CN110304636A - A kind of method that vacuum filtration prepares photo crystal thick - Google Patents

A kind of method that vacuum filtration prepares photo crystal thick Download PDF

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Publication number
CN110304636A
CN110304636A CN201910571987.5A CN201910571987A CN110304636A CN 110304636 A CN110304636 A CN 110304636A CN 201910571987 A CN201910571987 A CN 201910571987A CN 110304636 A CN110304636 A CN 110304636A
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Prior art keywords
crystal thick
vacuum filtration
photo crystal
dispersion
filtration according
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CN201910571987.5A
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Chinese (zh)
Inventor
胡晓斌
蔡子贺
林升炫
肖佳佳
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Shanghai Jiaotong University
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Shanghai Jiaotong University
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Priority to CN201910571987.5A priority Critical patent/CN110304636A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D29/00Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/085Funnel filters; Holders therefor
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02Homopolymers or copolymers of hydrocarbons
    • C08J2325/04Homopolymers or copolymers of styrene
    • C08J2325/06Polystyrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/10Homopolymers or copolymers of methacrylic acid esters
    • C08J2333/12Homopolymers or copolymers of methyl methacrylate

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Filtering Materials (AREA)

Abstract

The present invention relates to a kind of methods that vacuum filtration prepares photo crystal thick, comprising: mono-dispersion microballoon dispersion is obtained dispersion liquid in a solvent;Clean smooth perforated substrate is placed on filter;Dispersion liquid is poured into perforated substrate, is filtered by vacuum to solvent and is drained;It removes substrate and carries out drying and processing;It repeats to filter, drying for several times, obtains certain thickness photo crystal thick.Compared with prior art, the present invention realizes preparation of the period from 100nm-1 μm of photo crystal thick by changing the partial size of mono-dispersion microballoon, passes through the concentration for adjusting mono-dispersion microballoon, dosage, speed is filtered, the preparation of the photo crystal thick of 1 μm of -1cm of thickness is realized.

Description

A kind of method that vacuum filtration prepares photo crystal thick
Technical field
The present invention relates to photonic crystal preparation fields, and the side of photo crystal thick is prepared more particularly, to a kind of vacuum filtration Method.
Background technique
Material with optical band gap gap (Photonic Band-Gap) is also known as photonic crystal, it refers to dielectric constant (folding Penetrate rate) periodically variable one kind material on submicron-scale.The concept of photonic crystal be earliest 1987 by What Yablonovitch and two people of John independently proposed, be to be got by traditional crystal concept analogy: in crystal, having a size of 10- The atom periodic arrangement of 10m can make X-ray that diffraction occur;In the photonic crystal, the periodic structure having a size of 10-7m can So that diffraction occurs for visible light.U.S.'s Science magazine 1999 photonic crystal be classified as the following six big research hotspots it One, predictive of the bright prospects of photonic crystal research.
The preparation of photonic crystal of opals structure mainly has self-assembly method and spray coating method at present, and wherein self-assembly method obtains Photonic crystal order is good, but manufacturing cycle is longer, and thickness is usually no more than 10 μm, and spray coating method is suitable for the light of large area Sub- crystal preparation, but obtained photonic crystal order is poor.
Therefore, it is necessary to a kind of completely new, simple processes, the low-cost, method that is able to achieve photo crystal thick preparation.
Chinese patent CN100410301C discloses a kind of side with preparation of ordered porous conductive polymer by suction filtration/immersion method Method.This method immerses monomer in colloidal crystal template simultaneously with initiator by suction filtration mode to polymerize, and then removes template and obtains To preparing 3-D ordered multiporous conducting polymer.The present invention and the main distinction of patent CN100410301C are: 1) of the invention The mono-dispersion microballoon is silicon dioxide microsphere, is had the advantages that corrosion-resistant, resistant to high temperature;2) substrate of the present invention is with gas The carbon paper of body diffused layer has smaller aperture, excellent electric conductivity compared with patent CN100410301C;3) present invention adopts With multistep processes, the defect formed after drying can be effectively reduced, patent CN100410301C does not have this advantage.
Summary of the invention
It is an object of the present invention to overcome the above-mentioned drawbacks of the prior art and provide a kind of vacuum filtrations to prepare The method of photo crystal thick is suitable for a variety of perforated substrates, simple process and low cost.
The purpose of the present invention can be achieved through the following technical solutions:
A kind of method that vacuum filtration prepares photo crystal thick, comprising:
Mono-dispersion microballoon dispersion is obtained into dispersion liquid in a solvent;
Clean smooth perforated substrate is placed on filter;
Dispersion liquid is poured into perforated substrate, is filtered by vacuum to solvent and is drained;
It removes substrate and carries out drying and processing;
It repeats to filter, drying for several times, obtains the photo crystal thick of 1 μm of -1cm thickness.
The mono-dispersion microballoon includes silicon dioxide microsphere.
The partial size of the mono-dispersion microballoon is 100nm-1 μm.
The solvent is ethyl alcohol or deionized water.
The mass concentration of the dispersion liquid is 0.2-1.0%, and the dispersion liquid of the concentration can form uniform after filtering Photo crystal thick advantageously reduces the generation of defect.
The perforated substrate is the carbon fiber paper with gas diffusion layers, and the aperture of perforated membrane is necessarily less than mono-dispersion microballoon Partial size.
The flow velocity that control filters when vacuum filtration is 1-5L/h.
It filters, the number of repetition of drying is 0-5 times, can reduce photonic crystal caliper defects by the flow velocity that control filters Formation;The defects of by repeatedly drying and filtering, on the one hand can making the crack formed after previous step is dry is filled, On the other hand the thickness of photonic crystal is increased.
Compared with prior art, present invention process is simple, low in cost, applied widely, it can be achieved that mono-dispersion microballoon, no The preparation of the photo crystal thick of stack pile.
Partial size by changing mono-dispersion microballoon realizes preparation of the period from 100nm-1 μm of photo crystal thick;It is logical The concentration of mono-dispersion microballoon is overregulated, dosage filters speed, realizes the preparation of the photo crystal thick of 1 μm of -1cm of thickness.
Specific embodiment
The present invention is described in detail combined with specific embodiments below.Following embodiment will be helpful to the technology of this field Personnel further understand the present invention, but the invention is not limited in any way.It should be pointed out that the ordinary skill of this field For personnel, without departing from the inventive concept of the premise, various modifications and improvements can be made.These belong to the present invention Protection scope.
A kind of method that vacuum filtration method prepares photo crystal thick, comprising the following steps:
1) mono-dispersion microballoon for being 100nm-1 μm by partial size, such as silicon dioxide microsphere, polystyrene microsphere or poly- methyl Methyl acrylate microballoon is placed in beaker, ethyl alcohol or deionized water is added as solvent, it is 0.2- that ultrasonic disperse, which obtains mass concentration, The dispersion liquid of 1.0% dispersion liquid, the concentration can form uniform photo crystal thick after filtering, and advantageously reduce defect Generation;
2) clean smooth perforated substrate is placed on sand core filter, the substrate that can be used is with gas diffusion layers Carbon fiber paper.The aperture of perforated membrane is necessarily less than the partial size of mono-dispersion microballoon;
3) vacuum pump is opened, dispersion liquid is poured into, the flow velocity for controlling suction filtration is 1-5L/h, until solvent is drained;
4) substrate is removed, is placed in drying box and dries;
5) it repeats to filter, baking step 0-5 times, photonic crystal caliper defects can be reduced by the flow velocity that control filters It is formed;The defects of by repeatedly drying and filtering, on the one hand can making the crack formed after previous step is dry is filled, separately On the one hand the thickness for increasing photonic crystal, finally obtains the photo crystal thick of required thickness.
Above scheme bring direct technology effect is to prepare photo crystal thick, technique letter using vacuum filtration method It is single, it is low in cost, realize the preparation of photo crystal thick.
More detailed case study on implementation below, by following case study on implementation further illustrate technical solution of the present invention with And the technical effect that can be obtained.
Embodiment 1
With a thickness of 10 μm of silica photo crystal thicks the preparation method is as follows:
1) it takes the silica mono-dispersion microballoon that 0.1g partial size is 300nm in beaker, 50ml dehydrated alcohol, ultrasound is added Disperse 30min, forms uniform dispersion liquid;
2) taking area is 4cm2The carbon fiber paper with gas diffusion layers, be layered on sand core filter, clamping device;
3) dispersion liquid is poured into, vacuum pump is opened, adjusting flow velocity is 1L/h;
4) after the completion of all filtering, carbon fiber paper is removed, is placed in drying box, 60 DEG C, dry 1h.
Embodiment 2
With a thickness of 1cm polystyrene photon crystal thick film the preparation method is as follows::
1) it takes the polystyrene mono-dispersion microballoon that 0.5g partial size is 500nm in beaker, 200ml deionized water is added, surpass Sound disperses 30min, forms uniform dispersion liquid;
2) taking area is 4cm2Aperture be 0.22 μm of filter membrane, be layered on sand core filter, clamping device;
3) dispersion liquid is poured into, vacuum pump is opened, adjusting flow velocity is 2L/h;
4) after the completion of all filtering, filter membrane is removed, is placed in drying box, 60 DEG C, dry 1h.
5) suction filtration, drying steps 5 times are repeated, the polystyrene photon crystal thick film with a thickness of 1cm is obtained.
Embodiment 3
With a thickness of 100 μm of silica photo crystal thicks the preparation method is as follows::
1) it takes the silicon dioxide microsphere that 1g partial size is 100nm in beaker, 500ml deionized water, ultrasonic disperse is added 30min forms uniform dispersion liquid;
2) taking area is 4cm2Aperture be 40nm filter membrane, be layered on sand core filter, clamping device;
3) dispersion liquid is poured into, vacuum pump is opened, adjusting flow velocity is 1L/h;
4) after the completion of all filtering, filter membrane is removed, is placed in drying box, 60 DEG C, dry 1h.
5) suction filtration, drying steps 2 times are repeated, the silica photo crystal thick with a thickness of 100 μm is obtained.
Embodiment 4
With a thickness of 300 μm of polymethyl methacrylate photo crystal thicks the preparation method is as follows::
1) it takes the polymethyl methacrylate mono-dispersion microballoon that 1g partial size is 1 μm in beaker, 100ml deionization is added Water, ultrasonic disperse 60min form uniform dispersion liquid;
2) taking area is 8cm2Aperture be 0.5 μm of filter membrane, be layered on sand core filter, clamping device;
3) dispersion liquid is poured into, vacuum pump is opened, adjusting flow velocity is 5L/h;
4) after the completion of all filtering, filter membrane is removed, is placed in drying box, 60 DEG C, dry 2h.
5) suction filtration, drying steps 4 times are repeated, the polymethyl methacrylate photo crystal thick with a thickness of 300 μm is obtained.
In the description of this specification, the description of reference term " one embodiment ", " example ", " specific example " etc. means Particular features, structures, materials, or characteristics described in conjunction with this embodiment or example are contained at least one implementation of the invention In example or example.In the present specification, schematic expression of the above terms may not refer to the same embodiment or example. Moreover, particular features, structures, materials, or characteristics described can be in any one or more of the embodiments or examples to close Suitable mode combines.
The above description of the embodiments is intended to facilitate ordinary skill in the art to understand and use the invention. Person skilled in the art obviously easily can make various modifications to these embodiments, and described herein general Principle is applied in other embodiments without having to go through creative labor.Therefore, the present invention is not limited to the above embodiments, ability Field technique personnel announcement according to the present invention, improvement and modification made without departing from the scope of the present invention all should be of the invention Within protection scope.

Claims (9)

1. a kind of method that vacuum filtration prepares photo crystal thick, which is characterized in that this method comprises:
Mono-dispersion microballoon dispersion is obtained into dispersion liquid in a solvent;
Clean smooth perforated substrate is placed on filter;
Dispersion liquid is poured into perforated substrate, is filtered by vacuum to solvent and is drained;
It removes substrate and carries out drying and processing;
It repeats to filter, drying for several times, obtains certain thickness photo crystal thick.
2. the method that a kind of vacuum filtration according to claim 1 prepares photo crystal thick, which is characterized in that the list Dispersion microsphere includes silicon dioxide microsphere.
3. the method that a kind of vacuum filtration according to claim 1 or 2 prepares photo crystal thick, which is characterized in that institute The partial size for stating mono-dispersion microballoon is 100nm-1 μm.
4. the method that a kind of vacuum filtration according to claim 1 prepares photo crystal thick, which is characterized in that described molten Agent is ethyl alcohol or deionized water.
5. the method that a kind of vacuum filtration according to claim 1 prepares photo crystal thick, which is characterized in that described point The mass concentration of dispersion liquid is 0.2-1.0%.
6. the method that a kind of vacuum filtration according to claim 1 prepares photo crystal thick, which is characterized in that described more Hole substrate is the carbon fiber paper with gas diffusion layers.
7. the method that a kind of vacuum filtration according to claim 1 prepares photo crystal thick, which is characterized in that vacuum is taken out The flow velocity that control filters when filter is 1-5L/h.
8. the method that a kind of vacuum filtration according to claim 1 prepares photo crystal thick, which is characterized in that it filters, The number of repetition of drying is 0-5 times.
9. the method that a kind of vacuum filtration according to claim 1 prepares photo crystal thick, which is characterized in that the light Sub- crystal thick film with a thickness of 1 μm of -1cm.
CN201910571987.5A 2019-06-28 2019-06-28 A kind of method that vacuum filtration prepares photo crystal thick Pending CN110304636A (en)

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CN110983424A (en) * 2019-11-19 2020-04-10 上海交通大学 Method for preparing large-area crack-free thick film photonic crystal on porous substrate
CN111082147A (en) * 2019-12-09 2020-04-28 上海交通大学 Preparation method of photonic crystal lithium-sulfur battery based on large-area thick film controllable texture
CN114420995A (en) * 2022-01-07 2022-04-29 上海交通大学 Selenium-enriched lithium selenium battery based on three-dimensional ordered porous carbon optical crystal and preparation method thereof
CN114839702A (en) * 2022-04-27 2022-08-02 中国科学院力学研究所 Method and system for rapidly preparing photonic crystal through low-pressure auxiliary evaporation

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110983424A (en) * 2019-11-19 2020-04-10 上海交通大学 Method for preparing large-area crack-free thick film photonic crystal on porous substrate
CN111082147A (en) * 2019-12-09 2020-04-28 上海交通大学 Preparation method of photonic crystal lithium-sulfur battery based on large-area thick film controllable texture
CN111082147B (en) * 2019-12-09 2023-09-12 上海交通大学 Preparation method of photonic crystal lithium sulfur battery based on large-area thick film controllable texture
CN114420995A (en) * 2022-01-07 2022-04-29 上海交通大学 Selenium-enriched lithium selenium battery based on three-dimensional ordered porous carbon optical crystal and preparation method thereof
CN114839702A (en) * 2022-04-27 2022-08-02 中国科学院力学研究所 Method and system for rapidly preparing photonic crystal through low-pressure auxiliary evaporation

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