CN114875389A - Plasma film deposition device and treatment method for irregular-shaped parts - Google Patents
Plasma film deposition device and treatment method for irregular-shaped parts Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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Abstract
The utility model provides a plasma film deposition device and processing method for irregularly shaped part, includes high voltage electrode and telluric electricity field, high voltage electrode passes through high-voltage wire and high voltage power supply and connects, high voltage electrode and organic glass pipe unit constitution discharge area, high voltage electrode passes through the long pipe of flexible polymer and telluric electricity field connection, telluric electricity field is located the port department of the long pipe of flexible polymer, gets the long pipe of flexible polymer and is carried by the arm unit, under the control of arm unit, aims at the part of handling of the exit of the long pipe of flexible polymer. Compared with the prior art, the method greatly improves the efficiency of processing parts with complex hollowness and large curvature, and the prior method can not completely process narrow gaps, but can perfectly process narrow zones such as part gaps. Simultaneously, install the buckle equipment of polymerization zone flexible long tube and organic glass union coupling additional, the effectual flexible pipe of changing different length materials of being convenient for.
Description
Technical Field
The invention relates to a plasma film deposition device, in particular to a plasma film deposition device and a processing method for irregular-shaped parts.
Background
At present, for a part anticorrosion cover device, a chemical reagent waterproof coating agent with anticorrosion and hydrophobicity, or hydrophobic glass is used, and waterproof paint is coated on the surface of the part.
The plasma is a substance fourth state after solid, liquid and gas states, the surface of the substance is treated by low-temperature plasma, the surface of the substance is subjected to various physical and chemical changes, or the surface is relatively rough due to etching, or some polar groups are introduced to improve some properties such as hydrophilicity, dyeability and biocompatibility of the surface of the material, or a thin film is formed for deposition, so that the corrosion resistance, oil resistance, insulation property, hydrophobicity and the like of the surface of the substance are improved. The plasma material surface treatment technology has wide application in the fields of semiconductor material etching, polymer film deposition, material corrosion prevention and the like.
Compared with the traditional means, the low-temperature plasma technology has great advantages in the aspect of material modification, and the anticorrosion medium is added into the plasma to activate the plasma, so that a deposition chemical reaction is initiated on the surface of the treated material to form an anticorrosion film. For example, CN 104271261B, CN 108080228B, CN 106835067B and the like have been reported in patents on plasma deposition of an anti-corrosion film, which apply plasma technology to bring a monomer containing an organic silicon compound into a plasma jet through a carrier gas, activate the monomer molecules to form hydrophobic groups through high-energy particles in discharge plasma, and further form a coating with super-hydrophobic properties on the surface of a material through a deposition reaction, thereby achieving the anti-corrosion effect.
Typically, the plasma jet is limited in its structure, the treatment area is typically a few square centimeters, and thus dynamic treatment is often required for industrial applications with large areas and irregular surface modifications. Especially for processing objects with complex shapes, such as ship impellers, ship brake hubs and other objects with large curvature and irregular shapes, the flexibility of the structure of the jet electrode must be improved, so that the jet electrode has certain flexibility. The existing jet electrode structure adopts a rigid medium pipe, so that objects with large curvature, a hollow structure and narrow gaps among blades, such as an impeller, are difficult to process, and a novel flexible jet plasma device is needed.
A few patents have been reported about flexible plasma devices, such as patent CN 111729106B, CN 206761952U which uses flexible jet to sterilize and disinfect endoscopes, and some scholars at home and abroad also use flexible jet plasma to modify hydrophilicity. The electrode structure of the existing device mostly adopts a single needle or a single ring type structure, the introduced gas is argon with higher purity, and various physical, chemical and biological effects are initiated through excited argon active particles, so that respective application purposes are achieved. However, the existing device does not introduce any reaction medium, and the deposition of the anticorrosive thin film cannot be realized. Compared with the argon atom, the reaction medium is larger in molecular structure and more complex in reaction in the propagation process, so that the activated group of the reaction medium cannot be transmitted to the surface of a sample to be treated in a long distance, and the deposition reaction is initiated on the surface. Therefore, even though the existing structure can treat parts with different specifications and shapes, only hydrophilic modification can be realized, and the deposition of an anticorrosive film cannot be realized.
The existing device adopts a combined electrode structure, such as a plurality of high-voltage electrodes or a high-voltage and low-voltage staggered electrode combination, and the added electrode treatment adopted by the existing device is to add a high-voltage electrode or a ground electrode at the position 7-10mm above the pipe orifice of the traditional rigid jet reactor, which is the most traditional needle ring or ring electrode structure. The existing device adds electrodes and operates on a rigid jet flow reactor. The flexible pipe related to the device is a medium pipe. Not in jet reactor devices. The modification of the electrode on the dielectric flexible tube is a new attempt. And the flexible medium pipe below the flexible medium pipe can be replaced according to industrial requirements, so that free and convenient conversion of different materials and different lengths can be realized. Therefore, the second electrode 9 can change the distance from the flexible pipe orifice according to different parameters, change the material selection and achieve the effect of increasing discharge and strengthening the deposited film.
In addition, the high-low staggered mode of a plurality of electrodes of the existing device can theoretically carry out long-distance jet flow transmission plasma, but the processing range and objects of the existing method are limited due to the fact that a plurality of groups of electrodes are added on a reactor, and therefore the processing can only be rigid processing but flexible processing cannot be realized. Some complex shapes are even more difficult to process. Such as impeller clearance, rigid jets cannot be handled. The addition of multiple sets of electrodes results in the jet tube generator being fixed. Flexibility cannot be guaranteed, and flexible processing cannot be realized.
Disclosure of Invention
1. The technical problem to be solved is as follows:
the existing plasma jet is difficult to treat parts with irregular shapes, can realize hydrophilic modification and cannot realize anticorrosive film deposition.
2. The technical scheme is as follows:
in order to solve the above problems, the present invention provides a plasma thin film deposition apparatus for irregular-shaped parts, comprising a high voltage electrode and a ground electrode, wherein the high voltage electrode is connected with a high voltage power supply through a high voltage lead, the high voltage electrode and an organic glass tube unit form a discharge region, the high voltage electrode is connected with the ground electrode through a flexible polymer long guide tube, the ground electrode is located at an end port of the flexible polymer long guide tube, the flexible polymer long guide tube is clamped by a mechanical arm unit, and an outlet of the flexible polymer long guide tube is aligned with a processing part of a processed part under the control of the mechanical arm unit.
Still be equipped with the air feed unit, the air feed unit is equipped with two air flues, and one of them air flue is used for getting into inert gas, and another air flue is used for getting into the modified medium, the venthole of air feed unit and the inlet port of mixing the gas unit are connected, inert gas and modified medium mix the back in mixing the gas unit, follow the gas mixture that mixes the gas unit and come out gets into the region that discharges.
The air supply unit is connected with the air mixing unit through a polymeric hose.
And a gas mass flowmeter is arranged in the gas supply unit and is closely connected with the gas outlet.
The whole material of arm unit is insulating material, includes the base, there are a plurality of arms on the base, wherein first arm and base are connected, and supervisory equipment and mechanical tongs are connected to last arm end, mechanical tongs are cliied flexible polymer long catheter, connect through rolling bearing between the adjacent arm. The base has a data access function and is used for being connected with a computer to compile an automatic program, and the monitoring equipment intelligently and automatically scans the specific shape and specific lines of the processed part and transmits specific data to the computer so as to control the mechanical arm to automatically adjust a processing path.
The whole mechanical arm unit is made of insulating materials.
The grounding electrode wire is fixed by inserting into an electrode clamping groove arranged at the tail end of the flexible polymer long guide pipe.
The organic glass tube and the flexible polymer long guide tube are connected through a buckle device of the bidirectional adjustable switch.
The high-voltage power supply is nanosecond pulse power supply equipment.
The invention also provides a method for processing the irregular parts by using the plasma film deposition device for the irregular parts.
3. Has the beneficial effects that:
the invention utilizes the flexible jet plasma modification technology, does not influence the flexible treatment process, can realize film deposition, quickly realizes the modification treatment of complex materials, can clamp the flexible jet pipe by an intelligent mechanical arm for control, and has short treatment time and high efficiency. Meanwhile, the periodic motion control is adopted, so that the treatment can be carried out more comprehensively and uniformly during treatment. The flexible jet plasma modification uses a small amount of medium, avoids the use of a large amount of chemical reagents such as coating liquid and the like, and has low cost, energy conservation and environmental protection. Meanwhile, the length of the fluid plume of the jet flow can be greatly improved, the flexibility characteristic is not influenced, and the simple and convenient effect is achieved during treatment.
Drawings
Fig. 1 is an overall view of a flexible jet plasma device for improving corrosion resistance of a ship impeller.
Fig. 2 is a schematic view of the structure of the air supply unit.
Fig. 3 is a schematic view of a high voltage discharge electrode.
Fig. 4 is a schematic view of a grasping jet tube robot arm.
Description of reference numerals: 1. an air supply unit; 2. a polymer hose; 3. a gas mixing unit; 4. a high voltage electrode; 5. a high-voltage wire; 6. an organic glass tube; 7. a latching device for a bi-directional adjustable switch; 8. a flexible polymeric elongate conduit; 9. a ground electrode; 10. a power supply device; 11. a part; 201. an airway; 202. a gas mass flow meter; 203. an air outlet; 401. a base; 402. a mechanical arm; 402. rotating the bearing; 404. monitoring equipment; 405. and (4) a mechanical gripper.
Detailed Description
The present invention will be described in detail below with reference to the drawings and examples.
As shown in figures 1 and 3, a flexible efflux plasma film deposition apparatus for irregularly shaped part, including high voltage electrode 4 and telluric electricity field 9, high voltage electrode 4 passes through high voltage conductor 5 and high voltage power supply 10 connects, high voltage electrode 4 and organic glass pipe unit 6 constitute the region of discharging, high voltage electrode 4 passes through the long pipe 8 of flexible polymer and telluric electricity field 9 connects, telluric electricity field 9 is located the port department of the long pipe 8 of flexible polymer, adds telluric electricity field, promptly auxiliary electrode in flexible pipe port department, improvement treatment effect that can be very big again when guaranteeing flexibility.
The high-voltage electrode unit 4 and the organic glass tube unit 6 form a discharge area, and the specific atmosphere requirement of a discharge space is met. The plasma plume is transmitted along the flexible long polymerization tube 8, and the grounding electrode 9 is positioned at the tail end of the flexible long polymerization tube 8, so that the discharge effect is increased, and the film deposition effect is increased. The polymer flexible tube 8 is gripped by the robot arm unit. The flexible polymer long catheter 8 is clamped and taken by the mechanical arm unit for control, the processing time is short, and the efficiency is high. Meanwhile, the periodic motion control is adopted, so that the treatment can be carried out more comprehensively and uniformly during treatment.
The invention relates to a flexible pipe long jet flow film deposition device. Different from the traditional rigid jet flow, the flexible pipe double-electrode mode is adopted to realize remote thin film deposition, the traditional rigid jet flow can only deposit the thin film at the pipe orifice and can not process complex shapes, the flexible jet flow can process complex shapes, and the existing flexible pipe long jet flow in the device only introduces inert gas to carry out discharge treatment such as cleaning or sterilization treatment. There is no apparatus which has been subjected to a thin film deposition treatment. The device carries out the film deposition treatment of the double electrodes of the flexible tube, and the position arrangement of the ground electrode can solve the problem of high-activity long-distance transmission of the active medium in the flexible tube, thereby achieving the effect.
As shown in fig. 4, the robot arm unit comprises a base 1, wherein a plurality of robot arms 402 are arranged on the base 1, a first robot arm 402 is connected with the base 1, the end of a last robot arm 402 is connected with a monitoring device 404 and a mechanical hand grip 405, the mechanical hand grip 405 clamps the flexible polymer long guide tube 8, and adjacent robot arms 402 are connected through a rotating bearing 403. The base 401 has a data access function and is used for connecting a computer to compile an automatic program, and the monitoring device 404 intelligently and automatically scans the specific shape and specific lines of the processed part 11 and transmits specific data to the computer to control the mechanical arm 402 to automatically adjust a processing path.
During the treatment of the part 11 to be treated, the treatment process is a dynamic process, the part 11 is kept static and stable, the monitoring equipment 404 is used for repeatedly measuring the shape, size and gap distance of the part 11, the obtained data is transmitted to a computer through measurement to obtain a specific mechanical arm 402 treatment motion path, and the flexible catheter can be used for carrying out comprehensive uniform treatment without dead angles on the surface of the part through controlling a mechanical arm unit. In the continuous processing of a plurality of parts 11, the monitoring device 404 can obtain the gaps between the parts, and also perform uniform processing completely without dead angles, so that the processing is more effective and faster, and the film deposition effect is greatly improved.
In one embodiment, as shown in fig. 2, a gas supply unit 1 is further provided, the gas supply unit 1 is provided with two gas passages 201, one gas passage 201 is used for introducing inert gas, the other gas passage 201 is used for introducing a modification medium, a gas outlet 203 of the gas supply unit 1 is connected with a gas inlet of the gas mixing unit 3, and after the inert gas and the modification medium are mixed in the gas mixing unit 3, a gas mixture coming out of the gas mixing unit 3 enters a discharge area. The flexible jet plasma modification uses a small amount of medium, avoids the use of a large amount of chemical reagents such as coating liquid and the like, and has low cost, energy conservation and environmental protection. Meanwhile, the length of the fluid plume of the jet flow can be greatly improved without influencing the flexibility characteristic, and the simple and convenient effect is achieved during treatment
The working gas is inert gas or air, wherein the inert gas can be Ar, He, Ne and the like.
The medium is selected according to the desired properties, such as for increasing hydrophobicity, using hydrocarbons, carbon-halogen compounds, fluorosilanes, silicones, and the like.
In one embodiment, a gas mass flow meter 202 is disposed in the gas supply unit 1, and the gas mass flow meter 202 is closely connected to the gas outlet 203. The atomized modified medium and the working gas are fully mixed and enter a discharge area through the air outlet, so that uniform and stable discharge is ensured.
In one embodiment, the plexiglas tube 6 and the long flexible polymer tube 8 are connected by a snap device 7 of a two-way adjustable switch. The required flexible polymer long conduit 8 can be simply replaced, and flexible pipes of different materials and different curvatures can be conveniently adopted. The flexible pipe is convenient to control to carry out multi-angle freedom treatment.
In one embodiment, the air supply unit 1 is connected to the air mixing unit 3 through a polymeric hose 2.
In one embodiment, the ground electrode 9 wire is secured by insertion into an electrode slot provided at the trailing end of the long flexible polymer conduit 8. The purpose of enlarging the discharging effect is achieved, and the treatment is more sufficient and effective.
In one embodiment, the hv electrode 4 is a solid single needle.
The whole treatment process comprises the following steps: when the irregular parts are modified, the irregular parts are placed at fixed positions, and a pulse voltage is applied to the high-voltage electrode 4 by the high-voltage pulse power supply 10 to perform discharge. Before discharging, working gas argon, helium or air with set flow is firstly introduced into the gas mixing chamber 3 through one of the gas passages 201 by the flow control unit 202 through the working gas. The modified medium enters through another air passage 201 and enters the gas mixing cavity 3 from the air outlet 203, the working gas and the modified medium are fully mixed in the gas mixing cavity 3 and enter a discharge area consisting of the high-voltage electrode 4 and the organic glass tube unit 6 through the polymer hose 2, and the specific atmosphere requirement of the discharge area is met. The plasma plume is transmitted along the flexible polymer long guide pipe 8, and the discharge effect is increased due to the effect of the amplifying grounding electrode 9, so that the film deposition effect is increased. The flexible long pipe 8 of polymer is got to arm unit clamp, handle part 11 to be handled irregular shape under supervisory equipment 404's condition, this processing procedure is dynamic process, keep part 11 static stability, accomplish the shape size to part 11 through the monitoring, adjacent part 11 clearance distance carries out repeated measurement, obtain data transmission for the computer obtains concrete arm 402 through measuring and handle the motion path, through controlling mechanical arm 402, make the long pipe of flexible polymer can do and carry out the even processing at part 11 surface and adjacent part 11 clearance comprehensive no dead angle, make to handle more effectively fast, and compare with other devices and promote film deposition effect greatly because handled narrow and small clearance between the part.
Compared with the existing rigid jet pipe, the method greatly improves the treatment efficiency of objects with complex hollowness and large curvature, and the existing method can not completely treat narrow gaps, but can perfectly treat narrow zones such as blade gaps. Simultaneously, install the buckle equipment of flexible tube and glass union coupling additional, be convenient for carry out the flexible tube of effectual change different length materials in the experiment. The method is quick and convenient, and the treatment rate is high.
Claims (10)
1. A plasma film deposition apparatus for irregularly shaped parts, including high voltage electrode (4) and telluric electricity field (9), high voltage electrode (4) are connected through high voltage wire (5) and high voltage power supply (10), its characterized in that: discharge area is constituteed to high voltage electrode (4) and organic glass pipe unit (6), high voltage electrode (4) are connected through flexible polymer long pipe (8) and earthed electrode (9), earthed electrode (9) are located the port department of flexible polymer long pipe (8), take flexible polymer long pipe (8) to be cliied by the arm unit, under the control of arm unit, aim at the part of handling of the part (11) of being handled with the exit of flexible polymer long pipe (8).
2. The plasma thin film deposition apparatus for irregularly shaped parts according to claim 1, wherein: still be equipped with air feed unit (1), air feed unit (1) is equipped with two air flues (201), and one of them air flue (201) is used for getting into working gas, and another air flue (201) is used for getting into the modified medium, venthole (203) of air feed unit (1) and the inlet port of mixing gas unit (3) are connected, working gas and modified medium mix the back in mixing gas unit (3), follow the gas mixture that mixes gas unit (3) and come out gets into the region of discharging, air feed unit (1) is connected through polymerization hose (2) and mixing gas unit (3).
3. The plasma thin film deposition apparatus for irregularly shaped parts according to claim 2, wherein: the working gas is inert gas or air.
4. The plasma thin film deposition apparatus for irregularly shaped parts as claimed in claim 2 or 3, wherein: the gas supply unit (1) is internally provided with a gas mass flow meter (202), and the gas mass flow meter (202) is tightly connected with the gas outlet (203).
5. The plasma thin film deposition apparatus for irregularly shaped parts according to any of claims 1 to 3, wherein: the mechanical arm unit comprises a base (1), wherein a plurality of mechanical arms (402) are arranged on the base (1), the first mechanical arm (402) is connected with the base (1), the tail end of the last mechanical arm (402) is connected with a monitoring device (404) and a mechanical gripper (405), the flexible polymer long guide pipe (8) is clamped by the mechanical gripper (405), adjacent mechanical arms (402) are connected through a rotating bearing (403), the base (401) has a data access function and is used for being connected with a computer to write an automatic program, the monitoring device (404) intelligently and automatically scans the specific shape and specific texture of a processed part (11) and transmits specific data to the computer to control the mechanical arms (402) to automatically adjust a processing path.
6. The plasma thin film deposition apparatus for irregularly shaped parts according to claim 5, wherein: the whole mechanical arm unit is made of insulating materials.
7. The plasma thin film deposition apparatus for irregularly shaped parts according to any of claims 1 to 3, wherein: and the grounding electrode (9) wire is fixed by inserting into an electrode clamping groove arranged at the tail end of the flexible polymer long conduit (8).
8. The plasma thin film deposition apparatus for irregularly shaped parts according to any of claims 1 to 3, wherein: the organic glass tube (6) and the flexible polymer long guide tube (8) are connected through a buckle device (7) of the bidirectional adjustable switch.
9. The plasma thin film deposition apparatus for irregularly shaped parts according to any of claims 1 to 3, wherein: the high-voltage power supply (10) is nanosecond pulse power supply equipment.
10. A method for plasma film deposition of an irregularly shaped part by using the plasma film deposition apparatus for irregularly shaped parts according to any of claims 1 to 9, comprising the steps of: step S01: placing the irregularly-shaped part at a fixed position; step S02: through flow control unit (202), working gas with set flow is introduced into air supply unit (201) through one of air passages (201), the modified medium enters air supply unit (201) through the other air passage (201), and enters air mixing chamber (3) from air outlet (203), and the working gas and the modified medium enter a discharge area formed by high-voltage electrode (4) and organic glass tube unit (6) through polymer hose (2) after being fully mixed in air mixing chamber (3), step S03: the specific atmosphere requirement of a discharge area is met, and a pulse voltage is applied to the high-voltage electrode (4) through a high-voltage pulse power supply (10) to discharge; step S04: the plasma plume is transmitted along the flexible polymer long guide pipe (8), and the film deposition effect is increased due to the action of the amplifying grounding electrode (9); step S05: the mechanical arm unit clamps the flexible polymer long catheter (8), the part (11) to be processed is processed under the condition of the monitoring equipment (404), the processing process is a dynamic process, the part (11) is kept to be static and stable, repeated measurement is conducted on the shape and the size of the part and the gap distance between adjacent parts (11) through monitoring, the obtained data are transmitted to a computer through measurement to obtain a specific mechanical arm (402) processing movement path, and the flexible catheter is enabled to be subjected to uniform processing without dead angles comprehensively on the surface of the part (11) and the gap between adjacent parts (11) through controlling the mechanical arm (402).
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Application publication date: 20220809 |