CN114815003A - Optical film edge metallization treatment process - Google Patents
Optical film edge metallization treatment process Download PDFInfo
- Publication number
- CN114815003A CN114815003A CN202210262072.8A CN202210262072A CN114815003A CN 114815003 A CN114815003 A CN 114815003A CN 202210262072 A CN202210262072 A CN 202210262072A CN 114815003 A CN114815003 A CN 114815003A
- Authority
- CN
- China
- Prior art keywords
- edge
- film
- glue
- exposure
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 44
- 239000012788 optical film Substances 0.000 title claims abstract description 28
- 238000001465 metallisation Methods 0.000 title claims abstract description 27
- 239000010408 film Substances 0.000 claims abstract description 43
- 239000003292 glue Substances 0.000 claims abstract description 27
- 239000000047 product Substances 0.000 claims abstract description 23
- 238000000576 coating method Methods 0.000 claims abstract description 19
- 239000002184 metal Substances 0.000 claims abstract description 19
- 230000003287 optical effect Effects 0.000 claims abstract description 19
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 19
- 239000011248 coating agent Substances 0.000 claims abstract description 18
- 238000007747 plating Methods 0.000 claims abstract description 16
- 238000001035 drying Methods 0.000 claims abstract description 14
- 238000002791 soaking Methods 0.000 claims abstract description 14
- 239000011265 semifinished product Substances 0.000 claims abstract description 12
- 238000001259 photo etching Methods 0.000 claims abstract description 10
- 239000007788 liquid Substances 0.000 claims abstract description 9
- 230000000903 blocking effect Effects 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 4
- 238000004026 adhesive bonding Methods 0.000 claims description 16
- 230000001133 acceleration Effects 0.000 claims description 11
- 238000004528 spin coating Methods 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003331 infrared imaging Methods 0.000 description 1
- 238000004021 metal welding Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B1/00—Instruments for performing medical examinations of the interior of cavities or tubes of the body by visual or photographical inspection, e.g. endoscopes; Illuminating arrangements therefor
- A61B1/00163—Optical arrangements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Surgery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Medical Informatics (AREA)
- Radiology & Medical Imaging (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Biophysics (AREA)
- Biomedical Technology (AREA)
- Heart & Thoracic Surgery (AREA)
- Pathology (AREA)
- Molecular Biology (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Chemically Coating (AREA)
Abstract
The invention discloses an optical film edge metallization treatment process, which can plate a circle of metal film on the edge of an optical lens and comprises the following steps: 1) coating the whole surface of the optical lens primary product with glue; 2) blocking the edge part through a No. 1 mask plate, and exposing the middle part under a photoetching machine; 3) after exposure, the photoresist of the exposed part is dissolved by soaking a developing solution; 4) drying the obtained product in the step 3), and plating a dielectric film on the obtained product; 5) the film at the edge of the plated rubber part falls off by soaking a stripping liquid to obtain a semi-finished product; 6) coating the whole surface of the semi-finished product with glue; 7) blocking the middle part by using a No. 2 mask plate, and exposing the edge part; 8) after exposure, the photoresist on the edge and the side is dissolved by using a developing solution; 9) drying the obtained product in the step 8), and plating a metal film on the product; 10) and after the plating is finished, stripping the metal film with the photoresist as a substrate by using a stripping solution to obtain the optical lens with the metal film at the edge of the intermediate medium film.
Description
Technical Field
The invention relates to the technical field of optical films, in particular to an edge metallization treatment process of an optical film.
Background
The medical endoscope needs high-temperature and high-pressure sterilization before use, water needs to be prevented from entering a cavity of the endoscope in use, and a common gluing method is easy to fall off in a high-temperature state, so that metal welding becomes necessary, and a vacuum observation window also needs good tightness in the same way, so that a metal film and a dielectric film need to exist at the same base.
Disclosure of Invention
The invention aims to design an optical film edge metallization treatment process, which can plate a circle of metal film on the edge of an optical lens, so that the obtained product can be better welded or connected on optical mechanical assembly, thereby realizing the sealing performance.
The invention is realized by the following technical scheme: the edge metallization treatment process of the optical film comprises the following steps:
1) coating the whole surface of the optical lens primary product with glue;
2) blocking the edge part through a No. 1 mask plate, and exposing the middle part under a photoetching machine;
3) after exposure, the photoresist of the exposed part is dissolved by soaking a developing solution;
4) drying the obtained product in the step 3), and plating a dielectric film on the obtained product;
5) the film at the edge of the plated rubber part falls off by soaking a stripping liquid to obtain a semi-finished product;
6) coating the whole surface of the semi-finished product with glue;
7) blocking the middle part by using a No. 2 mask plate, and exposing the edge part;
8) after exposure, the photoresist on the edge and the side is dissolved by using a developing solution;
9) drying the obtained product in the step 8), and plating a metal film on the product;
10) and after the plating is finished, stripping off the metal film with the photoresist as a substrate by using a stripping solution to obtain the optical lens with the metal film at the edge of the intermediate medium film.
In order to better realize the optical film edge metallization treatment process, the following setting modes are adopted: in the step 1) and the step 6), when surface gluing is carried out, a glue homogenizing machine is adopted for gluing, the rotating speed is set to be 2500-3000 r/min (preferably 2500 r/min), and the acceleration is 400-450 r/s 2 (preferably 400 r/s) 2 ) The whirl coating time is 25-30 s (preferably 25-30 s)30s）。
In order to further better realize the optical film edge metallization treatment process, the following setting modes are adopted: during the gluing process in the step 1), the primary optical lens coated with the glue is baked for 25-30S (preferably 30S) by using a constant-temperature oven under the condition of 120-130 ℃ (preferably 120 ℃); and in the gluing process of the step 6), the semi-finished product which is completely glued is baked for 25-30 s (preferably 30 s) by using a constant-temperature oven under the condition of 120-130 ℃ (preferably 120 ℃).
In order to better realize the optical film edge metallization treatment process, the following setting modes are adopted: in the step 2), during exposure, a photoetching machine is used for exposure for 60-90 s (preferably 90 s) under the condition that the energy is 70-80 lm (preferably 80 lm); and during exposure, the glue coating surface is placed on the No. 1 mask plate below.
In order to better realize the optical film edge metallization treatment process, the following setting modes are adopted: in the step 7), during exposure, a photoetching machine is used for exposure for 60-90 s (preferably 90 s) under the condition that the energy is 70-80 lm (preferably 80 ml); and when exposure is carried out, the glue coating surface is placed on the No. 2 mask plate below.
In order to better realize the optical film edge metallization treatment process, the following setting modes are adopted: when the photoresist is dissolved by using the developing solution in the steps 3) and 8), the concentration of the developing solution is 25-50% (preferably 50%), and the developing time is 25-30 s (preferably 30 s).
In order to better realize the optical film edge metallization treatment process, the following setting modes are adopted: the drying step 3) specifically comprises: the centrifuge obtained in the step 3) is used at the rotating speed of 4000-4500 r/min (preferably 4500 r/min) and the acceleration of 400-450 r/s 2 (preferably 400 r/s) 2 ) Centrifuging for 25-30 s (preferably 30 s) under the condition(s).
In order to better realize the optical film edge metallization treatment process, the following arrangement is adoptedThe method comprises the following steps: the drying step 8) specifically comprises: the centrifuge obtained in the step 8) is used at the rotating speed of 4000-4500 r/min (preferably 4500 r/min) and the acceleration of 400-450 r/s 2 (preferably 400 r/s) 2 ) Centrifuging for 25-30 s (preferably 30 s) under the condition(s).
In order to better realize the optical film edge metallization treatment process, the following setting modes are adopted: and (3) when the stripping solution is soaked in the step 5), the temperature is 90-95 ℃ (preferably 90 ℃), and the soaking time is 45-60 min (preferably 60 min), until the stripping solution is completely removed.
In order to better realize the optical film edge metallization treatment process, the following setting modes are adopted: when the stripping liquid is used for stripping in the step 10), the temperature is 90-95 ℃ (preferably 90 ℃), and the soaking time is 20-50min (20 min), until the stripping liquid is completely stripped.
Compared with the prior art, the invention has the following advantages and beneficial effects:
the optical lens of the metal film at the edge of the intermediate dielectric film obtained by the invention does not need soldering flux during welding, eliminates the pollution of the soldering flux on the optical film and can meet the requirement of air tightness even at high temperature.
The invention provides a feasible scheme for plating the dielectric film and the metal film on the same surface, and solves the problems of air release and side wall demoulding of the plated metal film, which can occur in the gluing and plating process.
The optical lens of the metal film at the edge of the intermediate dielectric film can be widely applied to the aspects of infrared detectors, medical endoscopes, vacuum observation windows, infrared imaging systems and the like.
Drawings
FIG. 1 shows a mask No. 1.
Fig. 2 is mask No. 2.
Fig. 3 is an experimental effect display diagram.
Detailed Description
The present invention will be described in further detail with reference to examples, but the embodiments of the present invention are not limited thereto.
To make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention. Thus, the detailed description of the embodiments of the present invention provided below is not intended to limit the scope of the invention as claimed, but is merely representative of selected embodiments of the invention.
In the description of the present invention, it is to be understood that the terms "first", "second" and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise specifically stated or limited, the terms "mounting," "connecting," "disposing," "fixing," and the like are to be understood in a broad sense, and may be, for example, a fixed connection, a detachable connection, or an integral connection, and are not limited to any conventional mechanical connection means such as screwing, interference fitting, riveting, screw-assisted connection, and the like. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
It is worth noting that: in the present application, when it is necessary to apply the known technology or the conventional technology in the field, the applicant may have the case that the known technology or/and the conventional technology is not specifically described in the text, but the technical means is not specifically disclosed in the text, and the present application is considered to be not in compliance with the twenty-sixth clause of the patent law.
Example 1:
the edge metallization treatment process of the optical film comprises the following steps:
1) coating the whole surface of the optical lens primary product with glue;
2) blocking the edge part (namely fixing the optical lens primary product after gluing by using a clamp so that the gluing surface is on the lower mask plate) by using a No. 1 mask plate (as shown in figure 1), and exposing the middle part under a photoetching machine;
3) after exposure, the photoresist of the exposed part is dissolved by soaking a developing solution;
4) drying the dielectric film obtained in the step 3), plating the dielectric film, wherein when the dielectric film is plated, the plating temperature is 110 degrees, and the photoresist is deflated when the plating temperature is lower than 110 degrees;
5) the film at the edge of the plated rubber part falls off by soaking a stripping liquid to obtain a semi-finished product;
6) coating the whole surface of the semi-finished product with glue;
7) blocking the middle part (i.e. fixing the glued optical lens primary product by using a fixture so that the gluing surface is on the lower mask plate) by using a No. 2 mask plate (as shown in figure 2), and exposing the edge part;
8) after exposure, the photoresist on the edge and the side is dissolved by using a developing solution;
9) drying the obtained product in the step 8), and plating a metal film on the product;
10) and after the plating is finished, stripping off the metal film with the photoresist as a substrate by using a stripping solution to obtain the optical lens with the metal film at the edge of the intermediate medium film.
Example 2:
the embodiment is further optimized based on the above embodiment, and the same parts as those in the foregoing technical solution will not be described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: in the step 1) and the step 6), when surface gluing is carried out, a glue homogenizing machine is adopted for gluing, as the faster the speed is, the thinner the film is, the film is easy to crack when the film is coated too thin, the film is difficult to bake when the film is too thick, and the gas is easy to escape when the film is coated, therefore, the rotating speed is set to be 2500-3000 r/min (preferably 2500 r/min), the acceleration is not too fast in the setting aspect of acceleration, samples are easy to fall when the glue is spun too fast, and the acceleration is 400-450 r/s 2 (preferably 400 r/s) 2 ) The spin coating time is 25-30 s (preferably 30 s).
Example 3:
the present embodiment is further optimized based on any of the above embodiments, and the same parts as those in the foregoing technical solutions will not be described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: during the gluing process in the step 1), the primary optical lens coated with the glue is baked for 25-30S (preferably 30S) by using a constant-temperature oven under the condition of 120-130 ℃ (preferably 120 ℃); and in the gluing process of the step 6), the semi-finished product which is completely glued is baked for 25-30 s (preferably 30 s) by using a constant-temperature oven under the condition of 120-130 ℃ (preferably 120 ℃).
Example 4:
the present embodiment is further optimized based on any of the above embodiments, and the same parts as those in the foregoing technical solutions will not be described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: in the step 2), during exposure, a photoetching machine is used for exposure for 60-90 s (preferably 90 s) under the condition that the energy is 70-80 lm (preferably 80 lm); and when exposure is carried out, the glue coating surface is placed on the lower mask plate No. 1, namely, the optical lens primary product which is coated with glue and baked is fixed by the clamp, so that the glue coating surface is exposed on the lower mask plate.
Example 5:
the present embodiment is further optimized based on any of the above embodiments, and the same parts as those in the foregoing technical solutions will not be described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: in the step 7), during exposure, a photoetching machine is used for exposure for 60-90 s (preferably 90 s) under the condition that the energy is 70-80 lm (preferably 80 ml); and when exposure is carried out, the glue coating surface is placed on the lower mask plate No. 2, namely, the semi-finished product which is coated with glue and baked is fixed by the clamp, so that the glue coating surface is exposed on the lower mask plate.
Example 6:
the present embodiment is further optimized based on any of the above embodiments, and the same parts as those in the foregoing technical solutions will not be described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: and in the step 3) and the step 8), when the photoresist is dissolved by using the developing solution, the concentration of the developing solution is 25-50% (preferably 50%), the developing time is 25-30 s (preferably 30 s), and the photoresist is carefully checked until the photoresist is cleaned.
Example 7:
the present embodiment is further optimized based on any of the above embodiments, and the same parts as those in the foregoing technical solutions will not be described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: the drying step 3) specifically comprises: the centrifuge obtained in the step 3) is accelerated at the rotating speed of 4000-4500 r/min (preferably 4500r/min, the faster the sample is, the better the sample is, and the acceleration is 400-450 r/s 2 (preferably 400 r/s) 2 ) Centrifuging for 25-30 s (preferably 30 s) under the condition(s).
Example 8:
the present embodiment is further optimized based on any of the above embodiments, andthe same parts of the technical scheme are not described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: the drying step 8) specifically comprises: the centrifuge obtained in the step 8) is used at the rotating speed of 4000-4500 r/min (preferably 4500 r/min) and the acceleration of 400-450 r/s 2 (preferably 400 r/s) 2 ) Centrifuging for 25-30 s (preferably 30 s) under the condition (1), and cleaning the photoresist on the side wall by using alcohol.
Example 9:
the present embodiment is further optimized based on any of the above embodiments, and the same parts as those in the foregoing technical solutions will not be described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: when the stripping solution is soaked in the step 5), the temperature is 90-95 ℃ (preferably 90 ℃, the higher the stripping solution is without boiling water, the better the stripping solution is), and the soaking time is 45-60 min (preferably 60 min), until the stripping solution is completely removed.
Example 10:
the present embodiment is further optimized based on any of the above embodiments, and the same parts as those in the foregoing technical solutions will not be described herein again, and in order to further better implement the optical film edge metallization processing process of the present invention, the following setting manner is particularly adopted: when the peeling liquid is used for peeling in the step 10), the temperature is 90-95 ℃ (preferably 90 ℃), the soaking time is 20-50min (20 min), and the experimental effect of the obtained product is shown in fig. 3 until the peeling liquid is completely peeled.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way, and all simple modifications and equivalent variations of the above embodiments according to the technical spirit of the present invention are within the scope of the present invention.
Claims (10)
1. The edge metallization treatment process of the optical film is characterized by comprising the following steps: the method comprises the following steps:
1) coating the whole surface of the optical lens primary product with glue;
2) blocking the edge part through a No. 1 mask plate, and exposing the middle part under a photoetching machine;
3) after exposure, the photoresist of the exposed part is dissolved by soaking a developing solution;
4) drying the obtained product in the step 3), and plating a dielectric film on the obtained product;
5) the film at the edge of the plated rubber part falls off by soaking a stripping liquid to obtain a semi-finished product;
6) coating the whole surface of the semi-finished product with glue;
7) blocking the middle part by using a No. 2 mask plate, and exposing the edge part;
8) after exposure, the photoresist on the edge and the side is dissolved by using a developing solution;
9) drying the obtained product in the step 8), and plating a metal film on the product;
10) and after the plating is finished, stripping off the metal film with the photoresist as a substrate by using a stripping solution to obtain the optical lens with the metal film at the edge of the intermediate medium film.
2. The process of claim 1, wherein: when the surface gluing is carried out in the steps 1) and 6), a glue homogenizing machine is adopted for gluing, the rotating speed is set to be 2500r/min, and the acceleration is 400r/s 2 The spin coating time was 30 s.
3. The process of claim 1, wherein: baking the primary optical lens coated with the glue for 30s at 120 ℃ by using a constant-temperature oven during the gluing process in the step 1); and in the step 6), the semi-finished product after glue coating is baked for 30s at 120 ℃ by using a constant-temperature oven during the glue coating process.
4. The process of claim 1, 2 or 3, wherein: in the step 2), during exposure, a photoetching machine is used for exposure for 90s under the condition that the energy is 80 lm; and during exposure, the glue coating surface is placed on the No. 1 mask plate below.
5. The process of claim 1, 2 or 3, wherein: in the step 7), during exposure, a photoetching machine is used for exposure for 90s under the condition that the energy is 80 lm; and when exposing, the glue coating surface is placed on the No. 2 mask plate below.
6. The process of claim 1, 2 or 3, wherein: and in the step 3) and the step 8), when the photoresist is dissolved by using the developing solution, the concentration of the developing solution is 50% and the developing time is 30 s.
7. The process of claim 1, 2 or 3, wherein the step of applying the edge metallization comprises: the drying step 3) specifically comprises: the centrifuge obtained in the step 3) is used at the rotating speed of 4500r/min and the acceleration of 400r/s 2 Was centrifuged for 30s under the conditions of (1).
8. The process of claim 1, 2 or 3, wherein: the drying step 8) specifically comprises: the centrifuge obtained in the step 8) is used at the rotating speed of 4500r/min and the acceleration of 400r/s 2 Was centrifuged for 30s under the conditions of (1).
9. The process of claim 1, 2 or 3, wherein: and (3) when the stripping solution is soaked in the step 5), the temperature is 90 ℃, and the soaking time is 60 min.
10. The process of claim 1, 2 or 3, wherein: when the stripping liquid is used for stripping in the step 10), the temperature is 90 ℃ and the soaking time is 20 min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210262072.8A CN114815003A (en) | 2022-03-17 | 2022-03-17 | Optical film edge metallization treatment process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210262072.8A CN114815003A (en) | 2022-03-17 | 2022-03-17 | Optical film edge metallization treatment process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114815003A true CN114815003A (en) | 2022-07-29 |
Family
ID=82528524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210262072.8A Pending CN114815003A (en) | 2022-03-17 | 2022-03-17 | Optical film edge metallization treatment process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114815003A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115701841A (en) * | 2022-12-09 | 2023-02-14 | 安徽光智科技有限公司 | Optical lens coating method |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3740417A1 (en) * | 1987-11-28 | 1989-06-08 | Winter & Ibe Olympus | Endoscope optics with a distal window held by a bonding compound |
| JPH06201454A (en) * | 1992-12-30 | 1994-07-19 | Horiba Ltd | Infrared detector |
| JP2005228775A (en) * | 2004-02-10 | 2005-08-25 | Nissan Motor Co Ltd | Airtight package for optics |
| CN102731170A (en) * | 2011-04-06 | 2012-10-17 | 苏州鼎旺科技有限公司 | Technology for coating film on surface of ceramic substrate |
| CN103809381A (en) * | 2012-11-15 | 2014-05-21 | 毛华军 | Spinning method |
| CN105543977A (en) * | 2015-12-07 | 2016-05-04 | 天津中环半导体股份有限公司 | Automatic silicon chip spin coater |
| CN107731904A (en) * | 2017-10-11 | 2018-02-23 | 成都海威华芯科技有限公司 | A kind of wafer dorsal pore photoresist fill method |
| CN109371362A (en) * | 2018-12-19 | 2019-02-22 | 武汉正源高理光学有限公司 | Filter plate multizone film plating process and its application |
| CN110320855A (en) * | 2019-08-02 | 2019-10-11 | 吉林华微电子股份有限公司 | Sol evenning machine control device and method |
| CN111522208A (en) * | 2020-05-06 | 2020-08-11 | 南京南大光电工程研究院有限公司 | Method for stripping metal film by using positive photoresist as mask |
| CN111983894A (en) * | 2020-08-28 | 2020-11-24 | 中国科学院微电子研究所 | Gluing method |
-
2022
- 2022-03-17 CN CN202210262072.8A patent/CN114815003A/en active Pending
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3740417A1 (en) * | 1987-11-28 | 1989-06-08 | Winter & Ibe Olympus | Endoscope optics with a distal window held by a bonding compound |
| JPH06201454A (en) * | 1992-12-30 | 1994-07-19 | Horiba Ltd | Infrared detector |
| JP2005228775A (en) * | 2004-02-10 | 2005-08-25 | Nissan Motor Co Ltd | Airtight package for optics |
| CN102731170A (en) * | 2011-04-06 | 2012-10-17 | 苏州鼎旺科技有限公司 | Technology for coating film on surface of ceramic substrate |
| CN103809381A (en) * | 2012-11-15 | 2014-05-21 | 毛华军 | Spinning method |
| CN105543977A (en) * | 2015-12-07 | 2016-05-04 | 天津中环半导体股份有限公司 | Automatic silicon chip spin coater |
| CN107731904A (en) * | 2017-10-11 | 2018-02-23 | 成都海威华芯科技有限公司 | A kind of wafer dorsal pore photoresist fill method |
| CN109371362A (en) * | 2018-12-19 | 2019-02-22 | 武汉正源高理光学有限公司 | Filter plate multizone film plating process and its application |
| CN110320855A (en) * | 2019-08-02 | 2019-10-11 | 吉林华微电子股份有限公司 | Sol evenning machine control device and method |
| CN111522208A (en) * | 2020-05-06 | 2020-08-11 | 南京南大光电工程研究院有限公司 | Method for stripping metal film by using positive photoresist as mask |
| CN111983894A (en) * | 2020-08-28 | 2020-11-24 | 中国科学院微电子研究所 | Gluing method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115701841A (en) * | 2022-12-09 | 2023-02-14 | 安徽光智科技有限公司 | Optical lens coating method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN114815003A (en) | Optical film edge metallization treatment process | |
| JPS5993448A (en) | Anti-reflection coating | |
| JPH07168345A (en) | Pellicle for lithography | |
| JPH03502255A (en) | Use of specific mixtures of ethyl lactate and methyl ethyl ketone to remove unwanted peripheral material (e.g. edge beads) from photoresist coated substrates | |
| JP2975766B2 (en) | Method for manufacturing flexible thin film solar cell | |
| JPH01130535A (en) | Formation of silicone coating | |
| CN110187417B (en) | Method for manufacturing PDMS film micro-lens array | |
| US4384919A (en) | Method of making x-ray masks | |
| CN110161803A (en) | Improve the photolithography method of photoresist and substrate adhesiveness | |
| US5716763A (en) | Liquid immersion heating process for substrate temperature uniformity | |
| US4975347A (en) | Method for manufacturing heat-stable structured layers from photopolymers which are addition reaction products of olefinic unsaturated monoisocyanates and phenol-formaldehyde resins | |
| WO2019112141A1 (en) | Thin film electrode separation method using thermal expansion coefficient | |
| JPS60192951A (en) | Production of electrophotographic sensitive body | |
| WO2021000851A1 (en) | Method for preparing patterned polymer | |
| CN108193171A (en) | The manufacturing method of the optically isolated structure of multichannel integrated optical filter | |
| JPS60194459A (en) | Production of electrophotographic photosensitive body | |
| RU2195047C2 (en) | Photoresist mask generation process | |
| CN109750253B (en) | Preparation method of tilting structure | |
| JP2646205B2 (en) | Method of forming photosensitive resin layer | |
| JPS6292321A (en) | Mask employing polyimide supporting patterned x-ray non-transmitting layer | |
| JPH117138A (en) | Production of semiconductor element | |
| JPS59210404A (en) | Manufacture of color filter | |
| CA1141274A (en) | Method of making x-ray masks | |
| JPH06242613A (en) | Formation of polyimide pattern | |
| JPH0836258A (en) | Photosensitive element, its laminating method and resist forming method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |