CN114855257A - Edge polishing method of metal film material, metal film material and application - Google Patents
Edge polishing method of metal film material, metal film material and application Download PDFInfo
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- CN114855257A CN114855257A CN202210416050.2A CN202210416050A CN114855257A CN 114855257 A CN114855257 A CN 114855257A CN 202210416050 A CN202210416050 A CN 202210416050A CN 114855257 A CN114855257 A CN 114855257A
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- 239000002184 metal Substances 0.000 title claims abstract description 97
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- 238000005498 polishing Methods 0.000 title claims abstract description 84
- 238000000034 method Methods 0.000 title claims abstract description 26
- 230000001681 protective effect Effects 0.000 claims abstract description 49
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 14
- 239000010936 titanium Substances 0.000 claims description 14
- 229910052719 titanium Inorganic materials 0.000 claims description 14
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L31/00—Materials for other surgical articles, e.g. stents, stent-grafts, shunts, surgical drapes, guide wires, materials for adhesion prevention, occluding devices, surgical gloves, tissue fixation devices
- A61L31/02—Inorganic materials
- A61L31/022—Metals or alloys
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L31/00—Materials for other surgical articles, e.g. stents, stent-grafts, shunts, surgical drapes, guide wires, materials for adhesion prevention, occluding devices, surgical gloves, tissue fixation devices
- A61L31/08—Materials for coatings
- A61L31/10—Macromolecular materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/18—Polishing of light metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/24—Polishing of heavy metals of iron or steel
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
Abstract
The invention discloses an edge polishing method of a metal film material, the metal film material and application. The edge polishing method of the metal film material comprises the following steps: arranging a protective film with insulating property on the metal film material, wherein the protective film covers the region outside the edge of the metal film material; carrying out electrochemical polishing on the metal film material provided with the protective film; and removing the protective film of the polished metal film material. According to the edge polishing method of the metal film material, the surface of the metal film material is coated with a protective film with insulating property, and electrochemical polishing is carried out. The electrochemical polishing is mainly used for removing the sharp part of the edge of the metal film material, so that the edge of the metal film material is smooth, thereby avoiding the cracking of soft tissues, reducing the possibility of wound infection and further shortening the healing period of the wound.
Description
Technical Field
The invention relates to the field of medical instruments, in particular to an edge polishing method of a metal film material, the metal film material and application.
Background
The GBR technology for Guided Bone Regeneration is characterized by that according to the characteristics of that the growth and migration speed of epithelial cell and fibroblast is quick, and the migration speed of Bone cell is slow, a barrier membrane made of metal or biological material is placed between soft tissue, for example, gum soft tissue and Bone defect, and a biological barrier is artificially erected. The biological barrier can reserve an osteogenic space, prevent fibroblasts and epithelial cells with higher speed in soft tissues from growing into a bone defect area, create a relatively closed environment, ensure that osteoblasts with lower proliferation speed are not interfered in an osteogenic process, have sufficient time to occupy the osteogenic space and finally realize complete bone repair and regeneration of the defect area.
However, in clinical application, the barrier membrane made of biomaterial cannot provide good mechanical support and space protection, and often causes the problems of collapse of the bone defect part during repair, insufficient bone increment and the like. While the traditional metal film material such as oral titanium film has excellent mechanical support performance, the sharp metal cutting and cutting edge can cause the soft tissue to crack, thereby increasing the possibility of wound infection and prolonging the healing period of the wound.
Disclosure of Invention
Therefore, it is necessary to provide an edge polishing method for a metal film, a metal film and an application thereof, aiming at the problem that the sharp edge of the metal film may cause soft tissue cracking.
In a first aspect of the present application, there is provided a method for polishing an edge of a metal film, comprising the steps of:
arranging a protective film with insulating property on the metal film material, wherein the protective film covers the region outside the edge of the metal film material;
performing electrochemical polishing on the metal film material coated with the polymer film coat and provided with the protective film;
and removing the protective film of the polished metal film material. Optionally, the step of electrochemically polishing comprises:
under the condition that a cathode of electrochemical polishing equipment is connected with insoluble metal, a metal film material provided with a protective film is placed on an anode, polishing is carried out for 1-25 times under the conditions that the current range is 0.1-10A and the voltage range is 0.1-100V, the single polishing time is 5-1200 s, the current is direct current or pulse current, and the frequency of the pulse current is 1-300 Hz.
Optionally, the metal film material wrapping the polymer film coat and provided with the protective film is polished for 1-25 times for 5-10 times under the conditions that the current ranges from 1A to 50.1A and the voltage ranges from 5V to 200.1V, the single polishing time is 30-3005-1200 s, the current is direct current or pulse current, and the frequency of the pulse current is 20-1001-300 Hz.
Optionally, the electrolyte in the step of electrochemical polishing is a mixture of an alcohol and an acid.
The alcohol is selected from two of ethanol, propanol, butanol, pentanol, ethylene glycol and glycerol.
The acid is selected from one of acetic acid, propionic acid, acrylic acid, carbonic acid, boric acid, lactic acid, sulfuric acid, nitric acid, phosphoric acid and hydrochloric acid.
The volume ratio of the total volume of the alcohol substances to the volume of the acid substances in the electrolyte is 88-95: 5-12; wherein the volume ratio of the two alcohols is 30-55: 40-60.
Optionally, the metal film material is a titanium film material, a zinc film material, a magnesium film material or an iron film material.
Optionally, the protective film is a polymer film, and the material of the polymer film includes one or more of polyethylene, polypropylene, polyvinyl chloride, polystyrene, polymethyl methacrylate, polycarbonate, polyamide, polyimide, polyoxymethylene, polyethylene terephthalate, polyphenylene oxide resin, polyphthalamide, polyphenylene sulfide, polysulfone, polyether ether ketone, polyvinyl fluoride, polyvinylidene fluoride, polychlorotrifluoroethylene, and polytetrafluoroethylene.
The polymer film is formed by heat-seal curing, spray curing or photocuring.
Optionally, the thickness of the protective film is 0.01-1 mm.
Optionally, the step of removing the protective film of the polished metal film further comprises:
and cleaning the metal film material with the protective film removed.
In a second aspect of the present application, a metal film prepared by the above polishing method is provided.
In a third aspect of the present application, there is provided a use of the metal film material prepared by the above polishing method in a barrier film.
According to the edge polishing method of the metal film material, the surface of the metal film material is coated with a protective film with insulating property, and electrochemical polishing is carried out. The electrochemical polishing is mainly used for removing the sharp part of the edge of the metal film material, so that the edge of the metal film material is smooth, thereby avoiding the cracking of soft tissues, reducing the possibility of wound infection and further shortening the healing period of the wound.
Drawings
FIG. 1 is a topographical view of the edge of an unpolished zinc film of example 1;
FIG. 2 is a topographical view of the edge of the zinc film of example 1 after polishing;
FIG. 3 is a topographical view of the edge of an unpolished magnesium film of example 2;
FIG. 4 is a topographical view of the edge of the polished magnesium film of example 2;
FIG. 5 is a topographical view of the edge of the unpolished iron film of example 3;
FIG. 6 is a topographical view of the edge of the polished iron film of example 3;
FIG. 7 is a topographical view of the edge of an unpolished titanium film of example 4;
FIG. 8 is a topographical view of the edge of the titanium film material of example 4 after polishing.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein, but rather should be construed as broadly as the present invention is capable of modification in various respects, all without departing from the spirit and scope of the present invention.
In a first aspect of the present application, there is provided a method for polishing an edge of a metal film, comprising the steps of:
arranging a protective film with insulating property on the metal film material, wherein the protective film covers the region outside the edge of the metal film material;
performing electrochemical polishing on the metal film material coated with the polymer film coat and provided with the protective film;
and removing the protective film of the polished metal film material.
The applicant finds that the edge of the metal film material with the thickness less than 100um is difficult to carry out chamfering and sharpness removing treatment on the edge through numerical control machining turning. Based on this, through a great deal of research, the applicant can realize the clinical purpose of product sharpness removal by performing electrochemical polishing and edge polishing treatment.
The protective film of the metal film has insulating properties, so that the region of the metal film covered by the protective film cannot be electrochemically polished. The edge of the metal film material is a polishing object, and the edge of the metal film material is an intersection part of each surface of the metal film material and other surfaces and an area close to the intersection part. Thus, the edge of the metal film is not covered with the protective film. The other portions of the surfaces of the metal film material are not required to be polished, and are covered with the protective film. The protective film protects these partial areas.
It is to be understood that, when the protective film is provided, the protective film may be provided not in the edge region of the metal film but in other regions. Or a protective film covering the whole metal film material can be arranged on the metal film material, and then the protective film at the edge of the metal film material is removed in a cutting, grinding and other modes, so that the edge of the metal film material is exposed.
Electrochemical polishing is also known as electropolishing. The electrolytic polishing is to immerse the workpiece to be polished as anode and insoluble metal as cathode in an electrolytic bath simultaneously, and to introduce current to produce selective anode dissolution, so as to increase the surface brightness of the workpiece.
According to the principle of electrochemical point discharge, the micro-protruding part is dissolved preferentially during electrochemical polishing, meanwhile, a high-resistance viscous liquid film layer is formed by a dissolved product and electrolyte on the surface, and the liquid film layer of the micro-protruding part is thinner and has low resistance, so that the preferential dissolution is continuously maintained. The metal film has sharp edges and protrudes from other surfaces, so that the metal film is preferentially dissolved and finally forms a smooth edge.
After polishing, the edge of the metal film material is smooth, the protective film of the polished metal film material can be stripped through a physical mode, and the protective film can be dissolved and removed through a chemical mode, so that the polished metal film material is obtained.
According to the edge polishing method of the metal film material, the surface of the metal film material is coated with a protective film with insulating property, and electrochemical polishing is carried out. The electrochemical polishing is mainly used for removing the sharp part of the edge of the metal film material, so that the edge of the metal film material is smooth, thereby avoiding the cracking of soft tissues, reducing the possibility of wound infection and further shortening the healing period of the wound.
Optionally, the step of electrochemically polishing comprises:
under the condition that a cathode of electrochemical polishing equipment is connected with insoluble metal, a metal film material provided with a protective film is placed on an anode, polishing is carried out for 1-25 times under the conditions that the current range is 0.1-10A and the voltage range is 0.1-100V, the single polishing time is 5-1200 s, the current is direct current or pulse current, and the frequency of the pulse current is 1-300 Hz.
The electrochemical polishing device has a cathode and an anode, and at the same time, the device also has an electrolyte. And (3) placing the metal film material provided with the protective film on an anode of an electrochemical polishing device, and simultaneously connecting platinum and iridium insoluble metals on a cathode to polish under the conditions. When the current or voltage is too large, the corrosion polishing rate of the corrosion surface is too high, and uneven point corrosion is caused; when the current or voltage is too low, the corrosion polishing rate of the corrosion surface is too low, the polishing efficiency is reduced, and the polishing cost is increased.
Optionally, the metal film material coated with the polymer film coating and provided with the protective film is polished for 1-25 times for 5-10 times under the conditions that the current ranges from 1 to 50.1-10A and the voltage ranges from 5 to 200.1-100V, the single polishing time ranges from 30 to 3005-1200 s, the current is direct current or pulse current, and the frequency of the pulse current is 20-1001-300 Hz.
Optionally, the electrolyte in the step of electrochemical polishing is a mixture of an alcohol and an acid.
The alcohol is selected from two of ethanol, propanol, butanol, pentanol, ethylene glycol and glycerol.
The acid is selected from one of acetic acid, propionic acid, acrylic acid, carbonic acid, boric acid, lactic acid, sulfuric acid, nitric acid, phosphoric acid and hydrochloric acid.
The volume ratio of the total volume of the alcohol substances to the volume of the acid substances in the electrolyte is 88-95: 5-12; wherein the volume ratio of the two alcohols is 30-55: 40-60.
Optionally, the metal film material is a titanium film material, a zinc film material, a magnesium film material or an iron film material.
Optionally, the protective film is a polymer film, which may also be referred to as a polymer film coat. The material of the high molecular film comprises one or more of polyethylene, polypropylene, polyvinyl chloride, polystyrene, polymethyl methacrylate, polycarbonate, polyamide, polyimide, polyformaldehyde, polyethylene terephthalate, polyphenyl ether resin, polyphthalamide, polyphenylene sulfide, polysulfone, polyether ether ketone, polyvinyl fluoride, polyvinylidene fluoride, polytrifluorochloroethylene and polytetrafluoroethylene.
The polymer film is formed by heat-seal curing, spray curing or photocuring.
Optionally, the thickness of the protective film is 0.01-1 mm.
Optionally, the step of removing the protective film of the polished metal film further comprises:
and cleaning the metal film material with the protective film removed.
In a second aspect of the present application, a metal film prepared by the above polishing method is provided.
In a third aspect of the present application, there is provided a use of the metal film material prepared by the above polishing method in a barrier film.
Example 1
(1) Sealing a layer of polypropylene polymer film with the thickness of 0.05mm on the surface of the zinc film by adopting a heat-sealing curing method, and exposing the edge of the zinc film.
(2) And (3) placing the sealed zinc membrane on an anode of electrochemical polishing equipment, connecting a cathode with platinum-iridium wire insoluble metal, and polishing according to the following polishing parameters. The current is direct current. Current range 1A, voltage range 30V, single action time 300s, polishing times 2 times. The electrolyte used was propanol: ethylene glycol: and (3) mixing the phosphoric acid with the mixed polishing solution in a volume ratio of 50:48: 2.
(3) The polished product is stripped from the polymer film coat and is subjected to ultrasonic cleaning in absolute ethyl alcohol to obtain the zinc film material with the sharp edge. The boundary morphology of the zinc film and the edge-sharpened zinc film was examined under the condition of 300 times magnification by a kirschner super-depth-of-field microscope, and the results are shown in fig. 1 and 2. FIG. 1 shows that the included angle of the zinc film edge is right angle and the edge is sharp. Figure 2 shows that the zinc film edge after edge de-sharpening is relatively round and smooth.
Example 2
(1) And sealing a layer of polytetrafluoroethylene polymer film with the thickness of 0.2mm on the surface of the magnesium film material by adopting a photocuring method, and exposing the edge of the magnesium film material.
(2) And (3) placing the sealed magnesium film material on an anode of electrochemical polishing equipment, connecting a cathode with platinum-iridium wire insoluble metal, and polishing according to the following polishing parameters. The current is direct current. The current range is 0.2A, the voltage range is 10V, the single action time is 20s, and the polishing times are 6. The electrolyte used was ethanol: glycerol: and (3) mixing the polishing solution with acetic acid in a volume ratio of 55:40: 5.
(3) And (3) stripping the polymer film coat of the polished product, and performing ultrasonic cleaning in absolute ethyl alcohol to obtain the magnesium film material with the edge being sharpened. The boundary morphology of the magnesium film and the edge-sharpened magnesium film was examined under the condition of 300 times magnification by a kirschner super-depth-of-field microscope, and the results are shown in fig. 3 and 4. FIG. 3 shows that the included angle of the edge of the magnesium film is right angle and the edge is sharp. Fig. 4 shows that the edges of the magnesium film material after edge de-sharpening are smooth and round.
Example 3
(1) Sealing a layer of polymethyl methacrylate polymer film with the thickness of 0.1mm on the surface of the iron film material by adopting a heat-sealing curing method, and exposing the edge of the iron film material.
(2) And placing the sealed iron membrane material on an anode of electrochemical polishing equipment, connecting a cathode with platinum-iridium wire insoluble metal, and polishing according to the following polishing parameters. The current is direct current. Current range 2A, voltage range 60V, single action time 200s, polishing times 5 times. The electrolyte used was amyl alcohol: ethylene glycol: and (3) mixing the polishing solution with carbonic acid in a volume ratio of 30:60: 10.
(3) And (4) stripping the high-molecular film coat from the polished product, and performing ultrasonic cleaning in absolute ethyl alcohol to obtain the iron film material with the edge being sharpened. The boundary morphology of the iron film material and the edge-sharpened iron film material was examined under the condition of 300 times magnification of a kirschner super-depth-of-field microscope device, and the results are shown in fig. 5 and 6. FIG. 5 shows that the included angle of the iron film material edge is a right angle, and the edge is sharp. Fig. 6 shows that the edges of the iron film material after edge de-sharpening are smooth and round.
Example 4
(1) And sealing a layer of polycarbonate high-molecular film coating with the thickness of 0.5mm on the surface of the titanium film material by adopting a spraying and curing method, and exposing the edge of the titanium film material.
(2) And placing the sealed titanium film material at the anode of an electrochemical polishing device, connecting the cathode with platinum iridium wire insoluble metal, and polishing according to the following polishing parameters. The current is a pulsed current. The current range is 5A, the voltage range is 90V, the single action time is 120s, the polishing times are 10 times, and the pulse current frequency is 95 Hz. The electrolyte used was butanol: glycerol: and (3) mixing the hydrochloric acid with the mixed polishing solution in a volume ratio of 44:50: 6.
(3) And peeling the high molecular film coat of the polished product, and performing ultrasonic cleaning in absolute ethyl alcohol to obtain the titanium film material with the edge being sharpened. The boundary morphology of the titanium film and the titanium film with the edges being sharpened were examined under 500 times magnification by a kirschner super-depth-of-field microscope, and the results are shown in fig. 7 and 8. FIG. 7 shows the titanium film with sharp edges and a right angle included angle. Figure 8 shows that the edges of the titanium film after edge de-sharpening are relatively smooth and rounded.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the present invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. An edge polishing method of a metal film is characterized by comprising the following steps:
arranging a protective film with insulating property on a metal film material, wherein the protective film covers the region outside the edge of the metal film material;
carrying out electrochemical polishing on the metal film material provided with the protective film;
and removing the protective film of the polished metal film material.
2. The method of claim 1, wherein the step of electrochemically polishing comprises:
under the condition that a cathode of an electrochemical polishing device is connected with insoluble metal, the metal film material provided with the protective film is placed on an anode, polishing is carried out for 1-25 times under the conditions that the current range is 0.1-10A and the voltage range is 0.1-100V, the single polishing time is 5-1200 s, the current is direct current or pulse current, and the frequency of the pulse current is 1-300 Hz.
3. The method for polishing the edge of a metal film according to claim 2, wherein the metal film provided with the protective film is polished 5 to 10 times under the conditions of a current range of 1 to 5A and a voltage range of 5 to 20V, the single polishing time is 30 to 300s, the current is direct current or pulse current, and the frequency of the pulse current is 20 to 100 Hz.
4. The method according to claim 2, wherein the electrolyte in the step of electrochemical polishing is a mixture of an alcohol and an acid;
the alcohol substance is selected from two of ethanol, propanol, butanol, pentanol, ethylene glycol and glycerol;
the acid substance is selected from one of acetic acid, propionic acid, acrylic acid, carbonic acid, boric acid, lactic acid, sulfuric acid, nitric acid, phosphoric acid and hydrochloric acid;
the volume ratio of the total volume of the alcohol substances to the volume of the acid substances in the electrolyte is 88-95: 5-12; wherein the volume ratio of the two alcohols is 30-55: 40-60.
5. The edge polishing method of a metal film according to claim 4, wherein the metal film is a titanium film, a zinc film, a magnesium film, or an iron film.
6. The method of claim 1, wherein the protective film is a polymer film, and the polymer film is made of one or more of polyethylene, polypropylene, polyvinyl chloride, polystyrene, polymethyl methacrylate, polycarbonate, polyamide, polyimide, polyoxymethylene, polyethylene terephthalate, polyphenylene oxide resin, polyphthalamide, polyphenylene sulfide, polysulfone, polyether ether ketone, polyvinyl fluoride, polyvinylidene fluoride, polychlorotrifluoroethylene, and polytetrafluoroethylene;
the polymer film is formed by heat-seal curing, spray curing or photocuring.
7. The method of polishing the edge of a metal film according to any one of claims 1 to 6, wherein the thickness of the protective film is 0.01 to 1 mm.
8. The method according to any one of claims 1 to 6, wherein the step of removing the protective film of the metal film after polishing is further followed by:
and cleaning the metal film material with the protective film removed.
9. A metal film produced by the polishing method according to any one of claims 1 to 8.
10. Use of a metal film material prepared by the polishing method according to any one of claims 1 to 8 in a barrier film.
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