CN114695148B - Silicon and lithium niobate heterojunction bonding method of silicon-based photoelectronic device - Google Patents

Silicon and lithium niobate heterojunction bonding method of silicon-based photoelectronic device Download PDF

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CN114695148B
CN114695148B CN202210324288.2A CN202210324288A CN114695148B CN 114695148 B CN114695148 B CN 114695148B CN 202210324288 A CN202210324288 A CN 202210324288A CN 114695148 B CN114695148 B CN 114695148B
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silicon
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bcb
lithium niobate
silicon substrate
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CN114695148A (en
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吴传贵
李云飞
罗文博
孟雪飞
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University of Electronic Science and Technology of China
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    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
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    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
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    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
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    • H01L2224/271—Manufacture and pre-treatment of the layer connector preform
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
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    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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Abstract

The invention belongs to the field of integrated photonics, and particularly relates to a silicon and lithium niobate heterojunction bonding method of a silicon-based optoelectronic device. The thickness control of the BCB bonding layer is realized by diluting the BCB and matching with a corresponding spin coating process, so that the requirement of a silicon-based optoelectronic device on the thickness of the introduced bonding layer is met, and the BCB bonding layer with the thickness below 200nm is obtained on the basis of ensuring the bonding strength of silicon and lithium niobate. Aiming at the problem that the spin coating and pre-bonding effects of diluted BCB are poor in the bonding process, the interface to be bonded is treated by adopting a twice plasma activation technology, so that the spin coating and pre-bonding effects are improved. For the lithium niobate cracking phenomenon caused by thermal mismatch at the annealing and curing temperature of 250 ℃, the cracking problem is solved by controlling the annealing highest temperature to 200 ℃ and prolonging the heat preservation time. The bonding technology of the invention provides process support for preparing optical devices such as low-cost and high-quality electro-optic modulators.

Description

Silicon and lithium niobate heterojunction bonding method of silicon-based photoelectronic device
Technical Field
The invention belongs to the field of integrated photonics, and particularly relates to a silicon and lithium niobate heterojunction bonding method of a silicon-based optoelectronic device, which is based on Benzocyclobutene (BCB) bonding.
Background
Along with the development speed of microelectronic technology, silicon-based heterogeneous integration has wide application prospect by virtue of high reliability of silicon-based CMOS technology and abundant and various physical properties of other compound semiconductors. Silicon is considered to be a technology platform for the development of next-generation integrated microsystems, by virtue of its mature process, excellent electrothermal, mechanical properties, and characteristics compatible with conventional integrated circuit (Integrated Circuit, IC) technologies, and is a major direction of future semiconductor development. Silicon-based microelectromechanical systems (Micro Electro Mechanical System, MEMS) have the advantages of high precision, low power consumption, high integration, etc., and have been widely used in the field of optical band electronics in recent years. The rapid advances in information and communication technology have further increased the demand for silicon-based optoelectronic devices. Silicon-based electro-optic modulators, particularly those that play a key role in optical communication systems, have been widely studied in recent years and are rapidly advancing. However, silicon-based electro-optic modulators have significantly limited the bandwidth and loss of the modulator due to the inherent characteristics of the material itself, with performance gradually reaching physical limits.
The heterogeneous integration of silicon with lithium niobate provides a good solution to the bottleneck. Lithium niobate crystals have long been considered as one of the most promising integrated photonics host materials by virtue of extremely low light absorption loss and good linear electro-optic effect. The richness of the physical effect has led to the widespread use of lithium niobate in various fields. The excellent piezoelectric and ferroelectric effects are widely applied to sensors and detectors, and the acoustic characteristics are widely applied to MEMS devices such as surface acoustic wave devices and thin film bulk acoustic wave resonance devices. In addition, the outstanding electro-optic effect and nonlinear optical effect play a key role in the development and application of optical devices such as optical waveguides, electro-optic modulators, optical phase modulators, electro-optic Q-switching devices and the like. Meanwhile, with the development of direct bonding and ion cutting technology of lithium niobate, the appearance of lithium niobate (Lithium Niobate on Insulater, LNOI) thin film materials on insulators and the introduction of lithium niobate submicron waveguide etching technology, the integration level and performances of various aspects of a lithium niobate modulator are effectively improved.
However, heterogeneous integration of silicon and lithium niobate is often achieved by direct bonding, which has extremely high requirements on the cleanliness and flatness of the surface of the bonded sample, and polishing treatment (high process cost) is usually performed by Chemical Mechanical Polishing (CMP) or the like. In addition, due to the thermal expansion coefficient of silicon (2.5X10 -6 There is a large difference between the thermal expansion coefficient (16.7X10-6/. Degree.C.) of lithium niobate and that of lithium niobate, and if high temperature annealing is used, a strong stress is generated due to thermal mismatch, resulting inFragmentation of lithium niobate. Without annealing treatment, the bonding strength is difficult to be ensured, and is seriously affected by edge effect, so that the bonding quality has negative effect.
The introduction of the bonding layer to achieve hetero-bonding between silicon and lithium niobate should also be theoretically possible, but the thickness of the bonding layer in silicon-based optoelectronic devices is only available in submicron order, and no viable technical solution is available at present.
Disclosure of Invention
Aiming at the problems or the defects, the invention provides a silicon and lithium niobate heterojunction bonding method of a silicon-based optoelectronic device, which is used for integrating optoelectronic devices such as an electro-optic modulator with low cost and high quality, in order to solve the problems of poor bonding quality and higher process cost of the silicon and lithium niobate heterojunction bonding in the existing silicon-based optoelectronic device.
A silicon and lithium niobate heterojunction bonding method of a silicon-based photoelectronic device comprises the following specific steps:
and step 1, performing plasma activation on the silicon substrate to improve the wettability of the surface of the silicon substrate, so that the integrity and uniformity of BCB spin coating are improved.
Specific activation conditions are as follows: activated gas N 2 The activation power was 300W and the activation time was 120s, and plasma activation was performed.
BCB dilution: the mesitylene is used for diluting the BCB, the content of the diluent is controlled to be 1-5 times of the content of the BCB, and spin coating failure occurs when the content of the diluent is too high. The thickness of the BCB film obtained after spin coating is different for the BCB under different dilution ratios, and the thickness control of the BCB intermediate layer after bonding can be realized.
And 2, spin-coating the BCB diluted in the step 1 on the bonding surface of the whole silicon substrate after plasma activation.
And step 3, heating the silicon substrate spin-coated with the BCB in the step 2 to evaporate the diluent in the BCB, so as to improve the purity of the BCB and facilitate bonding and curing of the BCB.
And 4, performing plasma activation on the silicon substrate and the lithium niobate block material obtained in the step 3, wherein the activation parameters are the same as those of the first time, so as to improve the surface energy of a bonding interface, thereby achieving the purposes of improving the pre-bonding effect and improving the bonding strength.
And 5, adaptively aligning the bonding surface of the activated silicon substrate and the bonding surface of the activated lithium niobate block in the step 4, and applying uniform external force to complete pre-bonding between the silicon substrate and the lithium niobate block.
And 6, carrying out vacuum annealing on the sample after pre-bonding in the step 5 under the condition of pressing on two sides to finish bonding, wherein the bonded sample has a three-layer structure, and the thickness of the BCB bonding layer is less than or equal to 200nm, and the silicon substrate, the BCB bonding layer and the lithium niobate block are sequentially arranged from bottom to top.
Further, the pressure applied to both sides of the pre-bonded sample in the step 6 is 50-200Mpa.
Further, the bonded silicon substrate and lithium niobate bulk sample are cleaned and then reused. Such as: respectively ultrasonically cleaning the silicon and lithium niobate blocks in acetone, alcohol and deionized water at normal temperature for 5min; heating in water bath at 70deg.C in SC-1 (ammonia water: hydrogen peroxide: deionized water=1:1:5), and cleaning for 15min; and washing with deionized water for 5min.
BCB, as a polymer, can achieve good planarization by spin coating on the sample surface. The curing temperature is above and below 200 ℃, and bonding can be completed at a lower temperature. The thickness of the BCB bonding layer is in the micron level, and the thicker intermediate layer is not beneficial to realizing effective light transmission and light coupling in the optical device, so that the requirement of the integrated photonics device cannot be met.
The thickness control of the BCB bonding layer is realized by diluting the BCB and matching with a corresponding spin coating process, so that the requirement of a silicon-based optoelectronic device on the thickness of the introduced bonding layer is met, and the BCB bonding layer with the thickness below 200nm is obtained on the basis of ensuring the bonding strength of silicon and lithium niobate. Aiming at the problem that the spin coating and pre-bonding effects of diluted BCB are poor in the bonding process, the interface to be bonded is treated by adopting a twice plasma activation technology, so that the spin coating and pre-bonding effects are improved. For the lithium niobate cracking phenomenon caused by thermal mismatch at the annealing and curing temperature of 250 ℃, the cracking problem is solved by controlling the annealing highest temperature to 200 ℃ and prolonging the heat preservation time. The bonding technology of the invention provides process support for preparing optical devices such as low-cost and high-quality electro-optic modulators.
Drawings
FIG. 1 is a schematic flow chart of the present invention;
FIG. 2 is a schematic diagram of the bonded sample structure of the present invention;
FIG. 3 shows spin-coating of BCB before and after activation of plasma activation on the surface of a silicon substrate according to an embodiment;
FIG. 4 is a graph showing the case of lithium niobate samples at different annealing curing temperatures according to the examples;
fig. 5 is a graph of bond strength versus bond strength obtained under tensile testing for bond samples of different BCB layer thicknesses.
FIG. 6 shows SEM test results of cross-section of a silicon and lithium niobate heterobonded sample having a BCB layer thickness of 150 nm.
Detailed Description
The invention is described in detail below with specific experimental methods and experimental data for heterobonding of silicon and lithium niobate realized based on BCB bonding layers, verifying the effectiveness of the technique.
BCB with Mesitylene: bcb=5:1 was sequentially spin-coated on the surface of the silicon substrate after activation and activation without using plasma, the spin-coating rotation speed parameter was set to 1000rpm for 10s, and 5000rpm for 30s, the spin-coating effect of BCB was shown in fig. 3, fig. 3A was before bonding, and fig. 3B was after bonding. It was found that the spin coating effect of BCB was poor and large area spin coating was not performed on the substrate without the activation treatment, whereas the spin coating of BCB showed good integrity and uniformity after the activation treatment.
At an annealing temperature profile with a maximum cure temperature of 250 ℃ for 60min, the resulting bonded sample exhibited severe cracking, see fig. 4A, which was primarily due to the thermal mismatch between lithium niobate and silicon. By reducing the maximum cure temperature to 200 ℃ while extending the soak time to 100 minutes at 200 ℃ to ensure adequate cure of BCB, the resulting bonded sample lithium niobate maintains good integrity, see fig. 4B.
The spin-coating rotation speed parameter was fixed at 5000rpm, and dilution parameters were prepared as mesitylen: bcb=1:1, 3:2, 2:1, 3:1, 5:1 BCB, bonding experiments were performed according to the process flow shown in fig. 1, BCB layer thickness was measured by observing the section of the bonded sample with a scanning electron microscope (Scanning Electron Microscope, SEM), and bonding strength of the bonded sample was measured by tensile test, and tensile strength of the bonded sample corresponding to different BCB layer thicknesses was obtained as shown in fig. 5.
The results of cross-sectional SEM testing of silicon and lithium niobate bonded samples with BCB layer thickness of 150nm are shown in fig. 6.
As can be seen by the above examples: according to the invention, the thickness control of the BCB bonding layer is realized by diluting the BCB and matching with a corresponding spin coating process, and the BCB bonding layer with the thickness below 200nm is obtained on the basis of ensuring the bonding strength of silicon and lithium niobate. Aiming at the problem that the spin coating and pre-bonding effects of diluted BCB are poor in the bonding process, the interface to be bonded is treated by adopting a twice plasma activation technology, so that the spin coating and pre-bonding effects are improved. For the lithium niobate cracking phenomenon caused by thermal mismatch at the annealing and curing temperature of 250 ℃, the cracking problem is solved by controlling the annealing highest temperature to 200 ℃ and prolonging the heat preservation time. The bonding technology of the invention provides process support for preparing optical devices such as low-cost and high-quality electro-optic modulators.

Claims (4)

1. A method for heterobonding silicon and lithium niobate of a silicon-based optoelectronic device, comprising the steps of:
step 1, performing plasma activation on a silicon substrate;
BCB dilution: diluting the BCB by using mesitylene, wherein the content of the diluent is controlled to be 1-5 times of the content of the BCB;
step 2, spin-coating the diluted BCB in the step 1 to the bonding surface of the whole silicon substrate after plasma activation;
step 3, heating the silicon substrate spin-coated with the BCB in the step 2 to evaporate the diluent in the BCB;
step 4, plasma activating the silicon substrate and the lithium niobate block material obtained in the step 3;
step 5, adaptively aligning the bonding surface of the activated silicon substrate and the bonding surface of the activated lithium niobate block material in the step 4, and applying uniform external force to complete pre-bonding between the silicon substrate and the lithium niobate block material;
and 6, carrying out vacuum annealing on the sample after pre-bonding in the step 5 under the condition of pressing on two sides to finish bonding, wherein the bonded sample has a three-layer structure, and the thickness of the BCB bonding layer is less than or equal to 200nm, and the silicon substrate, the BCB bonding layer and the lithium niobate block are sequentially arranged from bottom to top.
2. A method of heterobonding silicon and lithium niobate of a silicon-based optoelectronic device as recited in claim 1 wherein:
the specific activation conditions of the step 1 and the step 4 are as follows: activated gas N 2 The activation power is 300W, and the activation time is 120s.
3. A method of heterobonding silicon and lithium niobate of a silicon-based optoelectronic device as recited in claim 1 wherein: the pressure applied to the two sides of the sample after pre-bonding in the step 6 is 50-200Mpa.
4. A method of heterobonding silicon and lithium niobate of a silicon-based optoelectronic device as recited in claim 1 wherein: the bonded silicon substrate and lithium niobate bulk sample are cleaned and then reused.
CN202210324288.2A 2022-03-28 2022-03-29 Silicon and lithium niobate heterojunction bonding method of silicon-based photoelectronic device Active CN114695148B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008098404A2 (en) * 2007-02-16 2008-08-21 ETH Zürich Method for manufacturing a single-crystal film, and integrated optical device comprising such a single-crystal film
CN110376768A (en) * 2019-07-26 2019-10-25 中国科学院半导体研究所 The encapsulating structure of lithium niobate modulator and application, opto-electronic device
CN111175892A (en) * 2020-01-07 2020-05-19 电子科技大学 Lithium niobate optical waveguide device and preparation method thereof
CN114035267A (en) * 2021-11-11 2022-02-11 中国电子科技集团公司第五十五研究所 AlGaAs optical waveguide manufacturing method for enhancing optical mode space limitation

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9187316B2 (en) * 2013-07-19 2015-11-17 University Of Windsor Ultrasonic sensor microarray and method of manufacturing same
US10302864B2 (en) * 2016-06-02 2019-05-28 Ohio State Innovation Foundation Method of forming a deterministic thin film from a crystal substrate by etching a bilayer bonding interface to create a channel

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008098404A2 (en) * 2007-02-16 2008-08-21 ETH Zürich Method for manufacturing a single-crystal film, and integrated optical device comprising such a single-crystal film
CN110376768A (en) * 2019-07-26 2019-10-25 中国科学院半导体研究所 The encapsulating structure of lithium niobate modulator and application, opto-electronic device
CN111175892A (en) * 2020-01-07 2020-05-19 电子科技大学 Lithium niobate optical waveguide device and preparation method thereof
CN114035267A (en) * 2021-11-11 2022-02-11 中国电子科技集团公司第五十五研究所 AlGaAs optical waveguide manufacturing method for enhancing optical mode space limitation

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