CN114839702A - Method and system for rapidly preparing photonic crystal through low-pressure auxiliary evaporation - Google Patents
Method and system for rapidly preparing photonic crystal through low-pressure auxiliary evaporation Download PDFInfo
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- CN114839702A CN114839702A CN202210454621.1A CN202210454621A CN114839702A CN 114839702 A CN114839702 A CN 114839702A CN 202210454621 A CN202210454621 A CN 202210454621A CN 114839702 A CN114839702 A CN 114839702A
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- 239000004038 photonic crystal Substances 0.000 title claims abstract description 58
- 238000000034 method Methods 0.000 title claims abstract description 38
- 230000008020 evaporation Effects 0.000 title claims abstract description 37
- 238000001704 evaporation Methods 0.000 title claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 239000007788 liquid Substances 0.000 claims abstract description 35
- 239000000084 colloidal system Substances 0.000 claims abstract description 28
- 238000002360 preparation method Methods 0.000 claims abstract description 26
- 239000002245 particle Substances 0.000 claims abstract description 15
- 239000004005 microsphere Substances 0.000 claims abstract description 8
- 238000005086 pumping Methods 0.000 claims abstract description 8
- 238000002294 plasma sputter deposition Methods 0.000 claims description 5
- 238000011897 real-time detection Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 description 6
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
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Abstract
The invention provides a method and a system for rapidly preparing photonic crystals based on low-pressure auxiliary evaporation, wherein the method comprises the following steps: step 100, performing wettability treatment on a substrate in advance to enhance hydrophilicity; 200, slowly dripping colloidal droplets dispersed with microsphere particles on a substrate subjected to wettability treatment, wherein a gas-liquid interface is formed between the colloidal droplets on the substrate and air; step 300, placing the substrate covered with the colloid drops in a vacuum tank with controllable pressure intensity; step 400, adjusting the pressure in the vacuum tank to reduce the pressure to below 0.2atm, so that the colloid liquid drops are quickly evaporated and gradually soaked, and further ordered photonic crystals are formed on a gas-liquid interface and spread on the substrate. The system is applied to the implementation and operation of the method and comprises a vacuum tank, a vacuum pumping pump and a pressure gauge arranged on the vacuum tank 1. The invention realizes the preparation of the uniform and ordered photonic crystal in the second order and solves the problem of long preparation period of the photonic crystal.
Description
Field of the invention
The invention belongs to the field of photonic crystal preparation, relates to a rapid preparation direction of photonic crystals, and particularly relates to a method and a system for rapidly preparing photonic crystals by low-pressure auxiliary evaporation.
Background
Photonic crystals refer to microscopic periodic dielectric structures with photonic band gap characteristics, the most essential characteristic being that electromagnetic waves of a certain frequency cannot propagate in such periodic structures and thus take on a specific color. The preparation of the photonic crystal with ordered structure and uniform performance becomes the focus of research in the field of soft substances in nearly two decades, because the photonic crystal has great potential application value in the fields of optical fiber communication, color display, biochemical sensing and the like.
The current methods for preparing photonic crystals mainly include a gravity settling method, an electric field induced self-assembly method, a spin-coating method, an interface assembly method and the like. However, these methods have a significant drawback in that they are inefficient, long in preparation period, and can last up to several months. The preparation efficiency restricts the progress of photonic crystal research and also restricts the application and popularization of the photonic crystal. Therefore, it is an urgent need to achieve rapid preparation of uniformly ordered photonic crystals.
Disclosure of Invention
In view of the defect of long preparation period of the photonic crystal in the prior art, the invention provides a method and a system for quickly preparing the photonic crystal by low-pressure auxiliary evaporation, and the preparation of the uniform ordered photonic crystal in the second order is realized.
A method for rapidly preparing photonic crystals by low-pressure auxiliary evaporation comprises the following steps:
200, slowly dripping colloidal droplets dispersed with microsphere particles on a substrate subjected to wettability treatment, wherein a gas-liquid interface is formed between the colloidal droplets on the substrate and air;
step 300, placing the substrate covered with the colloid drops in a vacuum tank with controllable pressure intensity;
step 400, adjusting the pressure in the vacuum tank to reduce the pressure to below 0.2atm, so that the height of the gas-liquid interface of the rapid evaporation of the colloid liquid drops is reduced along with the evaporation process, the colloid liquid drops are gradually soaked, and then the ordered photonic crystals are formed on the gas-liquid interface and spread on the substrate.
Further, in the step 400, the pressure in the vacuum tank is reduced to 0.2atm or less within 10 seconds.
Further, the pressure in the step 400 is reduced to 0.05atm or 0.01atm or 0.001 atm.
Further, the substrate is previously subjected to a wetting treatment using a surface plasma sputtering method.
Further, the method further comprises: the preparation of different types of photonic crystals is achieved by varying the concentration of colloidal droplets and/or the diameter of the microspheroidal particles.
Further, the concentration of the colloidal droplets is: 2-6 wt%; the diameter of the microsphere particles is as follows: 170 and 1000 nm.
In a second aspect of the present invention, there is provided a system for a method for rapidly preparing a photonic crystal by low-pressure assisted evaporation, the system for rapidly preparing a photonic crystal by low-pressure assisted evaporation comprising:
a vacuum tank for placing the substrate covered with the colloid liquid drop;
the vacuum pumping pump is connected with the vacuum tank and is used for controlling the pressure in the vacuum tank;
the pressure gauge is arranged on the vacuum tank, the detection end of the pressure gauge is communicated with the inside of the vacuum tank, and the pressure gauge is used for detecting the pressure in the vacuum tank in real time.
Compared with the prior art, the invention has the following beneficial effects:
1. according to the invention, evaporation is assisted by low pressure, so that the evaporation rate of colloid droplets is greatly increased, colloid particles can be rapidly assembled on a gas-liquid interface, and finally photonic crystals are formed. Compared with the existing preparation scheme of the photonic crystal, the preparation method greatly improves the preparation efficiency, improves the preparation time to be within a few seconds, and shortens the preparation time of the photonic crystal by tens of times or even hundreds of times.
2. According to the invention, the wettability of the substrate is increased, the concentration of the colloid liquid drop is adjusted, and the particle diameter is changed, so that the rapid preparation of abundant photonic crystals is realized.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below. It should be apparent that the drawings in the following description are merely exemplary, and that other embodiments can be derived from the drawings provided by those of ordinary skill in the art without inventive effort.
FIG. 1 is a flow chart of the method for rapidly preparing photonic crystals by low-pressure auxiliary evaporation according to the present invention;
FIG. 2 is a schematic view of the evaporation of the gas-liquid interface in the present invention;
FIG. 3 is a diagram of a process for preparing a system for rapidly preparing photonic crystals by low-pressure assisted evaporation according to the present invention;
FIG. 4 is an exemplary illustration of a photonic crystal sample prepared in example 1 of the present invention;
FIG. 5 is a schematic diagram of a comparison of prior art and inventive methods for producing photonic crystals;
reference numbers in the figures: 1-vacuum tank, 2-vacuum pump, 3-pressure gauge, 4-colloid liquid drop.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
A method for rapidly preparing photonic crystals by low-pressure auxiliary evaporation is shown in figure 1, and comprises the following steps:
In the present invention, the substrate can be selected from various flat solids, as long as the surface of the substrate is smooth, such as latex, PDMS, metal, glass, and other solid materials.
The substrate can be subjected to wettability treatment by a surface plasma sputtering method, the surface plasma sputtering method is suitable for various solid substrates, and the substrates made of various materials can be subjected to wettability treatment by the surface plasma sputtering method.
The substrate is processed with wettability to reduce the contact angle between water and the substrate as much as possible, and the contact angles of colloid liquid drops with different concentrations are different, and the contact angle requirement is smaller when the concentration is higher. The contact angle of the colloidal droplet with the substrate generally needs to be reduced to below 30 °, preferably below 10 °.
And 200, slowly dripping the colloid liquid drops dispersed with the microsphere particles on the substrate after the wettability treatment, and forming a gas-liquid interface between the colloid liquid drops on the substrate and air.
In one embodiment, the present invention may also enable the preparation of different types of photonic crystals by varying the concentration of colloidal droplets and/or the diameter of the microspheroidal particles.
The concentration of the colloid liquid drop is generally selected to be 2-6 wt%, and the diameter range of the microsphere particle is generally selected to be 170-1000 nm.
And 300, placing the substrate covered with the colloid drops in a vacuum tank with controllable pressure.
In one embodiment, a vacuum pump may be used to adjust the pressure inside the vacuum tank, and the vacuum pump is connected to the vacuum tank to control the evaporation rate by adjusting the pressure inside the vacuum tank. The evaporation rate is related to the pressure inside the vacuum tank, the lower the pressure inside the vacuum tank the higher the evaporation rate.
Step 400, adjusting the pressure in the vacuum tank to reduce the pressure to below 0.2atm, so that the height of the gas-liquid interface of the rapid evaporation of the colloid liquid drops is reduced along with the evaporation, the colloid liquid drops are gradually soaked, and then the ordered photonic crystals are formed on the gas-liquid interface and spread on the substrate.
In the process that the pressure is reduced to be below 0.2atm, the colloid drops are quickly evaporated, the height of a gas-liquid interface is quickly reduced along with the evaporation, as shown in figure 2, the colloid drops form small drops, a large number of particles are captured by the gas-liquid interface, the gas-liquid interface is assembled into ordered photonic crystals, and the ordered photonic crystals are spread on a substrate along with the soaking removal process. And (4) shifting an air valve switch on the vacuum pump, and easily opening the vacuum tank after the internal pressure and the external pressure of the vacuum pump are consistent to finish the preparation of the photonic crystal.
In one embodiment, the pressure is decreased for as long as possible within 10S, and the vacuum pump pumping rate is selected according to the volume of the vacuum tank within 10S to adjust the pressure in the vacuum tank to be reduced to below 0.2atm, so as to reduce the coffee ring effect.
The pressure is directly related to the formation of the final photonic crystal, and the lower the pressure, the higher the evaporation efficiency and the shorter the evaporation time. Generally, the pressure drops below 0.2atm, and a photonic crystal can be formed. The pressure drop can be realized in two ways: and when the pressure is reduced to a certain pressure value below 0.2atm, keeping the pressure in the vacuum tank unchanged, and waiting for the photonic crystal to form. The second method comprises the following steps: after the pressure is reduced to 0.2atm, the pressure in the vacuum tank is continuously reduced until the photonic crystals are completely formed, and the pressure is stopped to be reduced.
In one embodiment, the pressure may be reduced to 0.05atm or 0.01atm or 0.001 atm.
The invention also provides a system for the method for rapidly preparing the photonic crystal by low-pressure auxiliary evaporation, as shown in fig. 3, the system comprises:
a vacuum tank 1 for placing a substrate covered with colloidal droplets 4;
the vacuum pumping pump 2 is connected with the vacuum tank 1, and the vacuum pumping pump 2 is used for controlling the pressure in the vacuum tank 1;
the pressure gauge 3 is arranged on the vacuum tank 1, the detection end of the pressure gauge 3 is communicated with the interior of the vacuum tank 1, and the pressure gauge 3 is used for detecting the pressure in the vacuum tank 1 in real time.
In the system for rapidly preparing the photonic crystal by low-pressure auxiliary evaporation, the photonic crystal can be rapidly prepared by adopting the method. According to the invention, evaporation rate of colloid liquid drops is greatly increased by low-pressure auxiliary evaporation, colloid particles can be rapidly assembled on a gas-liquid interface, and finally photonic crystals are formed, so that preparation time is increased to the second order.
Example 1
The glass substrate is selected, cleaned and plasma sputtered to reduce the contact angle between water and glass as much as possible, in this example, to below 30 °.
0.5. mu.l of colloidal droplets having a concentration of 4% by weight and a particle diameter of 200nm was pipetted slowly onto the treated glass substrate.
The glass substrate was placed in a vacuum tank having a volume of 3.8L and a vacuum pump connected to the vacuum tank at a pumping rate of 2.3L/s. The vacuum pump was turned on to reduce the pressure in the vacuum tank to 0.01atm, and then the vacuum pump was turned off to maintain the pressure in the vacuum tank at 0.01 atm. Within a few tens of seconds, after the colloidal droplets evaporated, the ordered arrangement of photonic crystals spread out on the glass substrate, and the final prepared photonic crystal sample is shown in fig. 4.
The preparation time of the photonic crystal was 218S compared to the scheme of main crystal preparation efficiency by using a fast evaporation solvent (Su et al chem. eng. journal.2021(420)) as the upper graph in fig. 5; by adopting the preparation scheme of the invention, as shown in the lower graph in FIG. 5, the preparation time of the photonic crystal is 3.1S, and the preparation efficiency is almost improved by two orders of magnitude.
The above embodiments are only exemplary embodiments of the present application, and are not intended to limit the present application, and the protection scope of the present application is defined by the claims. Various modifications and equivalents may be made by those skilled in the art within the spirit and scope of the present application and such modifications and equivalents should also be considered to be within the scope of the present application.
Claims (7)
1. A method for rapidly preparing photonic crystals by low-pressure auxiliary evaporation is characterized by comprising the following steps:
step 100, performing wettability treatment on a substrate in advance to enhance hydrophilicity;
200, slowly dripping colloidal droplets dispersed with microsphere particles on a substrate subjected to wettability treatment, wherein a gas-liquid interface is formed between the colloidal droplets on the substrate and air;
step 300, placing the substrate covered with the colloid drops in a vacuum tank with controllable pressure intensity;
step 400, adjusting the pressure in the vacuum tank to reduce the pressure to below 0.2atm, so that the height of the gas-liquid interface of the rapid evaporation of the colloid liquid drops is reduced along with the evaporation process, the colloid liquid drops are gradually soaked, and then the ordered photonic crystals are formed on the gas-liquid interface and spread on the substrate.
2. The method for rapidly preparing photonic crystals through low-pressure auxiliary evaporation as claimed in claim 1, wherein the pressure in the step 400 is reduced to 0.05atm, 0.01atm or 0.001 atm.
3. The method of claim 1, wherein in step 400, the pressure in the vacuum tank is reduced to below 0.2atm within 10 seconds.
4. The method for rapidly preparing the photonic crystal by the low-pressure auxiliary evaporation as claimed in claim 1, wherein the substrate is subjected to the wettability treatment in advance by adopting a surface plasma sputtering method.
5. The method for rapidly preparing photonic crystals by low-pressure auxiliary evaporation according to claim 1, further comprising: the preparation of different types of photonic crystals is realized by changing the concentration of colloid droplets and/or the diameter of microsphere particles.
6. The method for rapidly preparing photonic crystals by low-pressure auxiliary evaporation according to claim 5, wherein the concentration of the colloid liquid drops is as follows: 2-6 wt%; the diameter of the microsphere particles is as follows: 170 and 1000 nm.
7. A system for the method for rapidly preparing photonic crystals by low-pressure auxiliary evaporation according to any one of claims 1 to 6, which is characterized by comprising the following steps:
the vacuum tank (1) is used for placing the substrate covered with the colloid liquid drops (4);
the vacuum pumping pump (2) is connected with the vacuum tank (1), and the vacuum pumping pump (2) is used for controlling the pressure in the vacuum tank (1);
manometer (3), set up on vacuum tank (1), the sense terminal of manometer (3) with vacuum tank (1) inside intercommunication, manometer (3) are used for real-time detection the pressure in the vacuum tank (1).
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1936074A (en) * | 2005-09-21 | 2007-03-28 | 中国科学院物理研究所 | Method and apparatus for growing three-dimensional photon crystal film by pressure-reducing self-assembling |
| CN101280455A (en) * | 2008-01-08 | 2008-10-08 | 东南大学 | Method for self-assembling preparing colloidal photonic crystals and improving mechanical stability |
| WO2009128591A1 (en) * | 2008-04-14 | 2009-10-22 | Korea Advanced Institute Of Science And Technology | Method for patterning of hemispherical photonic crystallines and fabrication of photonic crystals with various shapes using photocurable colloidal suspensions |
| CN101702060A (en) * | 2009-11-05 | 2010-05-05 | 东南大学 | Array type display component and preparation method thereof |
| CN102251272A (en) * | 2011-07-15 | 2011-11-23 | 中国科学院力学研究所 | Elastic colloidal crystal film and preparation method thereof |
| CN103361730A (en) * | 2012-04-06 | 2013-10-23 | 中国科学院化学研究所 | Annular photonic crystal, and preparation method and application thereof |
| CN106544732A (en) * | 2016-10-27 | 2017-03-29 | 温州医科大学 | A kind of fast preparation method of opal photonic crystal |
| CN106908898A (en) * | 2015-12-23 | 2017-06-30 | 中国科学院化学研究所 | A kind of preparation method of photonic crystal and the photonic crystal prepared by the method |
| CN110304636A (en) * | 2019-06-28 | 2019-10-08 | 上海交通大学 | A kind of method that vacuum filtration prepares photo crystal thick |
| CN113089102A (en) * | 2021-03-02 | 2021-07-09 | 南京师范大学 | Preparation method of two-dimensional composite colloidal crystal photonic device |
| CN113877787A (en) * | 2021-08-18 | 2022-01-04 | 航天特种材料及工艺技术研究所 | Photonic crystal infrared stealth material and preparation method thereof |
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2022
- 2022-04-27 CN CN202210454621.1A patent/CN114839702A/en active Pending
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1936074A (en) * | 2005-09-21 | 2007-03-28 | 中国科学院物理研究所 | Method and apparatus for growing three-dimensional photon crystal film by pressure-reducing self-assembling |
| CN101280455A (en) * | 2008-01-08 | 2008-10-08 | 东南大学 | Method for self-assembling preparing colloidal photonic crystals and improving mechanical stability |
| WO2009128591A1 (en) * | 2008-04-14 | 2009-10-22 | Korea Advanced Institute Of Science And Technology | Method for patterning of hemispherical photonic crystallines and fabrication of photonic crystals with various shapes using photocurable colloidal suspensions |
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| CN102251272A (en) * | 2011-07-15 | 2011-11-23 | 中国科学院力学研究所 | Elastic colloidal crystal film and preparation method thereof |
| CN103361730A (en) * | 2012-04-06 | 2013-10-23 | 中国科学院化学研究所 | Annular photonic crystal, and preparation method and application thereof |
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| CN106544732A (en) * | 2016-10-27 | 2017-03-29 | 温州医科大学 | A kind of fast preparation method of opal photonic crystal |
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| CN113089102A (en) * | 2021-03-02 | 2021-07-09 | 南京师范大学 | Preparation method of two-dimensional composite colloidal crystal photonic device |
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