CN114570180A - Acetic anhydride waste gas treatment device for organic silicon synthesis - Google Patents
Acetic anhydride waste gas treatment device for organic silicon synthesis Download PDFInfo
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Abstract
The invention discloses an acetic anhydride waste gas treatment device for organic silicon synthesis, which comprises a reaction tank, wherein a gas guide main rod is inserted into the reaction tank, the outer side of the gas guide main rod is connected with a gas guide auxiliary rod, and a reaction auxiliary mechanism for prolonging the reaction time of waste gas in an absorbent and increasing the contact area of the waste gas and the absorbent is arranged in the reaction tank; and optimally, the air guide main rod is internally and fixedly provided with an air distribution mechanism for controlling the working sequence of the reaction auxiliary mechanism. This acetic anhydride exhaust treatment device for organosilicon synthesis, through installation deflector in the retort, during the use, waste gas is discharged from the air guide auxiliary rod, and the bubble come-up gathers mouthful department along the guide of below deflector to the breathing in, is gathering mouthful department dispersion outflow along the guide of top deflector to the breathing in, so makes the unable direct come-up of waste gas that gets into in the absorbent, has prolonged the time of waste gas in the absorbent, lets the reaction more abundant.
Description
Technical Field
The invention relates to the technical field of acetic anhydride waste gas treatment, in particular to an acetic anhydride waste gas treatment device for organic silicon synthesis.
Background
In the organic silicon synthesis process, waste gas with acetic anhydride is generated, and the acetic anhydride causes environmental pollution and influences the health of workers, so that the waste gas cannot be directly discharged, and the waste gas needs to be introduced into an absorbent for absorption and purification to remove the acetic anhydride in the waste gas;
at present, when acetic anhydride waste gas is treated, a dissolving and neutralizing method is mostly directly adopted, and the dissolving time of the acetic anhydride waste gas is long during dissolving and neutralizing, so that the acetic anhydride waste gas is easy to be insufficiently treated during purification, and the problem is solved by providing the acetic anhydride waste gas treatment device for organic silicon synthesis.
Disclosure of Invention
The invention aims to solve the problem that the waste gas of acetic anhydride is easy to be insufficiently treated during purification because the waste gas of acetic anhydride is dissolved for a long time, and provides an acetic anhydride waste gas treatment device for organosilicon synthesis, which has the function of sufficient reaction.
The invention adopts the following technical scheme for realizing the technical purpose: an acetic anhydride waste gas treatment device for organic silicon synthesis comprises a reaction tank, wherein an air guide main rod is inserted into the reaction tank, an air guide auxiliary rod is connected to the outer side of the air guide main rod, an exhaust pipe is connected to the outer side of the reaction tank, an air blowing device is connected above the air guide main rod, an absorbent is filled in the reaction tank, and a reaction auxiliary mechanism for prolonging the reaction time of waste gas in the absorbent and increasing the contact area of the waste gas and the absorbent is arranged in the reaction tank;
As optimization, a gas distribution mechanism for controlling the working sequence of the reaction auxiliary mechanism is fixedly arranged inside the gas guide main rod;
preferably, the inner part of the tank wall of the reaction tank is provided with a diversion hole for balancing the state balance of the waste gas and the absorbent around the reaction auxiliary mechanism.
As an optimization, the air guide main rod and the air guide auxiliary rod are the same, the air guide auxiliary rod is arranged circumferentially, and the air exhaust holes parallel to the horizontal plane are formed in the same direction of the side surface of the air guide auxiliary rod;
preferably, openings at two ends of the diversion hole are respectively positioned above and below the reaction auxiliary mechanism, and the opening above the diversion hole is submerged by the absorbent
Preferably, the reaction auxiliary mechanism comprises a guide plate fixedly connected to the inner wall of the reaction tank, the guide plate is formed by splicing two funnel-shaped discs from top to bottom, the surface of the lower guide plate is provided with a ventilating and gathering port, the surface of the upper guide plate is provided with a ventilating and scattering port, and a screen mesh is fixedly connected between the upper guide plate and the lower guide plate.
Preferably, the guide plate is positioned above the air guide auxiliary rod and surrounds the outer side of the air guide main rod, the middle of the lower guide plate is high, and the periphery of the lower guide plate is low, and the middle of the upper guide plate is low and the periphery of the upper guide plate is high.
Preferably, the air gathering port is located at the center of the guide plate, the air diffusing ports are dispersed around the guide plate, and the screen is located between the air gathering port and the air diffusing ports.
Preferably, the air distribution mechanism comprises an air guide groove arranged in the air guide main rod, the bottom wall of the air guide groove is fixedly connected with a central rod, the outer side of the central rod is rotatably connected with a turntable, and a sliding groove is formed in the surface of the turntable;
as an optimization, divide the gas mechanism including seting up in the inside connecting hole of air guide mobile jib, the inside fixed connection mounting bracket of connecting hole, the inside sliding connection control lever of mounting bracket, the one end fixed connection shutoff ball of control lever, the draw-in groove is seted up to the other end of control lever, the inside fixed connection of draw-in groove runs through the slide bar of spout.
Preferably, a torsion spring is arranged between the central rod and the rotary table, the force required by the torsion spring above the rotary table is larger than the force required by the torsion spring below the rotary table, and the diameter of the rotary table is smaller than the inner diameter of the air guide groove.
Preferably, the difference of the straight line distances from the two ends of the sliding chute to the central rod is larger than half of the diameter of the plugging ball.
As optimization, the connecting hole is communicated with the air guide groove and the air guide auxiliary rod, the outer opening of the connecting hole is the same as the shape of the plugging ball, and the diameter of the lower connecting hole is larger than that of the lower connecting hole;
as optimization, the connecting hole is plugged by the plugging ball, and the control rod is wrapped outside the turntable through the clamping groove.
Preferably, open grooves communicated with the flow guide holes are formed in the reaction tank and located in the upper side and the lower side of the upper guide plate and the lower side of the lower guide plate, the open grooves between the upper guide plate and the lower guide plate in the same group are close to the lower guide plate, and the open grooves between the two groups of different guide plates are close to the upper guide plate.
The invention has the following beneficial effects:
1. this acetic anhydride waste gas treatment device for organosilicon synthesis discharges waste gas through using the exhaust hole, and waste gas has given a thrust at the exhaust in-process to the air guide auxiliary rod like this, makes air guide main rod and air guide auxiliary rod rotate, so stirs waste gas and absorbent, acceleration mixing, reaction rate.
2. This synthetic acetic anhydride exhaust treatment device of using of organosilicon, through installation deflector in the retort, during the use, waste gas is discharged from the air guide side rod, and the bubble come-up gathers mouthful department along the guide of below deflector to ventilating, is gathering along the scattered mouthful of dispersion outflow of ventilating of top deflector guide, so makes the unable direct come-up of waste gas that gets into in the absorbent, has prolonged the time of waste gas in the absorbent, lets the reaction more abundant.
3. According to the acetic anhydride waste gas treatment device for organic silicon synthesis, the screen is arranged between the air gathering port and the air diffusing port, when the device is used, countless dispersed bubbles on the periphery converge towards the middle to form larger bubbles when waste gas flows through the air gathering port, the larger bubbles are divided into smaller bubbles to be diffused towards the periphery, so that the contact area of the waste gas and an absorbent is increased, the reaction is accelerated, and meanwhile, the outer surfaces of the two bubbles are changed by firstly converging and redispersing, so that the contact area is further increased, and the reaction speed is increased.
4. According to the acetic anhydride waste gas treatment device for organic silicon synthesis, the sealing ball is arranged at the opening of the connecting hole, the sealing ball is pushed away during ventilation, and the connecting hole is sealed by the sealing ball during air stopping, so that blood backflow can be prevented during air stopping, and the complete work of equipment is ensured;
through arranging torsion springs with different tension forces, during ventilation, high-pressure airflow pushes the blocking ball at the lowest part of the block first, if the air pressure is not changed, the current working state is continued, and if the air pressure is increased continuously, the blocking ball at the upper part is pushed away, so that the air guide auxiliary rod at the lowest part is always started first and closed last, the working efficiency is improved, and the reaction effect is ensured;
the synchronous movement of various plugging balls is controlled by the turntable, so that the uniform dispersion of waste gas is ensured, and the reaction quality is improved;
the diameter of the lower connecting hole is larger than that of the upper connecting hole, so that the ventilation volume below the lower connecting hole is larger than that above the lower connecting hole, and the influence of bubbles floating above the lower connecting hole on bubbles above the lower connecting hole is reduced;
drawings
FIG. 1 is a schematic view of the interior of a reaction tank of an acetic anhydride waste gas treatment device for organosilicon synthesis.
FIG. 2 is a diagram showing a reaction auxiliary mechanism of the acetic anhydride waste gas treatment device for organosilicon synthesis.
FIG. 3 is a sectional view of an acetic anhydride waste gas treatment device for organosilicon synthesis according to the invention.
FIG. 4 is a schematic view of a flow guide hole of the acetic anhydride waste gas treatment device for organosilicon synthesis.
FIG. 5 is a schematic view of a gas distribution mechanism of the acetic anhydride waste gas treatment device for organosilicon synthesis.
FIG. 6 is a partial display view of a gas distribution mechanism of the acetic anhydride waste gas treatment device for organosilicon synthesis.
In the figure: 1. a reaction tank; 2. an air guide main rod; 3. an air guide auxiliary rod; 4. a reaction assisting mechanism; 41. a guide plate; 42. a vent convergence port; 43. ventilating and dispersing openings; 44. screening a screen; 5. a gas distribution mechanism; 51. a gas guide groove; 52. a center pole; 53. a turntable; 54. a chute; 55. connecting holes; 56. a mounting frame; 57. a control lever; 58. plugging the ball; 59. a card slot; 510. a slide bar; 6. and (4) flow guide holes.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
Referring to fig. 1, an acetic anhydride waste gas treatment device for organic silicon synthesis comprises a reaction tank 1, wherein an absorbent is filled in the reaction tank 1, a main gas guide rod 2 is inserted into the reaction tank 1, an auxiliary gas guide rod 3 is connected to the outer side of the main gas guide rod 2, an exhaust pipe is connected to the outer side of the reaction tank 1, an air blowing device is connected to the upper part of the main gas guide rod 2, and waste gas generated by reaction is filled in through the air blowing device;
the air guide main rod 2 and the air guide auxiliary rod 3 are the same, the air guide auxiliary rod 3 is arranged in a circumferential mode, and exhaust holes parallel to the horizontal plane are formed in the same direction of the side face of the air guide auxiliary rod 3.
The exhaust holes are used for discharging the exhaust gas, so that the exhaust gas provides thrust for the air guide auxiliary rod 3 in the discharging process, the air guide main rod 2 and the air guide auxiliary rod 3 rotate, the exhaust gas and the absorbent are stirred, and the mixing and reaction speed is accelerated.
Example 2
Referring to fig. 1-3, an acetic anhydride waste gas treatment device for organic silicon synthesis comprises a reaction tank 1, an absorbent is filled in the reaction tank 1, a main gas guide rod 2 is inserted and arranged in the reaction tank 1, an auxiliary gas guide rod 3 is connected to the outer side of the main gas guide rod 2, an exhaust pipe is connected to the outer side of the reaction tank 1, an air blowing device is connected to the upper side of the main gas guide rod 2, waste gas generated by reaction is filled in through the air blowing device, and a reaction auxiliary mechanism 4 for prolonging the reaction time of the waste gas in the absorbent and increasing the contact area of the waste gas and the absorbent is arranged in the reaction tank 1;
The air guide main rod 2 and the air guide auxiliary rod 3 are the same, the air guide auxiliary rod 3 is arranged in a circumferential mode, and exhaust holes parallel to the horizontal plane are formed in the same direction of the side face of the air guide auxiliary rod 3.
Openings at two ends of the diversion hole 6 are respectively positioned above and below the reaction auxiliary mechanism 4, and the opening above the diversion hole 6 is submerged by the absorbent.
The reaction auxiliary mechanism 4 comprises a guide plate 41 fixedly connected to the inner wall of the reaction tank 1, the guide plate 41 is formed by splicing two funnel-shaped discs up and down, the surface of the lower guide plate 41 is provided with a ventilating and gathering port 42, the surface of the upper guide plate 41 is provided with a ventilating and scattering port 43, and a screen 44 is fixedly connected between the upper guide plate 41 and the lower guide plate 41.
The guide plate 41 is positioned above the air guide auxiliary rod 3, the guide plate 41 surrounds the outer side of the air guide main rod 2, the middle of the lower guide plate 41 is high, and the periphery of the lower guide plate 41 is low, and the middle of the upper guide plate 41 is low, and the periphery of the upper guide plate is high.
The air gathering port 42 is located at the center of the guide plate 41, the air diffusing ports 43 are dispersed around the guide plate 41, and the screen 44 is located between the air gathering port 42 and the air diffusing ports 43.
When the reaction tank 1 is used, the waste gas is discharged from the gas guide auxiliary rod 3, bubbles float upwards and are collected to the gas gathering port 42 along the guide of the lower guide plate 41, and the bubbles are dispersed and flow out along the guide of the upper guide plate 41 to the gas scattering port 43, so that the waste gas entering the absorbent cannot float upwards directly, the time of the waste gas in the absorbent is prolonged, and the reaction is more sufficient;
By installing the screen 44 between the air gathering port 42 and the air diffusing port 43, when in use, countless dispersed air bubbles around the air gathering port 42 are gathered to the middle to form larger air bubbles when the exhaust gas flows through the air gathering port 42, the larger air bubbles are divided into smaller air bubbles and are diffused to the periphery, so that the contact area of the exhaust gas and the absorbent is increased, the reaction is accelerated, and meanwhile, by the methods of gathering and dispersing firstly, the contact area of the exhaust gas and the absorbent is changed twice, the contact area is further increased, and the reaction speed is increased.
And further:
the inner part of the tank wall of the reaction tank 1 is provided with a diversion hole 6 for balancing the state balance of the waste gas and the absorbent around the reaction auxiliary mechanism 4.
Open grooves communicated with the diversion holes 6 are formed in the reaction tank 1 and positioned on the upper side and the lower side of the upper guide plate 41 and the lower guide plate 41.
So get into behind the waste gas pressure increase below deflector 41, can have partial absorbent by the waste gas extrusion upwards, when the ventilation volume becomes little, the partial absorbent that is discharged can flow back, conflicts with the bubble that rises, makes the unsmooth of bubble come-up, and comes the balanced absorbent through water conservancy diversion hole 6, does not influence the bubble come-up, improves work efficiency.
The open slots between the upper and lower guide plates 41 of the same set are adjacent to the lower guide plate 41, and the open slots between the different sets of guide plates 41 are adjacent to the upper guide plate 41.
This prevents exhaust gas bubbles from being discharged from the guide holes 6.
Example 3
Referring to fig. 1-6, an acetic anhydride waste gas treatment device for organic silicon synthesis comprises a reaction tank 1, an absorbent is filled in the reaction tank 1, a main gas guide rod 2 is inserted and arranged in the reaction tank 1, an auxiliary gas guide rod 3 is connected to the outer side of the main gas guide rod 2, an exhaust pipe is connected to the outer side of the reaction tank 1, an air blowing device is connected to the upper side of the main gas guide rod 2, waste gas generated by reaction is filled in through the air blowing device, and a reaction auxiliary mechanism 4 for prolonging the reaction time of the waste gas in the absorbent and increasing the contact area of the waste gas and the absorbent is arranged in the reaction tank 1;
the air guide main rod 2 is internally and fixedly provided with an air distribution mechanism 5 for controlling the working sequence of the reaction auxiliary mechanism 4;
the air guide main rod 2 and the air guide auxiliary rod 3 are the same, the air guide auxiliary rods 3 are arranged in a circumferential mode, and exhaust holes parallel to the horizontal plane are formed in the same direction of the side face of each air guide auxiliary rod 3.
Openings at two ends of the diversion hole 6 are respectively positioned above and below the reaction auxiliary mechanism 4, and an opening above the diversion hole 6 is submerged by the absorbent.
The reaction auxiliary mechanism 4 comprises a guide plate 41 fixedly connected to the inner wall of the reaction tank 1, the guide plate 41 is formed by splicing two funnel-shaped discs up and down, the surface of the lower guide plate 41 is provided with a ventilating and gathering port 42, the surface of the upper guide plate 41 is provided with a ventilating and scattering port 43, and a screen 44 is fixedly connected between the upper guide plate 41 and the lower guide plate 41.
The guide plate 41 is positioned above the air guide auxiliary rod 3, the guide plate 41 surrounds the outer side of the air guide main rod 2, the middle of the lower guide plate 41 is high, and the periphery of the lower guide plate 41 is low, and the middle of the upper guide plate 41 is low, and the periphery of the upper guide plate is high.
The air gathering port 42 is located at the center of the guide plate 41, the air diffusing ports 43 are dispersed around the guide plate 41, and the screen 44 is located between the air gathering port 42 and the air diffusing ports 43.
The air distributing mechanism 5 comprises an air guide groove 51 arranged in the air guide main rod 2, the bottom wall of the air guide groove 51 is fixedly connected with a central rod 52, the outer side of the central rod 52 is rotatably connected with a turntable 53, and the surface of the turntable 53 is provided with a sliding groove 54;
the air distribution mechanism 5 comprises a connecting hole 55 formed in the air guide main rod 2, a mounting frame 56 is fixedly connected to the inside of the connecting hole 55, a control rod 57 is slidably connected to the inside of the mounting frame 56, a blocking ball 58 is fixedly connected to one end of the control rod 57, a clamping groove 59 is formed in the other end of the control rod 57, and a sliding rod 510 penetrating through the sliding groove 54 is fixedly connected to the inside of the clamping groove 59.
A torsion spring is arranged between the central rod 52 and the rotating disc 53, the force required by the upper torsion spring is larger than the force required by the lower torsion spring, and the diameter of the rotating disc 53 is smaller than the inner diameter of the air guide groove 51.
The difference in the linear distance from the ends of the slide groove 54 to the center rod 52 is greater than half the diameter of the blocking ball 58.
The connecting hole 55 is communicated with the air guide groove 51 and the air guide auxiliary rod 3, the outer opening of the connecting hole 55 has the same shape as the plugging ball 58, and the diameter of the lower connecting hole 55 is larger than that of the upper connecting hole 55;
the connecting hole 55 is sealed by a sealing ball 58, and the control rod 57 is wrapped outside the rotary disc 53 through a clamping groove 59.
By arranging the blocking ball 58 at the opening of the connecting hole 55, the blocking ball 58 is pushed away during ventilation, and the blocking ball 58 blocks the connecting hole 55 during air stopping, so that blood backflow can be prevented during air stopping, and the complete work of equipment is ensured;
through arranging torsion springs with different tension forces, during ventilation, high-pressure airflow pushes the blocking ball 58 at the lowest part of the block first, if the air pressure is not changed, the current working state is continued, and if the air pressure is increased continuously, the blocking ball 58 at the upper part is pushed away, so that the air guide auxiliary rod 3 at the lowest part is always started first and closed last, the working efficiency is improved, and the reaction effect is ensured;
the synchronous movement of various blocking balls 58 is controlled by the turntable 53, so that the uniform dispersion of waste gas is ensured, and the reaction quality is improved;
the diameter of the lower connecting hole 55 is larger than that of the upper connecting hole 55, so that the lower ventilation volume is larger than the upper ventilation volume, and the influence of the air bubbles floating on the lower part on the upper part is reduced;
Example 4
Referring to fig. 1-6, an acetic anhydride waste gas treatment device for organic silicon synthesis comprises a reaction tank 1, an absorbent is filled in the reaction tank 1, a main air guide rod 2 is inserted into the reaction tank 1, an auxiliary air guide rod 3 is connected to the outer side of the main air guide rod 2, an exhaust pipe is connected to the outer side of the reaction tank 1, an air blowing device is connected to the upper side of the main air guide rod 2, waste gas generated by reaction is filled in through the air blowing device, and a reaction auxiliary mechanism 4 for prolonging the reaction time of the waste gas in the absorbent and increasing the contact area of the waste gas and the absorbent is arranged in the reaction tank 1;
the air distribution mechanism 5 for controlling the working sequence of the reaction auxiliary mechanism 4 is fixedly arranged inside the air guide main rod 2;
the inner part of the tank wall of the reaction tank 1 is provided with a diversion hole 6 for balancing the state balance of the waste gas and the absorbent around the reaction auxiliary mechanism 4.
The air guide main rod 2 and the air guide auxiliary rod 3 are the same, the air guide auxiliary rod 3 is arranged in a circumferential mode, and exhaust holes parallel to the horizontal plane are formed in the same direction of the side face of the air guide auxiliary rod 3.
Openings at two ends of the diversion hole 6 are respectively positioned above and below the reaction auxiliary mechanism 4, and the opening above the diversion hole 6 is submerged by the absorbent.
The reaction auxiliary mechanism 4 comprises a guide plate 41 fixedly connected to the inner wall of the reaction tank 1, the guide plate 41 is formed by splicing two funnel-shaped discs up and down, the surface of the lower guide plate 41 is provided with a ventilating and gathering port 42, the surface of the upper guide plate 41 is provided with a ventilating and scattering port 43, and a screen 44 is fixedly connected between the upper guide plate 41 and the lower guide plate 41.
The guide plate 41 is positioned above the air guide auxiliary rod 3, the guide plate 41 surrounds the outer side of the air guide main rod 2, the middle of the lower guide plate 41 is high, and the periphery of the lower guide plate 41 is low, and the middle of the upper guide plate 41 is low, and the periphery of the upper guide plate is high.
The air gathering port 42 is located at the center of the guide plate 41, the air diffusing ports 43 are dispersed around the guide plate 41, and the screen 44 is located between the air gathering port 42 and the air diffusing ports 43.
The air distributing mechanism 5 comprises an air guide groove 51 arranged in the air guide main rod 2, the bottom wall of the air guide groove 51 is fixedly connected with a central rod 52, the outer side of the central rod 52 is rotatably connected with a turntable 53, and the surface of the turntable 53 is provided with a sliding groove 54;
the air distribution mechanism 5 comprises a connecting hole 55 formed in the air guide main rod 2, a mounting frame 56 is fixedly connected to the inside of the connecting hole 55, a control rod 57 is slidably connected to the inside of the mounting frame 56, a blocking ball 58 is fixedly connected to one end of the control rod 57, a clamping groove 59 is formed in the other end of the control rod 57, and a sliding rod 510 penetrating through the sliding groove 54 is fixedly connected to the inside of the clamping groove 59.
A torsion spring is arranged between the central rod 52 and the rotating disc 53, the force required by the upper torsion spring is larger than the force required by the lower torsion spring, and the diameter of the rotating disc 53 is smaller than the inner diameter of the air guide groove 51.
The difference in the linear distance from the ends of the slide groove 54 to the center rod 52 is greater than half the diameter of the blocking ball 58.
The connecting hole 55 is communicated with the air guide groove 51 and the air guide auxiliary rod 3, the outer opening of the connecting hole 55 has the same shape as the plugging ball 58, and the diameter of the lower connecting hole 55 is larger than that of the upper connecting hole 55;
the connecting hole 55 is sealed by a sealing ball 58, and the control rod 57 is wrapped outside the rotary disc 53 through a clamping groove 59.
Open grooves communicated with the diversion holes 6 are formed in the upper side and the lower side of the upper guide plate 41 and the lower side in the reaction tank 1, the open groove between the same group of the upper guide plate 41 and the lower guide plate 41 is close to the lower guide plate 41, and the open groove between two groups of different guide plates 41 is close to the upper guide plate 41.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (10)
1. The utility model provides an acetic anhydride exhaust treatment device for organosilicon synthesis, includes retort (1), the inside interlude of retort (1) sets up air guide mobile jib (2), air guide auxiliary rod (3) are connected in the outside of air guide mobile jib (2), the blast pipe is connected in the outside of retort (1), air blowing device is connected to air guide mobile jib (2) top, pack absorbent, its characterized in that in retort (1): a reaction auxiliary mechanism (4) for prolonging the reaction time of the waste gas in the absorbent and increasing the contact area of the waste gas and the absorbent is arranged in the reaction tank (1);
The air distribution mechanism (5) for controlling the working sequence of the reaction auxiliary mechanism (4) is fixedly arranged inside the air guide main rod (2);
and a diversion hole (6) for balancing the state of the waste gas and the absorbent around the reaction auxiliary mechanism (4) is formed in the inner wall of the reaction tank (1).
2. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 1, characterized in that: the air guide main rod (2) is the same as the air guide auxiliary rod (3), the air guide auxiliary rod (3) is arranged in a circumferential manner, and exhaust holes parallel to the horizontal plane are formed in the same direction of the side surface of the air guide auxiliary rod (3);
openings at two ends of the diversion hole (6) are respectively positioned above and below the reaction auxiliary mechanism (4), and the opening above the diversion hole (6) is submerged by the absorbent.
3. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 2, wherein: the reaction auxiliary mechanism (4) comprises a guide plate (41) fixedly connected to the inner wall of the reaction tank (1), the guide plate (41) is formed by splicing two funnel-shaped discs up and down, a ventilating and gathering port (42) is formed in the surface of the guide plate (41) below, a ventilating and scattering port (43) is formed in the surface of the guide plate (41) above, and a screen (44) is fixedly connected between the upper guide plate and the lower guide plate (41).
4. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 3, wherein: the guide plate (41) is positioned above the air guide auxiliary rod (3), the guide plate (41) surrounds the outer side of the air guide main rod (2), the middle of the lower guide plate (41) is high, and the periphery of the lower guide plate is low, and the middle of the upper guide plate (41) is low and the periphery of the upper guide plate is high.
5. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 4, wherein: the air gathering port (42) is positioned at the center of the guide plate (41), the air diffusing ports (43) are dispersed around the guide plate (41), and the screen (44) is positioned between the air gathering port (42) and the air diffusing ports (43).
6. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 1, wherein: the air distribution mechanism (5) comprises an air guide groove (51) formed in the air guide main rod (2), the bottom wall of the air guide groove (51) is fixedly connected with a central rod (52), the outer side of the central rod (52) is rotatably connected with a turntable (53), and a sliding groove (54) is formed in the surface of the turntable (53);
divide gas mechanism (5) including seting up connecting hole (55) in air guide mobile jib (2) inside, inside fixed connection mounting bracket (56) of connecting hole (55), inside sliding connection control lever (57) of mounting bracket (56), one end fixed connection shutoff ball (58) of control lever (57), draw-in groove (59) are seted up to the other end of control lever (57), slide bar (510) of spout (54) are run through to the inside fixed connection of draw-in groove (59).
7. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 6, wherein: set up the torsional spring between well core rod (52) and carousel (53), and the power that needs when the torsional spring pulling of top is greater than the power that needs when the torsional spring pulling of below, the diameter of carousel (53) is less than the internal diameter of air guide groove (51).
8. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 6, wherein: the difference of the straight line distances from the two ends of the sliding groove (54) to the central rod (52) is larger than half of the diameter of the blocking ball (58).
9. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 6, wherein: the connecting hole (55) is communicated with the air guide groove (51) and the air guide auxiliary rod (3), the outer opening of the connecting hole (55) is the same as the shape of the blocking ball (58), and the diameter of the lower connecting hole (55) is larger than that of the upper connecting hole (55);
the connecting hole (55) is plugged by the plugging ball (58), and the control rod (57) is wrapped on the outer side of the rotary disc (53) through the clamping groove (59).
10. The acetic anhydride waste gas treatment device for organosilicon synthesis according to claim 3, wherein: open grooves which are the same as the flow guide holes (6) are formed in the upper side and the lower side of the reaction tank (1) and located on the upper guide plate (41) and the lower guide plate (41), the open grooves between the same group of upper guide plates and the same group of lower guide plates (41) are close to the lower guide plates (41), and the open grooves between the two groups of different guide plates (41) are close to the upper guide plates (41).
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