CN114774920A

CN114774920A - Processing technology for ensuring etching speed

Info

Publication number: CN114774920A
Application number: CN202210377701.1A
Authority: CN
Inventors: 任忠平; 尹国钦; 陈绍文
Original assignee: Ningbo Fuji New Materials Co ltd
Current assignee: Ningbo Fuji New Materials Co ltd
Priority date: 2022-04-12
Filing date: 2022-04-12
Publication date: 2022-07-22
Anticipated expiration: 2042-04-12
Also published as: CN114774920B

Abstract

The invention relates to a processing technology for ensuring etching speed, which comprises an etching base, an etching groove and an electric cabinet, wherein the etching groove is arranged on the etching base, a sliding rail is arranged above the etching groove, a movable manipulator is arranged on the sliding rail, a clamping platform is arranged at the lower end of the movable manipulator, an induction bracket is arranged at the left side of a groove body of the etching groove, a baume densimeter which slides up and down is vertically arranged in the induction bracket, a sleeve pipe bracket which slides relative to the induction bracket is sleeved on the baume densimeter, a first liquid storage tank and a second liquid storage tank are arranged at the lower part of the etching groove, and a micro-pump bracket is vertically arranged on each of the first liquid storage tank and the second liquid storage tank. The invention has the characteristics of improving the production efficiency, saving the labor cost, ensuring the victory of workers and the etching tank through full-automatic production, protecting the health of the workers and the like.

Description

Processing technology for ensuring etching speed

Technical Field

The invention relates to the technical field of etching, in particular to a processing technology for ensuring etching speed.

Background

In the conventional etching process, the etching solution is directly poured into the etching tank, and then a worker puts a product into the tank body for etching once, so that the process has the advantages of long consumed time, high labor cost, low production efficiency and easiness in causing physical injury to the worker.

Disclosure of Invention

The invention aims to solve the technical problem of providing a processing technology for ensuring the etching speed, and the processing technology has the characteristics of improving the production efficiency, saving the labor cost, ensuring the victory of workers and an etching pool through full-automatic production, protecting the health of the workers and the like.

The technical scheme adopted by the invention for solving the technical problem is as follows: the utility model provides a ensure processing technology of etching speed, includes full-automatic etching device, full-automatic etching device includes etching base, etching groove and electric cabinet, etching base on install the etching groove, etching groove top be provided with the slip track, install the removal manipulator on the slip track, the centre gripping platform is installed to removal manipulator lower extreme, the cell body left side of etching groove install the response support, vertically install gliding baume gravimeter from top to bottom in the response support, the baume gravimeter on cup jointed with the sleeve pipe support of responding to the support relative slip, etching groove lower part be provided with first liquid reserve tank and second liquid reserve tank, first liquid reserve tank and second liquid reserve tank are all vertically installed the micropump support, the micropump support on install the micropump, the import pipeline of micropump link to each other with first liquid reserve tank, the outlet pipeline of micropump support extends to in the etching groove, an electric cabinet is arranged on the front side of the etching bath, the electric cabinet controls the micro pump to be started and closed according to the detection data of the baume densitometer, and a PH value detector is arranged in the etching bath and connected with the electric cabinet.

The process comprises the following specific steps: the method comprises the following steps: selecting optimal data for improving the etching speed to the maximum extent as theoretical parameters according to all reference parameters in the original process, inputting the theoretical parameters into a data input panel, and storing the theoretical parameters in a control panel, wherein the data comprises a ferrous chloride concentration parameter, a pH value and a temperature; step two: pouring the prepared etching solution into an etching tank, and then carrying out etching operation on the product through an automatic manipulator; step three: the baume densimeter, the temperature sensor and the PH value detector are used for monitoring the etching solution in the etching tank in real time, transmitting the measured data to the control panel, and comparing the measured data with theoretical parameters through the control panel; step four: the control panel controls the ammonia chloride transfusion arm and the hydrochloric acid transfusion arm, thereby ensuring that the concentration parameter, the PH value and the temperature of the ferrous chloride are in a constant state.

In order to ensure the normal operation of the automatic etching device, ferrous chloride needs to be continuously supplemented, and in order to solve the problem, a structure capable of sensing the concentration of the ferrous chloride in the etching solution needs to be designed, and meanwhile, the chloride ion concentration of the etching solution needs to be continuously supplemented through an automatic control system.

Move the manipulator through setting up among this technical scheme, a full automatic transportation for realizing the metal sheet, simultaneously be used for testing the concentration of the ferrous chloride in the etching groove through setting up baume hydrometer, data through detecting, come to contrast with the parameter of record in the electric cabinet, realize opening of micropump through the contrast and stop, the micropump is carried the ammonium chloride toward the etching inslot, the ammonium chloride can restore the ferrous chloride with the ferric trichloride, be provided with the inductor in the response support, the inductor is connected with the electric cabinet, install bushing bracket on the baume hydrometer, be provided with a plurality of induction nodes on the bushing bracket, when the baume hydrometer rises and descends, bushing bracket's induction node and inductor produce contact signal, the signal can judge the ferrous chloride's of etching solution concentration.

As a supplement to the technical scheme, both ends of the upper part of the etching bath are provided with mounting panels, a compression pump assembly is mounted on the mounting panels, and an infusion arm extending into the etching bath is mounted at the output end of the compression pump assembly.

Through setting up compression pump assembly, make the outside air constantly to the etching solution operation of rolling for the etching solution turns in the etch bath, and the in-process that turns, the etching solution can be clear away the etching corruption bits on the metal sheet, improves the process velocity of metal sheet.

As a supplement to the technical scheme, the infusion arm comprises a liquid collecting part, an extension arm and a diffusion head, wherein the lower end of the liquid collecting part is provided with the L-shaped extension arm, and the tail end of the extension arm is provided with the diffusion head.

Concentrate supplementary liquid and air through the arm of infusing, supplementary liquid carries out middle storage in album liquid portion, later extrude liquid to whole etching tank in through gas, this operation can accelerate the diffusion of supplementary liquid greatly to make the quick reduction of ferric chloride be the ferrous chloride.

As a supplement to this technical scheme, collection liquid portion in be provided with the stock solution chamber, the lateral part in stock solution chamber be provided with the liquid inlet joint with the export butt joint of micropump, stock solution chamber upper end be provided with the air inlet joint with the gas outlet butt joint of compression pump subassembly, the extension arm in be provided with the conveyer pipe, conveyer pipe one end is connected with the liquid outlet of stock solution chamber lower extreme, the other end docks with the overhead case of diffusion.

As a supplement to the technical scheme, the movable manipulator is internally provided with a downward moving cylinder with a vertically downward main shaft, a clamping bottom plate which is horizontally arranged is installed on the main shaft of the downward moving cylinder, and a plurality of clamping cylinders which are longitudinally arranged are installed on the lower end face of the clamping bottom plate side by side.

As a supplement to the technical scheme, a clamping shaft of the clamping cylinder is provided with a clamping block which faces downwards vertically, the outer side of the lower end of the clamping block is of a vamp structure, and the inner side of the lower end of the clamping block is provided with a clamping groove.

As a supplement to the technical scheme, a circle of temperature sensor is arranged in the middle of the outer ring of the etching bath, the temperature sensor comprises two butted shells, a temperature sensor is arranged between the shells, a plurality of sensing nodes inserted into the etching bath are arranged on the temperature sensor, and the temperature sensor is butted with an electric cabinet.

In order to ensure the reaction speed of the etching solution, the temperature of the etching solution is required to be ensured within a reasonable range, so that the etching solution is required to be ensured to be in a constant temperature state by designing a temperature control system, the temperatures of different areas of the etching solution are tested by setting a plurality of sensing nodes in the temperature control system, temperature parameters are subjected to centralized statistics, the temperature of the etching solution is ensured, and meanwhile, the electric cabinet is used for judging whether the etching solution needs to be heated or not through a control system in the electric cabinet.

As a supplement to the technical scheme, a heating sheet is arranged in the bottom of the etching tank, and a plurality of heating wires extending to the bottom surface of the tank body of the etching tank are arranged on the heating sheet.

The heating sheet is provided with a plurality of vertical heating wires which are in a burr shape, the structure can reduce the heating area, and the temperature of a contact part with etching liquid can not be too high during heating.

As a supplement to the technical scheme, the first liquid storage tank and the second liquid storage tank are arranged in a staggered mode from front to back, the two infusion arms are also arranged in a staggered mode, when the lower end of the movable manipulator extends into the etching tank, the lower end of the movable manipulator cannot interfere with the two infusion arms, and the first liquid storage tank and the second liquid storage tank respectively store ammonia chloride and hydrochloric acid.

Has the advantages that: the invention relates to a processing technology for ensuring etching speed, which is characterized in that a mobile manipulator is arranged for realizing full-automatic transportation of a metal plate, a baume densitometer is arranged for testing the concentration of ferrous chloride in an etching tank, the detected data is compared with parameters recorded in an electric cabinet, the start and stop of a micropump are realized through comparison, the micropump conveys ammonium chloride into the etching tank, the ammonium chloride can reduce ferric chloride back to the ferrous chloride, an inductor is arranged in an induction bracket and is connected with the electric cabinet, a sleeve bracket is arranged on the baume densitometer, a plurality of induction nodes are arranged on the sleeve bracket, when the baume densitometer rises and falls, the induction nodes and the inductor of the sleeve bracket generate contact signals, the signals can judge the concentration of the ferrous chloride of etching solution, the production efficiency is improved, the labor cost is saved, and full-automatic production ensures that workers and etching tanks benefit is better, protecting the health of workers and the like.

Drawings

FIG. 1 is a front view of the present invention;

FIG. 2 is a top view of an etching bath according to the present invention;

FIG. 3 is a cross-sectional view of an etching bath according to the present invention;

FIG. 4 is a view of the infusion arm of the present invention;

FIG. 5 is a schematic view of the liquid trap part according to the present invention;

fig. 6 is a schematic view of the structure of the transfer robot according to the present invention;

FIG. 7 is a view of the structure at the clamping cylinder according to the present invention;

FIG. 8 is a block diagram of a process flow of the present invention.

The figure is as follows: 1. the device comprises a sliding track, 2, a mobile manipulator, 3, a clamping platform, 4, an etching base, 5, an electric cabinet, 6, an etching groove, 7, a first liquid storage box, 8, a second liquid storage box, 9, a micropump bracket, 10, a temperature sensor, 11, a temperature sensor, 12, a micropump, 13, a transfusion arm, 14, a compression pump assembly, 15, a shell, 16, a sensing node, 17, an installation panel, 18, a sensing bracket, 19, a baume densimeter, 20, a sleeve bracket, 21, a liquid collection part, 22, an extension arm, 23, a diffusion head, 24, a liquid storage cavity, 25, an air inlet joint, 26, a liquid inlet joint, 27, a liquid outlet, 28, a downward moving cylinder, 29, a main shaft, 30, a clamping bottom plate, 31, a clamping cylinder, 32, a clamping block, 33 and a clamping groove.

Detailed Description

The invention will be further illustrated with reference to the following specific examples. It should be understood that these examples are for illustrative purposes only and are not intended to limit the scope of the present invention. Further, it should be understood that various changes or modifications of the present invention can be made by those skilled in the art after reading the teaching of the present invention, and these equivalents also fall within the scope of the claims appended to the present application.

The embodiment of the invention relates to a processing technology for ensuring etching speed, as shown in figure 1, a plurality of moving manipulators 2 are required on one sliding rail 1, and the moving manipulators 2 can ensure that an etched metal plate can be installed at a set station and move forwards step by repeatedly moving back and forth, so that full-automatic flow line production is formed, the production efficiency is improved, the labor cost is reduced, indirect production is ensured, and chemical reagents are prevented from invading the bodies of workers.

Simultaneously, in order to ensure full automated production, need carry out incessant replenishment to the etching solution in the etching groove, the etching reaction uses ferrous chloride to work the metal sheet usually at present stage, the ferrous chloride can be by oxidation and be the ferric chloride after accomplishing, in order to ensure the chloride ion concentration of etching solution, need supply chloride ion through reduction solution such as supplementary ammonium chloride, this device has set up first liquid reserve tank 7 and second liquid reserve tank 8, and through micropump 12, input reduction solution into etching groove 6.

As shown in fig. 2, in order to ensure the etching speed of the etching solution, the content of ferrous chloride in the etching solution needs to be ensured, the concentration of ferrous chloride is tested by setting a baume densimeter 19, meanwhile, reasonable parameters are input into a control panel through keys of an electric cabinet 5, the control panel compares actual parameters with theoretical parameters, when the concentration of chloride ions is too low, the electric cabinet 5 can automatically start a micro pump 12, and the micro pump 12 can supplement a reducing agent into the etching solution, so that continuous constant supplement is realized, and the etching operation speed is ensured.

As shown in fig. 3, in order to ensure that the baume densimeter 19 can convert the actual concentration parameter into an electronic parameter, the induction bracket 18 is arranged, then the sleeve bracket 20 sleeved on the baume densimeter 19 is arranged, the sleeve bracket 20 can move up and down along with the lifting of the baume densimeter 19, the induction bracket 18 can induce the induction point of the sleeve bracket 20, and a parameter signal is provided to the electric cabinet 5 through the induction point.

In the etching operation process, the sweeps that the etching came out can deposit on the etching position surface, and this can influence etching efficiency, so in order to solve this problem, set up compression pump subassembly 14, in compression pump subassembly 14 sent into the etching solution with outside air, the gassing, the bubble can cause the etching solution to roll to know the sweeps on the metal sheet through liquid vibration, this structure can accelerate etching speed, improves production efficiency.

In practice, the frequency input by the compressor-pump assembly 14 is controlled in the control panel of the electric cabinet 5, which ensures that the level vibration does not have a significant effect on the baume scale 19.

As shown in fig. 4 and 5, the reducing agent can be rapidly mixed with the etching solution by the compression pump assembly 14, the solution-collecting portion 21 is disposed in the solution-feeding arm 13, the reducing agent is input into the solution-collecting portion 21 by the micro pump 12, and then the reducing agent is pressed out of the solution-collecting portion 21 by the compression pump assembly 14, and the reducing agent is diffused by the valve core in the diffusion head 23 during pressing out, so that the reducing agent and the etching solution rapidly react, the mixing speed of the reducing agent and the etching solution is further increased, and the production efficiency is improved.

As shown in fig. 6 and 7, the mobile manipulator 2 can clamp a plurality of metal plates, during operation, the clamping shaft of the clamping cylinder 31 is extended, then the main shaft 29 of the downward moving cylinder 28 moves downwards, so that the clamping bottom plate 30 can move downwards with the clamping cylinder 31, the lower end of the clamping block 32 is inserted into the butt-joint lug of the metal plate, then the clamping shaft is controlled to contract, the clamping groove 33 can be clamped with the edge of the metal plate, then the main shaft 29 moves upwards, the mobile manipulator 2 moves, when moving to the upper part of the etching groove 6, the downward moving cylinder 28 is controlled to move downwards, the metal plate can be immersed in the etching solution in the etching groove 6 for etching, and after etching is completed, the downward moving cylinder 28 resets, and products are delivered.

To ensure that the clamping block 32 does not corrode, its lower surface is provided with a ceramic shell.

As shown in fig. 3, as a supplement to the present technical solution, a circle of temperature sensor 10 is disposed in the middle of the outer ring of the etching bath 6, the temperature sensor 10 includes two butted shells 15, a temperature sensor 11 is disposed between the shells 15, a plurality of sensing nodes 16 inserted into the etching bath 6 are disposed on the temperature sensor 11, and the temperature sensor 11 is butted with the electric cabinet 5.

In order to ensure the reaction speed of the etching solution, the temperature of the etching solution is required to be ensured within a reasonable range, so that the etching solution is required to be ensured to be in a constant temperature state by designing a temperature control system, the temperatures of different areas of the etching solution are tested by arranging a plurality of sensing nodes 16 in the temperature control system, temperature parameters are subjected to centralized statistics to ensure the temperature of the etching solution, and meanwhile, the electric cabinet is used for judging whether the etching solution needs to be heated or not through a control system in the electric cabinet 5.

As a supplement to the technical solution, a heating sheet 17 is arranged in the bottom of the etching bath 6, and a plurality of heating wires extending to the bottom surface of the bath body of the etching bath 6 are arranged on the heating sheet 17.

As a supplement to this technical scheme, first liquid reserve tank 7 and second liquid reserve tank 8 around be the dislocation arrangement, two infusion arms 13 also are the dislocation arrangement, when removing 2 lower extremes of manipulator and stretching into etching groove 6, can not produce with two infusion arms 13 and interfere, first liquid reserve tank 7 and second liquid reserve tank 8 save ammonium chloride and hydrochloric acid respectively.

As shown in fig. 8, a process for ensuring etching speed includes the following steps: selecting optimal data for improving the etching speed to the maximum extent as theoretical parameters according to all reference parameters in the original process, inputting the theoretical parameters into a data input panel, and storing the theoretical parameters in a control panel, wherein the data comprises a ferrous chloride concentration parameter, a pH value and a temperature; pouring the prepared etching solution into an etching tank, and then carrying out etching operation on the product through an automatic manipulator; the baume densitometer, the temperature sensor and the pH value detector are used for monitoring the etching solution in the etching tank in real time, transmitting the measured data to the control panel, and comparing the measured data with theoretical parameters through the control panel; the control panel controls the ammonia chloride transfusion arm and the hydrochloric acid transfusion arm, thereby ensuring that the concentration parameter, the PH value and the temperature of the ferrous chloride are in a constant state.

The ammonia chloride solution may also use phosphoric acid, sodium chlorite, hydrogen iodide, etc. as a reducing agent.

In the technical scheme, the right side of the etching bath 6 can be detached and is used for facilitating the integral cleaning of the etching bath 6, impurities can be accumulated in the etching bath 6 during the time process of etching production, the attached impurities can not be cleaned by the conventional pump-type pumping cleaning, in order to ensure the accuracy of data in the production process, the whole device needs to be cleaned every worship, and during cleaning, firstly, the temperature sensor 10 which is externally wound on the outer ring of the etching groove 6 is removed, then the second liquid storage tank 8, the micro-pump bracket 9, the micro-pump 12, the transfusion arm 13 and the compression pump assembly 14 which are positioned at the right end are removed, then the right side wall of the etching bath 6 is removed, a water tank is arranged below the opening at the right side, then the inner wall of the etching bath 6 is washed by a high-pressure water gun, and the washed sewage is discharged from the right side, so that the cleanness inside the device can be greatly ensured, and the equipment can be ensured to accurately run.

It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an", and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.

The relative arrangement of the components and steps, the numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present invention unless it is specifically stated otherwise. Meanwhile, it should be understood that the sizes of the respective portions shown in the drawings are not drawn in an actual proportional relationship for the convenience of description. Techniques, methods, and apparatus known to those of ordinary skill in the relevant art may not be discussed in detail but are intended to be part of the specification where appropriate. In all examples shown and discussed herein, any particular value should be construed as merely illustrative, and not limiting. Thus, other examples of the exemplary embodiments may have different values. It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be discussed further in subsequent figures.

In the description of the present invention, it is to be understood that the orientation or positional relationship indicated by the orientation words such as "front, rear, upper, lower, left, right", "lateral, vertical, horizontal" and "top, bottom", etc. are usually based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and in the case of not making a reverse description, these orientation words do not indicate and imply that the device or element being referred to must have a specific orientation or be constructed and operated in a specific orientation, and therefore, should not be considered as limiting the scope of the present invention; the terms "inner and outer" refer to the inner and outer relative to the profile of the respective component itself.

Spatially relative terms, such as "above … …," "above … …," "above … … surface," "above," and the like, may be used herein for ease of description to describe one device or feature's spatial relationship to another device or feature as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if a device in the figures is turned over, devices described as "above" or "on" other devices or configurations would then be oriented "below" or "under" the other devices or configurations. Thus, the exemplary term "above … …" can include both an orientation of "above … …" and "below … …". The device may be otherwise variously oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

It should be noted that the terms "first", "second", and the like are used to define the components, and are only used for convenience of distinguishing the corresponding components, and unless otherwise stated, the terms have no special meaning, and therefore, the scope of the present invention should not be construed as being limited.

The above processing technology for ensuring the etching speed provided by the present application is introduced in detail, and the principles and embodiments of the present application are explained in detail herein by applying specific examples, and the above description of the embodiments is only used to help understanding the method and the core idea of the present application; meanwhile, for a person skilled in the art, according to the idea of the present application, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present application.

Claims

1. A process for ensuring etching rate, characterized by: including the full-automatic etching device who is used for this technology, full-automatic etching device includes etching base (4), etching groove (6) and electric cabinet (5), etching base (4) on install etching groove (6), etching groove (6) top be provided with slip track (1), install on slip track (1) and remove manipulator (2), remove manipulator (2) lower extreme and install clamping platform (3), the cell body left side of etching groove (6) install induction bracket (18), gliding baume hydrometer (19) about vertically installing in induction bracket (18), baume hydrometer (19) on cup joint sleeve pipe support (20) with induction bracket (18) relative slip, etching groove (6) lower part be provided with first liquid reserve tank (7) and second liquid reserve tank (8), first liquid reserve tank (7) and second liquid reserve tank (8) all go up vertical micro pump support (9) of installing, the micro-pump bracket (9) is provided with a micro-pump (12), an inlet pipeline of the micro-pump (12) is connected with the first liquid storage tank (7), an outlet pipeline of the micro-pump bracket (9) extends into the etching tank (6), the front side of the etching tank (6) is provided with an electric cabinet (5), the electric cabinet (5) controls the micro-pump (12) to start and close according to the detection data of the baume densimeter (19), the etching tank (6) is internally provided with a PH value detector, the PH value detector is connected with the electric cabinet (5),

the processing technology comprises the following specific steps:

a. selecting optimal data for improving the etching speed to the maximum extent as theoretical parameters according to all reference parameters in the original process, wherein the data comprises ferrous chloride concentration parameters, a PH value and a temperature, inputting the theoretical parameters into a data input panel, and storing the theoretical parameters in a control panel;

b. pouring the prepared etching solution into an etching tank (6), and then etching the product by an automatic manipulator;

c. the baume densitometer (19), the temperature sensor (11) and the PH value detector are used for monitoring the etching solution in the etching tank (6) in real time, the measured data are transmitted into the control panel, and the measured data are compared with theoretical parameters through the control panel;

d. the control panel controls the ammonia chloride transfusion arm and the hydrochloric acid transfusion arm, thereby ensuring that the concentration parameter, the PH value and the temperature of the ferrous chloride are in a constant state.

2. The process of claim 1, wherein the etching rate is ensured by: etch groove (6) upper portion both ends all be provided with mounting panel (17), mounting panel (17) on install compression pump subassembly (14), the output of compression pump subassembly (14) install infusion arm (13) that stretch into etch groove (6).

3. The process of claim 2, wherein the etching rate is ensured by: infusion arm (13) including collection liquid portion (21), extension arm (22) and diffusion head (23), collection liquid portion (21) lower extreme install extension arm (22) that are L shape, diffusion head (23) are installed to the end of extension arm (22).

4. The process of claim 3, wherein the etching rate is ensured by: liquid collection portion (21) in be provided with liquid storage chamber (24), the lateral part of liquid storage chamber (24) be provided with liquid inlet joint (26) of the export butt joint of micropump (12), liquid storage chamber (24) upper end be provided with air inlet joint (25) of the gas outlet butt joint of compression pump subassembly (14), extension arm (22) in be provided with the conveyer pipe, conveyer pipe one end is connected with liquid outlet (27) of liquid storage chamber (24) lower extreme, the other end docks with the case in the diffusion head (23).

5. The process of claim 1, wherein the etching rate is ensured by: the manipulator is characterized in that a downward moving cylinder (28) with a main shaft (29) vertically downward is arranged in the moving manipulator (2), a clamping bottom plate (30) horizontally arranged is installed on the main shaft of the downward moving cylinder (28), and a plurality of clamping cylinders (31) longitudinally arranged are installed on the lower end face of the clamping bottom plate (30) side by side.

6. The process of claim 5, wherein the etching rate is ensured by: the clamping shaft of the clamping cylinder (31) is provided with a vertical downward clamping block (32), the outer side of the lower end of the clamping block (32) adopts a vamp structure, and the inner side of the lower end of the clamping block (32) is provided with a clamping groove (33).

7. The process of claim 1, wherein the etching rate is controlled by: a circle of temperature sensor (10) is arranged in the middle of the outer ring of the etching groove (6), the temperature sensor (10) comprises two butted shells (15), a temperature sensor (11) is arranged between the shells (15), a plurality of sensing nodes (16) inserted into the etching groove (6) are arranged on the temperature sensor (11), and the temperature sensor (11) is butted with the electric cabinet (5).

8. The process of claim 1, wherein the etching rate is controlled by: the heating device is characterized in that a heating sheet (17) is arranged in the bottom of the etching groove (6), and a plurality of heating wires extending to the bottom surface of the groove body of the etching groove (6) are arranged on the heating sheet (17).

9. The process of claim 2, wherein the etching rate is ensured by: the first liquid storage tank (7) and the second liquid storage tank (8) are arranged in a staggered manner from front to back, and the two infusion arms (13) are also arranged in a staggered manner, so that the lower end of the movable manipulator (2) extends into the etching groove (6) and cannot interfere with the two infusion arms (13).

10. The process of claim 1, wherein the etching rate is controlled by: the first liquid storage tank (7) and the second liquid storage tank (8) are used for storing ammonia chloride and hydrochloric acid respectively.