CN114675509A - Method for generating extreme ultraviolet light and device for laser plasma extreme ultraviolet light source - Google Patents
Method for generating extreme ultraviolet light and device for laser plasma extreme ultraviolet light source Download PDFInfo
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- CN114675509A CN114675509A CN202210389706.6A CN202210389706A CN114675509A CN 114675509 A CN114675509 A CN 114675509A CN 202210389706 A CN202210389706 A CN 202210389706A CN 114675509 A CN114675509 A CN 114675509A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
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Abstract
The invention relates to a method for generating extreme ultraviolet light and a device of a laser plasma extreme ultraviolet light source, wherein the method for generating the extreme ultraviolet light comprises the following steps: droplet driving processing, signal detection processing, and position processing. Converting a laser pulse signal into a driving signal, disturbing liquid, generating liquid drops, detecting the extreme ultraviolet radiation intensity of the liquid drops, obtaining the position of the laser pulse and the position information of the liquid drops through calculation, and adjusting the position of the laser pulse to focus the laser pulse on the liquid drops to generate extreme ultraviolet light. The method for generating the extreme ultraviolet light and the device of the laser plasma extreme ultraviolet light source can realize the accurate synchronization of the laser pulse and the liquid drop under high frequency without adding a synchronous control device, and realize the accurate targeting by adjusting the position of the laser pulse, thereby greatly improving the conversion efficiency of the plasma extreme ultraviolet light source.
Description
Technical Field
The invention relates to the technical field of laser, in particular to a method for generating extreme ultraviolet light and a device of a laser plasma extreme ultraviolet light source.
Background
With the development of semiconductor technology, the photolithography technology is receiving more and more attention. However, as the integration degree of semiconductor chips is higher and higher, the exposure wavelength is required to be shorter and shorter, the light source for photoetching is reduced to 22 nm from the earliest visible light wave band 436 nm and ultraviolet wave band 365 nm to the later deep ultraviolet wave band 248 nm and 193 nm through an immersion technology, and the extreme ultraviolet light source of 13.5 nm is considered as the most potential photoetching light source of the next generation. The method for generating the extreme ultraviolet light of 13.5 nanometers comprises the following steps: synchrotron radiation source technology, discharge plasma technology, and laser plasma technology. The former two schemes have great defects due to the complexity and instability of the synchrotron radiation original technology and the heat effect of the discharge plasma technology, and the development of the former two schemes is seriously hindered; in contrast, the laser plasma technology is an optimal technical means for generating the extreme ultraviolet light source due to its advantages of simple device, good stability, high output power, and the like. The prior art discloses a laser plasma technology, which needs to detect liquid drops firstly and then control a laser to emit laser pulses through a synchronization technology to realize target shooting, and the synchronization of the laser pulses and the liquid drops is difficult to realize under high frequency, so that most of laser energy is lost, and meanwhile, the device is complex, difficult to operate and very low in conversion efficiency of an extreme ultraviolet light source.
Therefore, how to achieve precise synchronization of laser pulses and droplets at high frequency and improve the conversion efficiency of the euv light source by using the laser plasma technology as the euv light source has become a problem to be solved in this field.
Disclosure of Invention
In view of the above, it is desirable to provide an euv light generating method and an euv light source apparatus for laser plasma, which can achieve precise synchronization of laser pulses and droplets at high frequency and improve the conversion efficiency of the euv light source.
A method of extreme ultraviolet light generation comprising the steps of:
droplet driving processing: converting the laser pulse signal into a driving signal, and disturbing the liquid to generate liquid drops;
and (3) signal detection processing: detecting the extreme ultraviolet radiation intensity of the liquid drop;
position processing: and calculating to obtain the position of the laser pulse and the position information of the liquid drop, and adjusting the position of the laser pulse to focus the laser pulse on the liquid drop to generate extreme ultraviolet light.
In one embodiment, the laser pulse is focused on the droplet by translating the laser pulse in three dimensions in the position process.
An apparatus for a laser plasma extreme ultraviolet light source, comprising:
a droplet driving assembly: the liquid droplet generator is used for converting a laser pulse signal into a driving signal, disturbing liquid and generating liquid droplets;
a signal detector: for detecting the extreme ultraviolet radiation intensity of the droplets;
the laser is used for generating laser pulses and laser pulse signals; and
a position processing component: and the signal detector is connected with the liquid drop driving component and is used for receiving the electric signal, obtaining the position of the laser pulse and the position information of the liquid drop through calculation, and adjusting the position of the laser pulse to focus the laser pulse on the liquid drop to generate extreme ultraviolet light.
In one embodiment, the signal detector comprises an extreme ultraviolet energy meter for detecting the extreme ultraviolet radiation intensity of the liquid droplet.
In one embodiment, the droplet driving assembly comprises a piezoelectric ceramic driver, a piezoelectric ceramic and a droplet target generator, wherein one end of the piezoelectric ceramic is connected with the piezoelectric ceramic driver, the other end of the piezoelectric ceramic is connected with the droplet target generator, and the piezoelectric ceramic driver is connected with the laser.
In one embodiment, the droplet driving assembly further comprises a temperature control module connected to the piezoelectric ceramic and configured to regulate the temperature of the piezoelectric ceramic.
In one embodiment, the position processing assembly comprises an optical lens group, a three-dimensional moving translation stage and a position control module, the laser and the optical lens group are coaxially mounted on the three-dimensional moving translation stage, and the position control module is connected to the three-dimensional moving translation stage and the signal detector.
In one embodiment, the optical lens group includes a predetermined number of lenses.
In one embodiment, the laser comprises any one of an actively Q-switched laser and a passively Q-switched laser.
In one embodiment, the laser plasma extreme ultraviolet light source device further comprises a vacuum target chamber, and the vacuum target chamber is used for providing a vacuum environment for generating extreme ultraviolet light.
According to the method for generating the extreme ultraviolet light and the device for the laser plasma extreme ultraviolet light source, the laser pulse signal is used as the trigger signal to drive the generation of the liquid drop, the precise synchronization of the laser pulse and the liquid drop can be realized under high frequency without adding a synchronous control device, the precise targeting is realized by adjusting the position of the laser pulse, the conversion efficiency of the plasma extreme ultraviolet light source is greatly improved, and the method and the device are simple and easy to operate.
Drawings
FIG. 1 is a schematic diagram of an apparatus for generating an EUV light source using laser plasma according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of an apparatus of a laser plasma EUV light source according to another embodiment of the present invention;
fig. 3 is a flowchart illustrating a method for generating extreme ultraviolet light according to an embodiment of the invention.
Reference numerals: 10. laser plasma extreme ultraviolet light source device; 11. a droplet driving assembly; 111. a piezoelectric ceramic driver; 112. piezoelectric ceramics; 113. a droplet target generator; 114. a temperature control module; 12. a signal detector; 13. a laser; 14. a location processing component; 141. an optical lens group; 142. moving the translation stage in three dimensions; 143. a position control module; 15. a vacuum target chamber.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and are not to be considered limiting of the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.
Referring to fig. 1, fig. 1 shows a schematic structural diagram of an apparatus 10 for laser plasma euv light source according to an embodiment of the present invention, wherein the laser plasma technology is an euv light source, and the apparatus 10 for laser plasma euv light source according to the present invention is an apparatus for generating euv light by using the laser plasma technology as an euv light source, and mainly includes a droplet driving component 11, a signal detector 12, a laser 13, and a position processing component 14.
The liquid drop driving component 11 is used for converting a laser pulse signal into a driving signal, disturbing liquid and generating liquid drops; in one embodiment, the droplet driving module 11 comprises a piezoelectric ceramic driver 111, a piezoelectric ceramic 112 and a droplet target generator 113, wherein one end of the piezoelectric ceramic 112 is connected to the piezoelectric ceramic driver 111, and the other end is connected to the droplet target generator 113, and the piezoelectric ceramic driver 111 is connected to the laser 13.
In one embodiment, the piezoelectric ceramic driver 111 is used for receiving the laser pulse signal and driving the piezoelectric ceramic 112, and the piezoelectric ceramic driver 111 mainly includes a signal generating part, an impedance converting part, and a high-voltage amplifying part.
In one embodiment, piezoelectric ceramic 112 is used to generate vibrations. Generally, after receiving the laser pulse signal, the piezoelectric ceramic driver 111 converts the laser pulse signal into a signal for driving the piezoelectric ceramic 112, and generates an alternating voltage to drive the piezoelectric ceramic 112 to vibrate. Specifically, the piezoelectric ceramic driver 111 applies alternating voltages of different polarities to both ends of the polarization center axis of the piezoelectric ceramic 112, thereby vibrating the piezoelectric ceramic 112. The piezoelectric ceramic 112 is not particularly limited, and may be an acoustic ceramic of less than 20 khz, an ultrasonic ceramic of more than 20 khz, or preferably an ultrasonic ceramic of 40 khz.
In one embodiment, the droplet target generator 113 is used to generate droplets, and specifically, the droplet target generator 113 transmits vibrations generated by the piezoelectric ceramic 112 into the liquid, thereby perturbing the liquid to generate droplets. Among them, the droplet target material used in the droplet target generator 113 is not particularly limited, and is preferably tin liquid.
In one embodiment, as shown in FIG. 2, droplet driving assembly 11 further comprises a temperature control module 114, wherein temperature control module 114 is coupled to piezoelectric ceramic 112, and temperature control module 114 is configured to adjust the temperature of piezoelectric ceramic 112 and maintain the characteristic vibration frequency of piezoelectric ceramic 112. Further, the piezoelectric ceramic 112 may be operated below the curie temperature by adjusting the temperature via the temperature control module 114. Specifically, the temperature control module 114 adjusts the temperature by measuring the change of the vibration frequency of the piezoelectric ceramic 112, so that the piezoelectric ceramic 112 operates at the characteristic vibration frequency, thereby implementing piezoelectric matching and stabilizing the generation of the liquid droplets. Where curie temperature refers to the temperature at which a material can change between ferromagnetic and paramagnetic bodies.
Wherein, the signal detector 12 is used for detecting the extreme ultraviolet radiation intensity of the liquid drop and converting the detected extreme ultraviolet radiation intensity into an electric signal to be transmitted to the position processing component. In one embodiment, the signal detector 12 comprises an extreme ultraviolet energetics for detecting the extreme ultraviolet radiation intensity of the droplets.
The laser 13 is used for generating laser pulses and laser pulse signals. Specifically, the laser 13 emits a laser pulse and generates a signal (i.e., a laser pulse signal) for driving the piezo ceramic driver 111, and the laser pulse is focused on the droplet through the optical lens group 141. The signal refers to electromagnetic coding or electronic coding of data, and the laser pulse signal refers to electromagnetic coding or electronic coding which is generated when the laser 13 emits laser pulses and is used for driving the piezoelectric ceramic driver 111.
In one embodiment, laser 13 is a high power pulsed laser, including any one of an actively Q-switched laser and a passively Q-switched laser. The active Q-switched laser is a laser 13 capable of controlling laser pulse output by artificially controlling Q parameters. The passive Q-switched laser is a laser which controls a Q parameter through a saturable absorber and cannot control the Q parameter manually. The Q parameter is an index for evaluating the quality of an optical resonator in a laser, and specifically, Q ═ 2 pi × energy stored in the resonator)/energy lost per oscillation period. In one embodiment, the active Q-switched laser and the passive Q-switched laser are not particularly limited, for example, the active Q-switched laser may be an active Q-switched carbon dioxide laser, and the passive Q-switched laser may be a passive Q-switched fuel laser, etc.
In one embodiment, the position processing component 14 is connected to the droplet driving component 11 and the signal detector 12, and is configured to receive the electrical signal and calculate to obtain the position of the laser pulse and the position information of the droplet, and adjust the position of the laser 13 to focus the laser pulse on the droplet, so as to generate the extreme ultraviolet light.
The position processing assembly 14 includes an optical lens group 141, a three-dimensional moving translation stage 142, and a position control module 143, the laser 13 and the optical lens group 141 are coaxially mounted on the three-dimensional moving translation stage 142, and the position control module 143 is connected to the three-dimensional moving translation stage 142 and the signal detector 12. The laser 13 and the optical lens group 141 are coaxially mounted on the three-dimensional moving translation stage 142, that is, the laser 13 and the optical lens group 141 are mounted on the three-dimensional moving translation stage 142 such that the optical axis of the laser 13 and the optical axis of the optical lens group 141 are aligned on the same straight line.
In one embodiment, the optical lens group 141 includes a preset number of lenses, the preset number of lenses is not particularly limited, and may be, for example, 3 lenses, further, for example, 4 lenses, further, for example, 5 lenses, and the like, and the optical lens group 141 preferably includes 3 or 4 lenses.
In one embodiment, the laser pulses are expanded, collimated, and refocused on the droplets by the optical lens group 141.
In one embodiment, the position control module 143 receives the electrical signal from the signal detector 12, calculates and determines the relative positions of the laser pulse and the droplet, adjusts the three-dimensional moving translation stage 142 to translate in three-dimensional directions, and translates the laser 13 and the optical lens group 141 mounted on the three-dimensional moving translation stage 142 in three-dimensional directions, so as to translate the laser pulse in three-dimensional directions, and then precisely focus the laser pulse on the droplet, which generates plasma through absorption energy, and radiates extreme ultraviolet light.
In one embodiment, the apparatus 10 for generating an euv light source of laser plasma further comprises a vacuum target chamber 15, wherein the vacuum target chamber 15 is used for providing a vacuum environment for generating euv light.
In one embodiment, as shown in fig. 1, the laser 13 is an actively Q-switched carbon dioxide laser 13, the droplet target is a tin liquid, the signal detector 12 is an extreme ultraviolet energy meter, the vacuum target chamber 15 provides a vacuum environment for generating extreme ultraviolet light, the actively Q-switched carbon dioxide laser 13 is connected to the piezoelectric ceramic driver 111, one end of the piezoelectric ceramic 112 is connected to the piezoelectric ceramic driver 111, the other end is connected to the droplet target generator 113, the actively Q-switched carbon dioxide laser 13 and the optical lens group 141 are coaxially mounted on the three-dimensional moving translation stage 142, and the position control module 143 is connected to the three-dimensional moving translation stage 142 and the extreme ultraviolet energy meter. When the device works, the active Q-switched carbon dioxide laser 13 emits laser pulses and generates laser pulse signals, and transmits the laser pulse signals to the piezoelectric ceramic driver 111, the piezoelectric ceramic driver 111 receives the laser pulse signals, converts the laser pulse signals into signals for driving the piezoelectric ceramic 112, generates alternating voltage to drive the piezoelectric ceramic 112, so that the piezoelectric ceramic 112 generates vibration, the droplet target generator 113 transmits the vibration of the piezoelectric ceramic 112 to tin liquid, disturbs the tin liquid to generate tin droplets, the extreme ultraviolet energy meter detects the extreme ultraviolet radiation intensity of the tin droplets, converts the extreme ultraviolet radiation intensity into electric signals and transmits the electric signals to the position control module 143, the position control module 143 calculates and obtains the position of the laser pulses and the position information of the tin droplets, adjusts the three-dimensional moving translation stage 142 to translate in the three-dimensional direction, so that the active Q-switched carbon dioxide laser 13 and the optical lens group 141 translate in the three-dimensional direction, the position of the laser pulse is adjusted so that the laser pulse is focused on the tin droplet through the optical lens group 141, and the tin droplet generates plasma by absorbing energy to radiate extreme ultraviolet light. Therefore, the accurate synchronization of the laser pulse and the liquid drop is realized on the premise of high frequency and no synchronous control device, and the conversion efficiency of the plasma extreme ultraviolet light source is greatly improved.
In one embodiment, as shown in fig. 2, the laser 13 is a passive Q-switched dye laser 13, the droplet target is a tin liquid, the signal detector 12 is an euv energy meter, the vacuum target chamber 15 provides a vacuum environment for generating euv light, the passive Q-switched dye laser 13 is connected to the piezoelectric ceramic driver 111, one end of the piezoelectric ceramic 112 is connected to the piezoelectric ceramic driver 111, the other end of the piezoelectric ceramic 112 is connected to the droplet target generator 113, the temperature control module 114 is connected to the piezoelectric ceramic 112, the passive Q-switched dye laser 13 and the optical lens group 141 are coaxially mounted on the three-dimensional moving translation stage 142, and the position control module 143 is connected to the three-dimensional moving translation stage 142 and the euv energy meter. During operation, the passive Q-switched dye laser 13 emits laser pulses and generates laser pulse signals, and transmits the laser pulse signals to the piezoelectric ceramic driver 111, the piezoelectric ceramic driver 111 receives the laser pulse signals, converts the laser pulse signals into signals for driving the piezoelectric ceramic 112, generates alternating voltage for driving the piezoelectric ceramic 112, the temperature control module 114 enables the piezoelectric ceramic 112 to generate vibration at a characteristic vibration frequency by adjusting the temperature of the piezoelectric ceramic 112, the droplet target generator 113 transmits the vibration of the piezoelectric ceramic 112 to tin liquid, disturbs the tin liquid to generate tin droplets, the extreme ultraviolet energy meter detects the extreme ultraviolet radiation intensity of the tin droplets, converts the extreme ultraviolet radiation intensity into electrical signals and transmits the electrical signals to the position control module 143, the position control module 143 calculates and obtains the position information of the laser pulses and the tin droplets, and adjusts the three-dimensional moving translation stage 142 to translate in three-dimensional directions, the passive Q-switched dye laser 13 and the optical lens group 141 are translated in the three-dimensional direction, the position of the laser pulse is adjusted, the laser pulse is focused on the tin liquid drop through the optical lens group 141, the tin liquid drop generates plasma through absorbing energy, and extreme ultraviolet light is radiated. By adding the temperature control module 114, piezoelectric matching is realized, and liquid drops are generated more stably, so that the accurate synchronization of laser pulses and the liquid drops is further improved, and the conversion efficiency of the plasma extreme ultraviolet light source is greatly improved.
A method of extreme ultraviolet light generation comprising the steps of:
droplet driving processing: converting the laser pulse signal into a driving signal, and disturbing the liquid to generate liquid drops;
and (3) signal detection processing: detecting the extreme ultraviolet radiation intensity of the liquid drop;
position processing: and calculating to obtain the position of the laser pulse and the position information of the liquid drop, and adjusting the position of the laser pulse to focus the laser pulse on the liquid drop to generate extreme ultraviolet light.
In one embodiment, in the position adjustment process, the laser pulse is focused on the droplet by translating the laser pulse in a three-dimensional direction.
In one embodiment, the extreme ultraviolet light generation method mainly uses a laser pulse signal as a main signal to trigger signals of all components in the laser plasma extreme ultraviolet light source device, so that all the components are basically synchronized in time, and laser pulses emitted by the laser 13 can be accurately focused on liquid drops after passing through the optical module, thereby realizing the accurate synchronization of the laser pulses and the liquid drops; secondly, through the processing of position control, realize accurate target practice, can make the liquid drop absorb the energy of laser pulse greatly, improve light source conversion efficiency, reduce the loss of laser energy.
In one embodiment, the light source conversion efficiency refers to a ratio of energy of the generated euv radiation to energy of the laser 13, and the present invention can make the light source conversion efficiency greater than 4%, for example, the light source conversion efficiency is between 4% and 5%, and for example, the light source conversion efficiency is as high as 5% by the method for generating euv light and the laser plasma euv light source device.
In one embodiment, as shown in fig. 3, the method for generating euv light includes converting a laser pulse signal into a driving signal by the droplet driving assembly 11, perturbing the liquid to generate a droplet, detecting the euv radiation intensity of the droplet by the signal detector 12, converting the euv radiation intensity into an electrical signal, and transmitting the electrical signal to the position processing assembly 14, where the position processing assembly 14 calculates and obtains the laser pulse and position information of the droplet by the received electrical signal, and adjusts the position of the laser pulse to focus the laser pulse on the droplet to generate euv light. Specifically, the laser 13 emits a laser pulse, transmits a laser pulse signal to the piezoelectric ceramic driver 111, converts the laser pulse signal into a driving signal through the piezoelectric ceramic driver 111 and the piezoelectric ceramic 112, so that the piezoelectric ceramic 112 vibrates to disturb liquid and generate a liquid droplet, then the signal detector 12 detects the euv radiation intensity of the liquid droplet, converts the euv radiation intensity into an electrical signal, and transmits the electrical signal to the position control module 143 of the position processing assembly 14, the position control module 143 calculates and obtains the laser pulse and the position information of the liquid droplet, and adjusts the position of the three-dimensional moving translation stage 142 to achieve the adjustment of the three-dimensional translation of the laser pulse, so that the laser pulse is focused on the liquid droplet through the optical lens group 141 to generate euv light.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. A method of extreme ultraviolet light generation, comprising the steps of:
droplet driving processing: converting the laser pulse signal into a driving signal, and disturbing the liquid to generate liquid drops;
and (3) signal detection processing: detecting the extreme ultraviolet radiation intensity of the liquid drop;
position processing: and calculating to obtain the position of the laser pulse and the position information of the liquid drop, and adjusting the position of the laser pulse to focus the laser pulse on the liquid drop to generate extreme ultraviolet light.
2. The method of ultraviolet light generation as recited in claim 1 wherein in said position treatment said laser pulse is focused on said droplet by translating said laser pulse in three dimensions.
3. An apparatus for a laser plasma extreme ultraviolet light source, comprising:
the liquid drop driving component is used for converting the laser pulse signal into a driving signal, disturbing the liquid and generating liquid drops;
a signal detector for detecting the extreme ultraviolet radiation intensity of the droplets;
the laser is used for generating laser pulses and laser pulse signals; and
and the position processing assembly is connected with the liquid drop driving assembly and the signal detector and is used for receiving the electric signal, calculating and acquiring the position of the laser pulse and the position information of the liquid drop, and adjusting the position of the laser to focus the laser pulse on the liquid drop to generate extreme ultraviolet light.
4. The apparatus of claim 3, wherein the signal detector comprises an EUV energy meter configured to detect an EUV radiation intensity of the droplet.
5. The apparatus of claim 3, wherein the droplet driving module comprises a piezoelectric ceramic driver, a piezoelectric ceramic and a droplet target generator, one end of the piezoelectric ceramic is connected to the piezoelectric ceramic driver, the other end of the piezoelectric ceramic is connected to the droplet target generator, and the piezoelectric ceramic driver is connected to the laser.
6. The apparatus of claim 5, wherein the droplet driving assembly further comprises a temperature control module coupled to the piezoelectric ceramic for adjusting the temperature of the piezoelectric ceramic.
7. The apparatus of claim 3, wherein the position processing assembly comprises an optical lens set, a three-dimensional moving translation stage, and a position control module, the laser and the optical lens set are coaxially mounted on the three-dimensional moving translation stage, and the position control module is connected to the three-dimensional moving translation stage and the signal detector.
8. The apparatus of claim 7, wherein the optical lens group comprises a predetermined number of lenses.
9. The apparatus of claim 3, wherein the laser comprises any one of an actively Q-switched laser and a passively Q-switched laser.
10. The apparatus of claim 3, further comprising a vacuum target chamber, wherein the vacuum target chamber is used for providing a vacuum environment for generating the EUV light.
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| CN117728279A (en) * | 2023-12-21 | 2024-03-19 | 广东国志激光技术有限公司 | High repetition frequency laser pulse generation device and extreme ultraviolet light generation system |
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| CN117728279A (en) * | 2023-12-21 | 2024-03-19 | 广东国志激光技术有限公司 | High repetition frequency laser pulse generation device and extreme ultraviolet light generation system |
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