CN114855113B - Low-absorption-ratio high-emissivity coating material and preparation process thereof, and coating system and preparation process thereof - Google Patents
Low-absorption-ratio high-emissivity coating material and preparation process thereof, and coating system and preparation process thereof Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 88
- 239000011248 coating agent Substances 0.000 title claims abstract description 85
- 239000000463 material Substances 0.000 title claims abstract description 38
- 238000002360 preparation method Methods 0.000 title claims abstract description 28
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims abstract description 98
- 239000000395 magnesium oxide Substances 0.000 claims abstract description 59
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 15
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000010410 layer Substances 0.000 claims description 50
- 239000000843 powder Substances 0.000 claims description 42
- 238000005507 spraying Methods 0.000 claims description 29
- 239000000919 ceramic Substances 0.000 claims description 22
- 239000007921 spray Substances 0.000 claims description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 238000010521 absorption reaction Methods 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 9
- 239000000956 alloy Substances 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 239000011159 matrix material Substances 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 238000000227 grinding Methods 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- 238000005303 weighing Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000005245 sintering Methods 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000012790 adhesive layer Substances 0.000 claims description 3
- 238000009694 cold isostatic pressing Methods 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 239000002002 slurry Substances 0.000 claims description 3
- 238000000498 ball milling Methods 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims description 2
- 239000011812 mixed powder Substances 0.000 claims 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 abstract description 20
- 238000011161 development Methods 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 9
- 230000005855 radiation Effects 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 229910052596 spinel Inorganic materials 0.000 description 3
- 239000011029 spinel Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- -1 magnesium aluminate Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000010532 solid phase synthesis reaction Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000012720 thermal barrier coating Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/073—Metallic material containing MCrAl or MCrAlY alloys, where M is nickel, cobalt or iron, with or without non-metal elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/131—Wire arc spraying
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Abstract
The invention relates to a low-absorption-ratio high-emissivity coating material and a preparation process thereof, and a high-emissivity coating system and a preparation process thereof. The low-absorption-ratio high-emissivity coating material is magnesia doped alumina, wherein the doping amount of the magnesia is 1-10 wt%. According to the magnesium oxide doping content provided by the invention, the prepared aluminum oxide-based high-emissivity coating system has lower absorption-emission ratio compared with a pure aluminum oxide coating, and the doping method provided by the invention can be applied to development of a sun-facing coating of a solar detector.
Description
Technical Field
The invention belongs to the field of high-emissivity coating materials, and particularly relates to a low-absorption-ratio high-emissivity coating material and a preparation process thereof, and a low-absorption-ratio high-emissivity coating system and a preparation process thereof.
Background
The sun is the nearest star to the earth, and the environment of the whole solar system is almost dominated by it. The series of activities performed by the sun itself affects humans in different ways. Therefore, we need to detect and study the sun in order to cope with solar activities affecting our lives. Initially humans observe the sun remotely by transmitting sun-observing satellites. Many sun-observing satellites have been launched in the united states, europe and japan, but since these satellites are far from the sun, the observed data do not have excessive research value, and thus there is an urgent need to develop a tool capable of observing the sun at close distances. Compared with a solar observation satellite, the solar detector is closer to the sun, so that images with higher resolution can be shot, solar data with higher scientific research value can be acquired, and the solar observation satellite has higher research value. The technical core of the solar detector is to design a thermal protection system capable of resisting high temperature and strong radiation flow exceeding 2500 degrees Fahrenheit from the sun during operation so as to cope with unprecedented high temperature tests. One of the complex components of the thermal protection system is to prepare a sun-facing coating, i.e. to add a thermal protection coating to the detector surface. The thermal protection coating is capable of both reflecting a substantial portion of the visible solar radiation and emitting the remaining energy in the infrared band, so that only a small portion of the residual heat enters the interior of the thermal protection system, which will greatly reduce the temperature inside the spacecraft.
The high emissivity coating is an important branch of a thermal protection coating, has the advantages of high temperature resistance, good chemical stability and the like of a common ceramic coating, and has excellent radiation heat dissipation capability. The high emissivity coating transmits heat on the substrate in the form of thermal radiation through the form of infrared radiation, so that the temperature of the substrate is reduced, the deformation of the component is reduced, and the service life of the component is prolonged.
The most commonly used ceramic materials for high emissivity coatings are oxygen, nitrogen, carbon and boron compounds, with oxides being favored for their low cost and good stability. Common oxides are Al 2 O 3 、Fe 2 O 3 、CuO、MnO 2 、MgO、Cr 2 O 3 Etc., wherein A isl 2 O 3 Due to their excellent properties of wear resistance, corrosion resistance, electrical insulation, etc., they have been widely used in many fields. In particular in the aerospace field, al 2 O 3 The coating also has the characteristics of high temperature stability, high infrared emissivity and low solar absorptivity, and has great advantages in reducing the internal temperature of the solar detector. The current method for improving the infrared emissivity of the coating comprises the steps of controlling the thickness of the coating, regulating and controlling the porosity and doping of the coating, and the like. Chinese patent publication No. CN105861972a discloses a method for preparing a high emissivity coating by doping rare earth oxide. The preparation method plays a role in improving emissivity through doping, so that the temperature control effect of the coating is improved, but the temperature control effect is affected without considering the reduction of the absorptivity of the coating.
In summary, oxide is still the most potential high emissivity coating material, and doping modification is performed on the high emissivity coating to improve the emissivity of the coating, so that the influence of the oxide on the absorptivity of the coating also affects the temperature control effect of the coating.
Disclosure of Invention
The invention aims to provide a low-absorption-ratio high-emissivity coating material and a preparation process thereof, and a low-absorption-ratio high-emissivity coating system and a preparation process thereof, so that the problem that the influence of the absorption rate of an alumina-based high-emissivity coating on the temperature control effect is not considered in the prior art is solved.
According to a first aspect of the present invention there is provided a low-emissivity coating material, the low-emissivity coating material being a magnesium oxide doped alumina, the magnesium oxide being doped in an amount of 1 to 10wt.%. More preferably, the doping amount of the magnesium oxide is 3 to 10wt.%. Most preferably, the magnesium oxide is doped in an amount of 5wt.%.
According to a second aspect of the present invention there is provided a process for the preparation of a low absorption-to-transmission ratio high emissivity coating material as described above, comprising the steps of: a1: respectively weighing Al according to a certain mass ratio 2 O 3 Powder and MgO powder, pouring the weighed powder with different proportions into a ball mill tank, and using absolute ethyl alcohol as a medium, wherein the mass ratio of the alumina grinding ball to the powder is [ ]1-3) 1, and milling and mixing for 20-24 hours by using a planetary ball mill. A2: and (3) placing the ball-milled slurry into a dryer for drying for 2-3 hours, weighing 3-5 g of dried powder by using an electronic balance, placing the powder into a CIP-22M micro isostatic press, and keeping the powder for 5-10 min under the pressure of 300MPa of cold isostatic pressing. A3: and (3) sintering the block material obtained in the step (A2) in an air atmosphere at 1500-1550 ℃ for 60-72 hours, and cooling to room temperature to obtain the low-absorption-ratio high-emissivity coating material of the magnesia doped alumina.
Preferably, in step A1, the Al 2 O 3 The purity of the MgO powder is 99.99% or more.
More preferably, in step A1, the mass ratio of alumina balls to powder is 2:1, at which ratio the best results.
Preferably, in step A3, the precipitate obtained in step A2 is sintered in an air atmosphere at 1550 ℃ for 70-72 hours.
According to a third aspect of the invention, there is provided a process for preparing a low-absorption-ratio high-emissivity thermal barrier coating system, comprising the steps of: b1: providing a low absorption-to-high emissivity coating material as described above; b2: spraying, granulating and drying the coating material with low absorption-emission ratio and high emissivity to prepare high-fluidity powder with the particle size of 15-45 mu m as ceramic layer powder; b3: providing a nickel-based alloy matrix, and spraying NiCrAlY powder on the nickel-based alloy matrix to form a metal bonding layer; b4: and (3) spraying the ceramic layer powder prepared in the step (B2) onto the metal bonding layer prepared in the step (B3) by adopting a spraying process to form a ceramic layer.
Preferably, in the step B3, parameters in the preparation process of the metal bonding layer are as follows: firstly, preheating a substrate to 200-250 ℃ by using a spray gun, then spraying, wherein the spraying voltage is 65-70V, the spraying current is 600-650A, the main air pressure is 50NLPM, the hydrogen pressure is 8NLPM, the moving speed of the spray gun is 500-1000 mm/s, the spraying distance is 80-120 mm, and the powder feeding rotating speed is 1.0-1.5 r/min.
Preferably, in step B4, the parameters of the ceramic layer preparation process are: firstly, preheating a substrate to 200-300 ℃ by using a spray gun, then spraying, wherein the spraying voltage is 65-70V, the spraying current is 600-650A, the main air pressure is 50NLPM, the hydrogen pressure is 8NLPM, the moving speed of the spray gun is 500-1000 mm/s, the spraying distance is 80-100 mm, and the powder feeding rotating speed is 1.3-1.7 r/min.
Preferably, the thickness of the ceramic layer is controlled to be 200-250 μm.
Preferably, the spraying process in step B4 comprises: plasma spraying, electron beam physical vapor deposition, or other spray coating techniques.
According to a fourth aspect of the present invention, there is provided a low-emissivity coating system prepared according to the preparation process described above, the low-emissivity coating system comprising: a base layer; a metal adhesive layer formed on the surface of the base layer; and a ceramic layer connected by the metal bonding layer; the base layer is composed of a high-temperature nickel-based alloy IN738, the metal bonding layer is composed of NiCrAlY, and the ceramic layer is made of magnesia doped alumina, wherein the doping amount of the magnesia is 1-10 wt.%.
It should be understood that "doping amount" in the present invention means a proportion of dopant to the whole material, for example, "10 wt.% of magnesium oxide in magnesium oxide doped alumina" means MgO to Al 2 O 3 And the proportion of the total amount of MgO is 10wt.%. "the doping amount of magnesium oxide in the magnesium oxide doped alumina is 0wt.%" means undoped MgO.
As described in the background art, the present high emissivity coating usually increases its emissivity by doping during development, but the doping is not considered to affect the absorptivity of the coating, so as to affect the temperature control effect of the coating. Because magnesium oxide is a good sintering aid, when the doping content of magnesium oxide is higher than 1wt.%, the grain boundary melting phenomenon can be generated, so that the aluminum oxide-based high-emissivity coating material can effectively reduce the absorptivity of the coating and the absorption-emission ratio of the coating, thereby playing a better role in controlling temperature. Thus, preferably, the doping amount of magnesium oxide is 1wt.% to 10wt.%. The prior art never discloses a coating material with low absorption, high emissivity and doped with magnesia. When the doping amount of magnesium oxide is 5wt.%, the combined effect of the grain boundary melting phenomenon and the produced magnesium aluminate spinel is minimized, so that the magnesium oxide doped aluminum oxide has excellent temperature control effect with respect to the high emissivity coating material with low absorption and emission.
The invention not only limits the doping content of magnesium oxide, avoids the phenomena of small grain size when the doping content is too low and magnesia-alumina spinel when the doping content is too high, but also limits the calcining temperature and avoids that the magnesium oxide can not act on the aluminum oxide when the temperature is too low. Therefore, according to the preparation process of the magnesia doped alumina high-emissivity coating material, the absorption-emission ratio of the alumina coating can be effectively reduced by combining the adopted magnesia doping proportion, so that the temperature control effect is achieved.
Finally, the invention also provides a low-absorption-ratio high-emissivity coating system prepared by the magnesia doped alumina high-emissivity coating material and a preparation process thereof. The low absorption-to-emission ratio high emissivity coating system includes a substrate layer, a metallic bonding layer, and a ceramic layer coupled to the substrate layer by the metallic bonding layer. Spray coating tests show that the low absorption-to-emission ratio high emissivity coating system prepared according to the invention is tightly combined and the system is complete.
In summary, compared with the prior art, the invention has the following beneficial effects:
1) The invention provides a coating material with low absorption and high emissivity by doping magnesium oxide in an alumina material, which reduces the absorptivity of the coating on the basis of ensuring high emissivity, wherein the material is magnesium oxide doped alumina, and the doping amount of the magnesium oxide is 1-10 wt%.
2) The invention also provides a preparation process of the magnesia doped alumina coating material with high low absorption and high emissivity, which is simple and accurate in operation, low in cost and high in reliability.
3) The invention also provides a low-absorption-ratio high-emissivity coating system prepared from the magnesia doped alumina low-absorption-ratio high-emissivity coating material and a preparation process thereof, wherein the low-absorption-ratio high-emissivity coating system has a lower absorption-ratio, is reduced by more than 10 percent compared with the original alumina coating material, and can be applied to a sun-facing coating in a solar detector heat protection system.
Drawings
FIG. 1 is a schematic illustration of the structure of a typical high emissivity coating;
FIG. 2 is a cross-sectional texture of the magnesia doped alumina low absorption-to-high emissivity coating prepared in example 2;
FIG. 3 is an X-ray diffraction pattern of the magnesia-doped alumina powder prepared in example 1 and the low absorption-to-high emissivity coating prepared in example 2;
fig. 4 is a plot of the change in the absorption ratio of the magnesia doped alumina prepared in example 2 and the original alumina material.
Detailed Description
The invention will be further illustrated with reference to specific examples. It should be understood that the following examples are illustrative of the present invention and are not intended to limit the scope of the present invention.
EXAMPLE 1 spray powder preparation
In a purity of 99.99% of Al 2 O 3 The powder is respectively weighed with MgO powder as raw materials according to the doping amount of MgO of 0wt.%, 1wt.%, 3wt.%, 5wt.%, 10wt.%, and absolute ethyl alcohol is used as medium, and the alumina grinding ball and Al are used as raw materials 2 O 3 And MgO total powder with the mass ratio of 2:1, using a planetary ball mill to carry out milling and mixing for 24 hours, putting the slurry after ball milling into a dryer to be dried for 2 hours, weighing 3g of dried powder by using an electronic balance, putting the powder into a CIP-22M micro isostatic press, and keeping the powder for 5 minutes under the pressure of 300MPa of cold isostatic pressing. And sintering the block at a high temperature in an air atmosphere of 1550 ℃ for 72 hours, cooling to room temperature to obtain a required ceramic block, and crushing the block to obtain the coating material with low absorption and emission ratio and high emissivity.
Example 2 Low absorption to high emissivity coating system preparation
The high emissivity coating samples were prepared using conventional atmospheric plasma spray methods. The magnesia doped alumina powder is obtained by the high temperature solid phase method, and the high fluidity powder with the grain diameter of 15-45 microns is prepared as ceramic layer powder by spray granulation and drying treatment. The matrix and the bonding layer are respectively made of high-temperature nickel-based alloy IN738 and domestic NiCrAlY. After preheating the matrix to 230 ℃ by using a spray gun, niCrAlY powder is sprayed to prepare the metal bonding layer. The spray voltage and current were 65V and 620A, respectively, the main gas pressure was 50NLPM, and the hydrogen pressure was 8NLPM. The moving speed of the spray gun is set to 900mm/s, the spraying distance is 110mm, the powder feeding rotating speed is controlled to 1.2r/min, and the thickness of the bonding layer is controlled to about 120 mu m. For the ceramic layer, the matrix was preheated to 230 ℃ using a spray gun, again without powder feed. At this time, the voltage was 65V, the current was 620A, the main gas pressure was 50NLPM, and the hydrogen pressure was 8NLPM. The moving speed of the spray gun is set to be 500mm/s, the spraying distance is 90mm, and the powder feeding rate is 1.5r/min. The thickness of the ceramic layer is controlled to be about 220 μm.
As shown in fig. 1, a low-absorption-ratio high-emissivity coating system made in accordance with the invention comprises: a base layer; a metal adhesive layer formed on the surface of the base layer; ceramic layers connected by a metallic bond layer; the base layer is composed of high-temperature nickel-based alloy IN738, the metal bonding layer is composed of NiCrAlY, and the ceramic layer is composed of magnesia doped alumina with different MgO doping amounts.
The structure of the low-absorption-ratio high-emissivity coating system prepared by the method is shown in fig. 2, wherein (a) represents that the MgO doping amount is 0wt.%, b) represents that the MgO doping amount is 1wt.%, c represents that the MgO doping amount is 3wt.%, d represents that the MgO doping amount is 5wt.%, and e represents that the MgO doping amount is 10wt.%. The coating exhibits the microstructure characteristics of a typical atmospheric plasma spray process and the bond between the layers is tight with no significant crack generation.
The X-ray diffraction results of the magnesia-doped alumina powder and the high emissivity coating are shown in fig. 3, wherein (a) represents the powder and (b) represents the sprayed coating, and the results show that the low absorption-to-high emissivity powder prepared in example 1 and the sprayed coating prepared in example 2 both exhibit a magnesium aluminate spinel phase at a magnesia doping level of greater than 1 wt.%.
The change in the absorption/emission ratio of the different magnesia doping amount alumina coatings is shown in fig. 4 after measuring the absorption/emission ratio of the different magnesia doping amount alumina coatings. The results show that the coating has the lowest absorption to emission ratio at a magnesium oxide doping level of 5wt.% and is reduced by about 10% from the original aluminum oxide material.
Compared with the original alumina material, the magnesia doped alumina low-absorption-ratio high-emissivity coating material provided by the invention has the advantages of lower absorption-ratio, low preparation cost, simple preparation method and easiness in realizing industrial production and application.
The foregoing description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, and various modifications can be made to the above-described embodiment of the present invention. All simple, equivalent changes and modifications made in accordance with the claims and the specification of the present application fall within the scope of the patent claims. The present invention is not described in detail in the conventional art.
Claims (9)
1. The preparation process of the coating material with low absorption and high emissivity is characterized by comprising the following steps of:
a1: respectively weighing Al according to a certain mass ratio 2 O 3 Pouring the weighed mixed powder into a ball mill tank, using absolute ethyl alcohol as a medium, and grinding balls made of aluminum oxide, wherein the mass ratio of the grinding balls to the mixed powder is (1-3): 1, and using a planetary ball mill for grinding and mixing for 20-24 hours;
a2: placing the slurry subjected to ball milling in the step A1 into a dryer for drying for 2-3 hours, weighing 3-5 g of dried powder by using an electronic balance, placing the powder into a CIP-22M micro isostatic press, and keeping the powder for 5-10 min under the pressure of 250-300 MPa of cold isostatic pressing;
a3: and (3) sintering the block material obtained in the step (A2) in an air atmosphere at 1500-1550 ℃ for 60-72 hours, cooling to room temperature, and crushing the block material to obtain the low-absorption-ratio high-emissivity coating material of the magnesia doped alumina, wherein the doping amount of the magnesia is 1-10 wt%.
2. The process according to claim 1, wherein in step A1, the Al is 2 O 3 The purity of MgO is more than 99.99%.
3. The process according to claim 1, wherein in step A1, the mass ratio of the grinding balls to the mixed powder is 2:1.
4. A process for preparing a low-absorption-ratio high-emissivity coating system, comprising the steps of:
b1: providing a low-absorption-ratio high-emissivity coating material prepared by the preparation process according to any one of claims 1-3;
b2: spraying, granulating and drying the coating material with low absorption-emission ratio and high emissivity to prepare high-fluidity powder with the particle size of 15-45 mu m as ceramic layer powder;
b3: providing a nickel-based alloy matrix, and spraying NiCrAlY powder on the nickel-based alloy matrix to form a metal bonding layer;
b4: and (3) spraying the ceramic layer powder prepared in the step (B2) onto the metal bonding layer prepared in the step (B3) by adopting a spraying process to form a ceramic layer.
5. The process according to claim 4, wherein in step B3, the parameters of the ceramic layer preparation process are: firstly, preheating a substrate to 200-300 ℃ by using a spray gun, then spraying, wherein the spraying voltage is 60-70V, the spraying current is 550-650A, the main air pressure is 50NLPM, the hydrogen pressure is 8NLPM, the moving speed of the spray gun is 500mm/s, the spraying distance is 60-100 mm, and the powder feeding rotating speed is 1.3-1.7 r/min.
6. The manufacturing process according to claim 5, wherein the thickness of the metal bonding layer is controlled to be 130-180 μm.
7. The process according to claim 4, wherein in step B4, the parameters of the ceramic layer preparation process are: firstly, preheating a substrate to 200-300 ℃ by using a spray gun, then spraying, wherein the spraying voltage is 60-70V, the spraying current is 550-650A, the main air pressure is 50NLPM, the hydrogen pressure is 8NLPM, the moving speed of the spray gun is 500-1000 mm/s, the spraying distance is 60-100 mm, and the powder feeding rotating speed is 1.3-1.7 r/min.
8. The manufacturing process according to claim 7, wherein the thickness of the ceramic layer is controlled to be 200-250 μm.
9. A low-emissivity coating system prepared by the preparation process according to any one of claims 4 to 8, wherein the low-emissivity coating system comprises: a base layer; a metal adhesive layer formed on the surface of the base layer; and a ceramic layer connected by the metal bonding layer; the base layer is composed of a high-temperature nickel-based alloy IN738, the metal bonding layer is composed of NiCrAlY, and the ceramic layer is composed of magnesia doped alumina with different magnesia doping amounts.
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