CN114895413B - Waveguide with pore cladding structure and preparation method thereof - Google Patents
Waveguide with pore cladding structure and preparation method thereof Download PDFInfo
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- CN114895413B CN114895413B CN202210315362.4A CN202210315362A CN114895413B CN 114895413 B CN114895413 B CN 114895413B CN 202210315362 A CN202210315362 A CN 202210315362A CN 114895413 B CN114895413 B CN 114895413B
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- 238000005253 cladding Methods 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title abstract description 9
- 239000011148 porous material Substances 0.000 title abstract description 8
- 239000000463 material Substances 0.000 claims abstract description 40
- 238000007639 printing Methods 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 11
- 230000003287 optical effect Effects 0.000 claims description 18
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000002861 polymer material Substances 0.000 claims description 4
- 238000007711 solidification Methods 0.000 claims description 4
- 230000008023 solidification Effects 0.000 claims description 4
- 229920001486 SU-8 photoresist Polymers 0.000 claims description 3
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 54
- 229920000642 polymer Polymers 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000010146 3D printing Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 241000984642 Cura Species 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/44—Mechanical structures for providing tensile strength and external protection for fibres, e.g. optical transmission cables
- G02B6/4401—Optical cables
- G02B6/4429—Means specially adapted for strengthening or protecting the cables
- G02B6/443—Protective covering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optical Integrated Circuits (AREA)
Abstract
The invention discloses a pore cladding waveguide and a preparation method thereof. The method includes establishing a waveguide model; saving the print file in STL format; dropping uncured photopolymer material onto a substrate; importing a printing file, slicing the waveguide model to obtain a path file scanned by a laser, and printing; the photopolymer material solidifies to form a waveguide device on the substrate. The waveguide structure has low loss and three-dimensional property, is favorable for sensing and has no perturbation; the preparation method is simple and reliable, one-time forming is free of register errors, one-time printing forming of the same material is adopted, and the process of replacing materials of multiple materials and the later register errors are avoided.
Description
Technical Field
The invention relates to the technical field of polymer optical waveguide preparation, in particular to a waveguide with a pore cladding structure and a preparation method thereof.
Background
The polymer material is an important material of the optical waveguide device, has wide application in the fields of optical communication, optical calculation and optical sensing, and is particularly flexible, stretchable, biocompatible and self-healing, and particularly suitable for the fields of wearable and sensing application. The 3D printing polymer optical waveguide is a new technology developed in recent years, the processing of a high-quality waveguide device is mainly realized through an ultra-precise processing mechanical system or a laser processing system, and along with the development of the laser processing technology and the application of a two-photon polymerization technology, the processing size of the optical waveguide can reach the size precision of 50 nm.
The existing two-photon polymerization scheme mainly realizes the solidification of polymer materials by focusing laser in polymer liquid drops, so the printing materials are usually core layer materials, air and a substrate are used as cladding layers, and the structure is mainly suitable for planar devices. In 2020, researchers have adopted air as a cladding layer of a polymer waveguide, and the waveguide provides a cantilever type polymer waveguide structure, so that the cantilever type polymer waveguide can be applied to optical interconnection and end face space connection of a plurality of layers of chips, and is an important scheme for dense space integration of photonic chips. However, when the printed structure is a stereoscopic device, the device has the following problems: the stability of the three-dimensional structure is problematic, and the three-dimensional structure requires a supporting structure, which causes loss and scattering of light. The existing three-dimensional waveguide structure mainly adopts the bottom support and the side surface attaching support of the bracket structure, and the loss of the structure can be reduced through the optimization of supporting parameters. Meanwhile, the structure can bring about phase perturbation of light at the bracket and influence the output waveform of optical structures such as gratings. If different materials are used as the supporting structure, the loss can be reduced, but the complexity of the preparation process is improved, and meanwhile, the error of later alignment is brought. The same material is adopted, so that the waveguide is supported, light can not leak from the supporting structure, the perturbation of the supporting structure is reduced, the stability of the device is improved, and the three-dimensional waveguide is a problem to be solved.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides a waveguide with a pore cladding structure and a preparation method thereof, wherein laser two-photon polymer 3D printing is adopted under the condition that a plurality of material bodies are not adopted, the waveguide and air cladding structure are manufactured in a single optical polymer material sensitive to laser, and an optical waveguide device is obtained after development.
The technical scheme adopted by the invention is as follows:
an aperture clad waveguide, characterized by: the waveguide structure comprises a waveguide layer and a supporting structure which is arranged outside the waveguide layer and wraps the waveguide layer, wherein the supporting structure is a net-shaped supporting structure, and an inner layer of the net-shaped supporting structure is in contact with an outer layer of the waveguide layer.
Further, the waveguide layer is of a strip-shaped structure.
Further, the cross section of the waveguide layer of the strip-shaped structure is rectangular, the cross section of the supporting structure wrapping the periphery of the waveguide layer is a ring frame structure comprising an outer rectangle and an inner rectangle, wherein the outer rectangle is concentric with the inner rectangle, the length of the outer rectangle is the same as that of the waveguide layer, the height of the outer rectangle is 2-5 times that of the waveguide layer, the width of the outer rectangle is 2-5 times that of the waveguide layer, and the distance from the outer rectangle to the inner rectangle is not less than 0.5 times that of the inner rectangle.
Further, the waveguide layer has a width of 1 μm to 20 μm and a height of 1 μm to 20 μm.
Or the cross section of the waveguide layer of the strip-shaped structure is circular, and correspondingly, the cross section of the supporting structure wrapped on the periphery of the waveguide layer is a ring frame structure comprising an outer rectangle and an inner circle, wherein the outer rectangle is concentric with the inner circle, the length of the outer rectangle is the same as that of the waveguide layer, and the distance from the circumferential boundary of the inner circle to the outer rectangle is not smaller than the radius of the inner circle.
Or the cross section of the waveguide layer of the strip-shaped structure is triangular, correspondingly, the cross section of the supporting structure wrapped on the periphery of the waveguide layer is a ring frame structure comprising an outer rectangle and an inner triangle, the length of the outer rectangle is the same as that of the waveguide layer, and the distance from the boundary of the inner triangle to the outer rectangle is not less than half of the longest height of the triangle.
Further, the length of the waveguide layer is 100 μm-1cm.
A method of making a waveguide of an aperture cladding structure, the method comprising the steps of:
s1, establishing a waveguide model according to any one of claims 1-7;
after modeling is completed, storing the model into a print file in an STL format;
s2, dropwise adding uncured photopolymer material on a substrate, and placing the substrate on an objective table of a microscope;
s3, importing the printing file saved in the step S1, slicing the M-Z optical waveguide sensor model by adopting slicing software to obtain a corresponding thin layer, and slicing to obtain a path file scanned by a laser;
s4, printing is started according to the path file scanned by the laser and the printing parameters;
s5, solidifying the uncured photopolymer material irradiated by the laser light spot, forming a waveguide device on the substrate after solidification, and removing the uncured photopolymer material by using a developer to obtain the waveguide structure.
Further, the photopolymer material comprises SU-8 photoresist material, NOA photoresist or greenA photoresist, and the photopolymer material is matched to the wavelength of a laser, which causes the irradiated photopolymer material to cure.
Further, when slicing the M-Z optical waveguide sensor model by adopting slicing software, the longitudinal precision hz of the slice is not more than the dimension of the light spot direction, the transverse precision hh is 0.02-1 mu M, corresponding thin layers are obtained by slicing in the slice direction, different linear filling is arranged in the corresponding thin layers, and the distance between lines in the same layer is printed to be smaller than the dimension of the light spot horizontal projection; the distance between the vertical layers of the light spots is smaller than the size of the vertical light spots; the printing optical power is 5-150mW, the exposure time is 0.5-5ms, the developer is acetone, and the acetone is developed for 20-60s.
Compared with the prior art, the invention has the beneficial effects that:
the waveguide structure is provided with:
low loss: the solid structure ensures that light is transmitted in the waveguide and less light is distributed at the position, close to the waveguide, of the supporting structure, so that leakage of the supporting structure is reduced, and loss of the device is low.
Stereozation: the waveguide structure is suspended, the air cladding structure is arranged on four sides, and the stability is high.
And the sensing is facilitated: the air pore cladding promotes the contact between light and an object to be detected, improves the overlapping integral factor and improves the sensor precision.
No perturbation: the effect on waveguide transmission is constant, no perturbation effect is generated, and unlike the stand alone support and contact structure, perturbation is generated.
The preparation method is simple and reliable, one-time forming is free of register errors, one-time printing forming of the same material is adopted, and the process of replacing materials of multiple materials and the later register errors are avoided.
Drawings
FIG. 1 is a schematic perspective view of a waveguide according to an embodiment of the present invention;
FIG. 2 is a schematic side view of a waveguide according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a front view of a waveguide according to an embodiment of the present invention;
FIG. 4 is a flow chart of a method according to an embodiment of the present invention;
fig. 5 is a visual diagram of an apparatus and a flow used in the printing method according to the embodiment of the invention.
Detailed Description
As shown in fig. 1-3, an aperture cladding waveguide comprises a waveguide layer 1 and a supporting structure 2 arranged outside the waveguide layer and wrapping the waveguide layer, wherein the supporting structure 2 is a net-shaped supporting structure, and an inner layer of the net-shaped supporting structure is in contact with an outer layer of the waveguide layer.
The waveguide layer is of a strip-shaped structure, and the length of the waveguide layer is 300 mu m-1cm.
The cross-section of the waveguide layer and the support surface of the support structure may take a variety of forms.
First form: the cross section of the waveguide layer of the strip-shaped structure is rectangular, the width of the waveguide layer with the rectangular cross section is 1-20 mu m, and the height of the waveguide layer is 1-20 mu m. The cross section of the supporting structure wrapping the periphery of the waveguide layer is a ring frame structure comprising an outer rectangle and an inner rectangle, wherein the outer rectangle is concentric with the inner rectangle, the length of the outer rectangle is the same as that of the waveguide layer, the height of the outer rectangle is 2-5 times of that of the waveguide layer, the width of the outer rectangle is 2-5 times of that of the waveguide layer, and the distance from the outer rectangle to the inner rectangle is not less than 0.5 times of that of the inner rectangle.
In a second form, the cross section of the waveguide layer of the strip-shaped structure is circular, and correspondingly, the cross section of the supporting structure wrapped around the periphery of the waveguide layer is a ring frame structure comprising an outer rectangle and an inner circle, wherein the outer rectangle is concentric with the inner circle, the length of the outer rectangle is the same as that of the waveguide layer, and the distance from the circumferential boundary of the inner circle to the outer rectangle is not smaller than the radius of the inner circle.
In a third form, the cross section of the waveguide layer of the strip-shaped structure is triangular, and correspondingly, the cross section of the supporting structure wrapped on the periphery of the waveguide layer is a ring frame structure comprising an outer rectangle and an inner triangle, the length of the outer rectangle is the same as that of the waveguide layer, and the distance from the boundary of the inner triangle to the outer rectangle is not less than half of the longest height of the triangle.
The present embodiment only exemplifies these three forms, but is certainly not limited to these three forms, and may be a polygonal structure form or the like.
As shown in fig. 4-5, a method for preparing a waveguide with an aperture cladding structure, the method comprising the steps of:
s1, establishing a waveguide model 11;
after modeling is completed, storing the model into a print file in an STL format;
in this step, the waveguide model is built, and the specific structure of the model is not described again. The model built may use soildworks, or other cartographic software, to make the three-dimensional model.
S2, dropwise adding uncured photopolymer material on the substrate 3, and placing the substrate on a stage of a microscope 4;
in this step, the substrate is a rectangular substrate, the rectangular substrate can be 5mm-2.5cm wide, the substrate length is 2cm-2.5cm, uncured photopolymer material 8 is dripped on the rectangular substrate 3, the photopolymer material 8 can be SU-8 photoresist material, NOA photoresist or greenA photoresist, the photopolymer material is matched with the wavelength of the laser 5, the wavelength of the laser 5 can enable the irradiated photopolymer material 8 to be cured, the rectangular substrate 3 is mounted on the stage of the microscope 4, the computer 6 is started, the laser 5 can be 532nm picosecond laser, the nanosecond laser or femtosecond laser, the laser energy is 10mW-200mW, the laser 5 is also connected with the laser controller 7, and the laser controller 7 can adjust the focal position and the output light intensity of the laser and the movement path of the laser spot.
S3, importing the print file saved in the step S1, slicing the waveguide model by adopting slicing software 9 to obtain a corresponding thin layer, and slicing to obtain a path file scanned by the laser;
in this step, the slicing software may be commercial software, such as cura, simplefy 3D, etc., the slice longitudinal precision hz is 0.05-1 μm, the longitudinal precision cannot be larger than the dimension of the light spot in the Z direction, otherwise the device is printed discontinuously, the transverse precision hh is 0.02-1 μm, the slicing direction may be the X, Y or Z direction, the corresponding direction slices to obtain the corresponding thin layers, different linear fills, such as spiral line fills, straight line fills, cross fills, and the pitch between lines in the same layer may be adjusted, in order to obtain a solid waveguide, the line pitch should be smaller than the dimension of the horizontal projection of the light spot, the vertical layer-to-layer pitch of the light spot should be smaller than the dimension of the vertical light spot, the light spot dimension is determined by the focusing lens and the laser wavelength, the light spot dimension X direction is generally 0.17-0.25 μm, the Y direction is generally 0.49-1.42 μm, and the Z direction is generally 0.49-1.42 μm. And obtaining a path file scanned by the laser after slicing.
S4, printing is started according to the path file scanned by the laser and the printing parameters;
specifically, in this step, the path file scanned by the laser is led to the laser controller 7, and the laser controller 7 can adjust the start position of printing by the laser so that the start position of the laser 5 is at the interface between the substrate 3 and the uncured photopolymer material, and the start position of printing is located inside the droplet of uncured photopolymer material in the horizontal direction. Setting printing environment parameters (such as invasive or air environment), setting light power to 5-150mW, setting exposure time to 0.5-5ms, selecting printing direction to be (o-X, o-Y o-z), and starting the laser 5 to start printing after parameter adjustment.
S5, solidifying the uncured photopolymer material irradiated by the laser light spot, forming a waveguide device on the substrate after solidification, and removing the uncured photopolymer material to obtain the waveguide structure of the pore cladding structure.
The waveguide structure obtained in this embodiment has:
low loss: the solid structure on the structure ensures that light is transmitted in the waveguide, less light is distributed at the position, close to the waveguide, of the supporting structure, leakage of the supporting structure is reduced, and loss of the device is low.
Stereozation: the waveguide structure is suspended, the air cladding structure is arranged on four sides, and the stability is high.
And the sensing is facilitated: the air pore cladding promotes the contact between light and an object to be detected, improves the overlapping integral factor and improves the sensor precision.
No perturbation: the effect on waveguide transmission is constant, no perturbation effect is generated, and unlike the stand alone support and contact structure, perturbation is generated.
The method has no register error in one-step molding, adopts the same material to perform one-step printing molding, and has no process of replacing materials of various materials and later register errors.
The above embodiments are only preferred embodiments of the present invention, and the scope of the present invention is not limited thereto, but any insubstantial changes and substitutions made by those skilled in the art on the basis of the present invention are intended to be within the scope of the present invention as claimed.
Claims (7)
1. An aperture clad waveguide, characterized by: the waveguide layer is made of a single optical polymer material, and the supporting structure is arranged outside the waveguide layer and wraps the waveguide layer, the supporting structure is a net-shaped supporting structure, and an inner layer of the net-shaped supporting structure is in contact with an outer layer of the waveguide layer;
the waveguide layer is of a strip-shaped structure;
the cross section of the waveguide layer of the strip-shaped structure is rectangular, the cross section of the supporting structure wrapping the periphery of the waveguide layer is a ring frame structure comprising an outer rectangle and an inner rectangle, wherein the outer rectangle is concentric with the inner rectangle, and the length of the outer rectangle is the same as that of the waveguide layer.
2. The aperture clad waveguide of claim 1 wherein: the height of the outer rectangle is 2-5 times of the height of the waveguide layer, the width of the outer rectangle is 2-5 times of the width of the waveguide layer, and the distance from the outer rectangle to the inner rectangle is not less than 0.5 times of the width or the height of the inner rectangle.
3. The aperture clad waveguide of claim 2 wherein: the waveguide layer has a width of 1 μm to 20 μm and a height of 1 μm to 20 μm.
4. The aperture clad waveguide of any one of claims 1-3 wherein: the length of the waveguide layer is 100 μm-1cm.
5. A method of making a waveguide of an aperture cladding structure, the method comprising the steps of:
s1, establishing a waveguide model according to any one of claims 1-4;
after modeling is completed, storing the model into a print file in an STL format;
s2, dropwise adding uncured photopolymer material on a substrate, and placing the substrate on an objective table of a microscope;
s3, importing the printing file saved in the step S1, slicing the M-Z optical waveguide sensor model by adopting slicing software to obtain a corresponding thin layer, and slicing to obtain a path file scanned by a laser;
s4, printing is started according to the path file scanned by the laser and the printing parameters; the printing optical power is 5-150mW, the exposure time is 0.5-5ms, the developer is acetone, and the acetone is developed for 20-60s;
s5, solidifying the uncured photopolymer material irradiated by the laser light spot, forming a waveguide device on the substrate after solidification, and removing the uncured photopolymer material by using a developer to obtain the waveguide structure.
6. The method of fabricating a waveguide with an aperture cladding structure of claim 5, wherein: the photopolymer material comprises SU-8 photoresist material, NOA photoresist or greenA photoresist, and is matched with the wavelength of a laser, wherein the wavelength of the laser enables the irradiated photopolymer material to be solidified.
7. The method of fabricating a waveguide with an aperture cladding structure of claim 5, wherein: when slicing the M-Z optical waveguide sensor model by adopting slicing software, the longitudinal precision hz of the slice is not more than the dimension of the light spot direction, the transverse precision hh is 0.02-1 mu M, corresponding thin layers are obtained by slicing in the slicing direction, different linear filling is arranged in the corresponding thin layers, and the distance between lines in the same layer is printed to be smaller than the dimension of the horizontal projection of the light spot; the vertical layer-to-layer spacing of the spots is less than the vertical spot size.
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Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1549937A (en) * | 2001-05-01 | 2004-11-24 | 纳幕尔杜邦公司 | Optimized multi-layer optical waveguiding system |
| JP2006010888A (en) * | 2004-06-24 | 2006-01-12 | Bridgestone Corp | Optical waveguide and its manufacturing method |
| CN1760704A (en) * | 2005-03-25 | 2006-04-19 | 燕山大学 | Araneose hollow optical fiber |
| CN102116895A (en) * | 2009-12-31 | 2011-07-06 | 中国科学院理化技术研究所 | Method and device for preparing mutant organic polymer optical fiber in one step |
| US9229162B1 (en) * | 2006-10-13 | 2016-01-05 | Hrl Laboratories, Llc | Three-dimensional ordered diamond cellular structures and method of making the same |
| CN105589129A (en) * | 2015-12-23 | 2016-05-18 | 吉林大学 | Polymer photobleaching optical waveguide and micro fluidic registration-free integrated chip and preparation method thereof |
| CN106405736A (en) * | 2016-10-17 | 2017-02-15 | 吉林大学 | Method for preparing polymer optical waveguide side electrode by employing 3D printing technology and hot embossing technology |
| CN110716261A (en) * | 2019-09-18 | 2020-01-21 | 东南大学 | Multilayer flexible waveguide writing device and preparation method of multi-cladding polymer waveguide |
| CN113799386A (en) * | 2021-10-08 | 2021-12-17 | 天津工业大学 | Double-coupling whispering gallery mode microcavity based on stereolithography 3D printing |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1697777A1 (en) * | 2003-12-24 | 2006-09-06 | Pirelli & C. S.p.A. | Low loss microring resonator device |
| US9829727B2 (en) * | 2014-05-07 | 2017-11-28 | Hewlett Packard Enterprise Development Lp | Polymer-clad optical modulators |
-
2022
- 2022-03-28 CN CN202210315362.4A patent/CN114895413B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1549937A (en) * | 2001-05-01 | 2004-11-24 | 纳幕尔杜邦公司 | Optimized multi-layer optical waveguiding system |
| JP2006010888A (en) * | 2004-06-24 | 2006-01-12 | Bridgestone Corp | Optical waveguide and its manufacturing method |
| CN1760704A (en) * | 2005-03-25 | 2006-04-19 | 燕山大学 | Araneose hollow optical fiber |
| US9229162B1 (en) * | 2006-10-13 | 2016-01-05 | Hrl Laboratories, Llc | Three-dimensional ordered diamond cellular structures and method of making the same |
| CN102116895A (en) * | 2009-12-31 | 2011-07-06 | 中国科学院理化技术研究所 | Method and device for preparing mutant organic polymer optical fiber in one step |
| CN105589129A (en) * | 2015-12-23 | 2016-05-18 | 吉林大学 | Polymer photobleaching optical waveguide and micro fluidic registration-free integrated chip and preparation method thereof |
| CN106405736A (en) * | 2016-10-17 | 2017-02-15 | 吉林大学 | Method for preparing polymer optical waveguide side electrode by employing 3D printing technology and hot embossing technology |
| CN110716261A (en) * | 2019-09-18 | 2020-01-21 | 东南大学 | Multilayer flexible waveguide writing device and preparation method of multi-cladding polymer waveguide |
| CN113799386A (en) * | 2021-10-08 | 2021-12-17 | 天津工业大学 | Double-coupling whispering gallery mode microcavity based on stereolithography 3D printing |
Non-Patent Citations (4)
| Title |
|---|
| A polymer asymmetric mach-zehnder interferometer sensor model based on electrode thermal writing waveguide technology;Baizhu Liu等;《micromachines》;全文 * |
| development of versatile polymer waveguide flex technology for use in optical interconnectes;Roger Dangle;《journal of lightwave technology》;第31卷(第24期);全文 * |
| 三维混合集成M-Z光波导传感器的设计;孙月;曹悦;郑尧;刘豫;衣云骥;张大明;;中国科技论文(第14期);全文 * |
| 用于传感的聚合物微谐振环的研制;郭洪波;鄂书林;邓文渊;孔光明;;微细加工技术(第05期);全文 * |
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