CN114675509A - Method for generating extreme ultraviolet light and device for laser plasma extreme ultraviolet light source - Google Patents

Abstract

The invention relates to a method for generating extreme ultraviolet light and a device for a laser plasma extreme ultraviolet light source. The method for generating extreme ultraviolet light comprises the steps of: droplet driving processing, signal detection processing and position processing. Convert the laser pulse signal into a driving signal, disturb the liquid, generate droplets, detect the extreme ultraviolet radiation intensity of the droplets, obtain the position of the laser pulses and the position information of the droplets through calculation, and adjust the laser pulses position to focus the laser pulse on the droplet, producing extreme ultraviolet light. By using the method for generating extreme ultraviolet light and the device for laser plasma extreme ultraviolet light source of the present invention, it is not necessary to add a synchronization control device, and the precise synchronization of laser pulse and droplet can be realized at high frequency, and by adjusting the laser pulse position, achieve precise targeting, greatly improve the conversion efficiency of the plasma EUV light source, and secondly, the method and device are both simple and easy to operate.

Description

Method for generating extreme ultraviolet light and device for laser plasma extreme ultraviolet light source

technical field

The invention relates to the field of laser technology, in particular to a method for generating extreme ultraviolet light and a device for a laser plasma extreme ultraviolet light source.

Background technique

With the development of semiconductor technology, lithography technology has attracted more and more attention. However, as the integration of semiconductor chips is getting higher and higher, the exposure wavelength is required to be shorter and shorter. The light source used for lithography ranges from the earliest visible light band of 436 nanometers and the ultraviolet band of 365 nanometers to the later deep ultraviolet bands of 248 nanometers and 193 nanometers. , and through immersion technology, the feature size has been reduced to 22 nanometers, and so far, the 13.5 nanometer extreme ultraviolet light source is considered to be the most promising next-generation lithography light source. The methods of generating extreme ultraviolet light of 13.5 nm include: synchrotron radiation source technology, discharge plasma technology and laser plasma technology. However, due to the complexity and instability of the synchrotron radiation technology and the thermal effect of the discharge plasma technology, the first two schemes have great defects, which seriously hinder their development; relatively speaking, the laser plasma technology is due to its own device. The advantages of simplicity, good stability and high output power make it the best technical means to generate extreme ultraviolet light sources. At present, the laser plasma technology is disclosed. It is necessary to detect the droplet first and then control the laser to emit laser pulses to achieve target shooting. It is difficult to achieve synchronization between the laser pulse and the droplet at high frequencies, so that most of the laser energy is lost, and the device is complicated. , the operation is not easy, and the conversion efficiency of the EUV light source is very low.

Therefore, using laser plasma technology as an EUV light source, how to achieve precise synchronization of laser pulses and droplets at high frequencies, and how to improve the conversion efficiency of plasma EUV sources, have become urgent problems in this field.

SUMMARY OF THE INVENTION

Based on this, it is necessary to address the above problems, and the present invention provides a method for generating EUV light, which can achieve precise synchronization between laser pulses and droplets at high frequencies, and improve the conversion efficiency of plasma EUV light sources, and a laser plasma Device for extreme ultraviolet light source.

A method for producing extreme ultraviolet light, comprising the steps of:

Droplet drive processing: convert the laser pulse signal into a drive signal, disturb the liquid, and generate droplets;

Signal detection processing: detecting the extreme ultraviolet radiation intensity of the droplets;

Position processing: The position of the laser pulse and the position information of the droplet are obtained by calculation, and the position of the laser pulse is adjusted so that the laser pulse is focused on the droplet to generate extreme ultraviolet light.

In one embodiment, in the position processing, the laser pulse is focused on the droplet by translating the laser pulse in three dimensions.

A device for a laser plasma extreme ultraviolet light source, comprising:

Droplet drive component: used to convert the laser pulse signal into a drive signal, disturb the liquid, and generate droplets;

Signal detector: used to detect the EUV radiation intensity of the droplets;

Lasers for generating laser pulses and laser pulse signals; and

Position processing component: connected to the droplet driving component and the signal detector, used to receive the electrical signal and obtain the position of the laser pulse and the position information of the droplet through calculation, and adjust the laser pulse. position, so that the laser pulse is focused on the droplet, producing extreme ultraviolet light.

In one of the embodiments, the signal detector includes an EUV energy meter for detecting the EUV radiation intensity of the droplet.

In one embodiment, the droplet driving assembly includes a piezoelectric ceramic driver, a piezoelectric ceramic and a droplet target generator, one end of the piezoelectric ceramic is connected to the piezoelectric ceramic driver, and the other end is connected to the liquid droplet target generator. A drop target generator, the piezoelectric ceramic driver is connected to the laser.

In one embodiment, the droplet driving assembly further includes a temperature control module, the temperature control module is connected to the piezoelectric ceramic and used to adjust the temperature of the piezoelectric ceramic.

In one embodiment, the position processing assembly includes an optical lens group, a three-dimensional moving translation stage, and a position control module, the laser and the optical lens group are coaxially mounted on the three-dimensional moving translation stage, and the position The control module is connected to the three-dimensional moving translation stage and the signal detector.

In one of the embodiments, the optical lens group includes a preset number of lenses.

In one of the embodiments, the laser includes any one of an active Q-switched laser and a passive Q-switched laser.

In one embodiment, the device of the laser plasma EUV light source further includes a vacuum target chamber, and the vacuum target chamber is used to provide a vacuum environment for generating EUV light.

The above-mentioned method for generating extreme ultraviolet light and the device for a laser plasma extreme ultraviolet light source use a laser pulse signal as a trigger signal to drive the generation of droplets, without adding a synchronous control device, the laser pulse and droplets can be realized at high frequency The precise synchronization of the laser pulses is achieved, and precise targeting is achieved by adjusting the position of the laser pulse, which greatly improves the conversion efficiency of the plasma EUV light source. Secondly, the method and device are simple and easy to operate.

Description of drawings

1 is a schematic structural diagram of a device for a laser plasma EUV light source according to an embodiment of the present invention;

2 is a schematic structural diagram of a device for a laser plasma EUV light source according to another embodiment of the present invention;

3 is a schematic flowchart of a method for generating EUV light according to an embodiment of the present invention.

Reference numerals: 10. Device of laser plasma extreme ultraviolet light source; 11. Droplet drive assembly; 111, Piezoelectric ceramic driver; 112, Piezoelectric ceramics; 113, Droplet target generator; 114, Temperature control module; 12 13, laser; 14, position processing assembly; 141, optical lens group; 142, three-dimensional mobile translation stage; 143, position control module; 15, vacuum target chamber.

Detailed ways

In order to make the above objects, features and advantages of the present invention more clearly understood, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present invention. Therefore, the present invention is not limited by the specific embodiments disclosed below.

In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", " Back, Left, Right, Vertical, Horizontal, Top, Bottom, Inner, Outer, Clockwise, Counterclockwise, Axial , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the indicated device or Elements must have a particular orientation, be constructed and operate in a particular orientation and are therefore not to be construed as limitations of the invention.

In addition, the terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature delimited with "first", "second" may expressly or implicitly include at least one of that feature. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise expressly and specifically defined.

In the present invention, unless otherwise expressly specified and limited, the terms "installed", "connected", "connected", "fixed" and other terms should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection , or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between the two elements, unless otherwise specified limit. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.

In the present invention, unless otherwise expressly specified and limited, a first feature "on" or "under" a second feature may be in direct contact between the first and second features, or the first and second features indirectly through an intermediary touch. Also, the first feature being "above", "over" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is level higher than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.

It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or an intervening element may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used herein are for the purpose of illustration only and do not represent the only embodiment.

Referring to FIG. 1, FIG. 1 shows a schematic structural diagram of a device 10 for a laser plasma extreme ultraviolet light source according to an embodiment of the present invention, wherein the laser plasma technology is an extreme ultraviolet light source, and the laser plasma extreme ultraviolet light source of the present invention The ultraviolet light source device 10 refers to a device that utilizes laser plasma technology as an EUV light source to generate EUV light, and mainly includes a droplet driving component 11 , a signal detector 12 , a laser 13 and a position processing component 14 .

The droplet driving component 11 is used to convert the laser pulse signal into a driving signal, disturb the liquid, and generate droplets; in one embodiment, the droplet driving component 11 includes a piezoelectric ceramic driver 111, a piezoelectric ceramic 112 and a liquid droplet. For the drop target generator 113 , one end of the piezoelectric ceramic 112 is connected to the piezoelectric ceramic driver 111 , and the other end is connected to the drop target generator 113 , and the piezoelectric ceramic driver 111 is connected to the laser 13 .

In one embodiment, the piezoelectric ceramic driver 111 is used to receive a laser pulse signal and drive the piezoelectric ceramic 112 , and the piezoelectric ceramic driver 111 mainly includes a signal generating part, an impedance transforming part and a high-voltage amplifying part.

In one embodiment, piezoelectric ceramic 112 is used to generate vibrations. Generally speaking, after receiving the laser pulse signal, the piezoelectric ceramic driver 111 can convert the laser pulse signal into a signal for driving the piezoelectric ceramic 112 to generate an alternating voltage to drive the piezoelectric ceramic 112 to vibrate. Specifically, the piezoelectric ceramic driver 111 applies alternating voltages of different polarities at both ends of the polarization axis of the piezoelectric ceramic 112 to cause the piezoelectric ceramic 112 to vibrate. Wherein, the piezoelectric ceramic 112 is not particularly limited, for example, it can be an acoustic ceramic of less than 20 kHz, and, for example, can be an ultrasonic ceramic of more than 20 kHz, preferably, an ultrasonic ceramic of 40 kHz.

In one embodiment, the droplet target generator 113 is used to generate droplets. Specifically, the droplet target generator 113 transmits the vibration generated by the piezoelectric ceramic 112 into the liquid, thereby disturbing the liquid to generate droplets. Among them, the droplet target material used in the droplet target generator 113 is not particularly limited, and it is preferably a tin liquid.

In one embodiment, as shown in FIG. 2 , the droplet driving assembly 11 further includes a temperature control module 114, the temperature control module 114 is connected to the piezoelectric ceramic 112, and the temperature control module 114 is used to adjust the temperature of the piezoelectric ceramic 112 and maintain the pressure The characteristic vibration frequency of the electroceramic 112 . Further, by adjusting the temperature through the temperature control module 114, the piezoelectric ceramic 112 can be operated below the Curie temperature. Specifically, the temperature control module 114 adjusts the temperature correspondingly by measuring the change of the vibration frequency of the piezoelectric ceramic 112, so that the piezoelectric ceramic 112 operates at the characteristic vibration frequency, so as to realize piezoelectric matching and make the generation of droplets more stable. . Among them, the Curie temperature refers to the temperature at which a material can change between a ferromagnet and a paramagnet.

Wherein, the signal detector 12 is used to detect the EUV radiation intensity of the droplets, and convert the detected EUV radiation intensity into electrical signals and transmit them to the position processing component. In one embodiment, the signal detector 12 includes an EUV light energy meter for detecting the EUV radiation intensity of the droplets.

The laser 13 is used for generating laser pulses and laser pulse signals. Specifically, when the laser 13 emits laser pulses, it also generates a signal (ie, a laser pulse signal), which is used to drive the piezoelectric ceramic driver 111 , and the laser pulses are focused on the liquid through the optical lens group 141 . drop on. The signal refers to the electromagnetic code or electronic code of the data, and the laser pulse signal refers to a kind of electromagnetic code or electronic code for driving the piezoelectric ceramic driver 111 generated when the laser 13 emits laser pulses.

In one embodiment, the laser 13 is a high-power pulsed laser, including any one of an active Q-switched laser and a passive Q-switched laser. The active Q-switched laser refers to the laser 13 that can control the output of laser pulses by manually controlling the Q parameter. Passive Q-switched laser refers to a laser whose Q parameter is controlled by a saturable absorber and cannot be controlled artificially. The Q parameter is an index for evaluating the quality of the optical resonator in the laser, specifically, Q=(2π×energy stored in the resonator)/energy lost per oscillation period. In one embodiment, the active Q-switched laser and the passive Q-switched laser are not particularly limited, for example, the active Q-switched laser may be an actively Q-switched carbon dioxide laser, for example, the passive Q-switched laser may be a passively Q-switched fuel laser or the like.

In one embodiment, the position processing component 14 is connected to the droplet driving component 11 and the signal detector 12, and is used for receiving the electrical signal, obtaining the position of the laser pulse and the position information of the droplet through calculation, and adjusting the position of the droplet. The laser 13 is positioned so that the laser pulse is focused on the droplet, producing extreme ultraviolet light.

The position processing assembly 14 includes an optical lens group 141, a three-dimensional moving translation stage 142, and a position control module 143. The laser 13 and the optical lens group 141 are coaxially mounted on the three-dimensional moving translation stage 142, and the position control module 143 is connected to the three-dimensional moving translation stage 142. The translation stage 142 and the signal detector 12 are moved. The coaxial installation of the laser 13 and the optical lens group 141 on the three-dimensional moving translation stage 142 means that the laser 13 and the optical lens group 141 are installed on the three-dimensional moving translation stage 142 so that the optical axis of the laser 13 and the optical lens group 141 The optical axes are on the same straight line.

In one embodiment, the optical lens group 141 includes a preset number of lenses, and the preset number of lenses is not particularly limited, for example, it can be 3 lenses, or it can be 4 lenses, or it can be 5 lenses Lenses, etc., the optical lens group 141 preferably has three or four lenses.

In one embodiment, the laser pulses are beam expanded, collimated and focused on the droplet by the optical lens group 141 .

In one embodiment, the position control module 143 receives the electrical signal of the signal detector 12, calculates and judges the relative position of the laser pulse and the droplet, and adjusts the three-dimensional moving translation stage 142 to translate in the three-dimensional direction, so that the three-dimensional moving translation stage installed in the three-dimensional moving translation The laser 13 and the optical lens group 141 on the stage 142 translate in the three-dimensional direction, so that the laser pulse is translated in the three-dimensional direction, and then the laser pulse is precisely focused on the droplet, and the droplet generates plasma by absorbing energy, and radiates out. extreme ultraviolet light.

In one embodiment, the device 10 of the laser plasma EUV light source further includes a vacuum target chamber 15, and the vacuum target chamber 15 is used to provide a vacuum environment for generating EUV light.

In one embodiment, as shown in FIG. 1 , the laser 13 is an active Q-switched carbon dioxide laser 13, the droplet target is tin liquid, the signal detector 12 is an EUV energy meter, and the vacuum target chamber 15 is used to generate EUV light. In a vacuum environment, the active Q-switched carbon dioxide laser 13 is connected to the piezoelectric ceramic driver 111, one end of the piezoelectric ceramic 112 is connected to the piezoelectric ceramic driver 111, the other end is connected to the drop target generator 113, the active Q-switched carbon dioxide laser 13 and the optical lens group 141 is coaxially mounted on the three-dimensional moving translation stage 142, and the position control module 143 is connected to the three-dimensional moving translation stage 142 and the EUV energy meter. During operation, the active Q-switched carbon dioxide laser 13 emits laser pulses and generates laser pulse signals, and transmits the laser pulse signals to the piezoelectric ceramic driver 111, and the piezoelectric ceramic driver 111 receives the laser pulse signals and converts the laser pulse signals into driving piezoelectric The signal of the ceramic 112 generates an alternating voltage to drive the piezoelectric ceramic 112, so that the piezoelectric ceramic 112 vibrates, and the drop target generator 113 transmits the vibration of the piezoelectric ceramic 112 to the tin liquid, disturbs the tin liquid, and generates tin droplets , after the extreme ultraviolet energy meter detects the extreme ultraviolet radiation intensity of the tin droplet, it is converted into an electrical signal and transmitted to the position control module 143. The position control module 143 calculates and obtains the position of the laser pulse and the position information of the tin droplet, and adjusts the three-dimensional movement. The translation stage 142 translates in the three-dimensional direction, so that the active Q-switched carbon dioxide laser 13 and the optical lens group 141 are translated in the three-dimensional direction, and the position of the laser pulse is adjusted, so that the laser pulse is focused on the tin droplet through the optical lens group 141, and the tin liquid is The droplets generate plasma by absorbing energy, radiating extreme ultraviolet light. Therefore, the precise synchronization of the laser pulse and the droplet is realized under the premise of high frequency and no synchronization control device, and at the same time, the conversion efficiency of the plasma EUV light source is greatly improved.

In one embodiment, as shown in FIG. 2 , the laser 13 is a passive Q-switched dye laser 13 , the droplet target is tin liquid, the signal detector 12 is an EUV energy meter, and the vacuum target chamber 15 is used to generate EUV light. In a vacuum environment, the passive Q-switched dye laser 13 is connected to the piezoelectric ceramic driver 111 , one end of the piezoelectric ceramic 112 is connected to the piezoelectric ceramic driver 111 , the other end is connected to the drop target generator 113 , and the temperature control module 114 is connected to the piezoelectric ceramic 112 , the passive Q-switched dye laser 13 and the optical lens group 141 are coaxially mounted on the three-dimensional moving translation stage 142, and the position control module 143 is connected to the three-dimensional moving translation stage 142 and the EUV energy meter. During operation, the passive Q-switched dye laser 13 emits laser pulses and generates laser pulse signals, and transmits the laser pulse signals to the piezoelectric ceramic driver 111, and the piezoelectric ceramic driver 111 receives the laser pulse signals and converts the laser pulse signals into driving piezoelectric The signal of the ceramic 112 generates an alternating voltage to drive the piezoelectric ceramic 112. The temperature control module 114 adjusts the temperature of the piezoelectric ceramic 112 to keep the piezoelectric ceramic 112 vibrating at the characteristic vibration frequency. The vibration of the electric ceramic 112 is transmitted to the tin liquid, disturbing the tin liquid, and producing tin droplets. After the EUV energy meter detects the EUV radiation intensity of the tin droplets, it is converted into an electrical signal and transmitted to the position control module 143. The position control module 143 After calculating the position of the laser pulse and the position information of the tin droplet, adjust the three-dimensional moving translation stage 142 to translate in the three-dimensional direction, so that the passive Q-switched dye laser 13 and the optical lens group 141 are translated in the three-dimensional direction, and adjust the laser pulse. position, so that the laser pulse is focused on the tin droplet through the optical lens group 141, and the tin droplet generates plasma by absorbing energy, and radiates extreme ultraviolet light. By adding the temperature control module 114, piezoelectric matching is realized, and the generation of droplets is more stable, thereby further improving the precise synchronization of the laser pulse and the droplets, and at the same time greatly improving the conversion efficiency of the plasma EUV light source.

A method for producing extreme ultraviolet light, comprising the steps of:

Droplet drive processing: convert the laser pulse signal into a drive signal, disturb the liquid, and generate droplets;

Signal detection processing: detecting the extreme ultraviolet radiation intensity of the droplets;

Position processing: The position of the laser pulse and the position information of the droplet are obtained by calculation, and the position of the laser pulse is adjusted so that the laser pulse is focused on the droplet to generate extreme ultraviolet light.

In one embodiment, in the position adjustment process, the laser pulse is focused on the droplet by translating the laser pulse in three dimensions.

In one embodiment, the method for generating EUV mainly uses a laser pulse signal as the main signal to trigger the signals of each component in the laser plasma EUV light source device, so that each component is basically synchronized in time, so that the laser 13 The emitted laser pulses can be precisely focused on the droplets after passing through the optical module to achieve precise synchronization between the laser pulses and the droplets; secondly, through the processing of position adjustment, precise targeting can be achieved, which can greatly absorb the energy of the laser pulses by the droplets , improve the conversion efficiency of the light source and reduce the loss of laser energy.

In one embodiment, the conversion efficiency of the light source refers to the ratio of the generated extreme ultraviolet radiation energy to the energy of the laser 13. The present invention can make the extreme ultraviolet light generation method and the laser plasma extreme ultraviolet light source device to make The light source conversion efficiency is greater than 4%, for example, the light source conversion efficiency is between 4% and 5%, and for example, the light source conversion efficiency is as high as 5%.

In one embodiment, as shown in FIG. 3 , the method for generating EUV light includes converting a laser pulse signal into a driving signal by the droplet driving component 11 , disturbing the liquid, and generating droplets, and then the signal detector 12 detects The extreme ultraviolet radiation intensity of the droplet is converted into an electrical signal and transmitted to the position processing component 14. The position processing component 14 calculates and obtains the laser pulse and the position information of the droplet through the received electrical signal, and adjusts the The laser pulse is positioned so that the laser pulse is focused on the droplet, producing extreme ultraviolet light. Specifically, the laser 13 emits laser pulses and transmits the laser pulse signals to the piezoelectric ceramic driver 111 , and the piezoelectric ceramic driver 111 and the piezoelectric ceramics 112 convert the laser pulse signals into driving signals, so that the piezoelectric ceramics 112 vibrate Thus, the liquid is disturbed to generate droplets, and then the signal detector 12 detects the extreme ultraviolet radiation intensity of the droplets, and converts it into an electrical signal and transmits it to the position control module 143 of the position processing component 14. The position control module 143 calculates and obtains the laser light The position information of the pulse and the droplet, by adjusting the position of the three-dimensional moving translation stage 142, the laser pulse can be adjusted to translate in the three-dimensional direction, so that the laser pulse is focused on the droplet through the optical lens group 141 to generate extreme ultraviolet light .

The technical features of the above-described embodiments can be combined arbitrarily. For the sake of brevity, all possible combinations of the technical features in the above-described embodiments are not described. However, as long as there is no contradiction between the combinations of these technical features, All should be regarded as the scope described in this specification.

The above-mentioned embodiments only represent several embodiments of the present invention, and the descriptions thereof are specific and detailed, but should not be construed as a limitation on the scope of the invention patent. It should be pointed out that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can also be made, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention should be subject to the appended claims.

Claims (10)

1. a method for producing extreme ultraviolet light, is characterized in that, comprises the steps: Droplet drive processing: convert the laser pulse signal into a drive signal, disturb the liquid, and generate droplets; Signal detection processing: detecting the extreme ultraviolet radiation intensity of the droplets; Position processing: The position of the laser pulse and the position information of the droplet are obtained by calculation, and the position of the laser pulse is adjusted so that the laser pulse is focused on the droplet to generate extreme ultraviolet light. 2 . The method for generating ultraviolet light according to claim 1 , wherein, in the position processing, the laser pulse is shifted in a three-dimensional direction to focus the laser pulse on the droplet. 3 . 3. A device for a laser plasma extreme ultraviolet light source, comprising: The droplet driving component is used to convert the laser pulse signal into a driving signal, disturb the liquid, and generate droplets; a signal detector for detecting the EUV radiation intensity of the droplets; Lasers for generating laser pulses and laser pulse signals; and a position processing component, connected to the droplet driving component and the signal detector, for receiving the electrical signal and obtaining the position of the laser pulse and the position information of the droplet through calculation, and adjusting the position of the laser , focusing the laser pulse on the droplet, producing extreme ultraviolet light. 4 . The device for laser plasma EUV light source according to claim 3 , wherein the signal detector comprises an EUV energy meter, and the EUV energy meter is used to detect EUV radiation of the droplets. 5 . strength. 5 . The device for laser plasma extreme ultraviolet light source according to claim 3 , wherein the droplet driving component comprises a piezoelectric ceramic driver, a piezoelectric ceramic and a droplet target generator, and the piezoelectric ceramic One end is connected to the piezoelectric ceramic driver, the other end is connected to the drop target generator, and the piezoelectric ceramic driver is connected to the laser. 6 . The device for laser plasma extreme ultraviolet light source according to claim 5 , wherein the droplet driving assembly further comprises a temperature control module, and the temperature control module is connected to the piezoelectric ceramic and used to adjust the temperature. 7 . the piezoelectric ceramic temperature. 7 . The device for laser plasma EUV light source according to claim 3 , wherein the position processing component comprises an optical lens group, a three-dimensional moving translation stage and a position control module, the laser and the optical lens group. 8 . The three-dimensional moving translation stage is coaxially mounted on the three-dimensional moving translation stage, and the position control module is connected to the three-dimensional moving translation stage and the signal detector. 8 . The laser plasma EUV light source device according to claim 7 , wherein the optical lens group comprises a preset number of lenses. 9 . 9 . The device for laser plasma EUV light source according to claim 3 , wherein the laser comprises any one of an active Q-switched laser and a passive Q-switched laser. 10 . 10 . The device of the laser plasma extreme ultraviolet light source according to claim 3 , wherein the device of the laser plasma extreme ultraviolet light source further comprises a vacuum target chamber, and the vacuum target chamber is used for generating extreme ultraviolet light. 11 . Provide a vacuum environment.

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