CN1147706C - Angle changeable double reflection mirror dynamic liquid film thickness measuring instrument - Google Patents
Angle changeable double reflection mirror dynamic liquid film thickness measuring instrumentInfo
- Publication number
- CN1147706C CN1147706C CNB021090130A CN02109013A CN1147706C CN 1147706 C CN1147706 C CN 1147706C CN B021090130 A CNB021090130 A CN B021090130A CN 02109013 A CN02109013 A CN 02109013A CN 1147706 C CN1147706 C CN 1147706C
- Authority
- CN
- China
- Prior art keywords
- liquid film
- film thickness
- polishing
- catoptron
- angle changeable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The present invention relates to an angle changeable type dynamic liquid film thickness measuring instrument with double reflecting mirrors, which belongs to a polishing liquid film thickness measuring apparatus in the technical field of optical cold processing. The technical problem to be solved by the present invention is how to change the change of liquid film thickness into the rotary angular change of a lower reflecting mirror relative to an upper reflecting mirror. In order to solve the technical problem, the present invention has the technical scheme that in angle changeable type double reflecting mirrors, a structure that a light slide seat lifts a post rod in order to support the lower reflecting mirror with a smooth rotating shaft to rotate around the rotating shaft is adopted; laser beams emitted through the multiple reflection of the angle changeable type double reflecting mirrors with the reflecting surfaces oppositely installed are received and displayed by ground glass. The present invention is composed of a polishing system and a measuring system, wherein the measuring system is installed behind the moving direction of a polished part in the polishing system. The apparatus can dynamically measure liquid film thickness in real time, can regulate liquid film thickness in time, can improve the polishing conditions of ultra-smooth surfaces, can increase work efficiency and can ensure polishing quality.
Description
Technical field
The invention belongs to a kind of measurement mechanism in the optics cold processing technique field to the polishing fluid film thickness.
Background technology
In optics cold working, often run into and to carry out super-smooth surface processing some eyeglass, such as, in short-wave band optics, be used in the utmost point purple light etching system in the VLSI (very large scale integrated circuit) manufacturing, need the image quality of optical system clear especially, this just requires the optical lens surface roughness to be less than the ultra-smooth degree of 1nm (RMS).
In general, optics cold working to super-smooth surface, the lapping mode that can not adopt common work piece surface and mill directly to contact, allow abrasive solution be full of gap space between work piece surface and the mill but adopt, the relative motion of mill and work piece, formed the flow of solution of both gap spaces, the effect that this liquid film flows, can reach effect to the ultra-smooth processing of work piece surface, the thickness of liquid film that flows becomes the very important factor that influences Super-smooth Surface Polishing, therefore, and in the Super-smooth Surface Polishing process, thickness of liquid film is carried out real time dynamic measurement, just become requisite work in the super-smooth surface processing.
According to situation about grasping, both at home and abroad in Super-smooth Surface Polishing, usually all adopt the way that on work piece, adds counterweight, regulate the thickness of liquid film between work piece and the mill, with the most approaching prior art of the present invention (Y.Namba and H.Tsuwa as shown in Figure 1, Ultra-precisionfloat polishing machine, Annals CIRP, 1987,36 (1): 211-214): form by polishing pond 1, workpiece spindle 2, counterweight 3, polished 4, liquid film 5, tin mill 6, mill spindle 7.
This device is by adding the way of counterweight 3 on polished 4, regulates the thickness that is full of liquid film between polished 4 and the tin mill 6, satisfies the needs of Super-smooth Surface Polishing.This way only knows that thickness of liquid film has obtained adjustment, actual size to thickness of liquid film, the notion that does not have amount, workpiece of every polishing, all must carry out the counterweight test and adjust, make troubles, influence work efficiency and quality of finish to work, in order to overcome above-mentioned shortcoming, the device of a kind of energy of ad hoc meter real time dynamic measurement thickness of liquid film.
Summary of the invention
The technical problem to be solved in the present invention is: how to make the variation of thickness of liquid film, changing into down, catoptron changes with respect to the angle that upper reflector rotates.
The technical scheme of technical solution problem is: in the angle changeable double reflection mirror system, adopt the lightweight slide to hold up push rod and support the following catoptron that the has smooth precision spindle structure that rotates around the axis, the angle changeable double reflection mirror of relatively arranging by reflecting surface is the laser light reflected bundle repeatedly, and the light spot position of observing on the frosted glass display screen changes.
Detailed content of the present invention is as shown in Figure 2: be made up of polishing system (8,9,10,11,12,13,22) and measuring system (9,14,15,16,17,18,19,20,21), polishing system comprises: polishing pond 8, liquid film 9, tin mill 10, polished 11, subsides dish 12, workpiece spindle 13, mill spindle 22; Measuring system comprises liquid film 9, following reflection mirror rotation shafts 14, plane mirror 15, film viewing screen 16, LASER Light Source 17, upper reflector 18, following catoptron 19, push rod 20, slide 21.
In polishing system, mill spindle 22 is vertical with tin mill 10, and is solid dead and drive 10 rotations of tin mill at the center of tin mill 10 and its; Workpiece spindle 13 is fixed with it at polished 11 center by subsides dish 12, and vertical with polished 11, drives polished 11 rotation; Polished 11 polished surface is parallel with the workplace of tin mill 10, and slit between the two is full of liquid film 9.
Measuring system (9,14,15,16,17,18,19,20,21) be installed in polishing system (8,9,10,11,12,13,22) back of polished 11 motion direct of travel in, in measuring system, liquid film 9 is full of the slit between slide 21 and the tin mill 10, the lower end of push rod 20 is perpendicular and firm in the center of slide 21, upper end and following catoptron 19 are vertical and reinforce, the relative installation of reflecting surface of upper reflector 18 and following catoptron 19, upper reflector 18 maintains static, following catoptron 19 14 rotates under the effect of push rod 20 around the shaft, change the angle between upper reflector 18 and the following catoptron 19, the laser beam of LASER Light Source 17 is catoptron 19 under the right-hand member directive of angle changeable double reflection mirror, after angle changeable double reflection mirror repeatedly reflects, from the left end ejaculation of catoptron 19 down, reflex to film viewing screen 16 through plane mirror 15.
Principle of work explanation: the laser beam that LASER Light Source 17 is sent catoptron 19 under the double mirror right-hand member directive, laser beam between the double mirror through after the reflection repeatedly, penetrate from the left end of catoptron 19 down, reflex on the film viewing screen 16 through plane mirror 15.On, in the following double mirror, upper reflector 18 maintains static, under reflect 19 and can be around the shaft 14 rotate, when the thickness of liquid film in slit between polished 11 surface and the tin mill 10 changes, slit between slide 21 and the tin mill 10 also changes thereupon, the variation of this thickness of liquid film, cause by slide 21 and push rod 20 effects catoptron 19 14 rotations around the shaft down, thereby the angle that is changing between upper reflector 18 and the following catoptron 19 changes, the direction of the laser beam that catoptron 19 reflected under the variation of angle directly changed, thereby also changing the direction of the laser beam that plane mirror 15 reflects, light spot position on the plane mirror 15 reflection directive film viewing screens 16 changes, just can measure the climb of slide 21, i.e. thickness of liquid film.
Good effect: can the real time dynamic measurement thickness of liquid film, in time the regulator solution film thickness improves the Super-smooth Surface Polishing condition, increases work efficiency, and guarantees quality of finish.
Description of drawings
Fig. 1 is the structural representation of prior art, and Fig. 2 is a structural representation of the present invention, and Figure of abstract also adopts Fig. 2.
Embodiment
Implement by structure shown in Figure 2, upper and lower catoptron 18 and 19 reflectivity will be higher than 95%, and smooth rotating shaft is adopted in rotating shaft 14, slide 21 and push rod 20 adopt light material, plane mirror 15 adopts aluminium reflector, and reflectivity is higher than 95%, and film viewing screen 16 adopts the frosted glass that has scale.
Claims (1)
1, a kind of angle changeable double reflection mirror dynamic liquid film thickness measuring instrument comprises polishing system, it is characterized in that the present invention also comprises measuring system; Measuring system is installed in the back of polished (11) motion direct of travel in the polishing system, liquid film in measuring system (9) is full of the slit between slide (21) and the tin mill (10), the lower end of push rod (20) is perpendicular and firm in the center of slide (21), the upper end is vertical with following catoptron (19) and reinforce, the relative installation of reflecting surface of upper reflector (18) and following catoptron (19), upper reflector (18) maintains static, following catoptron (19) is (14) rotation around the shaft under the effect of push rod (20), change the angle between upper reflector (18) and the following catoptron (19), the laser beam of LASER Light Source (17) is catoptron (19) under the right-hand member directive of angle changeable double reflection mirror, after angle changeable double reflection mirror repeatedly reflects, from the left end ejaculation of catoptron (19) down, reflex to film viewing screen (16) through plane mirror (15).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021090130A CN1147706C (en) | 2002-01-07 | 2002-01-07 | Angle changeable double reflection mirror dynamic liquid film thickness measuring instrument |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021090130A CN1147706C (en) | 2002-01-07 | 2002-01-07 | Angle changeable double reflection mirror dynamic liquid film thickness measuring instrument |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1358983A CN1358983A (en) | 2002-07-17 |
| CN1147706C true CN1147706C (en) | 2004-04-28 |
Family
ID=4740444
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021090130A Expired - Fee Related CN1147706C (en) | 2002-01-07 | 2002-01-07 | Angle changeable double reflection mirror dynamic liquid film thickness measuring instrument |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1147706C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9971073B2 (en) | 2014-04-14 | 2018-05-15 | Corning Incorporated | Enhanced performance metallic based optical mirror substrates |
| CN104634392B (en) * | 2015-02-11 | 2017-04-26 | 上海理工大学 | Method for measuring concentration, thickness and temperature of liquid film through device for synchronously measuring concentration, thickness and temperature of liquid film |
| CN106225714B (en) * | 2016-08-02 | 2018-04-10 | 中国科学院长春光学精密机械与物理研究所 | A kind of optical calibration method for being used for MR fluid ribbon in magnetorheological process equipment |
| CN107401981A (en) * | 2017-07-19 | 2017-11-28 | 大连理工大学 | The device and application method of turbulent liquid film substrate thickness in non-cpntact measurement pipe |
-
2002
- 2002-01-07 CN CNB021090130A patent/CN1147706C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1358983A (en) | 2002-07-17 |
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