CN114877197B - Probe space pose precision adjusting device for capacitance nanometer displacement sensor - Google Patents
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
- F16M11/02—Heads
- F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
- F16M11/043—Allowing translations
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
- F16M11/02—Heads
- F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
- F16M11/06—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting
- F16M11/12—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting in more than one direction
- F16M11/121—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting in more than one direction constituted of several dependent joints
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
- F16M11/02—Heads
- F16M11/18—Heads with mechanism for moving the apparatus relatively to the stand
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
- F16M11/20—Undercarriages with or without wheels
- F16M11/2007—Undercarriages with or without wheels comprising means allowing pivoting adjustment
- F16M11/2035—Undercarriages with or without wheels comprising means allowing pivoting adjustment in more than one direction
- F16M11/2042—Undercarriages with or without wheels comprising means allowing pivoting adjustment in more than one direction constituted of several dependent joints
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
- F16M11/20—Undercarriages with or without wheels
- F16M11/24—Undercarriages with or without wheels changeable in height or length of legs, also for transport only, e.g. by means of tubes screwed into each other
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
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Abstract
The invention relates to the technical field of precision adjustment, and particularly discloses a probe space pose precision adjusting device for a capacitance nanometer displacement sensor. The sensor probe seat is positioned above the base plate, the damping ring is vertically fixed in a through hole in the sensor probe seat, and the probe body is connected in the damping ring. The lever is connected to the upper surface of the base plate through a hinge, two ends of the counter force spring are respectively connected with the inner side end of the lever and the upper surface of the base plate, the fine adjustment screw is vertically connected to the upper surface of the base plate through threads, and the fine adjustment screw is connected with the outer side end of the lever. The adjusting connecting rod is arranged obliquely upwards, and two ends of the adjusting connecting rod are respectively connected with the inner side end of the lever and the probe seat of the sensor through hinges. The adjusting device can effectively overcome the problem that the capacitance nanometer displacement sensor is sensitive to the position and the posture of a spatial inclination angle under the effect of an electric field.
Description
Technical Field
The invention relates to the technical field of precision adjustment, in particular to a probe space pose precision adjusting device for a capacitance nanometer displacement sensor.
Background
The information disclosed in this background of the invention is only for enhancement of understanding of the general background of the invention and is not necessarily to be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person skilled in the art.
The high-speed development of ultra-precise scientific instruments and manufacturing equipment, such as integrated circuit chip processing and detection, molecular biology/DNA operation and detection, micro electro mechanical systems and micro sensing systems, promotes the development of ultra-precise engineering into nanometer and even sub-nanometer scale. The micro-nano manufacturing equipment and the scientific instrument both depend on the development of an ultra-precise motion control technology, and one of the core components is a nano micro-displacement sensor system. The capacitance type nanometer displacement sensor measurement system is becoming one of the most widely used nanometer displacement sensor systems in the world due to the characteristics of excellent nanometer resolution and working bandwidth, simple structure and relatively low price advantage.
Patent document CN213685885U proposes a sensor position adjustment mechanism that can perform coarse adjustment and fine adjustment of the position of an optical sensor and improve the accuracy of the optical sensor. Patent document CN216206425U proposes an axial movement fine adjustment and protection device for a capacitive displacement sensor, which solves the problem that the capacitive displacement sensor is easily subjected to hard collision and extrusion with a measured object during use, thereby causing damage to the capacitive displacement sensor. The structure mainly aims at the axial adjustment of the sensor, and the electric field effect of the capacitance nanometer displacement sensor causes the sensor (such as CS02 and CS05 produced by Germany Mi Iridium, NS-DCS10L produced by Tianjin Sanying accurate control and the like) to be sensitive to the spatial inclination angle pose, namely the existing structure is difficult to meet under the detection requirement of extreme precision.
Disclosure of Invention
Aiming at the problems, the invention provides a probe space pose precision adjusting device for a capacitance nanometer displacement sensor, which can realize the refined adjustment of the space pose of a probe, meet the requirement of precision adjustment of the structure and effectively overcome the problem that the capacitance nanometer displacement sensor is sensitive to the space dip angle pose under the electric field effect. In order to achieve the purpose, the invention discloses the following technical scheme.
To electric capacity nanometer displacement sensor's probe space position appearance precision adjusting device includes: the device comprises a base plate, a sensor probe seat, a damping ring, a probe body, a lever, a counter-force spring, a fine adjustment screw, a hinge and an adjusting connecting rod. Wherein: the sensor probe seat is positioned above the substrate, the damping ring is vertically fixed in a through hole in the sensor probe seat, and the probe body is connected in the damping ring so as to reduce the transmission of external vibration to the probe body. The lever is connected to the upper surface of the base plate through a hinge, the lever can swing up and down relative to the upper surface of the base plate, the upper end and the lower end of the reaction spring are respectively connected with the inner side end of the lever and the upper surface of the base plate, the fine adjustment screw is vertically in threaded connection with the upper surface of the base plate and is connected with the outer side end of the lever, and therefore the angle of the lever relative to the upper surface of the base plate can be conveniently adjusted through adjusting the height of the fine adjustment screw. The adjusting connecting rod is arranged obliquely upwards, and two ends of the adjusting connecting rod are respectively connected with the inner side end of the lever and the probe seat of the sensor through hinges, so that the probe seat of the sensor, the damping ring and the probe body are supported in the air.
Furthermore, four groups of lever mechanisms consisting of the levers, the counter-force springs, the fine adjustment screws, the hinges and the adjusting connecting rods are uniformly distributed along the circumferential direction of the probe seat of the sensor, so that the fine adjustment of the space full angle of the probe body is realized.
Further, a screw hole is formed in the base plate below the outer end of the lever, the fine adjustment screw is connected to the screw hole in a threaded mode, the top end of the fine adjustment screw abuts against the lower surface of the outer end of the lever, and therefore the lever is adjusted through adjusting the height of the fine adjustment screw. Preferably, the screw hole is of a fine tooth structure.
Furthermore, a first blind hole is formed in the lower surface of the end of the inner side of the lever, a second blind hole is formed in the upper surface of the substrate below the first blind hole, and the upper end and the lower end of the reaction spring are clamped in the first blind hole and the second blind hole respectively.
Further, the inner end of each lever points to the center of the upper surface of the substrate.
Further, the outer wall of the probe body below the probe seat of the sensor is sleeved with an annular guide mechanism, the annular guide mechanism is composed of a plurality of same arc-shaped guide mechanisms, each arc-shaped guide mechanism is provided with a plurality of layers of channels distributed in an arc shape on the side wall, the adjacent channels are connected through a connecting column, and the upper surface of the arc-shaped guide mechanism is provided with a protruding column which is coaxially arranged with the connecting column. The bottom surface of each arc-shaped guide mechanism is connected with the lower surface of the probe seat of the sensor through a probe axial fine adjustment screw, the side wall of each arc-shaped guide mechanism is connected with the probe body through a probe radial pre-tightening screw, and the protruding columns are abutted to the lower surface of the probe seat of the sensor, so that a gap is formed between the upper surface of each arc-shaped guide mechanism and the lower surface of the probe seat of the sensor.
Furthermore, a penetrating axial threaded hole is formed in the bottom surface of each arc-shaped guide mechanism, the probe axial fine adjustment screw penetrates through the axial threaded hole and then is in threaded connection with the lower surface of the probe seat of the sensor, and the probe axial fine adjustment screw is in threaded connection with the axial threaded hole, so that the arc-shaped guide mechanisms are adjustably connected to the probe seat of the sensor. Optionally, the axial threaded hole is of a fine-toothed structure to facilitate fine adjustment.
Furthermore, the side wall of each arc-shaped guide mechanism is provided with a radial threaded hole, and the radial pre-tightening screw of the probe penetrates through the thread of the radial threaded hole and then is in threaded connection with the outer wall of the probe body. Optionally, the radial threaded hole is of a fine-toothed structure to facilitate fine adjustment.
Compared with the prior art, the invention has the following beneficial effects: according to the lever principle, the probe body can be adjusted in a fine space manner by means of the branch fine adjustment screws and the levers, and the probe body can be adjusted in a fine space manner in a full space angle manner by means of the four groups of lever mechanisms, so that the requirement for fine adjustment of the structure is met, and the problem that the capacitance nanometer displacement sensor is sensitive to the spatial inclination angle pose under the electric field effect is effectively solved. In addition, the invention can realize the fine adjustment of the probe body in the space linear direction by means of the matching of the damping ring and the probe axial fine adjustment screw, further realize the fine adjustment of the space pose of the probe body part, and meet the requirement of the fine adjustment of the structure of the nanometer micro-displacement sensor.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate exemplary embodiments of the invention and together with the description serve to explain the invention and not to limit the invention.
Fig. 1 is a schematic structural diagram (partially cut away) of a probe space pose precision adjusting device for a capacitance nanometer displacement sensor in an embodiment of the invention.
Fig. 2 is a front view of a probe space pose precision adjusting device for a capacitance nanometer displacement sensor in the embodiment of the invention.
FIG. 3 is a schematic diagram of a probe holder of a sensor in an embodiment of the invention.
Fig. 4 is a schematic structural view (partially cut away) of a guide mechanism in an embodiment of the present invention.
Wherein the numerical designations represent: 1-a substrate; 2-a sensor probe base; 3-a damping ring; 4-probe body; 5-a lever; 6-counter force spring; 7-fine adjustment of screws; 8-a hinge; 9-adjusting the connecting rod; 10-a guide mechanism; 1001-channel, 1002-connecting column, 1003-protruding column, 1004-gap; 11-axial fine adjustment screw of probe; 12-radial pre-tightening screw of probe, 13-first blind hole, 14-second blind hole.
Detailed Description
It is to be understood that the following detailed description is exemplary and is intended to provide further explanation of the invention as claimed. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of exemplary embodiments according to the invention. For convenience of description, the words "up", "down", "left" and "right" in the present invention, if any, merely indicate that the directions of movement are consistent with those of the drawings, and do not limit the structure, but merely facilitate the description of the invention and simplify the description, rather than indicate or imply that the referenced device or element needs to have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the invention. The probe space pose precision adjusting device provided by the invention is further explained by combining the drawings and the specific embodiment of the specification.
Referring to fig. 1 and fig. 2, a probe space pose fine adjustment device for a capacitance nanometer displacement sensor is illustrated, and comprises: the device comprises a base plate 1, a sensor probe seat 2, a damping ring 3, a probe body 4, a lever 5, a counter force spring 6, a fine adjustment screw 7, a hinge 8 and an adjusting connecting rod 9. Wherein:
the sensor probe seat is characterized in that the substrate 1 is horizontally arranged, the sensor probe seat 2 is arranged right above the substrate, a through hole is formed in the center of the sensor probe seat 2, the damping ring 3 is vertically fixed in the through hole, the probe body 4 is connected in the damping ring 3, the damping ring 3 is of a hollow circular ring structure, the inner diameter of the inner side face of the damping ring 3 is smaller than the diameter of the outer side face of the probe body 4, so that the damping ring and the probe body form interference fit, and the damping ring 3 is mainly used for reducing the change of the space pose of the probe body 4 caused by the transmission of external vibration to the probe body 4.
The lever 5 is of an elongated structure, and the lower surface of the lever 5 is connected to the upper surface of the substrate 1 through a hinge 8, so that the lever 5 can swing up and down with a certain amplitude relative to the upper surface of the substrate 1. The lower surface of the inner side end of the lever 5 is provided with a first blind hole, the upper surface of the substrate 1 below the first blind hole is provided with a second blind hole, and the upper end and the lower end of the reaction spring 6 are respectively clamped in the first blind hole and the second blind hole, so that the reaction spring 6 is connected with the lever 5 and the substrate 1 together.
The base plate 1 below the outer end of the lever 5 is provided with a screw hole, the fine adjustment screw 7 vertically penetrates through the screw hole from the lower part of the base plate 1 and then abuts against the lower surface of the outer end of the lever 5, the screw hole is of a fine tooth structure and is in threaded connection with the fine adjustment screw 7, and therefore the angle of the lever 5 relative to the upper surface of the base plate 1 can be adjusted by adjusting the height of the fine adjustment screw 7.
The adjusting connecting rod 9 is arranged obliquely upwards, and two ends of the angle of the upper surface of the base plate 1 are respectively connected with the inner side end of the lever 5 and the sensor probe seat 2 through hinges 8. Four groups of lever mechanisms consisting of the levers 5, the counter-force springs 6, the fine adjustment screws 7, the hinges 8 and the adjusting connecting rods 9 are uniformly distributed along the circumferential direction of the probe seat 2 of the sensor, the inner side ends of the levers 5 point to the center of the substrate 1, and the probe body 4 is arranged above the center of the substrate 1, so that the probe seat 2 of the sensor, the damping ring 3 and the probe body 4 are supported in the air, and the fine adjustment of the space full angle of the probe body 4 is realized.
The probe space pose precision adjusting device of the embodiment can effectively realize the fine adjustment of the probe body 4 in space according to the lever principle, namely, by means of the fine adjustment screw 7 and the lever 5. When the spatial pose of the probe body 4 needs to be finely adjusted, the fine adjustment screw 7 is rotated to adjust the angle of the lever 5 relative to the upper surface of the substrate 1, so that the spatial pose change of the adjusting connecting rod 9 and the sensor probe seat 2 is driven, the spatial pose change of the probe body 4 is driven, and the change of the four groups of lever mechanisms can realize the fine adjustment of the spatial full angle of the probe body 4, so that the requirement of the precision adjustment of the structure is met, and the problem that a capacitance nanometer displacement sensor is sensitive to the spatial inclination pose under the electric field effect is effectively solved.
Referring to fig. 3 and 4, in the precise adjustment device for the spatial pose of the probe of the capacitance nanometer displacement sensor, an annular guide mechanism 10 is sleeved on the outer wall of the probe body 4 below the probe seat 2 of the sensor, the annular guide mechanism 10 is composed of three identical arc-shaped guide mechanisms, a plurality of layers of channels 1001 distributed in an arc shape are arranged on the side wall of each arc-shaped guide mechanism, adjacent channels 1001 are connected through a connecting column 1002, and a convex column 1003 coaxial with the connecting column 1002 is arranged on the upper surface of each arc-shaped guide mechanism.
And the bottom surface of each arc-shaped guide mechanism is provided with a through axial threaded hole which is of a fine tooth structure so as to be convenient for precise adjustment. The probe axial fine adjustment screw 11 penetrates through the axial threaded hole and then is in threaded connection with a threaded hole in the lower surface of the sensor probe seat 2, the probe axial fine adjustment screw 11 is in threaded connection with the axial threaded hole, the arc-shaped guide mechanism is adjustably connected to the lower surface of the sensor probe seat 2, the protruding column 1003 is abutted to the lower surface of the sensor probe seat 2, and a gap 1004 is formed between the upper surface of the arc-shaped guide mechanism and the lower surface of the sensor probe seat 2.
The side wall of the arc-shaped guide mechanism is provided with a radial threaded hole which is of a fine-tooth structure so as to facilitate the precise adjustment of the radial pre-tightening screw 12 of the probe to penetrate through the radial threaded hole and then be in threaded connection with the outer wall of the probe body 4, and the radial pre-tightening screw 12 of the probe is in threaded connection with the radial threaded hole so as to connect the probe body 4 and the annular guide mechanism 10 into a whole.
When the probe axial fine adjustment screw 11 is rotated and finely adjusted, the width of the gap 1004 can be changed, and the probe body 4 is further driven to linearly move in the axial direction to achieve fine adjustment. In the process, the bulge columns 1003 are extruded by the lower surface of the probe seat 2 of the sensor, the extrusion force is transmitted to the connecting columns 1002, and then the arc-shaped guide mechanisms at the positions of the channels 1001 are extruded and deformed layer by layer. Each arc-shaped guide mechanism can be independently adjusted and operated, and fine adjustment of the pose of the probe body 4 in the axial direction can be well realized.
Finally, it should be understood that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention. Although the embodiments of the present invention have been described with reference to the accompanying drawings, it is not intended to limit the scope of the present invention, and it should be understood by those skilled in the art that various modifications and variations can be made without inventive efforts by those skilled in the art based on the technical solution of the present invention.
Claims (10)
1. Accurate adjusting device of probe space position appearance to electric capacity nanometer displacement sensor, its characterized in that includes: the device comprises a base plate, a sensor probe seat, a damping ring, a probe body, a lever, a counter-force spring, a fine adjustment screw, a hinge and an adjusting connecting rod; wherein: the sensor probe seat is positioned above the substrate, the damping ring is vertically fixed in a through hole on the sensor probe seat, and the probe body is connected in the damping ring; the lever is connected to the upper surface of the base plate through a hinge, the upper end and the lower end of the counter-force spring are respectively connected with the inner side end of the lever and the upper surface of the base plate, the fine adjustment screw is vertically screwed on the upper surface of the base plate and is connected with the outer side end of the lever; the adjusting connecting rod is arranged obliquely upwards, and two ends of the adjusting connecting rod are respectively connected with the inner side end of the lever and the sensor probe seat through hinges.
2. The precise probe space pose adjusting device for the capacitive nano-displacement sensor according to claim 1, wherein four groups of lever mechanisms consisting of the lever, the counter-force spring, the fine adjustment screw, the hinge and the adjusting connecting rod are uniformly distributed along the circumference of the probe seat of the sensor.
3. The probe space pose fine adjustment device for the capacitance nanometer displacement sensor according to claim 2, wherein the inner side end of each lever points to the center of the upper surface of the substrate.
4. The precise probe space pose adjusting device for the capacitive nanometer displacement sensor according to claim 1, wherein a screw hole is formed on the substrate below the outer end of the lever, the fine tuning screw is connected in the screw hole in a threaded manner, and the top end of the fine tuning screw abuts against the lower surface of the outer end of the lever.
5. The precise probe space pose adjusting device for the capacitive nano-displacement sensor according to claim 4, wherein the screw hole is of a fine tooth structure.
6. The probe space pose precision adjusting device for the capacitance nanometer displacement sensor according to claim 1, wherein a first blind hole is formed on the lower surface of the inner end of the lever, a second blind hole is formed on the upper surface of the substrate below the first blind hole, and the upper end and the lower end of the reaction spring are clamped in the first blind hole and the second blind hole respectively.
7. The precise probe space pose adjusting device for the capacitance nanometer displacement sensor according to any one of claims 1 to 6, wherein an annular guide mechanism is sleeved on the outer wall of the probe body below the probe seat of the sensor, the annular guide mechanism is composed of a plurality of identical arc-shaped guide mechanisms, a plurality of layers of channels distributed in an arc shape are arranged on the side wall of each arc-shaped guide mechanism, adjacent channels are connected through a connecting column, and a convex column which is coaxial with the connecting column is arranged on the upper surface of each arc-shaped guide mechanism; the bottom surface of each arc-shaped guide mechanism is connected with the lower surface of the probe seat of the sensor through a probe axial fine adjustment screw, the side wall of each arc-shaped guide mechanism is connected with the probe body through a probe radial pre-tightening screw, and the protruding columns are abutted to the lower surface of the probe seat of the sensor, so that a gap is formed between the upper surface of each arc-shaped guide mechanism and the lower surface of the probe seat of the sensor.
8. The precise probe space pose adjusting device for the capacitive nano-displacement sensor according to claim 7, wherein a penetrating axial threaded hole is formed in the bottom surface of each arc-shaped guide mechanism, the axial fine adjustment screw of the probe penetrates through the axial threaded hole and then is in threaded connection with the lower surface of the probe seat of the sensor, and the axial fine adjustment screw of the probe is in threaded connection with the axial threaded hole.
9. The precise probe space pose adjusting device for the capacitive nano-displacement sensor according to claim 8, wherein the axial threaded hole is of a fine tooth structure.
10. The precise probe space pose adjusting device for the capacitance nanometer displacement sensor according to claim 7, wherein the side wall of each arc-shaped guide mechanism is provided with a radial threaded hole, and the radial pretension screw of the probe penetrates through the thread of the radial threaded hole and is in threaded connection with the outer wall of the probe body.
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| CN202210796676.0A CN114877197B (en) | 2022-07-08 | 2022-07-08 | Probe space pose precision adjusting device for capacitance nanometer displacement sensor |
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| CN202210796676.0A CN114877197B (en) | 2022-07-08 | 2022-07-08 | Probe space pose precision adjusting device for capacitance nanometer displacement sensor |
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Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005279798A (en) * | 2004-03-29 | 2005-10-13 | Taiheiyo Cement Corp | Link of parallel link apparatus, and parallel link apparatus |
| CN102819186A (en) * | 2012-09-07 | 2012-12-12 | 天津大学 | 3T1R four-degrees-of-freedom precise location workbench |
| CN203054320U (en) * | 2012-12-17 | 2013-07-10 | 安徽省电力公司培训中心 | High-stability fine tuning stand |
| CN203322672U (en) * | 2013-06-24 | 2013-12-04 | 上海工程技术大学 | Fine-adjustment working platform of three-dimensional measurement instrument |
| CN103894691A (en) * | 2014-04-22 | 2014-07-02 | 中国工程物理研究院机械制造工艺研究所 | Multi-functional flexible adjustable electric machining clamp |
| CN104358976A (en) * | 2014-10-22 | 2015-02-18 | 中国科学院苏州生物医学工程技术研究所 | Flexible hinge micro-angle adjustment table for precise optical detection |
| CN106547065A (en) * | 2015-09-17 | 2017-03-29 | 上海微电子装备有限公司 | A kind of movable lens adjustment mechanism |
| CN207410248U (en) * | 2017-11-21 | 2018-05-25 | 吉林大学 | Piezoelectricity rotation positioning platform with grand microring array kinetic characteristic |
| CN109254400A (en) * | 2018-09-28 | 2019-01-22 | 西安交通大学 | A kind of means for correcting of distorting lens deformation compensation and compensation method |
| CN110806222A (en) * | 2019-11-12 | 2020-02-18 | 山东大学 | Fine-adjustment mounting equipment for bipolar plate capacitive sensor |
-
2022
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Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005279798A (en) * | 2004-03-29 | 2005-10-13 | Taiheiyo Cement Corp | Link of parallel link apparatus, and parallel link apparatus |
| CN102819186A (en) * | 2012-09-07 | 2012-12-12 | 天津大学 | 3T1R four-degrees-of-freedom precise location workbench |
| CN203054320U (en) * | 2012-12-17 | 2013-07-10 | 安徽省电力公司培训中心 | High-stability fine tuning stand |
| CN203322672U (en) * | 2013-06-24 | 2013-12-04 | 上海工程技术大学 | Fine-adjustment working platform of three-dimensional measurement instrument |
| CN103894691A (en) * | 2014-04-22 | 2014-07-02 | 中国工程物理研究院机械制造工艺研究所 | Multi-functional flexible adjustable electric machining clamp |
| CN104358976A (en) * | 2014-10-22 | 2015-02-18 | 中国科学院苏州生物医学工程技术研究所 | Flexible hinge micro-angle adjustment table for precise optical detection |
| CN106547065A (en) * | 2015-09-17 | 2017-03-29 | 上海微电子装备有限公司 | A kind of movable lens adjustment mechanism |
| CN207410248U (en) * | 2017-11-21 | 2018-05-25 | 吉林大学 | Piezoelectricity rotation positioning platform with grand microring array kinetic characteristic |
| CN109254400A (en) * | 2018-09-28 | 2019-01-22 | 西安交通大学 | A kind of means for correcting of distorting lens deformation compensation and compensation method |
| CN110806222A (en) * | 2019-11-12 | 2020-02-18 | 山东大学 | Fine-adjustment mounting equipment for bipolar plate capacitive sensor |
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Denomination of invention: A precise adjustment device for probe spatial pose of capacitive nanodisplacement sensors Granted publication date: 20220906 Pledgee: Qilu Bank Co.,Ltd. Rizhao Branch Pledgor: Ami Precision Control Technology (Shandong) Co.,Ltd. Registration number: Y2024980003192 |
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