) * | 2019-12-27 | 2020-10-30 | 江苏宥拓新材料有限公司 | Hot pressing mechanism for attaching PTC (positive temperature coefficient) electric heating film |
| CN211846518U (en) * | 2019-12-27 | 2020-11-03 | 苏州昆岭薄膜工业有限公司 | Winding compression roller device of F-shaped splitting machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP3073756B1 (en) | Waterproof sound-transmitting film and waterproof sound-transmitting structure using same | |
| US10028043B2 (en) | Waterproof sound-permeable membrane, waterproof sound-permeable member, and electronic device | |
| EP3209027A1 (en) | Sound-passing membrane, sound-passing membrane member having same, microphone, and electronic device | |
| CN106992279B (en) | Nonaqueous electrolytic solution secondary battery spacer, lamination spacer, component and nonaqueous electrolytic solution secondary battery | |
| US20120272517A1 (en) | Device of manufacturing speaker | |
| WO1993016497A1 (en) | Method of producing thin cell | |
| CN115149204A (en) | Polyolefin microporous membrane | |
| KR20230124890A (en) | Polyolefin microporous film and its production system, battery diaphragm, electrochemical device | |
| JP2007016211A (en) | Porous film comprising aromatic polyamide and/or aromatic polyimide and separator for battery | |
| US4302633A (en) | Electrode plate electret of electro-acoustic transducer and its manufacturing method | |
| CN114953422A (en) | High-temperature-resistant back plate continuous processing device and processing technology thereof | |
| CN110380129B (en) | Lithium ion battery and preparation method thereof | |
| KR20100134886A (en) | Manufacturing method of voice coil | |
| US20110139355A1 (en) | Method for Forming Porous PTFE Layer | |
| CN217477629U (en) | High temperature resistant back polar plate continuous type processingequipment | |
| KR20200113823A (en) | Manufacture method for electrode assembly and manufacture apparatus for the same | |
| CN100377622C (en) | Process for making backing electrode electret condenser type microphones | |
| CN101710536A (en) | Method for manufacturing capacitor in parallel connection outside core | |
| WO2011062343A1 (en) | Metal-clad material, the bond strength of which is improved by means of a continuous heat treatment, and method for producing same | |
| CN111244369B (en) | Polyolefin microporous membrane | |
| CN106512548A (en) | Method for attaching slurry to supporting layer during filtering material preparing and application of method | |
| KR100774303B1 (en) | Electret for high temperature, process for preparing the same, and microphone comprising the electret | |
| CN101729971A (en) | Method for manufacturing electret vibrating membrane | |
| EP1648194B1 (en) | Material for heat-resistant electret and heat-resistant electret | |
| JPS6239600B2 (en) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |