CN114737167A - Clean mechanism in coating film chamber - Google Patents

Clean mechanism in coating film chamber Download PDF

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Publication number
CN114737167A
CN114737167A CN202210166507.9A CN202210166507A CN114737167A CN 114737167 A CN114737167 A CN 114737167A CN 202210166507 A CN202210166507 A CN 202210166507A CN 114737167 A CN114737167 A CN 114737167A
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CN
China
Prior art keywords
drainage
coating
chamber
plate
coating cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202210166507.9A
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Chinese (zh)
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CN114737167B (en
Inventor
周磊
窦沛静
段琳琳
丁媛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mingderunhe Machinery Manufacturing Tianjin Co ltd
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Mingderunhe Machinery Manufacturing Tianjin Co ltd
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Application filed by Mingderunhe Machinery Manufacturing Tianjin Co ltd filed Critical Mingderunhe Machinery Manufacturing Tianjin Co ltd
Priority to CN202210166507.9A priority Critical patent/CN114737167B/en
Publication of CN114737167A publication Critical patent/CN114737167A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405Cleaning of reactor or parts inside the reactor by using reactive gases
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587Mechanical means for changing the gas flow
    • C23C16/45591Fixed means, e.g. wings, baffles
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating Apparatus (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)

Abstract

The invention provides a coating cavity cleaning mechanism, which is arranged in a rectangular coating cavity and comprises: the drainage device comprises a dry pump arranged at the bottom of a coating cavity, drainage units arranged on four inner walls of the coating cavity and gas collecting hoods respectively arranged at four corners of the coating cavity and connected with the dry pump, wherein the drainage units are drainage plates which comprise vertical plates and horizontal plates in L shapes. The invention not only improves the utilization rate of NF3, but also improves the cleaning effect, and is beneficial to improving the product quality; the quick-mounting type quick-mounting assembling tool is simple in overall structure, scientific in design, capable of saving assembling time and using cost by adopting a quick-mounting mode and designing the quick-mounting type quick-mounting part into a replaceable structure.

Description

Clean mechanism in coating film chamber
Technical Field
The invention relates to the technical field of CVD coating, in particular to a coating cavity cleaning mechanism.
Background
When a CVD chamber is coated, a large amount of films are adhered in the chamber, and in order to ensure the cleanliness of the chamber, a cleaning gas NF is required to be used3The chamber is cleaned. As shown in FIG. 1, the cleaning gas NF in the prior art3The film layer is easy to be accumulated to four corners by radiating and diffusing from the center of the cavity outwards, and then particles influencing the product quality are generated. Thus, to ensure product qualityThe cleaning time needs to be prolonged, and the prolonged cleaning time can result in cleaning gas NF3The cost is increased, the productivity is limited, and even if the cleaning time is prolonged and is limited by the diffusion direction of the cleaning gas, the film accumulation still easily occurs at the four corners of the chamber. Therefore, how to efficiently improve the cleanliness of the chamber, especially the cleaning effect of four corners inside the chamber, is a technical problem to be solved at present.
Disclosure of Invention
In order to overcome the defects in the prior art, the invention provides a coating cavity cleaning mechanism.
The technical scheme of the invention is realized as follows:
the utility model provides a clean mechanism in coating film chamber sets up in the coating film intracavity of rectangle, includes: the drainage device comprises a dry pump arranged at the bottom of a coating cavity, drainage units arranged on four inner walls of the coating cavity and gas collecting hoods respectively arranged at four corners of the coating cavity and connected with the dry pump, wherein the drainage units are drainage plates which comprise vertical plates and horizontal plates in L shapes.
Preferably, the membrane plating device also comprises a support bracket, and the drainage plate is fixedly connected with the inner wall of the membrane plating cavity through the support bracket.
Further preferred, the support bracket holds in the palm and the collet including the side that is the L type, and the outside that the side held in the palm is provided with the threaded connection spare that is used for with the inner wall connection in coating film chamber, and the inboard fixed connection that the vertical plate held in the palm through couple and side is provided with the chamber that holds that is used for placing the collet on the horizontal plate.
More preferably, the upper surface of the shoe is slightly higher than the upper surface of the horizontal plate.
Most preferably, the vertical plate and the horizontal plate are of an integrated structure, and the side support and the bottom support are of an integrated structure.
Compared with the prior art, the invention has at least the following beneficial effects:
1. through arranging the drainage units on the four inner walls of the coating cavity, clean gas NF (nitrogen fluoride) is enabled to be obtained3Turns back to four corners for cleaning after natural diffusion, thereby not only improving NF3The use rate of the cleaning agent is improved, the cleaning effect is improved, and the product quality is improved;
2. does not increase the NF of the cleaning gas3The using amount of the cleaning agent does not prolong the cleaning time, so that the cleaning cost is not increased, and the productivity is not reduced;
3. the quick-mounting type quick-mounting assembling tool is simple in overall structure, scientific in design, capable of saving assembling time and using cost by adopting a quick-mounting mode and designing the quick-mounting type quick-mounting part into a replaceable structure.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a diagram showing a distribution of a cleaning gas in a coating chamber before a flow guide unit is installed;
FIG. 2 is a schematic view of the arrangement structure of the drainage unit in the coating chamber;
FIG. 3 is a cross-sectional view of the drainage unit;
FIG. 4 is a schematic perspective view of FIG. 3;
FIG. 5 is a schematic structural view (cross-sectional view) of the present invention;
FIG. 6 is a distribution diagram of the cleaning gas in the coating chamber after the flow guide unit is arranged; .
In the figure: A. coating a film cavity; B. a shielding frame; m, glass to be coated; 1. a drainage plate; 11. a vertical plate; 12. a horizontal plate; 2. hooking; 3. a support bracket; 31. side supporting; 32. a bottom support; 4. a threaded connection; 5. a dry pump; 6. and a gas-collecting hood.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
The utility model provides a clean mechanism in coating film chamber sets up in the coating film chamber A of rectangle, includes: set up in dry pump 5 of coating film chamber A bottom, set up drainage unit and 4 on four inner walls of coating film chamber A set up respectively in four corners of coating film chamber A and the gas collecting channel 6 of being connected with dry pump 5, and the drainage unit is drainage plate 1, and the drainage plate is including the vertical plate 11 and the horizontal plate 12 that are the L type.
The arrangement position of the drainage plate 1 in the film coating cavity A is shown in figure 2, and the arrangement positions of the dry pump 5 and the gas-collecting hood 6 in the film coating cavity A are shown in figure 5. During cleaning, cleaning gas NF3The glass M is introduced into the center of the glass M to be coated, then naturally diffused to 4 drainage plates 1, drained by a vertical plate 11 and guided by a gas collecting hood 6, and NF3Returning to four corners for cleaning. Whereas in the prior art, the cleaning gas NF3The glass M to be coated is introduced into the center of the glass M to be coated, then naturally spreads to the 4 inner walls and is drawn out at the gap between the shielding frame and the inner walls, so that the 4 corners are hardly cleaned (the specific cleaning process is shown in FIG. 1). The cleaning mechanism for the coating cavity not only improves NF3The usage rate of the cleaning agent is improved, and the cleaning effect is improved, so that the product quality is improved (the specific cleaning process is shown in figure 6).
Example 2
On the basis of embodiment 1, still include support bracket 3, drainage plate 1 is through support bracket 3 and the inner wall fixed connection of coating chamber A. As shown in fig. 3 and 4 together: specifically, support bracket 3 holds in the palm 31 and collet 32 including the side that is the L type, and the outside that holds in the palm 31 is provided with the threaded connection spare 4 that is used for with the inner wall connection of coating film chamber A, and vertical plate 11 holds in the palm the inboard fixed connection of 31 through couple 2 and side, is provided with the chamber that holds that is used for placing collet 32 on the horizontal plate 12. Drainage plate 1 is installed on couple 2, and couple 2 is fixed on support bracket 3, and support bracket 3 passes through threaded connection 4 to be fixed on the inner wall of coating chamber A, and installation operation is swift, convenient.
Example 3
On the basis of embodiment 2, the upper surface of the shoe 32 is slightly higher than the upper surface of the horizontal plate 12. In use, the shielding frame B is arranged on the bottom support 32, so that the bottom support 32 is stressed, and the deformation is generated in long-term use, and the support bracket 3 is directly replaced without replacing the drainage plate 1.
Example 4
In addition to the embodiments 1-3, the vertical plate 11 and the horizontal plate 12 are integrated, and the side bracket 31 and the bottom bracket 32 are integrated for easy processing and use.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims (5)

1. The utility model provides a clean mechanism in coating film chamber, sets up in the coating film chamber (A) of rectangle, its characterized in that: the method comprises the following steps: the drainage device comprises a dry pump (5) arranged at the bottom of a coating cavity (A), drainage units arranged on four inner walls of the coating cavity (A) and a gas collecting hood (6) respectively arranged at four corners of the coating cavity (A) and connected with the dry pump (5), wherein the drainage units are drainage plates (1), and each drainage plate comprises a vertical plate (11) and a horizontal plate (12) which are L-shaped.
2. The coating chamber cleaning mechanism of claim 1, wherein: the drainage plate is characterized by further comprising a supporting bracket (3), and the drainage plate (1) is fixedly connected with the inner wall of the film coating cavity (A) through the supporting bracket (3).
3. The coating chamber cleaning mechanism of claim 1, wherein: support bracket (3) including the side that is the L type hold in the palm (31) and collet (32), the outside that the side held in the palm (31) is provided with be used for with coating film chamber (A) threaded connection spare (4) of inner wall connection, inboard fixed connection that vertical plate (11) held in the palm (31) through couple (2) and side is provided with the chamber that holds that is used for placing collet (32) on horizontal plate (12).
4. The coating chamber cleaning mechanism of claim 3, wherein: the upper surface of the bottom support (32) is slightly higher than the upper surface of the horizontal plate (12).
5. The coating chamber cleaning mechanism according to any one of claims 1 to 4, wherein: the vertical plate (11) and the horizontal plate (12) are of an integrated structure, and the side support (31) and the bottom support (32) are of an integrated structure.
CN202210166507.9A 2022-02-23 2022-02-23 Film coating cavity cleaning mechanism Active CN114737167B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210166507.9A CN114737167B (en) 2022-02-23 2022-02-23 Film coating cavity cleaning mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210166507.9A CN114737167B (en) 2022-02-23 2022-02-23 Film coating cavity cleaning mechanism

Publications (2)

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CN114737167A true CN114737167A (en) 2022-07-12
CN114737167B CN114737167B (en) 2024-01-19

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005213551A (en) * 2004-01-28 2005-08-11 Ulvac Japan Ltd Film deposition system and cleaning method therefor
US20140109940A1 (en) * 2012-10-18 2014-04-24 Applied Materials, Inc. Shadow frame support
CN211105602U (en) * 2019-11-25 2020-07-28 江西宏欣光学科技有限公司 Coating device for coating layer falling protective layer
CN113930747A (en) * 2021-10-19 2022-01-14 浙江泰嘉光电科技有限公司 High-speed cleaning CVD chamber structure for implementing vapor deposition process

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005213551A (en) * 2004-01-28 2005-08-11 Ulvac Japan Ltd Film deposition system and cleaning method therefor
US20140109940A1 (en) * 2012-10-18 2014-04-24 Applied Materials, Inc. Shadow frame support
CN104704141A (en) * 2012-10-18 2015-06-10 应用材料公司 Shadow frame support
CN211105602U (en) * 2019-11-25 2020-07-28 江西宏欣光学科技有限公司 Coating device for coating layer falling protective layer
CN113930747A (en) * 2021-10-19 2022-01-14 浙江泰嘉光电科技有限公司 High-speed cleaning CVD chamber structure for implementing vapor deposition process

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