CN114752761A - Method for enhancing ore grinding and leaching efficiency of vanadium shale by utilizing microwaves - Google Patents
Method for enhancing ore grinding and leaching efficiency of vanadium shale by utilizing microwaves Download PDFInfo
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- 229910052720 vanadium Inorganic materials 0.000 title claims abstract description 176
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 title claims abstract description 176
- 238000002386 leaching Methods 0.000 title claims abstract description 77
- 238000000227 grinding Methods 0.000 title claims abstract description 73
- 238000000034 method Methods 0.000 title claims abstract description 58
- 230000002708 enhancing effect Effects 0.000 title claims abstract description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 37
- 239000002245 particle Substances 0.000 claims abstract description 36
- 230000008569 process Effects 0.000 claims abstract description 29
- 238000010791 quenching Methods 0.000 claims abstract description 18
- 230000000171 quenching effect Effects 0.000 claims abstract description 18
- 239000002002 slurry Substances 0.000 claims abstract description 12
- 238000002156 mixing Methods 0.000 claims abstract description 6
- 238000012216 screening Methods 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 28
- 238000009434 installation Methods 0.000 claims description 26
- 238000012545 processing Methods 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 2
- 238000005265 energy consumption Methods 0.000 abstract description 28
- 230000000694 effects Effects 0.000 abstract description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052799 carbon Inorganic materials 0.000 abstract description 12
- 238000000605 extraction Methods 0.000 abstract description 10
- 238000005728 strengthening Methods 0.000 abstract description 8
- 239000002131 composite material Substances 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 229910052500 inorganic mineral Inorganic materials 0.000 description 6
- 239000011707 mineral Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 239000010445 mica Substances 0.000 description 4
- 229910052618 mica group Inorganic materials 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 230000002787 reinforcement Effects 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 239000003245 coal Substances 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- 229910018516 Al—O Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005906 dihydroxylation reaction Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 239000010433 feldspar Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052683 pyrite Inorganic materials 0.000 description 2
- 239000011028 pyrite Substances 0.000 description 2
- NIFIFKQPDTWWGU-UHFFFAOYSA-N pyrite Chemical compound [Fe+2].[S-][S-] NIFIFKQPDTWWGU-UHFFFAOYSA-N 0.000 description 2
- 229910052604 silicate mineral Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000012795 verification Methods 0.000 description 2
- 238000003723 Smelting Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007885 magnetic separation Methods 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000004537 pulping Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910001784 vanadium mineral Inorganic materials 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B4/00—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
- C22B4/04—Heavy metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B1/00—Preliminary treatment of ores or scrap
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
- C22B3/04—Extraction of metal compounds from ores or concentrates by wet processes by leaching
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/22—Obtaining vanadium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B4/00—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
- C22B4/08—Apparatus
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
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Abstract
The invention relates to a method for enhancing ore grinding and leaching efficiency of vanadium shale by utilizing microwaves. The technical scheme is as follows: and crushing and screening the vanadium shale raw ore to obtain the vanadium shale raw ore with the particle size of less than 1.5mm and the particle size of 1.5-10.0 mm. Starting a continuous microwave treatment device for enhancing the grinding and leaching efficiency of the vanadium shale, feeding raw vanadium shale ore with the particle size of 1.5-10.0 mm from a feeding hole at the speed of 60-150 kg/h, and performing water quenching according to the mass ratio of the obtained microwave treated vanadium shale to water of 1: 1-3 to obtain water quenching slurry; and mixing the water quenching slurry with the vanadium shale raw ore with the particle size of less than 1.5mm according to the mass ratio of the vanadium shale raw ore with the particle size of less than 1.5mm to the vanadium shale raw ore with the particle size of 1.5-10.0 mm of 1: 1.5-2, grinding, and enabling the obtained ground ore product to enter a leaching process. The method has the advantages of short treatment time, low energy consumption, no carbon emission, good vanadium shale grindability and leaching rate strengthening effect, simple operation and high treatment efficiency, and is suitable for microwave strengthening of a vanadium shale all-wet vanadium extraction system.
Description
Technical Field
The invention belongs to the technical field of vanadium extraction from shale. In particular to a method for enhancing the ore grinding and leaching efficiency of vanadium shale by utilizing microwaves.
Background
Vanadium-containing stone coal (vanadium shale) is an important vanadium resource, and vanadium extraction from shale becomes an important way and demand guarantee for development and utilization of vanadium resources in China. The ore grinding and leaching of the vanadium shale are two important links in the vanadium extraction process of the shale, and the ore grinding and leaching efficiency jointly determine the comprehensive recovery rate of the vanadium shale and the vanadium extraction cost. Microwave is widely concerned as a clean energy in the field of mining and metallurgy, especially in the aspects of auxiliary ore grinding, enhanced leaching and the like.
Junpen Wang et al (Junpen Wang, Tao Jinag, Yaking Liu, and Xiangxin Xue. Effect of microwave irradiation on the grinding and magnetic separation characteristics of vanadium titano-magnetite [ J ]. metallic Research & Technology,2019,116,419:1-10) use microwaves to enhance the grinding effect of vanadium titano-magnetite. The grindability (in terms of the crushing rate) of the vanadium titano-magnetite was improved by a maximum of about 159.1% at a microwave power of 2kW and a treatment time of 4 min. On one hand, the method can improve the grindability of the vanadium-containing mineral to a certain extent, but continuous irradiation is needed for 4min under the condition of 2kw, so that the energy consumption is high; and the ore grinding efficiency is improved by 159.1 percent, and the improvement range is not large. On the other hand, the method belongs to discontinuous microwave treatment, and when a large amount of vanadium-containing shale needs to be treated, the operation of the device is more complicated and the efficiency is low. Therefore, the existing microwave reinforced vanadium-containing mineral grinding technology has the technical defects of high processing energy consumption, small promotion degree of vanadium mineral grindability, complex operation and low processing efficiency.
Liyili et al (Liyinli, Song Yonghui, Wangcorong, Chenshoyang. Stone coal microwave leaching vanadium extraction Process research [ J ]. nonferrous metals (smelting part), 2016,03:36-44.) carried out microwave enhanced leaching research on vanadium-containing stone coal by using a microwave solution chemical reactor. It was found that when the microwave power was 800W, the microwave irradiation time was 60min, the sulfuric acid concentration was 13% and the liquid-solid ratio was 2:1(mL/g), the vanadium leaching rate was 83.2%; and the vanadium leaching rate of 73.63 percent can be obtained by leaching in a conventional heating mode under the same leaching condition. Although the method can obtain higher vanadium leaching rate, continuous microwave irradiation is required for 60min, the treatment time is long, the energy consumption is high, and the leaching rate is improved by less than 10% compared with the leaching rate obtained by a conventional method. In addition, the microwave solution chemical reactor belongs to an intermittent treatment device, continuous operation cannot be realized, and when a large amount of vanadium shale needs to be treated, the operation is complex and the efficiency is low. The defects of long treatment time, high energy consumption, small vanadium leaching rate improvement degree, complex device operation and low efficiency of the existing microwave reinforced leaching technology are shown.
Yi-zhongYuan et al (Yi-zhongYuan, Yi-minZhang, Tao Liu1, and tie-jun chemin. company of the mechanisms of microwave and computational and of the effects of the methods of free from the bone [ J ]. International Journal of minerals, metals and materials,2015,22(5):476-482) microwave roasting the vanadium shale at 800 ℃ for 30min, leaching the roasted sample to obtain a vanadium leaching rate of 84%; compared with the conventional roasting at 900 ℃ for 60min, the vanadium leaching rate is improved by 13 percent. Compared with the conventional roasting mode, although the roasting temperature and the roasting time are shortened, the leaching rate is also improved; but still has the technical defects of overhigh treatment temperature, long treatment time and high energy consumption; moreover, the microwave roasting temperature is far higher than the combustion temperature of carbon in the vanadium shale, and a large amount of carbon emission is generated in the treatment process. In addition, the method belongs to discontinuous microwave treatment, and when a large amount of vanadium-containing shale needs to be treated, the operation of the device is more complicated and the efficiency is low. Therefore, the existing technology for enhancing the leaching efficiency of the vanadium-containing mineral through microwave roasting has the technical defects of long microwave treatment time, high treatment energy consumption, large carbon emission, complex operation and low treatment efficiency.
In conclusion, the existing technology for enhancing the vanadium shale ore grinding and leaching efficiency by using microwaves has the technical defects of long treatment time, high energy consumption, large carbon emission, small improvement degree of vanadium leaching efficiency, complex device operation and low treatment efficiency.
Disclosure of Invention
The invention aims to overcome the defects of the prior art, and aims to provide a method for strengthening the grinding and leaching efficiency of vanadium shale by using microwaves, which has the advantages of short treatment time, low energy consumption, no carbon emission, good vanadium shale grindability and leaching rate strengthening effect, simple device operation and high treatment efficiency.
In order to achieve the purpose, the technical scheme adopted by the invention comprises the following specific steps:
And 2, performing microwave treatment by adopting a continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale, setting the conveying speed of a conveying belt, turning on switches of all wave sources in the continuous microwave treatment device, and starting the conveying belt.
Feeding vanadium shale raw ore with the particle size of 1.5-10.0 mm from a feeding hole of the continuous microwave treatment device, wherein the feeding amount is 60-150 kg/h; and obtaining the vanadium shale subjected to microwave treatment from a discharge hole of the continuous microwave treatment device.
And 3, placing the vanadium shale subjected to microwave treatment in water for water quenching according to the mass ratio of the vanadium shale to the water subjected to microwave treatment of 1: 1-3 to obtain water quenching slurry.
Mixing the water quenching slurry with the vanadium shale raw ore with the particle size of less than 1.5mm according to the mass ratio of the vanadium shale raw ore with the particle size of less than 1.5mm to the vanadium shale raw ore with the particle size of 1.5-10.0 mm of 1: 1.5-2, and grinding the ore to obtain a ground ore product; and the ore grinding product enters a subsequent leaching process.
And 4, after all the materials are processed, closing switches of all the wave sources, and closing the material conveying belt.
The vanadium shale comprises the following chemical components: the content of C is 4-25 wt%; v2O5The content is more than or equal to 0.45wt percent.
The microwave power of the wave source is 500-1500W.
The conveying speed of the conveying belt 9 is na-2 na/min.
The continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale has the structure that: the continuous microwave processing device consists of a cavity surrounded by 4 rectangular flat plates, 4n wave sources and a material conveying belt; the length multiplied by the width of each rectangular flat plate is 2na multiplied by a, each rectangular flat plate is respectively and uniformly provided with n wave sources, 4n wave sources are the same, and n is a natural number of 2-10; the material conveying belt is horizontally arranged in the cavity, the height of the upper surface of the conveying belt from the top of the cavity is 0.52-0.58 a, and the width of the conveying belt is 0.9-0.95 a.
The four rectangular flat plates are respectively a top plate, a left side plate, a bottom plate and a right side plate, and the top plate, the left side plate, the bottom plate and the right side plate are sequentially and correspondingly provided with a top plate wave source, a left side plate wave source, a bottom plate wave source and a right side plate wave source; each wave source consists of 1 magnetron and 1 waveguide, and the mounting surface of each wave source on the rectangular flat plate is rectangular.
The installation position of each wave source on the corresponding rectangular flat plate is as follows:
for simplicity of description, it is assumed that the cavity is separated from the intersection line of the top plate and the right side plate, and the cavity is unfolded into a plane; and order: the entrance point of material is the initiating side of every rectangle flat board, and the split line of roof is the last sideline of cavity expansion face, and the first water flat line of cavity expansion face is the top edge of roof promptly, and the second water flat line of cavity expansion face is the last sideline of left side board, and the third water flat line of cavity expansion face is the top edge of bottom plate, and the fourth water flat line of cavity expansion face is the last sideline of right side board.
Mounting position of the top plate wave source on the top plate: the 1 st roof wave source is located at a/2 from the starting edge of the roof, the 2 nd roof wave source is located at 2a (2-1) + a/2 from the starting edge of the roof, the 3 rd roof wave source is located at 2a (3-1) + a/2 from the starting edge of the roof, … …, and so on, the nth roof wave source is located at 2a (n-1) + a/2 from the starting edge of the roof; the mounting surface center O1 of each top plate wave source is a/4 distance away from the upper line of the top plate, and the long side of each top plate wave source mounting surface is perpendicular to the upper line of the top plate.
The installation position of left side board wave source at the left side board: the 1 st left panel is located at a/2 from the starting edge of the left panel, the 2 nd left panel is located at 2a (2-1) + a/2 from the starting edge of the left panel, the 3 rd left panel is located at 2a (3-1) + a/2 from the starting edge of the left panel, … …, and so on, the nth left panel is located at 2a (n-1) + a/2 from the starting edge of the left panel; the distance between the center O2 of the mounting surface of each left side plate wave source and the upper sideline of the left side plate is a/4, and the included angle theta between the long edge of the mounting surface of each left side plate wave source and the upper sideline of the left side plate is 0-45 degrees.
The installation position of the bottom plate wave source on the bottom plate: the 1 st baseplate wave source is positioned at 3a/2 of the starting edge of the baseplate, the 2 nd baseplate wave source is positioned at 2a (2-1) +3a/2 of the starting edge of the baseplate, the 3 rd baseplate wave source is positioned at 2a (3-1) +3a/2 of the starting edge of the baseplate, … …, and so on, and the nth baseplate wave source is positioned at 2a (n-1) +3a/2 of the starting edge of the baseplate; the distance between the center O3 of the mounting surface of each baseplate wave source and the upper edge line of the baseplate is a/4, and the long edge of the mounting surface of each baseplate wave source is parallel to the upper edge line of the baseplate.
The right side plate wave source is arranged at the mounting position of the right side plate: the 1 st right-side plate wave source is positioned at 3a/2 of the starting edge of the right-side plate, the 2 nd right-side plate wave source is positioned at 2a (2-1) +3a/2 of the starting edge of the right-side plate, the 3 rd right-side plate wave source is positioned at 2a (3-1) +3a/2 of the starting edge of the right-side plate, … …, and so on, the nth right-side plate wave source is positioned at 2a (n-1) +3a/2 of the starting edge of the right-side plate; the distance between the center O4 of the wave source mounting surface of each right side plate and the upper sideline of the right side plate is a/4, and the included angle beta between the long edge of the wave source mounting surface of each right side plate and the upper sideline of the right side plate is 90-theta.
The long side l of the rectangle is a/6-a/3.
Due to the adoption of the technical scheme, the invention has the following beneficial effects:
1. the invention is based on the simulation and experimental verification of an electric-magnetic-thermal-stress composite physical field in a cavity of a microwave treatment device, and adopts a continuous microwave treatment device (hereinafter referred to as a continuous microwave treatment device) for enhancing the ore grinding and leaching efficiency of vanadium shale to carry out microwave treatment. The cavity and the wave sources of the continuous microwave processing device are optimized in layout, and n wave sources corresponding to the cavity are regularly arranged at different positions and different angles of the outer walls of 4 flat plates of the cavity respectively, so that the optimized distribution of a composite physical field in the cavity is realized, the induction strengthening effect of microwaves on the out-phase dissociation of the vanadium shale is fully exerted, and the grindability of the vanadium shale is greatly improved; in addition, the continuous processing mode of multiple wave sources can realize that the vanadium shale is subjected to continuous multi-dimensional irradiation in the operation process in the cavity, so that the processing effect is improved, and the processing period is shortened.
The method can realize the high-efficiency pretreatment of the vanadium shale within 1-2 min and below the combustion temperature of carbon, so that the grindability (in terms of crushing rate) of the vanadium shale is improved by over 200 percent, the total ore grinding energy consumption (including the energy consumption of microwave pretreatment and the energy consumption of ore grinding of microwave pretreatment products) is reduced by over 40 percent, the treatment period is short, the treatment effect is good, and the energy consumption is low.
2. Aiming at pyrite and carbonaceous wave-absorbing substances of vanadium shale, the embedding characteristic interwoven with mica and feldspar non-wave-absorbing silicate mineral fine particles and the evolution rule of dielectric characteristic of the vanadium-containing mineral in the treatment process, on the basis of the simulation of a composite physical field, by the special design of a continuous microwave treatment device, a microwave cavity, n stages (the first wave source of each plate is called as a first stage, the second wave source of each plate is called as a second stage, … …, and the like) and a continuous transmission device, in the pretreatment process, a multi-stage microwave ponderomotive force effect is continuously excited, so that the treated vanadium shale is continuously and alternately subjected to the action of n electric-magnetic-thermal-stress composite physical fields in the cavity, and the distribution form of the composite physical field greatly strengthens the dehydroxylation reaction of the vanadium-containing mica Al-O (OH) body, the reaction activity of the shale vanadium in the acid leaching process is improved, so that the vanadium leaching rate is improved by more than 15% under the same leaching condition, and the reaction has a remarkable strengthening effect on the vanadium leaching rate.
3. The invention adopts a continuous microwave processing device, combines a multi-stage continuous distribution mechanism of n-stage wave sources with a material conveying belt, and adjusts the irradiation power and the irradiation time of each stage of wave source and the transmission speed of the material conveying belt in the continuous microwave process of the vanadium shale to carry out optimized matching; on one hand, the operation steps of the vanadium shale microwave treatment are simplified, and the batch continuous treatment of the vanadium shale can be realized under simple operation; on the other hand, because the processed vanadium shale continuously passes through n electric-magnetic-thermal-stress composite physical fields, the continuous and alternate radiation energy can greatly reduce the radiation nonuniformity in a plurality of physical fields in the cavity of the microwave device, high grindability and leaching efficiency of the vanadium shale can be obtained within 1-2 min, and the production efficiency is high.
4. In the online microwave treatment process of the vanadium shale, the invention can arrange a continuous microwave treatment device between the crushing process and the ore grinding process of the vanadium shale due to short treatment period, low integral temperature and no carbon emission; the organic combination among the grinding process, the microwave treatment process and the ore grinding process can be realized through simple series combination, and the method is suitable for a vanadium shale all-wet vanadium extraction system.
Therefore, the method has the characteristics of short treatment time, low energy consumption, no carbon emission, good reinforcement effect on the grindability and leaching rate of the vanadium shale, simple operation and high treatment efficiency, and is suitable for the microwave reinforcement method of the vanadium shale full-wet vanadium extraction system.
Drawings
FIG. 1 is a schematic structural diagram of a continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of vanadium shale;
fig. 2 is an expanded schematic view of the structure shown in fig. 1.
Detailed Description
The invention is further described with reference to the following drawings and detailed description, without limiting its scope:
in order to avoid repetition, the relevant structures of the "continuous microwave processing device for enhancing vanadium shale grinding and leaching efficiency" adopted in the present embodiment are described in the following in a unified manner, and are not described in detail in the embodiments:
As shown in fig. 1, the four rectangular flat plates are respectively a top plate 1, a left side plate 3, a bottom plate 5 and a right side plate 7, and the top plate 1, the left side plate 3, the bottom plate 5 and the right side plate 7 are sequentially and correspondingly provided with a top plate wave source 8, a left side plate wave source 2, a bottom plate wave source 4 and a right side plate wave source 6; each wave source consists of 1 magnetron and 1 waveguide, and the mounting surface of each wave source on the rectangular flat plate is rectangular.
For simplicity of description, it is assumed that the cavity shown in fig. 1 is separated from the intersection line of the top plate 1 and the right side plate 7, and the cavity is unfolded to be a plan view shown in fig. 2; and order: the entrance point of material is the initiating edge of every rectangle flat board, and the line of separation of roof 1 is the last sideline of cavity expansion face, and the first water flat line of cavity expansion face is the last sideline of roof 1 promptly, and the second water flat line of cavity expansion face is the last sideline of left side board 3, and the third water flat line of cavity expansion face is the last sideline of bottom plate 5, and the fourth water flat line of cavity expansion face is the last sideline of right side board 7.
The ore grinding equipment, leaching equipment and leaching system used in this example were the same as in comparative example 1.
Comparative example 1
Crushing 10kg of vanadium shale raw ore into 0-10 mm, and directly pulping and grinding the raw ore, wherein the used grinding equipment is a ball mill with the power of 1000W and the single treatment capacity of 1 kg; the leaching equipment of the ore grinding product is a magnetic stirrer, and the leaching system is as follows: h 2SO4The dosage is 35 wt.%, the leaching time is 8 hours, the leaching temperature is 95 ℃, and CaF2The dosage is 5 wt.%, and the liquid-solid ratio is 1.5 mL/g.
Example 1
A method for enhancing the ore grinding and leaching efficiency of vanadium shale by utilizing microwaves. The method of the embodiment comprises the following steps:
And 2, performing microwave treatment by adopting a continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale, setting the conveying speed of a conveying belt 9, turning on switches of all wave sources in the continuous microwave treatment device, and starting the conveying belt 9.
Feeding vanadium shale raw ore with the particle size of 1.5-10.0 mm from a feeding hole of the obtained continuous microwave treatment device, wherein the feeding amount is 60 kg/h; and obtaining the vanadium shale subjected to microwave treatment from a discharge hole of the continuous microwave treatment device.
And 3, putting the vanadium shale subjected to microwave treatment into water for water quenching according to the mass ratio of the vanadium shale subjected to microwave treatment to the water being 1: 1 to obtain water quenching slurry.
Mixing the water quenching slurry with the vanadium shale raw ore with the particle size of less than 1.5mm according to the mass ratio of the vanadium shale raw ore with the particle size of less than 1.5mm to the vanadium shale raw ore with the particle size of 1.5-10.0 mm of 1: 1.5, and grinding to obtain an ore grinding product; and the ore grinding product enters a subsequent leaching process.
And 4, after all the materials are processed, turning off switches of all the wave sources, and turning off the material conveying belt (9).
The vanadium shale comprises the following chemical components: the C content was 4 wt%; v2O5The content was 0.45 wt%.
The present example was tested: the grindability (measured by the crushing rate) of the vanadium shale is 0.1501, which is improved by 185.9%; the ore grinding time is 17 min; the energy consumption is 0.3266 kw.h/Kg (wherein, the energy consumption of microwave treatment is 0.0443 kw.h/Kg, the energy consumption of ore grinding is 0.2833 kw.h/Kg), which is reduced by 48.42%; the leaching rate of the ore grinding product is 73.01 percent, and is improved by 15.14 percent.
The continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale is provided by the embodiment. As shown in fig. 1, the continuous microwave processing apparatus is composed of a cavity surrounded by 4 rectangular flat plates, 4 × n wave sources, and a material conveying belt 9. The length multiplied by the width of each rectangular flat plate is 2na multiplied by a, each rectangular flat plate is respectively and uniformly provided with n wave sources, and 4n wave sources are the same; a material conveying belt 9 is horizontally arranged in the cavity, the height of the upper surface of the conveying belt 9 from the top of the cavity is 0.55a, and the width of the conveying belt 9 is 0.92 a; the transport speed of the transport belt 9 was 1.5 na/min.
In this embodiment: the n is 5; the microwave power of the wave source is 500W.
The installation position of each wave source on the corresponding rectangular flat plate is as follows:
the installation position of the top plate wave source 8 on the top plate 1 is shown in fig. 2: the 1 st ceiling source 8 is located at a/2 from the starting edge of the ceiling 1, the 2 nd ceiling source 8 is located at 2a + a/2 from the starting edge of the ceiling 1, the 3 rd ceiling source 8 is located at 4a + a/2 from the starting edge of the ceiling 1, the 4 th ceiling source 8 is located at 6a + a/2 from the starting edge of the ceiling 1, and the 5 th ceiling source 8 is located at 8a + a/2 from the starting edge of the ceiling 1. The mounting surface center O1 of each roof wave source 8 is a/4 distance away from the upper line of the roof 1, and the long side of the mounting surface of each roof wave source 8 is perpendicular to the upper line of the roof 1.
The installation position of the left panel wave source 2 on the left panel 3 is shown in fig. 2: the 1 st left plate wave source 2 is located at a/2 position from the starting edge of the left plate 3, the 2 nd left plate wave source 2 is located at 2a + a/2 position from the starting edge of the left plate 3, the 3 rd left plate wave source 2 is located at 4a + a/2 position from the starting edge of the left plate 3, the 4 th left plate wave source 2 is located at 6a + a/2 position from the starting edge of the left plate 3, and the 5 th left plate wave source 2 is located at 8a + a/2 position from the starting edge of the left plate 3. The distance between the center O2 of the installation surface of each left plate wave source 2 and the upper edge line of the left plate 3 is a/4, and the included angle theta between the long edge of the installation surface of each left plate wave source 2 and the upper edge line of the left plate 3 is 30 degrees.
The installation position of the baseplate wave source 4 on the baseplate 5 is shown in fig. 2: the 1 st baseplate wave source 4 is located 3a/2 from the starting edge of the baseplate 5, the 2 nd baseplate wave source 4 is located 2a +3a/2 from the starting edge of the baseplate 5, the 3 rd baseplate wave source 4 is located 4a +3a/2 from the starting edge of the baseplate 5, the 4 th baseplate wave source 4 is located 6a +3a/2 from the starting edge of the baseplate 5, and the 5 th baseplate wave source 4 is located 8a +3a/2 from the starting edge of the baseplate 5. The center O3 of the installation surface of each baseplate wave source 4 is a/4 distance away from the upper edge line of the baseplate 5, and the long edge of the installation surface of each baseplate wave source 4 is parallel to the upper edge line of the baseplate 5.
The right plate wave source 6 is arranged at the right plate 7, as shown in fig. 2, the 2 nd right plate wave source 6 is positioned at 2a +3a/2 from the starting edge of the right plate 7, the 3 rd right plate wave source 6 is positioned at 4a +3a/2 from the starting edge of the right plate 7, the 4 th right plate wave source 6 is positioned at 6a +3a/2 from the starting edge of the right plate 7, and the 5 th right plate wave source 6 is positioned at 8a +3a/2 from the starting edge of the right plate 7. The distance between the center O4 of the mounting surface of each right-side plate wave source 6 and the upper side line of the right-side plate 7 is a/4, and the included angle beta between the long edge of the mounting surface of each right-side plate wave source 6 and the upper side line of the right-side plate 7 is 60 degrees.
The long side l of the rectangle is a/6.
Example 2
A method for enhancing the ore grinding and leaching efficiency of vanadium shale by utilizing microwaves. The method of the embodiment comprises the following steps:
And 2, performing microwave treatment by adopting a continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale, setting the conveying speed of the conveying belt 9, starting switches of all wave sources in the continuous microwave treatment device, and starting the conveying belt 9.
Feeding vanadium shale raw ore with the particle size of 1.5-10.0 mm from a feeding hole of the continuous microwave treatment device, wherein the feeding amount is 100 kg/h; and obtaining the vanadium shale subjected to microwave treatment from a discharge hole of the continuous microwave treatment device.
And 3, putting the vanadium shale subjected to microwave treatment into water for water quenching according to the mass ratio of the vanadium shale subjected to microwave treatment to the water being 1: 1.2 to obtain water quenching slurry.
Mixing the water quenching slurry with the vanadium shale raw ore with the particle size of less than 1.5mm according to the mass ratio of the vanadium shale raw ore with the particle size of less than 1.5mm to the vanadium shale raw ore with the particle size of 1.5-10.0 mm of 1: 1.8, and grinding to obtain an ore grinding product; and the ore grinding product enters a subsequent leaching process.
And 4, after all the materials are processed, turning off switches of all the wave sources, and turning off the material conveying belt (9).
The vanadium shale comprises the following chemical components: the C content is 15 wt%; v2O5The content was 0.74 wt%.
The present example was tested: the grindability (measured by the crushing rate) of the vanadium shale is 0.1678, which is improved by 236.3%; the ore grinding time is 12 min; the energy consumption is 0.3333 kw.h/Kg (wherein, the energy consumption of microwave treatment is 0.1333 kw.h/Kg, and the energy consumption of ore grinding is 0.2 kw.h/Kg), which is reduced by 47.37%; the leaching rate of the ore grinding product is 83.32 percent, and is improved by 24.45 percent.
The continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale is provided by the embodiment. As shown in fig. 1, the continuous microwave processing apparatus is composed of a cavity surrounded by 4 rectangular flat plates, 4 × n wave sources, and a material conveying belt 9. The length multiplied by the width of each rectangular flat plate is 2na multiplied by a, each rectangular flat plate is respectively and uniformly provided with n wave sources, and 4n wave sources are the same; a material conveying belt 9 is horizontally arranged in the cavity, the height of the upper surface of the conveying belt 9 from the top of the cavity is 0.58a, and the width of the conveying belt 9 is 0.9 a; the transport speed of the conveyor belt 9 is na/min.
In this embodiment: the n is 10; the microwave power of the wave source is 1000W.
The installation position of each wave source on the corresponding rectangular flat plate is as follows:
the installation position of the top plate wave source 8 on the top plate 1 is shown in fig. 2: the 1 st ceiling source 8 is located at a/2 from the starting edge of the ceiling 1, the 2 nd ceiling source 8 is located at 2a + a/2 from the starting edge of the ceiling 1, the 3 rd ceiling source 8 is located at 4a + a/2 from the starting edge of the ceiling 1, … …, and so on, and the 10 th ceiling source 8 is located at 18a + a/2 from the starting edge of the ceiling 1. The mounting surface center O1 of each roof wave source 8 is a/4 distance away from the upper line of the roof 1, and the long side of the mounting surface of each roof wave source 8 is perpendicular to the upper line of the roof 1.
The installation position of the left panel wave source 2 on the left panel 3 is shown in fig. 2: the 1 st left panel wave source 2 is located at a/2 from the starting edge of the left panel 3, the 2 nd left panel wave source 2 is located at 2a + a/2 from the starting edge of the left panel 3, the 3 rd left panel wave source 2 is located at 4a + a/2 from the starting edge of the left panel 3, … …, and so on, the 10 th left panel wave source 2 is located at 18a + a/2 from the starting edge of the left panel 3. The distance between the center O2 of the mounting surface of each left plate wave source 2 and the upper side line of the left plate 3 is a/4, and the included angle theta between the long edge of the mounting surface of each left plate wave source 2 and the upper side line of the left plate 3 is 0-45 degrees.
The installation position of the baseplate wave source 4 on the baseplate 5 is shown in fig. 2: the 1 st backplane wave source 4 is located 3a/2 from the starting edge of the backplane 5, the 2 nd backplane wave source 4 is located 2a +3a/2 from the starting edge of the backplane 5, the 3 rd backplane wave source 4 is located 4a +3a/2 from the starting edge of the backplane 5, … …, and so on, and the 10 th backplane wave source 4 is located 18a +3a/2 from the starting edge of the backplane 5. The center O3 of the mounting surface of each of the backplane wave sources 4 is a/4 distance from the upper line of the backplane 5, and the long side of the mounting surface of each of the backplane wave sources 4 is parallel to the upper line of the backplane 5.
The installation position of the right side plate wave source 6 on the right side plate 7 is shown in fig. 2: the 1 st right-side plate wave source 6 is located at 3a/2 from the starting edge of the right-side plate 7, the 2 nd right-side plate wave source 6 is located at 2a +3a/2 from the starting edge of the right-side plate 7, the 3 rd right-side plate wave source 6 is located at 4a +3a/2 from the starting edge of the right-side plate 7, … …, and so on, and the 10 th right-side plate wave source 6 is located at 18a (n-1) +3a/2 from the starting edge of the right-side plate 7. The distance between the center O4 of the mounting surface of each right-side plate wave source 6 and the upper edge line of the right-side plate 7 is a/4, and the included angle beta between the long edge of the mounting surface of each right-side plate wave source 6 and the upper edge line of the right-side plate 7 is 45 degrees.
The long side l of the rectangle is a/4.
Example 3
A method for enhancing the ore grinding and leaching efficiency of vanadium shale by utilizing microwaves. The method of the embodiment comprises the following steps:
And 2, performing microwave treatment by adopting a continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale, setting the conveying speed of the conveying belt 9, starting switches of all wave sources in the continuous microwave treatment device, and starting the conveying belt 9.
Feeding vanadium shale raw ore with the particle size of 1.5-10.0 mm from a feeding hole of the continuous microwave treatment device, wherein the feeding amount is 150 kg/h; and obtaining the vanadium shale subjected to microwave treatment from a discharge hole of the continuous microwave treatment device.
And 3, putting the vanadium shale subjected to microwave treatment into water for water quenching according to the mass ratio of the vanadium shale subjected to microwave treatment to the water being 1: 3 to obtain water quenching slurry.
Mixing the water quenching slurry with the vanadium shale raw ore with the particle size of less than 1.5mm according to the mass ratio of the vanadium shale raw ore with the particle size of less than 1.5mm to the vanadium shale raw ore with the particle size of 1.5-10.0 mm of 1: 2, and grinding to obtain an ore grinding product; and the ore grinding product enters a subsequent leaching process.
And 4, after all the materials are processed, closing switches of all the wave sources, and closing the material conveying belt (9).
The chemical components of the vanadium shale are as follows: the C content is 25 wt%; v2O5The content was 1.25 wt%.
The present embodiment was tested: the grindability (measured by the crushing rate) of the vanadium shale is 0.1577, which is improved by 216%; the ore grinding time is 16.5 min; the energy consumption is 0.3665 kw.h/Kg (wherein, the energy consumption of microwave treatment is 0.0083 kw.h/Kg, and the energy consumption of ore grinding is 0.3999 kw.h/Kg), which is reduced by 40.78%; the leaching rate of the ore grinding product is 76.19 percent, and is improved by 18.39 percent.
The continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale is provided by the embodiment. As shown in fig. 1, the continuous microwave processing apparatus is composed of a cavity surrounded by 4 rectangular flat plates, 4 × n wave sources, and a material conveying belt 9. The length multiplied by the width of each rectangular flat plate is 2na multiplied by a, each rectangular flat plate is respectively and uniformly provided with n wave sources, and 4n wave sources are the same; a material conveying belt 9 is horizontally arranged in the cavity, the height of the upper surface of the conveying belt 9 from the top of the cavity is 0.52a, and the width of the conveying belt 9 is 0.95 a; the transport speed of the transport belt 9 was 2 na/min.
In this embodiment: and n is 3.
The microwave power of the wave source is 1500W.
The installation position of each wave source on the corresponding rectangular flat plate is as follows:
the installation position of the top plate wave source 8 on the top plate 1 is shown in fig. 2: the 1 st ceiling source 8 is located at a/2 from the starting edge of the ceiling 1, the 2 nd ceiling source 8 is located at 2a + a/2 from the starting edge of the ceiling 1, and the 3 rd ceiling source 8 is located at 4a/2 from the starting edge of the ceiling 1. The mounting surface center O1 of each roof wave source 8 is a/4 distance away from the upper line of the roof 1, and the long side of the mounting surface of each roof wave source 8 is perpendicular to the upper line of the roof 1.
The installation position of the left panel wave source 2 on the left panel 3 is shown in fig. 2: the 1 st left plate wave source 2 is located at a/2 position from the starting edge of the left plate 3, the 2 nd left plate wave source 2 is located at 2a + a/2 position from the starting edge of the left plate 3, and the 3 rd left plate wave source 2 is located at 4a + a/2 position from the starting edge of the left plate 3. The distance between the center O2 of the mounting surface of each left plate wave source 2 and the upper edge line of the left plate 3 is a/4, and the included angle theta between the long edge of the mounting surface of each left plate wave source 2 and the upper edge line of the left plate 3 is 0 deg.
The installation position of the baseplate wave source 4 on the baseplate 5 is shown in fig. 2: the 1 st baseplate wave source 4 is positioned at 3a/2 of the starting edge of the baseplate 5, the 2 nd baseplate wave source 4 is positioned at 2a +3a/2 of the starting edge of the baseplate 5, and the 3 rd baseplate wave source 4 is positioned at 4a +3a/2 of the starting edge of the baseplate 5. The center O3 of the mounting surface of each of the backplane wave sources 4 is a/4 distance from the upper line of the backplane 5, and the long side of the mounting surface of each of the backplane wave sources 4 is parallel to the upper line of the backplane 5.
The installation position of the right side plate wave source 6 on the right side plate 7 is shown in fig. 2: the 1 st right-side plate wave source 6 is located at 3a/2 of the starting edge of the right-side plate 7, the 2 nd right-side plate wave source 6 is located at 2a +3a/2 of the starting edge of the right-side plate 7, and the 3 rd right-side plate wave source 6 is located at 4a4+3a/2 of the starting edge of the right-side plate 7. The distance between the center O4 of the mounting surface of each right-side plate wave source 6 and the upper side line of the right-side plate 7 is a/4, and the included angle beta between the long edge of the mounting surface of each right-side plate wave source 6 and the upper side line of the right-side plate 7 is 90 degrees.
The long side l of the rectangle is a/3.
Compared with the prior art, the specific implementation method has the following positive effects:
1. in the embodiment, based on simulation and experimental verification of an electric-magnetic-thermal-stress composite physical field in a cavity of a microwave treatment device, a continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale (hereinafter referred to as a continuous microwave treatment device) is adopted for carrying out microwave treatment. The cavity and the wave sources of the continuous microwave processing device are optimized in layout, and n wave sources corresponding to the cavity are regularly arranged at different positions and different angles of the outer walls of 4 flat plates of the cavity respectively, so that the optimized distribution of a composite physical field in the cavity is realized, the induction strengthening effect of microwaves on the out-phase dissociation of the vanadium shale is fully exerted, and the grindability of the vanadium shale is greatly improved; in addition, the continuous processing mode of multiple wave sources can realize that the vanadium shale is subjected to continuous multi-dimensional irradiation in the operation process in the cavity, so that the processing effect is improved, and the processing period is shortened.
According to the specific embodiment, the high-efficiency pretreatment of the vanadium shale can be realized within 1-2 min and below the combustion temperature of carbon, so that the grindability (in terms of crushing rate) of the vanadium shale is improved by over 200%, the total ore grinding energy consumption (including microwave pretreatment energy consumption and microwave pretreatment product ore grinding energy consumption) is reduced by over 40%, the treatment period is short, the treatment effect is good, and the energy consumption is low.
2. The specific embodiment aims at the pyrite and carbonaceous wave-absorbing substances of the vanadium shale, the embedding property interwoven with the mica and feldspar non-wave-absorbing silicate mineral fine particles and the evolution rule of the dielectric property of the vanadium-containing mineral in the treatment process, and on the basis of the simulation of a composite physical field, by the special design of a microwave cavity, n stages (the first wave source of each plate is called as a first stage, the second wave source of each plate is called as a second stage, … …, and the like) and a continuous transmission device of a continuous microwave treatment device, in the pretreatment process, the multi-stage microwave qualitative dynamic effect is continuously excited, so that the treated vanadium shale is continuously and alternately subjected to the action of n electric-magnetic-thermal-stress composite physical fields in the cavity, and the distribution form of the composite physical field greatly strengthens the dehydroxylation reaction of the vanadium-containing mica Al-O (OH) octahedron, the reaction activity of the shale vanadium in the acid leaching process is improved, so that the vanadium leaching rate is improved by more than 15% under the same leaching condition, and the reaction has a remarkable strengthening effect on the vanadium leaching rate.
3. In the specific embodiment, a continuous microwave processing device is adopted, a multi-stage continuous distribution mechanism of n-stage wave sources is combined with a material conveying belt (9), and in the continuous microwave process of the vanadium shale, the irradiation power and the irradiation time of each stage of wave source and the transmission speed of the material conveying belt (9) are adjusted to implement optimized matching; on one hand, the operation steps of the vanadium shale microwave treatment are simplified, and the batch continuous treatment of the vanadium shale can be realized under simple operation; on the other hand, because the processed vanadium shale continuously passes through n electric-magnetic-thermal-stress composite physical fields, the continuous and alternate radiation energy can greatly reduce the radiation nonuniformity in a plurality of physical fields in the cavity of the microwave device, high grindability and leaching efficiency of the vanadium shale can be obtained within 1-2 min, and the production efficiency is high.
4. In the online microwave treatment process of the vanadium shale, the continuous microwave treatment device can be arranged between the crushing process and the ore grinding process of the vanadium shale due to short treatment period, low overall temperature and no carbon emission; the organic combination among the grinding process, the microwave treatment process and the ore grinding process can be realized through simple series combination, and the method is suitable for a vanadium shale all-wet vanadium extraction system.
Therefore, the specific embodiment has the characteristics of short treatment time, low energy consumption, no carbon emission, good reinforcement effect on the grindability and leaching rate of the vanadium shale, simple operation and high treatment efficiency, and the method is suitable for the microwave reinforcement method of the vanadium shale all-wet vanadium extraction system.
Claims (4)
1. A method for enhancing the ore grinding and leaching efficiency of vanadium shale by using microwaves is characterized by comprising the following specific steps:
step 1, crushing and screening vanadium shale raw ore to obtain vanadium shale raw ore with the particle size of less than 1.5mm and vanadium shale raw ore with the particle size of 1.5-10.0 mm;
step 2, carrying out microwave treatment by adopting a continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale, setting the conveying speed of a conveying belt (9), starting switches of all wave sources in the continuous microwave treatment device, and starting the conveying belt (9);
feeding vanadium shale raw ore with the particle size of 1.5-10.0 mm from a feeding hole of the continuous microwave treatment device, wherein the feeding amount is 60-150 kg/h; obtaining the vanadium shale subjected to microwave treatment from a discharge hole of the continuous microwave treatment device;
step 3, placing the vanadium shale subjected to microwave treatment in water for water quenching according to the mass ratio of the vanadium shale subjected to microwave treatment to water being 1: 1-3 to obtain water quenching slurry;
Mixing the water quenching slurry with the vanadium shale raw ore with the particle size of less than 1.5mm according to the mass ratio of the vanadium shale raw ore with the particle size of less than 1.5mm to the vanadium shale raw ore with the particle size of 1.5-10.0 mm of 1: 1.5-2, and grinding to obtain an ore grinding product; the ore grinding product enters a subsequent leaching process;
step 4, after all the materials are processed, turning off switches of all the wave sources, and turning off a material conveying belt (9);
the continuous microwave treatment device for enhancing the ore grinding and leaching efficiency of the vanadium shale has the structure that: the continuous microwave processing device consists of a cavity surrounded by 4 rectangular flat plates, 4n wave sources and a material conveying belt (9); the length multiplied by the width of each rectangular flat plate is 2na multiplied by a, each rectangular flat plate is respectively and uniformly provided with n wave sources, 4n wave sources are the same, and n is a natural number of 2-10; a material conveying belt (9) is horizontally arranged in the cavity, the height of the upper surface of the conveying belt (9) from the top of the cavity is 0.52-0.58 a, and the width of the conveying belt (9) is 0.9-0.95 a;
the four rectangular flat plates are respectively a top plate (1), a left side plate (3), a bottom plate (5) and a right side plate (7), and the top plate (1), the left side plate (3), the bottom plate (5) and the right side plate (7) are sequentially and correspondingly provided with a top plate wave source (8), a left side plate wave source (2), a bottom plate wave source (4) and a right side plate wave source (6); each wave source consists of 1 magnetron and 1 waveguide, and the mounting surface of each wave source on the rectangular flat plate is rectangular;
The installation position of each wave source on the corresponding rectangular flat plate is as follows:
for simplicity of description, the cavity is separated from the intersection line of the top plate (1) and the right side plate (7) so as to be unfolded into a plane; and order: the inlet end of the material is the starting edge of each rectangular flat plate, the separation line of the top plate (1) is the upper side line of the cavity expansion surface, namely the first horizontal line of the cavity expansion surface is the upper side line of the top plate (1), the second horizontal line of the cavity expansion surface is the upper side line of the left side plate (3), the third horizontal line of the cavity expansion surface is the upper side line of the bottom plate (5), and the fourth horizontal line of the cavity expansion surface is the upper side line of the right side plate (7);
the installation position of the top plate wave source (8) on the top plate (1): the 1 st roof wave source (8) is positioned at a/2 position from the starting edge of the roof (1), the 2 nd roof wave source (8) is positioned at 2a (2-1) + a/2 position from the starting edge of the roof (1), the 3 rd roof wave source (8) is positioned at 2a (3-1) + a/2 position from the starting edge of the roof (1), … …, and so on, and the nth roof wave source (8) is positioned at 2a (n-1) + a/2 position from the starting edge of the roof (1); the distance between the center O1 of the mounting surface of each top plate wave source (8) and the upper edge line of the top plate (1) is a/4, and the long edge of the mounting surface of each top plate wave source (8) is perpendicular to the upper edge line of the top plate (1);
The installation position of the left side plate wave source (2) on the left side plate (3): the 1 st left board wave source (2) is positioned at a/2 position away from the starting edge of the left board (3), the 2 nd left board wave source (2) is positioned at 2a (2-1) + a/2 position away from the starting edge of the left board (3), the 3 rd left board wave source (2) is positioned at 2a (3-1) + a/2 position away from the starting edge of the left board (3), … …, and so on, the nth left board wave source (2) is positioned at 2a (n-1) + a/2 position away from the starting edge of the left board (3); the distance between the center O2 of the mounting surface of each left plate wave source (2) and the upper side line of the left plate (3) is a/4, and the included angle theta between the long edge of the mounting surface of each left plate wave source (2) and the upper side line of the left plate (3) is 0-45 degrees;
the installation position of the bottom plate wave source (4) on the bottom plate (5) is as follows: the 1 st baseplate wave source (4) is positioned at 3a/2 from the starting edge of the baseplate (5), the 2 nd baseplate wave source (4) is positioned at 2a (2-1) +3a/2 from the starting edge of the baseplate (5), the 3 rd baseplate wave source (4) is positioned at 2a (3-1) +3a/2 from the starting edge of the baseplate (5), … …, and so on, and the nth baseplate wave source (4) is positioned at 2a (n-1) +3a/2 from the starting edge of the baseplate (5); the distance between the center O3 of the mounting surface of each bottom plate wave source (4) and the upper edge line of the bottom plate (5) is a/4, and the long edge of the mounting surface of each bottom plate wave source (4) is parallel to the upper edge line of the bottom plate (5);
The right side plate wave source (6) is arranged at the installation position of the right side plate (7): the 1 st right side plate wave source (6) is positioned at 3a/2 from the starting edge of the right side plate (7), the 2 nd right side plate wave source (6) is positioned at 2a (2-1) +3a/2 from the starting edge of the right side plate (7), the 3 rd right side plate wave source (6) is positioned at 2a (3-1) +3a/2 from the starting edge of the right side plate (7), … …, and the like, and the nth right side plate wave source (6) is positioned at 2a (n-1) +3a/2 from the starting edge of the right side plate (7); the distance between the center O4 of the mounting surface of each right side plate wave source (6) and the upper edge line of the right side plate (7) is a/4, and the included angle between the long edge of the mounting surface of each right side plate wave source (6) and the upper edge line of the right side plate (7) is 90-theta.
2. The method for enhancing the ore grinding and leaching efficiency of vanadium shale by using microwaves as claimed in claim 1, wherein the chemical components of the vanadium shale are as follows: the content of C is 4-25 wt%; v2O5The content is more than or equal to 0.45wt percent.
3. The method for enhancing the ore grinding and leaching efficiency of the vanadium shale by using the microwaves as claimed in claim 1, wherein the microwave power of the wave source is 500-1500W.
4. The method for enhancing the ore grinding and leaching efficiency of vanadium shale by using microwaves as claimed in claim 1, wherein the length l of the rectangle is a/6-a/3.
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BE1021589B1 (en) * | 2012-11-14 | 2015-12-16 | Wuhan University Of Technology | PROCESS FOR EXTRACTING VANADIUM FROM SCHITE CONTAINING VANADIUM |
CN103421964A (en) * | 2013-08-26 | 2013-12-04 | 武汉科技大学 | Method for leaching vanadium from stone coal containing vanadium |
CN104437833A (en) * | 2014-11-07 | 2015-03-25 | 贵州省贵金属矿产资源综合利用工程技术研究中心有限公司 | Physical upgrading method for enrichment of carbonaceous shale type vanadium ore |
CN105331810A (en) * | 2015-10-13 | 2016-02-17 | 长沙矿冶研究院有限责任公司 | Microwave heating device and method for leaching vanadium from stone coal through sulfuric acid |
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