CN114899000A - Fluxgate sensor iron core and preparation method thereof - Google Patents
Fluxgate sensor iron core and preparation method thereof Download PDFInfo
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- CN114899000A CN114899000A CN202210497357.XA CN202210497357A CN114899000A CN 114899000 A CN114899000 A CN 114899000A CN 202210497357 A CN202210497357 A CN 202210497357A CN 114899000 A CN114899000 A CN 114899000A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/001—Magnets
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F3/00—Cores, Yokes, or armatures
- H01F3/04—Cores, Yokes, or armatures made from strips or ribbons
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The invention provides a preparation method of a fluxgate sensor iron core, which comprises the following steps: s1, manufacturing an insulating layer; s2, manufacturing an electroplating seed layer; s3, manufacturing an electroplating mold; s4, manufacturing a first layer of film iron core: electroplating a first layer of film iron core on the electroplating mould by adopting an electroplating process, wherein the first layer of film iron core consists of a plurality of parallel strip-shaped iron cores, and the plurality of iron cores are at least 2 iron cores; s5, cleaning; s6, manufacturing a filling material; and S7, cleaning and drying. A single-layer plurality of strip-shaped iron cores are arranged in parallel. The invention has the advantages that: the multilayer strip-shaped iron core structure can further reduce the cross sectional area of each strip-shaped iron core, so that the demagnetization coefficient can be further reduced, and under the condition that the total effective cross sectional area of the iron core is unchanged, the sensitivity of the fluxgate is not greatly influenced, and the noise level of the fluxgate is remarkably reduced.
Description
Technical Field
The invention relates to the field of sensors, in particular to a fluxgate sensor iron core structure and a preparation method thereof.
Background
The micro fluxgate sensor has good application prospect in the fields of micro satellites, unmanned planes, robots and the like which require high stability. Many documents describe and describe fluxgate sensors in relation thereto.
The document 1 "Sources of Noise in a magnetic meter base on Orthogonal flux fluorescent in Fundamental mode. IEEE Transactions on Magnetics,2012,48(4):1508 and 1511" study shows that the major part of the Fluxgate Noise is not generated by the measurement circuit nor by the Noise of the excitation current, which is mainly generated inside the soft magnetic thin film core. The document 2 "Detection of motion in small bias magnetic field by a micro-flux-based sensing system, Journal of Applied Physics,2014,116:154701 (1-7)" studies show that the noise level of micro fluxgates can be reduced by the method of pasting the strip (pasting the strip core of a conventional fluxgate to a silicon wafer).
However, the tape attaching method of document 2 is not compatible with the micro fluxgate processing process, and the substantial problem of the increase of the noise of the micro fluxgate is not solved. The reduction of the noise of the flux gate under miniaturization conditions is an urgent problem to be solved in the field. Especially, the problem of noise generated by the soft magnetic thin film core is difficult to solve.
Disclosure of Invention
In order to reduce the noise problem mainly generated by the soft magnetic thin film core in the micro fluxgate.
The invention provides a method for preparing a multilayer iron core of a fluxgate sensor;
the solution is as follows:
a preparation method of a fluxgate sensor iron core comprises the following steps:
s1, manufacturing an insulating layer: growing a silicon dioxide film on a polished surface of a silicon wafer by taking the silicon wafer as a substrate, wherein the silicon dioxide film is used as an insulating layer;
s2, manufacturing an electroplating seed layer, and depositing copper on the insulating layer to be used as the electroplating seed layer;
s3, manufacturing an electroplating mold: spin-coating photoresist on the electroplating seed layer, and aligning the first layer of iron core mask to photoetching and developing to serve as an electroplating mold;
s4, manufacturing a first layer of film iron core: electroplating a first layer of film iron core on the electroplating mould by adopting an electroplating process, wherein the first layer of film iron core consists of a plurality of parallel strip-shaped iron cores, and the plurality of iron cores are at least 2 iron cores;
s5, cleaning: after the first layer of film iron core is electroplated, putting the first layer of film iron core into a photoresist cleaning solution to remove the photoresist, and then cleaning and drying the first layer of film iron core;
s6, preparing a filling material: preparing a filling material among a plurality of parallel strip-shaped iron cores; the filling material can be photoresist or diamagnetic material;
and S7, cleaning and drying.
Further, the silicon wafer in the step S1 is a single-polished silicon wafer.
Furthermore, the thickness of the single-polished silicon wafer is 500 μm.
Furthermore, the silicon dioxide film is grown by a wet oxidation method, and the thickness of the silicon dioxide film is 300 nm.
Further, in the step S2, depositing copper on the insulating layer adopts a magnetron sputtering process; the thickness of the deposited copper is 100 nm.
Furthermore, in the magnetron sputtering process, the substrate is heated to more than 250 ℃.
Further, the thickness of the spin-on photoresist in step S3 is 4 μm.
Further, the electroplating time of the electroplating process in the step S4 is 6 min; the thickness of the first layer of the film iron core is 4 mu m.
Further, the photoresist cleaning solution in the step S5 is acetone;
a method for preparing a multi-layer bar-shaped iron core of a fluxgate sensor comprises the steps S1 to S7, repeating the steps S2 to S7 for n times on the same substrate;
n is greater than or equal to 2, and the number of n is the number of layers of the iron core.
A single-layer plurality of strip-shaped iron cores are arranged in parallel.
Further, the filling material between each strip-shaped iron core can be photoresist or diamagnetic material, and the plurality of iron cores are at least 2 iron cores.
Furthermore, when the fluxgate sensor is a multi-layer iron core structure; the adjacent strip-shaped iron cores are arranged alternately.
Furthermore, when the fluxgate sensor is a multi-layer iron core structure; the adjacent strip-shaped iron cores in each layer can be aligned.
The invention has the advantages that: the multilayer strip-shaped iron core structure can further reduce the cross sectional area of each strip-shaped iron core, so that the demagnetization coefficient can be further reduced, and under the condition that the total effective cross sectional area of the iron core is unchanged, the sensitivity of the fluxgate is not greatly influenced, and the noise level of the fluxgate is remarkably reduced.
The two iron core arrangement modes can reduce the manufacturing cost of the iron cores and have simple manufacturing process.
Filling material can be the photoresist between every bar iron core, also can be diamagnetic material (like copper, gold, silver etc.), if diamagnetic material, can reduce the magnetic leakage and the stray magnetic field of every bar iron core border and both ends, prevent the magnetostatic coupling effect between every iron core simultaneously, be favorable to reducing fluxgate noise level, can also improve fluxgate's linear measurement scope.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic diagram of a method for manufacturing a multilayer iron core of a fluxgate sensor according to the present invention;
FIG. 2 is a schematic view of a single-layer core structure of a fluxgate sensor according to the present invention;
FIG. 3 is a schematic view of a multi-layer core structure of a fluxgate sensor according to the present invention;
description of reference numerals:
20: si substrate, 21: SiO2 2 Insulating layer, 22: cu seed layer, 23: photoresist, 24: and (3) an iron core.
Detailed Description
The present invention will be described more fully with reference to the following embodiments and accompanying drawings.
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The method for manufacturing the multilayer core of the fluxgate sensor according to the present invention will be described in detail with reference to several specific embodiments.
Fig. 1 shows steps of a method for manufacturing a multilayer core of a fluxgate sensor according to the present invention.
Under the MEMS process condition, the strip-shaped array iron core is prepared by adopting the process flows of photoetching, magnetron sputtering, electroplating and the like, wherein the specific process flow is as shown in figure 1 (the filling material takes copper as an example):
1) as shown in fig. (a): selecting a single polished silicon wafer with the thickness of 500 mu m as a substrate, cleaning the substrate, and growing a silicon dioxide (SiO2) film with the thickness of 300nm on a polished surface by adopting a wet oxidation method to be used as an insulating layer;
2) as shown in fig. (b): depositing 100nm copper (Cu) on the insulating layer as a plating seed layer by using a magnetron sputtering process, and heating the substrate to 250 ℃ in sputtering, so that the adhesion between the seed layer and the substrate can be enhanced;
3) as shown in FIG. (c): spin-coating a photoresist with the thickness of 4 μm on the substrate, and aligning the first layer of iron core mask to the photoetching development to be used as an electroplating mold; the first layer of cores is closest to the insulating layer.
4) As shown in FIG. d: electroplating a first layer of film iron core by adopting an electroplating process, wherein the electroplating time is 6min, and the growth thickness is 4 mu m; it should be noted that the first layer of film core is composed of a plurality of parallel strip cores, and the plurality of cores means at least 2 cores.
The benefits here are: according to the technical magnetics, when the thickness of an iron core is fixed, the cross section area of each iron core in a single-layer strip-shaped iron core structure is greatly reduced compared with that of a thin film iron core, so that the demagnetization coefficient of a single strip-shaped iron core determined by shape parameters is obviously reduced compared with that of the thin film iron core, meanwhile, the total effective cross section area of the single-layer iron core is basically unchanged compared with that of the thin film iron core, and finally, the sensitivity of the fluxgate is not greatly influenced, so that the noise level of the fluxgate is effectively reduced.
5) As shown in (e): after the electroplating is finished, putting the substrate into acetone, removing the photoresist, and then cleaning and drying the substrate;
6) as shown in (f): preparing a copper filling material by using a copper (Cu) electroplating process, wherein the thickness of the copper filling material is about 4 mu m, and the electroplating time is 6 min;
it should be noted here that the filling material between each strip-shaped iron core may be photoresist, or may be diamagnetic material (such as copper, gold, silver, etc.), and if the filling material is diamagnetic material, the leakage flux and stray magnetic field at the edge and both ends of each strip-shaped iron core may be reduced, and meanwhile, the magnetostatic coupling effect between each iron core is prevented, which is beneficial to reducing the noise level of the fluxgate, and may also improve the linear measurement range of the fluxgate.
7) After the electroplating is finished, cleaning and drying the substrate;
it should be noted that the substrate mentioned in the above steps refers to the state of the iron core during different steps or after different steps are completed in the manufacturing process.
For the preparation method of the multilayer iron core, the steps 2 to 7 are repeated on the basis.
The multilayer strip-shaped iron core structure can further reduce the cross sectional area of each strip-shaped iron core, so that the demagnetization coefficient can be further reduced, and under the condition that the total effective cross sectional area of the iron cores is unchanged, the sensitivity of the fluxgate is not greatly influenced, and the noise level of the fluxgate is remarkably reduced.
It should be noted that in the multilayer strip-shaped iron core structure, each layer of strip-shaped iron cores may be aligned or alternatively arranged.
Meanwhile, the invention also provides a single-layer or multi-layer iron core structure of the fluxgate sensor. The description is as follows:
fig. 2 is a schematic view of a single-layer core structure of a fluxgate sensor according to the present invention; the single-layer iron core structure obtained by the method for preparing the multilayer iron core of the fluxgate sensor of the present invention is to be noted that the single-layer iron core structure can be obtained without repeating the steps 2 to 7 in the above method. As can be seen from fig. 2, a plurality of single-layer strip cores are arranged in parallel. Filling material can be the photoresist between every bar iron core, also can be diamagnetic material (like copper, gold, silver etc.), if diamagnetic material, can reduce the magnetic leakage and the stray magnetic field of every bar iron core border and both ends, prevent the magnetostatic coupling effect between every iron core simultaneously, be favorable to reducing fluxgate noise level, can also improve fluxgate's linear measurement scope.
For the multi-layer result, fig. 3 is a schematic view of a multi-layer core structure of the fluxgate sensor of the present invention; as in the multi-layer strip-shaped core structure in fig. 3, adjacent strip-shaped cores in each layer are arranged alternately, that is, the positions of the upper and lower layer cores are alternated with each other, and are not aligned (of course, the positions of the strip-shaped cores in each layer may be identical, that is, they may also be aligned).
When the multilayer strip-shaped iron cores are manufactured in an aligned arrangement mode, the multilayer strip-shaped iron cores can be manufactured only by one set of iron core mask plate; when the multilayer strip-shaped iron cores are alternately arranged and manufactured, the two sets of iron core mask plates can finish the manufacturing of the multilayer strip-shaped iron cores. It should be noted here that, when the multiple layers of strip-shaped iron cores are alternately arranged and manufactured, the iron cores can be manufactured by using a set of iron core mask plates, and when the iron cores are manufactured, the positions of the front and the back of the mask plates are shifted and staggered.
The invention has the advantages that: the multilayer strip-shaped iron core structure can further reduce the cross sectional area of each strip-shaped iron core, so that the demagnetization coefficient can be further reduced, and under the condition that the total effective cross sectional area of the iron core is unchanged, the sensitivity of the fluxgate is not greatly influenced, and the noise level of the fluxgate is remarkably reduced.
The two iron core arrangement modes can reduce the manufacturing cost of the iron cores and have simple manufacturing process.
Filling material can be the photoresist between every bar iron core, also can be diamagnetic material (like copper, gold, silver etc.), if diamagnetic material, can reduce the magnetic leakage and the stray magnetic field of every bar iron core border and both ends, prevent the magnetostatic coupling effect between every iron core simultaneously, be favorable to reducing fluxgate noise level, can also improve fluxgate's linear measurement scope.
Claims (10)
1. A preparation method of a fluxgate sensor core is characterized by comprising the following steps:
s1, manufacturing an insulating layer: growing a silicon dioxide film on a polished surface of a silicon wafer by taking the silicon wafer as a substrate, wherein the silicon dioxide film is used as an insulating layer;
s2, manufacturing an electroplating seed layer, and depositing copper on the insulating layer to be used as the electroplating seed layer;
s3, manufacturing an electroplating mold: spin-coating photoresist on the electroplating seed layer, and aligning the first layer of iron core mask to photoetching and developing to serve as an electroplating mold;
s4, manufacturing a first layer of iron core: electroplating a first layer of film iron core on the electroplating mould by adopting an electroplating process, wherein the first layer of iron core consists of a plurality of parallel strip-shaped iron cores, and the plurality of iron cores are at least 2 iron cores;
s5, cleaning: after the first layer of film iron core is electroplated, putting the first layer of film iron core into a photoresist cleaning solution to remove the photoresist, and then cleaning and drying the first layer of film iron core;
s6, preparing a filling material: preparing a filling material among a plurality of parallel strip-shaped iron cores; the filling material can be photoresist or diamagnetic material;
and S7, cleaning and drying.
2. The method for manufacturing a fluxgate sensor core according to claim 1, wherein: the silicon wafer in the step S1 is a single-polished silicon wafer.
3. The method for manufacturing a fluxgate sensor core according to claim 1, wherein: and depositing copper on the insulating layer in the step S2 by adopting a magnetron sputtering process.
4. The method for manufacturing a fluxgate sensor core according to claim 1, wherein: the electroplating time of the electroplating process in the step S4 is 6 min; the thickness of the first layer of iron core is 4 μm.
5. The method for manufacturing a fluxgate sensor core according to claim 1, wherein: the photoresist cleaning solution in step S5 is acetone.
6. A method for manufacturing a multi-layered bar-shaped iron core for a fluxgate sensor comprising steps S1 to S7 according to any one of claims 1 to 5, wherein the steps S2 to S7 are repeated n times on the same substrate; n is greater than or equal to 2, and the number of n is the number of layers of the iron core.
7. A fluxgate sensor core manufactured by the method for manufacturing a fluxgate sensor core according to any one of claims 1 to 6, wherein a plurality of single-layered bar cores are arranged in parallel.
8. The fluxgate sensor core of claim 7 wherein: the filling material between each strip-shaped iron core is photoresist or diamagnetic material, and the plurality of iron cores are at least 2 iron cores.
9. The fluxgate sensor core of claim 8 wherein: when the fluxgate sensor is of a multilayer iron core structure; the adjacent strip-shaped iron cores are arranged alternately.
10. The fluxgate sensor core of claim 8 wherein: when the fluxgate sensor is of a multilayer iron core structure; and each adjacent layer of strip-shaped iron cores are aligned.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210497357.XA CN114899000A (en) | 2022-05-09 | 2022-05-09 | Fluxgate sensor iron core and preparation method thereof |
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| CN202210497357.XA CN114899000A (en) | 2022-05-09 | 2022-05-09 | Fluxgate sensor iron core and preparation method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023236249A1 (en) * | 2022-06-09 | 2023-12-14 | 河南理工大学 | Soft magnetic thin film iron core, manufacturing method therefor and sensor |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130224887A1 (en) * | 2012-02-28 | 2013-08-29 | Dok Won Lee | Method of Forming a Laminated Magnetic Core with Sputter Deposited and Electroplated Layers |
| CN106298180A (en) * | 2016-08-17 | 2017-01-04 | 上海交通大学 | The graphical planar magnetic core double layer planar micro-inductance of helical structure thin film and preparation method |
| CN109358300A (en) * | 2018-09-29 | 2019-02-19 | 河南理工大学 | A kind of micro fluxgate sensor based on stereochemical structure iron core |
| JP2019201190A (en) * | 2018-05-18 | 2019-11-21 | 株式会社村田製作所 | Inductor and manufacturing method for the same |
| CN111123177A (en) * | 2020-01-20 | 2020-05-08 | 河南理工大学 | Folding multilayer iron core orthogonal fluxgate sensor |
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2022
- 2022-05-09 CN CN202210497357.XA patent/CN114899000A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130224887A1 (en) * | 2012-02-28 | 2013-08-29 | Dok Won Lee | Method of Forming a Laminated Magnetic Core with Sputter Deposited and Electroplated Layers |
| CN106298180A (en) * | 2016-08-17 | 2017-01-04 | 上海交通大学 | The graphical planar magnetic core double layer planar micro-inductance of helical structure thin film and preparation method |
| JP2019201190A (en) * | 2018-05-18 | 2019-11-21 | 株式会社村田製作所 | Inductor and manufacturing method for the same |
| CN109358300A (en) * | 2018-09-29 | 2019-02-19 | 河南理工大学 | A kind of micro fluxgate sensor based on stereochemical structure iron core |
| CN111123177A (en) * | 2020-01-20 | 2020-05-08 | 河南理工大学 | Folding multilayer iron core orthogonal fluxgate sensor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023236249A1 (en) * | 2022-06-09 | 2023-12-14 | 河南理工大学 | Soft magnetic thin film iron core, manufacturing method therefor and sensor |
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