CN114657525A - FeCrAl/Ta alloy coating and preparation method thereof - Google Patents
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
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- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/06—Ferrous alloys, e.g. steel alloys containing aluminium
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- C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Abstract
The invention discloses an FeCrAl/Ta alloy coating and a preparation method thereof, wherein the FeCrAl/Ta alloy coating comprises a Ta transition layer and an FeCrAl layer deposited on the surface of the Ta transition layer; the chemical components of the FeCrAl coating are that the atomic percentage of Fe, Cr and Al is 79:10:11 at%. Preparing a FeCrAl/Ta alloy coating on a polished zirconium alloy substrate by adopting a magnetron sputtering method, and depositing a Ta transition layer between the FeCrAl coating and the zirconium alloy substrate by controlling the deposition sequence of a Ta target and the FeCrAl alloy target, wherein the intermediate transition layer prepared by the method has the advantages of smooth surface, few defects, less influence on the structure of an upper coating, clear and stable double-layer coating interface, contribution to the film-substrate interface bonding performance, uniform components and compact structure; the addition of the Ta intermediate transition layer can effectively improve the service relevance of the FeCrAl coating.
Description
Technical Field
The invention relates to the field of metal surface modification, in particular to a FeCrAl/Ta alloy coating and a preparation method thereof.
Background
The FeCrAl alloy has excellent high temperature oxidation resistance and mechanical property and is widely applied to the fields of aerospace, military industry, nuclear reactors and the like. During the high-temperature oxidation process, Cr and Al elements in the alloy can quickly form compact Cr on the surface of a sample2O3And Al2O3The oxide layer inhibits further erosion of oxygen elements to the interior, and shows excellent high-temperature oxidation resistance. Compared with the existing zirconium alloy cladding material, the oxidation kinetics rate constant of the FeCrAl alloy is reduced by 3-5 orders of magnitude, and good high-temperature mechanical property is kept. Therefore, it is listed as a candidate material for a reactor accident tolerant fuel zirconium alloy cladding coating.
The surface modification is carried out on the active Zr alloy, namely, a layer of anti-oxidation and anti-corrosion protective coating is prepared on the surface of the cladding, the physical isolation of the zirconium cladding and the coolant is realized on the premise of not changing the structural design of the reactor, the accident fault-tolerant capability of the zirconium cladding is improved, and the method is the most practical and feasible solution for improving the service safety of the nuclear cladding in a short time.
But the FeCrAl coating is directly deposited on the surface of the Zr alloy, because the Fe-Zr eutectic temperature is only 928 ℃, when the water loss accident happens, the cladding temperature can reach 1200 ℃, the coating and the matrix elements can be seriously interdiffused in the high-temperature steam oxidation process, a large number of cavities are formed in the interdiffusion zone due to the dissolution of the Fe-Zr eutectic and the Cokendaer effect, the mechanical property of the matrix and the combination of a film-substrate interface are seriously deteriorated, and even the matrix is deformed and the coating falls off.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides a FeCrAl/Ta alloy coating and a preparation method thereof.
The invention is realized by the following technical scheme:
an FeCrAl/Ta alloy coating comprises a Ta transition layer and an FeCrAl layer deposited on the surface of the Ta transition layer;
the crystal grains of the FeCrAl layer and the Ta transition layer are nano columnar crystals, the size of the nano columnar crystals is 50-80 nm, and the thickness of the Ta layer is 20-200 nm.
Preferably, the atomic percentages of the elements in the FeCrAl layer are as follows: 10-20 at.% of Cr, 11 at.% of Al and the balance of Fe.
Preferably, the thickness of the FeCrAl layer is 2.3 + -0.2 μm.
A preparation method of a FeCrAl/Ta coating system comprises the following steps:
step 2, sequentially sputtering and depositing a Ta transition layer and an FeCrAl layer on the alloy matrix obtained in the step 1 in a magnetron sputtering mode, and cooling to room temperature to obtain an FeCrAl/Ta alloy coating;
and the Ta target adopts radio frequency power to carry out source sputtering, the sputtering power is 100W, and the deposition time of the Ta transition layer is 332-3320 s.
Preferably, the method for grinding and cleaning the alloy matrix in the step 1 comprises the following steps:
and (3) carrying out sand paper grinding and polishing on the alloy matrix, and carrying out ultrasonic cleaning and drying on the polished alloy matrix.
Preferably, the vacuum etching method comprises the following steps:
and (3) conveying the cleaned alloy matrix into a magnetron sputtering coating chamber, vacuumizing, and etching at an etching power of 200W for 5 min.
Preferably, the method for sequentially depositing the Ta transition layer and the FeCrAl layer in step 2 is as follows:
firstly, carrying out Ta transition layer deposition on a Ta target by adopting radio frequency power sputtering, and then carrying out double-target co-sputtering on two FeCrAl alloy targets by adopting a direct current power supply.
Preferably, the Ta target has the purity of 99.99 wt.%, the sputtering power is 100W, the deposition pressure is set to be 0.3Pa, the deposition temperature is room temperature, and the rotating speed of the substrate is 15 r/min.
Preferably, the alloy matrix is a zirconium alloy, a steel matrix or a titanium alloy.
Compared with the prior art, the invention has the following beneficial technical effects:
a FeCrAl/Ta alloy coating, pure metal Ta has lower solubility in Zr alloy, the interdiffusion coefficient with Zr basal body is low, and is similar to the thermal expansion coefficient of the FeCrAl alloy coating, the intermediate transition layer should select the material with larger atomic size as far as possible, because the material with larger atomic size has higher diffusion activation energy, and the displacement compatibility between the atomic sizes is smaller, and then can hinder the interdiffusion between elements, Ta has larger atomic size, the appearance is nano-columnar crystal, the organization is compact and uniform, the Ta can be used as the preferred material of the intermediate transition layer between the FeCrAl coating and the Zr alloy basal body, and the Ta as the intermediate transition layer can improve the service performance of the FeCrAl coating.
According to the preparation method of the FeCrAl/Ta alloy coating, the pure metal Ta target and the FeCrAl alloy target are alternately sputtered by magnetron sputtering, the deposited coating interface is obvious, and the deposition rate is high; the scattering effect of the working gas argon on sputtered atoms is weak, and the deposition efficiency and the adhesive force of the film are further improved. Therefore, the deposited film is uniform and compact, has few defects, high purity and strong adhesion. According to the method, the deposition sequence of the pure metal Ta target and the FeCrAl alloy target is controlled, and the transition layer is deposited between the FeCrAl coating and the Zr alloy substrate. The FeCrAl alloy target adopts 200W of direct current power, and the pure metal Ta target adopts 100W of radio frequency power supply power.
And finally, the finished product is naturally cooled to room temperature in a vacuum coating chamber, so that the phenomenon that the film is debonded and broken from the substrate due to the difference of the coefficients of thermal expansion of the film and the substrate is avoided, and the film is prevented from being oxidized.
Drawings
FIG. 1 is SEM surface photograph and EDS surface scanning element distribution diagram of FeCrAl/Ta alloy coating of the present invention.
FIG. 2 is a SEM photograph of a cross section of a FeCrAl/Ta alloy coating of the present invention.
FIG. 3 is a TEM image of a low magnification cross section of FeCrAl/Ta alloy coating of the present invention.
Detailed Description
The present invention will now be described in further detail with reference to the attached drawings, which are illustrative, but not limiting, of the present invention.
An FeCrAl/Ta alloy coating comprises a Ta transition layer and an FeCrAl layer deposited on the surface of the Ta transition layer; the Ta transition layer is made of pure metal Ta, the atomic percentages of all elements in the FeCrAl layer are 10-20 at.% of Cr, 11 at.% of Al and the balance of Fe; the crystal grains of the Ta transition layer and the FeCrAl layer are nano columnar crystals, the size of the columnar crystals is 50-80 nm, the thickness of the Ta is 20-200nm, and the thickness of the FeCrAl alloy coating is 2.3 +/-0.2 mu m.
FIG. 1 shows SEM surface pictures and surface EDS scanning element distribution diagrams of FeCrAl/Ta coating systems of the invention; FIG. 2 shows SEM cross-sectional pictures of FeCrAl/Ta coating systems of the present invention; FIG. 3 shows a low resolution TEM cross-sectional picture of FeCrAl/Ta coating system of the present invention. According to the FeCrAl/Ta coating system, the internal alloy elements are uniformly distributed, and the crystal grains are nano columnar crystals. The FeCrAl/Ta coating system has uniform and compact structure and excellent oxidation resistance.
A preparation method of a FeCrAl/Ta alloy coating comprises the following steps:
step 1: and grinding and polishing the alloy matrix to remove the oxide layer on the surface of the alloy matrix.
The polishing and grinding method specifically comprises the steps of grinding the zirconium alloy matrix by 600-mesh, 1000-mesh, 1500-mesh and 2000-mesh abrasive paper in sequence by adopting a cross grinding method, then polishing on a polishing machine, grinding the rest surfaces by 600-mesh, 1000-mesh and 1500-mesh abrasive paper in sequence, and grinding the surface oxide layer until the surface is free of scratches.
The alloy matrix is zirconium alloy, steel matrix or titanium alloy.
And 2, step: and (4) carrying out ultrasonic cleaning on the alloy matrix ground and polished in the step (1).
Specifically, the alloy matrix with a polished single surface is taken, sequentially subjected to ultrasonic cleaning in acetone and ethanol for 10 minutes and dried, the surface of the matrix is ensured to be clean and free of stains and dust adhesion, and the polished alloy matrix is subjected to ultrasonic cleaning, so that the bonding force between a film and the matrix is improved.
And step 3: and (3) etching the alloy matrix obtained in the step (2) under a vacuum condition to remove impurities on the surface of the alloy matrix.
Specifically, the alloy substrate is adhered to a substrate by conductive adhesive and sent into a film coating chamber, and the vacuum degree of the back bottom is pumped to 4.0 multiplied by 10-4Pa below, the etching power is 200W, and the etching time is 5 min.
And 4, step 4: and sputtering and depositing a Ta transition layer and an FeCrAl layer on the alloy matrix in sequence by adopting a magnetron sputtering method, and cooling to room temperature after sputtering and depositing to a preset thickness to obtain the FeCrAl/Ta alloy coating.
Specifically, the alloy matrix after ultrasonic cleaning is fixed on a base plate, automatically and mechanically sent into a magnetron sputtering coating chamber, and vacuumized until the vacuum degree of the back bottom is 4.0 multiplied by 10-4Pa or less.
And (3) sequentially depositing a Ta transition layer and an FeCrAl layer on the alloy substrate by adopting a Ta target and an FeCrAl alloy target, sputtering and depositing to a preset thickness, and cooling the substrate to room temperature in a high-vacuum coating chamber to obtain the FeCrAl/Ta alloy coating in order to ensure that the internal stress of the sample is small and prevent the sample from being oxidized in the air due to the temperature rise in the deposition process.
The purity of the FeCrAl alloy target is 99.9 wt.%, the atomic percentages of elements in the FeCrAl layer are 10-20 at.% of Cr, 11 at.% of Al, and the balance of Fe. The FeCrAl alloy target is sputtered by a direct-current power supply with the power of 200W.
Sputtering Ta target with purity of 99.99 wt.% by using a radio frequency power supply, the power of 100W, the deposition pressure of 0.3Pa, the deposition temperature of room temperature, the rotating speed of the base disc of 15r/min, and the vacuum degree of 4.0 multiplied by 10-4The deposition preparation is started under Pa, the deposition time of the Ta intermediate transition layer is 332s-3320s, the deposition time of the FeCrAl coating is 10800s, the thickness of the finally obtained Ta intermediate transition layer is 20-200nm, and the thickness of the FeCrAl coating is 2.3 +/-0.2 mu m.
The principle of depositing the coating on the surface of the substrate by adopting a magnetron sputtering method is as follows: ionized by Ar gasAr+The target surface of the cathode target is accelerated and bombarded under the action of the electric field, so that target atoms sputtered from the target are deposited on the substrate, and sputtered secondary electrons are bound in a plasma region close to the target surface under the action of the electric field and the magnetic field, so that the collision probability with Ar is increased, and more Ar is ionized+A higher deposition rate is achieved. After deposition, the substrate is taken out after being fully cooled in a high vacuum coating chamber so as to prevent debonding and cracking caused by the difference of the thermal expansion coefficients of the substrate and the film material and oxidation of high-temperature air. Finally depositing FeCrAl/Ta coating system with intermediate transition layer Ta.
Example 1
Step 1: and (3) grinding and polishing the zirconium alloy matrix by using sand paper.
Step 2: and ultrasonically cleaning the zirconium alloy substrate with the polished single surface in acetone and ethanol for 10min respectively, and drying by using a blower.
And 3, step 3: fixing the zirconium alloy base on the base plate, mechanically and automatically tracing the zirconium alloy base into a vacuum coating chamber, wherein the vacuum degree of the back bottom is lower than 4.0 multiplied by 10 before deposition-4Pa, and etching for 5min with the etching power of 200W.
And 4, step 4: and sequentially sputtering and depositing a Ta transition layer and an FeCrAl layer on the zirconium alloy base by adopting a magnetron sputtering method, and cooling to room temperature after sequentially sputtering and depositing to a preset thickness to obtain the FeCrAl/Ta alloy coating.
The purity of the FeCrAl alloy target is 99.9 wt.%, the atomic percent of Fe, Cr and Al is 79:10:11 at.%, the direct-current power supply power is adopted for sputtering 200W, the purity of the Ta target is 99.9 wt.%, the radio-frequency power supply power is adopted for sputtering 100W, the deposition pressure is 0.3Pa, the deposition temperature is room temperature, the rotating speed of a base plate is 15r/min, the deposition time of a Ta transition layer is 1660s, the deposition time of a FeCrAl coating is 10800s, the thickness of the finally obtained Ta transition layer is 100 +/-20 nm, and the thickness of the FeCrAl coating is 2.3 +/-0.2 mu m.
And 5: after deposition is finished, the zirconium alloy base is naturally cooled for 4 hours in a high vacuum sputtering chamber and then taken out to obtain a FeCrAl/Ta coating system.
Microstructure characterization and oxidation performance tests are carried out on the prepared FeCrAl/Ta coating system, and EDS element distribution data show that the atomic percentage of Fe, Cr and Al is 79:10:11 at.%, crystal grains are nano columnar crystals, and the FeCrAl/Ta coating system has excellent high-temperature oxidation resistance.
Example 2
Step 1: the steel substrate was sanded and polished.
Step 2: and ultrasonically cleaning the steel substrate with one polished surface in acetone and ethanol for 10min respectively, and drying by using a blower.
And step 3: fixing the steel substrate on the base plate, mechanically and automatically feeding into a vacuum coating chamber with vacuum degree of the back bottom lower than 4.0 × 10 before deposition-4Pa, and etching for 5min with the etching power of 200W.
And 4, step 4: and sequentially sputtering and depositing a Ta transition layer and an FeCrAl layer on the steel substrate by adopting a magnetron sputtering method, and cooling to room temperature after sequentially sputtering and depositing to a preset thickness to obtain the FeCrAl/Ta alloy coating.
The purity of the FeCrAl alloy target is 99.9 wt.%, the atomic percent of Fe, Cr and Al is 74:15:11 at.%, the direct-current power supply power is 200W for sputtering, the purity of the Ta target is 99.9 wt.%, the radio-frequency power supply power is 100W for sputtering, the deposition pressure is 0.3Pa, the deposition temperature is room temperature, the rotating speed of a base plate is 15r/min, the deposition time of a Ta intermediate transition layer is 332s, the deposition time of a FeCrAl coating is 10800s, the thickness of the finally obtained Ta transition layer is 20nm, and the thickness of the FeCrAl coating is 2.3 +/-0.2 mu m.
And 5: and after deposition is finished, naturally cooling the steel substrate in a high-vacuum sputtering chamber for 4 hours, and taking out the steel substrate to obtain an FeCrAl/Ta coating system.
Microstructure characterization and oxidation performance tests are carried out on the prepared FeCrAl/Ta coating system, and EDS element distribution data show that the atomic percent of Fe, Cr and Al is 74:15:11 at.%, crystal grains are nano columnar crystals, and the FeCrAl/Ta coating system has excellent high-temperature oxidation resistance.
Example 3
Step 1: and (4) carrying out sand paper grinding and polishing on the titanium alloy matrix.
Step 2: and ultrasonically cleaning the titanium alloy substrate with the single side polished in acetone and ethanol for 10min respectively, and drying by using a blower.
And step 3: mixing steelThe substrate is fixed on a base plate, then the substrate is mechanically and automatically conveyed into a vacuum coating chamber, and the vacuum degree of the back bottom is lower than 4.0 multiplied by 10 before deposition-4Pa, and etching for 5min with the etching power of 200W.
And 4, step 4: and sequentially sputtering and depositing a Ta transition layer and an FeCrAl layer on the titanium alloy substrate by adopting a magnetron sputtering method, and cooling to room temperature after sequentially sputtering and depositing to a preset thickness to obtain the FeCrAl/Ta alloy coating.
The purity of the FeCrAl alloy target is 99.9 wt.%, the atomic percent of Fe, Cr and Al is 69:20:11 at.%, the direct-current power supply power is 200W for sputtering, the purity of the Ta target is 99.9 wt.%, the radio-frequency power supply power is 100W for sputtering, the deposition pressure is 0.3Pa, the deposition temperature is room temperature, the rotating speed of a base plate is 15r/min, the deposition time of a Ta intermediate transition layer is 3320s, the deposition time of a FeCrAl coating is 10800s, the thickness of the finally obtained Ta transition layer is 200nm, and the thickness of the FeCrAl coating is 2.3 +/-0.2 mu m.
And 5: after deposition is finished, the titanium alloy matrix is naturally cooled for 4 hours in a high vacuum sputtering chamber and then taken out to obtain a FeCrAl/Ta coating system.
Microstructure characterization and oxidation performance tests are carried out on the prepared FeCrAl/Ta coating system, EDS element distribution data show that the atomic percentage of Fe, Cr and Al is 69:20:10 at.%, crystal grains are nano columnar crystals, and the FeCrAl/Ta coating system has excellent high-temperature oxidation resistance.
The above-mentioned contents are only for illustrating the technical idea of the present invention, and the protection scope of the present invention is not limited thereby, and any modification made on the basis of the technical idea of the present invention falls within the protection scope of the claims of the present invention.
Claims (9)
1. An FeCrAl/Ta alloy coating is characterized by comprising a Ta transition layer and an FeCrAl layer deposited on the surface of the Ta transition layer;
the crystal grains of the FeCrAl layer and the Ta transition layer are nano columnar crystals, the size of the nano columnar crystals is 50-80 nm, and the thickness of the Ta layer is 20-200 nm.
2. A FeCrAl/Ta alloy coating according to claim 1, characterized in that the atomic percentage of the elements in the FeCrAl layer is: 10-20 at% of Cr, 11 at% of Al and the balance of Fe.
3. A FeCrAl/Ta alloy coating according to claim 1, characterized in that the thickness of the FeCrAl layer is 2.3 ± 0.2 μm.
4. A method for the preparation of a FeCrAl/Ta coating system according to any of the claims 1-3, characterized in that it comprises the steps of:
step 1, grinding, cleaning and vacuum etching an alloy substrate;
step 2, sequentially sputtering and depositing a Ta transition layer and an FeCrAl layer on the alloy substrate obtained in the step 1 in a magnetron sputtering mode, and cooling to room temperature to obtain an FeCrAl/Ta alloy coating;
and the Ta target adopts radio frequency power to carry out source sputtering, the sputtering power is 100W, and the deposition time of the Ta transition layer is 332-3320 s.
5. A method for preparing a FeCrAl/Ta coating system according to claim 4, wherein the method for grinding and cleaning the alloy matrix in step 1 is as follows:
and (3) carrying out sand paper grinding and polishing on the alloy matrix, and carrying out ultrasonic cleaning and drying on the polished alloy matrix.
6. The method for preparing a FeCrAl/Ta coating system according to claim 4, wherein the vacuum etching method is as follows:
and (3) conveying the cleaned alloy matrix into a magnetron sputtering coating chamber, vacuumizing, and etching at the etching power of 200W for 5 min.
7. A method for preparing a FeCrAl/Ta coating system according to claim 4, characterized in that the method for depositing the Ta transition layer and the FeCrAl layer in sequence in step 2 is as follows:
firstly, carrying out Ta transition layer deposition on a Ta target by adopting radio frequency power sputtering, and then carrying out double-target co-sputtering on two FeCrAl alloy targets by adopting a direct current power supply.
8. A method for preparing a FeCrAl/Ta coating system according to claim 4, characterized in that the Ta target purity is 99.99 wt.%, the sputtering power is 100W, the deposition gas pressure is set to 0.3Pa, the deposition temperature is room temperature, and the substrate rotation speed is 15 r/min.
9. Method for the production of a FeCrAl/Ta coating system according to claim 4, characterized in that the alloy matrix is a zirconium alloy, a steel matrix or a titanium alloy.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115142028A (en) * | 2022-08-25 | 2022-10-04 | 西安稀有金属材料研究院有限公司 | Preparation method of wear-resistant corrosion-resistant Fe-Cr-Al composite coating |
| CN115181932A (en) * | 2022-07-15 | 2022-10-14 | 上海大学 | Zirconium alloy surface FeCrAl/Al 2 O 3 Composite coating and preparation method thereof |
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| CN115142028B (en) * | 2022-08-25 | 2023-06-30 | 西安稀有金属材料研究院有限公司 | Preparation method of wear-resistant corrosion-resistant Fe-Cr-Al composite coating |
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