CN114537009B - Optical anti-counterfeiting transfer film and preparation method and application thereof - Google Patents
Optical anti-counterfeiting transfer film and preparation method and application thereof Download PDFInfo
- Publication number
- CN114537009B CN114537009B CN202011342913.3A CN202011342913A CN114537009B CN 114537009 B CN114537009 B CN 114537009B CN 202011342913 A CN202011342913 A CN 202011342913A CN 114537009 B CN114537009 B CN 114537009B
- Authority
- CN
- China
- Prior art keywords
- photoinitiator
- layer
- aqueous
- photo
- coating system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 105
- 238000012546 transfer Methods 0.000 title claims abstract description 94
- 238000002360 preparation method Methods 0.000 title abstract description 9
- 239000010410 layer Substances 0.000 claims description 237
- 238000000576 coating method Methods 0.000 claims description 148
- 239000011248 coating agent Substances 0.000 claims description 147
- 238000000016 photochemical curing Methods 0.000 claims description 101
- 238000003384 imaging method Methods 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 42
- 239000000178 monomer Substances 0.000 claims description 35
- 239000004831 Hot glue Substances 0.000 claims description 33
- 238000001035 drying Methods 0.000 claims description 33
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 31
- 239000004925 Acrylic resin Substances 0.000 claims description 30
- 239000003999 initiator Substances 0.000 claims description 27
- 229920000178 Acrylic resin Polymers 0.000 claims description 24
- -1 acrylic ester Chemical class 0.000 claims description 21
- 125000006850 spacer group Chemical group 0.000 claims description 21
- 239000012952 cationic photoinitiator Substances 0.000 claims description 18
- 238000003825 pressing Methods 0.000 claims description 17
- 229920005989 resin Polymers 0.000 claims description 17
- 239000011347 resin Substances 0.000 claims description 17
- 239000007787 solid Substances 0.000 claims description 16
- 239000003085 diluting agent Substances 0.000 claims description 14
- 238000007747 plating Methods 0.000 claims description 14
- 150000003254 radicals Chemical class 0.000 claims description 12
- 230000009477 glass transition Effects 0.000 claims description 10
- 239000012965 benzophenone Substances 0.000 claims description 9
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 8
- 239000012949 free radical photoinitiator Substances 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 claims description 7
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 6
- 229920001225 polyester resin Polymers 0.000 claims description 6
- 239000004645 polyester resin Substances 0.000 claims description 6
- 229920000570 polyether Polymers 0.000 claims description 6
- 229920005749 polyurethane resin Polymers 0.000 claims description 6
- 238000010790 dilution Methods 0.000 claims description 5
- 239000012895 dilution Substances 0.000 claims description 5
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 claims description 5
- 238000001723 curing Methods 0.000 claims description 4
- FAQJJMHZNSSFSM-UHFFFAOYSA-N phenylglyoxylic acid Chemical compound OC(=O)C(=O)C1=CC=CC=C1 FAQJJMHZNSSFSM-UHFFFAOYSA-N 0.000 claims description 4
- 229920000728 polyester Polymers 0.000 claims description 4
- 229920002635 polyurethane Polymers 0.000 claims description 4
- 239000004814 polyurethane Substances 0.000 claims description 4
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 claims description 4
- 239000000805 composite resin Substances 0.000 claims description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 3
- 229920005668 polycarbonate resin Polymers 0.000 claims description 3
- 239000004431 polycarbonate resin Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000000465 moulding Methods 0.000 abstract description 34
- 230000000694 effects Effects 0.000 abstract description 17
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 230000010076 replication Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 125000005396 acrylic acid ester group Chemical group 0.000 description 8
- 238000007723 die pressing method Methods 0.000 description 8
- 238000004049 embossing Methods 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 229920002799 BoPET Polymers 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 6
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 4
- 238000003848 UV Light-Curing Methods 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052733 gallium Inorganic materials 0.000 description 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 3
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 229940095102 methyl benzoate Drugs 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 2
- 230000003796 beauty Effects 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 239000011127 biaxially oriented polypropylene Substances 0.000 description 2
- 229920006378 biaxially oriented polypropylene Polymers 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 125000005520 diaryliodonium group Chemical group 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 2
- BFYJDHRWCNNYJQ-UHFFFAOYSA-N oxo-(3-oxo-3-phenylpropoxy)-(2,4,6-trimethylphenyl)phosphanium Chemical compound CC1=CC(C)=CC(C)=C1[P+](=O)OCCC(=O)C1=CC=CC=C1 BFYJDHRWCNNYJQ-UHFFFAOYSA-N 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- LAIJAUHBAWLPCO-UHFFFAOYSA-N (4-tert-butylcyclohexyl) prop-2-enoate Chemical compound CC(C)(C)C1CCC(OC(=O)C=C)CC1 LAIJAUHBAWLPCO-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- BCWCEHMHCDCJAD-UHFFFAOYSA-N 1,2-bis(4-methylphenyl)ethane-1,2-dione Chemical compound C1=CC(C)=CC=C1C(=O)C(=O)C1=CC=C(C)C=C1 BCWCEHMHCDCJAD-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- NTNLSICUQDSUMN-UHFFFAOYSA-N 2-(2-benzoylphenoxy)acetic acid Chemical compound OC(=O)COC1=CC=CC=C1C(=O)C1=CC=CC=C1 NTNLSICUQDSUMN-UHFFFAOYSA-N 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- XRMBQHTWUBGQDN-UHFFFAOYSA-N [2-[2,2-bis(prop-2-enoyloxymethyl)butoxymethyl]-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CC)COCC(CC)(COC(=O)C=C)COC(=O)C=C XRMBQHTWUBGQDN-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- ZHBRXKCMXCSQRJ-UHFFFAOYSA-N hexane-1,6-diol methyl prop-2-eneperoxoate Chemical compound C(C=C)(=O)OOC.C(CCCCCO)O ZHBRXKCMXCSQRJ-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- WZESLRDFSNLECD-UHFFFAOYSA-N phenyl prop-2-eneperoxoate Chemical class C=CC(=O)OOC1=CC=CC=C1 WZESLRDFSNLECD-UHFFFAOYSA-N 0.000 description 1
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000013035 waterborne resin Substances 0.000 description 1
- 229920006313 waterborne resin Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/14—Security printing
Landscapes
- Laminated Bodies (AREA)
Abstract
The invention relates to the field of optical anti-counterfeiting, and discloses an optical anti-counterfeiting transfer film, a preparation method and application thereof. The optical anti-counterfeiting transfer film solves the problem of sticking during UV molding of the fine microstructure, can be suitable for UV molding of various types of fine microstructures, meets the wide adaptability of UV molding to the fine microstructure, ensures the subsequent thermoprinting transfer, and is beneficial to improving the optical anti-counterfeiting effect in the fields of bank notes and cards.
Description
Technical Field
The invention relates to the field of optical anti-counterfeiting, in particular to an optical anti-counterfeiting transfer film, a preparation method and application thereof.
Background
The optical anti-counterfeiting transfer film is widely applied to the anti-counterfeiting fields of bank notes, high-end card (such as Unionpay card) and the like, and the optical anti-counterfeiting structure is generally transferred to the surfaces of target substrates such as bank cards, banknote paper and the like in a hot stamping and thermal transfer mode. Currently, as disclosed in CN203937262a, regardless of the implementation of the special purpose functional layer, the general structure of the anti-counterfeiting heat transfer film used in the packaging field is generally: PET film, release layer, hot molding layer or printing ink layer, cladding material and hot melt adhesive layer.
However, in the fields of high-end cards and banknote security, the imaging layer of the optical security transfer film is very difficult to process, and the fine optical security transfer film such as the micro-mirror disclosed in CN105313529A, the micro-lenses disclosed in CN1552589A and US 489236, the mirror disclosed in CN103832114A, the blazed grating disclosed in CN103847289A, the sub-wavelength relief structure disclosed in CN103448411A, CN104385800 and CN102514443a, the surface relief structure disclosed in CN103576216A, CN102903298A, the diffraction microstructure disclosed in CN104249584A and the like are more complex in the replication structure, the requirement on replication fineness is high, the replication depth-to-width ratio is large, and a method needs to be found to meet the replication requirements of all different types of microstructures. Thermal molding, however, cannot satisfy the duplication of the above-described structure because of the limitation of duplication depth and duplication loss.
For this reason, CN102344704a implements the processing of the above-mentioned fine security structure by means of UV molding. However, the prior art is mainly applied to non-transfer film products, and can face extremely troublesome difficulties in preparing anti-counterfeiting transfer films. The fine microstructure needs to have good adhesion with a substrate during UV (ultraviolet) molding so as to meet the requirement of molding replication and transfer.
However, the release layer of the current anti-counterfeiting heat transfer film does not provide good adhesion during UV molding. Therefore, the peeling value of the typical hot stamping film is very low, so that the bonding force between the cured UV coating and the template is often large during UV molding, the problem of sticking the template exists, and the UV molding process cannot be successfully completed on the release film.
CN105313516A adopts a release layer with a softening point of 95-120 ℃, the bonding force between the release layer and the UV molding layer is large when the temperature is less than 95 ℃, and the release layer and the UV molding layer are easy to peel when the hot stamping temperature is greater than 120 ℃. However, this method is primarily directed to cat eye films for use in packaging applications. In the fields of cards and bank notes, the fine anti-counterfeiting microstructure is more complex in variety, large in copying depth-to-width ratio and high in copying precision requirement, and is difficult to copy, so that better adhesion fastness is required during UV copying, and the scheme of CN105313516A cannot meet the UV molding requirement of the fine structure. Meanwhile, in the field of cards and banknotes, the thermoprinting base materials are of heat-sensitive type, such as paper, BOPP, PVC and the like, lower thermoprinting temperature is required, when the thermoprinting temperature is lower than 120 ℃, the scheme of CN105313516A is difficult to completely strip, and the thermoprinting stripping is incomplete, so that the method cannot be applied to the fields of cards and banknotes.
Therefore, there is a need to develop anti-counterfeit transfer film products that can meet the needs of the field of identification cards and banknotes.
Disclosure of Invention
The invention aims to overcome the defect that an optical anti-counterfeiting transfer film is easy to adhere when being used for UV mould pressing copying in the anti-counterfeiting of the fields of bank notes and high-end cards in the prior art, and is incomplete in thermoprinting stripping during subsequent thermoprinting transfer, and provides an optical anti-counterfeiting transfer film, a preparation method and application thereof.
In order to achieve the above object, according to a first aspect of the present invention, there is provided an optical anti-counterfeiting transfer film, which includes a substrate layer, and a release layer, an imaging layer, a plating layer, and a hot melt adhesive layer sequentially stacked on the substrate layer, wherein the imaging layer contains an anti-counterfeiting pattern having an optical anti-counterfeiting structure;
the stripping layer is a coating formed by sequentially drying and first photocuring a first photocuring coating system, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375nm;
the imaging layer is a coating formed by sequentially carrying out UV mould pressing and second photo-curing on a second photo-curing coating system, wherein the second photo-curing coating system contains acrylate oligomer, acrylate diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator comprises 375nm-425nm;
And, the first photo-curing is performed after the second photo-curing.
In a second aspect, the present invention provides a method of preparing an optical anti-counterfeit transfer film, the method comprising:
(1) First applying a first photo-curable coating system to a substrate, followed by a first drying to form a variable layer on the substrate; the first photo-curing coating system comprises a first photoinitiator and an acrylic resin, wherein the photoinitiation wavelength of the first photoinitiator is less than 375nm;
and optionally, second covering the aqueous coating system on the variable layer, followed by second drying to form a spacer layer on the variable layer;
(2) Performing third coverage on the variable layer or the spacing layer by a second photo-curing coating system, and then sequentially performing UV (ultraviolet) mould pressing and second photo-curing to form an imaging layer on the variable layer or the spacing layer, wherein the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure obtained by the UV mould pressing; the second light-cured coating system comprises an acrylic acid ester oligomer, an acrylic acid ester diluent monomer and a second light initiator, wherein the photoinitiation wavelength of the second light initiator comprises 375nm-425nm, the second light curing is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(3) Evaporating the imaging layer to form a plating layer;
(4) Performing fourth covering on the hot melt adhesive on the coating to form a hot melt adhesive layer;
the method further comprises the steps of: subjecting the variable layer to a first photo-curing to form a release layer, the first photo-curing being performed after step (2), step (3) or step (4), the first photo-curing being performed under first light source irradiation conditions, the first light source emitting light having a wavelength of less than 375 nm.
In a third aspect, the present invention provides an optical anti-counterfeit transfer film prepared by the method of the second aspect.
A fourth aspect of the present invention provides the use of the optical anti-counterfeiting transfer film according to the first or third aspect in the field of optical anti-counterfeiting.
Compared with the prior art, the invention has at least the following advantages:
the method solves the problem of easy sticking during UV molding of the fine microstructure, can be suitable for UV molding of various types of fine microstructures, and meets the wide adaptability of UV molding to the fine microstructure; in addition, the optical anti-counterfeiting transfer film solves the problem that the existing optical anti-counterfeiting transfer film is incomplete in thermoprint stripping during thermoprint transfer, improves the optical anti-counterfeiting effect in the fields of bank notes and cards, and has wide application prospects.
Additional features and advantages of the invention will be set forth in the detailed description which follows.
Drawings
FIG. 1 is a schematic structural diagram of an optical anti-counterfeiting transfer film L1 prepared in example 1;
fig. 2 is a schematic structural diagram of an optical anti-counterfeiting transfer film L2 prepared in embodiment 2.
Description of the reference numerals
1. Substrate layer 2, release layer 3, imaging layer
4. Coating 5, hot melt adhesive layer 6 and spacer layer
Detailed Description
The following describes specific embodiments of the present invention in detail with reference to the drawings. It should be understood that the detailed description and specific examples, while indicating and illustrating the invention, are not intended to limit the invention.
As described above, the first aspect of the present invention provides an optical anti-counterfeiting transfer film, which includes a substrate layer, and a release layer, an imaging layer, a plating layer, and a hot melt adhesive layer sequentially stacked on the substrate layer, where the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure;
the stripping layer is a coating formed by sequentially drying and first photocuring a first photocuring coating system, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375nm;
The imaging layer is a coating formed by sequentially carrying out UV mould pressing and second photo-curing on a second photo-curing coating system, wherein the second photo-curing coating system contains acrylate oligomer, acrylate diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator comprises 375nm-425nm;
and, the first photo-curing is performed after the second photo-curing.
The invention is not particularly limited in the specific type of the anti-counterfeiting pattern with the optical anti-counterfeiting structure, and can be various fine optical anti-counterfeiting microstructures in the prior art, particularly used in the anti-counterfeiting field of banknotes and high-end cards, for example, the anti-counterfeiting pattern with the three-dimensional relief effect in CN103576216A, and the anti-counterfeiting pattern with the fine dynamic effect in CN 103832114A.
In the present invention, the photoinitiation wavelength of the first photoinitiator is less than 375nm, which means that the first photoinitiator can be initiated by light having a wavelength less than 375 nm; the photoinitiation wavelength of the second photoinitiator comprises 375nm to 425nm, meaning that the second photoinitiator is capable of being initiated by light having a wavelength of 375nm to 425 nm.
Preferred embodiments of the release layer are described below.
Preferably, the first photoinitiator is selected from at least one of a first radical photoinitiator and a first cationic photoinitiator.
According to the present invention, preferably, the first radical photoinitiator is at least one selected from α -hydroxy ketone photoinitiators, benzoyl formate photoinitiators, and benzophenone photoinitiators. The alpha-hydroxy ketone photoinitiator is, for example, 2-hydroxy-2-methyl-1-phenyl acetone, 1-hydroxycyclohexyl-phenyl ketone; the methyl benzoate photoinitiator is, for example, methyl benzoate MBF; the benzophenone photoinitiator is, for example, benzophenone and its derivatives.
Preferably, the first cationic initiator is selected from at least one of an arylferrites, sulfonium salts, iodonium salts, more preferably at least one of iodonium salts, sulfonium salts. The iodonium salts are, for example, diaryliodonium salts; the sulfonium salts are, for example, triarylsulfonium salts.
According to a preferred embodiment of the present invention, the first photoinitiator is a first radical photoinitiator.
More preferably, the first photoinitiator is selected from at least one of alpha-hydroxy ketone photoinitiators, benzoyl formate photoinitiators and benzophenone photoinitiators.
Still more preferably, the first photoinitiator is selected from at least one of 2-hydroxy-2-methyl-1-phenylpropion 1173, 1-hydroxycyclohexyl-phenyl ketone 184, benzophenone BP, methyl benzoate MBF, 4-p-toluenesulfo-benzophenone BMS, polytetramethylene glycol 250-bis- (2-carboxymethoxy benzophenone).
Preferably, the glass transition temperature of the acrylic resin is higher than 30 ℃.
Preferably, the adhesion fastness of the acrylate resin coated on the PET substrate is not lower than 4B grade.
In the invention, the attachment fastness is measured by referring to an ASTMD3359 attachment fastness measurement standard, and the rating is from 0B to 5B, wherein 5B is the best; 0B is worst.
According to the present invention, the acrylate resin is present in the form of an aqueous acrylic resin such as Zhanxin 7230, 7718, 7210, 2384, 7655, etc., as well as solvent acrylic acid, such as Jie Zhida UV-370, UV-372, etc.; the solvent type acrylic resin is, for example, JS-113, JS-116, JS-126, etc. of Jiesda.
Preferably, the solids content of the first photocurable coating system is in the range of 5-55 wt-%. According to the present invention, the solid content of the first photocurable coating system refers to the total content of the acrylic resin and the first photoinitiator contained in the first photocurable coating system. According to the invention, the solids content of the first photocurable coating system can be adjusted by means of water or a solvent for the solvent-borne acrylic acid. The solvent type of the solvent-based acrylic resin is not particularly limited, and solvents used for the solvent-based acrylic resin in the prior art may be, for example, ketone, ester, alcohol solvents, etc.
Preferably, the first photoinitiator is present in an amount of 1 to 6 weight percent and the acrylic resin is present in an amount of 94 to 99 weight percent based on the dry weight of the first photocurable coating system, the dry weight being the total weight of the first photoinitiator and the acrylic resin contained in the first photocurable coating system.
According to the present invention, the first light curing is performed under first light source irradiation conditions, the first light source emits light having a wavelength less than 375nm, including but not limited to conventional UV light sources and UV-LED light sources including emission wavelength 365 nm. The conventional UV light source is an existing polar lamp and/or electrodeless lamp which are used in the UV curing field and have an emission wavelength less than 375nm, wherein the polar lamp comprises a mercury lamp, an iron lamp and a gallium lamp; the electrodeless lamp comprises a D lamp, an H lamp and a V lamp.
Preferred embodiments of the imaging layer are described below.
Preferably, the second photoinitiator is at least one selected from a sensitizer-second cationic photoinitiator composite initiator, a second free radical photoinitiator-second cationic photoinitiator composite system, a second cationic photoinitiator and a second free radical photoinitiator.
According to the invention, the second cationic photoinitiator is preferably an arylferrocenium salt photoinitiator.
According to the present invention, the second radical photoinitiator is preferably at least one selected from benzoin-based photoinitiators, benzil-based photoinitiators, acetophenone-based photoinitiators, alpha-aminoketone-based photoinitiators, acylphosphine oxide-based photoinitiators, thioxanthone-based photoinitiators, anthraquinone-based photoinitiators.
According to the invention, the benzoin photoinitiators, such as benzophenone and derivatives; such as dimethyl benzil ketal; acetophenone photoinitiators such as diethoxyacetophenone; such as 2-methyl-1- (4-methylthiophenyl) -2-morpholin-1-one; acyl phosphine oxides photoinitiators such as 2,4, 6-trimethylbenzoyl-ethoxy-phenyl phosphine oxide, 2,4, 6-trimethylbenzoyl-diphenyl phosphine oxide, bis (2, 4, 6-trimethylbenzoyl) phenyl phosphine oxide; such as 2-isopropylthioxanthone, 4-diethylthioxanthone; such as 2-ethyl anthraquinone and the like.
According to the invention, in the second free radical photoinitiator-second cationic photoinitiator complex system, the second free radical photoinitiator is capable of sensitizing the second cationic photoinitiator such that the second cationic photoinitiator is capable of being initiated over a greater spectral range. For example, sensitization of thioxanthone photoinitiators (second radical photoinitiators) to diaryliodonium salts (second cationic photoinitiators) allows themselves to obtain photoinitiating properties of long wavelength, e.g. 405nm, from short wavelength initiated iodonium salts.
According to the invention, in the sensitizer-second cationic photoinitiator composite system, the sensitizer can sensitize the second cationic initiator to realize long-wavelength initiation of the second cationic initiator. The sensitizer is preferably at least one of coumarin-based sensitizers.
According to a preferred embodiment of the present invention, the second photoinitiator is a second radical photoinitiator.
More preferably, the second photoinitiator is selected from at least one of an alpha-aminoketone photoinitiator, an acylphosphine oxide-based initiator, and a thioxanthone-based photoinitiator.
Still more preferably, the second photoinitiator is selected from at least one of 2-methyl 1- (4-methylthiophenyl) -2-morpholin-1-one, 2,4, 6-trimethylbenzoyl-ethoxy-phenylphosphine oxide, 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide, bis (2, 4, 6-trimethylbenzoyl) phenylphosphine oxide, 2-isopropylthioxanthone and 4-diethylthioxanthone.
According to the invention, the absorption spectra of the first photoinitiator and the second photoinitiator are disclosed by standard textbooks and handbooks, and can be obtained from photopolymerization technology and application and photocuring material performance and application handbook published by chemical industry publishers.
According to the invention, the second photo-curing is performed under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425nm, such as ultraviolet light with the wavelength of 375nm-405 nm. The second light source includes, but is not limited to, conventional UV light sources with added filters, and UV-LED light sources including 385nm, 395nm, 405 nm. The conventional UV light source refers to an existing polar lamp and an existing electrodeless lamp in the field of UV curing, wherein the polar lamp comprises a mercury lamp, an iron lamp and a gallium lamp; the electrodeless lamp comprises a D lamp, an H lamp and a V lamp.
The time, light intensity, etc. of the first and second photocuring are not particularly limited in the present invention, as long as the respective coatings can be completely crosslinked and cured.
According to the present invention, it is preferable that the pencil hardness after photocuring of the acrylate oligomer is not higher than 2H.
Preferably, the acrylate oligomer is selected from at least one of epoxy acrylate, polyester acrylate, and urethane acrylate.
According to the invention, the epoxy acrylates are such as Zhanxin EB3700, EB3708, EB3710, EB3720; UVE-151 of saridoma, and the like.
According to the present invention, the polyester acrylates such as PS1000, PS420, PS460, PS2500, PS2522, etc. of beauty sources; CN2203, CN2283, CN3108, CN704, CN736, CN738, etc. for saridoma; new EB80, EB84, EB525, EB546, EB505, EB586, etc.
According to the present invention, the urethane acrylate such as CN8003, CN890, CN8000, CN8001, CN968, etc. of sandomax; new EB210, EB230, EB285, EB8808, EB8402, etc.; PU210, PU2064, PU3603, PU3702, UA5216, SC2404, etc. of the beauty source; polyurethane acrylates 6150-100 from Changxing company, and the like.
Preferably, the acrylate dilution monomer is selected from at least one of acrylate monomers having a functionality of 1-6.
More preferably, the acrylate diluent monomer is selected from at least one of 1, 6-hexanediol diacrylate monomer (HDDA), 1, 6-hexanediol methoxy monoacrylate monomer (EOTMPTA), neopentyl glycol diacrylate monomer (NPGDA), propoxylated neopentyl glycol diacrylate monomer (PONPGDA), tripropylene glycol diacrylate monomer (TPGDA), dipropylene glycol diacrylate monomer (DPGDA), 2-phenoxyethyl acrylate monomer (PHEA), ethoxylated phenoxy acrylate monomer (PH 3 EOA), tetrahydrofurfuryl acrylate monomer (THFA), isobornyl acrylate monomer (IBOA), benzyl acrylate monomer (BA), 4-t-butylcyclohexyl acrylate monomer (TBCHA), trimethylolpropane triacrylate (TMPTA), ethoxylated trimethylolpropane triacrylate (EOTMPTA), propoxylated trimethylolpropane triacrylate (pots pta), pentaerythritol triacrylate (PET 3A), pentaerythritol tetraacrylate (PET 4A), di (trimethylolpropane) tetraacrylate, dipentaerythritol hexaacrylate (DPHA), caprolactone-modified dipentaerythritol hexaacrylate.
Preferably, the acrylate oligomer is present in an amount of 25 to 65 wt%, the acrylate diluent monomer is present in an amount of 30 to 70 wt% and the second photoinitiator is present in an amount of 1 to 6 wt%, based on the total weight of the second photocurable coating system.
According to a preferred embodiment of the invention, a spacer layer is further provided between the imaging layer and the release layer, the spacer layer being a coating formed by drying an aqueous coating system. The inventors have surprisingly found that by providing said spacer layer, the resulting optical security transfer film is more advantageous for UV embossing and subsequent thermoprinting transfer of fine optical security microstructures.
Preferably, the solids content of the aqueous coating system, which means the content of the resin contained in the aqueous coating system, is from 5 to 55% by weight.
Preferably, the aqueous resin in the aqueous coating system is at least one selected from the group consisting of aqueous polyether resin-aqueous polyester resin composite resin, aqueous polycarbonate resin, aqueous polyether resin, aqueous polyester resin, aqueous acrylic resin, aqueous polyurethane resin, and aqueous polyvinyl butyral resin. For example, the aqueous polyurethane resin water-WG-204 from DIC company.
Preferably, the glass transition temperature of the resin in the aqueous coating system is higher than 30 ℃.
According to the invention, the aqueous coating system may also contain various additives conventionally used in the art, such as water, co-solvents and auxiliaries, in such amounts that the solids content of the aqueous coating system is from 5 to 55% by weight.
In order to obtain an optical anti-counterfeiting transfer film with better performance, the average thickness of the spacer layer is preferably 100nm-3 μm, and more preferably, the average thickness of the spacer layer is 50nm-3 μm.
Preferably, the average thickness of the substrate layer is 12 μm to 30 μm.
Preferably, the average thickness of the release layer is 100nm to 3 μm.
Preferably, the imaging layer has an average thickness of 1 μm to 20 μm.
Preferably, the average thickness of the coating is 3nm to 3 μm.
Preferably, the hot melt adhesive layer has an average thickness of 2 μm to 10 μm.
Preferably, the base material layer contains at least one selected from polyethylene terephthalate, polypropylene, and polyamide, and more preferably polyethylene terephthalate (PET film).
Preferably, the coating is a metallic aluminium coating and/or an interference coating, wherein the interference coating may be, for example, a multilayer interference coating as disclosed in US4779898A, CN102501500A, CN11001234 a.
The composition of the hot melt adhesive layer is not particularly limited, and the hot melt adhesive material can be a hot melt adhesive material which can realize the bonding and transferring of heat-sensitive substrates such as cards and bank notes in the field through hot stamping in the prior art.
The optical anti-counterfeiting transfer film according to the present invention is further described below with reference to fig. 1 and 2.
According to a preferred embodiment of the invention, the optical anti-counterfeiting transfer film comprises a substrate layer 1, and a stripping layer 2, an imaging layer 3, a plating layer 4 and a hot melt adhesive layer 5 which are sequentially overlapped on the substrate layer 1, wherein the imaging layer 3 contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure;
the stripping layer 2 is a coating formed by sequentially drying and first photocuring a first photocuring coating system, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375nm;
the imaging layer 3 is a coating formed by sequentially carrying out UV mould pressing and second photo-curing on a second photo-curing coating system, wherein the second photo-curing coating system contains an acrylic ester oligomer, an acrylic ester diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator comprises 375nm-425nm; the first photo-curing is performed after the second photo-curing.
According to another preferred embodiment of the invention, the optical anti-counterfeiting transfer film comprises a substrate layer 1, and a stripping layer 2, an imaging layer 3, a plating layer 4, a hot melt adhesive layer 5 and a spacing layer 6 which are sequentially overlapped on the substrate layer 1, wherein the spacing layer 6 is arranged between the imaging layer 3 and the stripping layer 2, and the imaging layer 3 contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure;
the stripping layer 2 is a coating formed by sequentially drying and first photocuring a first photocuring coating system, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375nm;
the imaging layer 3 is a coating formed by sequentially carrying out UV mould pressing and second photo-curing on a second photo-curing coating system, wherein the second photo-curing coating system contains an acrylic ester oligomer, an acrylic ester diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator comprises 375nm-425nm; the spacer layer 6 is a coating formed by drying an aqueous coating system; the first photo-curing is performed after the second photo-curing.
The optical anti-counterfeiting transfer film solves the problem of sticking during UV molding of a fine microstructure, can be suitable for UV molding of various types of fine microstructures, and meets the wide adaptability of UV molding to the fine microstructure.
Meanwhile, the optical anti-counterfeiting transfer film provided by the invention has the advantages that the UV light source reaction which is matched with the first photoinitiator and contains the emission wavelength less than 375nm is adopted, the variable layer which has the bonding effect during UV mould pressing is converted into the stripping layer which is easy to strip by utilizing the crosslinking reaction, and the thermoprinting stripping is complete during the subsequent thermoprinting transfer, so that the thermoprinting transfer of the thermally sensitive substrate in the anti-counterfeiting field of the bank note and the card can be satisfied, and the optical anti-counterfeiting effect in the field of the bank note and the card can be promoted.
As previously described, a second aspect of the present invention provides a method of preparing an optical anti-counterfeit transfer film, the method comprising:
(1) First applying a first photo-curable coating system to a substrate, followed by a first drying to form a variable layer on the substrate; the first photo-curing coating system comprises a first photoinitiator and an acrylic resin, wherein the photoinitiation wavelength of the first photoinitiator is less than 375nm;
and optionally, second covering the aqueous coating system on the variable layer, followed by second drying to form a spacer layer on the variable layer;
(2) Performing third coverage on the variable layer or the spacing layer by a second photo-curing coating system, and then sequentially performing UV (ultraviolet) mould pressing and second photo-curing to form an imaging layer on the variable layer or the spacing layer, wherein the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure obtained by the UV mould pressing; the second light-cured coating system comprises an acrylic acid ester oligomer, an acrylic acid ester diluent monomer and a second light initiator, wherein the photoinitiation wavelength of the second light initiator comprises 375nm-425nm, the second light curing is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(3) Evaporating the imaging layer to form a plating layer;
(4) Performing fourth covering on the hot melt adhesive on the coating to form a hot melt adhesive layer;
the method further comprises the steps of: subjecting the variable layer to a first photo-curing to form a release layer, the first photo-curing being performed after step (2), step (3) or step (4), the first photo-curing being performed under first light source irradiation conditions, the first light source emitting light having a wavelength of less than 375 nm.
Preferably, the first photo-curing is performed after the step (4).
In the method according to the second aspect of the present invention, the properties such as composition, solid content, optional component types, etc. of the first photo-curing coating system, the second photo-curing coating system and the aqueous coating system are the same as those of the first aspect, and the properties such as optional types of the first photo-initiator and the second photo-initiator are the same as those of the first photo-initiator and the second photo-initiator according to the first aspect, and the present invention is not repeated herein, and the person skilled in the art should not understand the limitation of the present invention.
According to the method of the second aspect of the present invention, the amounts of the first photo-curable coating system, the second photo-curable coating system and the aqueous coating system are such that a variable layer, an imaging layer and a spacer layer of a specific thickness are obtained, respectively.
According to the method of the second aspect of the invention, the substrate preferably has an average thickness of from 10 μm to 30 μm.
According to the method of the second aspect of the invention, the variable layer preferably has an average thickness of 100nm to 3um.
According to the method of the second aspect of the present invention, preferably, the average thickness of the peeling layer is 100nm to 3 μm.
According to the method of the second aspect of the present invention, preferably, the imaging layer has an average thickness of 1 μm to 20 μm.
According to the method of the second aspect of the invention, the spacer layer preferably has an average thickness of 100nm-3 μm, more preferably 50nm-3 μm.
According to the method of the second aspect of the present invention, preferably, the average thickness of the plating layer is 3nm to 3 μm.
According to the method of the second aspect of the present invention, preferably, the hot melt adhesive layer has an average thickness of 2 μm to 10 μm.
Preferably, in step (1), the first drying conditions include: the temperature is 60-200 ℃.
Preferably, in step (1), the second drying conditions include: the temperature is 60-200 ℃.
According to a preferred embodiment of the invention, the first drying and the second drying are carried out by means of drying in a drying tunnel. The invention has no special limitation on the drying speed of the drying tunnel, and can be reasonably adjusted according to actual needs.
According to the invention, the imaging layer is provided with an anti-counterfeiting image with an optical anti-counterfeiting structure by UV (ultraviolet) mould pressing. The UV embossing process includes laminating an embossing plate, embossing such that an optically anti-counterfeiting pattern is formed in the imaging layer, and the specific operation of the UV embossing process according to the present invention may be performed using the existing UV embossing process in the art, such as the operation disclosed in CN104312414a, and preferably, in step (2), the UV embossing conditions include: the temperature is 0-100 ℃.
According to the present invention, the conditions and equipment for performing the vapor deposition are not particularly limited, and the vapor deposition can be performed using conditions and equipment for performing the vapor deposition of a plating layer existing in the art.
According to the present invention, in the step (4), the present invention is not particularly limited with respect to the operation conditions and equipment for applying the hot melt adhesive, and may be carried out using the operation and equipment for applying the hot melt adhesive existing in the art. Preferably, in step (4), the conditions for the fourth coverage include: the temperature is 60-200 ℃. The composition of the hot melt adhesive layer is not particularly limited, and the hot melt adhesive material can be a hot melt adhesive material which can realize the bonding and transferring of heat-sensitive substrates in the fields of cards and banknotes by hot stamping in the prior art.
Preferably, the first cover, the second cover, the third cover, and the fourth cover are each independently selected from at least one of coating, printing, and more preferably coating.
The present invention is not particularly limited to a device for performing the first, second, third and fourth covers, and may be performed using a coater that is currently used in the art, for example.
According to the method of the second aspect of the invention, the first photo-curing is performed under the irradiation condition of a first light source, and the first light source emits light with the wavelength smaller than 375nm, and the first light source comprises, but is not limited to, a conventional UV light source and a UV-LED light source comprising an emission wavelength of 365 nm. The conventional UV light source is an existing polar lamp and/or electrodeless lamp which are used in the UV curing field and have an emission wavelength less than 375nm, wherein the polar lamp comprises a mercury lamp, an iron lamp and a gallium lamp; the electrodeless lamp comprises a D lamp, an H lamp and a V lamp.
According to the method of the second aspect of the present invention, the second photo-curing is performed under the irradiation condition of a second light source, and the second light source emits light with a wavelength of 375nm-425nm, such as ultraviolet light with a wavelength of 375nm-405 nm. The second light source includes, but is not limited to, conventional UV light sources with added filters, and UV-LED light sources including 385nm, 395nm, 405 nm. The conventional UV light source refers to an existing polar lamp and an existing electrodeless lamp in the field of UV curing, wherein the polar lamp comprises a mercury lamp, an iron lamp and a gallium lamp; the electrodeless lamp comprises a D lamp, an H lamp and a V lamp.
The irradiation direction of the first and second photocuring is not particularly limited, and irradiation may be performed in a direction perpendicular to the substrate or from both sides of the substrate.
According to the method of the second aspect of the invention, two preferred embodiments are provided below.
Embodiment 1:
the method comprises the following steps:
(1) First applying a first photo-curable coating system to a substrate, followed by a first drying to form a variable layer on the substrate; the first photo-curing coating system comprises a first photoinitiator and an acrylic resin, wherein the photoinitiation wavelength of the first photoinitiator is less than 375nm;
(2) Performing a third overlay of a second photocurable coating system on the variable layer, then performing UV embossing and a second photocuring under a second light source irradiation condition, and forming an imaging layer on the variable layer; the second photo-curing coating system comprises an acrylic acid ester oligomer, an acrylic acid ester diluent monomer and a second photo-initiator, wherein the photo-initiation wavelength of the second photo-initiator comprises 375nm-425nm, the imaging layer comprises an anti-counterfeiting pattern with an optical anti-counterfeiting structure obtained through UV (ultraviolet) compression molding, the second photo-curing is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(3) Evaporating the imaging layer to form a plating layer;
(4) Performing fourth covering on the coating by using the hot melt adhesive, and forming a hot melt adhesive layer on the coating;
the method further comprises the steps of: subjecting the variable layer to a first photo-curing under first light source irradiation conditions to form a release layer, wherein the first photo-curing is performed after the step (2), the step (3) or the step (4), the first photo-curing is performed under first light source irradiation conditions, and the first light source emits light with a wavelength less than 375 nm;
preferably, the first photo-curing is performed after the step (4).
Embodiment 2:
the method comprises the following steps:
(1) First applying a first photo-curable coating system to a substrate, followed by a first drying to form a variable layer on the substrate; the first photo-curing coating system comprises a first photo-initiator and acrylic resin, wherein the acrylic resin is aqueous acrylic resin or solvent acrylic resin, and the first photo-initiator absorbs ultraviolet light with the wavelength less than 375 nm;
(2) Second covering the aqueous coating system on the variable layer, and then second drying to form a spacer layer on the release layer;
(3) Performing third coverage on the spacer layer by a second photo-curing coating system, and then performing UV (ultraviolet) mould pressing and second photo-curing under the irradiation condition of a second light source to form an imaging layer on the spacer layer; the second photo-curing coating system comprises an acrylic acid ester oligomer, an acrylic acid ester diluent monomer and a second photo-initiator, wherein the photo-initiation wavelength of the second photo-initiator comprises 375nm-425nm, the imaging layer comprises a counterfeiting pattern with an optical counterfeiting structure obtained by the die pressing, the second photo-curing is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(4) Evaporating the imaging layer to form a plating layer;
(5) Performing fourth covering on the coating by using the hot melt adhesive, and forming a hot melt adhesive layer on the coating;
the method further comprises the steps of: and (3) performing a first photo-curing of the variable layer under a first light source irradiation condition to form a stripping layer, wherein the first photo-curing is performed after the step (2), the step (3) or the step (4), the first photo-curing is performed under the first light source irradiation condition, and the first light source emits light with the wavelength less than 375 nm.
Preferably, the first photo-curing is performed after the step (4).
According to the method provided by the invention, the stripping layer is introduced into the production process of the optical anti-counterfeiting transfer film, the photo-crosslinking reaction is utilized to convert the variable layer with the bonding effect into the stripping layer easy to strip, so that the problem of sticking during UV (ultraviolet) die pressing of the fine microstructure is solved, the method can be suitable for UV die pressing of various types of fine microstructures, the wide adaptability of UV die pressing to the fine microstructure is met, the subsequent thermoprinting transfer is ensured, and the optical anti-counterfeiting effect in the fields of bank notes and cards is facilitated to be improved.
As previously described, a third aspect of the present invention provides an optical anti-counterfeit transfer film prepared by the method of the second aspect.
The optical anti-counterfeiting transfer film prepared by the method has the same advantages as the optical anti-counterfeiting transfer film in the first aspect, solves the problem of sticking during UV molding of the fine microstructure, can be suitable for UV molding of various types of fine microstructures, and meets the wide adaptability of UV molding to the fine microstructure. Meanwhile, when the subsequent thermoprint transfer is performed, the thermoprint stripping is complete, the thermoprint transfer of the heat-sensitive base material in the anti-counterfeiting field of the bank note and the card is satisfied, and the optical anti-counterfeiting effect in the field of the bank note and the card is facilitated to be improved.
As described above, the fourth aspect of the present invention provides the use of the optical anti-counterfeiting transfer film according to the first or third aspect in the optical anti-counterfeiting field.
Preferably, the application is the application of the optical anti-counterfeiting transfer film in the transfer type optical anti-counterfeiting field, and particularly preferably, the application is the application of the optical anti-counterfeiting transfer film in high-end identification cards such as bank notes, bank cards, passports and the like.
The invention will be described in detail below by way of examples.
In the examples below, the raw materials are all commercially available unless otherwise specified.
Example 1
This example is illustrative of the preparation of the optical anti-counterfeit transfer film of the present invention.
The specific components used in this example are as follows:
the substrate is a PET substrate with an average thickness of 10 μm;
first photo-curable coating System (photo-curable coating for release layer, solid content 20% by weight)
A first photoinitiator: 2-hydroxy-2-methyl-1-phenylpropion 1173 produced by IGM corporation;
aqueous acrylic resin: brand 7230 (20% by weight solids, balance water, glass transition temperature Tg of the resin 65 ℃, adhesion to PET substrate 4B grade);
The first photoinitiator is present in an amount of 1% by weight based on the dry weight of the first photocurable coating system.
Second photo-curable coating system (photo-curable coating of imaging layer)
A second photoinitiator: 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide TPO produced by IGM;
acrylate oligomer: epoxy acrylate EB3700 (pencil hardness H) of the new company;
acrylate dilution monomer: 1, 6-hexanediol diacrylate HDDA from BASF;
in the second photo-curing coating system, the content weight ratio of the second photoinitiator to the acrylate oligomer to the acrylate diluent monomer is 3:27:70;
the preparation process comprises the following steps:
(1) Coating the first photo-curing coating system on a PET film by using a coating machine in full plate, and then drying at 150 ℃ at a speed of 200m/min through a drying channel to form a variable layer on the PET film, wherein the average thickness of the variable layer is 100nm;
(2) Coating a second photo-curing coating system on the variable layer, attaching a die pressing plate by using a UV die pressing machine, performing UV die pressing at 50 ℃, and performing second photo-curing to obtain an imaging layer containing UV die pressing patterns (anti-counterfeiting patterns with optical anti-counterfeiting effects), wherein the second photo-curing adopts a 405nm UV-LED;
(3) Evaporating aluminum of a metal reflecting layer on the UV mould pressing layer by using a vacuum coating machine to form a coating;
(4) Coating hot melt adhesive on the metal coating by using a coating machine, wherein the coating temperature is 150 ℃, and forming a hot melt adhesive layer to obtain rewinding;
(5) Using a winding device with a UV light source, rewinding by irradiation of mercury lamp (emitting UV light with emission wavelength less than 375 nm), and performing first photo-curing on the variable layer to form a stripping layer, so as to obtain the transfer film L1 with optical anti-counterfeiting effect.
The structural schematic diagram of the optical anti-counterfeiting transfer film L1 is shown in FIG. 1, wherein L1 comprises a substrate layer, and a stripping layer, an imaging layer, a plating layer and a hot melt adhesive layer which are sequentially overlapped on the substrate layer; the average thickness of the release layer was 100nm, and the average thickness of the imaging layer was 1 μm; the average thickness of the coating is 20nm, and the average thickness of the hot melt adhesive layer is 6 mu m; the optical anti-counterfeiting pattern of the optical anti-counterfeiting transfer film is an anti-counterfeiting pattern with a three-dimensional embossment effect, and the optical effect of the three-dimensional embossment is as shown in CN103576216A.
Example 2
This example is illustrative of the preparation of the optical anti-counterfeit transfer film of the present invention.
The specific components used in this example are as follows:
the substrate used was BOPP substrate with an average thickness of 25 μm;
First photo-curable coating System (photo-curable coating for release layer, solid content 10% by weight)
A first photoinitiator: 1-hydroxycyclohexyl-phenyl ketone 184 produced by IGM;
aqueous acrylic resin: brand 7655 (solids content 20 wt%, balance water, glass transition temperature Tg of resin 50 ℃, adhesion to PET substrate grade 4B);
the first photoinitiator was present in an amount of 3% by weight based on the dry weight of the first photocurable coating system.
Aqueous coating system(photo-curable coating of spacer layer)
The aqueous polyurethane resin of DIC company was water-WG-204 (solid content: 30% by weight, the remainder being water, the glass transition temperature Tg of the resin: 65 ℃ C.);
second photo-curable coating system (photo-curable coating of imaging layer)
A second photoinitiator: 2-isopropyl thioxanthone ITX produced by IGM;
acrylate oligomer: polyurethane acrylate 6150-100 (pencil hardness H) of Changxing company;
acrylate dilution monomer: the tripropylene glycol diacrylate monomer TPGDA of BASF company;
in the second photo-curing coating system, the content weight ratio of the second photoinitiator to the acrylate oligomer to the acrylate diluent monomer is 4:46:50;
The preparation process comprises the following steps:
(1) Coating a first photo-curing coating system on a PET film by using a coating machine, and drying at 80 ℃ and 100m/min by adopting a drying tunnel to form a variable layer on the PET film, wherein the average thickness of the variable layer is 200nm;
(2) Coating a water-based coating system on the variable layer, and then drying the variable layer at 100 ℃ and 150m/min by adopting a drying tunnel to form a spacing layer on the variable layer;
(3) Coating a second photo-curing coating system (photo-curing coating) on the spacer layer by using a UV molding press, attaching a molding plate, performing UV molding at 60 ℃, and performing second photo-curing to obtain an imaging layer containing UV molding patterns (anti-counterfeiting patterns with optical anti-counterfeiting effects), wherein the second photo-curing adopts 395nm UV-LEDs;
(4) Evaporating aluminum of a metal reflecting layer on the UV mould pressing layer by using a vacuum coating machine to form a coating;
(5) Coating the metal coating with a coating machine at 160 ℃ to form a thermosol layer to obtain a rewinding;
(6) Using a winding device with a UV light source, rewinding by irradiation with a mercury lamp (UV light with emission wavelength less than 375 nm), and subjecting the variable layer to a first photo-curing to form a peeling layer, to obtain a transfer film L2 with an optical anti-counterfeiting effect.
The structural schematic diagram of the optical anti-counterfeiting transfer film L2 is shown in fig. 2, the L2 comprises a substrate layer, and a stripping layer, a spacing layer, an imaging layer, a plating layer and a hot melt adhesive layer which are sequentially overlapped on the substrate layer, wherein the average thickness of the stripping layer is 200nm, the average thickness of the spacing layer is 2 mu m, and the average thickness of the imaging layer is 10 mu m; the average thickness of the coating is 300nm, and the average thickness of the hot melt adhesive layer is 6 mu m; the optical anti-counterfeiting pattern of the optical anti-counterfeiting transfer film is an anti-counterfeiting pattern with a fine dynamic effect, and the fine dynamic optical effect is the same as that of CN103832114A.
Example 3
A transferable optical anti-counterfeit transfer film was prepared in a similar manner to example 1, except that: an interlayer is added, and the specific steps are as follows: before step (2), coating the variable layer with an aqueous coating system (aqueous polyurethane resin of DIC company is WATERSOL-WG-204, the solid content is 30% by weight, the rest is water, the glass transition temperature Tg of the resin is 65 ℃), and drying the variable layer at 100 ℃ and 150m/min by adopting a drying channel to form a spacing layer on the variable layer, wherein the average thickness of the spacing layer is 2 mu m; then, the subsequent steps were carried out, and the rest were the same as in example 1, to obtain an optical anti-counterfeit transfer film L3.
Comparative example 1
An optical anti-counterfeit transfer film was prepared in a similar manner to example 1 except that the transfer film did not contain a release layer, i.e., step (1) and step (5) were not performed, and a second photo-curable coating system was directly applied to the substrate, and the rest was the same as in example 1, to obtain an optical anti-counterfeit transfer film DL1.
Comparative example 2
An optical anti-counterfeit transfer film was prepared in a similar manner to example 1 except that in step (1), the raw materials for forming the release layer were different;
specifically, the first photocurable coating system in example 1 was replaced with the waterborne resin of the toyomill 1200 to form an undercoat layer on the PET film, the average thickness of the undercoat layer was 100nm, and step (5) was not performed, and the rest was the same as in example 1, to obtain an optical anti-counterfeit transfer film DL2.
Comparative example 3
An optical anti-counterfeit transfer film was prepared in a similar manner to example 1 except that the variable layer was UV light cured to form a release layer prior to step (2), and the rest was the same as example 1, to obtain an optical anti-counterfeit transfer film DL3.
Comparative example 4
An optical anti-counterfeit transfer film was prepared in a similar manner to example 1 except that in step (1), the kind of photoinitiator forming the release layer was different;
Specifically, the first photoinitiator replaced 2-hydroxy-2-methyl-1-phenylpropionic acid 1173 produced by IGM company with 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide TPO produced by IGM; the rest is the same as in example 1, and an optical anti-counterfeit transfer film DL4 is obtained.
Test case
The UV molding replication and hot stamping stripping of the optical anti-counterfeiting transfer films prepared in the examples and the comparative examples are observed, and specific results are shown in Table 1:
TABLE 1
Remarks: "-" means that the subsequent hot stamping stripping process cannot be performed due to poor UV stamping effect.
In table 1, the replication yield represents the yield of the mold replication, and is obtained by the following formula:
replication yield/% = (total coated area-UV die coating void area)/total coated area x 100
From the results, the optical anti-counterfeiting transfer film solves the problem of sticking during UV molding of the fine microstructure, can be suitable for UV molding of various types of fine microstructures, and meets the wide adaptability of UV molding to the fine microstructure. Meanwhile, the optical anti-counterfeiting transfer film provided by the invention is easy to peel during thermoprinting transfer, and the subsequent thermoprinting transfer is ensured.
In particular, as can be seen by comparing example 1 with example 3, the replication yield of the special optical anti-counterfeiting transfer film containing the spacer layer is higher;
In particular, as can be seen from comparison of examples 1 to 3 and comparative examples 1 to 4, the present invention converts the variable layer having an adhesive effect before UV molding into the easily peeled release layer by skillfully introducing the release layer and using the photo-crosslinking reaction, not only solves the problem of sticking during UV molding of fine microstructures, but also ensures the subsequent transfer of thermoprints.
In conclusion, the optical anti-counterfeiting transfer film provided by the invention solves the problem of sticking during UV (ultraviolet) molding of a fine microstructure and the defect of incomplete stripping during subsequent thermoprinting transfer, is beneficial to improving the optical anti-counterfeiting effect in the fields of bank notes and cards, and has wide application prospect.
The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings, but the present invention is not limited thereto. Within the scope of the technical idea of the invention, a plurality of simple variants of the technical proposal of the invention can be carried out, comprising that each specific technical feature is combined in any suitable way, and in order to avoid unnecessary repetition, the invention does not need to be additionally described for various possible combinations. Such simple variations and combinations are likewise to be regarded as being within the scope of the present disclosure.
Claims (25)
1. The optical anti-counterfeiting transfer film is characterized by comprising a substrate layer, and a stripping layer, an imaging layer, a plating layer and a hot melt adhesive layer which are sequentially overlapped on the substrate layer, wherein the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure;
The stripping layer is a coating formed by sequentially drying and first photocuring a first photocuring coating system, wherein the first photocuring coating system contains a first photoinitiator and acrylic resin, and the photoinitiation wavelength of the first photoinitiator is less than 375nm;
the imaging layer is a coating formed by sequentially carrying out UV mould pressing and second photo-curing on a second photo-curing coating system, wherein the second photo-curing coating system contains acrylate oligomer, acrylate diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator is 375nm-425nm;
and, the first photo-curing is performed after the second photo-curing.
2. The optical anti-counterfeiting transfer film according to claim 1, wherein the first photoinitiator is selected from at least one of a first cationic photoinitiator and a first free radical photoinitiator.
3. The optical anti-counterfeiting transfer film according to claim 2, wherein the first photoinitiator is a first radical photoinitiator.
4. The optical anti-counterfeit transfer film of claim 3, wherein the first photoinitiator is selected from at least one of alpha-hydroxy ketone photoinitiators, benzoyl formate photoinitiators, and benzophenone photoinitiators.
5. The optical anti-counterfeit transfer film of claim 1, wherein the acrylic resin has a glass transition temperature of greater than 30 ℃;
and/or the solids content of the first photocurable coating system is in the range of 5-55 wt-%.
6. The optical anti-counterfeiting transfer film according to any one of claims 1-5, wherein the second photoinitiator is selected from at least one of a sensitizer-second cationic photoinitiator complex initiator, a second free radical photoinitiator-second cationic photoinitiator complex initiator, a second cationic photoinitiator, and a second free radical photoinitiator.
7. The optical anti-counterfeiting transfer film according to claim 6, wherein the second photoinitiator is a second free radical photoinitiator.
8. The optical anti-counterfeiting transfer film according to claim 7, wherein the second photoinitiator is selected from at least one of an alpha-aminoketone photoinitiator, an acylphosphine oxide-based initiator, and a thioxanthone-based photoinitiator.
9. The optical anti-counterfeiting transfer film according to any one of claims 1-5, wherein the acrylate oligomer in the second photocurable coating system is selected from at least one of epoxy acrylate, polyester acrylate, and polyurethane acrylate;
And/or, the pencil hardness of the acrylate oligomer after photocuring is not higher than 2H;
and/or the acrylic ester dilution monomer is selected from at least one acrylic ester monomer with the functionality of 1-6.
10. The optical anti-counterfeiting transfer film according to any one of claims 1-5, wherein a spacer layer is further provided between the imaging layer and the release layer, the spacer layer being a coating formed by drying an aqueous coating system.
11. The optical anti-counterfeiting transfer film according to claim 10, wherein the aqueous resin in the aqueous coating system is selected from at least one of an aqueous polyether resin-aqueous polyester resin composite resin, an aqueous polycarbonate resin, an aqueous polyether resin, an aqueous polyester resin, an aqueous acrylic resin, an aqueous polyurethane resin, and an aqueous polyvinyl butyral resin;
and/or the solids content of the aqueous coating system is from 5 to 55 wt.%;
and/or the glass transition temperature of the resin in the aqueous coating system is higher than 30 ℃.
12. The optical anti-counterfeit transfer film of claim 10, wherein the average thickness of the release layer is 100nm-3 μm;
and/or the imaging layer has an average thickness of 1 μm to 20 μm;
And/or the spacer layer has an average thickness of 50nm-3 μm.
13. A method of making an optically anti-counterfeit transfer film, the method comprising:
(1) First applying a first photo-curable coating system to a substrate, followed by a first drying to form a variable layer on the substrate; the first photo-curing coating system comprises a first photoinitiator and acrylic resin, wherein the photoinitiation wavelength of the first photoinitiator is less than 375nm;
and, second covering the aqueous coating system on the variable layer, and then second drying to form a spacer layer on the variable layer;
(2) Performing third coverage on the variable layer or the spacing layer by a second photo-curing coating system, and then sequentially performing UV (ultraviolet) mould pressing and second photo-curing to form an imaging layer on the variable layer or the spacing layer, wherein the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure obtained by the UV mould pressing; the second light-cured coating system comprises an acrylic ester oligomer, an acrylic ester diluent monomer and a second light initiator, wherein the photoinitiation wavelength of the second light initiator is 375nm-425nm, the second light curing is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(3) Evaporating the imaging layer to form a plating layer;
(4) Performing fourth covering on the hot melt adhesive on the coating to form a hot melt adhesive layer;
the method further comprises the steps of: subjecting the variable layer to a first photo-curing to form a release layer, the first photo-curing being performed after step (2), step (3) or step (4), the first photo-curing being performed under first light source irradiation conditions, the first light source emitting light having a wavelength of less than 375 nm.
14. The method of claim 13, wherein the first photo-curing is performed after the step (4).
15. The method of claim 13, wherein the first photoinitiator is selected from at least one of a first cationic photoinitiator and a first free radical photoinitiator.
16. The method of claim 15, wherein the first photoinitiator is a first radical photoinitiator;
and/or, the glass transition temperature of the acrylic resin is higher than 30 ℃;
and/or the solids content of the first photocurable coating system is in the range of 5-55 wt-%.
17. The method of claim 16, wherein the first photoinitiator is selected from at least one of an alpha-hydroxy ketone photoinitiator, a benzoyl formate photoinitiator, and a benzophenone photoinitiator.
18. The method of any of claims 13-17, wherein the second photoinitiator is selected from at least one of a sensitizer-second cationic photoinitiator complex initiator, a second free radical photoinitiator-second cationic photoinitiator complex initiator, a second cationic photoinitiator, a second free radical photoinitiator.
19. The method of claim 18, wherein the second photoinitiator is a second free radical photoinitiator.
20. The method of claim 19, wherein the second photoinitiator is selected from at least one of an alpha-aminoketone photoinitiator, an acyl phosphine oxide-based initiator, and a thioxanthone-based photoinitiator.
21. The method of any of claims 13-17, wherein the acrylate oligomer is selected from at least one of an epoxy acrylate, a polyester acrylate, and a polyurethane acrylate;
and/or, the pencil hardness of the acrylate oligomer after photocuring is not higher than 2H;
and/or the acrylic ester dilution monomer is selected from at least one acrylic ester monomer with the functionality of 1-6.
22. The method of any of claims 13-17, wherein the aqueous resin in the aqueous coating system is selected from at least one of an aqueous polyether resin-aqueous polyester resin composite resin, an aqueous polycarbonate resin, an aqueous polyether resin, an aqueous polyester resin, an aqueous acrylic resin, an aqueous polyurethane resin, an aqueous polyvinyl butyral resin;
And/or the solids content of the aqueous coating system is from 5 to 55 wt.%;
and/or the glass transition temperature of the resin in the aqueous coating system is higher than 30 ℃.
23. An optical anti-counterfeiting transfer film prepared by the method of any one of claims 13-22.
24. Use of the optical anti-counterfeiting transfer film according to any one of claims 1-12 and 23 in the field of optical anti-counterfeiting.
25. The use according to claim 24, wherein the optical security field is a banknote and/or card security field.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011342913.3A CN114537009B (en) | 2020-11-25 | 2020-11-25 | Optical anti-counterfeiting transfer film and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011342913.3A CN114537009B (en) | 2020-11-25 | 2020-11-25 | Optical anti-counterfeiting transfer film and preparation method and application thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114537009A CN114537009A (en) | 2022-05-27 |
| CN114537009B true CN114537009B (en) | 2024-03-01 |
Family
ID=81659757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011342913.3A Active CN114537009B (en) | 2020-11-25 | 2020-11-25 | Optical anti-counterfeiting transfer film and preparation method and application thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114537009B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004059820A (en) * | 2002-07-31 | 2004-02-26 | Dainippon Printing Co Ltd | Photosetting resin, photosetting resin composition, method for forming minute uneven pattern, transfer foil, optical article and stamper |
| JP2008156659A (en) * | 2008-02-12 | 2008-07-10 | Dainippon Printing Co Ltd | Photo-curable resin and photo-curable resin composition |
| CN104312414A (en) * | 2014-09-28 | 2015-01-28 | 上海乘鹰新材料有限公司 | UV-laser transfer paint composition and use thereof |
| CN105313516A (en) * | 2015-09-23 | 2016-02-10 | 武汉华工图像技术开发有限公司 | Anti-fake hot stamping film with 3D effect and preparation method thereof |
| CN110408300A (en) * | 2018-04-26 | 2019-11-05 | 中钞特种防伪科技有限公司 | The protectiveness ultraviolet cured paint composition and its coating of 100% solid content and application |
| WO2020187286A1 (en) * | 2019-03-19 | 2020-09-24 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element and optical anti-counterfeiting product |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI691563B (en) * | 2018-06-28 | 2020-04-21 | 長興材料工業股份有限公司 | Photocurable coating composition and application thereof |
-
2020
- 2020-11-25 CN CN202011342913.3A patent/CN114537009B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004059820A (en) * | 2002-07-31 | 2004-02-26 | Dainippon Printing Co Ltd | Photosetting resin, photosetting resin composition, method for forming minute uneven pattern, transfer foil, optical article and stamper |
| JP2008156659A (en) * | 2008-02-12 | 2008-07-10 | Dainippon Printing Co Ltd | Photo-curable resin and photo-curable resin composition |
| CN104312414A (en) * | 2014-09-28 | 2015-01-28 | 上海乘鹰新材料有限公司 | UV-laser transfer paint composition and use thereof |
| CN105313516A (en) * | 2015-09-23 | 2016-02-10 | 武汉华工图像技术开发有限公司 | Anti-fake hot stamping film with 3D effect and preparation method thereof |
| CN110408300A (en) * | 2018-04-26 | 2019-11-05 | 中钞特种防伪科技有限公司 | The protectiveness ultraviolet cured paint composition and its coating of 100% solid content and application |
| WO2020187286A1 (en) * | 2019-03-19 | 2020-09-24 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element and optical anti-counterfeiting product |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114537009A (en) | 2022-05-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU2012274953B2 (en) | Printing diffraction gratings on paper and board | |
| RU2640711C2 (en) | Method of obtaining protection elements and hologram | |
| CN101291816B (en) | Set of curable liquids and methods for inkjet printing | |
| EP2084005B1 (en) | Apparatus and method for manufacturing a security product | |
| CN103770492B (en) | Method for manufacturing transfer film and transfer aluminum-plating paper | |
| EP2467755B1 (en) | Method for a sub microscopic and optically variable image carrying device | |
| CN101292000B (en) | Curable inkjet ink set and methods for inkjet printing | |
| WO2007045578A1 (en) | Method for preparing tamperproof id documents | |
| CN103054284A (en) | Metallic coin stamped with holographic anti-counterfeiting pattern and manufacturing method thereof | |
| US20060275669A1 (en) | Composition and a process for the preparation of coloured holograms | |
| WO2016156286A1 (en) | High gloss metal effect papers and boards | |
| CN106626854A (en) | Active energy ray-curable resin composition, transfer sheet, decorative board, and method for producing decorative board | |
| AU752118B2 (en) | Cellulose substrates with transparentized area and method of making same | |
| JPH01161001A (en) | Photopolymerizable mixture | |
| CN114537009B (en) | Optical anti-counterfeiting transfer film and preparation method and application thereof | |
| KR20200000340A (en) | Led curable compositions | |
| JPH01289876A (en) | Ink and coating composition having both ultraviolet curability and oxidative polymerizability and printed matter and coated object formed by using same | |
| JP4736308B2 (en) | UV curable overprint varnish composition | |
| CN103059698A (en) | Holographic composite aluminized coating composition capable of being subjected to ultraviolet curing and preparation method thereof | |
| CN114539892B (en) | Coating composition for preparing transfer type optical anti-counterfeiting element, application of coating composition, transfer type optical anti-counterfeiting element, preparation method of coating composition and application of transfer type optical anti-counterfeiting element | |
| US20140216283A1 (en) | Method of flexographic patterning using photocurable composition | |
| JP2004142130A (en) | Transfer recording element, certificate recording medium, its manufacturing method and issuance device | |
| CN117799275A (en) | Transfer substrate and preparation method and application thereof | |
| JP2007277762A (en) | Hologram thread and forgery-preventing paper | |
| JPS61289302A (en) | Production of color filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information |
Address after: 100070 No. 6 Spark Road, Science City, Beijing, Fengtai District Applicant after: ZHONGCHAO SPECIAL SECURITY TECHNOLOGY Co.,Ltd. Applicant after: China Banknote Printing and Minting Group Co.,Ltd. Address before: 100070 No. 6 Spark Road, Science City, Beijing, Fengtai District Applicant before: ZHONGCHAO SPECIAL SECURITY TECHNOLOGY Co.,Ltd. Applicant before: CHINA BANKNOTE PRINTING AND MINTING Corp. |
|
| CB02 | Change of applicant information | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |