CN114534299A - Diffusion rate adjusting method, system, device and storage medium - Google Patents
Diffusion rate adjusting method, system, device and storage medium Download PDFInfo
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- 238000009792 diffusion process Methods 0.000 title claims abstract description 377
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- 239000013014 purified material Substances 0.000 claims abstract description 99
- 238000000859 sublimation Methods 0.000 claims abstract description 63
- 230000008022 sublimation Effects 0.000 claims abstract description 63
- 238000000746 purification Methods 0.000 claims abstract description 53
- 239000000523 sample Substances 0.000 claims abstract description 46
- 238000010438 heat treatment Methods 0.000 claims description 83
- 238000004590 computer program Methods 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 8
- 239000010453 quartz Substances 0.000 claims description 8
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- 238000010586 diagram Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- 238000002061 vacuum sublimation Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
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- 230000009125 negative feedback regulation Effects 0.000 description 1
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Abstract
The invention discloses a diffusion rate adjusting method, a system, a device and a storage medium, wherein the scheme is applied to a diffusion rate adjusting device, whether the diffusion rate is in a preset diffusion rate range is judged according to the diffusion rate of a purified material in a sublimation tube detected by a diffusion rate probe, and a diffusion rate control signal is adjusted when the diffusion rate is not in the preset diffusion rate range, so that a diffusion rate adjusting module adjusts the diffusion rate of the purified material in the sublimation tube to be in the preset diffusion rate range, the stability and the purity of the purified material are prevented from being reduced due to the instability of the diffusion rate, the utilization rate of the material to be purified is improved, the loss rate of the purified material is reduced, and the time and the labor cost in the purification process are reduced.
Description
Technical Field
The invention relates to the field of vacuum sublimation purification, in particular to a diffusion rate adjusting method, a diffusion rate adjusting system, a diffusion rate adjusting device and a storage medium.
Background
In the prior art, when a material to be purified is purified, the material to be purified is generally purified by controlling the temperature more, the influence of the diffusion rate of the purified material on the purity and the utilization rate of the purified material is ignored, the utilization rate of the material to be purified and the purity and the stability of the purified material are reduced due to the improper diffusion rate, the loss rate of the purified material is increased, and the time and the labor cost in the purification process are increased.
Disclosure of Invention
The invention aims to provide a diffusion rate adjusting method, a diffusion rate adjusting system, a diffusion rate adjusting device and a storage medium, which can avoid the reduction of the stability and the purity of a purified material due to the instability of the diffusion rate, improve the utilization rate of the material to be purified, reduce the loss rate of the purified material and reduce the time and labor cost in the purification process.
In order to solve the technical problem, the invention provides a diffusion rate adjusting method which is applied to a diffusion rate adjusting device, wherein the diffusion rate adjusting device comprises a diffusion rate probe and a diffusion rate adjusting module which are arranged in a sublimation pipe of purification equipment; the method comprises the following steps:
judging whether the diffusion rate of the purified material in the sublimation tube detected by the diffusion rate probe is within a preset diffusion rate range;
if not, adjusting the diffusion rate control signal to enable the diffusion rate adjusting module to adjust the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
Preferably, adjusting the diffusion rate control signal to enable the diffusion rate adjusting module to adjust the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range includes:
and adjusting the diffusion rate control signal to enable the diffusion rate adjusting module to adjust the output power of a heating system of the purification equipment so as to adjust the diffusion rate of the purified material in the sublimation pipe to be within the preset diffusion rate range.
Preferably, the sublimation pipe of the purification equipment comprises a plurality of heating regions, and the diffusion rate probes and the diffusion rate adjusting modules are respectively arranged in the heating regions in a one-to-one correspondence manner;
judging whether the diffusion rate of the purified material in the sublimation tube detected by the diffusion rate probe is within a preset diffusion rate range or not, and the method comprises the following steps:
judging whether the diffusion rate of the purified material in the target heating area detected by the diffusion rate probe corresponding to the target heating area is within a target preset diffusion rate range;
if not, adjusting a diffusion rate control signal to enable the diffusion rate adjusting module of each heating region to adjust the diffusion rate of the purified material in each heating region until the diffusion rate of the purified material in the target heating region is within the target preset diffusion rate range.
In order to solve the technical problem, the invention provides a diffusion rate adjusting system which is applied to a diffusion rate adjusting device, wherein the diffusion rate adjusting device comprises a diffusion rate probe and a diffusion rate adjusting module which are arranged in a sublimation pipe of purification equipment; the system comprises:
the judging unit is used for judging whether the diffusion rate of the purified material in the sublimation pipe, which is detected by the diffusion rate probe, is within a preset diffusion rate range;
and the adjusting unit is used for adjusting the diffusion rate control signal when the diffusion rate is not within a preset diffusion rate range, so that the diffusion rate adjusting module adjusts the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
In order to solve the above technical problem, the present invention provides a diffusion rate adjusting device, including:
a memory for storing a computer program;
a processor for implementing the steps of the diffusion rate adjustment method as described above when executing the computer program.
Preferably, the method further comprises the following steps:
the diffusion rate probe is arranged in a sublimation pipe of the purification equipment and is used for detecting the diffusion rate of the purified material in the sublimation pipe of the purification equipment;
and the diffusion rate adjusting module is arranged between the diffusion rate probe and the processor and used for adjusting the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range according to the diffusion rate control signal adjusted by the processor when the processor judges that the diffusion rate is not within the preset diffusion rate range.
Preferably, the sublimation pipe of the purification equipment comprises a plurality of heating regions, and the diffusion rate probes and the diffusion rate adjusting modules are respectively arranged in the heating regions in a one-to-one correspondence manner;
the diffusion rate probe is used for detecting whether the diffusion rate of the purified material in the heating area where the diffusion rate probe is located is within the preset diffusion rate range;
the diffusion rate adjusting module is used for adjusting the diffusion rate of the purified material in the heating area corresponding to the diffusion rate adjusting module according to the diffusion rate control signal adjusted by the processor when the processor determines that the diffusion rate of the purified material in the target heating area is not within the target preset diffusion rate range until the diffusion rate of the purified material in the target heating area is within the target preset diffusion rate range.
Preferably, the diffusion rate adjusting module is specifically configured to adjust an output power of a heating system of the purification apparatus according to the diffusion rate control signal adjusted by the processor, so as to adjust the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
Preferably, the diffusion rate probe is a quartz crystal oscillator for detecting the diffusion rate of the purified material in the sublimation tube of the purification apparatus according to a pressure applied to the purified material when the purified material is diffused.
In order to solve the above technical problem, the present invention provides a computer-readable storage medium, having a computer program stored thereon, where the computer program is executed by a processor to implement the steps of the diffusion rate adjusting method as described above.
The application provides a diffusion rate adjusting method, a system, a device and a storage medium, the scheme is applied to a diffusion rate adjusting device, whether the diffusion rate is in a preset diffusion rate range is judged according to the diffusion rate of a purified material in a sublimation pipe detected by a diffusion rate probe, and a diffusion rate control signal is adjusted when the diffusion rate is not in the preset diffusion rate range, so that the diffusion rate of the purified material in the sublimation pipe is adjusted to the preset diffusion rate range by a diffusion rate adjusting module, the stability and the purity of the purified material are prevented from being reduced due to the instability of the diffusion rate, the utilization rate of the material to be purified is improved, the loss rate of the purified material is reduced, and the time and the labor cost in the purification process are reduced.
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In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed in the prior art and the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a diffusion rate adjustment method according to the present invention;
FIG. 2 is a diagram of a diffusion rate adjustment system according to the present invention;
FIG. 3 is a schematic structural diagram of a diffusion rate adjusting device according to the present invention;
fig. 4 is a schematic structural diagram of a diffusion rate adjusting device according to the present invention.
Detailed Description
The core of the invention is to provide a diffusion rate adjusting method, a diffusion rate adjusting system, a diffusion rate adjusting device and a storage medium, which can avoid the reduction of the stability and the purity of the purified material due to the instability of the diffusion rate, improve the utilization rate of the material to be purified, reduce the loss rate of the purified material and reduce the time and labor cost in the purification process.
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a diffusion rate adjusting method applied to a diffusion rate adjusting device, where the diffusion rate adjusting device includes a diffusion rate probe and a diffusion rate adjusting module, which are disposed in a sublimation tube of a purification apparatus; the method comprises the following steps:
s11: judging whether the diffusion rate of the purified material in the sublimation tube detected by the diffusion rate probe is within a preset diffusion rate range;
the applicant considers that the organic light emitting diode has the advantages of active light emitting, quick response, flexibility and the like, is widely applied to a plurality of fields, is a recognized next generation display and illumination technology, and with the improvement of the productivity of the organic light emitting diode, the demand of high-purity organic small molecular materials is increased year by year, and higher requirements are put forward on the high-purity material productivity market. However, impurities in the organic small molecule material can form unstable impurity traps in the formed device and reduce the efficiency and operational stability of the device during operation of the device. At present, most of high-purity organic small molecular materials are obtained from vacuum sublimation purification, so the research and development design of a vacuum sublimation purification process and equipment are very important.
However, the purification technique in the prior art does not usually involve adjustment of the diffusion rate of the purified material, and if the diffusion rate of the purified material is too fast or too slow, the purity of the purified material is reduced, so that the purified materials of different batches have different purities and lower stability.
In order to solve the technical problem, a diffusion rate adjusting device is arranged in the purification equipment, the diffusion rate adjusting device comprises a diffusion rate probe and a diffusion rate adjusting module, the diffusion rate probe is arranged in a sublimation pipe of the purification equipment and detects the diffusion rate of a purified material in the sublimation pipe, the detected diffusion rate is sent to a processor 32, whether the diffusion rate of the purified material is within a preset diffusion rate range is judged by the processor 32, and only when the diffusion rate is within the preset diffusion rate range, the purity of the purified material is the purity expected by a user.
S12: and if the diffusion rate is not within the preset diffusion rate range, adjusting the diffusion rate control signal so that the diffusion rate adjusting module adjusts the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
When the processor 32 detects that the diffusion rate of the purified material is not within the preset diffusion rate range, the diffusion rate of the purified material in the sublimation tube needs to be adjusted in time to ensure high purity of the purified material.
Specifically, the processor 32 adjusts the diffusion rate of the purified material in the sublimation tube according to the adjusted diffusion rate control signal by adjusting the diffusion rate control signal, until the diffusion rate of the purified material is adjusted to a preset diffusion rate range, and ensures that the diffusion rate of the purified material is stable in the preset diffusion rate range by continuous feedback adjustment.
The diffusion rate control signal is adjusted to adjust the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range by the diffusion rate adjustment module, which may be specifically, but not limited to, adjusting the output power of the heating system of the purification apparatus by the diffusion rate adjustment module according to the adjusted diffusion rate control signal to adjust the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
Because purification equipment in this application treats the purification material through vacuum sublimation purification technique and purifies, consequently, realize separating the material after purifying from different impurity through the temperature of adjustment purification equipment in this application, also be according to the temperature of the sublimation temperature adjustment purification equipment of material after the purification, make after the purification material sublimate the back and diffuse out through the sublimation pipe, realize the purification separation, based on this, can realize adjusting the diffusion rate of material after the purification through the output power of the heating system that the adjustment carries out the heating to purification equipment in this application, in order to guarantee that the diffusion rate of material after the purification is stabilized in predetermineeing the diffusion rate within range, guarantee the high purity of material after the purification.
In addition, in consideration of the fact that when the purification apparatus in the present application purifies a material to be purified, the sublimation tube is divided into a plurality of heating regions, the temperatures of the heating regions are different, and the preset diffusion rate ranges of the purified material set in each heating region are different, in the present application, it is preferable that a diffusion rate probe and a diffusion rate adjustment module are respectively and correspondingly arranged in each heating region of the sublimation tube one by one, so as to detect and adjust the diffusion rate of each heating region.
Specifically, in the present application, a target heating area may be selected from each heating area, for example, a first end of the sublimation pipe is a position for heating a material to be purified, and correspondingly, the other end of the sublimation pipe is a position for completely separating a purified material, in order to ensure high purity of the purified material, in the present application, a heating area corresponding to the position where the purified material is completely separated is set as the target heating area, a preset diffusion rate range set for the target heating area is a target preset diffusion rate range, a diffusion rate probe of the target heating area detects a diffusion rate of the purified material in the target heating area, and sends a detection result to the processor 32, and when the processor 32 determines that the diffusion rate of the purified material in the target heating area is not within the target preset diffusion rate range, diffusion rate adjustment modules corresponding to the heating areas are controlled to respectively adjust the diffusion rate of the purified material in the heating areas And the diffusion rate of the purified material in the target heating area is within the target preset diffusion rate range, so that the influence of instability of the diffusion rate in the target heating area on the purity of the purified material is avoided, and the high purity of the purified material is ensured. It should be noted that, when the diffusion rate in the target heating region is only guaranteed to be within the target preset diffusion rate range, the diffusion rate in other heating zones may fluctuate due to diffusion rate adjustment, but it is preferable to ensure the purity of the purified material when the diffusion rate in the target heating zone is within the target preset diffusion rate range, the diffusion rates of other heating regions do not have a great influence on the purity of the purified material, and certainly, in the present application, the diffusion rates of the heating regions may not be limited to adjusting the diffusion rates of the heating regions when the diffusion rate of the target heating region is not within the target preset diffusion rate range, or when the diffusion rate of any one heating region is not within the self-corresponding preset diffusion rate range, and adjusting the diffusion rate of each heating area to ensure that the diffusion rate of each heating area is stable and in the range of the corresponding preset diffusion rate.
Correspondingly, when each diffusion rate adjusting module respectively adjusts the diffusion rate of each heating region, the diffusion rate adjusting module may also, but is not limited to, adjust the output power of the heating system corresponding to each heating region, so that the diffusion rate of each heating region is within the preset diffusion rate range.
It should be further noted that the material to be purified in the present application is a material containing impurities, and the purified material is a target material separated from the material to be purified and the impurities, that is, a material with high purity desired by a user.
In conclusion, the stability and purity of the purified material are prevented from being reduced due to the unstable diffusion rate, the utilization rate of the material to be purified is improved, the loss rate of the purified material is reduced, and the time and labor cost in the purification process are reduced.
On the basis of the above-described embodiment:
referring to fig. 2, fig. 2 is a diagram of a diffusion rate adjusting system applied to a diffusion rate adjusting device, where the diffusion rate adjusting device includes a diffusion rate probe and a diffusion rate adjusting module, which are disposed in a sublimation tube of a purification apparatus; the system comprises:
the judging unit 21 is used for judging whether the diffusion rate of the purified material in the sublimation tube detected by the diffusion rate probe is within a preset diffusion rate range;
and the adjusting unit 22 is configured to adjust the diffusion rate control signal when the diffusion rate is not within the preset diffusion rate range, so that the diffusion rate adjusting module adjusts the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
For the introduction of the diffusion rate adjustment system provided by the present invention, please refer to the above method embodiments, and the present invention is not repeated herein.
Referring to fig. 3, fig. 3 is a schematic structural diagram of a diffusion rate adjusting device provided in the present invention, the device including:
a memory 31 for storing a computer program;
a processor 32 for implementing the steps of the diffusion rate adjustment method as described above when executing a computer program.
Referring to fig. 4, fig. 4 is a schematic structural diagram of a diffusion rate adjusting device according to the present invention.
As a preferred embodiment, the method further comprises the following steps:
the diffusion rate probe is arranged in the sublimation pipe of the purification equipment and is used for detecting the diffusion rate of the purified material in the sublimation pipe of the purification equipment;
and the diffusion rate adjusting module is arranged between the diffusion rate probe and the processor 32 and is used for adjusting the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range according to the diffusion rate control signal adjusted by the processor 32 when the processor 32 judges that the diffusion rate is not within the preset diffusion rate range.
As a preferred embodiment, the sublimation pipe of the purification equipment comprises a plurality of heating zones, and each heating zone is respectively provided with a diffusion rate probe and a diffusion rate adjusting module in a one-to-one correspondence manner;
the diffusion rate probe is used for detecting whether the diffusion rate of the purified material in the heating area where the diffusion rate probe is located is within a preset diffusion rate range;
the diffusion rate adjusting module is configured to adjust the diffusion rate of the purified material in the heating region corresponding to the diffusion rate adjusting module according to the diffusion rate control signal adjusted by the processor 32 when the processor 32 determines that the diffusion rate of the purified material in the target heating region is not within the target preset diffusion rate range, until the diffusion rate of the purified material in the target heating region is within the target preset diffusion rate range.
As a preferred embodiment, the diffusion rate adjusting module is specifically configured to adjust the output power of the heating system of the purification apparatus according to the diffusion rate control signal adjusted by the processor 32, so as to adjust the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
In a preferred embodiment, the diffusion rate probe is a quartz crystal oscillator for detecting the diffusion rate of the purified material in the sublimation tube of the purification apparatus based on the pressure applied to the purified material as it diffuses.
In this embodiment, through setting up diffusion rate probe and diffusion rate adjustment module, realize the negative feedback regulation of diffusion rate in the sublimation pipe, guarantee that diffusion rate is stabilized in predetermineeing the diffusion rate within range, avoid producing the harmful effects to the purity of purification back material.
Specifically, the diffusion rate adjusting module may include, but is not limited to, a diffusion rate data acquisition and analysis module, a diffusion rate response system, a PID self-tuning system, and a diffusion rate error monitoring system, wherein the processor 32 sends an adjusted diffusion rate control signal to the diffusion rate data acquisition and analysis module corresponding to each heating region when the diffusion rate probe of the target heating region detects that the diffusion rate of the target heating region is not within the target preset diffusion rate range, and each diffusion rate data acquisition and analysis module sends the adjusted diffusion rate control signal to the diffusion rate response system corresponding to itself, so that each diffusion rate response system adjusts the output power of the heating system of the heating region corresponding to itself, and adjusts the diffusion rate of the target heating region to within the target preset diffusion rate range, and subsequently, if the diffusion rate error monitoring system corresponding to the target heating area judges that the diffusion rate of the target heating area is not in the target preset diffusion rate range according to the diffusion rate detected by the diffusion rate probe and the adjusted diffusion rate control signal, the PID self-tuning system can automatically adjust the PID value of the PID self-tuning system according to the set diffusion rate floating percentage, so that each diffusion rate response system adjusts the output power of the heating system of the heating area corresponding to the PID self-tuning system, the diffusion rate of the target heating area is adjusted to be in the target preset diffusion rate range, high-sensitivity monitoring and intelligent control of the diffusion rate are realized, and the utilization rate of raw materials is further improved.
In addition, the diffusion rate probe in this application can be but not be limited to the quartz crystal oscillator, and the quartz crystal oscillator sets up in the sublimation pipe, when the material after the purification diffuses, can exert pressure to the quartz crystal oscillator, and the quartz crystal oscillator detects the diffusion rate of material after the purification through the pressure variation of self, realizes the high accuracy detection to the diffusion rate.
Wherein the quartz crystal oscillator, which may have a frequency of 6 mhz but is not limited thereto, is fixed inside the sublimation pipe.
For the introduction of the diffusion rate adjusting apparatus provided by the present invention, please refer to the above method embodiments, and the present invention is not described herein again.
The computer readable storage medium in the present invention has stored thereon a computer program, which when executed by the processor 32, implements the steps of the diffusion rate adjusting method as described above.
For the introduction of the computer-readable storage medium provided by the present invention, please refer to the above-mentioned method embodiments, which are not described herein again.
It is further noted that, in the present specification, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in the process, method, article, or apparatus that comprises the element.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. A diffusion rate adjusting method is characterized by being applied to a diffusion rate adjusting device, wherein the diffusion rate adjusting device comprises a diffusion rate probe and a diffusion rate adjusting module which are arranged in a sublimation pipe of purification equipment; the method comprises the following steps:
judging whether the diffusion rate of the purified material in the sublimation tube detected by the diffusion rate probe is within a preset diffusion rate range;
if not, adjusting the diffusion rate control signal to enable the diffusion rate adjusting module to adjust the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
2. The diffusion rate adjustment method of claim 1, wherein adjusting a diffusion rate control signal to cause the diffusion rate adjustment module to adjust the diffusion rate of the purified material in the sublimation tube to be within the predetermined diffusion rate range comprises:
and adjusting the diffusion rate control signal to enable the diffusion rate adjusting module to adjust the output power of a heating system of the purification equipment so as to adjust the diffusion rate of the purified material in the sublimation pipe to be within the preset diffusion rate range.
3. The diffusion rate adjusting method according to claim 1, wherein the sublimation tube of the purification apparatus comprises a plurality of heating zones, and the diffusion rate probes and the diffusion rate adjusting modules are respectively arranged in the heating zones in a one-to-one correspondence manner;
judging whether the diffusion rate of the purified material in the sublimation tube detected by the diffusion rate probe is within a preset diffusion rate range or not, and the method comprises the following steps:
judging whether the diffusion rate of the purified material in the target heating area detected by the diffusion rate probe corresponding to the target heating area is within a target preset diffusion rate range;
if not, adjusting a diffusion rate control signal to enable the diffusion rate adjusting module of each heating region to adjust the diffusion rate of the purified material in each heating region until the diffusion rate of the purified material in the target heating region is within the target preset diffusion rate range.
4. A diffusion rate adjusting system is characterized by being applied to a diffusion rate adjusting device, wherein the diffusion rate adjusting device comprises a diffusion rate probe and a diffusion rate adjusting module which are arranged in a sublimation pipe of purification equipment; the system comprises:
the judgment unit is used for judging whether the diffusion rate of the purified material in the sublimation tube detected by the diffusion rate probe is within a preset diffusion rate range or not;
and the adjusting unit is used for adjusting the diffusion rate control signal when the diffusion rate is not within a preset diffusion rate range, so that the diffusion rate adjusting module adjusts the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
5. A diffusion rate adjusting apparatus, comprising:
a memory for storing a computer program;
a processor for implementing the steps of the diffusion rate adjusting method according to any one of claims 1 to 3 when executing the computer program.
6. The diffusion rate adjusting device according to claim 5, further comprising:
the diffusion rate probe is arranged in a sublimation pipe of the purification equipment and is used for detecting the diffusion rate of the purified material in the sublimation pipe of the purification equipment;
and the diffusion rate adjusting module is arranged between the diffusion rate probe and the processor and used for adjusting the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range according to the diffusion rate control signal adjusted by the processor when the processor judges that the diffusion rate is not within the preset diffusion rate range.
7. The diffusion rate adjusting device of claim 6, wherein the sublimation tube of the purification equipment comprises a plurality of heating zones, and the diffusion rate probes and the diffusion rate adjusting modules are respectively arranged in the heating zones in a one-to-one correspondence manner;
the diffusion rate probe is used for detecting whether the diffusion rate of the purified material in the heating area where the diffusion rate probe is located is within the preset diffusion rate range;
the diffusion rate adjusting module is used for adjusting the diffusion rate of the purified material in the heating area corresponding to the diffusion rate adjusting module according to the diffusion rate control signal adjusted by the processor when the processor determines that the diffusion rate of the purified material in the target heating area is not within the target preset diffusion rate range until the diffusion rate of the purified material in the target heating area is within the target preset diffusion rate range.
8. The diffusion rate adjusting device of claim 6, wherein the diffusion rate adjusting module is specifically configured to adjust an output power of a heating system of the purifying apparatus according to the diffusion rate control signal adjusted by the processor, so as to adjust the diffusion rate of the purified material in the sublimation tube to be within the preset diffusion rate range.
9. The diffusion rate adjusting device according to claim 6, wherein the diffusion rate probe is a quartz crystal oscillator for detecting the diffusion rate of the purified material in the sublimation tube of the purification apparatus based on a pressure applied to the purified material when the purified material is diffused.
10. A computer-readable storage medium, having stored thereon a computer program which, when being executed by a processor, carries out the steps of the diffusion rate adjusting method according to any one of claims 1 to 3.
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| CN2710718Y (en) * | 2004-08-03 | 2005-07-20 | 山西至诚科技有限公司 | Vacuum sublimation appts suitable for collecting products |
| CN102961890A (en) * | 2012-12-12 | 2013-03-13 | 中国科学院长春应用化学研究所 | Equipment and process for vacuum sublimation purification of small organic molecule material |
| US20140191422A1 (en) * | 2011-08-13 | 2014-07-10 | Beijing Aglaia Technology Development Co., Ltd. | Sublimation method for the purification of organic small molecules |
| CN213100901U (en) * | 2020-04-08 | 2021-05-04 | 北京大学深圳研究生院 | Sublimation purification device for organic semiconductor material |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2710718Y (en) * | 2004-08-03 | 2005-07-20 | 山西至诚科技有限公司 | Vacuum sublimation appts suitable for collecting products |
| US20140191422A1 (en) * | 2011-08-13 | 2014-07-10 | Beijing Aglaia Technology Development Co., Ltd. | Sublimation method for the purification of organic small molecules |
| CN102961890A (en) * | 2012-12-12 | 2013-03-13 | 中国科学院长春应用化学研究所 | Equipment and process for vacuum sublimation purification of small organic molecule material |
| CN213100901U (en) * | 2020-04-08 | 2021-05-04 | 北京大学深圳研究生院 | Sublimation purification device for organic semiconductor material |
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