CN114760747A - Microwave plasma torch generating device - Google Patents

Microwave plasma torch generating device Download PDF

Info

Publication number
CN114760747A
CN114760747A CN202210585716.7A CN202210585716A CN114760747A CN 114760747 A CN114760747 A CN 114760747A CN 202210585716 A CN202210585716 A CN 202210585716A CN 114760747 A CN114760747 A CN 114760747A
Authority
CN
China
Prior art keywords
microwave
coaxial
resonant cavity
waveguide
plasma torch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210585716.7A
Other languages
Chinese (zh)
Inventor
丁海兵
王彬彬
吉忠浩
陆登峰
肖韧
唐科
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aerospace Information Research Institute of CAS
Original Assignee
Aerospace Information Research Institute of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aerospace Information Research Institute of CAS filed Critical Aerospace Information Research Institute of CAS
Priority to CN202210585716.7A priority Critical patent/CN114760747A/en
Publication of CN114760747A publication Critical patent/CN114760747A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/30Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Abstract

The present disclosure provides a microwave plasma torch generating device, comprising: an input waveguide for inputting microwaves; the gradual change waveguide comprises a first gradual change waveguide section and a second gradual change waveguide section, wherein the first gradual change waveguide section and the second gradual change waveguide section are used for distributing the power of the microwave to obtain a first microwave and a second microwave, and the power of the first microwave is higher than that of the second microwave; a coaxial resonant cavity for generating a high-intensity electric field according to the second microwave; the quartz glass tube is a reaction cavity of microwave plasma flame and is used for generating the microwave plasma flame according to gas molecules under the action of a high-intensity electric field, and the cylindrical resonant cavity is used for generating an electric field with certain intensity according to first microwave so as to maintain the plasma flame. The plasma torch generated by the microwave plasma torch generating device has larger plasma volume, longer gas processing distance, no need of triggering by a mechanical ignition device and lower energy consumption.

Description

Microwave plasma torch generating device
Technical Field
The present disclosure relates to the field of microwave plasma technology, and more particularly, to a microwave plasma torch generating device.
Background
Plasma is a fourth state of matter different from solid, liquid and gas. The plasma belongs to ionized gas, mainly consists of neutral atoms or molecules, excited atoms or molecules, free radicals, electrons or positive and negative ions and radiation photons, and the number of negative charges of the neutral atoms or molecules is the same as that of positive charges of the excited atoms or molecules, so that the neutral plasma is macroscopically represented by electroneutrality. The microwave plasma generation principle is that microwave energy is injected into gas molecules by a waveguide device to induce the gas molecules to generate a series of reactions such as excitation, ionization and the like, and further generate plasmas with high reaction activity, and the plasmas generated by excitation and ionization can be limited in a specific space and can be transmitted to the plasmas [1] simultaneously due to the characteristic of a microwave electromagnetic field 'hollow structure'. Compared with other methods for generating plasma, microwave plasma has many advantages, such as high ionization degree, wide adaptive pressure range, high electron density, easy regulation of microwave and plasma characteristics, etc., which makes the research of microwave plasma technology have greater practical application value.
At one atmosphere, the breakdown field strength of air is 3X 106V/m. In order to generate the high electric field strength required for the plasma, the most common solutions in microwave resonators include the following two: increasing the microwave input power or reducing the size of the microwave cavity. Increasing the input power of the microwave can increase the microwave field strength per unit volume, thereby being beneficial to increasing the electric field strength, but the increase of the microwave power is limited. The electric field can be more concentrated by reducing the size of the microwave resonant cavity, the field intensity is greatly enhanced, and the realization and the personalized design are convenient. Therefore, the most commonly adopted structure of the conventional microwave plasma torch is a compressed waveguide structure, which can reduce the volume of a resonant cavity and concentrate an electric field to increase the strength of the electric field; or a resonant cavity structure with multiple input ends to provide greater microwave power. However, the volume of the plasma generated by the resonant cavity structure is small, the gas processing distance is short, and the isolation difficulty between multiple ports is large Higher power input is required and an additional mechanical ignition device is usually required for triggering.
Disclosure of Invention
In view of the above technical problem, the present disclosure provides a microwave plasma torch generating device, including: an input waveguide for inputting microwaves; the gradual change waveguide comprises a first gradual change waveguide section and a second gradual change waveguide section, wherein the first gradual change waveguide section and the second gradual change waveguide section are used for distributing the power of the microwave to obtain a first microwave and a second microwave, and the power of the first microwave is higher than that of the second microwave; a coaxial resonant cavity for generating a high-intensity electric field according to the second microwave; the microwave plasma flame generating device comprises a cylindrical resonant cavity, wherein a quartz glass tube is arranged at the center of the cylindrical resonant cavity, the quartz glass tube is a reaction cavity of microwave plasma flame and used for generating microwave plasma flame according to gas molecules under the action of a high-intensity electric field, and the cylindrical resonant cavity is used for generating an electric field with certain intensity according to first microwave so as to maintain the plasma flame.
According to the embodiment of the disclosure, the distribution ratio of the first gradual change waveguide segment to the power of the microwave is 3: 1.
According to an embodiment of the present disclosure, wherein the microwave plasma torch generating device further comprises: the microwave source comprises a connecting waveguide and a coupling port, wherein one end of the connecting waveguide is connected with a first gradually-changed waveguide section, and the other end of the connecting waveguide is connected to the cylindrical resonant cavity through the coupling port so as to feed first microwaves into the cylindrical resonant cavity.
According to an embodiment of the present disclosure, wherein the microwave plasma torch generating device further comprises: the short-circuit waveguide is connected with the second gradual change waveguide section; the coupling probe is connected with the short-circuit waveguide and is used for concentrating the second microwaves; the coaxial line outer conductor is sleeved outside the coaxial line inner conductor and is coaxial with the coaxial line inner conductor, one end of the coaxial line inner conductor and one end of the coaxial line outer conductor are connected to the coupling probe, and the other end of the coaxial line inner conductor and the other end of the coaxial line outer conductor are connected to the coaxial resonant cavity and used for transmitting the second microwave to the coaxial resonant cavity.
According to an embodiment of the present disclosure, wherein the coaxial resonant cavity comprises: the coaxial resonant cavity inner conductor is used for generating a high-intensity electric field according to the second microwave; one end of the coaxial resonant cavity inner conductor is open-circuit, the other end is short-circuit, and one end of the open-circuit is inserted into the quartz glass tube; the coaxial cavity housing is adapted to be supported to secure the coaxial cavity inner conductor.
According to an embodiment of the present disclosure, wherein the coaxial resonator inner conductor diameter is gradually reduced in a direction in which the one end of the open circuit points to the one end of the short circuit.
According to the embodiment of the disclosure, an air inlet pipe is further arranged at one end, close to the coaxial resonant cavity, of the quartz glass pipe, and the air inlet pipe and the central axis of the quartz glass pipe form a preset angle.
According to the embodiment of the present disclosure, the gas inlet pipes are symmetrically distributed on two sides of the central axis of the quartz glass pipe.
According to an embodiment of the present disclosure, wherein the surface of the quartz glass tube not covered by the cylindrical resonator cavity is covered with a metal cylinder.
According to an embodiment of the present disclosure, wherein the input waveguide and the connection waveguide are rectangular waveguides.
Drawings
The above and other objects, features and advantages of the present disclosure will become more apparent from the following description of embodiments of the present disclosure with reference to the accompanying drawings, in which:
FIG. 1 schematically illustrates a front view of the structure of a microwave plasma torch generating device according to an embodiment of the disclosure.
FIG. 2 schematically illustrates a top view of a structure of a microwave plasma torch generation device according to an embodiment of the disclosure.
[ description of reference ]
1-input waveguide, 2-tapered waveguide, 201-first tapered waveguide section, 202-second tapered waveguide section, 3-coaxial resonant cavity, 301-coaxial resonant cavity inner conductor, 302-coaxial resonant cavity outer shell, 4-cylindrical resonant cavity, 5-quartz glass tube, 501-air inlet tube, 6-connection waveguide, 7-coupling port, 8-short-circuit waveguide, 9-coupling probe, 10-coaxial line inner conductor, 11-coaxial line outer conductor, 12-metal cylinder.
Detailed Description
To make the objects, technical solutions and advantages of the present disclosure more apparent, the present disclosure will be described in further detail below with reference to specific embodiments and the accompanying drawings. It is to be understood that the embodiments described are only a few embodiments of the present disclosure, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments disclosed herein without making any creative effort, shall fall within the protection scope of the present disclosure.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. The terms "comprises," "comprising," and the like, as used herein, specify the presence of stated features, steps, operations, and/or components, but do not preclude the presence or addition of one or more other features, steps, operations, or components.
In the present disclosure, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integral; may be mechanically, electrically or otherwise in communication with each other; either directly or indirectly through intervening media, either internally or in any other suitable relationship. The specific meaning of the above terms in the present disclosure can be understood as a specific case by a person of ordinary skill in the art.
In the description of the present disclosure, it is to be understood that the terms "longitudinal," "length," "circumferential," "front," "back," "left," "right," "top," "bottom," "inner," "outer," and the like are used in the indicated orientations and positional relationships based on the orientation shown in the drawings, merely to facilitate the description of the disclosure and to simplify the description, and are not intended to indicate or imply that the referenced subsystems or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the disclosure.
Throughout the drawings, like elements are represented by like or similar reference numerals. Conventional structures or constructions will be omitted when they may obscure the understanding of the present disclosure. And the shapes, sizes and position relations of all parts in the drawing do not reflect the real sizes, proportions and actual position relations. In addition, in the present disclosure, any reference signs placed between parentheses shall not be construed as limiting the present disclosure.
Similarly, in the above description of exemplary embodiments of the disclosure, various features of the disclosure are sometimes grouped together in a single embodiment, figure, or description thereof for the purpose of streamlining the disclosure and aiding in the understanding of one or more of the various disclosed aspects. Reference to the description of the terms "one embodiment," "some embodiments," "an example," "a specific example," or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the disclosure. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or to implicitly indicate the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present disclosure, "a plurality" means at least two, e.g., two, three, etc., unless explicitly defined otherwise.
In order to overcome the defects in the prior art, the embodiment of the disclosure provides a microwave plasma torch generation device, which is implemented based on a combined microwave resonant cavity and mainly comprises a waveguide component, a Y-shaped branch waveguide power divider, a probe-type waveguide-coaxial transition section, a cylindrical resonant cavity, an 1/4-wavelength coaxial resonant cavity, a quartz tube, an air inlet and the like. The following description is similar to the specific embodiments.
Fig. 1 schematically shows a front view of the structure of a microwave plasma torch generating device according to an embodiment of the disclosure. Figure 2 schematically shows a top view of a structure of a microwave plasma torch generating device according to an embodiment of the disclosure.
As shown in fig. 1 and 2, in an embodiment of the present disclosure, a microwave plasma torch generation device may include, for example, an input waveguide 1, a graded waveguide 2, a coaxial resonant cavity 3, a cylindrical resonant cavity 4, and a quartz glass tube 5.
Specifically, the input waveguide 1 is used for inputting the microwave M, and preferably, the input waveguide 1 may be, for example, a rectangular waveguide. The metal spacer of the tapered waveguide 2 is divided into an upper part and a lower part, and comprises a first tapered waveguide section 201 and a second tapered waveguide section 202, the first tapered waveguide section 201 and the second tapered waveguide section 202 are both connected to the output end of the input waveguide 1 and used for distributing the power of the microwave M to obtain a first microwave and a second microwave, and the power of the first microwave is higher than that of the second microwave. The first transition waveguide segment 201 transmits the first microwave, and the second transition waveguide segment 202 transmits the second microwave, that is, the first transition waveguide segment 201 and the second transition waveguide segment 202 are equivalent to power dividers. Preferably, the distribution ratio of the power of the microwave M by the first graded waveguide segment 21 and the second graded waveguide segment is preferably 3: 1.
The coaxial resonant cavity 3 receives the second microwave and generates a high-intensity electric field according to the second microwave, and the high-intensity electric field plays a role in triggering ignition generated by the microwave plasma flame. The quartz glass tube 5 is arranged in the center of the cylindrical resonant cavity 4, serves as a reaction cavity of the microwave plasma flame, and is used for generating the microwave plasma flame according to gas molecules under the ionization action of a high-intensity electric field, and the cylindrical resonant cavity 4 receives first microwaves and generates an electric field with certain intensity according to the first microwaves so as to maintain the plasma flame.
According to the microwave plasma torch generating device provided by the embodiment, based on a single microwave source, the tapered waveguide is arranged to be of a Y-shaped structure formed by the first tapered waveguide section and the second tapered waveguide section with different power distribution ratios, a small part of microwave energy input by the input waveguide is fed into the coaxial resonant cavity through the second tapered waveguide section, the coaxial resonant cavity generates a high-intensity electric field based on the small part of the microwave energy to ignite gas molecules in the quartz glass tube so as to generate microwave plasma flame, and most of the microwave energy input by the input waveguide is fed into the cylindrical resonant cavity through the first tapered waveguide section to generate an electric field with certain intensity so as to maintain the plasma flame. In addition, although the electric field intensity of the center of the cylindrical resonant cavity is small, the plasma flame can be maintained, meanwhile, the plasma flame with a larger volume can be formed, and the gas processing distance is longer.
With continued reference to fig. 1 and 2, in another embodiment of the present disclosure, the microwave plasma torch generation apparatus may further include, for example, a connecting waveguide 6 and a coupling port 7, wherein one end of the connecting waveguide 6 is connected to the first tapered waveguide section 201, and the other end is connected to the cylindrical resonant cavity 4 through the coupling port 7, so as to feed the first microwave into the cylindrical resonant cavity 4. The cylindrical resonant cavity 4, the quartz glass tube 5 and the coupling port 7 constitute a component for maintaining a torch. Preferably, the connecting waveguide 6 may be, for example, a rectangular waveguide.
According to the microwave plasma torch generating device provided by the embodiment, most of energy can be better ensured to be fed into the cylindrical resonant cavity by arranging the connecting waveguide and the coupling port.
In a further embodiment of the present disclosure, the microwave plasma torch generating device may further comprise, for example, a short-circuit waveguide 8, a coupling probe 9, a coaxial inner conductor 10 and a coaxial outer conductor 11. The short-circuit waveguide 8 is connected to the second tapered waveguide section 202 and configured to short-circuit microblogs transmitted by the second tapered waveguide section 202, the coupling probe 9 is connected to the short-circuit waveguide 8 and configured to concentrate second microwaves, the coaxial outer conductor 11 is sleeved outside the coaxial inner conductor 10 and is coaxial with the coaxial inner conductor 10, one end of each of the coaxial inner conductor 10 and the coaxial outer conductor 11 is connected to the coupling probe 9, and the other end of each of the coaxial inner conductor 10 and the coaxial outer conductor 11 is connected to the coaxial resonant cavity 3 and configured to transmit the second microwaves to the coaxial resonant cavity 3. Specifically, the second tapered waveguide section 202 converts a small portion of microwave energy through a waveguide-to-coaxial interface, connects the inner conductor and the outer conductor of the coaxial line to the right input port of the coaxial resonant cavity 3, and feeds the energy into the coaxial resonant cavity 3 through ring coupling.
According to the microwave plasma torch generating device provided by the embodiment, by arranging the short-circuit waveguide, the coupling probe, the coaxial inner conductor and the coaxial outer conductor, a small part of microwave energy can be better concentrated, so that the coaxial resonant cavity can generate a high-intensity electric field.
In a further embodiment of the present disclosure, the coaxial resonant cavity 3 may comprise, for example, a coaxial resonant cavity inner conductor 301 and a coaxial resonant cavity outer shell 302, the coaxial resonant cavity inner conductor 301 for generating a high intensity electric field from the second microwave; one end of the coaxial resonant cavity inner conductor 301 is open-circuit, the other end is short-circuit, one end of the open-circuit is inserted into the quartz glass tube 5, and the coaxial resonant cavity outer shell 302 is used for supporting to fix the coaxial resonant cavity inner conductor 301. Preferably, the coaxial resonant cavity 3 may be, for example, an 1/4 wavelength coaxial resonant cavity.
Further, along the direction from the open end to the short end, the diameter of the inner conductor 301 of the coaxial resonant cavity is gradually reduced, that is, the coaxial resonant cavity 3 adopts a gradual change structure, the diameter of the open end is smaller, and the electric field is more concentrated.
According to the microwave plasma torch generating device provided by the embodiment, one end of the inner conductor of the coaxial resonant cavity is open-circuited, the other end of the inner conductor of the coaxial resonant cavity is short-circuited, and the diameter of the open-circuited end is smaller than that of the short-circuited end, so that the open-circuited end of the coaxial resonant cavity can generate a high-strength electric field, and the ignition requirement of the plasma torch is fully met. And a small part of the open end is inserted into the quartz glass tube, so that the field intensity is concentrated to generate a tip for ignition, and the generation and maintenance of a plasma torch are excited.
In another embodiment of the present disclosure, an end of the quartz glass tube 5 close to the coaxial resonant cavity 3 is further provided with an inlet pipe 501, and the inlet pipe 501 and the central axis of the quartz glass tube 5 may form a predetermined angle, for example, an acute angle in general. Preferably, the inlet pipes 501 are symmetrically distributed on both sides of the central axis of the quartz glass tube 5. Gas enters the quartz glass tube 5 from the gas inlet pipes 501 at both sides of the coaxial resonant cavity.
According to the microwave plasma torch generating device provided by the embodiment, the air inlet pipe at the bottom of the quartz tube and the central axis form a certain angle to generate spiral airflow, so that the quartz tube wall is prevented from being fused by a high-temperature torch.
In a further embodiment of the present disclosure, the surface of the quartz glass tube 5 not covered by the cylindrical resonant cavity 4 may be covered with a metal cylinder 12, for example. As shown in fig. 1, the quartz glass tube 5 is covered with a metal cylinder 12 on both the upper and lower outer sides.
According to the microwave plasma torch generating device provided by the embodiment, the surface of the quartz glass tube which is not covered by the cylindrical resonant cavity is covered by the metal cylinder, so that the microwave leakage can be prevented.
In order to verify the advantages of the microwave plasma torch generation device, simulation experiments are also performed in the embodiment of the present disclosure.
Specifically, the working mode of the cylindrical resonant cavity is TM010And the direction of an electric field is unchanged along the axial direction, and the field value is maximum at the central axis of the cylinder. When the input power is 1W, the peak value of the electric field intensity of the open end of the coaxial resonant cavity is larger than 1 multiplied by 10 and obtained through CST simulation5V/m, the electric field at the central axis of the cylindrical resonant cavity is about 1 × 104V/m。
Based on the situation, the microwave plasma torch generating device provided by the embodiment of the disclosure can complete the air breakdown under the atmospheric pressure and form a large-volume plasma torch under the condition of smaller microwave power input, and the design requirement can be met when the input power is 1.5kW through analog simulation calculation.
In summary, compared with the conventional compressed waveguide plasma torch, the microwave plasma torch generation device provided by the embodiment of the disclosure has the advantages that the plasma volume of the combined resonant cavity plasma torch is larger, the gas treatment distance is longer, a mechanical ignition device is not required for triggering, and the energy consumption is lower.
It should be noted that the microwave plasma torch generating device provided by the embodiment of the disclosure can be practically applied to garbage tail gas treatment, material surface treatment, biomedicine and other application fields.
The above-mentioned embodiments, objects, technical solutions and advantages of the present disclosure are further described in detail, it should be understood that the above-mentioned embodiments are only examples of the present disclosure, and should not be construed as limiting the present disclosure, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present disclosure should be included in the protection scope of the present disclosure.

Claims (10)

1. A microwave plasma torch generating device, comprising:
an input waveguide (1) for inputting microwaves;
the gradual change waveguide (2) comprises a first gradual change waveguide section (201) and a second gradual change waveguide section (202), the first gradual change waveguide section (201) and the second gradual change waveguide section (202) are used for distributing the power of the microwaves to obtain a first microwave and a second microwave, wherein the power of the first microwave is higher than that of the second microwave;
a coaxial resonant cavity (3) for generating a high intensity electric field from said second microwave;
the plasma generating device comprises a cylindrical resonant cavity (4), wherein a quartz glass tube (5) is arranged at the center of the cylindrical resonant cavity, the quartz glass tube (5) is a reaction cavity of microwave plasma flame and is used for generating the microwave plasma flame according to gas molecules under the action of the high-intensity electric field, and the cylindrical resonant cavity (4) is used for generating an electric field with certain intensity according to first microwaves to maintain the plasma flame.
2. A microwave plasma torch generating device according to claim 1, wherein the distribution ratio of the power of said microwave to said first and second tapered waveguide sections (201, 202) is 3: 1.
3. A microwave plasma torch generating device according to claim 1, wherein the microwave plasma torch generating device further comprises:
A connecting waveguide (6) and a coupling port (7), wherein one end of the connecting waveguide (6) is connected to the first graded waveguide section (201), and the other end of the connecting waveguide is connected to the cylindrical resonant cavity (4) through the coupling port (7), so as to feed the first microwave into the cylindrical resonant cavity (4).
4. A microwave plasma torch generating device according to claim 1, wherein the microwave plasma torch generating device further comprises:
a short-circuit waveguide (8) connected to the second graded waveguide segment (202);
a coupling probe (9) connected to the short-circuit waveguide (8) for concentrating the second microwave;
coaxial line inner conductor (10) and coaxial line outer conductor (11), coaxial line outer conductor (11) cover is established coaxial line inner conductor (10) outside and with coaxial line inner conductor (10) are coaxial, coaxial line inner conductor (10) and coaxial line outer conductor (11) one end are connected to coupling probe (9), and the other end is connected to coaxial resonant cavity (3), be used for with second microwave transmission extremely coaxial resonant cavity (3).
5. A microwave plasma torch generating device according to claim 1 or 4, wherein said coaxial resonance cavity (3) comprises:
a coaxial resonator inner conductor (301) for generating a high intensity electric field from said second microwave; one end of the coaxial resonant cavity inner conductor (301) is open-circuit, the other end is short-circuit, and one end of the open-circuit is inserted into the quartz glass tube (5);
The coaxial cavity housing (302) is used for supporting to fix the coaxial cavity inner conductor (301).
6. A microwave plasma torch according to claim 5, wherein said coaxial resonator inner conductor (301) is decreasing in diameter in a direction from the open end towards the short end.
7. A microwave plasma torch generating device according to claim 1, wherein an inlet pipe (501) is further provided at one end of said quartz glass tube (5) close to said coaxial resonant cavity (3), said inlet pipe (501) making a predetermined angle with the central axis of said quartz glass tube (5).
8. A microwave plasma torch generating device according to claim 7, wherein said inlet pipes (501) are symmetrically distributed on both sides of the central axis of said quartz glass tube (5).
9. A microwave plasma torch generating device according to claim 1, wherein the surface of said quartz glass tube (5) not covered by said cylindrical resonant cavity (4) is covered with a metal cylinder (12).
10. A microwave plasma torch generating device according to claim 3, wherein said input waveguide (1) and said connecting waveguide (6) are rectangular waveguides.
CN202210585716.7A 2022-05-23 2022-05-23 Microwave plasma torch generating device Pending CN114760747A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210585716.7A CN114760747A (en) 2022-05-23 2022-05-23 Microwave plasma torch generating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210585716.7A CN114760747A (en) 2022-05-23 2022-05-23 Microwave plasma torch generating device

Publications (1)

Publication Number Publication Date
CN114760747A true CN114760747A (en) 2022-07-15

Family

ID=82336499

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210585716.7A Pending CN114760747A (en) 2022-05-23 2022-05-23 Microwave plasma torch generating device

Country Status (1)

Country Link
CN (1) CN114760747A (en)

Similar Documents

Publication Publication Date Title
US4906898A (en) Surface wave launchers to produce plasma columns and means for producing plasma of different shapes
US4609808A (en) Plasma generator
CN107801286B (en) Microwave plasma excitation system based on dielectric barrier discharge pre-ionization
Hubert et al. A new microwave plasma at atmospheric pressure
KR100906836B1 (en) Microwave plasma nozzle with enhanced plume stability and heating efficiency, plasma generating system and method thereof
US4975625A (en) Electrodeless lamp which couples to small bulb
JP5280251B2 (en) Portable microwave plasma generator
WO2011147230A1 (en) Microwave plasma igniter
US3663858A (en) Radio-frequency plasma generator
CN103269561B (en) Waveguide direct-feed-type microwave plasma torch device
Moisan et al. New surface wave launchers for sustaining plasma columns at submicrowave frequencies (1–300 MHz)
CN110708853B (en) Waveguide feed-in type microwave coupling plasma generating device
JP2001508226A (en) Powerful microwave plasma generator
CN202979451U (en) Atmospheric-pressure microwave-plasma torch apparatus
CN204733448U (en) A kind of air tunable microwave plasmatorch device
EP3329748B1 (en) Chambers for microwave plasma generation and related methods
CN113194594B (en) Medium nozzle reinforced handheld medical low-power microwave plasma torch
US11122673B2 (en) Compound double coaxial line atmospheric pressure low-temperature microwave plasma jet source
CN114760747A (en) Microwave plasma torch generating device
CN209845424U (en) High-power high-efficiency multipurpose microwave plasma torch
JP6873152B2 (en) Adapter that forms an electromagnetic field that heats toroidal plasma discharges at microwave frequencies
CN105898975B (en) A kind of HIGH-POWERED MICROWAVES plasma resonant
CN114189973B (en) Microwave plasma torch device with double microwave resonant cavities and application method thereof
CN109640505A (en) A kind of large power high efficiency multipurpose microwave plasma torch
CN212278529U (en) Multi-feed source microwave plasma device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination