CN114918394A - Method and device for controlling flow field bias of crystallizer - Google Patents
Method and device for controlling flow field bias of crystallizer Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000007788 liquid Substances 0.000 claims abstract description 115
- 239000007789 gas Substances 0.000 claims description 39
- 239000011261 inert gas Substances 0.000 claims description 23
- 230000009467 reduction Effects 0.000 claims description 20
- 230000001276 controlling effect Effects 0.000 claims description 16
- 230000002596 correlated effect Effects 0.000 claims description 9
- 238000005266 casting Methods 0.000 abstract description 13
- 238000009749 continuous casting Methods 0.000 abstract description 13
- 238000004519 manufacturing process Methods 0.000 abstract description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 28
- 229910052786 argon Inorganic materials 0.000 description 14
- 238000007664 blowing Methods 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 4
- 230000000875 corresponding effect Effects 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 3
- 230000009118 appropriate response Effects 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
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- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D11/00—Continuous casting of metals, i.e. casting in indefinite lengths
- B22D11/16—Controlling or regulating processes or operations
- B22D11/18—Controlling or regulating processes or operations for pouring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D11/00—Continuous casting of metals, i.e. casting in indefinite lengths
- B22D11/14—Plants for continuous casting
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The application mainly provides a method for controlling flow field bias of a crystallizer, which comprises the following steps: acquiring liquid level data of two sides of an immersed nozzle in real time; calculating the liquid level difference on two sides of the submerged nozzle based on the liquid level data; and when the liquid level difference between two sides of the submerged nozzle is greater than a preset threshold value, adjusting the depth of the submerged nozzle in the crystallizer. The technical scheme provided by the application is simple to operate, and can quickly respond when the flow field of the crystallizer is disordered according to the liquid level fluctuation condition in the crystallizer, and meanwhile, different control measures are adopted to quickly improve the liquid level fluctuation caused by bias flow, so that the influence of the bias flow on the quality of a casting blank is reduced, and the quality of the casting blank is improved; the technical scheme provided by the application does not need to reduce the casting pulling speed of continuous casting equipment in actual operation, can effectively inhibit the turbulence of a crystallizer flow field, and does not influence the production efficiency of continuous casting production.
Description
Technical Field
The application belongs to the technical field of continuous casting, and particularly relates to a method and a device for controlling flow field bias of a crystallizer.
Background
In the slab continuous casting process, the problem of blockage in the submerged nozzle is always concerned by researchers, and inclusions containing high melting points are attached to the inner wall of the submerged nozzle in the casting process to cause uneven steel flow, so that the fluctuation of the liquid level of the crystallizer is increased. The blockage of the water gap can destroy a flow field in the crystallizer, change the form of flow and form asymmetrical flow under certain conditions, so that the inner part of the crystallizer is overturned, the liquid level fluctuation is caused, the slag entrapment of a casting blank is caused, and the quality of the casting blank is seriously deteriorated. When the nozzle plug is flushed, a large amount of molten steel gushes out along with the nozzle plug, so that the liquid level of the crystallizer is severely fluctuated, a steel leakage accident is seriously possibly caused, and the nozzle adhesive enters the molten steel of the crystallizer along with the nozzle plug, so that the surface quality and the internal quality of a casting blank are deteriorated.
When the submerged nozzle is seriously blocked, a person skilled in the art can only reduce the casting pulling speed, and the casting pulling speed is increased to a normal level after the nozzle is replaced.
In order to solve the above technical problems and improve the deficiencies of the prior art, a method for controlling the bias flow of the crystallizer flow field without affecting the production efficiency is urgently needed by those skilled in the art.
Disclosure of Invention
The embodiment of the application provides a method and a device for controlling the flow field bias of a crystallizer, so that the flow field bias of the crystallizer can be effectively controlled at least to a certain extent.
Other features and advantages of the present application will be apparent from the following detailed description, or may be learned by practice of the application.
In one aspect of the present application, a method for controlling a bias flow of a crystallizer flow field is provided, the method includes:
acquiring liquid level data of two sides of the submerged nozzle in real time; calculating the liquid level difference on two sides of the submerged nozzle based on the liquid level data; and when the liquid level difference between two sides of the submerged nozzle is greater than a preset threshold value, adjusting the depth of the submerged nozzle in the crystallizer.
In an embodiment of the present application, when the liquid level difference between the two sides of the submerged nozzle is greater than a predetermined threshold, the depth of the submerged nozzle in the crystallizer is adjusted, and the specific method includes:
when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value;
and adjusting the depth of the submerged nozzle in the crystallizer according to the difference value.
In an embodiment of the present application, said adjusting the depth of the submerged nozzle in the mold according to the difference value includes:
determining a depth increasing value of the submerged nozzle in the crystallizer according to the difference value, wherein the depth increasing value is in positive correlation with the difference value; and adjusting the depth of the submerged nozzle in the crystallizer according to the depth increasing value.
In an embodiment of the present application, the method for controlling the bias flow of the crystallizer flow field further includes:
when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value; and when the liquid level difference on two sides of the submerged nozzle is larger than a preset threshold value, adjusting the gas input amount of each inert gas input path in the crystallizer.
In an embodiment of the present application, when the liquid level difference between the two sides of the submerged nozzle is greater than a predetermined threshold, adjusting the gas input amount for each inert gas input path in the crystallizer includes:
determining a reduction value of the gas input quantity according to the difference value, wherein the reduction value of the gas input quantity is positively correlated with the difference value; and adjusting the gas input amount to each inert gas input path in the crystallizer according to the reduction value of the gas input amount.
In another aspect of the present application, there is provided a device for controlling a bias flow of a crystallizer flow field, the device comprising:
the acquisition unit is used for acquiring liquid level data of two sides of the submerged nozzle in real time; the calculating unit is used for calculating the liquid level difference on two sides of the submerged nozzle based on the liquid level data; the first adjusting unit is used for adjusting the depth of the submerged nozzle in the crystallizer when the liquid level difference between two sides of the submerged nozzle is larger than a preset threshold value.
In one embodiment of the present application, the first adjusting unit is configured to: when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value; and adjusting the depth of the submerged nozzle in the crystallizer according to the difference value.
In one embodiment of the present application, the first adjusting unit is further configured to: determining a depth increasing value of the submerged nozzle in the crystallizer according to the difference value, wherein the depth increasing value is in positive correlation with the difference value; and adjusting the depth of the submerged nozzle in the crystallizer according to the depth increasing value.
In an embodiment of the present application, the crystallizer flow field bias flow device further includes a second adjusting unit, and the second adjusting unit is configured to: when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value; and adjusting the gas input amount of each inert gas input path in the crystallizer according to the difference value.
In an embodiment of the present application, the second adjusting unit is further configured to: determining a reduction value of the gas input quantity according to the difference value, wherein the reduction value of the gas input quantity is positively correlated with the difference value; and adjusting the gas input amount to each inert gas input path in the crystallizer according to the reduction value of the gas input amount.
According to the technical scheme, the application has at least the following advantages and progress effects:
(1) the technical scheme provided by the application is simple to operate, and can quickly respond when the flow field of the crystallizer is disordered according to the liquid level fluctuation condition in the crystallizer, and meanwhile, different control measures are adopted to quickly improve the liquid level fluctuation caused by bias flow, so that the influence of the bias flow on the quality of a casting blank is reduced, and the quality of the casting blank is improved;
(2) the technical scheme provided by the application does not need to reduce the casting pulling speed of continuous casting equipment in actual operation, can effectively inhibit the flow field disorder of the crystallizer, and does not influence the production efficiency of continuous casting production.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the application and, together with the description, serve to explain the principles of the application. It is obvious that the drawings in the following description are only some embodiments of the application, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:
fig. 1 shows a schematic diagram of a method for controlling a bias flow of a crystallizer flow field in an embodiment of the present application.
FIG. 2 shows a simplified schematic diagram of real-time acquisition of liquid level data across a submerged entry nozzle in one embodiment of the present application.
Fig. 3 shows a schematic diagram of a method for adjusting the depth of the submerged nozzle in the crystallizer in one embodiment of the present application.
Fig. 4 shows a schematic diagram of another method for controlling the bias flow of the crystallizer flow field in an embodiment of the present application.
Detailed Description
Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art.
Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided to give a thorough understanding of embodiments of the application. One skilled in the relevant art will recognize, however, that the embodiments of the present application can be practiced without one or more of the specific details, or with other methods, components, devices, steps, and so forth. In other instances, well-known methods, devices, implementations, or operations have not been shown or described in detail to avoid obscuring aspects of the application.
The block diagrams shown in the figures are functional entities only and do not necessarily correspond to physically separate entities. I.e. these functional entities may be implemented in the form of software, or in one or more hardware modules or integrated circuits, or in different networks and/or processor means and/or microcontroller means.
The flow charts shown in the drawings are merely illustrative and do not necessarily include all of the contents and operations/steps, nor do they necessarily have to be performed in the order described. For example, some operations/steps may be decomposed, and some operations/steps may be combined or partially combined, so that the actual execution sequence may be changed according to the actual situation.
Referring to fig. 1, fig. 1 shows a simplified diagram of a method for controlling a bias flow of a crystallizer flow field in an embodiment of the present application, the method includes steps S1-S3:
step S1: and acquiring liquid level data of two sides of the submerged nozzle in real time.
Step S2: and calculating the liquid level difference of two sides of the submerged nozzle based on the liquid level data.
Step S3: and when the liquid level difference between two sides of the submerged nozzle is greater than a preset threshold value, adjusting the depth of the submerged nozzle in the crystallizer.
Referring to fig. 2, fig. 2 is a schematic diagram illustrating an embodiment of steps S1-S2 for obtaining liquid level data of two sides of a submerged nozzle in real time, where a and B can be regarded as two sides of the submerged nozzle in this embodiment, and the corresponding liquid level data a and B are the liquid level data of two sides of the submerged nozzle obtained in real time in this embodiment.
With reference to fig. 2, in step S2 of the present embodiment: and calculating the liquid level difference on two sides of the submerged nozzle based on the liquid level data. The liquid level difference may be calculated according to the following method: and subtracting the liquid level data on the two sides, and taking the absolute value of the difference value as the liquid level difference. In the present embodiment, the liquid level difference Δ h ═ a-b | is shown in the figure.
Referring to fig. 3, fig. 3 shows an embodiment of step S3, when the liquid level difference between two sides of the submerged nozzle is greater than a predetermined threshold, the depth of the submerged nozzle in the mold is adjusted, and the specific operation includes steps S301-S302:
step S301, when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value.
And S302, adjusting the depth of the submerged nozzle in the crystallizer according to the difference value.
For example, in a conventional continuous casting apparatus, when a liquid level difference between two sides of the submerged nozzle is a and a predetermined threshold value is B, the difference value C is a-B, and the depth D of the submerged nozzle in the mold is adjusted according to the size of C. In actual production, when the liquid level of the crystallizer fluctuates, the liquid level difference is a variable, control force of different degrees can be adopted according to different liquid level differences, and appropriate response can be made according to the fluctuation conditions of the liquid level of different degrees.
In an embodiment of step S302, adjusting the depth of the submerged nozzle in the mold according to the difference value may further include:
determining a depth increase value of the submerged nozzle in the crystallizer according to the difference value, wherein the depth increase value is positively correlated with the difference value;
and adjusting the depth of the submerged nozzle in the crystallizer according to the depth increase value.
For example, in five sets of conventional continuous casting equipment, the difference between the liquid level difference on both sides of the submerged nozzle and the predetermined threshold value is A, B, C, D, E, and the corresponding depth increase values are a, b, c, d and e. Given A > B > C > D > E, the depth increment value is positively correlated to the difference value in this example, thus a > B > C > D > E.
During actual continuous casting production, when the liquid level of the crystallizer fluctuates, the liquid level difference is a variable, and control force of different degrees can be adopted according to different liquid level differences. When the liquid level difference is relatively large, the fluctuation of the liquid level in the crystallizer is proved to be very violent at the moment, and the liquid level condition is proved to be very turbulent, so that relatively strong adjusting force is needed, and finally, the depth of the submerged nozzle in the crystallizer is adjusted to be relatively deep.
In one embodiment of step S3, the predetermined threshold may be set to 6 mm.
In one embodiment of step S3, the depth of the submerged nozzle in the crystallizer can be adjusted to increase by 5-10mm according to the liquid level difference.
Referring to fig. 4, in an embodiment of the present application, the method for controlling the bias flow of the crystallizer flow field can be further implemented by steps S01-S03:
and step S01, acquiring liquid level data of two sides of the submerged nozzle in real time.
And step S02, when the liquid level difference between the two sides of the submerged nozzle is larger than a preset threshold value, calculating the difference value between the liquid level difference between the two sides of the submerged nozzle and the preset threshold value.
And step S03, when the liquid level difference between the two sides of the submerged nozzle is larger than a preset threshold value, adjusting the gas input amount of each inert gas input path in the crystallizer.
In actual production, the input inert gas can be used as a protective gas to protect the stable running of the continuous casting process. Once the liquid level in the crystallizer fluctuates, the input inert gas easily blows off the blockage on the inner wall of the water gap, and larger liquid level fluctuation is caused. Therefore, when the liquid level difference between the two sides of the submerged nozzle is larger than a preset threshold value, the gas input amount of each inert gas input path in the crystallizer can be reduced, so that the blockage adhered to the inner wall of the submerged nozzle is prevented from falling off, and larger liquid level fluctuation is caused.
For example, in a conventional continuous casting apparatus, when a liquid level difference between two sides of the submerged nozzle is a and a predetermined threshold value is B, the difference value C is a-B, and the gas input amount D of each inert gas input path in the mold is adjusted according to the size of C. In actual production, when the liquid level of the crystallizer fluctuates, the liquid level difference is a variable, control force of different degrees can be adopted according to different liquid level differences, and appropriate response can be made according to different liquid level fluctuation conditions.
In an embodiment of step S02, when the liquid level difference between the two sides of the submerged nozzle is greater than the predetermined threshold, the gas input amount for each inert gas input path in the crystallizer is adjusted, which may be performed as follows: determining a reduction value of the gas input quantity according to the difference value, wherein the reduction value of the gas input quantity is positively correlated with the difference value; and adjusting the gas input amount to each inert gas input path in the crystallizer according to the reduction value of the gas input amount.
For example, in five sets of existing continuous casting equipment, the difference between the liquid level difference on both sides of the submerged nozzle and the predetermined threshold is A, B, C, D, E, and the corresponding reduction values of the gas input amount are a, b, c, d and e. Given A > B > C > D > E, the decrease in gas input in this example is positively correlated to the difference, and thus a > B > C > D > E.
During actual continuous casting production, when the liquid level of the crystallizer fluctuates, the liquid level difference is a variable, and control force of different degrees can be adopted according to different liquid level differences. When the liquid level difference is relatively large, it is proved that the fluctuation of the liquid level in the crystallizer is very violent at the moment, the liquid level condition is very disordered, so that relatively strong adjustment force is needed, and finally, the reduction value of the gas input quantity is relatively large.
In one embodiment of step S03, argon may be used as the inert gas input to the crystallizer.
In one embodiment of step S03, the input path of the inert gas may include: the position of the stopper, the position of the water feeding port and the position between the plates; the corresponding inert gas input amounts are: the argon blowing amount of the stopper rod, the argon blowing amount of the upper water gap and the argon blowing amount between plates.
In one embodiment of step S03, the predetermined threshold may be set to 6 mm.
In one embodiment of step S03, the inert gas input amount for each input path may be adjusted as follows: the argon blowing amount of the stopper rod is reduced by 0.5-1.0L/min, the argon blowing amount of the water feeding port is reduced by 0.75-1.5L/min, and the argon blowing amount between plates is reduced by 1.0-2.0L/min.
In order that those skilled in the art may more fully understand the present application, reference will now be made to a full embodiment.
In the process of continuously casting certain ultra-low carbon steel, the argon blowing amount of the stopper rod, the argon blowing amount of the upper water gap and the argon blowing amount between plates are respectively as follows: 5.0L/min, 6.0L/min, the depth of the submerged nozzle in the crystallizer is 170mm, and the predetermined threshold is set to be 6 mm.
The liquid level data of the two sides of the submerged nozzle are obtained in real time, when the 6 th furnace is cast, the liquid level on one side of the nozzle is found to fluctuate violently, one side of the nozzle is too stable and inactive, and the liquid level difference between the two sides of the submerged nozzle is calculated to be 6.5 mm.
And adjusting the stopper rod, reducing the argon blowing amount of the stopper rod by 0.7L/min, reducing the argon blowing amount of the water feeding port by 0.9L/min, and reducing the argon blowing amount between plates by 1.2L/min. Finally, the argon blowing flow among the stopper rod, the water feeding port and the plates is respectively adjusted to 4.3L/min, 4.1L/min and 4.8L/min; the depth of the submerged nozzle in the crystallizer is deepened by 5mm and is adjusted to 175 mm.
And observing the liquid level fluctuation conditions on the two sides of the submerged nozzle again, reducing the severe liquid level fluctuation, and calculating to obtain that the liquid level difference on the two sides of the submerged nozzle is 5.2mm and is less than the preset threshold value of 6mm, thereby reducing the problem of overlarge liquid level fluctuation caused by bias flow.
In another aspect of the application, a device for controlling bias flow of a crystallizer flow field is provided.
In one embodiment of the present application, the control device for the bias flow of the crystallizer flow field includes: the acquisition unit is used for acquiring liquid level data of two sides of the submerged nozzle in real time; the calculating unit is used for calculating the liquid level difference on two sides of the submerged nozzle based on the liquid level data; the first adjusting unit is used for adjusting the depth of the submerged nozzle in the crystallizer when the liquid level difference of two sides of the submerged nozzle is larger than a preset threshold value.
In actual production, the obtaining unit can be arranged above the crystallizer, at the bottom of the tundish or on the submerged nozzle.
In one embodiment of the application, the first adjusting unit may be configured to: when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value; and adjusting the depth of the submerged nozzle in the crystallizer according to the difference value.
In an embodiment of the application, the first adjusting unit may be further configured to: determining a depth increasing value of the submerged nozzle in the crystallizer according to the difference value, wherein the depth increasing value is in positive correlation with the difference value; and adjusting the depth of the submerged nozzle in the crystallizer according to the depth increase value.
In an embodiment of the application, the apparatus may further comprise a second adjusting unit, and the second adjusting unit may be configured to: when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value; and adjusting the gas input amount of each inert gas input path in the crystallizer according to the difference value.
In an embodiment of the application, the second adjusting unit may be further configured to: determining a reduction value of the gas input quantity according to the difference value, wherein the reduction value of the gas input quantity is positively correlated with the difference value; and adjusting the gas input amount of each inert gas input path in the crystallizer according to the reduction value of the gas input amount.
Other embodiments of the present application will be apparent to those skilled in the art from consideration of the specification and practice of the embodiments disclosed herein. This application is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the application and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains.
It will be understood that the present application is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the application is limited only by the appended claims.
Claims (10)
1. A method for controlling bias flow of a crystallizer flow field is characterized by comprising the following steps:
acquiring liquid level data of two sides of an immersed nozzle in real time;
calculating the liquid level difference on two sides of the submerged nozzle based on the liquid level data;
and when the liquid level difference between two sides of the submerged nozzle is greater than a preset threshold value, adjusting the depth of the submerged nozzle in the crystallizer.
2. The method for controlling the bias flow of the crystallizer flow field according to claim 1, wherein when the liquid level difference between the two sides of the submerged nozzle is greater than a predetermined threshold value, the adjusting the depth of the submerged nozzle in the crystallizer comprises:
when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value;
and adjusting the depth of the submerged nozzle in the crystallizer according to the difference value.
3. The method of claim 2, wherein said adjusting the depth of said submerged entry nozzle in said mold according to said difference value comprises:
determining a depth increasing value of the submerged nozzle in the crystallizer according to the difference value, wherein the depth increasing value is in positive correlation with the difference value;
and adjusting the depth of the submerged nozzle in the crystallizer according to the depth increase value.
4. The method of controlling crystallizer flow field bias flow according to claim 1, further comprising:
when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value;
and when the liquid level difference on two sides of the submerged nozzle is larger than a preset threshold value, adjusting the gas input amount of each inert gas input path in the crystallizer.
5. The method of claim 4, wherein said adjusting the gas input for each inert gas input path in the crystallizer when the liquid level difference across the submerged nozzle is greater than a predetermined threshold comprises:
determining a reduction value of the gas input quantity according to the difference value, wherein the reduction value of the gas input quantity is positively correlated with the difference value;
and adjusting the gas input amount of each inert gas input path in the crystallizer according to the reduction value of the gas input amount.
6. A device for controlling bias flow of a crystallizer flow field is characterized by comprising:
the acquisition unit is used for acquiring liquid level data of two sides of the submerged nozzle in real time;
the calculating unit is used for calculating the liquid level difference on two sides of the submerged nozzle based on the liquid level data;
the first adjusting unit is used for adjusting the depth of the submerged nozzle in the crystallizer when the liquid level difference of two sides of the submerged nozzle is larger than a preset threshold value.
7. The crystallizer flow field bias flow control device of claim 6, wherein the first adjusting unit is configured to: when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value; and adjusting the depth of the submerged nozzle in the crystallizer according to the difference value.
8. The crystallizer flow field bias flow control device of claim 7, wherein the first adjusting unit is further configured to: determining a depth increasing value of the submerged nozzle in the crystallizer according to the difference value, wherein the depth increasing value is in positive correlation with the difference value; and adjusting the depth of the submerged nozzle in the crystallizer according to the depth increase value.
9. The crystallizer flow field bias flow control device of claim 7, further comprising a second adjustment unit configured to: when the liquid level difference on the two sides of the submerged nozzle is larger than a preset threshold value, calculating a difference value between the liquid level difference on the two sides of the submerged nozzle and the preset threshold value; and adjusting the gas input amount of each inert gas input path in the crystallizer according to the difference value.
10. The crystallizer flow field bias flow control device of claim 9, wherein the second adjusting unit is further configured to: determining a reduction value of the gas input quantity according to the difference value, wherein the reduction value of the gas input quantity is positively correlated with the difference value; and adjusting the gas input amount to each inert gas input path in the crystallizer according to the reduction value of the gas input amount.
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