CN114602348B - Device and method for preparing high-alumina-silica glass etching solution by laser etching process - Google Patents
Device and method for preparing high-alumina-silica glass etching solution by laser etching process Download PDFInfo
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- CN114602348B CN114602348B CN202210328976.6A CN202210328976A CN114602348B CN 114602348 B CN114602348 B CN 114602348B CN 202210328976 A CN202210328976 A CN 202210328976A CN 114602348 B CN114602348 B CN 114602348B
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- 238000005530 etching Methods 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000010329 laser etching Methods 0.000 title claims abstract description 27
- 238000002360 preparation method Methods 0.000 claims abstract description 105
- 239000007788 liquid Substances 0.000 claims abstract description 52
- 238000010438 heat treatment Methods 0.000 claims abstract description 40
- 239000007921 spray Substances 0.000 claims abstract description 28
- 239000012535 impurity Substances 0.000 claims abstract description 11
- 239000011521 glass Substances 0.000 claims abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 96
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 30
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 20
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 10
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 10
- 229910017604 nitric acid Inorganic materials 0.000 claims description 10
- 241000220317 Rosa Species 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 6
- KMWBBMXGHHLDKL-UHFFFAOYSA-N [AlH3].[Si] Chemical compound [AlH3].[Si] KMWBBMXGHHLDKL-UHFFFAOYSA-N 0.000 claims description 5
- 238000005516 engineering process Methods 0.000 claims description 5
- 238000007599 discharging Methods 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims 1
- 238000003756 stirring Methods 0.000 abstract description 15
- 230000000694 effects Effects 0.000 abstract description 10
- 238000002156 mixing Methods 0.000 abstract description 7
- 238000004140 cleaning Methods 0.000 abstract description 6
- 238000011001 backwashing Methods 0.000 abstract description 5
- 238000003486 chemical etching Methods 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000000126 substance Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000005354 aluminosilicate glass Substances 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000008236 heating water Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/62—Regenerating the filter material in the filter
- B01D29/66—Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps
- B01D29/68—Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps with backwash arms, shoes or nozzles
- B01D29/684—Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps with backwash arms, shoes or nozzles with a translatory movement with respect to the filtering element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The invention discloses a device and a method for preparing high-alumina-silica glass etching solution by using a laser etching process, and belongs to the technical field of glass chemical etching. The high-alumina-silica glass etching solution preparation device for the laser etching process comprises a filter box and a preparation tank, and further comprises: the frame and the supporting rod are connected to the inner wall of the filter box in a sliding manner; the spray head is fixedly connected to the support rod; the filter screen is fixedly connected to the bottom of the frame; the heating box is fixedly arranged at the bottom of the filter box; according to the invention, when the high-aluminum silicon etching liquid is prepared, the mixing and stirring uniformity of the mixed liquid can be improved, and the harmful gas generated during the mixing and stirring of the mixed liquid can be collected and utilized, so that the discharge of the harmful gas is reduced, the environment-friendly effect of the device is improved, the inner wall of the preparation tank can be automatically washed and cleaned after the preparation of the high-aluminum silicon etching liquid is finished, and the back washing and cleaning of the particulate impurities adsorbed and blocked in the gaps of the filter screen can be carried out.
Description
Technical Field
The invention relates to the technical field of glass chemical etching, in particular to a device and a method for preparing high-alumina-silica glass etching solution by using a laser etching process.
Background
Etching, also known as photochemical etching, is a technique for removing materials by using a chemical reaction or physical impact, and can be divided into two types, wet etching and dry etching, wherein an etching solution etches photoresist by eroding materials, which belongs to the field of wet etching technique and is also an etching method widely used nowadays.
At present, present high aluminium silicon etching liquid preparation facilities, only phosphoric acid, nitric acid, acetic acid and water are according to certain ratio, mix through manual stirring and constitute high aluminium silicon etching liquid, because manual stirring, not only waste time and energy, and stirring speed is different, mutual effect between the raw materials has been influenced, thereby reduce preparation efficiency, and the harmful gas that produces when multiple raw materials liquid adds thermal agitation and mixes and constitute high aluminium silicon etching liquid, because can not carry out recycle to the heat in the harmful gas, direct emission, not only cause the wasting of resources, and the harmful substance in the gas causes the pollution to the environment of workshop, high aluminium silicon etching liquid preparation facilities feature of environmental protection has been reduced.
Disclosure of Invention
The invention aims to solve the problems that manual stirring in the prior art is time-consuming and labor-consuming, the stirring speed is different, the mutual dissolving effect between raw materials is influenced, the preparation efficiency is reduced, heat in harmful gas cannot be recycled, the heat is directly discharged, resources are wasted, the environment of a production workshop is polluted by the harmful gas in the gas, and the environmental friendliness of a high-alumina silicon etching liquid preparation device is reduced.
In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides a high aluminosilicate glass etching solution preparation facilities of laser etching technology, includes rose box, preparation jar, still includes: the frame and the supporting rod are connected to the inner wall of the filter box in a sliding manner; the spray head is fixedly connected to the supporting rod; the filter screen is fixedly connected to the bottom of the frame; the heating box is fixedly arranged at the bottom of the filter box; the compressor and the water pump are fixedly arranged on two sides of the outer wall of the preparation tank, the compressor is connected with the top of the preparation tank through a second guide pipe, and the compressor is connected with the heating box through a third guide pipe; the second pressure release valve is connected to the second guide pipe, wherein an air nozzle is arranged on the inner wall of the bottom of the preparation tank, the heating box is connected with the air nozzle through the first guide pipe, and the first pressure release valve is connected to the first guide pipe; the submersible pump is arranged in the filter box, and the output end of the submersible pump is connected with the preparation tank; the heat conduction pipe is arranged between the outer wall and the inner wall of the preparation tank, two ends of the water suction pump are respectively connected with the heating box and the heat conduction pipe, and the water outlet end of the heat conduction pipe is connected with the heating box through a fifth pipeline; the support frame is fixedly connected to the top of the preparation tank; the cylinder body is rotationally connected to the top of the preparation tank, and a first connecting rod is fixedly connected to the cylinder body; the first rotating shaft is rotatably connected to the supporting frame, a second connecting rod is fixedly connected to the outer wall of the first rotating shaft, the second connecting rod and the first connecting rod are both fixedly connected with a shifting plate, and a scraper is fixedly connected to the first connecting rod, wherein a first driving part for driving the barrel and the first rotating shaft to rotate is arranged on the supporting frame, and a second driving part for driving the supporting rod to move is arranged in the filter box; the water spray nozzle is fixedly connected to the shifting plate and is connected with the water suction pump through a fourth conduit; and the fifth guide pipe is fixedly connected to the inner wall of the bottom of the filter box, one end of the fifth guide pipe is connected with the spray head, the other end of the fifth guide pipe is connected with the water suction pump, and the fifth guide pipe and the fourth guide pipe are respectively provided with a control valve for controlling opening or closing.
In order to facilitate the conveying of the mixed liquid into the preparation tank, preferably, the submersible pump is fixedly installed on the inner wall of the bottom of the filter box, the input end of the submersible pump is fixedly connected with a first pipeline, and the output end of the submersible pump is connected with the preparation tank through a second pipeline.
In order to facilitate accurate proportioning, the filter box is fixedly connected with four groups of inlet pipes, the inlet pipes are connected with a first electromagnetic valve, and the outer wall of the filter box is fixedly provided with a controller.
In order to provide hot water for the internal circulation of the heat conduction pipe, preferably, the input end of the water suction pump is connected with the heating box through a third pipeline, the output end of the water suction pump is communicated with the heat conduction pipe through a fourth pipeline, one end of the fourth conduit is connected with the fourth pipeline, the other end of the fourth conduit is connected with the water spray nozzle, one end of the fifth conduit is connected with the spray head, and the other end of the fifth conduit is connected with the fourth pipeline.
In order to control the opening or closing of the fourth conduit and the fifth conduit, further, the control valve for controlling the opening or closing of the fourth conduit and the fifth conduit comprises a second electromagnetic valve, and the second electromagnetic valve is connected to the fourth conduit and the fifth conduit.
In order to drive the support rod to reciprocate, preferably, a second driving part for driving the support rod to move comprises a reciprocating screw rod and a second impeller positioned in the fifth guide pipe and fixedly connected to the outer wall of the reciprocating screw rod, the inner wall of the filter box is fixedly connected with a guide rod, and the support rod is slidably connected to the guide rod and is in threaded connection with the reciprocating screw rod.
In order to drive the cylinder and the rotating shaft to rotate synchronously, preferably, a first driving part for driving the cylinder and the rotating shaft to rotate comprises a second rotating shaft and a first impeller positioned in the fourth pipeline and fixedly connected to the outer wall of the rotating shaft, the second rotating shaft is rotatably connected to the supporting frame, and the second rotating shaft is connected with the cylinder and the first rotating shaft through a transmission set.
In order to collect and utilize water backwashed by the filter screen, preferably, the filter box is connected with the heating box through a conduit six, and the conduit six is connected with a solenoid valve three.
In order to facilitate the discharge of the mixed liquid after the uniform stirring in the preparation tank, preferably, the inner wall of the bottom of the preparation tank is arranged in an upward concave manner, a discharge pipe is fixedly connected to the bottom of the preparation tank, and a valve switch is connected to the discharge pipe.
A preparation method of a high-alumina-silica glass etching solution for a laser etching process comprises the following steps:
the method comprises the following steps: phosphoric acid, nitric acid, acetic acid and water are made to reach proper proportion through a controller and an electromagnetic valve I according to different proportions;
step two: impurities in phosphoric acid, nitric acid, acetic acid and water can be filtered out through the filter screen, and the mixed liquid can be conveyed into the preparation tank through the submersible pump;
step three: the preparation tank is heated by circulating hot water in the heat conducting pipe through the water suction pump, and the heat is transferred to the mixed liquid, so that the temperature of the mixed liquid is increased;
step four: the first driving part drives the cylinder body and the first rotating shaft to drive the two groups of shifting plates to synchronously and oppositely rotate, so that the mixed liquid in the preparation tank is mixed and stirred;
step five: the gas in the heating box is conveyed into the gas nozzle through the first guide pipe to be sprayed out, so that the gas is introduced into the preparation tank;
step six: after the high-aluminum silicon etching solution is prepared, discharging the high-aluminum silicon etching solution out of the preparation tank through a discharge pipe;
step seven: water is supplied to the water spray nozzle through the water pump to be sprayed out, and the water spray nozzle is matched with the first driving part to drive the barrel body and the rotating shaft to drive the scraper plate and rotate to the preparation tank;
step eight: the water is supplied to the spray head through the water pump and sprayed out, and the support rod is driven by the water pump to drive the spray head to move in a reciprocating mode through the cooperation of the driving portion and the driving portion.
Compared with the prior art, the invention has the following beneficial effects:
1. this high aluminosilicate glass etching solution preparation facilities of laser etching technology follows the barrel through dialling board head rod and rotates clockwise, and then reaches the mixed liquid in the preparation jar and mix the stirring to dialling the board and follow a anticlockwise rotation of pivot through the second connecting rod, and then make the mixed liquid in the preparation jar follow two sets of rotation opposite direction's the board of dialling and flow, thereby improve the homogeneity that mixes the mixed liquid and mix the stirring.
2. According to the high-alumina-silica glass etching liquid preparation device for the laser etching process, gas in the heating box is conveyed into the gas nozzle through the first guide pipe to be sprayed out, so that the gas is introduced into the preparation tank, the mixed liquid generates bubbles, the mixed liquid at the bottom is driven to move upwards, and the uniformity of mixed liquid mixing and stirring is further improved.
3. According to the high-alumina-silica glass etching liquid preparation device for the laser etching process, the gas of harmful substances is condensed and liquefied through the compressor, the liquefied condensed water is discharged into the heating box through the third guide pipe, the third guide pipe is provided with the one-way valve, and then the purpose that the water after the gas of the harmful substances is condensed can be achieved, so that the gas emission of the harmful substances is reduced, and the environment-friendly effect of the device is improved.
4. This high aluminosilicate glass etching solution preparation facilities of laser etching technology drives the shower nozzle through reciprocal lead screw and steadily reciprocates under the spacing of guide bar for the shower nozzle can realize reciprocating motion in the bottom of filter screen, thereby can reach and carry out comprehensive back flush clearance to the particulate matter impurity that the adsorption plug was in the filter screen gap, thereby improve the effect of carrying out back flush clearance to the filter screen.
5. This high aluminosilicate glass etching solution preparation facilities of laser etching technology, through the scraper blade, laminating preparation jar inner wall rotates, and then reaches to clear up preparation jar inner wall to cooperation pivot one drives the water spout and rotates, and then can reach and wash preparation jar inner wall comprehensively, thereby improve the clean effect of washing to preparation jar inner wall.
Drawings
FIG. 1 is a schematic structural diagram I of a high alumina silica glass etching solution preparation device for a laser etching process according to the present invention;
FIG. 2 is a schematic structural diagram of a second apparatus for preparing high alumina silica glass etching solution for laser etching process according to the present invention;
FIG. 3 is a schematic structural diagram III of a high alumina silica glass etching solution preparation device for a laser etching process according to the present invention;
FIG. 4 is a schematic view of a part of the structure of a device for preparing high alumina silica glass etching solution for laser etching process according to the present invention;
FIG. 5 is a schematic diagram of a part of a structure of a high alumina silica glass etching solution preparation device for a laser etching process according to the present invention;
FIG. 6 is a schematic diagram of a third partial structure of a device for preparing a high alumina silica glass etching solution for a laser etching process according to the present invention;
fig. 7 is an enlarged view of a portion a in fig. 2 of a high alumina silica glass etching solution preparation device for a laser etching process according to the present invention.
In the figure: 1. a filter box; 101. a feed pipe; 102. a first electromagnetic valve; 103. a controller; 104. a frame; 105. a filter screen; 2. preparing a tank; 201. a discharge pipe; 202. opening and closing a valve; 203. a thermometer; 3. a heating box; 4. a submersible pump; 401. a first pipeline; 402. a second pipeline; 5. a water pump; 501. a third pipeline; 502. a fourth pipeline; 503. a heat conduction pipe; 504. a fifth pipeline; 6. a support frame; 601. a barrel; 602. a first rotating shaft; 603. a first connecting rod; 604. dialing a plate; 605. a squeegee; 606. a second connecting rod; 7. a second rotating shaft; 701. an impeller I; 702. a transmission set; 8. a first conduit; 801. a first pressure relief valve; 802. an air nozzle; 9. a compressor; 901. a second conduit; 902. a third conduit; 903. a second pressure relief valve; 10. a fourth conduit; 1001. a water spray nozzle; 1002. a second electromagnetic valve; 11. a reciprocating screw rod; 1101. an impeller II; 1102. a support bar; 1103. a guide rod; 1104. a spray head; 1105. a fifth conduit; 12. a sixth conduit; 1201. and a third electromagnetic valve.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention.
Example 1:
referring to fig. 1 to 7, a device for preparing a high alumina silica glass etching solution for a laser etching process includes a filter box 1, a preparation tank 2, and further includes: a frame 104 and a support rod 1102 which are connected with the inner wall of the filter box 1 in a sliding way; the spray nozzle 1104 is fixedly connected to the support rod 1102; a filter screen 105 fixedly connected to the bottom of the frame 104; the heating box 3 is fixedly arranged at the bottom of the filter box 1; the compressor 9 and the water pump 5 are fixedly installed on two sides of the outer wall of the preparation tank 2, the compressor 9 is connected with the top of the preparation tank 2 through a second conduit 901, and the compressor 9 is connected with the heating box 3 through a third conduit 902; the second pressure release valve 903 is connected to the second conduit 901, wherein an air nozzle 802 is arranged on the inner wall of the bottom of the preparation tank 2, the heating box 3 is connected with the air nozzle 802 through a first conduit 8, and the first pressure release valve 801 is connected to the first conduit 8; the submersible pump 4 is arranged in the filter box 1, and the output end of the submersible pump 4 is connected with the preparation tank 2; the heat conducting pipe 503 is arranged between the outer wall and the inner wall of the preparation tank 2, two ends of the water suction pump 5 are respectively connected with the heating box 3 and the heat conducting pipe 503, and the water outlet end of the heat conducting pipe 503 is connected with the heating box 3 through a fifth pipeline 504; the support frame 6 is fixedly connected to the top of the preparation tank 2; the cylinder 601 is rotatably connected to the top of the preparation tank 2, and a first connecting rod 603 is fixedly connected to the cylinder 601; the first rotating shaft 602 is rotatably connected to the support frame 6, the outer wall of the first rotating shaft 602 is fixedly connected with a second connecting rod 606, the second connecting rod 606 and the first connecting rod 603 are both fixedly connected with a shifting plate 604, and the first connecting rod 603 is fixedly connected with a scraper 605, wherein a first driving part for driving the cylinder 601 and the first rotating shaft 602 to rotate is arranged on the support frame 6, and a second driving part for driving the support rod 1102 to move is arranged in the filter box 1; the water nozzle 1001 is fixedly connected to the shifting plate 604, and the water nozzle 1001 is connected with the water pump 5 through a pipe four 10; and the fifth guide pipe 1105 is fixedly connected to the inner wall of the bottom of the filter box 1, one end of the fifth guide pipe 1105 is connected with the spray nozzle 1104, the other end of the fifth guide pipe 1105 is connected with the water suction pump 5, and control valves for controlling opening or closing are arranged on the fifth guide pipe 1105 and the fourth guide pipe 10.
Immersible pump 4 fixed mounting is in 1 bottom inner wall of rose box, and immersible pump 4's input fixedly connected with pipeline 401, and immersible pump 4's output links to each other through pipeline two 402 with preparation jar 2.
Four groups of feed pipes 101 are fixedly connected to the filter box 1, the four groups of feed pipes 101 are connected with a first electromagnetic valve 102, and a controller 103 is fixedly mounted on the outer wall of the filter box 1.
The input end of the water pump 5 is connected with the heating box 3 through a third pipeline 501, the output end of the water pump 5 is communicated with the heat conducting pipe 503 through a fourth pipeline 502, one end of the fourth pipeline 10 is connected with the fourth pipeline 502, the other end of the fourth pipeline is connected with the water nozzle 1001, one end of the fifth pipeline 1105 is connected with the spray nozzle 1104, and the other end of the fifth pipeline is connected with the fourth pipeline 502.
The first driving part for driving the cylinder 601 and the first rotating shaft 602 to rotate comprises a second rotating shaft 7 and a first impeller 701 which is positioned in the fourth pipeline 502 and fixedly connected to the outer wall of the second rotating shaft 7, the second rotating shaft 7 is rotatably connected to the support frame 6, and the second rotating shaft 7 is connected with the cylinder 601 and the first rotating shaft 602 through a transmission set 702.
When the device is used, the four groups of feed pipes 101 are externally connected with a phosphoric acid storage barrel, a nitric acid storage barrel, an acetic acid storage barrel and a water barrel, then the controller 103 controls the electromagnetic valves one 102 arranged on the four groups of feed pipes 101 to control the flow of liquid, the phosphoric acid, the nitric acid, the acetic acid and the water reach a proper proportion according to different proportions, the liquid passes through the filter screen 105 and enters the filter box 1, and the filter screen 105 can filter out impurities in the phosphoric acid, the nitric acid, the acetic acid and the water, so that the purity of the high-alumina silicon etching liquid is improved;
then, the submersible pump 4 is started, the submersible pump 4 extracts the mixed liquid in the filter tank 1 through the first pipeline 401 and conveys the mixed liquid into the preparation tank 2 through the second pipeline 402, the one-way valve is arranged on the second pipeline 402, at the moment, the water in the heating tank 3 is heated through the heating rod in the heating tank 3, when the temperature of the water in the heating tank 3 reaches eighty or ninety degrees centigrade, the water pump 5 is started, the water pump 5 is conveyed into the heat conduction pipe 503 through the third pipeline 501 and the fourth pipeline 502, then, the water flows back into the heating tank 3 through the fifth pipeline 504, the five pipeline 504 is provided with the one-way valve, as the heat conduction pipe 503 is a copper pipe with good heat conductivity and is arranged around the outer wall and the inner wall of the preparation tank 2 in a spring shape, hot water can circularly heat the preparation tank 2 when passing through the heat conduction pipe 503, after the temperature of the preparation tank 2 rises, heat is transferred to the mixed liquid, so that the temperature of the mixed liquid is raised, at the moment, the mixed liquid is monitored through a thermometer 203 arranged on the outer wall of the preparation tank 2, meanwhile, when water passes through a pipeline IV 502, water flow impacts an impeller I701 to drive a rotating shaft II 7 to rotate, the rotating shaft II 7 drives a barrel 601 to rotate clockwise and a rotating shaft I602 to rotate anticlockwise through a transmission set 702, at the moment, a first connecting rod 603 of a shifting plate 604 rotates clockwise along with the barrel 601, so that the mixed liquid in the preparation tank 2 is mixed and stirred, the shifting plate 604 rotates anticlockwise along with the rotating shaft I602 through a second connecting rod 606, so that the mixed liquid in the preparation tank 2 flows along with the two groups of shifting plates 604 with opposite rotating directions, and the mixing and stirring uniformity of the mixed liquid is improved;
meanwhile, as the heating box 3 is in a sealed state, in the process of heating water in the heating box 3, the pressure in the heating box 3 can be increased, when the pressure in the heating box 3 is greater than a safety value set by the first pressure release valve 801, the first pressure release valve 801 is automatically opened to release pressure, at the moment, gas is conveyed into the gas nozzle 802 through the first conduit 8 to be sprayed out, so that the gas is introduced into the preparation tank 2, the mixed liquid generates bubbles and drives the mixed liquid at the bottom to move upwards, and the mixing and stirring uniformity of the mixed liquid is further improved;
when the pressure in preparation jar 2 is greater than the safe numerical value that second relief valve 903 set for, the pressure release is opened automatically to second relief valve 903, at this moment, produce in the preparation jar 2 gaseous through two 901 pipe entering compressors 9 of harmful substance after the heating of mixed liquid, carry out the condensation liquefaction to the gas of harmful substance through compressors 9, the comdenstion water after the liquefaction is discharged into heating cabinet 3 through three 902 pipes in, be equipped with the check valve on three 902 pipes, and then can reach the water after the gas condensation to harmful substance and collect the utilization, thereby reduce the gas emission of harmful substance, improve environmental protection effect.
Example 2:
referring to fig. 2, 4, 5 and 6, a device for preparing a high alumina silica glass etching solution for a laser etching process is substantially the same as that of example 1, and further, a control valve for controlling opening or closing of the conduit four 10 and the conduit five 1105 comprises a solenoid valve two 1002, and the solenoid valve two 1002 is connected to the conduit four 10 and the conduit five 1105.
The second driving part for driving the supporting rod 1102 to move comprises a reciprocating screw rod 11 and an impeller 1101 which is positioned in the duct five 1105 and is fixedly connected to the outer wall of the reciprocating screw rod 11, and the inner wall of the filter box 1 is fixedly connected with a guide rod 1103 and the supporting rod 1102 is slidably connected to the guide rod 1103 and is in threaded connection with the reciprocating screw rod 11.
After the mixed liquid is discharged out of the preparation tank 2, a fourth electromagnetic valve (not shown in the figure) is arranged at the joint of the fourth pipeline 502 and the water inlet end of the heat pipe 503, the fourth electromagnetic valve is closed, a second electromagnetic valve 1002 is opened, at the moment, the water suction pump 5 is started, the water suction pump 5 sucks hot water in the heating tank 3 through a third pipeline 501 and conveys the hot water into a fifth conduit 1105, and finally the hot water is sprayed out through a spray nozzle 1104, so that the sprayed water can realize back washing and cleaning on particulate impurities adsorbed and blocked in gaps of the filter screen 105;
meanwhile, when water passes through the five guide pipes 1105, the water flow impacts the second impeller 1101 to drive the reciprocating screw rod 11 to rotate, the reciprocating screw rod 11 drives the support rod 1102 to drive the spray head 1104 to stably reciprocate under the limit of the guide rod 1103, so that the spray head 1104 can reciprocate at the bottom of the filter screen 105, and therefore the comprehensive back washing and cleaning of particulate matters and impurities adsorbed and blocked in gaps of the filter screen 105 can be achieved, and the back washing and cleaning effect of the filter screen 105 is improved;
meanwhile, the partial water flow passing through the pipeline IV 502 enters the conduit IV 10 and is finally sprayed out through the water spray nozzle 1001, so that the sprayed water can wash and clean the inner wall of the preparation tank 2, meanwhile, when the water flow passes through the pipeline IV 502, the water flow impacts the impeller I701 to drive the rotating shaft II 7 to rotate, the rotating shaft II 7 drives the cylinder 601 to rotate clockwise and the rotating shaft I602 to rotate anticlockwise through the transmission set 702, at the moment, the scraper 605 synchronously adheres to the inner wall of the preparation tank 2 along with the cylinder 601 through the first connecting rod 603 to rotate, so that the inner wall of the preparation tank 2 is cleaned, and meanwhile, the water spray nozzle 1001 is driven to rotate by matching with the rotating shaft I602, so that the inner wall of the preparation tank 2 can be fully washed, the washing and cleaning effects on the inner wall of the preparation tank 2 are improved, and the washed water is discharged out of the preparation tank 2 through the discharge pipe 201;
it should be noted that the conduit four 10 is provided in two sections, and the connecting ends of the two sections of conduit four 10 are connected through a rotating joint provided at the top of the rotating shaft one 602, so that the conduit four 10 does not interfere with the rotation of the rotating shaft one 602.
Example 3:
referring to fig. 1, 2 and 7, a device for preparing a high alumina silica glass etching solution for a laser etching process is substantially the same as that of example 1, and further, a filter tank 1 is connected with a heating tank 3 through a conduit six 12, and the conduit six 12 is connected with a solenoid valve three 1201; after the filter screen 105 in the filter box 1 is back flushed, the electromagnetic valve III 1201 is opened, at the moment, water after the filter screen 105 is back flushed in the filter box 1 flows back to the heating box 3 through the conduit VI 12 for recycling, so that the waste of water resources is reduced, and the filter screen 105 is inserted into the filter box 1 through the frame 104, so that after the particulate impurities adsorbed and blocked in the gap of the filter screen 105 are back flushed and cleaned, the frame 104 is conveniently drawn out from the filter box 1 to clean the particulate impurities on the filter screen 105.
Example 4:
referring to fig. 1 to fig. 3, a device for preparing a high alumina silica glass etching solution by a laser etching process is substantially the same as that in example 1, further, the inner wall of the bottom of the preparation tank 2 is arranged to be concave upwards, the bottom of the preparation tank 2 is fixedly connected with a discharge pipe 201, and the discharge pipe 201 is connected with a valve switch 202; after the mixture is uniformly mixed and stirred, the valve switch 202 is opened, and at this time, the mixture in the preparation tank 2 is discharged out of the high alumina silicon etching solution collection cylinder outside the preparation tank 2 through the discharge pipe 201.
Example 5:
a preparation method of a high-alumina-silica glass etching solution for a laser etching process comprises the following steps:
the method comprises the following steps: phosphoric acid, nitric acid, acetic acid and water are mixed according to different proportions by a controller 103 and an electromagnetic valve I102 to reach a proper proportion;
step two: the impurities in the phosphoric acid, the nitric acid, the acetic acid and the water can be filtered out by the filter screen 105, and the mixed liquid can be conveyed into the preparation tank 2 by the submersible pump 4;
step three: the preparation tank 2 is heated by circulating hot water in the heat conducting pipe 503 through the water suction pump 5, and the heat is transferred to the mixed liquid, so that the temperature of the mixed liquid is increased;
step four: the first driving part drives the cylinder 601 and the first rotating shaft 602 to drive the two groups of shifting plates 604 to synchronously rotate and oppositely rotate, so that the mixed liquid in the preparation tank 2 is mixed and stirred;
step five: the gas in the heating box 3 is conveyed into the gas nozzle 802 through the first conduit 8 and is sprayed out, so that the gas is introduced into the preparation tank 2;
step six: after the high-alumina silicon etching solution is prepared, the high-alumina silicon etching solution is discharged out of the preparation tank 2 through a discharge pipe 201;
step seven: water is supplied into the water nozzle 1001 through the water pump 5 and is sprayed out, and the barrel 601 and the rotating shaft 602 are driven by the driving part I to drive the scraper 605 and the water nozzle 1001 to rotate to the preparation tank 2;
step eight: water is supplied into the nozzle 1104 by the water pump 5 and sprayed out, and the supporting rod 1102 is driven by the driving part II to drive the nozzle 1104 to reciprocate.
According to the invention, when the high-aluminum silicon etching liquid is prepared, the mixing and stirring uniformity of the mixed liquid can be improved, and the harmful gas generated during the mixing and stirring of the mixed liquid can be collected and utilized, so that the discharge of the harmful gas is reduced, the environment-friendly effect of the device is improved, the inner wall of the preparation tank 2 can be automatically washed and cleaned after the preparation of the high-aluminum silicon etching liquid is finished, and the back washing and cleaning of the particulate impurities adsorbed and blocked in the gaps of the filter screen 105 can be carried out.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (2)
1. The utility model provides a high aluminium silicon glass etching solution preparation facilities of laser etching technology, includes rose box (1), preparation jar (2), its characterized in that still includes:
the frame (104) and the support rod (1102) are connected to the inner wall of the filter box (1) in a sliding mode;
the spray head (1104) is fixedly connected to the support rod (1102);
the filter screen (105) is fixedly connected to the bottom of the frame (104);
the heating box (3) is fixedly arranged at the bottom of the filtering box (1);
the compressor (9) and the water pump (5) are fixedly installed on two sides of the outer wall of the preparation tank (2), the compressor (9) is connected with the top of the preparation tank (2) through a second conduit (901), and the compressor (9) is connected with the heating box (3) through a third conduit (902);
a second pressure relief valve (903) connected to the second conduit (901),
an air nozzle (802) is arranged on the inner wall of the bottom of the preparation tank (2), the heating box (3) is connected with the air nozzle (802) through a first guide pipe (8), and a first pressure release valve (801) is connected to the first guide pipe (8);
the submersible pump (4) is arranged in the filter box (1), and the output end of the submersible pump (4) is connected with the preparation tank (2);
the heat conduction pipe (503) is arranged between the outer wall and the inner wall of the preparation tank (2), and the water outlet end of the heat conduction pipe (503) is connected with the heating box (3) through a fifth pipeline (504);
the support frame (6) is fixedly connected to the top of the preparation tank (2);
the cylinder body (601) is rotatably connected to the top of the preparation tank (2), and a first connecting rod (603) is fixedly connected to the cylinder body (601);
the first rotating shaft (602) is rotatably connected to the supporting frame (6), the outer wall of the first rotating shaft (602) is fixedly connected with a second connecting rod (606), the second connecting rod (606) and the first connecting rod (603) are both fixedly connected with a shifting plate (604), the first connecting rod (603) is fixedly connected with a scraper (605),
the filter box comprises a support frame (6), a first driving part and a second driving part, wherein the support frame (6) is provided with the first driving part which is used for driving a barrel body (601) and a rotating shaft (602) to rotate, and the filter box (1) is internally provided with the second driving part which is used for driving a support rod (1102) to move;
the water spray nozzle (1001) is fixedly connected to the shifting plate (604);
the guide pipe five (1105) is fixedly connected to the inner wall of the bottom of the filter box (1), the guide pipe five (1105) and the guide pipe four (10) are respectively provided with a control valve for controlling opening or closing, the input end of the water pump (5) is connected with the heating box (3) through a pipe three (501), the output end of the water pump (5) is communicated with the heat conducting pipe (503) through a pipe four (502), one end of the guide pipe four (10) is connected with the pipe four (502), the other end of the guide pipe four (10) is connected with the water nozzle (1001), one end of the guide pipe five (1105) is connected with the spray head (1104), the other end of the guide pipe five (1105) is connected with the pipe four (502), the control valves for controlling opening or closing of the guide pipe four (10) and the guide pipe five (1105) comprise a solenoid valve two (1002), the solenoid valve two (1002) is connected to the guide pipe four (10) and the guide pipe five (1105), the driving part of the supporting rod (1102) comprises a reciprocating lead screw (11) and is located in the guide rod (1101), the guide rod (1103) is fixedly connected to the inner wall of the filter box (1), the guide rod (1101) is connected with the reciprocating lead screw (11), and the guide rod (11) and the guide rod (1103) is connected with the reciprocating guide rod (1101), input fixedly connected with pipeline (401) of immersible pump (4), the output of immersible pump (4) links to each other through pipeline two (402) with preparation jar (2), fixedly connected with four group inlet pipe (101) on rose box (1), four groups all be connected with solenoid valve (102) on inlet pipe (101), rose box (1) outer wall fixed mounting has controller (103), the drive barrel (601), pivot one (602) pivoted drive division one include pivot two (7) to and be located pipeline four (502), and fixed connection is in impeller one (701) on the pivot two (7) outer wall, pivot two (7) rotate to be connected on support frame (6), pivot two (7) link to each other with barrel (601), pivot one (602) through transmission group (702), pivot two (602), rose box (1) link to each other with heating cabinet (3) through six (12) of pipe, be connected with three solenoid valve (1201) on six (12) of pipe, preparation jar (2) bottom inner wall is the setting that makes progress, preparation jar (2) bottom fixedly connected with indent discharge tube (2), valve discharge tube (201) goes up.
2. A preparation method of a high-alumina-silica-glass etching solution for a laser etching process, which adopts the high-alumina-silica-glass etching solution preparation device for the laser etching process according to claim 1, is characterized by comprising the following steps:
the method comprises the following steps: phosphoric acid, nitric acid, acetic acid and water are mixed according to different proportions by a controller (103) and a first electromagnetic valve (102) to reach a proper proportion;
step two: impurities in phosphoric acid, nitric acid, acetic acid and water can be filtered out through the filter screen (105), and mixed liquid can be conveyed into the preparation tank (2) through the submersible pump (4);
step three: the preparation tank (2) is heated by circularly supplying hot water into the heat conducting pipe (503) through the water suction pump (5), and the heat is transferred to the mixed liquid, so that the temperature of the mixed liquid is increased;
step four: the first driving part drives the cylinder body (601) and the first rotating shaft (602) to drive the two groups of shifting plates (604) to rotate synchronously and oppositely, so that the mixed liquid in the preparation tank (2) is mixed and stirred;
step five: the gas in the heating box (3) is conveyed into the gas nozzle (802) through the first conduit (8) to be sprayed out, so that the gas is introduced into the preparation tank (2);
step six: after the high-aluminum silicon etching solution is prepared, discharging the high-aluminum silicon etching solution out of the preparation tank (2) through a discharge pipe (201);
step seven: water is supplied into the water spray nozzle (1001) through the water suction pump (5) and sprayed out, and the water spray nozzle (1001) is matched with the driving part I to drive the cylinder body (601) and the rotating shaft I (602) to drive the scraper (605) and the water spray nozzle (605) to rotate so as to clean the inner wall of the preparation tank (2);
step eight: water is supplied into the spray head (1104) through the water pump (5) and sprayed out, and the support rod (1102) is driven by the two driving parts to drive the spray head (1104) to move in a reciprocating mode.
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| CN202210328976.6A CN114602348B (en) | 2022-03-31 | 2022-03-31 | Device and method for preparing high-alumina-silica glass etching solution by laser etching process |
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| CN214513995U (en) * | 2020-12-31 | 2021-10-29 | 江阴市化学试剂厂有限公司 | Aluminum etching liquid preparation device |
| CN214438403U (en) * | 2021-03-05 | 2021-10-22 | 廊坊杰杰化工有限公司 | Dissolving device capable of filtering foreign matters |
| CN113019187A (en) * | 2021-03-23 | 2021-06-25 | 起源细胞技术(滁州)有限公司 | Blending device is used in antiseptic solution preparation |
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