CN114757138A - Layout construction method and system of resonant cavity pattern, storage medium and electronic device - Google Patents
Layout construction method and system of resonant cavity pattern, storage medium and electronic device Download PDFInfo
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- CN114757138A CN114757138A CN202210335864.3A CN202210335864A CN114757138A CN 114757138 A CN114757138 A CN 114757138A CN 202210335864 A CN202210335864 A CN 202210335864A CN 114757138 A CN114757138 A CN 114757138A
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- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/392—Floor-planning or layout, e.g. partitioning or placement
Abstract
The invention discloses a layout construction method and system of a resonant cavity graph, a storage medium and electronic equipment. The resonant cavity comprises two conductor transmission lines with consistent line distances and equal line widths, and the layout construction method comprises the following steps: acquiring shape parameters of a polygonal frame and a resonant cavity, wherein the polygonal frame is marked with a first marking point and a second marking point, and the shape parameters comprise the total length, the line width and the line distance of the resonant cavity; generating an auxiliary line with the total length from the first mark point to the second mark point in the polygonal frame; and generating a resonant cavity graph which takes the auxiliary line as a central line and is positioned in the polygonal frame according to the line width and the line distance. By the mode, the resonant cavity graph meeting the requirements can be automatically generated, and the resonant cavity drawing efficiency and accuracy can be greatly improved.
Description
Technical Field
The invention relates to the field of integrated circuit layout design, in particular to a layout construction method and system of a resonant cavity graph, a storage medium and electronic equipment.
Background
In integrated circuits, the resonant cavity, which is mainly used for transmitting microwave frequency signals, is formed by two parallel conductor transmission lines. Currently, in the integrated circuit layout design, the resonant cavity is mostly drawn manually. However, the layout space left for the resonant cavity in the integrated circuit layout is not fixed, the shape of the resonant cavity needs to be adapted to the reserved layout space, and the total length of the resonant cavity needs to be adapted to the design frequency. Therefore, layout designers often need to manually draw resonant cavity patterns according to the reserved layout space, however, the manual drawing of resonant cavity patterns is very complicated due to factors such as shape constraints of the layout space, total length constraints of the resonant cavity, line width constraints of the resonant cavity and the like. Therefore, how to automatically draw a resonant cavity meeting the requirements in a given layout space is an urgent need.
Disclosure of Invention
The invention aims to provide a layout construction method, a layout construction system, a storage medium and electronic equipment of a resonant cavity graph, which are used for solving the problem that the manual drawing of the resonant cavity graph in the prior art is complicated and can automatically generate the resonant cavity graph meeting requirements.
In order to solve the above technical problem, the present invention provides a layout construction method for a resonant cavity pattern, where the resonant cavity includes two conductor transmission lines with a consistent line distance and an equal line width, and the layout construction method includes:
Acquiring shape parameters of a polygonal frame and a resonant cavity, wherein the polygonal frame is marked with a first marking point and a second marking point, and the shape parameters comprise the total length, the line width and the line distance of the resonant cavity;
generating an auxiliary line with the length of the total length from the first mark point to the second mark point in the polygonal frame;
and generating a resonant cavity graph which takes the auxiliary line as a central line and is positioned in the polygonal frame according to the line width and the line distance.
Preferably, the shape parameter further includes a radius range;
the auxiliary line comprises a straight line section and an arc with the radius within the radius range, the straight line section is tangentially connected with the arc, the parts of the auxiliary line connected with the first mark point and the second mark point are straight line sections, and the straight line section connected with the first mark point and the second mark point is perpendicular to the line section where the first mark point and the second mark point are located.
Preferably, the other straight line segments of the auxiliary line except for the straight line segment connecting the first marking point and the second marking point are all perpendicular to the line segment where the first marking point is located.
Preferably, the line segment of the first mark point on the polygonal frame is perpendicular to the line segment of the second mark point.
Preferably, the circular arcs include a half circular arc and a quarter circular arc, the half circular arc is connected between mutually parallel straight line segments, and the quarter circular arc is connected between mutually perpendicular straight line segments.
Preferably, the step of generating an auxiliary line having a length equal to the total length from the first mark point to the second mark point within the polygonal frame includes:
selecting a median from the radius range as a temporary radius;
generating an auxiliary line from the first mark point to the second mark point in the polygonal frame based on the temporary radius, and calculating the length of the auxiliary line;
judging whether the length corresponding to the temporary radius is equal to the total length;
and if the length corresponding to the temporary radius is equal to the total length, taking the temporary radius as a target radius, and taking an auxiliary line corresponding to the target radius as a final auxiliary line.
Preferably, the step of generating an auxiliary line with a length equal to the total length from the first mark point to the second mark point within the polygonal frame further includes:
if the length corresponding to the temporary radius is not equal to the total length, judging whether the length corresponding to the temporary radius is larger than or smaller than the total length;
If the length corresponding to the temporary radius is larger than the total length, judging whether the difference value between the currently selected temporary radius and the previously selected temporary radius is smaller than a preset threshold value;
if the temporary radius is smaller than a preset threshold, taking the temporary radius as a target radius, equivalently shortening the rest straight line segments except the straight line segment connecting the first marking point and the second marking point in the auxiliary line corresponding to the target radius, and taking the shortened auxiliary line as a final auxiliary line, wherein the sum of the shortened lengths of all the straight line segments is equal to the difference between the length corresponding to the temporary radius and the total length;
and if the radius is not smaller than the preset threshold, replacing the lower limit value of the radius range with the temporary radius, and continuing to perform the step of selecting a median value from the radius range as the temporary radius.
Preferably, the step of generating an auxiliary line with a length equal to the total length from the first mark point to the second mark point within the polygon frame further includes:
and if the length corresponding to the temporary radius is less than the total length, replacing the upper limit value of the radius range with the temporary radius, and continuing to select a median value from the radius range as the temporary radius.
Preferably, before the step of selecting the median from the radius range as the temporary radius, the method further comprises:
generating auxiliary lines from the first mark point to the second mark point in the polygonal frame based on the upper limit value and the lower limit value of the radius range respectively, and calculating the lengths of the auxiliary lines;
judging whether the total length is between the length corresponding to the upper limit value and the length corresponding to the lower limit value;
if the length is between the length corresponding to the upper limit value and the length corresponding to the lower limit value, the step of selecting a median value from the radius range as a temporary radius is carried out;
and if the length is not between the length corresponding to the upper limit value and the length corresponding to the lower limit value, providing a prompt for changing the total length or the radius range.
Preferably, the layout construction method further includes:
and generating an air bridge graph crossing two sides of the auxiliary line on the auxiliary line.
Preferably, the step of generating an air bridge pattern on the auxiliary line across both sides of the auxiliary line includes:
acquiring the width and the span of an air bridge and the distance between adjacent air bridges;
after the insertion point and the insertion angle of the first air bridge graph are determined on the auxiliary line, the insertion point and the insertion angle of the current air bridge graph are determined from the second air bridge graph according to the distance between the adjacent air bridges;
Judging whether the current air bridge graph interferes with each generated air bridge graph or not;
if the interference exists, moving the insertion point position of the current air bridge graph on the auxiliary line until the insertion point position does not interfere with each generated air bridge graph, and generating the current air bridge graph at the insertion point after the movement position according to the insertion angle, the width and the span;
and if no interference exists, generating the current air bridge graph at the insertion point according to the insertion angle, the width and the span.
Preferably, the center point of each air bridge pattern is an insertion point of each air bridge pattern, and the center line of the span direction of each air bridge pattern is perpendicular to the tangent line at the insertion point of each air bridge pattern
In order to solve the above technical problem, the present invention further provides a layout construction system for a resonator pattern, where the resonator pattern includes two conductor transmission lines with a consistent line distance and an equal line width, and the layout construction system includes:
the acquisition module is used for acquiring the shape parameters of a polygonal frame and a resonant cavity, wherein the polygonal frame is marked with a first marking point and a second marking point, and the shape parameters comprise the total length, the line width and the line distance of the resonant cavity;
The generating module is used for generating an auxiliary line from the first mark point to the second mark point in the polygonal frame, wherein the auxiliary line has the total length;
and the layout module is used for generating a resonant cavity graph which takes the auxiliary line as a central line and is positioned in the polygonal frame according to the line width and the line distance.
Preferably, the layout module is further configured to generate an air bridge pattern on the auxiliary line across two sides of the auxiliary line.
In order to solve the above technical problem, the present invention further provides a storage medium, in which a computer program is stored, and the computer program is configured to execute the method for constructing a layout of a resonator pattern according to any one of the above embodiments when the computer program is run.
In order to solve the above technical problem, the present invention further provides an electronic device, which includes a memory and a processor, wherein the memory stores a computer program, and the processor is configured to run the computer program to perform the layout construction method for the resonator pattern according to any one of the foregoing descriptions.
The method comprises the steps of firstly obtaining a polygonal frame and shape parameters of a resonant cavity, marking a first marking point and a second marking point on the polygonal frame, wherein the shape parameters comprise the total length, the line width and the line distance of the resonant cavity, then generating an auxiliary line with the total length from the first marking point to the second marking point in the polygonal frame, and finally generating a resonant cavity graph which takes the auxiliary line as a central line and is positioned in the polygonal frame according to the line width and the line distance, so that the resonant cavity graph meeting requirements can be automatically generated.
The layout construction system of the resonant cavity graph, the storage medium and the electronic device provided by the invention belong to the same inventive concept as the layout construction method of the resonant cavity graph, so that the same beneficial effects are achieved, and the description is omitted.
Drawings
Fig. 1 is a schematic structural diagram of a resonant cavity.
Fig. 2 is a schematic flow chart of a layout construction method of a resonator pattern according to a first embodiment of the present invention.
FIG. 3 is a schematic diagram of a polygonal bounding box obtained by the layout construction method for the resonator diagram of FIG. 2.
FIG. 4 is a schematic diagram of auxiliary lines generated by the layout construction method of the resonator pattern of FIG. 2.
FIG. 5 is a schematic diagram of a cavity pattern generated by the cavity pattern layout construction method of FIG. 2.
Fig. 6 is a schematic flowchart of step S12 in the layout construction method of the cavity pattern according to the second embodiment of the present invention.
Fig. 7 is a flowchart illustrating the process before step S121 in fig. 6.
Fig. 8 is a schematic flow chart of a layout construction method of a cavity pattern according to a third embodiment of the present invention.
Fig. 9 is a detailed flowchart of step S14 in fig. 8.
Fig. 10 is a schematic diagram of an air bridge pattern generated on an auxiliary line.
FIG. 11 is a schematic diagram of a layout construction system of resonator patterns according to a fourth embodiment of the present invention.
Detailed Description
The following describes in more detail embodiments of the present invention with reference to the schematic drawings. Advantages and features of the present invention will become apparent from the following description and claims. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is provided for the purpose of facilitating and clearly illustrating embodiments of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "upper", "lower", "left", "right", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless explicitly specified otherwise.
The first embodiment of the invention provides a layout construction method of a resonant cavity graph. Referring to fig. 1, the resonant cavity includes two conductor transmission lines, each of which has a line width of W and a line distance of D.
Referring to fig. 2, the layout construction method of the present embodiment includes:
s11: and acquiring shape parameters of the polygonal frame and the resonant cavity, wherein the polygonal frame is marked with a first marking point and a second marking point, and the shape parameters comprise the total length, the line width and the line distance of the resonant cavity.
The polygonal frame may be drawn manually by a user, or may be generated according to parameters input by the user, for example, the user inputs coordinates of each vertex of the polygonal frame, and then sequentially connects each vertex according to a preset order to generate the polygonal frame. Similarly, the first marking point and the second marking point may be marked manually by the user, or may be marked by parameters such as coordinates input by the user.
The total length, line width and line spacing of the resonator may be manually input by a user, or may be directly or indirectly derived from user-input resonator parameters, e.g., the user simply inputs the total width and line spacing of the resonator, and the line width is then (total width-line spacing)/2.
The polygon bounding box may be any shape made up of line segments, typically with as few sides as possible. As shown in fig. 3, in one application, the polygonal frame is a rectangle, and a first mark point a and a second mark point B are marked on the polygonal frame.
S12: and generating an auxiliary line with the total length from the first mark point to the second mark point in the polygonal frame.
The auxiliary line may have any shape as long as the length is the total length of the resonant cavity. In general, in order to reduce the occupied area of the auxiliary lines, the auxiliary lines should be bent as much as possible, but the bending degree should be considered, and smooth bending should be ensured as much as possible, so as to avoid the phenomena of deviation from the design parameters of the resonant cavity, such as signal reflection, resonance frequency shift, and the like.
In this embodiment, the shape parameter of the resonant cavity further includes a radius range. As shown in fig. 4, the auxiliary line includes a straight line segment and a circular arc with a radius within a radius range, the straight line segment is tangentially connected with the circular arc, the portions of the auxiliary line connected with the first mark point a and the second mark point B are both straight line segments, and the straight line segment connecting the first mark point a and the second mark point B is perpendicular to the line segment where the first mark point a and the second mark point B are located. The line segments of the first mark point A and the second mark point B are line segments on the polygonal frame.
In order to facilitate the generation of the auxiliary line, please refer to fig. 4, the other straight line segments of the auxiliary line except the straight line segment connecting the first mark point a and the second mark point B are perpendicular to the line segment where the first mark point a is located.
In order to further facilitate the generation of the auxiliary line, the line segment of the first mark point a on the polygonal frame is perpendicular to the line segment of the second mark point B. The arc comprises a half arc and a quarter arc, the half arc is connected between the mutually parallel straight line sections, and the quarter arc is connected between the mutually perpendicular straight line sections. Because only two parallel straight line segments can be connected through a half circular arc, the distance between the parallel straight line segments in the auxiliary line is the diameter of the circular arc.
There are various generation manners of the auxiliary line, and this embodiment adopts a relatively efficient generation manner, which specifically includes:
generating a current straight-line segment intersected with the polygon frame between the first marking point and the second marking point according to the sequence, wherein when the current straight-line segment is a first straight-line segment, the starting point is the first marking point;
moving the intersection point of the current straight line segment and the polygon frame towards the starting point of the current straight line segment in a stepping mode;
When the shortest distance from the intersection point after stepping movement to the polygonal frame is greater than or equal to W + D/2 for the first time, taking the intersection point after stepping movement as the end point of the current straight line segment;
generating a vertical line segment with the length being 2 times of the radius of the circular arc at the side where the end point of the current straight line segment faces the second mark point;
judging whether the vertical line segment is intersected with the line segment where the second mark point is located;
if the two straight line segments do not intersect, generating a next straight line segment intersecting with the polygon frame by taking the endpoint of the vertical line segment as a starting point, taking the next straight line segment as a current straight line segment, and performing a step of moving the intersection point of the current straight line segment and the polygon frame towards the starting point of the current straight line segment in a stepping manner;
if the two straight line segments intersect, generating a straight line segment perpendicular to the line segment where the second marking point is located at the second marking point, taking the intersection point of the straight line segment connecting the second marking point and the nearest straight line segment as the end point of the nearest straight line segment, and deleting the part outside the end point of the nearest straight line segment, wherein the length of the straight line segment connecting the second marking point is larger than the radius of the circular arc;
and replacing the vertical line segment between every two adjacent parallel straight line segments by a half circular arc, and performing corner rounding treatment on the quarter circular arc on the inflection points of the mutually perpendicular straight line segments to further obtain the auxiliary line.
When the vertical line segment is replaced, the half circular arc is tangent to the vertical line segment.
S13: and generating a resonant cavity graph which takes the auxiliary line as a central line and is positioned in the polygonal frame according to the line width and the line distance.
The resonant cavity graph can be generated through Boolean operation, a first line graph with the line width of 2W + D and with the auxiliary line as the center line and a second line graph with the line width of D and with the auxiliary line as the center line are generated according to the line width and the line distance, then Boolean non-operation is conducted on the first line graph and the second line graph, and finally the resonant cavity graph is obtained.
It should be noted that the term "in the polygonal frame" in the present invention means not exceeding the polygonal frame, and the resonant cavity pattern and the polygonal frame are completely or partially overlapped and belong to the situation of not exceeding the polygonal frame. As shown in fig. 5, except that the edge of the resonant cavity pattern where the first mark point a and the edge of the second mark point B are overlapped with the polygonal frame, the rest of the resonant cavity pattern is located in the polygonal frame.
Through the above steps, the present embodiment can implement layout construction of a resonant cavity graph for a polygonal frame marked with a first mark point and a second mark point and shape parameters of a resonant cavity (the shape parameters include a total length, a line width, and a line distance of the resonant cavity), where the constructed resonant cavity graph is located in the polygonal frame and has a length equal to the total length of the resonant cavity.
The second embodiment of the invention provides a layout construction method of a resonant cavity graph. The layout construction method of the present embodiment includes all the technical features of the first embodiment, except that, referring to fig. 6, the step of generating the auxiliary lines with total length from the first mark point to the second mark point in the polygon frame, that is, the step S12 includes:
s121: and selecting a median value from the radius range as a temporary radius.
Wherein, the median of the radius range is the average value of the lower limit value and the upper limit value of the radius range.
S122: and generating an auxiliary line from the first mark point to the second mark point in the polygonal frame based on the temporary radius, and calculating the length of the auxiliary line.
The method comprises the steps of determining the distance between two adjacent parallel straight line segments and the shortest distance from the end point of each straight line segment except a first mark point and a second mark point to a polygonal frame according to a temporary radius, then generating each straight line segment, finally connecting the two parallel straight line segments through a half circular arc, and connecting the two vertical straight line segments through a quarter circular arc, thereby obtaining an auxiliary line.
The length of the auxiliary line is the sum of the arc lengths of all circular arcs and the lengths of all straight line segments.
S123: and judging whether the length corresponding to the temporary radius is equal to the total length.
S124: and if the length corresponding to the temporary radius is equal to the total length, taking the temporary radius as a target radius and taking the auxiliary line corresponding to the target radius as a final auxiliary line.
When the length corresponding to the temporary radius is equal to the total length of the resonant cavity, the selected radius is the optimal radius, and therefore the auxiliary line corresponding to the target radius is used as the final auxiliary line.
Since the arc length is calculated in relation to pi, which is not an integer, there may be situations where the length corresponding to the temporary radius is not equal to the total length. In this embodiment, the step of generating an auxiliary line with a total length from the first mark point to the second mark point within the polygon frame further includes:
s125: and if the length corresponding to the temporary radius is not equal to the total length, judging whether the length corresponding to the temporary radius is greater than or less than the total length.
S126: and if the length corresponding to the temporary radius is larger than the total length, judging whether the difference value between the currently selected temporary radius and the previously selected temporary radius is smaller than a preset threshold value.
S127: and if the temporary radius is smaller than the preset threshold, taking the temporary radius as a target radius, equivalently shortening the rest straight line segments except the straight line segment connecting the first mark point and the second mark point in the auxiliary line corresponding to the target radius, and taking the shortened auxiliary line as a final auxiliary line, wherein the sum of the shortened lengths of all the straight line segments is equal to the difference between the length corresponding to the temporary radius and the total length.
If the length corresponding to the temporary radius is larger than the total length, but the difference value between the length and the total length is smaller than a preset threshold value, the optimal radius when the currently selected temporary radius is within a certain precision range is indicated, therefore, the temporary radius is selected as a target radius, and the other straight line segments except the straight line segment connecting the first mark point and the second mark point are equivalently shortened to make up the difference value, so that the auxiliary line with the length being the total length of the resonant cavity is obtained.
S128: and if the radius is not smaller than the preset threshold, replacing the lower limit value of the radius range with the temporary radius, and continuing to select a median value from the radius range as the temporary radius.
The smaller the radius of the arc is, the more likely the number of the straight line segments is to be increased, so that the length of the auxiliary line generally increases with the decrease of the radius, and if the length corresponding to the temporary radius is greater than the total length and the difference between the two is smaller than a preset threshold, it indicates that the currently selected temporary radius is too small, so that after the temporary radius replaces the lower limit value of the radius range, and when the median is selected from the radius range again as the temporary radius, the median is inevitably larger than the last selected temporary radius, so that the length of the generated auxiliary line is decreased.
Further, the step of generating an auxiliary line with a total length from the first mark point to the second mark point in the polygon frame further includes:
s129: and if the length corresponding to the temporary radius is less than the total length, replacing the upper limit value of the radius range with the temporary radius, and continuing to select a median value from the radius range as the temporary radius.
The larger the radius of the circular arc is, the more likely the number of straight line segments is to be reduced, so that the length of the auxiliary line is generally reduced along with the increase of the radius, if the length corresponding to the temporary radius is smaller than the total length, it means that the currently selected temporary radius is larger, after replacing the upper limit value of the radius range with the temporary radius, when selecting the median value from the radius range again as the temporary radius, the median value is inevitably smaller than the temporary radius selected last time, and thus the length of the generated auxiliary line is increased.
It should be noted that, in this embodiment, when the length corresponding to the temporary radius is smaller than the total length, the length of the straight line segment is not increased to compensate for the difference between the length corresponding to the temporary radius and the total length, because the increase of the length of the straight line segment may cause the generated resonant cavity pattern to exceed the polygonal frame.
If there may be a range of radii and/or an unreasonable overall length setting, there is a case where any radius value in the range of radii is selected so as not to generate an auxiliary line having a length equal to the overall length of the cavity. In this case, in this embodiment, referring to fig. 7, before the step of selecting the median from the radius range as the temporary radius, the method further includes:
S201: and generating an auxiliary line from the first mark point to the second mark point in the polygonal frame based on the upper limit value and the lower limit value of the radius range respectively, and calculating the length of the auxiliary line.
S202: and judging whether the total length is between the length corresponding to the upper limit value and the length corresponding to the lower limit value.
S121: and if the length is between the length corresponding to the upper limit value and the length corresponding to the lower limit value, selecting a median value from the radius range as a temporary radius.
The total length of the resonant cavity is between the length corresponding to the upper limit value and the length corresponding to the lower limit value, which indicates that a radius with the optimal radius value is inevitably present in the radius range, and an auxiliary line with the length being the total length of the resonant cavity can be generated.
S203: if the length is not between the length corresponding to the upper limit value and the length corresponding to the lower limit value, a prompt for changing the total length or the radius range is provided.
The total length of the resonant cavity is between the length corresponding to the upper limit value and the length corresponding to the lower limit value, which indicates that no matter any radius value in the radius range is selected, an auxiliary line with the length being the total length of the resonant cavity cannot be generated, and at the moment, the total length or the radius range of the resonant cavity needs to be changed, so that a prompt for changing the total length or the radius range is provided.
The third embodiment of the invention provides a layout construction method of a resonant cavity graph. The layout construction method of the present embodiment includes all the technical features of the first embodiment or the second embodiment, and referring to fig. 8, the difference is that the layout construction method of the present embodiment further includes:
s14: and generating an air bridge pattern crossing two sides of the auxiliary line on the auxiliary line.
After the air bridge graph is generated, the auxiliary lines can be deleted or reserved according to actual needs.
Specifically, referring to fig. 9, the step of generating the air bridge pattern crossing both sides of the auxiliary line on the auxiliary line includes:
s141: and acquiring the width and the span of the air bridge and the distance between the adjacent air bridges.
As shown in fig. 10, the span L is a distance between the air bridge and both ends of the crossing auxiliary line, the width M is a dimension of the air bridge perpendicular to the span direction, the distance S between adjacent air bridges is a length of a center line between the adjacent air bridges, and the center line is a central axis of the air bridge in the span direction. The width, the span and the spacing between adjacent air bridges are determined according to the signal transmission requirement, the relevant parameters of the substrate and the like when the air bridge graph is constructed.
S142: after the insertion point and the insertion angle of the first air bridge pattern are determined on the auxiliary line, the insertion point and the insertion angle of the current air bridge pattern are determined from the second air bridge pattern according to the distance between the adjacent air bridges.
S143: and judging whether the current air bridge pattern interferes with each generated air bridge pattern.
And if the shortest distance between the two air bridge patterns is smaller than a set value, the two air bridge patterns are interfered.
S144: if the interference exists, the insertion point position of the current air bridge graph is moved on the auxiliary line until the interference does not exist with each generated air bridge graph, and the current air bridge graph is generated at the insertion point after the movement position according to the insertion angle, the width and the span.
When the position of the insertion point of the current air bridge graph is moved, stepping movement can be carried out according to a preset step length.
S145: if no interference exists, the current air bridge pattern is generated at the insertion point according to the insertion angle, width and span.
Assuming that the distance between the determined insertion point of the first air bridge pattern and the first mark point A is the distance S, determining a second air bridge pattern from the second air bridge pattern according to the distance S of the adjacent air bridges, then judging whether the second air bridge pattern interferes with each generated air bridge pattern (namely the first air bridge pattern), if so, moving the insertion point position of the current air bridge pattern in the direction away from the first air bridge pattern on the auxiliary line until the insertion point position does not interfere with each generated air bridge pattern. At this time, a second air bridge pattern is generated at the insertion point after the moving position according to the insertion angle.
And generating other air bridge patterns according to the process until the air bridge patterns with the specified quantity are generated or the air bridge patterns cannot be generated between the second mark point and the adjacent air bridge patterns.
As shown in fig. 10, some of the air bridge patterns generated on the auxiliary line have a distance S, and some of the air bridge patterns are larger than the distance S, for example, the distances between all the air bridge patterns on the first straight line segment are the distance S, and the distance between the last air bridge pattern on the first straight line segment and the first air bridge pattern on the second straight line segment is larger than the distance S.
In this embodiment, the center point of each air bridge pattern is the insertion point of each air bridge pattern, and the center line in the span direction of each air bridge pattern is perpendicular to the tangent line at the insertion point of each air bridge pattern. As shown in fig. 10, the intersection point of the center line in the span direction and the center line in the width direction of each air bridge pattern is the center point of the air bridge pattern, the center point is located on the auxiliary line, and the center line in the span direction is perpendicular to the tangent line of the auxiliary line at the center point, or the center line in the width direction is parallel to the tangent line of the auxiliary line at the center point.
A fourth embodiment of the invention provides a layout construction system for resonator patterns. Referring to fig. 1, the resonant cavity includes two conductor transmission lines, each of which has a line width of W and a line distance of D.
Referring to FIG. 11, the layout construction system of the present embodiment includes:
the obtaining module 11 is configured to obtain a polygonal frame and shape parameters of the resonant cavity, where the polygonal frame is marked with a first mark point and a second mark point, and the shape parameters include a total length, a line width, and a line distance of the resonant cavity.
The polygonal frame may be drawn manually by a user, or may be generated according to parameters input by the user, for example, the number of sides of the polygonal frame and the length of each side input by the user are sequentially connected according to a preset sequence to generate the polygonal frame. Similarly, the first marking point and the second marking point may be marked manually by the user, or may be marked by parameters such as coordinates input by the user.
The total length, line width and line distance of the resonant cavity can be manually input by a user or directly or indirectly obtained according to the resonant cavity parameters input by the user.
The polygon bounding box may be any shape made up of line segments, typically with as few sides as possible. In the present embodiment, the polygonal frame is preferably a quadrangle.
And a generating module 12, configured to generate an auxiliary line with a total length from the first mark point to the second mark point in the polygon frame.
The auxiliary line may have any shape as long as the length is the total length of the resonant cavity. In general, in order to reduce the occupied area of the auxiliary lines, the auxiliary lines should be bent as much as possible, but the bending degree should be considered, and smooth bending should be ensured as much as possible, so as to avoid the phenomena of deviating from the design parameters of the resonant cavity, such as signal reflection, resonance frequency shift, and the like.
And the layout module 13 is used for generating a resonant cavity graph which takes the auxiliary line as a central line and is positioned in the polygonal frame according to the line width and the line distance.
In the process of generating the resonant cavity pattern, for example, a first line pattern with a line width of 2W + D and a second line pattern with a line width of D are generated according to a line width and a line distance, and then a boolean non-operation is performed on the first line pattern and the second line pattern to finally obtain the resonant cavity pattern.
It should be noted that the term "within the polygonal frame" in the present invention means not exceeding the polygonal frame, and the resonant cavity pattern and the polygonal frame are completely or partially overlapped in the case of not exceeding the polygonal frame.
In this embodiment, the layout module 13 is also used to generate air bridge patterns on the auxiliary lines across both sides of the auxiliary lines.
Through the manner, the layout construction of the resonant cavity graph can be realized for the polygonal frame marked with the first mark point and the second mark point and the shape parameters (the shape parameters comprise the total length, the line width and the line distance of the resonant cavity) of the resonant cavity, and the constructed resonant cavity graph is positioned in the polygonal frame and has the length of the total length of the resonant cavity.
The present invention also provides a storage medium, in which a computer program is stored, and the computer program is configured to execute the layout construction method of the cavity pattern according to any one of the first embodiment, the second embodiment, and the third embodiment when running.
Specifically, in this embodiment, the storage medium may include, but is not limited to: various media capable of storing computer programs, such as a usb disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a removable hard disk, a magnetic disk, or an optical disk.
The invention further provides an electronic device, which includes a memory and a processor, wherein the memory stores a computer program, and the processor is configured to execute the computer program to execute the layout construction method of the cavity pattern according to any one of the first embodiment, the second embodiment and the third embodiment.
In particular, the memory and the processor may be connected by a data bus. In addition, the electronic device may further include a transmission device and an input/output device, wherein the transmission device is connected to the processor, and the input/output device is connected to the processor.
In the description herein, references to the description of "one embodiment," "some embodiments," "an example" or "a specific example" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. And the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments. Furthermore, various embodiments or examples described in this specification can be combined and combined by those skilled in the art.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention in any way. It will be understood by those skilled in the art that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (16)
1. A layout construction method for a resonant cavity graph, wherein the resonant cavity comprises two conductor transmission lines with consistent line distance and equal line width, and the layout construction method comprises the following steps:
acquiring shape parameters of a polygonal frame and a resonant cavity, wherein the polygonal frame is marked with a first marking point and a second marking point, and the shape parameters comprise the total length, the line width and the line distance of the resonant cavity;
generating an auxiliary line with the length of the total length from the first mark point to the second mark point in the polygonal frame;
and generating a resonant cavity graph which takes the auxiliary line as a central line and is positioned in the polygonal frame according to the line width and the line distance.
2. The layout construction method according to claim 1, wherein the shape parameter further includes a radius range;
the auxiliary line comprises a straight line section and an arc with the radius within the radius range, the straight line section is tangentially connected with the arc, the parts of the auxiliary line connected with the first mark point and the second mark point are straight line sections, and the straight line section connected with the first mark point and the second mark point is perpendicular to the line sections of the first mark point and the second mark point.
3. The layout construction method according to claim 2, wherein the straight line segments of the auxiliary lines other than the straight line segment connecting the first mark point and the second mark point are perpendicular to the line segment of the first mark point.
4. The method for building layout according to claim 3, wherein the line segment of the polygon border where the first mark point is located is perpendicular to the line segment of the polygon border where the second mark point is located.
5. The layout construction method according to claim 4, wherein the circular arcs comprise a half circular arc and a quarter circular arc, and wherein a half circular arc is connected between mutually parallel straight line segments and a quarter circular arc is connected between mutually perpendicular straight line segments.
6. The layout construction method according to claim 5, wherein the step of generating auxiliary lines with the total length from the first mark point to the second mark point within the polygon frame comprises:
selecting a median value from the radius range as a temporary radius;
generating an auxiliary line from the first mark point to the second mark point in the polygonal frame based on the temporary radius, and calculating the length of the auxiliary line;
Judging whether the length corresponding to the temporary radius is equal to the total length;
and if the length corresponding to the temporary radius is equal to the total length, taking the temporary radius as a target radius, and taking an auxiliary line corresponding to the target radius as a final auxiliary line.
7. The layout construction method according to claim 6, wherein the step of generating auxiliary lines with the total length from the first mark point to the second mark point within the polygon frame further comprises:
if the length corresponding to the temporary radius is not equal to the total length, judging whether the length corresponding to the temporary radius is larger than or smaller than the total length;
if the length corresponding to the temporary radius is larger than the total length, judging whether the difference value between the currently selected temporary radius and the previously selected temporary radius is smaller than a preset threshold value;
if the temporary radius is smaller than a preset threshold, taking the temporary radius as a target radius, equivalently shortening the rest straight line segments except the straight line segment connecting the first marking point and the second marking point in the auxiliary line corresponding to the target radius, and taking the shortened auxiliary line as a final auxiliary line, wherein the sum of the shortened lengths of all the straight line segments is equal to the difference between the length corresponding to the temporary radius and the total length;
And if the radius is not smaller than the preset threshold, replacing the lower limit value of the radius range with the temporary radius, and continuing to perform the step of selecting a median value from the radius range as the temporary radius.
8. The layout construction method according to claim 7, wherein the step of generating auxiliary lines with the total length from the first mark point to the second mark point within the polygon frame further comprises:
and if the length corresponding to the temporary radius is smaller than the total length, replacing the upper limit value of the radius range with the temporary radius, and continuing to select a median value from the radius range as the temporary radius.
9. Layout construction method according to any of claims 6 to 8, characterized in that, before the step of selecting a median value from the radius range as temporary radius, it further comprises:
generating auxiliary lines from the first mark point to the second mark point in the polygonal frame based on the upper limit value and the lower limit value of the radius range respectively, and calculating the lengths of the auxiliary lines;
judging whether the total length is between the length corresponding to the upper limit value and the length corresponding to the lower limit value;
If the length is between the length corresponding to the upper limit value and the length corresponding to the lower limit value, the step of selecting a median value from the radius range as a temporary radius is carried out;
and if the length is not between the length corresponding to the upper limit value and the length corresponding to the lower limit value, providing a prompt for changing the total length or the radius range.
10. The layout construction method according to claim 1, further comprising:
and generating an air bridge graph crossing two sides of the auxiliary line on the auxiliary line.
11. The layout construction method according to claim 10, wherein the step of generating the air bridge pattern on the auxiliary line across both sides of the auxiliary line comprises:
acquiring the width and the span of an air bridge and the distance between adjacent air bridges;
after the insertion point and the insertion angle of the first air bridge graph are determined on the auxiliary line, the insertion point and the insertion angle of the current air bridge graph are determined from the second air bridge graph according to the distance between the adjacent air bridges;
judging whether the current air bridge graph interferes with each generated air bridge graph or not;
if the interference exists, moving the insertion point position of the current air bridge graph on the auxiliary line until the insertion point position does not interfere with each generated air bridge graph, and generating the current air bridge graph at the insertion point after the movement position according to the insertion angle, the width and the span;
If no interference exists, generating a current air bridge graph according to the insertion angle, the width and the span at an insertion point.
12. The layout construction method according to claim 11, wherein a center point of each of the air bridge patterns is an insertion point of each of the air bridge patterns, and a center line in a span direction of each of the air bridge patterns is perpendicular to a tangent line at the insertion point of each of the air bridge patterns.
13. A layout construction system for a resonator pattern, said resonator pattern comprising two conductive lines of equal line width and having a consistent line spacing throughout, said layout construction system comprising:
the acquisition module is used for acquiring the shape parameters of a polygonal frame and a resonant cavity, wherein the polygonal frame is marked with a first marking point and a second marking point, and the shape parameters comprise the total length, the line width and the line distance of the resonant cavity;
the generating module is used for generating an auxiliary line with the length being the total length from the first mark point to the second mark point in the polygonal frame;
and the layout module is used for generating a resonant cavity graph which takes the auxiliary line as a central line and is positioned in the polygonal frame according to the line width and the line distance.
14. The layout construction system of claim 13, wherein the layout module is further configured to generate an air bridge pattern on the auxiliary line across both sides of the auxiliary line.
15. A storage medium having stored thereon a computer program configured to perform the method of layout construction of a cavity pattern of any of claims 1 to 12 when executed.
16. An electronic device comprising a memory having a computer program stored therein and a processor configured to execute the computer program to perform the method of layout construction of a cavity pattern according to any of claims 1 to 12.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210335864.3A CN114757138A (en) | 2022-03-31 | 2022-03-31 | Layout construction method and system of resonant cavity pattern, storage medium and electronic device |
| PCT/CN2023/084518 WO2023185883A1 (en) | 2022-03-31 | 2023-03-28 | Layout construction method and system for resonant cavity graph, storage medium and electronic device |
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| CN202210335864.3A CN114757138A (en) | 2022-03-31 | 2022-03-31 | Layout construction method and system of resonant cavity pattern, storage medium and electronic device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023185883A1 (en) * | 2022-03-31 | 2023-10-05 | 本源科仪(成都)科技有限公司 | Layout construction method and system for resonant cavity graph, storage medium and electronic device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2023185883A1 (en) * | 2022-03-31 | 2023-10-05 | 本源科仪(成都)科技有限公司 | Layout construction method and system for resonant cavity graph, storage medium and electronic device |
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