CN114659456A - Soft brush roller shaft distance detection device, adjustment system and method - Google Patents
Soft brush roller shaft distance detection device, adjustment system and method Download PDFInfo
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- CN114659456A CN114659456A CN202011547992.1A CN202011547992A CN114659456A CN 114659456 A CN114659456 A CN 114659456A CN 202011547992 A CN202011547992 A CN 202011547992A CN 114659456 A CN114659456 A CN 114659456A
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- 238000000034 method Methods 0.000 title claims abstract description 27
- 238000001514 detection method Methods 0.000 title claims description 36
- 230000001680 brushing effect Effects 0.000 claims abstract description 17
- 230000000694 effects Effects 0.000 claims abstract description 4
- 238000012545 processing Methods 0.000 claims description 34
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical group CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 23
- 238000003384 imaging method Methods 0.000 claims description 23
- 239000012459 cleaning agent Substances 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 15
- 230000000007 visual effect Effects 0.000 claims description 9
- 239000000654 additive Substances 0.000 claims description 7
- 230000000996 additive effect Effects 0.000 claims description 6
- -1 aromatic organic compound Chemical class 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 abstract description 14
- 230000002159 abnormal effect Effects 0.000 abstract description 7
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- 238000010521 absorption reaction Methods 0.000 description 24
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- 239000007921 spray Substances 0.000 description 11
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 239000010419 fine particle Substances 0.000 description 5
- 230000002745 absorbent Effects 0.000 description 3
- 239000002250 absorbent Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000002386 leaching Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 206010067484 Adverse reaction Diseases 0.000 description 2
- 230000006838 adverse reaction Effects 0.000 description 2
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- 239000013317 conjugated microporous polymer Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
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- 238000001035 drying Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
- G01S17/06—Systems determining position data of a target
- G01S17/08—Systems determining position data of a target for measuring distance only
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D3/00—Control of position or direction
- G05D3/12—Control of position or direction using feedback
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- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Computer Networks & Wireless Communication (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Automation & Control Theory (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention relates to a device, a system and a method for detecting the distance between roller shafts of a soft brush, belonging to the technical field of semiconductor manufacturing process and solving the problems that the adjustment of the distance between the roller shafts of the soft brush in the prior art needs to be finished manually, the labor is consumed and the production efficiency per capita is low; the cleaning effect is reduced and particles are remained due to untimely adjustment of the distance between the soft brush roll shafts; the problem that the distance between the soft brush roller shafts is not accurately adjusted due to improper operation of an individual, and the wafer is deformed and damaged due to abnormal stress of the soft brush roller on the wafer. The invention discloses a device for detecting the distance between the rollers of a soft brush, which comprises: the connecting line of the detector and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the detector and the center of the wafer and the plane where the pair of soft brush roller shafts are positioned is 60-90 degrees; the detector measures the distance between the soft brush roller shafts. The self-adjustment of the distance between the soft brush rollers of the brushing module in the semiconductor production process is realized.
Description
Technical Field
The invention relates to the technical field of semiconductor manufacturing processes, in particular to a device, a system and a method for detecting and adjusting the distance between rollers of a soft brush.
Background
With the progressive progress of semiconductor processes, the particle requirements of semiconductor processes are very strict recently, and the shrinking of chip patterns causes the fine particles, which have not been problematic before, to cause various adverse reactions in the present fine semiconductor manufacturing process. In the CMP, particles and sludge generated during polishing are attached to a wafer and cannot be effectively removed in a cleaning process of a cleaning chamber, which may induce fatal defects in the operation characteristics of a chip pattern. In particular, since various adverse reactions are caused by fine particles that have not caused problems, the CMP process is striving to reduce the fine particles from various aspects such as improvement of removal force, function, and fine management.
The CMP cleaning process is generally constructed in the order of rinsing, pre-cleaning, megasonic cleaning, first brushing, second brushing, and steam drying, in which the brushing is a module that removes fine particles strongly adhered to the wafer using a chemical cleaning agent and a pair of soft brush rollers. As shown in fig. 1, the brushing module structure includes a rinsing spray rod for spraying chemical cleaning liquid, a pair of roller soft brushes capable of rotating axially and opening and closing axially, and an auxiliary shaft located below the wafer being brushed for assisting the wafer to rotate. In order to rotate the wafer in a vertical state, the front ends and the rear ends of the roller shafts of the pair of cleaning roller shaft soft brushes are set to have different pitches as shown in fig. 2.
The problems of poor rotation of the wafer and incomplete cleaning of fine particles may occur if the pair of soft brush roller shafts are set by mistake. However, in the prior art, the adjustment of the soft brush roller shafts is a manual method, and no instrument capable of accurately measuring the interval of the soft brush roller shafts exists, so that the adjustment of different workers can be different.
Disclosure of Invention
In view of the above analysis, the present invention provides a device, an adjusting system and a method for detecting a distance between shafts of a soft brush roller, which at least solve one of the following technical problems: (1) in the prior art, the adjustment of the distance between a pair of roller shaft soft brushes needs to be completed manually, so that the labor consumption is high, and the per-capita production efficiency is low; (2) the cleaning effect is reduced and particles are remained due to untimely adjustment of the distance between the soft brush roll shafts; (3) the spacing between the soft brush roller shafts is inaccurately adjusted due to improper operation of an individual, and the soft brush roller is abnormal in stress on the wafer, so that the wafer is bent, deformed and damaged.
In one aspect, the present invention provides a device for detecting a distance between rollers of a soft brush, comprising: the connecting line of the detector and the center of the wafer is positioned in the radial direction of the wafer;
the included angle between the connecting line of the detector and the center of the wafer and the plane where the soft brush roller shaft is located is 60-90 degrees;
the detector is used for measuring the distance between the soft brush roller shafts.
Furthermore, the detector is a video measuring instrument, and the video measuring instrument measures the distance between the shafts of the soft brush roller through video imaging.
Further, the detector is an optical detector;
the detection device further comprises an optical emitter, a connecting line of the optical emitter and the center of the wafer is located in the radial direction of the wafer, and an included angle between the connecting line of the optical emitter and the center of the wafer and a plane where the soft brush roller shaft is located is 60-90 degrees.
Further, the optical detector is an infrared detector or an ultraviolet detector;
the optical emitter is an infrared emitter or an ultraviolet emitter.
Further, an imaging additive is added into the cleaning agent of the wafer.
Further, the imaging additive is isopropanol, and the wave number of infrared light detected by the infrared detector is ν 954cm-1V 818cm-1。
Further, the imaging additive is an aromatic organic compound, and the ultraviolet emitter emits ultraviolet light of 230-270 nm.
In one aspect, the invention provides a system for adjusting the distance between the soft brush roller shafts, which comprises a detection unit, a processing unit and an adjusting unit;
the detection unit is connected with the processing unit, and the processing unit is connected with the adjusting unit;
the detection unit is the device for detecting the distance between the soft brush roller shafts;
the detection unit transmits the detection signal to the processing unit, and the processing unit transmits the instruction signal to the adjusting unit.
Further, the processing unit comprises a server and a visual desktop operating system;
and the server displays the received information sent by the detection unit through a visual desktop operating system, and calculates to obtain an accurate target value for adjusting the distance between the soft brushing roller shafts.
Further, the adjusting unit includes an encoder and a driver,
the encoder is connected with the processing unit and the driver, converts the digital signals sent by the processing unit into analog signals and sends the analog signals to the driver.
Furthermore, the driver is connected with the soft brush, and the driver can realize the adjustment of the distance between the roller shafts of the soft brush by applying mechanical force or electromagnetic force.
In another aspect, the present invention provides a method for adjusting the distance between the soft brush roller shafts, using the system for adjusting the distance between the soft brush roller shafts, comprising:
the detection unit detects the distance between the soft brush roller shafts, monitors the distance between the soft brush roller shafts in real time and transmits detection data to the processing unit;
the processing unit calculates to obtain an accurate target value of the adjustment of the distance between the soft brush roller shafts according to the detection data;
the processing unit sends an adjusting signal to the adjusting unit;
the adjusting unit is used for adjusting the distance between the shafts of the soft brush roller.
Compared with the prior art, the invention can realize at least one of the following beneficial effects:
(1) compared with the prior art, the invention is provided with a video measuring instrument or an optical measuring instrument for measuring, and realizes the real-time measurement of the distance between the soft brush roller shafts and the change condition of the distance.
(2) According to the invention, the change of the distance between the soft brush roller shafts is determined through the analysis of the video image, and the automatic adjustment of the distance between the soft brush roller shafts is realized through the computer visual desktop.
(3) According to the invention, the automatic adjustment of the distance between the soft brush roller shafts is realized through the visual desktop control of the computer, the compiling of the compiler and the driving of the driver, so that the improper adjustment of the distance between the soft brush roller shafts caused by improper manual operation or inherent manual operation habit in the prior art is effectively avoided, and further the reduction of the soft brush scrubbing effect and the particle residue are avoided.
(4) According to the invention, the change of the distance between the soft brush roller shafts is monitored in real time by adopting the analysis of the video image, under the condition that the distance between the soft brush roller shafts automatically causes errors along with the continuous equipment in the brushing process or unreasonable errors exist after manual adjustment, an alarm can be sent to a process control center, the equipment is automatically locked, the continuous production in the abnormal state of the distance between the soft brush roller shafts is prevented, the great reduction of the yield is prevented, and the bending deformation and the damage caused by abnormal stress of the wafer due to the abnormal distance between the soft brush roller shafts can be even avoided.
In the invention, the technical schemes can be combined with each other to realize more preferable combination schemes. Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and drawings.
Drawings
The drawings are only for purposes of illustrating particular embodiments and are not to be construed as limiting the invention, wherein like reference numerals are used to designate like parts throughout.
FIG. 1 is a schematic diagram of a brushing module;
FIG. 2 is a schematic view of the adjustment of the spacing between the rollers of the soft brush;
FIG. 3 is a schematic diagram of a system for adjusting the distance between rollers of the flexible brush.
Reference numerals:
1-a wafer; 2-soft brush roller; 3-leaching the spray rod; 4-an auxiliary shaft; 5-a video camera; 6-a server; 7-visualization desktop operating system; 8-a driver; 9-coder.
Detailed Description
As shown in fig. 1, the structure of the brushing module includes a shower spray bar 3 for spraying chemical cleaning liquid, a pair of roller soft brushes 2 capable of rotating in the axial direction and opening and closing in the axial direction, and an auxiliary shaft 4 located below the wafer 1 under brushing to assist the wafer in rotation. In order to rotate the wafer 1 in a vertical state, the roller front ends and rear ends of the pair of cleaning roller soft brushes 2 are set at different pitches. The prior art is a manual method for adjusting the soft brush roller shaft, and as shown in fig. 2, no instrument capable of accurately measuring the interval of the soft brush roller shaft exists, so that the adjustment made by different workers may be different. Meanwhile, the adjustment of the distance between the pair of roller shaft soft brushes is manually finished, so that the labor is consumed, and the production efficiency per capita is low; the gap between the soft brush roller shafts is not adjusted in time, so that the brushing effect is reduced, and particles remain; when the operation is improper, the problems of inaccurate adjustment of the distance between the soft brush roller shafts and abnormal stress on the wafer, such as bending deformation and damage of the wafer, occur.
In consideration of the problem that the adjustment of the distance between the soft brush roller shafts in the prior art cannot realize the measurement of the adjustment distance, through intensive research, the applicant adopts a light imaging method to measure the distance between the soft brush roller shafts, and can realize accurate measurement. In one possible embodiment, the measurement of the soft brush roller spacing can be realized by a video image imaging device through a video image which can be seen in real time. Specific video image imaging apparatuses include a camera, and the like.
In consideration of the fact that the video image imaging device performs image imaging through visible light visible to the naked eye, although the mode has the advantage that the human eye can directly observe the video image imaging device, the problems that the naked eye cannot distinguish clearly and the like are easily caused because all processes and devices can be imaged by the video image imaging device. Invisible light which cannot be observed by naked eyes is selected for measuring the distance between the soft brush roller shafts, so that the distance between the soft brush roller shafts can be imaged and measured independently more clearly.
Through research, the spraying rod sprays cleaning agent to the wafer in the brushing process, absorbent capable of generating invisible light specific absorption is added into the cleaning agent, the absorbent is sprayed to the surface of the wafer and infiltrates a soft brush rolling along an axis, and therefore specific invisible light imaging can be carried out on the soft brush.
In a possible embodiment, ultraviolet light of invisible light is selected, and a trace amount of ultraviolet absorbent is added into the chemical cleaning agent sprayed by the leaching spray rod; under the ultraviolet irradiation, other parts without soaking the chemical cleaning agent do not generate ultraviolet absorption under the ultraviolet irradiation, only the surface of the wafer is covered with a cleaning agent liquid film, the soft brush is soaked by the cleaning agent and can generate ultraviolet absorption, the ultraviolet emission and absorption device is arranged above the wafer in the radial direction, and other parts except the soft brush to be detected cannot generate ultraviolet absorption, so that the accurate ultraviolet absorption imaging determination of the distance between the roller shafts of the soft brush is realized.
In another possible embodiment, invisible infrared light is selected. Considering that cleaning agent components in the chemical cleaning agent sprayed by the leaching spray rod can have infrared absorption, imaging additives do not need to be added into the cleaning agent, and the measurement of the distance between the rollers of the soft brush is realized through imaging and measurement of the infrared absorption of the cleaning agent components. In a possible implementation scheme, isopropanol is used as a chemical cleaning agent, infrared light absorption is used for directly imaging the isopropanol, and with the ultraviolet principle, an injection rod injects the isopropanol onto the surface of a wafer to soak a soft brush, and an infrared light emission and absorption device is arranged above the wafer in the radial direction, so that infrared absorption cannot be generated by other parts except the soft brush to be detected, and accurate infrared absorption imaging measurement of the distance between rollers of the soft brush is realized. But infrared light widely exists in a space-time range, and common objects can radiate infrared light with lower energy,the isopropanol molecule is 954cm at infrared wave number v-1、ν=818cm-1Fingerprint absorption exists at two wavenumbers, namely v to 954cm-1、ν=818cm-1No other substances produce infrared absorption at these two wavenumbers. Therefore, for a specific wave number v 954cm is selected-1、ν=818cm-1And infrared absorption imaging is carried out, so that other parts except the soft brush to be detected cannot generate infrared absorption, and accurate infrared absorption imaging measurement of the distance between the roller shafts of the soft brush is realized.
And transmitting the data measured by the video measuring instrument or the optical measuring instrument to a server, displaying the data through a visual desktop, and calculating to obtain an accurate target value for adjusting the distance between the soft brush roller shafts. Can direct input needs the target value of adjustment on visual desktop, the server sends digital signal for the encoder, and the encoder turns into analog signal with digital signal, and the driver receives the motion of the soft brush roller axle of drive behind the analog signal, realizes the adjustment to soft brush roller axle interval.
In one possible embodiment, the drive adjusts the distance between the soft brush rollers by means of a thread, i.e. the drive adjusts the distance between the soft brush rollers by means of mechanical forces, taking into account the fact that the distance between the soft brush rollers is very fine. In another possible embodiment, the connection part of the soft brush roller shaft and the driver is a permanent magnet, the driver is an electric driving part which generates magnetism when being powered on or powered off, and the size of the magnetic field generated by the electric driving part is changed by controlling the current, so that the distance between the soft brush roller shaft and the driver is adjusted.
In the prior art, the distance between the pair of roller shaft soft brushes needs to be adjusted manually, when personal operation is not proper, the distance between the roller shafts of the soft brushes can be adjusted inaccurately, and the problems of wafer bending deformation, damage and the like caused by abnormal stress of the wafer are solved. Based on the problems, the adjusting system for the distance between the soft brush roller shafts is also provided with an alarming and locking device. The data measured by the video measuring instrument or the optical measuring instrument is calculated by the server and then measured to the actual value d of the distance between the roller shafts of the soft brush1Actual distance d between server and soft brush roller shaft1Distance warning value d between the soft brush roller shaft and the soft brush roller shaft0The deviation ratio δ is calculated as follows:
if delta is more than or equal to 5 percent or delta is less than or equal to-5 percent, namely the actual value of the distance between the soft brush roller shafts exceeds the warning value by 5 percent, the deviation rate is judged to be too high. And if the delta is less than 5 percent in the range of-5 percent and less than 5 percent, namely the difference between the actual value of the spacing between the soft brush roller shafts and the warning value is within 5 percent, judging that the deviation rate is qualified.
When the deviation rate is too high, the alarm device is arranged to alarm a console in the process, and meanwhile, the server locks the soft brush roller shaft through the self-locking device to stop the axis of the soft brush roller shaft from rolling, so that the wafer is prevented from being bent, deformed or damaged, the yield is prevented from greatly sliding down due to continuous production, and the defective rate and the rejection rate are greatly increased.
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate preferred embodiments of the invention and together with the description, serve to explain the principles of the invention and not to limit the scope of the invention.
In the description of the embodiments of the present invention, it should be noted that, unless otherwise explicitly stated or limited, the term "connected" should be interpreted broadly, and may be, for example, a fixed connection, a detachable connection, or an integral connection, which may be a mechanical connection, an electrical connection, which may be a direct connection, or an indirect connection via an intermediate medium. As will be apparent to one of ordinary skill in the art,
the terms "top," "bottom," "above … …," "below," and "on … …" as used throughout the description are relative positions with respect to components of the device, such as the relative positions of the top and bottom substrates inside the device. It will be appreciated that the devices are multifunctional, regardless of their orientation in space.
The general working surface of the invention can be a plane or a curved surface, can be inclined or horizontal. For convenience of explanation, the embodiments of the present invention are placed on a horizontal plane and used on the horizontal plane, and are defined as "high and low" and "up and down".
Example one
The invention discloses a device for detecting the distance between rollers of a soft brush.
The soft brush roller axle distance detection device of this embodiment includes: a video camera;
a connecting line of the video camera and the center of the wafer is located in the radial direction of the wafer, and an included angle between the connecting line of the video camera and the center of the wafer and a plane where the soft brush roller shaft is located is 75 degrees; the distance from the video camera to the center of the wafer is 150 mm.
Example two
The invention discloses a device for detecting the distance between rollers of a soft brush.
The soft brush roller axle distance detection device of this embodiment includes: an ultraviolet detector and an ultraviolet emitter;
the connecting line of the ultraviolet detector and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the ultraviolet detector and the center of the wafer and the plane where the soft brush roller shaft is positioned is 90 degrees; the distance between the ultraviolet detector and the center of the wafer is 160 mm.
The connecting line of the ultraviolet emitter and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the ultraviolet emitter and the center of the wafer and the plane where the soft brush roller shaft is positioned is 70 degrees; the distance of the ultraviolet emitter from the center of the wafer is 200 mm.
EXAMPLE III
The invention discloses a device for detecting the distance between the rollers of a soft brush.
The soft brush roller axle distance detection device of this embodiment includes: an infrared detector and an infrared emitter;
the connecting line of the infrared detector and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the infrared detector and the center of the wafer and the plane where the soft brush roller shaft is positioned is 80 degrees; the distance of the infrared detector from the center of the wafer is 150 mm.
The connecting line of the infrared emitter and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the infrared emitter and the center of the wafer and the plane where the soft brush roller shaft is positioned is 90 degrees; the distance of the infrared emitter from the center of the wafer is 180 mm.
Example four
The invention discloses a system for adjusting the distance between rollers of a soft brush.
The system for adjusting the distance between the soft brush roller shafts in the embodiment, as shown in fig. 3, includes: the device comprises a detection unit, a processing unit and an adjusting unit.
The detection unit is connected with the processing unit through a data line, and the processing unit is connected with the adjusting unit through a data line.
The detection unit is a video camera 5, a connecting line of the video camera 5 and the center of the wafer 1 is located in the radial direction of the wafer, and an included angle between the connecting line of the video camera 5 and the center of the wafer 1 and a plane where the pair of soft brush roller shafts are located is 75 degrees; the distance of the video camera 5 from the center of the wafer 1 is 150 mm.
The processing unit comprises a server 6 and a visual desktop operating system 7.
The adjusting unit comprises an encoder 9 and a driver 8, the driver 8 is a motor, and the driver 8 adjusts the distance between the soft brush roller shafts in a threaded motion mode.
EXAMPLE five
The invention discloses a method for adjusting the distance between rollers of a soft brush.
The embodiment uses the adjustment system of the distance between the soft brush roller shafts to complete the adjustment of the distance between the soft brush roller shafts.
Soft brush roller axle spacing adjustment system includes: the device comprises a detection unit, a processing unit and an adjusting unit. The detection unit is connected with the processing unit through a data line, and the processing unit is connected with the adjusting unit through a data line.
The detection unit is an ultraviolet detector and an ultraviolet emitter.
The connecting line of the ultraviolet detector and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the ultraviolet detector and the center of the wafer and the plane where the soft brush roller shaft is positioned is 85 degrees; the distance between the ultraviolet detector and the center of the wafer is 180 mm.
The connecting line of the ultraviolet emitter and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the ultraviolet emitter and the center of the wafer and the plane where the soft brush roller shaft is positioned is 85 degrees; the distance of the ultraviolet emitter from the center of the wafer is 150 mm.
The processing unit comprises a server and a visualized desktop operating system.
The adjusting unit comprises an encoder and a driver, the driver is a motor, and the driver adjusts the distance between the soft brush roller shafts in a threaded motion mode.
The chemical cleaning agent sprayed by the spray rinsing rod above the soft brush contains 1 percent of naphthalene by volume fraction.
When the method is implemented, the naphthalene-containing chemical cleaning agent sprayed by the spray rod is rinsed to the surface of the wafer, and the two soft brushes are soaked by the aromatic organic compound-containing chemical cleaning agent in the brushing process.
The ultraviolet emitter emits ultraviolet light within the range of 230-270nm, the ultraviolet light irradiates on the system, the ultraviolet light is reflected and detected by the ultraviolet detector, and the ultraviolet detector measures the ultraviolet absorption at 254 nm. Because naphthalene has strong ultraviolet absorption at 254nm, ultraviolet light emitted by an ultraviolet emitter irradiates in a system, only two soft brush rollers soaked by a chemical cleaning machine containing naphthalene have strong ultraviolet absorption at 254nm in the system, and other parts do not have ultraviolet absorption at 254 nm. The ultraviolet detector obtains position relation images of the two soft brush rollers, the images are transmitted to the server, the server calculates the distance between the two soft brush roller shafts, and the distance between the two soft brush roller shafts is monitored in real time in the brushing process.
The server transmits the adjustment signal of the distance between the soft brush roller shafts to the compiler through the data line, the compiler converts the digital signal into an analog signal, the driver motor is controlled to rotate, the motor drives the threads connected with the soft brush to rotate, and the distance between the soft brush roller shafts is adjusted.
EXAMPLE six
The invention discloses a method for adjusting the distance between the rollers of a soft brush.
The embodiment uses the soft brush roller shaft spacing adjustment system to complete the adjustment of the soft brush roller shaft spacing.
Soft brush roller axle spacing adjustment system includes: the device comprises a detection unit, a processing unit and an adjusting unit. The detection unit is connected with the processing unit through a data line, and the processing unit is connected with the adjusting unit through a data line.
The detection unit is an infrared detector and an infrared emitter.
The connecting line of the infrared detector and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the infrared detector and the center of the wafer and the plane where the soft brush roller shaft is positioned is 90 degrees; the distance from the infrared detector to the center of the wafer is 180 mm.
The connecting line of the infrared emitter and the center of the wafer is positioned in the radial direction of the wafer, and the included angle between the connecting line of the infrared emitter and the center of the wafer and the plane where the soft brush roller shaft is positioned is 90 degrees; the infrared emitter is 150mm from the center of the wafer.
The processing unit comprises a server and a visualized desktop operating system.
The adjusting unit comprises an encoder and a driver, wherein the driver is a magnetic field generator and can generate N or S after being electrified through control.
The chemical cleaning agent sprayed by the spray rinsing spray rod above the soft brush is isopropanol.
When the cleaning method is implemented, the chemical cleaning agent isopropanol sprayed by the spray rod is leached to the surface of the wafer, and the isopropanol soaks the two soft brushes in the brushing process.
The infrared emitter emits wide-range infrared light, the infrared light irradiates on a system, the infrared light is detected by the infrared detector through reflection, and the wave number measured by the infrared detector is ν 954cm-1V 818cm-1Infrared absorption of (b). Because the isopropanol is 954cm at wave number v-1V 818cm-1Strong infrared characteristic absorption exists, infrared light emitted by an infrared emitter irradiates in a system, and only two soft brush rollers soaked by isopropanol in the system have the wave number v of 954cm-1V 818cm-1Has strong infrared absorption, and other components have wave number v 954cm-1V 818cm-1There is no infrared absorption. The infrared detector obtains position relation images of the two soft brush rollers, the images are transmitted to the server, the server calculates the distance between the two soft brush roller shafts, and the distance between the two soft brush roller shafts is monitored in real time in the brushing process.
The server transmits the adjustment signal of the distance between the soft brush roller shafts to the compiler through the data line, the compiler converts the digital signal into an analog signal, controls the current direction and the current magnitude of the driver, generates attraction force or repulsive force by generating the same or different magnetic fields and the permanent magnet of the soft brush action part, and controls the size of the attraction force or the repulsive force through the current magnitude to adjust the distance between the soft brush roller shafts.
When the distance between the two soft brush roller shafts exceeds the set warning value by 5%, the server sends an alarm to the whole process flow control center, starts the automatic lock, locks the two soft brush rollers to stop the two soft brush rollers from rolling, and waits for the maintenance of personnel.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention.
Claims (12)
1. The utility model provides a soft brush roller axle interval detection device which characterized in that includes: the connecting line of the detector and the center of the wafer is positioned in the radial direction of the wafer;
the included angle between the connecting line of the detector and the center of the wafer and the plane where the soft brush roller shaft is located is 60-90 degrees;
the detector is used for measuring the distance between the soft brush roller shafts.
2. The apparatus of claim 1, wherein the detector is a video measuring device, and the video measuring device measures the distance between the shafts of the soft brush roller by video imaging.
3. The apparatus for detecting a distance between shafts of a soft brush roller according to claim 1, wherein the sensor is an optical sensor;
the detection device further comprises an optical emitter, a connecting line of the optical emitter and the center of the wafer is located in the radial direction of the wafer, and an included angle between the connecting line of the optical emitter and the center of the wafer and a plane where the soft brush roller shaft is located is 60-90 degrees.
4. The device for detecting the distance between the shafts of the soft brush rollers as claimed in claim 3, wherein the optical detector is an infrared detector or an ultraviolet detector;
the optical emitter is an infrared emitter or an ultraviolet emitter.
5. The apparatus of claim 4, wherein an imaging additive is added to the cleaning agent of the wafer.
6. The apparatus of claim 5, wherein the imaging additive is isopropyl alcohol, and the infrared detector detects infrared light with a wave number v 954cm-1V 818cm-1。
7. The apparatus as claimed in claim 5, wherein the imaging additive is an aromatic organic compound, and the UV emitter emits UV light at 230-270 nm.
8. A soft brush roller shaft distance adjusting system is characterized by comprising a detection unit, a processing unit and an adjusting unit;
the detection unit is connected with the processing unit, and the processing unit is connected with the adjusting unit;
the detection unit is the soft brush roller shaft distance detection device of claims 1 to 7;
the detection unit transmits the detection signal to the processing unit, and the processing unit transmits the instruction signal to the adjusting unit.
9. The soft brush roller spacing adjustment system of claim 8, wherein the processing unit comprises a server and a visual desktop operating system;
and the server displays the received information sent by the detection unit through a visual desktop operating system, and calculates to obtain an accurate target value for adjusting the distance between the soft brushing roller shafts.
10. The system of claim 8, wherein the adjustment unit comprises an encoder and a driver, the encoder is connected to the processing unit and the driver, and converts the digital signal from the processing unit into an analog signal to be transmitted to the driver.
11. The system of claim 10, wherein the actuator is coupled to the flexible brush, and the actuator effects adjustment of the flexible brush roller spacing by application of mechanical or electromagnetic force.
12. A method for adjusting a distance between rollers of a soft brush using the system for adjusting a distance between rollers of a soft brush according to claims 8 to 10, comprising:
the detection unit detects the distance between the soft brush roller shafts, monitors the distance between the soft brush roller shafts in real time and transmits detection data to the processing unit;
the processing unit calculates to obtain an accurate target value of the adjustment of the distance between the soft brush roller shafts according to the detection data;
the processing unit sends an adjusting signal to the adjusting unit;
the adjusting unit is used for adjusting the distance between the shafts of the soft brush roller.
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