CN114589183B - Wafer cleaning device and cleaning system - Google Patents
Wafer cleaning device and cleaning system Download PDFInfo
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- CN114589183B CN114589183B CN202210120127.1A CN202210120127A CN114589183B CN 114589183 B CN114589183 B CN 114589183B CN 202210120127 A CN202210120127 A CN 202210120127A CN 114589183 B CN114589183 B CN 114589183B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 169
- 230000007246 mechanism Effects 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims description 14
- 230000006978 adaptation Effects 0.000 claims description 11
- 238000009434 installation Methods 0.000 claims description 7
- 230000000149 penetrating effect Effects 0.000 claims description 7
- 230000000712 assembly Effects 0.000 claims description 3
- 238000000429 assembly Methods 0.000 claims description 3
- 230000010405 clearance mechanism Effects 0.000 abstract description 4
- 238000005201 scrubbing Methods 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 81
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 230000007306 turnover Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/02—Devices for holding articles during cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention relates to a wafer cleaning device and a wafer cleaning system, the wafer cleaning device comprises a cleaning device body, wherein an upper frame assembly is arranged at the top of the cleaning device body, a cleaning mechanism is arranged inside the upper frame, an adjusting mechanism is arranged inside the cleaning device body, the upper frame assembly comprises a vertical motor, an output shaft of the vertical motor is fixedly connected with a vertical shaft, one end of the vertical shaft penetrates through and extends into the upper frame, a rotating disc is fixedly arranged on the outer surface of the vertical shaft, an air cylinder is fixedly arranged at the bottom of the rotating disc, the cleaning mechanism comprises a cleaning disc, and the top of the cleaning disc and the bottom of the air cylinder are fixedly arranged. This wafer belt cleaning device and cleaning system through being provided with the upper frame subassembly, through the setting of upright motor and cylinder for clearance mechanism possesses the function of rotation and reciprocating, and then reaches the purpose of carrying out high-efficient scrubbing to the wafer.
Description
Technical Field
The invention relates to the technical field of wafer cleaning, in particular to a wafer cleaning device and a wafer cleaning system.
Background
The wafer is a silicon wafer used for manufacturing a silicon semiconductor circuit, the raw material of the wafer is silicon, high-purity polycrystalline silicon is dissolved and then doped into a silicon crystal seed crystal, the silicon crystal seed crystal is slowly pulled out to form cylindrical monocrystalline silicon, a silicon crystal rod is ground, polished and sliced to form a silicon wafer, namely the wafer, the main processing modes of the wafer are wafer processing and batch processing, namely one or more wafers are processed simultaneously, the processing and measuring equipment is more and more advanced along with the smaller and smaller characteristic size of a semiconductor, so that the wafer processing has new data characteristics, meanwhile, the characteristic size is reduced, the influence of the number of particles in the air on the quality and reliability of the processed wafer is increased during wafer processing, and the number of particles has new data characteristics along with the improvement of cleanness.
The size of the wafer is inconvenient to adjust when the wafer is cleaned by the conventional wafer cleaning device, so that the wafer can only be cleaned in a single size when cleaning is carried out, the cleaning brush is damaged easily due to long service life, the cleaning brush is inconvenient to disassemble and replace in the prior art, the reverse side of the wafer is difficult to clean in the cleaning process, the cleaning effect is poor, and the problem is solved by the wafer cleaning device and the cleaning system.
Disclosure of Invention
Technical problem to be solved
Aiming at the defects of the prior art, the invention provides a wafer cleaning device and a wafer cleaning system, which have the advantages of good cleaning effect and wide application range, and solve the problems that the size of a wafer is inconvenient to adjust, only a single-size wafer can be cleaned during cleaning, the cleaning brush is easy to damage after being used for a long time, the cleaning brush is inconvenient to disassemble and replace in the prior art, and the reverse side of the wafer is difficult to clean during cleaning, so that the cleaning effect is poor.
(II) technical scheme
In order to achieve the purpose, the invention provides the following technical scheme: a wafer cleaning device comprises a cleaning device body, wherein an upper frame assembly is arranged at the top of the cleaning device body, a cleaning mechanism is arranged inside the upper frame, and an adjusting mechanism is arranged inside the cleaning device body;
the upper frame assembly comprises a vertical motor, an output shaft of the vertical motor is fixedly connected with a vertical shaft, one end of the vertical shaft penetrates through the vertical shaft and extends into the upper frame, a rotating disc is fixedly mounted on the outer surface of the vertical shaft, and an air cylinder is fixedly mounted at the bottom of the rotating disc;
the cleaning mechanism comprises a cleaning disc, the top of the cleaning disc and the bottom of the air cylinder are fixedly installed, a brush plate is movably installed at the bottom of the cleaning disc, two plug-ins with one ends penetrating and extending to the inside of the cleaning disc are fixedly installed at the top of the brush plate, positioning holes are formed in the left side and the right side of the cleaning disc, clamping bolts with one ends penetrating and extending to the outside of the plug-ins are movably installed on the left side and the right side of the two positioning holes, and positioning assemblies are arranged at the top and the bottom of the cleaning disc;
the adjusting mechanism comprises a welt cabin, the outer surface of the welt cabin is fixedly installed on the inner wall of the cleaning device body, a movable disc is movably installed between the inner wall of the welt cabin and the inner wall of the cleaning device body, an installation rod is movably installed on the left side of the movable disc, one end of the installation rod penetrates through the inner wall of the cleaning device body and extends to the outside of the cleaning device body, a rocking disc is fixedly installed on the left side of the installation rod, a lock handle assembly is arranged on the left side of the rocking disc, two shaft rods are movably installed inside the cleaning device body, the right side of the shaft rods is movably installed on the right side of the inner cavity of the cleaning device body, the left side of the shaft rods is fixedly connected with the right side of the movable disc, two ruler plates are movably installed on the outer surfaces of the shaft rods, size discs are fixedly installed on the opposite sides of the two ruler plates, and electric push rods are fixedly installed between the back of the inner cavities of the two ruler plates and the opposite sides of the two shaft rods respectively.
Furthermore, two locating component all includes two locating bin, and the homonymy is two locating bin all sets up in the inside of clearance dish, two the equal movable mounting in inside of locating hole has two springboards, and homonymy two mutually opposite side of springboard respectively with the relative lateral wall of the inner chamber in two locating bin of homonymy between fixed mounting have the elastic rod, homonymy two the equal fixed mounting in relative one side of springboard has one end to run through and extend to the inside bolt head of gim peg.
Further, the lock is including the jam plate, the right side of jam plate and the left side fixed mounting who shakes the dish, fixed mounting has the pole of sliding between the inner chamber left and right sides wall of jam plate, the surface movable mounting of pole of sliding has one end to run through and extends to the inside locking lever of belt cleaning device body, the surface movable mounting of pole of sliding has metal spring, metal spring's the left side and the inner chamber left side wall fixed mounting of jam plate, metal spring's the right side and the left side fixed mounting of locking lever.
Further, the inside of belt cleaning device body is provided with collects the storehouse, the left and right sides in collection storehouse all is provided with the handle, the inner wall in collection storehouse is provided with the fan, the surface of fan and the inner wall looks gomphosis in collection storehouse.
Furthermore, a cleaning inlet is formed in the top of the cleaning device body, a movable door is arranged on the front face of the cleaning device body, a shaft hole matched with the vertical shaft is formed in the top of the upper frame assembly, the rotating disc is rectangular when viewed from top to bottom, and a felt pad is arranged on the top of the brush plate.
Furthermore, the left side of belt cleaning device body and the right side in welt storehouse have all seted up the ring channel, the right side the size of ring channel and the size looks adaptation of axostylus axostyle, the left side the size of ring channel and the size looks adaptation of size of installation pole.
Furthermore, the locking rod is right-angle shape, the inside of locking rod has seted up the through hole, the diameter of through hole and the size of the size looks adaptation of pole that slides.
Further, the clamping bolt grooves are formed in the two clamping bolts on the opposite sides, threads are formed in the outer surfaces of the two clamping bolts, threaded holes in threaded connection with the clamping bolts are formed in the plug-in units, connecting holes are formed in the top and the bottom of the two clamping bolt grooves, the connecting holes are semicircular, and the size of each connecting hole is matched with that of the bolt head.
Furthermore, four bolt head one side of carrying on the back mutually all is provided with the cross-section, the left side of belt cleaning device body is provided with two spacing grooves, two the size of spacing groove all with the size looks adaptation of locking lever.
A wafer cleaning system comprises the following steps:
1) Placing the wafer in the cleaning device body, and fixing the wafer by starting the electric push rod and utilizing the size disc;
2) After the wafer is fixed, the vertical motor is started, and then the vertical motor drives the cleaning mechanism to perform a cleaning task, so that the back surface of the wafer is cleaned;
3) Garbage cleaned by the wafer is stored through the collecting bin, and the fan can also dry and blow the wafer;
4) The adjusting mechanism is operated, so that the wafer can be turned over, the turned surface of the wafer is further cleaned, and the cleaning step is to repeat the steps 2) and 3);
5) And after cleaning, opening a movable door arranged on the front surface of the cleaning device body, and taking out the cleaned wafer.
(III) advantageous effects
Compared with the prior art, the invention provides a wafer cleaning device and a wafer cleaning system, which have the following beneficial effects:
1. this wafer cleaning device and cleaning system through being provided with the upper frame subassembly, through the setting of upright motor and cylinder for clearance mechanism possesses rotatory and function that reciprocates, and then reaches the purpose of carrying out high-efficient cleaning to the wafer, through being provided with clearance mechanism, can install and dismantle the brush board, reaches the purpose of maintaining the brush board maintenance, thereby improves the clearance effect to the wafer, possesses the guard action to the wafer simultaneously, avoids the damage of brush board and influences the surface of wafer.
2. This wafer cleaning device and cleaning system through being provided with guiding mechanism, can carry out centre gripping and clearance with the wafer of not unidimensional size, has improved the usability of belt cleaning device body for the application scope of belt cleaning device body is more extensive, through being provided with the lock handle subassembly, can carry out the turn-over clearance with the wafer, improves the efficiency of clearance, compares in traditional single face clearance mode, and this kind of operation feasibility that can turn over is better.
Drawings
FIG. 1 is a schematic diagram of a wafer cleaning apparatus and a cleaning system according to the present invention;
FIG. 2 is an enlarged view of a portion A of the structure of a wafer cleaning apparatus and a wafer cleaning system according to the present invention in FIG. 1;
FIG. 3 is an enlarged view of the portion B in FIG. 1 illustrating a wafer cleaning apparatus and a cleaning system according to the present invention;
FIG. 4 is a top view of a chuck in a wafer cleaning apparatus and system according to the present invention;
fig. 5 is a schematic front view of fig. 1 in the structure of a wafer cleaning apparatus and a cleaning system according to the present invention.
In the figure: the cleaning device comprises a cleaning device body 1, an upper frame component 2, a vertical motor 3, a vertical shaft 4, a rotating disc 5, a cylinder 6, a cleaning mechanism 7, a cleaning disc 71, a brush plate 72, a plug-in component 73, a positioning hole 74, a clamping bolt 75, a positioning component 76, a 7601 positioning cabin, a 7602 springboard, a 7603 bolt head, an elastic rod 7604, an 8 adjusting mechanism, an 81 welting cabin, a 82 movable disc, an 83 mounting rod, a 84 rocking disc, an 85 locking handle component, an 8501 locking plate, an 8502 sliding rod, an 8503 locking rod, a 8504 metal spring, a 86 shaft rod, a 87 ruler plate, an 88 electric push rod, an 89 size disc, a 9 collecting cabin and a 10 fan.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Please refer to fig. 1 and 5, a wafer cleaning device, including a cleaning device body 1, a top of the cleaning device body 1 is provided with a top frame assembly 2, the top frame assembly 2 includes a vertical motor 3, a backing plate is fixedly installed on a right side of the vertical motor 3, a bottom of the backing plate and a top of the top frame assembly 2 are fixedly installed, the backing plate is arranged to facilitate placement of the vertical motor 3, an output shaft of the vertical motor 3 penetrates through and extends to a vertical shaft 4 inside the top frame 2 through one end of a coupler fixedly connected with, a shaft hole matched with the vertical shaft 4 is formed in the top of the top frame assembly 2, installation of the vertical shaft 4 is facilitated, a rotating disk 5 is fixedly installed on an outer surface of the vertical shaft 4, the rotating disk 5 is rectangular when viewed from top, the rotating disk 6 is conveniently driven to rotate, a cylinder 6 is fixedly installed at the bottom of the rotating disk 5, a cleaning mechanism 7 is arranged inside the top frame 2, an adjusting mechanism 8 is arranged inside the cleaning device body 1, a collection bin 9 is arranged inside the cleaning device body 1, handles are arranged on left side and right side of the collection bin 9, a fan 10 is arranged on an inner wall of the collection bin 9, and a position of the collection bin is larger.
Wherein, the top of belt cleaning device body 1 has seted up the washing entry, and the front of belt cleaning device body 1 is provided with the dodge gate, is convenient for take the wafer.
Specifically, through being provided with upper frame subassembly 2, through the setting of upright motor 3 and cylinder 6 for clearance mechanism 7 possesses rotatory and function that reciprocates, and then reaches the purpose of carrying out high-efficient cleaning to the wafer, through being provided with guiding mechanism 8, can carry out centre gripping and clearance with the wafer of not unidimensional size, has improved the practicality of belt cleaning device body 1, makes the application scope of belt cleaning device body 1 more extensive, and is more practical.
Referring to fig. 2, in the present embodiment, the cleaning mechanism 7 includes a cleaning disc 71, the top of the cleaning disc 71 and the bottom of the cylinder 6 are fixedly installed, a brush plate 72 is movably installed at the bottom of the cleaning disc 71, the brush plate 72 is responsible for cleaning, a felt pad is disposed at the top of the brush plate 72, which is beneficial for stably installing the brush plate 72, two plug-ins 73, one end of which penetrates through and extends into the cleaning disc 71, are fixedly installed at the top of the brush plate 72, the plug-ins 73 assist in installing the brush plate 72, positioning holes 74 are disposed at the left side and the right side of the cleaning disc 71, two clamping bolts 75, one end of which penetrates through and extends to the outside of the plug-ins 73, are movably installed at the left side and the right side of the two positioning holes 74, and positioning assemblies 76 are disposed at the top and the bottom of the cleaning disc 71.
Wherein, two locating component 76 all include two location storehouses 7601, the inside of clearing up dish 1 is all seted up in two location storehouses 7601 of homonymy, the equal movable mounting in inside of two locating holes 74 has two springboards 7602, fixed mounting has an elastic rod 7604 between the relative lateral wall of the inner chamber of two location storehouses 7601 of the back of the body of two springboards 7602 of homonymy respectively, the equal fixed mounting in relative one side of two springboards 7602 of homonymy has one end to run through and extend to the inside bolt head 7603 of draw-in bolt 75, four bolt heads 7603 the back of the body of the back of the body one side all are provided with the cross-section, conveniently extrude bolt head 7603.
Wherein, the jam bolt groove has all been seted up to the back of the body one side of two jam bolts 75, and the screw thread has all been seted up to the surface of two jam bolts 75, and the screw hole with 75 threaded connection of jam bolt is all seted up to the inside of two plug-in components 73, and the convenience is fixed plug-in components 73.
The elastic rod 7604 comprises a pressure spring and a telescopic rod, the pressure spring is movably mounted on the outer surface of the telescopic rod, one end of the pressure spring is fixedly mounted on the outer surface of the springboard 7602, the other end of the pressure spring is fixedly mounted on the inner wall of the positioning bin 7601, the elastic rod 7604 is arranged to be a bolt head 7603 to increase elastic force, and therefore the clamping bolt 75 is better assisted to be fixed.
It should be explained that the top and the bottom of the two clip slots are both provided with a connecting hole, the connecting holes are semicircular, so that the plug head 7603 can be conveniently placed, and the size of the connecting holes is matched with the size of the plug head 7603, thereby being beneficial to fixing the plug head 7603 and the clip 75.
Specifically, through being provided with elastic rod 7604, through the setting of elastic rod 7604 for stub 7603 possesses tension, through be provided with in the inside of gim peg 75 with the pole that supports of gim peg groove size looks adaptation, can extrude stub 7603, thereby shift out stub 7603 inside the gim peg 75, twist the gim peg 75 again, thereby reach break away from between plug-in components 73 and the clearance board 71, reach the purpose of dismantling brush board 72.
Referring to fig. 3 and 4, in this embodiment, the adjusting mechanism 8 includes a welt bin 81, an outer surface of the welt bin 81 is fixedly mounted on an inner wall of the cleaning device body 1, a movable disc 82 is movably mounted between the inner wall of the welt bin 81 and the inner wall of the cleaning device body 1, a mounting rod 83 having one end penetrating through and extending to the outside of the cleaning device body 1 is movably mounted on a left side of the movable disc 82, a rocking disc 84 is fixedly mounted on a left side of the mounting rod 83, a lock handle assembly 85 is disposed on a left side of the rocking disc 84, two shaft levers 86 are movably mounted inside the cleaning device body 1, a right side of the right shaft lever 86 is movably mounted on a right side wall of an inner cavity of the cleaning device body 1, a left side of the left shaft lever 86 is fixedly connected with a right side of the movable disc 82, ruler plates 87 are movably mounted on outer surfaces of the two shaft levers 86, size discs 89 are fixedly mounted on opposite sides of the two ruler plates 87, and electric push rods 88 are fixedly mounted between opposite sides of the inner cavities of the two ruler plates 87 and opposite sides of the two shaft levers 86.
Wherein, the lock is subassembly 85 including jam plate 8501, jam plate 8501's right side and the left side fixed mounting of rocking disc 84, fixed mounting has slide bar 8502 between jam plate 8501's the inner chamber left and right sides wall, slide bar 8502's surface movable mounting has one end to run through and extend to the locking lever 8503 of belt cleaning device body 1 inside, belt cleaning device body 1's left side is provided with two spacing grooves, the size of two spacing grooves all with locking lever 8503's size looks adaptation, conveniently carry out spacing fixed to locking lever 8503, slide bar 8502's surface movable mounting has metal spring 8504, metal spring 8504's left side and jam plate 8501's the left side wall fixed mounting of inner chamber, metal spring 8504's right side and locking lever 8503's left side fixed mounting.
Wherein, the ring channel has all been seted up on the left side of belt cleaning device body 1 and the right side in welt storehouse 81, the size of right side ring channel and axostylus axostyle 6's size looks adaptation, the size of left side ring channel and the size of the size looks adaptation of installation pole 83.
The locking rod 8503 is right-angled, a through hole is formed in the locking rod 8503, the diameter of the through hole is matched with the size of the sliding rod 8502, and the locking rod 8503 can slide conveniently.
Concretely, it is close to relative one side to drive size dish 89 through being provided with electric putter 88, until fixing the wafer, after the wafer clearance of single face, can carry out the turn-over operation to the wafer through rotating movable disc 82, then with locking lever 8503 through the extrusion to metal spring 8504, and make locking lever 8503 shift out the belt cleaning device body 1 outside, rethread rotates jam plate 8501, rotate one hundred eighty degrees, then, align locking lever 8503 to be located the spacing inslot that belt cleaning device body 1 bottom left side set up, through metal spring 8504's elasticity, and locking lever 8503 fixes, reach the purpose with wafer turn-over operation.
A wafer cleaning system comprises the following steps:
1) Placing the wafer in the cleaning device body 1, and fixing the wafer by starting the electric push rod 88 and using the size disc 89;
2) After the wafer is fixed, the vertical motor 3 is started, and the vertical motor 3 drives the cleaning mechanism 7 to perform a cleaning task, so that the back surface of the wafer is cleaned;
3) Garbage cleaned by the wafer is stored through the collecting bin 9, and the fan 10 can also dry and blow the wafer;
4) The adjusting mechanism 8 is operated to turn the wafer over, so that the turning of the wafer is cleaned, and the cleaning step is to repeat the steps 2 and 3;
5) After cleaning, the movable door arranged on the front surface of the cleaning device body 1 is opened, and the cleaned wafer is taken out.
The working principle of the above embodiment is as follows:
(1) According to the wafer cleaning device and the cleaning system, the vertical motor 3 is started, the output shaft of the vertical motor 3 drives the vertical shaft 4 to rotate through the coupler, the rotating disc 5 rotates to drive the air cylinder 6 to perform surrounding cleaning, the air cylinder 6 is started, the air cylinder 6 adjusts the upper portion and the lower portion of the brush plate 72, and when the brush plate 72 is in contact with a wafer, the air cylinder 6 can be stopped, and cleaning is performed.
(2) When the brush plate 72 is used for a long time, the brush plate needs to be replaced, the external abutting rod can be inserted into a clamping bolt groove formed in the clamping bolt 75, the inserting rod extrudes the bolt head 7603, the bolt head 7603 is extruded out of the clamping bolt 75, the clamping bolt 75 rotates, the clamping bolt 75 is screwed out of the cleaning disc 71 in a threaded connection mode, the cleaning disc 71 is separated from the brush plate 72, and the brush plate 71 is disassembled.
(3) This wafer belt cleaning device and cleaning system when carrying out the centre gripping to the wafer of not unidimensional size, earlier place the inside of belt cleaning device body 1 with the wafer, size dish 89 keeps away from mutually this moment, then starts electric putter 88 and drives size dish 89 and be close to relative one side, until fixing the wafer.
(4) After the wafer of single face is cleared up, can carry out the turn-over operation to the wafer through rotating movable disc 82, then with locking lever 8503 through extruding metal spring 8504, and make locking lever 8503 shift out the belt cleaning device body 1 outside, rethread rotates jam plate 8501, rotate one hundred eighty degrees, then, aim at locking lever 8503 and lie in the spacing inslot that belt cleaning device body 1 bottom left side set up, through metal spring 8504's elasticity, and fix locking lever 8503, reach the purpose with the operation of wafer turn-over, fan 10's setting can be swept the wafer, collect the rubbish that storehouse 9 will clean and carry out the splendid attire.
It should be noted that, in this document, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrases "comprising a," "8230," "8230," or "comprising" does not exclude the presence of additional like elements in a process, method, article, or apparatus that comprises the element.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (8)
1. A wafer cleaning device, includes belt cleaning device body (1), its characterized in that: an upper frame assembly (2) is arranged at the top of the cleaning device body (1), a cleaning mechanism (7) is arranged inside the upper frame assembly (2), and an adjusting mechanism (8) is arranged inside the cleaning device body (1);
the upper frame assembly (2) comprises a vertical motor (3), an output shaft of the vertical motor (3) is fixedly connected with a vertical shaft (4) with one end penetrating through and extending into the upper frame assembly (2) through a coupler, a rotating disc (5) is fixedly mounted on the outer surface of the vertical shaft (4), an air cylinder (6) is fixedly mounted at the bottom of the rotating disc (5), the output shaft of the vertical motor (3) drives the vertical shaft (4) to rotate through the coupler, and then the rotating disc (5) rotates to drive the air cylinder (6) to perform surrounding cleaning;
the cleaning mechanism (7) comprises a cleaning disc (71), the top of the cleaning disc (71) is fixedly mounted with the bottom of the air cylinder (6), a brush plate (72) is movably mounted at the bottom of the cleaning disc (71), two plug-ins (73) with one ends penetrating through and extending into the cleaning disc (71) are fixedly mounted at the top of the brush plate (72), positioning holes (74) are respectively formed at the left side and the right side of the cleaning disc (71), clamping bolts (75) with one ends penetrating through and extending to the outside of the plug-ins (73) are respectively movably mounted at the left side and the right side of the two positioning holes (74), and positioning assemblies (76) are respectively arranged at the top and the bottom of the cleaning disc (71);
the adjusting mechanism (8) comprises a welting bin (81), the outer surface of the welting bin (81) is fixedly mounted with the inner wall of the cleaning device body (1), a movable disc (82) is movably mounted between the inner wall of the welting bin (81) and the inner wall of the cleaning device body (1), a mounting rod (83) with one end penetrating and extending to the outside of the cleaning device body (1) is movably mounted on the left side of the mounting rod (83), a rocking disc (84) is fixedly mounted on the left side of the mounting rod (83), a lock handle assembly (85) is arranged on the left side of the rocking disc (84), two shaft levers (86) are movably mounted inside the cleaning device body (1), the right side of the shaft lever (86) on the right side is movably mounted with the right side wall of the inner cavity of the cleaning device body (1), the left side of the shaft lever (86) on the left side is fixedly connected with the right side of the movable disc (82), ruler plates (87) are movably mounted on the outer surfaces of the two shaft levers (86), a size disc (89) is fixedly mounted on one side of the opposite to one side of the two ruler plates (87), and an electric push rod (88) is mounted on one side of the inner cavity of the two ruler plates (86) opposite to the other side;
the lock is including jam plate (8501) subassembly (85), the right side of jam plate (8501) and the left side fixed mounting who shakes dish (84), fixed mounting has slide bar (8502) between the inner chamber left and right sides wall of jam plate (8501), the surface movable mounting of slide bar (8502) has one end to run through and extend to locking lever (8503) of belt cleaning device body (1) inside, the surface movable mounting of slide bar (8502) has metal spring (8504), the left side of metal spring (8504) and the inner chamber left side wall fixed mounting of jam plate (8501), the right side of metal spring (8504) and the left side fixed mounting of locking lever (8503).
2. The wafer cleaning apparatus according to claim 1, wherein: two locating component (76) all include two locating bin (7601), and the homonymy is two locating bin (7601) all sets up in the inside of clearing up dish (71), two the equal movable mounting in inside of locating hole (74) has two springboards (7602), and the homonymy is two springbar (7604), homonymy fixed mounting have one end to run through and extend to the inside bolt head (7603) of gim peg (75) between the relative lateral wall of inner chamber of two locating bin (7601) of homonymy respectively on one side of carrying on the back of the body of springboard (7602), homonymy two the equal fixed mounting in relative one side of springboard (7602).
3. The wafer cleaning apparatus according to claim 1, wherein: the inside of belt cleaning device body (1) is provided with collects storehouse (9), the left and right sides of collecting storehouse (9) all is provided with the handle, the inner wall of collecting storehouse (9) is provided with fan (10), the surface of fan (10) and the inner wall looks gomphosis of collecting storehouse (9).
4. The wafer cleaning apparatus according to claim 1, wherein: the cleaning device is characterized in that a cleaning inlet is formed in the top of the cleaning device body (1), a movable door is arranged on the front face of the cleaning device body (1), a shaft hole matched with the vertical shaft (4) is formed in the top of the upper frame component (2), the rotating disc (5) is rectangular when seen from top to bottom, and a felt pad is arranged on the top of the brush plate (72).
5. The wafer cleaning apparatus according to claim 1, wherein: the left side of belt cleaning device body (1) and the right side in welt storehouse (81) have all seted up the ring channel, the right side the size of ring channel and the size looks adaptation of axostylus axostyle, the left side the size of ring channel and the size of a dimension looks adaptation of installation pole (83).
6. The wafer cleaning apparatus according to claim 1, wherein: the locking rod (8503) is in a right-angle shape, a through hole is formed in the locking rod (8503), and the diameter of the through hole is matched with the size of the sliding rod (8502).
7. The wafer cleaning apparatus according to claim 2, wherein: the clamping bolt groove is formed in one side, opposite to the other side, of each of the two clamping bolts (75), threads are formed in the outer surface of each of the two clamping bolts (75), threaded holes in threaded connection with the clamping bolts (75) are formed in the two plug-in units (73), connecting holes are formed in the top and the bottom of each of the two clamping bolt grooves, each connecting hole is semicircular, and the size of each connecting hole is matched with that of each bolt head (7603).
8. The wafer cleaning apparatus according to claim 2, wherein: four bolt head (7603) one side of carrying on the back mutually all is provided with the cross-section, the left side of belt cleaning device body (1) is provided with two spacing grooves, two the size of spacing groove all with the size looks adaptation of locking lever (8503).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210120127.1A CN114589183B (en) | 2022-01-30 | 2022-01-30 | Wafer cleaning device and cleaning system |
| CN202211428996.7A CN115954262B (en) | 2022-01-30 | 2022-01-30 | Wafer cleaning method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210120127.1A CN114589183B (en) | 2022-01-30 | 2022-01-30 | Wafer cleaning device and cleaning system |
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| CN202211428996.7A Division CN115954262B (en) | 2022-01-30 | 2022-01-30 | Wafer cleaning method |
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| CN114589183A CN114589183A (en) | 2022-06-07 |
| CN114589183B true CN114589183B (en) | 2022-12-23 |
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| CN202211428996.7A Active CN115954262B (en) | 2022-01-30 | 2022-01-30 | Wafer cleaning method |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202211428996.7A Active CN115954262B (en) | 2022-01-30 | 2022-01-30 | Wafer cleaning method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115463892B (en) * | 2022-09-16 | 2023-06-20 | 上海申和投资有限公司 | Piece She Shijing round cleaning machine |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3321725B2 (en) * | 1995-05-12 | 2002-09-09 | 東京エレクトロン株式会社 | Cleaning equipment |
| JP5009253B2 (en) * | 2008-08-07 | 2012-08-22 | 東京エレクトロン株式会社 | Substrate cleaning device |
| CN106880161B (en) * | 2017-03-25 | 2018-10-12 | 安徽三和刷业有限公司 | A kind of hairbrush being conveniently replaceable brush head |
| CN208194743U (en) * | 2018-04-02 | 2018-12-07 | 浙江农业商贸职业学院 | A kind of automotive lacquer bracket with turn over function |
| CN108816860B (en) * | 2018-06-14 | 2021-08-31 | 芜湖慧宇商贸有限公司 | All-round cleaning device |
| CN208889616U (en) * | 2018-09-10 | 2019-05-21 | 锐捷芯盛（天津）电子科技有限公司 | A kind of wafer cleaning device |
| CN209312731U (en) * | 2019-01-24 | 2019-08-27 | 深圳市正和兴电子有限公司 | A kind of wafer cleaning drying device |
| CN112309923A (en) * | 2020-11-10 | 2021-02-02 | 太仓治誓机械设备科技有限公司 | Whole cleaning equipment of semiconductor wafer |
| CN214146489U (en) * | 2020-12-10 | 2021-09-07 | 瑞安市塘下作虎标准件拉丝加工厂 | Detachable bolt shaft |
| CN113976495A (en) * | 2021-01-26 | 2022-01-28 | 辉腾交通器材(安徽)有限公司 | Cleaning equipment is used in production of motorcycle piston ring |
| CN112735992B (en) * | 2021-03-31 | 2021-06-04 | 亚电科技南京有限公司 | Waterproof mark semiconductor wafer cleaning device based on inert gas and using method |
| CN215158750U (en) * | 2021-07-09 | 2021-12-14 | 济南瑞欧博自动化设备有限公司 | Turnover mechanism based on solar cell |
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| CN115954262B (en) | 2024-04-02 |
| CN115954262A (en) | 2023-04-11 |
| CN114589183A (en) | 2022-06-07 |
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Address after: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Patentee after: Jiangsu Yadian Technology Co.,Ltd. Address before: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Patentee before: Jiangsu Yadian Technology Co.,Ltd. |