CN114622264B - Fluid monitoring device - Google Patents
Fluid monitoring device Download PDFInfo
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- CN114622264B CN114622264B CN202011457748.6A CN202011457748A CN114622264B CN 114622264 B CN114622264 B CN 114622264B CN 202011457748 A CN202011457748 A CN 202011457748A CN 114622264 B CN114622264 B CN 114622264B
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Abstract
The application provides a fluid monitoring device. In this application, this fluid monitoring device includes: a container and a hydrodynamic force monitoring unit; the container comprises a transparent part, and the hydrodynamic monitoring part is positioned in the container and fixed on the transparent part; the container is used for containing fluid; when the fluid is disturbed, the state of the fluid power monitoring part is visually changed, and the state of the fluid power monitoring part is changed along with the change of the disturbance state of the fluid, wherein the state of the fluid power monitoring part is used for indicating the disturbance state of the fluid, and the disturbance state comprises the circulation direction of the fluid and the disturbance amplitude. In this application embodiment, can direct monitoring electroplate the vortex state of class fluid, and then, can discover electroplating device's improvement direction according to electroplating the vortex state of class fluid, help in time improving electroplating device, improve electroplating homogeneity, improve electroplating quality.
Description
Technical Field
The application relates to the technical field of electroplating, in particular to a fluid monitoring device.
Background
In the related art, it is known from the current distribution theory of the electrolytic cell that the electroplating uniformity is determined by improving the primary current distribution and the secondary current distribution by combining the hardware of the electroplating equipment and the electroplating solution. In theory, the most influencing factor of plating solution dispersion is whether the fluid (plating solution) power design is reasonable or not, besides the characteristics of the plating solution itself. So the research on the hydrodynamic state of electroplating is particularly important.
In the related art, plating fluid dynamics is mostly researched by taking plating products as research objects, and no direct means is adopted to research the turbulent flow state and the pressure state of plating fluid.
Disclosure of Invention
The embodiment of the application provides a fluid monitoring device which can directly monitor the turbulent flow state of electroplating fluid.
An embodiment of the present application provides a fluid monitoring apparatus, including: a container and a hydrodynamic force monitoring unit;
the container comprises a transparent part, and the hydrodynamic monitoring part is positioned in the container and fixed on the transparent part;
the container is used for containing fluid;
when the fluid is disturbed, the state of the fluid power monitoring part is visually changed, and the state of the fluid power monitoring part is changed along with the change of the disturbance state of the fluid, wherein the state of the fluid power monitoring part is used for indicating the disturbance state of the fluid, and the disturbance state comprises the circulation direction and/or the disturbance amplitude of the fluid.
In one embodiment, the material of the transparent part is a corrosion-resistant material;
the transparent portion is at least a portion of a sidewall of the container.
In one embodiment, the transparent portion is made of polypropylene.
In one embodiment, the hydrodynamic monitoring portion comprises N clusters of ribbons, wherein each cluster of ribbons comprises at least one ribbon, the N clusters of ribbons being respectively secured to N locations on the transparent portion, the N locations being evenly distributed on the transparent portion; n is a positive integer.
In one embodiment, the material of the ribbon is chemical fiber.
In one embodiment, the material of the ribbon is polyimide fiber.
In one embodiment, the fluid monitoring device further comprises a fluid pressure monitoring portion, wherein the fluid pressure monitoring portion is located in the container and is fixed on the transparent portion, and is used for monitoring the pressure distribution of the fluid.
In one embodiment, the fluid pressure monitoring portion is a pressure measurement film that is overlaid on the transparent portion, and the fluid dynamic monitoring portion is secured to the pressure measurement film.
In one embodiment, the fluid pressure monitoring part comprises a plurality of pressure sensors arranged in an array, and the fluid power monitoring part is fixed on the plurality of pressure sensors.
In one embodiment, the fluid monitoring apparatus further comprises a heater, a circulation pump and a rocking mechanism;
the heater, the circulating pump and the swinging mechanism are respectively positioned in the container;
the heater is used for heating the fluid, the circulating pump is used for promoting the circulation of the fluid, and the swinging mechanism is used for stirring the fluid.
In this embodiment of the present application, because the container includes the transparent portion, and the hydrodynamic force monitoring portion is located the container, and is fixed in on the transparent portion, when the fluid takes place to disturb, the state of hydrodynamic force monitoring portion takes place visual change, consequently, can supply the monitoring personnel to observe the state of hydrodynamic force monitoring portion through the transparent portion, again because the state of hydrodynamic force monitoring portion changes along with the disturbance state change of fluid, the state of hydrodynamic force monitoring portion is used for instructing the disturbance state of fluid, consequently, the monitoring personnel can observe the disturbance state of fluid through the transparent portion. In summary, the technical scheme of the application enables the turbulent flow state of electroplating fluid to be directly monitored. Furthermore, the improvement direction of the electroplating device can be found according to the turbulent flow state of the electroplating fluid, which is beneficial to timely improving the electroplating device, improving the electroplating uniformity and improving the electroplating quality.
Drawings
Fig. 1 is a schematic structural view of a fluid monitoring apparatus according to an embodiment of the present application.
Detailed Description
Reference will now be made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, the same numbers in different drawings refer to the same or similar elements, unless otherwise indicated. The implementations described in the following exemplary examples are not representative of all implementations consistent with the present application. Rather, they are merely examples of apparatus and methods consistent with some aspects of the present application as detailed in the accompanying claims.
The terminology used in the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the present application. As used in this application and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used herein refers to and encompasses any or all possible combinations of one or more of the associated listed items.
It should be understood that although the terms first, second, third, etc. may be used herein to describe various information, these information should not be limited by these terms. These terms are only used to distinguish one type of information from another. For example, a first message may also be referred to as a second message, and similarly, a second message may also be referred to as a first message, without departing from the scope of the present application. The word "if" as used herein may be interpreted as "at … …" or "at … …" or "responsive to a determination", depending on the context.
Some embodiments of the present application are described in detail below with reference to the accompanying drawings. The following embodiments and features of the embodiments may be combined with each other without conflict.
Embodiments of the present application provide a fluid monitoring apparatus. The structure of the fluid monitoring device is approximately the same as that of the electroplating device for single-sided electroplating, and the fluid monitoring device is used for directly monitoring the turbulent flow state of electroplating fluid to find defects of the electroplating device and find the improvement direction. Wherein, the electroplating fluid is the same or similar to the environment of the electroplating liquid. As shown in fig. 1, the fluid monitoring apparatus includes a container 11, a fluid power monitoring portion 12, a fluid pressure monitoring portion 13, a conductive structure 14, a heater (not shown), a circulation pump (not shown), and a swing mechanism (not shown).
Wherein the container 11 is for containing a fluid. In this embodiment, the container 11 is a plating tank for containing a plating solution. Alternatively, the container 11 is a tank body similar to the structure of the plating tank, and is used for containing a plating fluid. The container 11 may be a rectangular parallelepiped including four side walls, but is not limited thereto, and for example, the container 11 may be a square or a cylinder.
Wherein the container 11 comprises a transparent portion 111. In the present embodiment, the transparent portion 111 is a part of one side wall of the container 11. Of course, the transparent portion 111 may be one side wall of the container 11. The monitoring person can observe the inside of the container 11 through the transparent portion 111.
In the present embodiment, the material of the transparent portion 111 is a corrosion-resistant material, for example, polypropylene may be used, but is not limited thereto.
Wherein the heater, the circulation pump and the rocking mechanism are respectively located in the container 11. The heater is used for heating the fluid, the circulating pump is used for promoting the circulation of the fluid, and the rocking mechanism is used for stirring the fluid. In this embodiment, as shown in fig. 1, turbulence 21 exists in the fluid when the heater heats the fluid, the circulation pump promotes circulation of the fluid, and the rocking mechanism stirs the fluid. The states of the turbulence 21 at different locations may be the same or different. For example, the turbulence 21 may include a first turbulence 211 and a second turbulence 212, where the circulation direction of the first turbulence 211 is different from the circulation direction of the second turbulence 212, and the disturbance amplitude of the first turbulence 211 may be the same as or different from the disturbance amplitude of the second turbulence 212.
Wherein the conductive structure 14 is located in the container 11 for simulating the anode of the electroplating apparatus, and the position of the conductive structure 14 in the container 11 is the same as the position of the anode of the electroplating apparatus in the electroplating bath. In this embodiment, the conductive structure 14 is not energized and is used only to simulate the anode of an electroplating apparatus.
The fluid pressure monitoring portion 13 is located in the container 11 and is fixed on the transparent portion 111 for monitoring the pressure distribution of the fluid. In the present embodiment, the fluid pressure monitoring section 13 is a pressure measurement film, which is covered on the transparent section 111. For example, the pressure measurement membrane may be a Fuji pressure measurement membrane, wherein the microcapsules in the pressure measurement membrane are ruptured when the fluid is applied to the pressure measurement membrane, the chromogenic material interacts with the chromogenic material, and the area of pressure sensed on the pressure measurement membrane is red in color. The shade of red is used to indicate the magnitude of the sensed pressure, e.g., the darker the red, the greater the pressure sensed by the pressure measurement film, the lighter the red, and the lesser the pressure sensed by the pressure measurement film. The monitoring personnel can observe the red area and the red shade distribution on the pressure measurement film through the transparent part 111, so that the pressure distribution of the fluid can be qualitatively determined, and the possible defects of the electroplating device can be found according to the pressure distribution of the fluid, so that the improvement direction of the electroplating device can be found, the electroplating device can be improved in time, and the electroplating quality can be improved. For example, the monitoring personnel can evaluate and improve parameters such as the circulation pump, the rocking mechanism, the mechanical structure of the tank body of the electroplating tank, and the like according to the pressure distribution of the fluid.
Of course, in other embodiments, the fluid pressure monitoring portion 13 may include a plurality of pressure sensors arranged in an array, and the fluid power monitoring portion 12 is fixed to the plurality of pressure sensors. The monitoring personnel can obtain a plurality of pressure values detected by a plurality of pressure sensors through the processing equipment and process the obtained pressure values to obtain the pressure distribution of the fluid.
The hydrodynamic force monitoring part 12 is located in the container 11 and is fixed to the transparent part 111. When the fluid is disturbed, the state of the fluid power monitoring part 12 is visually changed, and the state of the fluid power monitoring part 12 is changed along with the change of the disturbance state of the fluid, wherein the state of the fluid power monitoring part 12 is used for indicating the disturbance state of the fluid, and the disturbance state can comprise the circulation direction of the fluid and the disturbance amplitude. Of course, the disturbance state may also include one of a direction of circulation of the fluid and a disturbance amplitude.
In this embodiment, the hydrodynamic monitor 12 is fixed to the pressure measurement film. As shown in fig. 1, the hydrodynamic monitor portion 12 includes 3 clusters of bands 121, wherein each cluster of bands 121 includes 3 bands 1211,3 with the 3 clusters of bands 121 respectively secured to 3 locations on the transparent portion 111 for securing the 3 clusters of bands 121 evenly distributed on the transparent portion 111. The material of ribbon 1211 is corrosion resistant and flexible. The material of the ribbon may be chemical fiber, for example, polyimide fiber, but is not limited thereto. Of course, in other embodiments, the hydrodynamic monitoring portion 12 may also include 4, 5, or 6 clusters of ribbons 121, not limited to the embodiments listed herein. Each tuft of ribbons 121 may comprise 1, 2, 4, or 5 ribbons 1211, not limited to the embodiments listed herein.
In the present embodiment, the state of the ribbon 1211 is changed with the state change of the turbulence 21, and the state change of the ribbon 1211 is a visual change that can be seen by the naked eye of the monitoring person. For example, the curl direction of the ribbon 1211 changes with the change of the circulation direction of the turbulent flow 21, and when the circulation direction of the turbulent flow 21 is clockwise, the ribbon 1211 curls from the direction close to the transparent portion 111 to the direction away from the transparent portion 111 is clockwise, and when the circulation direction of the turbulent flow 21 is counterclockwise, the ribbon 1211 curls from the direction close to the transparent portion 111 to the direction away from the transparent portion 111 is counterclockwise. For another example, the oscillation amplitude of the ribbon 1211 may change as the disturbance amplitude of the disturbance 21 changes, where the oscillation amplitude of the ribbon 1211 is larger when the disturbance amplitude of the disturbance 21 is larger, and where the oscillation amplitude of the ribbon 1211 is smaller when the disturbance amplitude of the disturbance 21 is smaller.
In this embodiment, the disturbance change (state change) of the ribbon 1211 can be used to evaluate the disturbance state of the disturbance flow 21 over the entire plating window (in the range observable through the transparent portion 111), and artificial intervention can be made for the abnormal disturbance point, and the plating edge effect can be reduced by improving the plating apparatus. Meanwhile, for the position with poor disturbance, the corresponding mass transfer state can be studied to check the electroplating effect, for example, the effect of hole filling electroplating can be checked, and the electroplating effect of other electroplating processes can be checked.
Therefore, the monitoring personnel can observe the disturbance state (the state of the disturbance 21) of the fluid through the transparent part 111, namely, the disturbance state of the electroplating fluid can be directly monitored, and further, the improvement direction of the electroplating device can be found according to the disturbance state of the electroplating fluid, so that the electroplating device can be improved in time, and the electroplating quality is improved. For example, the monitoring personnel can evaluate and improve parameters of the circulation pump, the rocking mechanism, the mechanical structure of the tank body of the plating tank, etc. based on the pressure distribution of the fluid. Wherein, the parameters of the circulating pump include flow and frequency, the parameters of the swinging mechanism include frequency, amplitude, speed and angle of the blades, wherein, the swinging mechanism includes a plurality of blades arranged according to the designated angle, and the parameters of the mechanical structure of the tank body of the electroplating tank include size, but are not limited thereto.
The technical scheme provided by the embodiment is simple to realize, can intuitively present the disturbance state of the fluid, has low cost and strong practicability, can enable monitoring staff to conveniently and rapidly master the fluid dynamics state and the mass transfer effect, and is very helpful for qualitative research at the factory level.
In this embodiment of the present application, because the container includes the transparent portion, and the hydrodynamic force monitoring portion is located the container, and is fixed in on the transparent portion, when the fluid takes place to disturb, the state of hydrodynamic force monitoring portion takes place visual change, consequently, can supply the monitoring personnel to observe the state of hydrodynamic force monitoring portion through the transparent portion, again because the state of hydrodynamic force monitoring portion changes along with the disturbance state change of fluid, the state of hydrodynamic force monitoring portion is used for instructing the disturbance state of fluid, consequently, the monitoring personnel can observe the disturbance state of fluid through the transparent portion. In summary, the technical scheme of the application enables the turbulent flow state of electroplating fluid to be directly monitored. Furthermore, the improvement direction of the electroplating device can be found according to the turbulent flow state of the electroplating fluid, which is beneficial to timely improving the electroplating device, improving the electroplating uniformity and improving the electroplating quality.
In the present application, the apparatus embodiments and the method embodiments may complement each other without collision. The apparatus embodiments described above are merely illustrative, wherein elements illustrated as separate elements may or may not be physically separate, and elements shown as elements may or may not be physical elements, may be located in one place, or may be distributed over a plurality of network elements. Some or all of the modules may be selected according to actual needs to achieve the purposes of the present application. Those of ordinary skill in the art will understand and implement the present invention without undue burden.
The foregoing description of the preferred embodiment of the present invention is not intended to limit the invention to the particular form disclosed, but on the contrary, the intention is to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.
Claims (10)
1. A fluid monitoring apparatus, comprising: a container and a hydrodynamic force monitoring unit;
the container comprises a transparent part, and the hydrodynamic monitoring part is positioned in the container and fixed on the transparent part;
the container is used for containing fluid;
the fluid dynamic monitoring part carries out visual detection on the fluid; wherein the hydrodynamic monitoring portion comprises N clusters of bands, each cluster of bands comprising at least one band, a state of the bands changing with a change in a disturbance state of the fluid, and the state change of the bands being visible; n is a positive integer;
when the fluid is disturbed, the state of the fluid power monitoring part is visually changed, and the state of the fluid power monitoring part is changed along with the change of the disturbance state of the fluid, wherein the state of the fluid power monitoring part is used for indicating the disturbance state of the fluid, and the disturbance state comprises the circulation direction and/or the disturbance amplitude of the fluid.
2. The fluid monitoring apparatus of claim 1, wherein the container is a plating bath and the transparent portion is a corrosion resistant material;
the transparent portion is at least a portion of a sidewall of the container.
3. The fluid monitoring device of claim 2, wherein the transparent portion is polypropylene.
4. The fluid monitoring device of claim 1, wherein N clusters of ribbons are secured to N locations on the transparent portion, respectively, the N locations being evenly distributed on the transparent portion.
5. The fluid monitoring apparatus of claim 4, wherein the material of the ribbon is a chemical fiber.
6. The fluid monitoring apparatus of claim 5, wherein the material of the ribbon is polyimide fiber.
7. The fluid monitoring device of claim 1, further comprising a fluid pressure monitoring portion positioned within the container and secured to the transparent portion for monitoring a pressure distribution of the fluid.
8. The fluid monitoring apparatus of claim 7 wherein the fluid pressure monitoring portion is a pressure measurement film, the pressure measurement film overlying the transparent portion, the fluid dynamic monitoring portion being secured to the pressure measurement film.
9. The fluid monitoring apparatus of claim 7, wherein the fluid pressure monitoring section comprises a plurality of pressure sensors arranged in an array, the fluid dynamic monitoring section being fixed to the plurality of pressure sensors.
10. The fluid monitoring apparatus of claim 1, further comprising a heater, a circulation pump, and a rocking mechanism;
the heater, the circulating pump and the swinging mechanism are respectively positioned in the container;
the heater is used for heating the fluid, the circulating pump is used for promoting the circulation of the fluid, and the swinging mechanism is used for stirring the fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011457748.6A CN114622264B (en) | 2020-12-10 | 2020-12-10 | Fluid monitoring device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011457748.6A CN114622264B (en) | 2020-12-10 | 2020-12-10 | Fluid monitoring device |
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| Publication Number | Publication Date |
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| CN114622264A CN114622264A (en) | 2022-06-14 |
| CN114622264B true CN114622264B (en) | 2023-06-27 |
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| CN202011457748.6A Active CN114622264B (en) | 2020-12-10 | 2020-12-10 | Fluid monitoring device |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1449491A (en) * | 2000-02-23 | 2003-10-15 | 卡钳技术有限公司 | Multi-reservoir pressure control system |
| TW200502442A (en) * | 2003-07-03 | 2005-01-16 | Suntek Compound Semiconductor Co Ltd | Electroplating apparatus |
| CN208104598U (en) * | 2018-03-19 | 2018-11-16 | 广州市深盈新材料有限责任公司 | Purifying electroplating solution alarm system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110226613A1 (en) * | 2010-03-19 | 2011-09-22 | Robert Rash | Electrolyte loop with pressure regulation for separated anode chamber of electroplating system |
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2020
- 2020-12-10 CN CN202011457748.6A patent/CN114622264B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1449491A (en) * | 2000-02-23 | 2003-10-15 | 卡钳技术有限公司 | Multi-reservoir pressure control system |
| TW200502442A (en) * | 2003-07-03 | 2005-01-16 | Suntek Compound Semiconductor Co Ltd | Electroplating apparatus |
| CN208104598U (en) * | 2018-03-19 | 2018-11-16 | 广州市深盈新材料有限责任公司 | Purifying electroplating solution alarm system |
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| CN114622264A (en) | 2022-06-14 |
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