CN114807849A - Nano composite high-entropy nitride coating and composite deposition method thereof - Google Patents
Nano composite high-entropy nitride coating and composite deposition method thereof Download PDFInfo
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Abstract
The invention relates to the technical field of surface coatings, in particular to the technical field of surface wear-resistant antifriction protective coating materials, and particularly relates to a nano composite high-entropy nitride coating and a composite deposition method thereof. The invention discloses a nano composite high-entropy nitride coating, which is a composite structure of amorphous SiNx wrapped high-entropy (TiAlCrNbV) N nanocrystals; the molecular formula of the nano composite high-entropy nitride coating is Ti a Al b Cr c Nb d V e Si f N, the nano composite high-entropy nitride hard coating adoptsDepositing the pulse arc and the direct current magnetron sputtering Si target on the surface of the substrate. The nano composite high-entropy nitride coating adopts a composite structure of amorphous-coated high-entropy nanocrystalline, has high-temperature mechanical property, high film-substrate binding force, excellent thermal stability, high-temperature oxidation resistance and high-temperature wear-resistant antifriction property, and can be applied to high-speed cutting processing of metal parts.
Description
Technical Field
The invention relates to the technical field of surface coatings, in particular to the technical field of surface wear-resistant antifriction protective coating materials, and particularly relates to a nano composite high-entropy nitride coating and a composite deposition method thereof.
Background
Along with the development of alloys in industry, more and more difficult-to-machine materials are applied to key parts, and the traditional cutting tool can cause local excessive high temperature when cutting the difficult-to-machine materials at a high speed, so that the high-temperature oxidation, bonding and diffusion wear coupling of a cutter coating are caused, the cutter is worn, and the popularization and development of the difficult-to-machine materials are influenced. Therefore, the high-speed cutting of the difficult-to-machine material is to improve the thermal stability, hardness and wear resistance of the cutter coating in a high-temperature environment.
Among the existing cutter coating layers, TiAlN is one of the most widely used cutter coating materials at present. However, the TiAlN coating can be thermally decomposed into a hexagonal AlN soft phase at high temperature, so that the mechanical property of the TiAlN soft phase is reduced; and the friction coefficient is larger at high temperature, which causes large cutting force and serious heat generation in the high-speed cutting process. The improvement of the performance of the coating by alloying elements is one of the main means for modifying the TiAlN coating. Research shows that the addition of Cr alloy element can promote the generation of (Al, Cr) on the surface of the coating 2 O 3 The oxidation layer is used for improving the high-temperature oxidation resistance of the TiAlN coating; the addition of Nb alloy elements can improve the thermal decomposition starting temperature of the TiAlN coating; the active element V of the magneli oxide lubricating phase is added, which is beneficial to reducing the friction coefficient of the TiAlN coating and improving the high-temperature tribological performance of the coating.
In order to promote the further development of high-speed cutting, researches show that the comprehensive performance of the TiAlN coating can be improved through multi-component alloying. The concept of high entropy derives from alloy materials, which generally refer to solid solution alloys comprising 5 or more than 5 elemental constituents in equal or near equal atomic ratios. The high-entropy alloying material has four main effects: namely high entropy effect, delayed diffusion effect, lattice distortion effect and cocktail effect. The high-entropy alloyed solid solution structure enables the high-entropy coating to easily achieve the purpose of regulating and controlling the performance through the change of chemical components, and can combine the respective advantages of different components to obtain excellent comprehensive performance.
At present, a novel coating coupling high-entropy nitride and a nano composite structure is one of research hotspots in the field of cutter surface protection. Nonmetal Si elements are added into the high-entropy coating, and a nano composite structure with amorphous SiNx interface phase wrapped with nano crystals can be formed through thermodynamic phase separation. The Hall-Petch effect initiated by the nanocrystalline can enhance the hardness, the amorphous phase has high structural elasticity, and the two-phase interface has high cohesive energy, so that the high-entropy coating has the advantages of high hardness, high oxidation resistance, excellent thermal stability and the like. The high entropy effect and the nano composite structure are beneficial to improving the mechanical property, oxidation resistance and wear resistance of the metal coating. However, the nano composite structure of the high-entropy nitride coating is built by adding the Si element, so that the high-entropy coating has high mixed entropy, the silicon element is easier to enter nitride crystal lattices to form a solid solution, and the phase separation difficulty is high; in addition, the existing preparation method of the silicon-containing high-entropy nitride coating adopts a single deposition power supply technology, such as arc ion plating, magnetron sputtering and the like, the ionization rate of deposited particles is low, the energy window is narrow, and a nano composite structure with a sharp two-phase interface cannot be obtained.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide a nano composite high-entropy nitride coating and a composite deposition method thereof. The nano composite high-entropy nitride coating adopts a composite structure of amorphous-coated high-entropy nano crystals, has high-temperature mechanical property, high film-substrate binding force, excellent thermal stability, high-temperature oxidation resistance and high-temperature wear-resistant antifriction property, and can be applied to high-speed cutting processing of metal parts.
The above object of the present invention is achieved by the following technical solutions:
the invention provides a nano composite high-entropy nitride coating, which is a composite structure of amorphous SiNx wrapped high-entropy (TiAlCrNbV) N nanocrystals; the sodiumThe molecular formula of the rice composite high-entropy nitride coating is Ti a Al b Cr c Nb d V e Si f N, wherein the atomic percentage content is as follows: 0.07<a<0.25、0.15<b<0.45、0.08<c<0.35、0.08<d<0.25、0.08<e<0.25、0.01<f<0.20, and satisfies a + b + c + d + e + f ═ 1.
Preferably, in the high entropy (TiAlCrNbV) N nanocrystal, Al, Cr, Nb, and V are present in the TiN nanocrystal in solid solution.
The invention also provides a composite deposition method of the nano composite high-entropy nitride coating, which comprises the following steps:
s1, putting the pretreated base material into a PVD vacuum chamber, and vacuumizing to 1-3 x 10 -3 Pa, setting the temperature to be 400-600 ℃;
s2, introducing Ar gas, adjusting the air pressure and bias voltage of the vacuum chamber, opening the Cr target arc cathode, and carrying out etching pretreatment on the substrate by adopting Cr ions;
s3, closing Ar gas, and introducing N 2 Gas, regulating the gas pressure and bias voltage, and depositing a CrN transition layer on the substrate by using a Cr target arc;
s4, closing the arc Cr target, and introducing Ar and N 2 Mixing the gases, adjusting the total pressure, partial pressure of nitrogen and bias voltage, and opening the pulsed arc Ti a Al b Cr c Nb d V e And (3) target and magnetron sputtering Si target, and regulating the current of the pulse arc target and the power of the magnetron sputtering target to deposit the nano composite high-entropy nitride hard coating on the substrate.
Preferably, the matrix material is cemented carbide or Polycrystalline Cubic Boron Nitride (PCBN) material.
Preferably, the pretreatment is to polish the substrate, then ultrasonically clean the substrate by using a metal ion cleaning solution and absolute ethyl alcohol respectively, and blow-dry the substrate by using compressed nitrogen. Further, the polishing treatment is to polish with different mesh number of sand paper, and finally polish with polishing cloth and adding polishing paste to a mirror surface.
Preferably, in step S2, the pressure is 2-4 Pa, the bias voltage is-800V-1000V, the etching time is 5-20 min, and the Cr target current is 60-150A. Further, the air pressure is 2Pa, the bias voltage is-800V, the etching time is 15min, and the current of the Cr target is 80A.
Preferably, in step S3, N 2 The flow rate of the gas is 200-300 sccm, the gas pressure is 1-3 Pa, the bias voltage is-50 to-200V, the Cr target current is 60-150A, and the deposition time is 5-20 min. Further, the air pressure is 3Pa, the bias voltage is-100V, the deposition time is 10min, and the current of the Cr target is 80A.
Preferably, in step S4, the total gas pressure of the mixed gas is 0.5 to 2.0Pa, the partial pressure ratio of nitrogen in the mixed gas is 40 to 80%, the bias voltage is-60 to-150V, the target current of the pulse arc target is 60 to 150A, the power of the magnetron sputtering target is 2 to 10Kw, and the deposition time is 1 to 4 hours. Further, the total gas pressure of the mixed gas is 0.7Pa, the partial pressure ratio of the nitrogen in the mixed gas is 60%, the bias voltage is-100V, the target current of the pulse arc target is 80A, the power of the magnetron sputtering target is 3-6 Kw, and the deposition time is 1 hour.
Compared with the prior art, the invention has the beneficial effects that:
1. the invention provides a nano composite high-entropy nitride coating and a composite deposition method thereof, which adopt a pulse arc and a direct current magnetron sputtering Si target, and regulate and control the valence state and the energy density of plasma elements of each element in the deposition process, so that the coating has a good composite structure of a nano crystal/amorphous interface layer, and the technical problems that the high-entropy nitride coating is easy to dissolve and separate and the traditional single deposition power supply cannot effectively prepare the nano composite structure high-entropy nitride coating are solved.
2. The (TiAlCrNbVSi) N high-entropy nitride coating is of an amorphous SiNx wrapped high-entropy nanocrystalline (TiAlCrNbV) N composite structure, has a nano composite structure and belongs to the field of high-entropy coatings, and the performance of the coating can have the performance advantages of the nano composite structure and high entropy. By adding Si element, a ((TiAlCrNbV) N/Si nano composite structure is formed, the grain size of the coating is refined, the displacement of randomly oriented (Ti, Al, Cr, Ta, W) N grains can be accommodated, and the dislocation movement can be prevented, so that the density and the high-temperature hardness of the coating are improved.
Drawings
FIG. 1 is a schematic diagram of a nano-composite structure of a TiAlCrNbVSiN high-entropy nitride coating and a preparation method thereof;
FIG. 2 is an X-ray diffraction pattern of coatings of examples 1, 2 and comparative example 2 of the present invention;
FIG. 3 is a cross-sectional profile of the coatings of examples 1, 2 and comparative example 2 of the present invention;
FIG. 4 is a transmission electron microscopy micrograph of a cross section of a coating of example 1 and comparative example 2 of the present invention;
FIG. 5 is a table cross-sectional profile of the coatings of example 1 and comparative example 2 of the present invention after 800 degree oxidation for 2 h;
FIG. 6 shows the scratch results of the coatings of example 1 of the present invention and comparative examples 1 and 2;
FIG. 7 shows nanoindentation hardness after high temperature annealing in the as-deposited state of the coatings of example 1 and comparative examples 1 and 2 of the present invention;
FIG. 8 shows the normal and high temperature wear rates of the coatings of example 1 of the present invention and comparative examples 1 and 2.
Detailed Description
The following further describes the embodiments of the present invention. It should be noted that the description of the embodiments is provided to help understanding of the present invention, but the present invention is not limited thereto. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
The experimental procedures in the following examples were carried out by conventional methods unless otherwise specified, and the test materials used in the following examples were commercially available by conventional methods unless otherwise specified.
Example 1 Ti 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 Preparation of N coatings
TiAlCrNbVSiN high entropy nitride coating (Ti) 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 N) and the preparation method are shown in fig. 1, and the cemented carbide substrate used in this example comprises the following components: WC-8 wt.%, Co-4 wt.%, and TiC-88 wt.%.
The preparation method comprises the following steps:
(1) pretreatment of the hard alloy substrate: polishing the hard alloy matrix by using 800-mesh, 1000-mesh and 1500-mesh abrasive paper, adding polishing paste into polishing cloth to polish the hard alloy matrix to a mirror surface, ultrasonically cleaning the hard alloy matrix by using metal ion cleaning liquid and absolute ethyl alcohol for 30min, drying the hard alloy matrix by using compressed nitrogen, and then loading the hard alloy matrix on a PVD vacuum chamber rotating frame disc;
(2) vacuumizing the chamber to the vacuum degree of below 1 multiplied by 10 < -3 > Pa, starting a heater to raise the temperature to 500 ℃, revolving the sample rotating frame disc at the rotating speed of 4rpm, opening an argon valve, adjusting the pressure of the cavity to be 2Pa, setting the temperature to be 450 ℃, setting the bias voltage to be-800V, then opening a Cr target to perform metal ion etching pretreatment on the substrate, setting the current of the Cr target to be 80A, and setting the etching time to be 15 min;
(3) opening a nitrogen valve, adjusting the flow of nitrogen to 300sccm, closing the argon valve, controlling the total pressure of the chamber to be 3Pa, setting the bias voltage to be-100V, setting the Cr target current to be 80A, and depositing a CrN transition layer for 10 min;
(4) the Cr target power supply is turned off, and N is introduced 2 Mixed with Ar gas, the total pressure is set to 0.7Pa, N 2 The ratio of the gas pressure of (2) is 60% of the total gas pressure of the mixed gas while the pulsed arc Ti is turned on 12.5 Al 0.5 Cr 12.5 Nb 12.5 V 12.5 The target and the magnetron sputtering pure Si target, the current of the pulse arc target is set to be 80A, the power of the magnetron target is set to be 3Kw, the bias voltage is set to be-100V, and the deposition time is 1 h;
(5) and after the film coating is finished, opening the vacuum chamber to take out the substrate when the temperature of the vacuum chamber is reduced to room temperature. Preparing Ti on the surface of a hard alloy substrate 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 And (3) N hard coating.
Example 2 Ti 0.08 Al 0.30 C r0.27 Nb 0.10 V 0.10 Si 0.15 Preparation of N coatings
The preparation method is the same as that of the embodiment 1, and is different from the embodiment 1 in that: the power of the direct current magnetron sputtering Si target material is 6Kw, and the prepared coating is Ti 0.08 Al 0.30 C r0.27 Nb 0.10 V 0.10 Si 0.15 And N hard coating.
Comparative example 1 Ti 0.5 Al 0.5 Preparation of N coatings
The preparation method is the same as that of the example 1, and is different from the example 1 in that: the pulse arc target is Ti 0.5 Al 0.5 Target, pure Si target without magnetron sputtering, coating prepared by Ti 0.5 Al 0.5 And N hard coating.
Comparative example 2 Ti 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 Preparation of N coatings
The preparation method is the same as that of the example 1, and is different from the example 1 in that: the pulse arc target is Ti 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 Target, pure Si target without magnetron sputtering, coating prepared by Ti 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 And N hard coating.
The phase structure of the coatings of examples 1 and 2 and comparative example 2 was analyzed by using an X-ray diffractometer (CuK alpha ray source) of Bruker D8 ADVANCE, respectively, and the spectra are shown in FIG. 2, wherein Ti is used as the Ti 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 The crystallinity of the N-element high-entropy coating is good, an FCC (111) diffraction peak is observed, and the coating has a simple face-centered cubic (FCC) structure, which shows that the high-entropy effect enables the multi-element alloying coating to easily form a single solid solution phase. After Si is added, the broadening degree of an X-ray diffraction band is increased, the peak intensity is reduced, and the coating crystal grains are refined to form nano crystals; and as the Si content increases, the smaller the crystal grain of the crystal, the greater the degree of broadening of the X-ray diffraction band. No silicon appeared in XRD spectrogramCompound of (e.g. Si) 3 N 4 And SiO 2 ) Diffraction peaks show that the existence mode of Si is mainly amorphous, namely a nano composite two-phase structure of nano crystal and amorphous SiNx is formed.
The cross-sections of the coatings of examples 1 and 2 according to the invention and comparative example 2 were observed and analyzed using a scanning electron microscope (FEI Nova Nano SEM 430) with a scanning pattern as shown in FIG. 3, Ti 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 The N coating shows a thicker columnar crystal morphology, the crystal grains are larger, and after the Si is doped, Ti 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 N coating and Ti 0.08 Al 0.30 C r0.27 Nb 0.10 V 0.10 Si 0.15 The N coating shows a nano composite equiaxed crystal growth structure, and has a compact structure and good mechanical properties.
The microscopic morphology of the coating was examined using a FEI Talos F200S field emission transmission electron microscope (FEI Talos F200) from FEI of the Netherlands for the coating sections of example 1 and comparative example 2 of the present invention, and the results are shown in FIG. 4, where Ti is 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 The N coating has a coarse columnar crystal morphology, which indicates that the coating has good crystallinity. Ti 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 The N coating forms a nano composite structure with sharp two-phase interface and amorphous SiNx wrapped high-entropy nano crystals.
The coatings of example 1 and comparative example 2 of the present invention were subjected to high temperature oxidation at 800 ℃ for 2 hours, and the oxidation surface cross-sectional morphology of the coatings was observed and analyzed using a scanning electron microscope (FEI Nova Nano SEM 430), and the results are shown in FIG. 5, in which Ti is present 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 A significant oxide layer is formed on the surface of the N coating, and Ti doped with Si 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.1 0 Si 0.06 The thickness of an oxide layer of the N coating is small, the structure is more compact, and the fact that the amorphous SiNx wraps the high-entropy nanocrystalline composite structure effectively improves the compactness of the oxide layer and prevents oxygen internal diffusion and metal external diffusion in the oxidation processThe powder effectively improves the high-temperature oxidation resistance of the coating.
The coatings of example 1, comparative example 1 and comparative example 2 of the present invention were tested for film-based adhesion by scratch method, and the scratch data of each coating is shown in FIG. 6, where Ti 50 Al 50 The film-base binding force of the N coating is only 81.2N, Ti 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 The N-coating has a film-based bonding force of 88.3N, and Ti 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 The film-substrate binding force of the N coating is 93.1N, which shows that the nano composite structure and the high-entropy coating are beneficial to prolonging the service life of the coating.
The coatings of the embodiment 1, the comparative example 1 and the comparative example 2 of the invention are respectively subjected to vacuum heat treatment experiments by a high-temperature vacuum annealing furnace, the heat treatment temperatures are respectively 800 ℃, 900 ℃, 1000 ℃ and 1100 ℃, the heating rate is 10 ℃/min, the heat preservation time is 60min, a furnace cooling mode is adopted, the hardness of an annealed sample is represented by a nanoindentation instrument in a constant load mode, and fig. 7 is a data graph of nanoindentation hardness of the coatings after annealing at different temperatures. Ti 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 The hardness of the N coating is higher than that of the traditional Ti coating at normal temperature in a deposition state 50 Al 50 N coating and high entropy Ti 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 The N coating is high. Ti 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 The hardness of the N coating after four high-temperature annealing is superior to that of the traditional Ti 50 Al 50 N coating and high entropy Ti 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 And (4) coating N. Ti 0.09 Al 0.33 Cr 0.30 Nb 0.1 2 V 0.10 Si 0.06 The N coating has a deposition hardness value of 37GPa, and can still maintain a hardness value of 34GPa when the temperature reaches 1000 ℃, while Ti 50 Al 50 N generates softening phenomenon at high temperature, the hardness is obviously reduced, and the nano composite high-entropy Ti can be known through comparison 0.09 Al 0.33 Cr 0.30 Nb 0.1 2 V 0.10 Si 0.06 The N coating has higher thermal stability and high-temperature mechanical property, and is of great help to improve the high-speed cutting processing and dry cutting processing performance of the cutting tool.
The coatings of example 1, comparative example 1 and comparative example 2 of the invention were subjected to frictional wear test using a CSM THT1000 type ball-disk high temperature frictional wear machine, respectively, using Al of 6mm in diameter 2 O 3 The ball is used as a counter-grinding material, and the test parameters are as follows: the load was 5N, the friction radius was 2mm, the linear velocity was 10cm/s, and the number of friction turns was 15000 turns. The normal and high temperature wear rates of the respective coatings are shown in FIG. 8, compared to Ti 0.10 Al 0.30 Cr 0.33 Nb 0.14 V 0.13 N coating and Ti 50 Al 50 N coating, nano composite high entropy Ti 0.09 Al 0.33 Cr 0.30 Nb 0.12 V 0.10 Si 0.06 The N coating shows lower wear rate under the conditions of high temperature and normal temperature, can effectively reduce friction, avoid the surface of a coated cutter from generating severe friction with chips and a processed material, and reduce local cutting temperature.
The embodiments of the present invention have been described in detail, but the present invention is not limited to the described embodiments. It will be apparent to those skilled in the art that various changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, and the scope of protection is still within the scope of the invention.
Claims (8)
1. A nano composite high-entropy nitride coating is characterized in that the nano composite high-entropy nitride coating is a composite structure of amorphous SiNx wrapped high-entropy (TiAlCrNbV) N nanocrystals; the molecular formula of the nano composite high-entropy nitride coating is Ti a Al b Cr c Nb d V e Si f N, wherein the atomic percentage content is as follows: 0.07<a<0.25、0.15<b<0.45、0.08<c<0.35、0.08<d<0.25、0.08<e<0.25、0.01<f<0.20, and satisfies a + b + c + d + e + f ═ 1.
2. A nanocomposite high entropy nitride coating according to claim 1, characterized in that in the high entropy (TiAlCrNbV) N nanocrystals, Al, Cr, Nb and V are present in TiN nanocrystals in solid solution.
3. A nanocomposite high entropy nitride coating according to claim 1 or 2, characterized in that the composite deposition method of the nanocomposite high entropy nitride coating comprises the following steps:
s1, putting the pretreated base material into a PVD vacuum chamber, and vacuumizing to 1-3 x 10 -3 Pa, setting the temperature to be 400-600 ℃;
s2, introducing Ar gas, adjusting the air pressure and bias voltage of the vacuum chamber, opening the Cr target arc cathode, and carrying out etching pretreatment on the substrate by adopting Cr ions;
s3, closing Ar gas, and introducing N 2 Gas, adjusting the gas pressure and bias voltage, and depositing a CrN transition layer on the substrate by using a Cr target arc;
s4, closing the arc Cr target, and introducing Ar and N 2 Mixing the gases, adjusting the total pressure, partial pressure of nitrogen and bias voltage, and opening the pulsed arc Ti a Al b Cr c Nb d V e And (3) target and magnetron sputtering Si target, and regulating the current of the pulse arc target and the power of the magnetron sputtering target to deposit the nano composite high-entropy nitride hard coating on the substrate.
4. A nanocomposite high entropy nitride coating in accordance with claim 3, wherein the base material is cemented carbide or polycrystalline cubic boron nitride material.
5. The nano-composite high-entropy nitride coating layer according to claim 3, wherein the pretreatment is to polish the substrate, then ultrasonically clean the substrate with a metal ion cleaning solution and absolute ethyl alcohol respectively, and blow-dry the substrate.
6. The composite deposition method of a nano-composite high-entropy nitride coating layer according to claim 3, wherein in step S2, the air pressure is 2-4 Pa, the bias voltage is-800V to-1000V, the etching time is 5-20 min, and the current of the Cr target is 60-150A.
7. A nano-composite high-entropy nitride coating according to claim 3, wherein, in step S3, N is 2 The flow rate of the introduced gas is 200-300 sccm, the gas pressure is 1-3 Pa, the bias voltage is-50 to-200V, the current of the Cr target material is 60-150A, and the deposition time is 5-20 min.
8. The nanocomposite high-entropy nitride coating according to claim 3, wherein in step S4, the total gas pressure of the mixed gas is 0.5 to 2.0Pa, the partial pressure ratio of the nitrogen gas in the mixed gas is 40 to 80%, the bias voltage is-60 to-150V, the target current of the pulsed arc target is 60 to 150A, the power of the magnetron sputtering target is 2 to 10Kw, and the deposition time is 1 to 4 hours.
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| CN116178030A (en) * | 2022-12-16 | 2023-05-30 | 广东工业大学 | Silicon nitride ceramic containing high-entropy nitride and preparation method and application thereof |
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