CN114920972A - Preparation method of temperature-sensitive culture dish - Google Patents

Preparation method of temperature-sensitive culture dish Download PDF

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Publication number
CN114920972A
CN114920972A CN202210575187.2A CN202210575187A CN114920972A CN 114920972 A CN114920972 A CN 114920972A CN 202210575187 A CN202210575187 A CN 202210575187A CN 114920972 A CN114920972 A CN 114920972A
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culture dish
temperature
poly
preparing
sensitive
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蔡汉宁
蔡万利
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Guangzhou Hot Spring Technology Co Ltd
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Guangzhou Hot Spring Technology Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/123Treatment by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/16Chemical modification with polymerisable compounds
    • C08J7/18Chemical modification with polymerisable compounds using wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02Homopolymers or copolymers of hydrocarbons
    • C08J2325/04Homopolymers or copolymers of styrene
    • C08J2325/06Polystyrene

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  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Polymers & Plastics (AREA)
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Abstract

The invention relates to the technical field of culture dish preparation, and particularly discloses a preparation method of a temperature-sensitive culture dish. The preparation method of the temperature-sensitive culture dish comprises the following steps: preparing poly-N isopropyl acryloyl solution from poly-N isopropyl acryloyl water; cleaning a culture dish, removing impurities, and drying to obtain a pretreated culture dish; placing the pretreated culture dish in a plasma treatment device for low-temperature plasma pretreatment; taking out the pretreated substrate after low-temperature plasma pretreatment and exposing the pretreated substrate to the atmospheric environment; placing the poly-N isopropyl acryloyl solution into a culture dish which is treated by the low-temperature plasma pretreatment step for oscillation, then carrying out ultraviolet irradiation under the conditions of introducing nitrogen and discharging oxygen, and then cleaning and drying to obtain the thermo-sensitive culture dish. The culture dish prepared by the method has a large contact angle change value, so that the culture dish is sensitive to temperature change, and the hydrophobicity and the hydrophilicity of the culture dish obviously change along with the temperature.

Description

Preparation method of temperature-sensitive culture dish
Technical Field
The invention relates to the technical field of culture dish preparation, in particular to a preparation method of a temperature-sensitive culture dish.
Background
Poly-N-isopropylacrylamide shows obvious temperature sensitivity because macromolecules simultaneously have hydrophilic amide groups and hydrophobic isopropyl groups, when the temperature is changed at about 32 ℃, the solution and gel of the poly-N-isopropylacrylamide have reversible sudden changes with the characteristics which are just similar to the temperature of human cell culture, which provides possibility for the poly-N-isopropylacrylamide to be used for preparing temperature-sensitive culture dishes, but the mechanical strength of the poly-N-isopropylacrylamide is poor, and the poly-N-isopropylacrylamide is difficult to support to be stably formed under the condition of being swelled by water, so that the application of the poly-N-isopropylacrylamide in preparing culture dishes is limited.
On the basis, researchers try to prepare a temperature-sensitive culture dish by grafting poly-N-isopropylacrylamide (PNIPAm) on a culture dish with a preparation material with strong mechanical strength and good mechanical property through various methods. The main mechanism of PNIPAm grafting is free radical polymerization, i.e., the reaction mechanism is chain initiation, chain propagation, 3-motif reaction of chain termination, and chain transfer as a side reaction. The grafting method is generally classified into solution radical grafting, photo-initiated grafting, radiation grafting, low-temperature plasma grafting, and the like according to the graft polymerization mechanism thereof. The preparation process of the low-temperature plasma grafting method belongs to a dry processing process, does not cause pollution, is simple to operate, only modifies the surface of a high polymer material, does not influence the structure and the performance of a body, and is a relatively suitable grafting technology.
However, the inventor finds in research that the culture dish prepared by grafting the poly-N-isopropylacrylamide into the culture dish by the existing method is insensitive to temperature change, and is characterized in that the change value of the contact angle is small, and the hydrophobic property and the hydrophilic property of the culture dish are not obviously changed along with the temperature. Therefore, the preparation method of the temperature-sensitive culture dish which is sensitive to temperature change and has a large contact angle change value is provided, and the preparation method has important application value.
Disclosure of Invention
In order to solve at least one technical problem pointed out in the prior art, the invention provides a preparation method of a temperature-sensitive culture dish. The culture dish prepared by the method has a large contact angle change value, so that the culture dish is sensitive to temperature change, and the hydrophobic property and the hydrophilic property of the culture dish obviously change along with the temperature.
The technical problem to be solved by the invention is realized by the following technical scheme:
a preparation method of a temperature-sensitive culture dish comprises the following steps:
preparing a poly-N isopropyl acrylamide solution: preparing poly-N-isopropyl acrylamide solution by using water;
a culture dish pretreatment step: cleaning a culture dish, removing impurities, and drying to obtain a pretreated culture dish;
a low-temperature plasma pretreatment step: placing the pretreated culture dish in a plasma treatment device for low-temperature plasma pretreatment; taking out and exposing the pretreated product to the atmospheric environment after low-temperature plasma pretreatment;
ultraviolet irradiation grafting step: placing the poly-N isopropyl acrylamide solution into a culture dish which is treated by the low-temperature plasma pretreatment step for oscillation, then carrying out ultraviolet irradiation under the conditions of introducing nitrogen and discharging oxygen, and then cleaning and drying to obtain the thermo-sensitive culture dish.
Preferably, in the step of preparing the poly-N-isopropylacrylamide solution, the poly-N-isopropylacrylamide is taken and water is used for preparing the poly-N-isopropylacrylamide solution with the mass fraction of 32-38%.
Preferably, in the step of preparing the poly-N-isopropylacrylamide solution, the poly-N-isopropylacrylamide is taken and is prepared into the poly-N-isopropylacrylamide solution with the mass fraction of 32% by using water.
Preferably, in the step of pretreating the culture dish, the culture dish is made of polystyrene.
Preferably, the step of cleaning and impurity removing in the pretreatment step of the culture dish refers to cleaning and impurity removing by using absolute ethyl alcohol.
Preferably, the time of the low-temperature plasma pretreatment in the low-temperature plasma pretreatment step is 2 min.
Preferably, in the low-temperature plasma pretreatment step, the substrate is taken out and exposed to the atmospheric environment for 2-3 hours after low-temperature plasma pretreatment.
Preferably, in the ultraviolet irradiation grafting step, the time of ultraviolet irradiation is 15 min.
Preferably, in the step of ultraviolet irradiation grafting, the shaking refers to shaking for 10-20 min.
Preferably, in the step of ultraviolet irradiation grafting, the cleaning is carried out for 16-30 h by oscillating and cleaning in a constant-temperature water bath at 25-35 ℃.
The inventors have found in experiments how to graft poly-N-isopropylacrylamide onto a polystyrene culture dish so that it has a large contact angle variation value, which is one of the difficulties encountered by those skilled in the art. The inventor surprisingly finds out in a large number of experiments that in a plurality of reaction conditions, three factors, namely the concentration of the poly-N isopropyl acrylamide solution, the low-temperature plasma pretreatment time, the ultraviolet light irradiation time and the like, play a decisive role in determining whether the culture dish grafted with the polystyrene material of the poly-N isopropyl acryloyl has a larger contact angle change value; the culture dish of the polystyrene material grafted with the poly-N isopropyl acrylamide is prepared by the difference of any one of three factors, namely the concentration of the poly-N isopropyl acrylamide solution, the low-temperature plasma pretreatment time, the ultraviolet irradiation time and the like, and the difference of the contact angle change values is great. Only when the mass fraction of the poly-N isopropyl acryloyl solution is 32-38%, the low-temperature plasma pretreatment time is 2min, and the ultraviolet irradiation time is 15min, the prepared culture dish has a large contact angle change value; the contact angle change value of the culture dish is far higher than that of the culture dish prepared under the conditions of other poly-N isopropyl acrylamide solution concentration, low-temperature plasma pretreatment time and ultraviolet light irradiation time.
Has the advantages that: the invention provides a brand-new culture dish preparation method; the culture dish prepared by the method has a large contact angle change value, so that the culture dish is sensitive to temperature change, and the hydrophobicity and the hydrophilicity of the culture dish obviously change along with the temperature; the culture dish has wide application prospect in the field of in-vitro tissue and organ regeneration based on cell layer engineering. In addition, it can be observed through cytotoxicity experiments and cell layer detachment experiments that the cells cultured in the culture dish have good shapes and are normally attached to the wall, grow and propagate, a complete cell layer structure can be obtained by reducing the temperature after a continuous cell layer is formed, and the cells have no cytotoxicity compared with the cytotoxicity grading standard.
Detailed Description
The present invention will be further explained with reference to specific examples, which are not intended to limit the present invention in any way.
Preparation method of temperature-sensitive culture dish
(1) Preparing a poly-N isopropyl acrylamide solution: preparing poly-N-isopropyl acrylamide solution from poly-N-isopropyl acrylamide by using water;
(2) a culture dish pretreatment step: soaking and cleaning a culture dish (a polystyrene culture dish) with absolute ethyl alcohol to remove organic matters and impurities, and then drying in a drying oven in vacuum to obtain a pretreated culture dish;
(3) a low-temperature plasma pretreatment step: placing the pretreated culture dish in a plasma treatment device for low-temperature plasma pretreatment (plasma treatment in low-temperature ammonia gas, the voltage discharge frequency is 15MHz, and the power is 120W); after low-temperature plasma pretreatment, taking out and exposing the product in the atmospheric environment for 2h to obtain a peroxy group;
(4) ultraviolet irradiation grafting step: placing 2ml of poly-N-isopropylacrylamide solution into the culture dish treated by the low-temperature plasma pretreatment step, oscillating for 15min, then irradiating by ultraviolet light under the conditions of introducing nitrogen and discharging oxygen, oscillating and cleaning in a constant-temperature water bath at 30 ℃ for 24h, and placing in a drying oven for vacuum drying after cleaning to obtain the temperature-sensitive culture dish.
The differences of each embodiment and the comparative example are in the concentration of poly-N-isopropylacrylamide solution, the low-temperature plasma pretreatment time and the ultraviolet irradiation time; the contact angle change values of the culture dishes prepared in the examples and comparative examples at 37 ℃ and 20 ℃ are tested simultaneously; see table 1 for details.
Table 1.
Figure BDA0003661860710000041
As can be seen from the experimental data in Table 1, the petri dish prepared in example 1 has a large contact angle variation value. In particular, the petri dish prepared in example 1 had a contact angle variation value as high as 24.3 °. According to tests, the contact angle of the bottom wall surface of the culture dish prepared in example 1 at 37 ℃ is 80.4 degrees, the culture dish is relatively hydrophobic, the contact angle at 20 ℃ is 56.1 degrees, the culture dish is relatively hydrophilic, and obvious wettability change of the culture dish grafted with poly-N isopropyl acryloyl along with temperature change can be seen.
As can be seen from the experimental data in Table 1, the difference of the contact angle change values of the culture dishes prepared in comparative examples 1-16 is huge and is far smaller than that of example 1. This indicates that: the concentration of poly-N isopropyl acryloyl solution, the low-temperature plasma pretreatment time, the ultraviolet light irradiation time and other three factors play a decisive role in determining whether a culture dish grafted with poly-N isopropyl acryloyl polystyrene material has a larger contact angle change value; the culture dish of the polystyrene material grafted with the poly-N isopropyl acryloyl is prepared by the difference of any one of three factors, namely the concentration of the poly-N isopropyl acryloyl solution, the low-temperature plasma pretreatment time, the ultraviolet light irradiation time and the like, and the difference of the contact angle change values of the culture dish is huge. Only when the mass fraction of the poly-N isopropyl acryloyl solution is 32-38%, the low-temperature plasma pretreatment time is 2min, and the ultraviolet irradiation time is 15min, the prepared culture dish has a large contact angle change value; the contact angle change value of the culture dish is far higher than that of the culture dish prepared under the conditions of other poly-N isopropyl acryloyl solution concentration, low-temperature plasma pretreatment time and ultraviolet light irradiation time.

Claims (10)

1. A preparation method of a temperature-sensitive culture dish is characterized by comprising the following steps:
preparing a poly-N isopropyl acrylamide solution: preparing poly-N-isopropyl acrylamide solution from poly-N-isopropyl acrylamide by using water;
a culture dish pretreatment step: cleaning a culture dish, removing impurities, and drying to obtain a pretreated culture dish;
a low-temperature plasma pretreatment step: placing the pretreated culture dish in a plasma treatment device for low-temperature plasma pretreatment; taking out the pretreated substrate after low-temperature plasma pretreatment and exposing the pretreated substrate to the atmospheric environment;
ultraviolet irradiation grafting step: placing the poly-N isopropyl acrylamide solution into a culture dish treated by the low-temperature plasma pretreatment step for oscillation, then carrying out ultraviolet irradiation under the conditions of introducing nitrogen and discharging oxygen, and then cleaning and drying to obtain the thermo-sensitive culture dish.
2. The method for preparing a temperature-sensitive culture dish according to claim 1, wherein in the step of preparing the poly-N-isopropylacrylamide solution, the poly-N-isopropylacrylamide is taken and water is used for preparing the poly-N-isopropylacrylamide solution with the mass fraction of 32-38%.
3. The method for preparing a temperature-sensitive culture dish according to claim 2, wherein in the step of preparing the poly-N-isopropylacrylamide solution, the poly-N-isopropylacrylamide is taken and is prepared into the poly-N-isopropylacrylamide solution with the mass fraction of 32% by using water.
4. The method of preparing a temperature-sensitive culture dish according to claim 1, wherein the culture dish is a polystyrene culture dish in the step of pretreating the culture dish.
5. The method for preparing a temperature-sensitive culture dish according to claim 1, wherein the step of washing and removing impurities in the pretreatment step of the culture dish is washing and removing impurities with absolute ethyl alcohol.
6. The method for preparing a temperature-sensitive culture dish according to claim 1, wherein the time for the low-temperature plasma pretreatment in the low-temperature plasma pretreatment step is 2 min.
7. The method for preparing a temperature-sensitive culture dish according to claim 1, wherein in the low-temperature plasma pretreatment step, the culture dish is taken out and exposed to the atmosphere for 2-3 hours after the low-temperature plasma pretreatment.
8. The method of manufacturing a temperature-sensitive culture dish according to claim 1, wherein in the ultraviolet irradiation grafting step, the time of ultraviolet irradiation is 15 min.
9. The method for preparing a temperature-sensitive culture dish according to claim 1, wherein in the step of ultraviolet irradiation grafting, the shaking is shaking for 10-20 min.
10. The method for preparing a temperature-sensitive culture dish according to claim 1, wherein in the step of ultraviolet irradiation grafting, the washing is carried out in a constant temperature water bath at 25 to 35 ℃ for 16 to 30 hours under shaking.
CN202210575187.2A 2022-05-25 2022-05-25 Preparation method of temperature-sensitive culture dish Pending CN114920972A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11349643A (en) * 1998-06-05 1999-12-21 Nitta Gelatin Inc Temperature-sensitive polymeric compound, its production, temperature-sensitive polymer composition, and cell culture substrate
CN101565489A (en) * 2009-06-02 2009-10-28 中山大学 Preparation method of polystyrene with thermo-sensitive surface
CN102276866A (en) * 2011-07-18 2011-12-14 海狸(广州)生物科技有限公司 Plasma-photochemical method for grafting carboxyl on cell culture surface
CN110938323A (en) * 2018-09-25 2020-03-31 广州洁特生物过滤股份有限公司 Temperature-sensitive cell culture surface and preparation method thereof
CN113265032A (en) * 2021-04-30 2021-08-17 华南师范大学 Preparation method and application of polyacrylamide modified temperature-sensitive copolymer

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11349643A (en) * 1998-06-05 1999-12-21 Nitta Gelatin Inc Temperature-sensitive polymeric compound, its production, temperature-sensitive polymer composition, and cell culture substrate
CN101565489A (en) * 2009-06-02 2009-10-28 中山大学 Preparation method of polystyrene with thermo-sensitive surface
CN102276866A (en) * 2011-07-18 2011-12-14 海狸(广州)生物科技有限公司 Plasma-photochemical method for grafting carboxyl on cell culture surface
CN110938323A (en) * 2018-09-25 2020-03-31 广州洁特生物过滤股份有限公司 Temperature-sensitive cell culture surface and preparation method thereof
CN113265032A (en) * 2021-04-30 2021-08-17 华南师范大学 Preparation method and application of polyacrylamide modified temperature-sensitive copolymer

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