CN114517877A - Intelligent monitoring device for wafer production line - Google Patents

Intelligent monitoring device for wafer production line Download PDF

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Publication number
CN114517877A
CN114517877A CN202210144368.XA CN202210144368A CN114517877A CN 114517877 A CN114517877 A CN 114517877A CN 202210144368 A CN202210144368 A CN 202210144368A CN 114517877 A CN114517877 A CN 114517877A
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China
Prior art keywords
wall
camera
production line
monitoring device
chamber
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Granted
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CN202210144368.XA
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Chinese (zh)
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CN114517877B (en
Inventor
常成
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Dongguan Kaman Food Co ltd
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Dongguan Kaman Food Co ltd
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Priority to CN202210144368.XA priority Critical patent/CN114517877B/en
Publication of CN114517877A publication Critical patent/CN114517877A/en
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Publication of CN114517877B publication Critical patent/CN114517877B/en
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16MFRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/02Heads
    • F16M11/04Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
    • F16M11/06Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting
    • F16M11/10Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting around a horizontal axis
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16MFRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/02Heads
    • F16M11/18Heads with mechanism for moving the apparatus relatively to the stand
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/50Constructional details
    • H04N23/51Housings
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Studio Devices (AREA)

Abstract

The invention belongs to the technical field of monitoring devices, and particularly relates to an intelligent monitoring device for a wafer production line, which comprises a support frame; the top end of the supporting frame is connected with a supporting cavity, one side of the bottom end of the supporting cavity is provided with a monitoring port, one end of the supporting cavity is provided with a motor, the end part of the motor is connected with a rotating rod extending into the supporting cavity, and the position of the side wall of the rotating rod, which corresponds to the monitoring port, is connected with a group of cameras; according to the monitoring device, the monitoring angle of the camera can be intelligently adjusted through the motor, the practicability of the monitoring device is improved, the supporting cavity can protect the camera in a non-working state, the condition that the camera is polluted or damaged when being exposed to the external environment is reduced, when the camera at the monitoring port is damaged, the rest of the cameras can move to the monitoring port and quickly work, and adverse effects caused by processing when the camera is damaged are reduced.

Description

Intelligent monitoring device for wafer production line
Technical Field
The invention belongs to the technical field of monitoring devices, and particularly relates to an intelligent monitoring device for a wafer production line.
Background
The waffle, also known as waffle and wiff biscuit, is a marketable snack which is made by washing glutinous rice, soaking, drying, mixing with the mixture of fully dissolved sodium bicarbonate and ammonium bicarbonate, making into flour dough, putting into a mold, and baking into cake slices. And continuously stirring the solidified edible oil until the edible oil is greasy and smooth, adding white sugar powder, uniformly stirring, coating on a cake slice, completely sticking, and finally sawing into small blocks with various specifications to obtain the finished product.
When a wafer production line in the prior art works, in order to effectively monitor processed food, monitoring devices such as cameras are often required to be arranged on the production line, but when the existing monitoring devices are damaged, the existing monitoring devices need to be maintained or replaced with time and labor wasting, and the smooth monitoring of the production line is influenced.
Therefore, the invention provides an intelligent monitoring device for a wafer production line.
Disclosure of Invention
To remedy the deficiencies of the prior art, at least one of the technical problems set forth in the background is addressed.
The technical scheme adopted by the invention for solving the technical problems is as follows: the invention relates to an intelligent monitoring device for a wafer production line, which comprises a supporting frame; the top end of the support frame is connected with a support cavity, one side of the bottom end of the support cavity is provided with a monitoring port, one end of the support cavity is provided with a motor, the end part of the motor is connected with a rotating rod extending into the support cavity, and the position of the side wall of the rotating rod corresponding to the monitoring port is connected with a group of cameras; when a wafer production line in the prior art works, in order to effectively monitor processed food, monitoring devices such as cameras are often required to be arranged on the production line, but when the existing monitoring devices are damaged, the existing monitoring devices need to be maintained or replaced with time and labor wasting, so that the smooth monitoring of the production line is influenced; when the monitoring equipment works, the motor is controlled to move, the camera on the rotating rod is driven to align to the monitoring port, so that the camera can effectively monitor the work of a production line, meanwhile, the monitoring angle of the camera can be intelligently adjusted through the motor, the practicability of the monitoring device is improved, the supporting cavity can protect the camera in a non-working state, the condition that the camera is polluted or damaged when exposed to the external environment is reduced, when the camera at the monitoring port is damaged, the camera is driven to rotate only through the work of the motor, the rest of the cameras can move to the monitoring port and work quickly, and the adverse effect on the produced processing when the camera is damaged is reduced.
Preferably, the supporting cavity is cylindrical, the camera comprises a shell and a sealing cover arranged at the working end of the shell, and the sealing cover is arranged into an arc shape matched with the shape of the side wall of the supporting cavity; when the camera of control mouth department is changed, drive this camera anticlockwise rotation through the motor for the shutoff of this camera tip can move to and support the inner wall in chamber and laminate mutually, thereby can play certain shutoff effect to the control mouth in support chamber, reduce external dust impurity and flow into and support intracavity portion, and make the condition that all the other cameras are polluted.
Preferably, an elastic corrugated sleeve is connected between the end part of the shell and the sealing cover, and the end part of the shell is connected with a positioning ring which is connected with the sealing cover in a sliding manner; accomodate to the in-process that supports intracavity portion from the control mouth when the camera, the inward flange of control mouth bottom can press the closing cap to casing one side to scrape the clearance to its accumulational dust impurity in surface, improved the definition when follow-up camera is shot.
Preferably, a sealed elastic bag is connected to the inner wall of the supporting cavity at the bottom end of the monitoring port, and the surface of the elastic bag is set to be a rough surface; when the closing cap of camera moved to elasticity bag department, can extrude the elasticity bag and rather than relative motion for can be abundant after the elasticity bag pressurized deformation laminate with the closing cap surface contact, and more effectual wearing off its surperficial dust impurity, improved the cleanliness of camera tip.
Preferably, a coating block is arranged on the inner wall of a supporting cavity corresponding to one side of the elastic bag close to the monitoring port, a water storage cavity is arranged on the inner wall of the supporting cavity at the bottom end of the coating block, a conveying pipe communicated with the water storage cavity is connected to the supporting cavity, the coating block is made of water absorbing materials and can absorb water filled in the water storage cavity, and a wiping layer made of water absorbing materials wraps the surface of the elastic bag; when the closing cap on the camera rotated to supporting intracavity portion, the coating piece can be coated the closing cap surface in the water cavity absorbing water coating of depositing earlier, when the closing cap moved to elastic bag department afterwards, the scrubbing layer can carry out more effective clearance with the dust impurity on moist closing cap surface, has further improved the cleanliness of camera tip.
Preferably, a cylindrical rotating column is rotatably connected to the inner wall of the supporting cavity corresponding to the top end of the water storage cavity, a group of annularly and uniformly distributed grooves are formed in the side wall of the rotating column, and the coating blocks are filled in the grooves and protrude out of the outer ends of the grooves; when foretell closing cap carries out the contact extrusion to the coating piece, water in the coating piece can be concentrated and extruded and flow out, be difficult to carry out effectual wetting to the closing cap of follow-up motion, through setting up the coating piece on the rotary column lateral wall, make the coating piece that moves to the water storage chamber department can absorb its inside water, the closing cap can drive the rotary column when moving from rotary column department simultaneously and rotate, make the rotary column will absorb the coating piece that has water respectively with the laminating of closing cap surface contact, thereby can last stable carry out moist to the closing cap.
Preferably, an arc-shaped groove is formed in the inner wall of the supporting cavity at the position of the elastic bag, a cylindrical roller is rotatably connected to the inner portion of the arc-shaped groove, the elastic bag is annular and wraps the side wall of the roller, the wiping layer is annular and wraps the outer annular side wall of the elastic bag, the surface of the wiping layer is in interference fit with the surface of the arc-shaped groove, a cleaning cavity is formed in the bottom end of the arc-shaped groove, and a water inlet pipe is connected to the bottom end of the cleaning cavity; when the closing cap moves from the roller, the closing cap can drive the roller to rotate through the frictional force between with the wiping layer, thereby make the wiping layer after wiping the closing cap surface can change over to the arc wall bottom, and the wiping layer that originally is located the arc wall bottom can roll over to the top, and wipe the closing cap, it is more because of accumulational dust impurity on the reduction wiping layer, and influence its effective clear condition to the closing cap, simultaneously when the wiping layer that receives dirt moves to washing chamber department, clear water in the washing chamber can wash it, the subsequent cleaning performance of wiping layer has been improved.
Preferably, an inclined flow guide surface is arranged at the top end of one side, away from the rotating column, of the arc-shaped groove, an arc-shaped protruding part is arranged on the arc-shaped groove corresponding to the bottom end of the flow guide surface, and a liquid discharge groove is formed in the bottom end of the flow guide surface; when the wiper layer is wiped the closing cap surface, can absorb its surperficial water simultaneously, the wiper layer is when moving to the bulge afterwards, and muddy water mixed liquid in the wiper layer flows out to guiding surface department under the extrusion of bulge to discharge through the fluid-discharge tank, thereby can play the effect of "wringing out" to the wiper layer.
Preferably, a drying groove communicated with the outer wall of the supporting cavity is formed in the side wall, corresponding to one side of the cleaning cavity close to the rotating column, of the arc-shaped groove, sponge is filled in the drying groove, and the inner end of the sponge is attached to the surface of the wiping layer; when the cleaning layer after cleaning moves to the sponge, the sponge can suck out the residual water in the cleaning layer, and the water in the cleaning layer is continuously sucked out through the evaporation mode, so that the quick drying of the cleaning layer is facilitated, the water on the sealing cover is effectively absorbed in the subsequent work, and the sponge arranged at the same time can play the role of isolating external dust, and the pollution of external dust impurities to the cleaning layer is reduced.
Preferably, the outer ring side wall of the elastic bag is connected with a group of springs which are uniformly distributed in an annular manner, and the other ends of the springs are connected with a shaking block which is fixedly connected with the wiping layer; when the inside shake piece of wiping layer moved to the bulge, the spring was in compression state under the effect of bulge, when shake piece roll-off bulge and moved to washing chamber department, the shake piece drove the compression of making a round trip of wiping layer under the bounce-back of spring to can promote the more effective discharge of its inside dust impurity, improved the cleaning performance of wiping layer.
The invention has the following beneficial effects:
1. according to the monitoring device, the movement of the motor is controlled to drive the camera on the rotating rod to align with the monitoring port, so that the camera can effectively monitor the work of a production line, meanwhile, the monitoring angle of the camera can be intelligently adjusted through the motor, the practicability of the monitoring device is improved, the supporting cavity can protect the camera in a non-working state, the condition that the camera is polluted or damaged when exposed to the external environment is reduced, when the camera at the monitoring port is damaged, the camera is driven to rotate only through the work of the motor, so that the rest of the cameras can move to the monitoring port and can quickly work, and the adverse effect caused by the processing of the damaged camera is reduced.
2. In the process that the camera is accommodated into the supporting cavity from the monitoring port, the inner edge at the bottom end of the monitoring port can press the sealing cover to one side of the shell, and dust and impurities accumulated on the surface of the shell are scraped and cleaned, so that the definition of the camera in the subsequent shooting process is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without inventive exercise.
The invention will be further described with reference to the accompanying drawings.
FIG. 1 is a perspective view of the present invention;
FIG. 2 is a schematic structural view of the present invention;
FIG. 3 is an enlarged view at A in FIG. 2;
FIG. 4 is a schematic view of the structure of the second embodiment of the present invention at the position of the wipe layer;
in the figure: the device comprises a support frame 1, a support cavity 2, a monitoring port 3, a motor 4, a camera 5, a shell 6, a sealing cover 7, a corrugated sleeve 8, a positioning ring 9, an elastic bag 10, a coating block 11, a water storage cavity 12, a conveying pipe 13, a wiping layer 14, a rotary column 15, a roller 16, a cleaning cavity 17, a water inlet pipe 18, a flow guide surface 19, a bulge 20, a liquid discharge tank 21, a drying tank 22, a sponge 23, a spring 24 and a shaking block 25.
Detailed Description
In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the invention easy to understand, the invention is further described with the specific embodiments. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The first embodiment is as follows:
referring to fig. 1-2, an intelligent monitoring device for a wafer production line according to an embodiment of the present invention includes a supporting frame 1; the top end of the support frame 1 is connected with a support cavity 2, one side of the bottom end of the support cavity 2 is provided with a monitoring port 3, one end of the support cavity 2 is provided with a motor 4, the end part of the motor 4 is connected with a rotating rod extending into the support cavity 2, and the position of the side wall of the rotating rod corresponding to the monitoring port 3 is connected with a group of cameras 5; when a wafer production line in the prior art works, in order to effectively monitor processed food, monitoring devices such as a camera 5 and the like are often required to be arranged on the production line, but when the existing monitoring devices are damaged, the existing monitoring devices need to be maintained or replaced with time and labor wasting, so that the smooth monitoring of the production line is influenced; when the monitoring equipment works, the motor 4 is controlled to move to drive the camera 5 on the rotating rod to align with the monitoring port 3, so that the camera 5 can effectively monitor the work of a production line, meanwhile, the monitoring angle of the camera 5 can be intelligently adjusted through the motor 4, the practicability of the monitoring device is improved, the supporting cavity 2 can protect the camera 5 in a non-working state, the condition that the camera 5 is polluted or damaged when being exposed to the external environment is reduced, when the camera 5 at the monitoring port 3 is damaged, the camera 5 is driven to rotate only through the work of the motor 4, the rest of the cameras 5 can move to the monitoring port 3 and quickly work, and adverse effects caused by processing when the camera 5 is damaged are reduced.
As shown in fig. 3, the support chamber 2 is cylindrical, the camera 5 includes a housing 6 and a cover 7 disposed at a working end thereof, and the cover 7 is disposed in an arc shape matching with a shape of a side wall of the support chamber 2; when camera 5 when 3 departments of control mouth are changed, drive this camera 5 anticlockwise rotation through motor 4 for the shutoff of 5 tip of this camera can move to laminating mutually with the inner wall that supports chamber 2, thereby can play certain shutoff effect to 3 control mouths that support chamber 2, reduce outside dust impurity flow in support chamber 2 inside, and make all the other cameras 5 the condition of receiving dirt.
An elastic corrugated sleeve 8 is connected between the end part of the shell 6 and the sealing cover 7, and the end part of the shell 6 is connected with a positioning ring 9 which is connected with the sealing cover 7 in a sliding way; accomodate to the in-process that supports 2 insides from control mouth 3 when camera 5, the inward flange of 3 bottoms of control mouth can press closing cap 7 to 6 one sides of casing to scrape off the clearance to its surperficial accumulational dust impurity, improved the definition when follow-up camera 5 shoots.
The inner wall of the supporting cavity 2 at the bottom end of the monitoring port 3 is connected with a sealed elastic bag 10, and the surface of the elastic bag 10 is set to be a rough surface; when the seal cover 7 of the camera 5 moves to the elastic bag 10, the elastic bag 10 can be extruded and moves relative to the elastic bag, so that the elastic bag 10 can be fully contacted and attached to the surface of the seal cover 7 after being pressed and deformed, dust and impurities on the surface of the elastic bag can be effectively ground off, and the cleanliness of the end part of the camera 5 is improved.
A coating block 11 is arranged on the inner wall of the supporting cavity 2 corresponding to one side of the elastic bag 10 close to the monitoring port 3, a water storage cavity 12 is arranged on the inner wall of the supporting cavity 2 at the bottom end of the coating block 11, a conveying pipe 13 communicated with the water storage cavity 12 is connected to the supporting cavity 2, the coating block 11 is made of water absorbing materials and can absorb water filled in the water storage cavity 12, and a wiping layer 14 made of the water absorbing materials is wrapped on the surface of the elastic bag 10; when the cover 7 on the camera 5 rotates towards the inside of the supporting cavity 2, the coating block 11 can firstly coat the water absorbed in the water storage cavity 12 on the surface of the cover 7, and then when the cover 7 moves to the elastic bag 10, the wiping layer 14 can more effectively clean the dust and impurities on the surface of the wetted cover 7, so that the cleanliness of the end part of the camera 5 is further improved.
A cylindrical rotary column 15 is rotatably connected to the inner wall of the support cavity 2 corresponding to the top end of the water storage cavity 12, a group of annularly and uniformly distributed grooves are formed in the side wall of the rotary column 15, and the coating blocks 11 are filled in the grooves and protrude to the outer ends of the grooves; when foretell closing cap 7 carries out contact extrusion to coating piece 11, water in the coating piece 11 can be concentrated and extrude and flow out, be difficult to carry out effectual wetting to the closing cap 7 of follow-up motion, through setting up coating piece 11 on rotary column 15 lateral wall, make the coating piece 11 that moves to water storage cavity 12 department can absorb its inside water, closing cap 7 can drive rotary column 15 when following rotary column 15 department motion simultaneously and rotate, make rotary column 15 will absorb coating piece 11 that has water respectively with closing cap 7 surface contact laminating, thereby can be continuously stable carry out the wetting to closing cap 7.
An arc-shaped groove is formed in the inner wall of the supporting cavity 2 at the position of the elastic bag 10, a cylindrical roller 16 is rotatably connected to the inner portion of the arc-shaped groove, the elastic bag 10 is in a ring shape and wraps the side wall of the roller 16, the wiping layer 14 is in a ring shape and wraps the outer ring side wall of the elastic bag 10, the surface of the wiping layer 14 is in interference fit with the surface of the arc-shaped groove, a cleaning cavity 17 is formed in the bottom end of the arc-shaped groove, and a water inlet pipe 18 is connected to the bottom end of the cleaning cavity 17; when closing cap 7 moves from roller 16, closing cap 7 can drive roller 16 through the frictional force between with wiping layer 14 and rotate, thereby make the wiping layer 14 after wiping closing cap 7 surface can change over to the arc wall bottom, and the wiping layer 14 that originally is located the arc wall bottom can roll out to the top, and wipe closing cap 7, it is more because of accumulational dust impurity on the reduction wiping layer 14, and influence its effective clear condition to closing cap 7, when dirty wiping layer 14 moves to washing chamber 17 department, clear water in the washing chamber 17 can wash it simultaneously, the subsequent cleaning performance of wiping layer 14 has been improved.
An inclined flow guide surface 19 is arranged at the top end of one side, away from the rotary column 15, of the arc-shaped groove, an arc-shaped protruding part 20 is arranged on the arc-shaped groove corresponding to the bottom end of the flow guide surface 19, and a liquid discharge groove 21 is formed in the bottom end of the flow guide surface 19; the wiping layer 14 can simultaneously absorb water on the surface of the cap 7 while wiping the surface, and then when the wiping layer 14 moves to the protrusions 20, the mud-water mixture in the wiping layer 14 flows out to the flow guide surface 19 under the extrusion of the protrusions 20 and is discharged through the liquid discharge groove 21, so that the wiping layer 14 can be dried.
A drying groove 22 communicated with the outer wall of the supporting cavity 2 is formed in the side wall, corresponding to one side of the cleaning cavity 17 close to the rotating column 15, of the arc-shaped groove, sponge 23 is filled in the drying groove 22, and the inner end of the sponge 23 is attached to the surface of the wiping layer 14; when the cleaned wiping layer 14 moves to the sponge 23, the sponge 23 can suck out residual water in the wiping layer 14, and the water in the wiping layer 14 is continuously sucked out in an evaporation mode, so that the wiping layer 14 is dried quickly, the water on the sealing cover 7 is effectively absorbed in subsequent work, and meanwhile, the arranged sponge 23 can play a role in isolating external dust, and the pollution of external dust impurities to the wiping layer 14 is reduced.
The second embodiment:
as shown in fig. 4, a first comparative example, in which another embodiment of the present invention is: a group of springs 24 which are uniformly distributed in an annular shape are connected to the outer ring side wall of the elastic bag 10, and the other ends of the springs 24 are connected with shaking blocks 25 which are fixedly connected with the wiping layer 14; when the shaking block 25 in the wiping layer 14 moves to the protruding part 20, the spring 24 is in a compressed state under the action of the protruding part 20, and when the shaking block 25 slides out of the protruding part 20 and moves to the cleaning cavity 17, the shaking block 25 drives the wiping layer 14 to compress back and forth under the rebounding of the spring 24, so that the dust and impurities in the wiping layer can be effectively discharged, and the cleaning effect of the wiping layer 14 is improved.
The working principle is as follows: the camera 5 on the rotating rod is driven to align with the monitoring port 3 by controlling the movement of the motor 4, so that the camera 5 can effectively monitor the work of a production line, meanwhile, the monitoring angle of the camera 5 can be intelligently adjusted through the motor 4, the practicability of the monitoring device is improved, the arranged supporting cavity 2 can protect the camera 5 in a non-working state, the condition that the camera 5 is polluted or damaged when exposed to the external environment is reduced, when the camera 5 at the monitoring port 3 is damaged, the camera 5 is driven to rotate only by controlling the work of the motor 4, so that the rest of the cameras 5 can move to the monitoring port 3 and quickly work, and the adverse effect caused by the processing generated when the camera 5 is damaged is reduced; when the camera 5 at the monitoring port 3 is replaced, the motor 4 drives the camera 5 to rotate anticlockwise, so that the plug at the end part of the camera 5 can move to be attached to the inner wall of the supporting cavity 2, a certain plugging effect can be achieved on the monitoring port 3 of the supporting cavity 2, and the condition that external dust impurities flow into the supporting cavity 2 and other cameras 5 are polluted is reduced; when the camera 5 is accommodated into the supporting cavity 2 from the monitoring port 3, the inner edge at the bottom end of the monitoring port 3 can press the sealing cover 7 to one side of the shell 6, and dust and impurities accumulated on the surface of the shell are scraped and cleaned, so that the definition of the subsequent camera 5 in shooting is improved; when the sealing cover 7 of the camera 5 moves to the elastic bag 10, the elastic bag 10 can be extruded and moves relative to the elastic bag, so that the elastic bag 10 can be fully contacted and attached to the surface of the sealing cover 7 after being pressed and deformed, dust and impurities on the surface of the elastic bag can be effectively ground off, and the cleanliness of the end part of the camera 5 is improved; when the sealing cover 7 on the camera 5 rotates towards the inside of the supporting cavity 2, the coating block 11 can firstly coat the water absorbed in the water storage cavity 12 on the surface of the sealing cover 7, and then when the sealing cover 7 moves to the elastic bag 10, the wiping layer 14 can more effectively clean dust and impurities on the surface of the wetted sealing cover 7, so that the cleanliness of the end part of the camera 5 is further improved; when the coating block 11 is contacted and extruded by the sealing cover 7, water in the coating block 11 can be intensively extruded and flows out, the sealing cover 7 which moves subsequently is difficult to be effectively wetted, the coating block 11 which moves to the water storage cavity 12 can absorb the water in the coating block 11 by arranging the coating block 11 on the side wall of the rotary column 15, and meanwhile, the sealing cover 7 can drive the rotary column 15 to rotate when moving from the rotary column 15, so that the rotary column 15 can respectively contact and attach the coating block 11 which absorbs the water with the surface of the sealing cover 7, and the sealing cover 7 can be continuously and stably wetted; when the sealing cover 7 moves from the roller 16, the roller 16 can be driven to rotate by the sealing cover 7 through the friction force between the sealing cover 7 and the wiping layer 14, so that the wiping layer 14 after the surface of the sealing cover 7 is wiped can rotate to the bottom end of the arc-shaped groove, the wiping layer 14 originally positioned at the bottom end of the arc-shaped groove can rotate to the top end, the sealing cover 7 is wiped, the condition that the effective cleaning of the sealing cover 7 is influenced by more accumulated dust and impurities on the wiping layer 14 is reduced, and meanwhile, when the polluted wiping layer 14 moves to the cleaning cavity 17, the clean water in the cleaning cavity 17 can clean the polluted wiping layer, so that the subsequent cleaning effect of the wiping layer 14 is improved; the wiping layer 14 can simultaneously absorb water on the surface of the cap 7 while wiping the surface, and then when the wiping layer 14 moves to the convex part 20, the muddy water mixed liquid in the wiping layer 14 flows out to the diversion surface 19 under the extrusion of the convex part 20 and is discharged through the liquid discharge groove 21, so that the wiping layer 14 can be dried; when the cleaned wiping layer 14 moves to the sponge 23, the sponge 23 can suck out residual water in the wiping layer 14, and the water in the wiping layer 14 is continuously sucked out in an evaporation mode, so that the wiping layer 14 is dried quickly, the water on the sealing cover 7 is effectively absorbed in subsequent work, and meanwhile, the sponge 23 can play a role in isolating external dust, and the pollution of external dust impurities to the wiping layer 14 is reduced; when the shaking block 25 in the wiping layer 14 moves to the protruding part 20, the spring 24 is in a compressed state under the action of the protruding part 20, and when the shaking block 25 slides out of the protruding part 20 and moves to the cleaning cavity 17, the shaking block 25 drives the wiping layer 14 to compress back and forth under the rebounding of the spring 24, so that the dust and impurities in the wiping layer can be effectively discharged, and the cleaning effect of the wiping layer 14 is improved.
The foregoing shows and describes the general principles, principal features and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are given by way of illustration of the principles of the present invention, and that various changes and modifications may be made without departing from the spirit and scope of the invention as defined by the appended claims. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims (10)

1. An intelligent monitoring device for a wafer production line comprises a support frame (1); the method is characterized in that: support frame (1) top is connected with supports chamber (2), control mouth (3) have been seted up to bottom one side of supporting chamber (2), motor (4) are installed to the one end of supporting chamber (2), motor (4) end connection has the bull stick that stretches into to supporting chamber (2) inside, the corresponding lateral wall position department of bull stick and control mouth (3) is connected with a set of camera (5).
2. An intelligent wafer production line monitoring device according to claim 1, wherein: the supporting cavity (2) is arranged to be cylindrical, the camera (5) comprises a shell (6) and a sealing cover (7) arranged at the working end of the shell, and the sealing cover (7) is arranged to be arc-shaped matched with the shape of the side wall of the supporting cavity (2).
3. An intelligent wafer production line monitoring device according to claim 2, wherein: elastic corrugated sleeves (8) are connected between the end of the shell (6) and the sealing cover (7), and a positioning ring (9) connected with the sealing cover (7) in a sliding manner is connected to the end of the shell (6).
4. An intelligent wafer production line monitoring device according to claim 3, wherein: the inner wall of the supporting cavity (2) at the bottom end of the monitoring port (3) is connected with a sealed elastic bag (10), and the surface of the elastic bag (10) is set to be a rough surface.
5. An intelligent wafer production line monitoring device according to claim 4, wherein: the utility model discloses a water absorbing and cleaning device, including elastic bag (10), be equipped with coating piece (11) on the support chamber (2) inner wall that one side that the elastic bag (10) is close to monitoring mouth (3) corresponds, be provided with on the support chamber (2) inner wall of coating piece (11) bottom and deposit water chamber (12), be connected with on the support chamber (2) and deposit conveyer pipe (13) that water chamber (12) are linked together, coating piece (11) are made by water absorbing material and can absorb the water that fills in depositing water chamber (12), elastic bag (10) surface coating has layer (14) of cleaning of one deck water absorbing material.
6. An intelligent wafer production line monitoring device according to claim 5, wherein: deposit on the support chamber (2) inner wall that water cavity (12) top corresponds and rotate and be connected with cylindric rotary column (15), set up the recess of a set of annular equipartition on rotary column (15) lateral wall, coating piece (11) are filled inside the recess and are projected to the recess outer end.
7. An intelligent monitoring device for wafer production line according to claim 5, characterized in that: the utility model discloses a cleaning device, including elastic bag (10), cleaning layer (14), cleaning layer (17), the arc wall has been seted up on the support chamber (2) inner wall of elastic bag (10) department, the inside rotation of arc wall is connected with cylindric roller (16), elastic bag (10) are the annular form and wrap up on roller (16) lateral wall, cleaning layer (14) are the annular form and wrap up on the outer loop lateral wall of elastic bag (10), just the surface of cleaning layer (14) and the surperficial interference laminating of arc wall, cleaning chamber (17) have been seted up to the arc wall bottom, cleaning chamber (17) bottom is connected with inlet tube (18).
8. An intelligent monitoring device for wafer production line according to claim 7, characterized in that: the top end of one side of the arc-shaped groove far away from the rotating column (15) is provided with an inclined flow guide surface (19), an arc-shaped bulge part (20) is arranged on the arc-shaped groove corresponding to the bottom end of the flow guide surface (19), and the bottom end of the flow guide surface (19) is provided with a liquid discharge groove (21).
9. An intelligent wafer production line monitoring device according to claim 7, wherein: the cleaning device is characterized in that a drying groove (22) communicated with the outer wall of the supporting cavity (2) is formed in the side wall of the arc-shaped groove corresponding to one side, close to the rotating column (15), of the cleaning cavity (17), a sponge (23) is filled in the drying groove (22), and the inner end of the sponge (23) is attached to the surface of the wiping layer (14).
10. An intelligent wafer production line monitoring device according to claim 7, wherein: the outer ring side wall of the elastic bag (10) is connected with a group of springs (24) which are uniformly distributed in an annular mode, and the other ends of the springs (24) are connected with shaking blocks (25) which are fixedly connected with the wiping layer (14).
CN202210144368.XA 2022-02-17 2022-02-17 Intelligent monitoring device for wafer production line Active CN114517877B (en)

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Denomination of invention: Intelligent monitoring device for Weihua cake production line

Granted publication date: 20231010

Pledgee: Bank of China Co.,Ltd. Dongguan Branch

Pledgor: Dongguan Kaman Food Co.,Ltd.

Registration number: Y2024980017658