CN114496715A - Deep energy level photoelectron spectroscopy research device based on electrostatic storage ring - Google Patents
Deep energy level photoelectron spectroscopy research device based on electrostatic storage ring Download PDFInfo
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Abstract
The invention belongs to the technical field of photoelectron spectroscopy, and particularly relates to a deep energy level photoelectron spectroscopy research device based on an electrostatic storage ring, which is used for realizing the measurement of a cluster deep energy level photoelectron spectroscopy with single size and precise temperature control based on desktop level equipment.
Description
Technical Field
The invention belongs to the technical field of photoelectron spectroscopy, and particularly relates to a deep energy level photoelectron spectroscopy research device based on an electrostatic storage ring.
Background
Clusters are relatively stable aggregates consisting of several or even thousands of atoms, molecules or ions, through physical and chemical bonding, the physical and chemical properties of which vary with the number of atoms contained, the spatial dimensions of the cluster range from 1nm to tens of nm, and are too large when described as inorganic molecules and too small when described as small pieces of solid. Its many properties are different from single atom molecules, and different from solid and liquid, and can not be obtained by simple linear extension and interpolation of both properties. Therefore, clusters are considered as a new hierarchy of material structures between atomic molecules and macroscopic masses, which are transition states of various materials from atomic molecules to bulk materials.
In the last decade, the research on cluster physics has been mainly focused on determining the geometry of size-dependent metal and semiconductor clusters, and the main research methods adopted by the research are photoelectron energy spectrum, infrared spectrum, electron scattering, newly developed X-ray scattering spectrum and the like. In most cases, these research methods are combined with Density Functional Theory (DFT) calculation, so that not only the geometric structures of these cluster systems can be effectively analyzed, but also the details of their corresponding electronic structures can be obtained. Especially when DFT is combined with photoelectron spectroscopy, it is theoretically possible to extract both the geometry and the electronic structure of the studied system from the calculation of DFT. However, in practice, due to the large computational complexity and the difficulty of DFT in complex electron orbital processing, the above method is only effective for alkali and noble metal clusters, while the study of heavy elements or clusters containing half-full d-shell elements, especially clusters consisting of f-open-shell elements, remains quite difficult. On the other hand, for the research on cluster properties (such as magnetism and reactivity), the traditional Stern-Gerlach method is generally adopted in the past, and in recent years, a great deal of research on the magnetism of free clusters is carried out by adopting X-ray Spectroscopy (X-ray Circular Dichroism Spectroscopy), but the reliability of the calculation result is difficult to guarantee, especially for the clusters with the atomic number more than 20. Therefore, we need more support of experimental data of high-precision spectrum in order to further develop and examine high-order theoretical methods, thereby effectively promoting the development of cluster physics.
The study of chemical reactions in the vapor phase of clusters and the deposition of clusters is mostly about the measurement of reaction rate, and some are about the study of intermediates of the reaction by using photoelectron spectroscopy and infrared spectroscopy (the intermediates refer to the state where clusters and products are separated). Most of such studies are largely conducted by DFT calculation, and most of the catalytically active materials are transition metal elements and their compounds (e.g. transition metal oxides), which play a key role in really understanding the chemical reaction properties of the clusters if the microscopic kinetic processes of the cluster chemical reactions can be experimentally observed (measured) in real time, and the pumping-probing ultrafast kinetic measurement of the clusters by using femtosecond lasers is the most important means for solving the above problems developed in the last two decades, but only a few studies on cluster systems with very small size have been reported so far, and the fundamental reason for this is mainly the technical difficulties in the architecture of the experimental device. So even though the research on ultrafast kinetics of molecules has been developed for decades, the research on ultrafast kinetics of clusters is only in the beginning stage, and only a few excitation and de-excitation channels are now well defined in experiments, mainly because most clusters are different from the small molecules widely studied in common pump-detection experiments, and when the standard Ti: low-order frequency doubling of Sapphire femtosecond laser (400nm and 266nm) is used, the dense de-excitation process accompanied in cluster photoelectron emission can block the photoelectron emission channels of metal clusters due to the low photon energy excitation energy spectrum.
Angle-resolved photoelectron spectroscopy has emerged in recent years, but has been widely used to measure microscopic architectural electronic structures. The angular resolved photoelectron spectrum containing the information of the electron angular momentum of the target system under study can give part of the characteristics of the electron wave function in the cluster. If the femtosecond laser is used for experimental measurement of pumping-detection, the photoelectron spectrum can directly reflect ultrafast processes in the cluster, such as the excitation and the de-excitation processes of electrons in the cluster, and even related chemical reaction processes. As a typical type of angle-resolved photoelectron spectroscopy, a momentum Map Imaging (VMI) photoelectron spectrometer has the characteristics of simple structure, high precision, large photoelectron generation area and the like, and compared with a conventional time-of-flight photoelectron spectrometer (such as a magnetic bottle photoelectron spectrometer), the VMI photoelectron spectroscopy is realized by measuring the spatial distance of a photoelectron signal drop point concentric on a photoelectron detector thereof, and can realize continuous measurement and accumulation of signals, so that the VMI photoelectron spectrometer is particularly suitable for research of free clusters and molecules and is widely used. The spectrometer can be used for measuring the basic characteristics of an electron wave function and researching the self-coherence in the electron emission process. But limited by the energy of the laser photons, only a few studies of metal and semiconductor cluster systems have been achieved so far using this approach.
Therefore, it is highly advantageous to use higher photon energy for the research of cluster micro-dynamics, but to generate such large laser photon energy, it is generally required to use free electron lasers (fess) or High Harmonic Generation (HHG) lasers generated by the femtosecond lasers as pumping light acting on a nonlinear optical medium as a light source. Although the FELs are ideal light sources for many experiments because they can generate high-flux and high-energy laser light, they are extremely expensive, and the light sources for single experiments have very limited time to use, and it is difficult to meet the requirements of large-cycle experiments for the study of size and temperature dependence in cluster studies. On the other hand, HHG is a desktop instrument in principle, and has the advantages of small occupied space and low cost compared with FELs, but the output luminous flux is very weak, and if the HHG is directly used as a traditional pulsed photoelectron spectrometer (20-100Hz), the signal occurrence rate is too low, and the effective measurement of photoelectron spectrum can hardly be realized.
Disclosure of Invention
The invention aims to: aiming at the defects of the prior art, the deep energy level photoelectron spectrum research device based on the electrostatic storage ring is provided, and size selection and precise temperature control cluster photoelectron spectrum full-spectrum measurement can be completed under a HHG femtosecond laser platform.
In order to achieve the purpose, the invention adopts the following technical scheme:
a deep energy level photoelectron spectrum research device based on an electrostatic storage ring comprises a magnetron sputtering source, a temperature control device and a temperature control device, wherein the magnetron sputtering source is used for providing a high-current-intensity and temperature-controllable metal/semiconductor cluster ion beam; the quadrupole rod mass selector is used for performing mass screening on the cluster ion beam emitted by the magnetron sputtering source; the low-temperature ion trap is used for carrying out temperature control on the cluster ion beam with the mass screened by the quadrupole rod mass selector; the beam optical shaping section is used for accelerating and shaping cluster ion beams with certain mass and temperature emitted from the low-temperature ion trap and injecting the cluster ion beams into the electrostatic storage ring; the electrostatic storage ring is used for restraining the beam to do annular motion and simultaneously improving the beam intensity in an order of magnitude; the electric field compensation type speed image photoelectron spectrometer makes the measurement of photoelectron spectrum not affect the circular motion of beam current by means of compensating electrode.
Preferably, the vacuum environment of the magnetron sputtering source is 10-6Pa, the vacuum environment of the quadrupole mass selector is 10-6Pa, the square cavity where the low-temperature ion trap is located is 10-6Pa, the vacuum environment of the beam optical shaping section is 10-7Pa, the vacuum chamber of the electrostatic storage ring is 10-9Pa。
Preferably, the magnetron sputtering source is a source outlet diaphragm which has an off angle of 15 degrees with the axis and is used for separating charged ions from neutral particles.
Preferably, the quadrupole rod mass selector is provided with ion guide and mass screening, the ion guide is provided with a stainless steel electrode plate for extracting beam current, and the mass screening is provided with a front guide rod, a rear guide rod and a mass analysis rod.
Preferably, the low-temperature ion trap is provided with an injection section, a temperature control section and a lead-out section, wherein the injection section comprises a group of electrostatic focusing lenses, a group of electrostatic deflecting lenses, a group of electrostatic focusing lenses and a group of electrostatic four-stage deflecting lenses which are sequentially arranged, and is used for accelerating and shaping the cluster ion beam current emitted from the quadrupole rod mass selector and then injecting the cluster ion beam current into the temperature control section; the temperature control section comprises a quadrupole rod and an end cover electrode, the quadrupole rod is used for limiting radial movement of the cluster ion beam, and the end cover electrode is used for limiting axial movement of the cluster ion beam; the extraction section comprises an accelerating lens group and an end cover electrode and is used for storing the rapid extraction of the cluster ion beam current and controlling the extraction kinetic energy distribution and the spatial distribution of the cluster ion beam current.
Preferably, the vacuum chamber of the electrostatic storage ring is a stainless steel square chamber.
Preferably, the electrostatic storage ring comprises a four-stage vacuum pumping technique.
Preferably, the internal elements of the electrostatic storage ring are distributed in a square structure, and are used for restraining the cluster ion beam current from performing periodic motion.
Preferably, the electrostatic storage ring is provided with four micro-channel detectors, which are respectively used for detecting the beam intensity injected in each direction.
Preferably, the vertical electric field compensation type speed image photoelectron spectrometer is used for measuring angle-resolved laser photoelectron spectroscopy. The photoelectrons are guided to the photoelectron spectrum region by the repulsive force exerted by the compensation electrode, which generates photoelectrons after the ionized laser and cluster ions act, and the compensation electrode arranged in the vertical direction also ensures that the measurement of the photoelectron spectrum does not influence the annular motion of beam current. The invention has the advantages that the intensity of a target cluster is improved in an order of magnitude by using the electrostatic ion storage ring, and the decoupling of the operating frequency of the ionization laser system of the low-temperature ion trap and the VMI is realized, so that the high repetition frequency of laser and even continuous operation are fully exerted on the premise of ensuring the effective temperature control of the ions to be researched, and the device can replace an FFLs light source with a relatively weak VUV light source such as HHG of a laser femtosecond pump to realize the measurement of the cluster deep energy level full spectrum. The research on the full electronic configuration structure of the transition metal cluster is realized, and the angle-resolved photoelectron spectroscopy is used as a powerful tool for researching the cluster structure to complete measurement in a VUV region, so that the complete valence band structure of the metalloid cluster and the evolution along with the size can be disclosed for the first time. The time-resolved measurement of the transition metal chemical reaction process is realized, and high-energy photons are utilized to simultaneously detect cluster cations and anions, so that the influence of the charge state of the cluster on the chemical reaction can be directly researched. By utilizing femtosecond-pumping detection spectrum, the dynamic process of valence electrons and shallow atomic-real electron excited states can be simultaneously detected by using high-energy photons, and further the contribution of shallow atomic-real to chemical reaction can be researched. The invention combines the electrostatic storage ring and the VMI, and realizes the system measurement of the cluster and the molecular medium-deep energy level electronic structure by using femtosecond laser, HHG technology and desktop type equipment in a laboratory.
Drawings
Features, advantages and technical effects of exemplary embodiments of the present invention will be described below with reference to the accompanying drawings.
FIG. 1 is an overall design layout of the present invention.
FIG. 2 is a schematic diagram of the design layout of the vacuum system of the present invention.
FIG. 3 shows a parallel injection mode in the electron optical system of the present invention.
FIG. 4 shows a vertical injection mode in the electron optical system of the present invention.
Fig. 5 is a schematic diagram of the layout of the electron optical elements of the beam transport and mass screening unit according to an embodiment of the present invention.
Fig. 6 is a schematic layout diagram of the electron optical elements of the beam temperature control unit in the parallel mode according to an embodiment of the present invention.
Fig. 7 is a schematic layout diagram of the electron optical elements of the beam temperature control unit in the vertical mode according to an embodiment of the present invention.
Fig. 8 is a schematic layout diagram of the electron optical elements of the linear beam transport and guide unit in the parallel mode according to an embodiment of the present invention.
Fig. 9 is a schematic layout diagram of the electron optical elements of the linear beam transport and guide unit in the vertical mode according to an embodiment of the present invention.
FIG. 10 is a schematic diagram of the layout of electron optical elements of the vertical beam current storage and photoelectron spectroscopy cell in accordance with an embodiment of the present invention.
Wherein the reference numerals are as follows:
1-magnetron sputtering source;
2-quadrupole mass selector;
3-a low temperature ion trap;
4.1-beam shaping; 4.2-beam shaping;
5-a differential pumping cavity;
6.1-90 degree deflector; 6.2-90 degree deflector; 6.3-90 degree deflector; 6.4-90 degree deflector;
7.1-microchannel plate detector; 7.2-microchannel plate detector; 7.3-microchannel plate detector; 7.4-microchannel plate detector;
8-VMI；
9.1-femtosecond laser system; 9.2-HHG unit.
A-pre-pumping preceding stage vacuum unit; b-an ultra-high vacuum unit; c-a molecular pump serial pumping unit; d-an ultra-high vacuum unit; a large-pumping-speed roots pump with the speed of P1-600m 3/s; P2-2200L/s semi-magnetic rotary floating molecular pump;
P3-1200L/s magnetic floating molecular pump; P4-1200L/s magnetic floating molecular pump;
P5-1200L/s semi-magnetic rotary floating molecular pump; P6-700L/s semi-magnetic rotary floating molecular pump;
P7-300L/s magnetic floating molecular pump; P8-300L/s magnetic floating molecular pump; P9-300L/s magnetic floating molecular pump; P10-300L/s magnetic floating molecular pump; P11-2200L/s semi-magnetic floating molecular pump; P12-2200L/s semi-magnetic floating molecular pump; a P13-2000L/s composite adsorption ion pump; V1-CF100 gate valve; V2-CF63 gate valve.
E-beam transmission and quality screening unit; f-beam temperature control unit; g-a linear beam shaping and guiding unit;
an H-beam storage and photoelectron spectroscopy unit; f1-support flange of low temperature ion trap;
f2-flange at the connection of the square cavity where the low-temperature ion trap is located and the rear end cavity.
Detailed Description
As used in the specification and in the claims, certain terms are used to refer to particular components. As one skilled in the art will appreciate, manufacturers may refer to a component by different names. This specification and claims do not intend to distinguish between components that differ in name but not function. In the following description and in the claims, the terms "include" and "comprise" are used in an open-ended fashion, and thus should be interpreted to mean "include, but not limited to. "substantially" means within an acceptable error range, and a person skilled in the art can solve the technical problem within a certain error range to substantially achieve the technical effect.
Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the present invention, unless otherwise expressly specified or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
The present invention will be described in further detail with reference to fig. 1 to 10, but the present invention is not limited thereto.
The deep energy level photoelectron spectrum research device based on the electrostatic storage ring comprises a magnetron sputtering source 1, a temperature control device and a temperature control device, wherein the magnetron sputtering source is used for providing a high-current-intensity and temperature-controllable metal/semiconductor cluster ion beam; the quadrupole rod mass selector 2 is used for carrying out mass screening on the cluster ion beam emitted by the magnetron sputtering source 1; the low-temperature ion trap 3 is used for carrying out temperature control on the cluster ion beam with the mass screened by the quadrupole rod mass selector 2; the beam optical shaping section 4 is used for accelerating and shaping cluster ion beams with certain mass and temperature emitted from the low-temperature ion trap 3 and injecting the cluster ion beams into the electrostatic storage ring; the electrostatic storage ring 6 is used for restraining the beam to do annular motion and simultaneously improving the beam intensity in an order of magnitude; the vertical distribution electric field compensation type speed image photoelectron spectrometer 8 is used for measuring the angle-resolved laser photoelectron spectrum and enabling the measurement of the photoelectron spectrum not to influence the annular motion of beam current through a compensation electrode arranged in the vertical direction. Specifically, the invention comprises a magnetron sputtering source 1, a quadrupole mass selector 2, a low-temperature ion trap 3, a beam optical shaping 4, an electrostatic ion storage ring 6 and a vertical distribution electric field compensation type speed image photoelectron spectrometer 8, wherein the magnetron sputtering source 1 is used as a main cluster source and has the advantages of strong current, controllable temperature range of 77K-198K and various cluster generation types. The cluster has a considerable size distribution after being generated from the source, the cluster enters the low-temperature radio frequency ion trap after being subjected to mass selection through a quadrupole mass selector 2 with high transmittance and large mass range, and the cluster is cooled to about 5K in the trap, so that the requirement of the measurement of a rear-end high-precision spectrum on the temperature is ensured. Meanwhile, the temperature of the cluster can be effectively controlled to be changed randomly from 5K to 300K, and the purposes of temperature-changing spectrum measurement and phase-changing research are further achieved. The clusters are injected and stored in a small-sized desktop electrostatic ion storage ring after being extracted from the ion trap, the clusters with single mass and controllable temperature after mass selection can be accumulated in the ring to very high beam intensity through repeated injection, and then the extreme ultraviolet ionization laser is operated under very high frequency, so that the photoelectron energy spectrum intensity is improved.
In some embodiments, the device is classified according to system functions, and can be classified into a vacuum system and an electron optical system. The vacuum system comprises vacuum acquisition and vacuum difference, wherein the vacuum acquisition is divided into four parts of a pre-vacuumizing unit A, an ultrahigh vacuum unit B, a molecular pump serial-pumping unit C and an ultrahigh vacuum unit D according to the vacuum degree, wherein the number of the pre-vacuumizing unit A is 10-1Pa, and an ultrahigh vacuum unit B for providing ultrahigh vacuum for the magnetron sputtering source 1, the quadrupole mass selector 2, the low-temperature ion trap 3 and the linear beam transmission and guide beam optical unitAnd (4) using the environment in a null mode. Vacuum degrees are respectively 10-6Pa，10-6Pa，10-7Pa，10- 7Pa. Molecular pump series pumping unit C for ultra-high vacuum unit D to improve high vacuum pre-pumping environment 10-5Pa, the extreme high vacuum unit D provides an extreme high vacuum using environment for the electrostatic storage ring, and 2 x 10 is realized in the storage ring cavity through a differential vacuum acquisition system and a molecular pump serial pumping technology-9Pa of extremely high vacuum. The electron optical system is divided into a beam transmission and quality screening unit E, a beam temperature control unit F, a linear beam shaping and guiding unit G and a beam storage and photoelectron spectroscopy unit H.
The beam transmission and quality screening unit E guides the cluster beam generated in the magnetron sputtering source 1 to the quadrupole rod quality selector 2 and performs quality screening. The exit diaphragm is used as a first-stage extraction lens, the ion guide rod and the end mirror are second-stage extraction lenses, the front lens and the rear lens of the quadrupole mass selector 2 are third-stage extraction lenses, and the mass separation and the intensity of generated cluster particles can be adjusted and precise mass screening can be performed by adjusting beam current adjusting parameters such as sputtering power P and He/Ar flow of the magnetron sputtering source 1, target outlet distance L, diaphragm opening D, RF frequency and amplitude of the ion guide rod, extraction field gradient, quadrupole mass selector 2RF and DC amplitude and the like.
In the deep-level photoelectron spectroscopy research device based on the electrostatic storage ring according to the invention, the vacuum environment of the magnetron sputtering source 1 is 10-6Pa, vacuum environment of the quadrupole mass selector 2 is 10-6Pa, the square cavity in which the low-temperature ion trap 3 is positioned is 10-6Pa, the vacuum environment of the beam optical shaping section is 10-7Pa, vacuum chamber of electrostatic storage ring is 10-9Pa。
In the deep-energy-level photoelectron spectroscopy research device based on the electrostatic storage ring, the magnetron sputtering source 1 is a source outlet diaphragm which has a 15-degree deviation angle with the axis and is used for separating charged ions from neutral particles.
In the electrostatic storage ring based deep level photoelectron spectroscopy research apparatus according to the present invention, the quadrupole mass selector 2 is provided with quadrupole ion guide and quadrupole mass screening. Utensil for cleaning buttockThe mass selector of the quadrupole rod is a quadrupole rod ion guide rail combined with the quadrupole rod mass selector, wherein the quadrupole rod ion guide rail has a diameter r010mm long L132 mm stainless steel rod according to r0And the/r is 1.1487, and the ion guide rail also comprises a stainless steel electrode plate with the outer diameter of 35mm, the inner diameter of 5mm and the thickness of 1.5mm, and the stainless steel electrode plate is used for extracting cluster ion beams emitted from the magnetron sputtering source. The quadrupole rod mass screening is provided with a front ion guide rod and a rear ion guide rod and a mass analysis rod, the upper limit of the distinguishable mass is 4000amu, and the upper limit of the mass resolution is 1500.
In the deep energy level photoelectron spectroscopy research device based on the electrostatic storage ring, the low-temperature ion trap 3 is provided with an injection section, a temperature control section and a leading-out section, wherein the injection section comprises a group of electrostatic focusing lenses, a group of electrostatic deflection lenses, a group of electrostatic focusing lenses and a group of electrostatic quadrupole deflection lenses which are sequentially arranged, and is used for accelerating and shaping the cluster ion beam emitted from the quadrupole mass selector 2 and injecting the cluster ion beam into the temperature control section; the temperature control section comprises a quadrupole rod and an end cover electrode, the quadrupole rod is used for limiting radial movement of the cluster ion beam, and the end cover electrode is used for limiting axial movement of the cluster ion beam; the extraction section comprises an accelerating lens group and an end cover electrode and is used for storing the rapid extraction of the cluster ion beam current and controlling the extraction kinetic energy distribution and the spatial distribution of the cluster ion beam current. The accelerating lens group consists of 19 stainless steel lenses with the thickness of 2mm, the outer diameter of which is 36mm, and the inner diameter of which is 3-12mm, which are non-uniformly and gradiently increased, wherein each group is indirectly at the same potential, and the two groups are connected with opposite potentials, so that a uniform gradient electric field with controllable 0- +/-200V distribution is realized.
In this embodiment, the injection section of the beam temperature control unit F is to perform spatial shaping on the cluster beam after accurate mass screening through an electrostatic focusing lens and an electrostatic deflection lens, and deflect the cluster beam to a quadrupole rod beam detector through 90 ° by the electrostatic quadrupole deflection lens to perform signal measurement or guide the cluster beam to the low-temperature ion trap 3 for next-step beam temperature control, wherein the faraday cage is used to detect the beam intensity led out by the source line to optimize the beam adjustment parameters. The temperature control section of the beam temperature control unit F is a radio frequency quadrupole ion trap and consists of a quadrupole rod and an end cover electrode, the quadrupole rod limits the radial motion of the cluster ion beam, the end cover electrode limits the axial motion of the cluster ion beam, and the stored cluster ions collide with helium atoms cooled by the cold head to realize the temperature control of 4-300 +/-1K. The leading-out section of the beam temperature control unit F consists of an accelerating lens group and an end cover electrode in the low-temperature ion trap 3, the rapid change of the electric potential between the electrodes is controlled through a time sequence, and the switching time is less than 100ns and is used for storing the rapid leading-out of the cluster ion beam to control the leading-out kinetic energy distribution and the spatial distribution of the cluster ion beam.
The linear beam transmission and guide unit G is divided into cluster ion beam cluster length control and cluster ion beam flow energy control, which are completed by a pulse acceleration and deceleration field and a direct current acceleration field, and because the kinetic energy of particles of the beam led out from the low-temperature ion trap 3 is smaller and smaller, after the beam is transmitted for a long distance, the particles at the back can exceed the particles at the front, so that the beam is elongated, and the acceleration and deceleration of the beam are required to be controlled to control the beam length. The accelerating electric field in the low-temperature ion trap 3 serves as a first-stage pulse accelerating field, the Wiley-Mclean lens serves as a second-stage pulse accelerating field, the reference flight tube serves as a third-stage pulse accelerating field, the beam current is accelerated by direct current and then completely enters the reference flight tube without gradient, the beam current is rapidly converted into another potential (about 100ns) after entering the reference flight tube, the beam current is accelerated at the outlet of the reference flight tube due to the fact that the outlet is referenced to the ground, and the direct current accelerating lens group 1 and the direct current accelerating lens group 2 improve beam current kinetic energy based on a voltage stabilizing field. The electrostatic focusing lens and the deflection lens are used for controlling the space shape of the beam current, so that the beam current transmission is facilitated. The beam kinetic energy injected into the storage ring is ensured to be more than 5KeV, the length is less than 450mm, and the beam spot diameter is less than 8 mm.
The beam storage and photoelectron spectroscopy unit H consists of an electrostatic storage ring 6 and a vertical electric field compensated velocity imaging photoelectron spectrometer 8, a significant feature of the electrostatic storage ring compared to magnetic storage rings is that there is in principle no limit to the mass of ions that can be stored in such rings, and the electrostatic ring also benefits from the anhysteretic effect and remanence. The Velocity image (VMI) photoelectron spectroscopy instrument has the characteristics of simple structure, high precision, large photoelectron generation area and the like, and compared with the traditional flight time type photoelectron spectroscopy instrument (such as a magnetic bottle type photoelectron spectroscopy instrument), the photoelectron spectroscopy of the VMI is realized by measuring the space distance of the same center of a photoelectron signal falling point on a photoelectron detector, the continuous measurement and accumulation of signals can be realized, and the purpose of measuring cluster deep-level high-precision photoelectron spectroscopy by using free electron laser by organically combining an electrostatic storage ring and the VMI is realized by using low-flux HHG laser. The internal elements of the electrostatic storage ring are distributed into a square structure, four groups of 90-degree deflectors are used for beam storage, four groups of micro-channel detectors are used for beam intensity detection, each group of deflectors consists of a 90-degree electrostatic quadrupole deflection lens and an electrostatic focusing lens, and the potential relation between the 90-degree electrostatic quadrupole deflection lens and the electrostatic focusing lens is adjusted, so that stable storage (second magnitude) of beams in the storage ring can be realized. The four groups of detectors are respectively used for detecting the beam intensity injected into the storage ring and the beam intensity in the motion direction in the process of the surrounding motion, when the surrounding beam intensity is measured to reach more than 8nA, the ionization laser of the VMI starts to work at a very high frequency, and the signals are accumulated based on time through the MCP above the VMI, so that the high-intensity deep energy level photoelectron spectrum is finally obtained.
In the deep-level photoelectron spectroscopy research device based on the electrostatic storage ring, the vacuum chamber of the electrostatic storage ring is a stainless steel square chamber. The vacuum chamber is a 316LN stainless steel square chamber with the length of 1 meter, the width of 1 meter and the height of 0.35 meter, and the vacuum chamber comprises four stages of vacuum serial pumping technology to realize 2 multiplied by 10-9Pa, the first stage is a preceding stage vacuum pipeline, and the vacuum degree is 2 × 10-1Pa; the second stage is a molecular pump at the front stage, and the vacuum degree is 2 multiplied by 10-5Pa; the third stage is main molecular pump set to reach vacuum degree of 2X 10-8Pa; the fourth stage is a compound adsorption ion pump, and the vacuum degree is 2 multiplied by 10-9Pa。
Based on a quadrupole mass selector 2, a low-temperature ion trap 3 and a single mass formed after beam optical shaping, the temperature is accurate, the beam length is less than 450mm, the beam spot is less than 8mm, cluster beams with the beam kinetic energy of about 5KeV are injected into a storage ring, the potential of a 4 multiplied by 90-degree deflector in the storage ring is adjusted to enable the beams to be stably stored, the cluster ion beams stored in the storage ring reach a quasi-continuous motion state through repeated injection, so that the photoelectron spectrum ionized laser can run at a very high frequency, the measurement efficiency of the photoelectron spectrum is greatly improved, and the frequency dependence relationship between the operating frequency of the ionized laser and the cluster generation, temperature control and transmission in the traditional free ion low-temperature photoelectron spectrum is decoupled.
The vertical distribution electric field compensation type velocity image photoelectron spectrometer (VMI) reduces the influence of the existence of the VMI on the motion of the storage beam by setting a compensation electric field, and the photoelectron spectrum of the VMI is realized by measuring the space distance of the photoelectron signal falling point concentric with the center of the photoelectron detector, so that the continuous measurement and accumulation of signals can be realized, and the vertical mode is designed to organically combine the beam storage with the measurement of the photoelectron spectrum.
Referring to fig. 1, cluster ions generated in a magnetron sputtering source 1 are guided to a quadrupole mass selector 2 through an ion guide rail for mass screening, then injected into a low-temperature ion trap 3 through a beam shaping and deflection lens for beam temperature control, and the cluster beams subjected to precise mass screening and temperature control are injected into an electrostatic storage ring 6 after being subjected to a series of acceleration and shaping 4, wherein the kinetic energy of the injected beams is 5KeV, the beam rigidity is improved, the influence of space charge effect on the beam storage time when the beams surround is reduced, the length of the injected beams is less than 720mm (the length of a single arm of a 90-degree electrostatic deflector), and the size of the beam spots is compressed to be less than 8mm, so that the influence of a fringe electric field is prevented. The electrostatic storage ring 6 comprises a 90-degree electrostatic deflector and a micro-channel detector 7 for measuring the shape/intensity of cluster ion beam current, which are respectively used for beam current deflection storage and beam current detection, and the VMI 8 measures the space distance of the photoelectron signal falling point of the photoelectron detector concentric to realize the continuous measurement and accumulation of signals, and when the surrounding beam current is accumulated to a certain intensity and is close to the quasi-continuous beam current, the ionized laser 9 is operated at a very high frequency to realize the accumulation of weak light single pulse on time to meet the measurement which can only be finished on high-flux light pulse at present.
Referring to FIG. 2, the vacuum system is divided into a pre-evacuation pre-stage vacuum unit A, an ultra-high vacuum unit B and a molecular pump serial evacuation unit according to usageUnit C and extreme high vacuum unit D four parts: as shown by the connection line in FIG. 2, the pre-pumping pre-stage vacuum unit A provides a primary (coarse) vacuum environment for the post-stage ultra-high vacuum and ultra-high vacuum system to reduce the pressure of the post-stage molecular pump and prolong the service life thereof, and the mechanical structure comprises a pre-pumping pipeline (three sections of 16m in total and 150mm in diameter) and 1.2m3Mechanically reinforced high vacuum surge tank, through 600m3Implementation 10 of/s high-pumping-speed roots pump P1-1Pa, coarse degree of vacuum. The ultrahigh vacuum unit B provides an ultrahigh vacuum using environment for the magnetron sputtering source 1, the quadrupole mass selector 2, the low-temperature ion trap 3 and the beam optical shaping 4. All the materials are selected to have good processing performance and are suitable for the ultrahigh vacuum environment, the manufacturing materials of the cavity are mainly 316LN stainless steel with the surface subjected to solution treatment, the flange and the internal supporting material are mainly 304L stainless steel with the surface subjected to solution treatment, and after the cavity is processed, dehydrogenation, electrolytic polishing and high-temperature baking degassing treatment are carried out. After 72h of vacuum baking and leakage detection, the cavity of the magnetron sputtering source 1 carrying the semi-magnetic rotary floating molecular pump P2 with the pumping speed of 2200L/s reaches 10-6Pa, the ultra-high vacuum degree, the cavity of the quadrupole rod mass selector 2 carrying the magnetic rotary floating molecular pump P3 with the pumping speed of 1200L/s reaches 10-6Pa, ultra-high vacuum degree, low-temperature ion trap 3 cavity with pumping speed of 1200L/s magnetic rotary floating molecular pump P4 reaching 10-7Pa, ultra-high vacuum degree, linear beam transmission and beam guidance optical section cavity with pumping speed of 1200L/s half magnetic rotary floating molecular pump P5 and pumping speed of 700L/s half magnetic rotary floating molecular pump P6 reaching 10-7Pa of ultra-high vacuum degree. The molecular pump serial pumping unit C carries a semi-magnetic rotary floating molecular pump P7 with the pumping speed of 300L/s for providing a high vacuum front stage 10 for the ultra-high vacuum unit D-5Pa, according to the differential pumping and molecular pump serial pumping technology, after continuously baking for several weeks, finally realizing 2 x 10 in the storage ring cavity-9The extreme high vacuum degree of Pa is used for increasing the free path of gas molecules and further reducing the collision frequency among molecules, so that the beam current is more stably stored in the ring. The vacuum cavity is 1 × 1 × 0.55m3Due to the requirement of extremely high vacuum, the processing of the cavity not only adopts the technical requirement of the ultra high vacuum processing, but also needs to pay special attention to the number of welding seams, the processing and the vacuum sealing mode, and in addition, the processing and the vacuum sealing mode are realizedBesides, it also has a differential pumping cavity 5 and two small-sized detector cavities, and two semi-magnetic rotary-float molecular pumps with pumping speed of 2200L/s P11 and P12 as main molecular pump and three semi-magnetic rotary-float molecular pumps with pumping speed of 300L/s P8, P9 and P10 as auxiliary molecular pumps are mounted to implement 2X 10-8Pa ultrahigh vacuum, 2 x 10 realized by carrying a compound ion pump P13 with pumping speed of 2000L/s-9Pa of very high vacuum.
In addition to the above vacuum pickup unit, the vacuum system is constituted by a differential system in which a differential hole having a diameter of 5mm and a length of 3mm is provided between 1 and 2, a differential hole having a diameter of 10mm and a length of 5mm is provided between 2 and 3, a CF100 gate valve V1 and a diameter of 10mm are provided between 3 and 4, a differential hole having a length of 5mm is provided between 4 and 5, a CF63 gate valve V2 and a diameter of 10mm are provided between 4 and 5, a differential hole having a length of 5mm is provided between 5 and 6, and a differential hole having a diameter of 10mm and a length of 5mm is provided between 5 and 6.
Referring to fig. 3 and 4, two working modes are designed based on beam injection of a Wiley-Mclaren lens, fig. 3 is a parallel mode, a cluster beam after mass selection is deflected to a low-temperature ion trap 3 by an electrostatic quadrupole deflection lens through 90 degrees, and an emergent beam in the trap is injected into a double-stage pulse field along the axial direction; fig. 4 shows a vertical mode, in which the mass-selected cluster beam is directly injected into the low-temperature ion trap 3, and the beam exiting from the trap is injected into the center of the pulse field along the vertical axis. Two modes were compared: the parallel mode is convenient for beam detection after quality selection, and the Wiley-Mcraren lens has high axial receiving degree, so that the current is strong; the vertical mode is applied to a high-resolution mode, and the emitted beam current in the trap has small energy dispersion in the axial direction, small spatial distribution and low current intensity.
The way to switch the two modes without replacing the chamber is as follows:
with reference to fig. 3 and 4, the two modes are switched by adjusting the orientations of two eccentric flanges, namely the supporting flange F1 of the low-temperature ion trap 3 and the flange F2 at the junction of the square cavity where the low-temperature ion trap 3 is located and the back-end cavity, as follows: f1, the size of the outer flange is 16 inches in diameter, the size of the inner flange is 10 inches in diameter, the upper and lower eccentricity is 59mm, and the left and right eccentricity is 33.75 mm; the size of the F2 outer flange is 16 inches in diameter, the size of the inner flange is 10 inches in diameter, the upper part and the lower part are concentric, and the left part and the right part are eccentric by 30 mm. When the parallel mode is adopted, F1 is adjusted to be eccentric to 59mm above the right 33.75mm, F2 is adjusted to be eccentric to the right 30mm, and when the vertical mode is switched, F1 and F2 are turned by 180 degrees clockwise respectively.
With reference to fig. 3 and 4, the electron optical system according to the present invention is divided into a beam transmission and quality screening unit E, a beam temperature control unit F, a linear beam shaping and guiding unit G, and a beam storage and photoelectron spectroscopy unit H.
Referring to fig. 5, a beam transport and mass screening unit E is used to guide the cluster beam generated by the magnetron sputtering source 1 to the quadrupole mass selector 2 and perform mass screening. The outlet diaphragm of the magnetron sputtering source 1 is a first-stage extraction electrode and is matched with an end mirror of a quadrupole ion guide rail to guide cluster beams to the ion guide rail. Wherein the diameter of the diaphragm can be adjusted within the range of 1.5-23mm, and the diaphragm is inclined by 15 degrees, so as to filter neutral particles generated in the magnetron sputtering source 1 and prevent the neutral particles from influencing the transmission of the charged cluster ions; ion guide rail diameter r010mm long L132 mm stainless steel rod according to r0And the/r is 1.1487, the end mirror is 35mm in outer diameter and 5mm in inner diameter, and the electrode plate with the thickness of 1.5mm is positioned at the front end of the rod by 85 mm.
Referring to fig. 6 and 7, fig. 6 and 7 show a beam temperature control unit F in a parallel mode and a vertical mode, respectively, which is divided into an injection section, a temperature control section, and a lead-out section.
The injection section in fig. 6 is composed of an electrostatic focusing lens 1, a differential electrode, an electrostatic deflecting lens 1, an electrostatic focusing lens 2, and an electrostatic quadrupole deflecting lens in sequence, and is used for accelerating and shaping the cluster ion beam emitted from the quadrupole mass selector 2 and then injecting the cluster ion beam into the temperature control section. The electrostatic focusing lens 1 consists of three electrodes, the electrodes at two ends are the same in shape, the outer diameter of the outer brim is 58mm, the thickness of the outer brim is 3mm, the outer diameter of the inner tube is 44mm, and the length of the inner diameter of the whole lens is 40mm and 26 mm; the middle lens shape is that both sides are outer eaves external diameter 58mm, and thick 3mm, and the centre is inner tube external diameter 44mm, and whole internal diameter 40mm length 45mm, the design outer eaves are used for the fringing electric field to shield, and every inter-electrode distance is 3 mm. The differential electrode has the outer diameter of 58mm, the thickness of 3mm and the middle aperture of 10mm, and is used for vacuum differential pumping and beam guiding between the quadrupole rod cavity and the 3-square cavity of the low-temperature ion trap. The electrostatic deflection lens 1 is composed of four half-moon-shaped electrodes, each two electrodes form a pair of deflection electrodes in a single direction (X or Y), the gap is 20mm, and the gap of each pair of electrodes is 2 mm. The electrostatic focusing lens 2 is in a shielding type flying tube structure, the whole outer diameter is 58mm, the thickness of a middle focusing electrode is 26mm, the lengths of two ends are 90mm, and the electrode shielding adopts an L-shaped buckling brim to compensate the focusing effect of the electrostatic focusing lens 1 so as to meet the condition that a beam enters the Bender. The electrostatic quadrupole deflection lens consists of a group of 90-degree deflection electrodes and four groups of focusing electrode plates, wherein the outer diameter of each deflection electrode is 28mm, a round rod with the length of 40mm is spliced into a square structure with the side length of 38mm after cutting four lobes by two central lines which are perpendicular to each other, the focusing electrode plates consist of three electrode plates with the length of 38mm, the width of 50mm, the thickness of 1.5mm and the central aperture of 6mm, and the distance between the electrode plates is 1 mm. The Faraday cylinder is used for detecting the beam guided to the electrostatic quadrupole deflection lens on a source line, the quadrupole rod beam detector is used for detecting the cluster ion strength after the mass selection, the potential of the 90-degree deflection electrode is reversed, and the beam can be guided to the temperature control section.
The temperature control section comprises a quadrupole rod and end cover electrodes, the diameter of the rod is 8mm, the length of the rod is 154mm, the quadrupole rod limits radial movement of the cluster ion beam, the end cover electrodes are all 36mm in outer diameter, 6mm in inner hole and 1.5mm in thickness, axial movement limitation exists on the cluster ion beam, and stored cluster ions collide with helium atoms cooled by the cold head to realize temperature control of 4-300 +/-1K.
The leading-out section consists of an accelerating lens group and an end cover electrode and is used for storing the rapid leading-out of the cluster ion beam to control the leading-out kinetic energy distribution and the spatial distribution of the cluster ion beam, wherein the accelerating lens group consists of 19 electrode plates with the external diameter of 36mm and the internal diameter of 6-24mm, the thickness of the electrode plates is 2mm, the non-uniform gradient of the electrode plates is increased, each group has the same indirect potential, and the two groups are connected with opposite potentials, so that the uniform gradient electric field with the controllable distribution of 0 +/-200V is realized.
In fig. 7, the injection section is composed of an electrostatic focusing lens 1, a differential electrode, and an electrostatic deflection lens 1 in sequence, and the temperature control section and the lead-out section are in the same parallel mode.
Referring to fig. 8 and 9, fig. 8 and 9 show a linear beam transporting and guiding unit G in a parallel mode and a vertical mode, respectively, which is divided into a cluster ion beam length control section and a cluster ion beam flowing energy control section.
The length and kinetic energy control of the cluster ion beam cluster shown in fig. 8 is composed of a Wiley-Mclaren lens WM, a direct current accelerating lens group 1, an electrostatic focusing lens 3, an electrostatic deflecting lens 2, a long focusing lens, an electrostatic focusing lens 5, a direct current accelerating lens group 2, a reference flight tube, an electrostatic focusing lens 6, an electrostatic deflecting lens 3, an electrostatic focusing lens 7 and an electrostatic deflecting lens 4, wherein the kinetic energy of particles in the front of the beam led out from the low-temperature ion trap 3 is smaller, and after the beam is transmitted for a long distance, the particles in the back of the beam exceed the particles in the front of the beam, so that the beam is lengthened. Designing a three-level pulse acceleration and deceleration field and two groups of direct current acceleration lens groups, controlling the beam length while accelerating the beam, wherein an acceleration electric field in a low-temperature ion trap 3 is used as a first-level pulse acceleration field, WM is used as a second-level pulse acceleration and deceleration field, a reference flight tube is used as a third-level pulse acceleration field and is a flight tube with the outer diameter of 38mm, the inner diameter of 35mm and the length of 450mm, the beam enters the reference flight tube completely without gradient after being accelerated by direct current, and is rapidly converted into another potential (-100 ns), because an outlet is referenced to the ground, the beam is accelerated at an outlet of the reference flight tube, the direct current acceleration lens group 1 consists of 4 direct current accelerators with the outer diameter of 60mm, the inner diameter of 20mm and the distance between every two electrode plates with the thickness of 3.5mm, and is formed by 1M omega resistor partial pressure, the kinetic energy of the beam is improved to about 200eV by the direct current acceleration lens group 1, and the direct current acceleration lens group 2 consists of 10 outer diameters of 60mm, the inner diameter is 20mm, the electrode slices with the thickness of 3.5mm are separated by two by 5mm, and the kinetic energy of the beam is improved to about 2KeV through the direct current accelerating lens group 1 by a direct current accelerator formed by 1M omega resistor partial pressure. The electrostatic focusing lenses 3, 5, 6 and 7 and the electrostatic deflection lenses 2, 3 and 4 are used for controlling the space shape of beam current and facilitating beam current transmission, wherein the electrostatic focusing lens 3 consists of three electrodes, the first two electrodes are same in shape, the outer diameter of the outer brim is 58mm, the thickness of the outer brim is 3mm, the outer diameter of the middle inner tube is 44mm, and the length of the whole inner diameter is 40 mm; the third electrode shape is that both sides are outer eaves external diameter 58mm, and thick 3mm, and the centre is inner tube external diameter 44mm, and whole internal diameter 40mm length 200mm, every inter-electrode distance is 5 mm. The electrostatic focusing lens 5 has the same electrode shape as the electrostatic focusing lens 2. The electrostatic focusing lens 6 is composed of three electrodes, each electrode is identical in shape, the two sides of each electrode are 58mm in outer diameter of the outer eaves, the thickness of each electrode is 3mm, the middle of each electrode is 44mm in outer diameter of the inner tube, the whole inner diameter is 40mm, the length of each electrode is 36mm, and the distance between the electrodes is 5 mm. The overall outer diameter of the electrostatic focusing lens 7 is 38mm, the thickness of the middle focusing electrode is 26mm, and the lengths of the two ends are 90 mm. The shape of the electrodes of the electrostatic deflection lenses 2, 3 and 4 is the same as that of the electrostatic deflection lens 1, the long focusing lens is five electrodes with the outer diameter of 60mm, the inner diameter of 40mm and the length of 16mm, the distance between every two electrodes is 5mm to form a direct current acceleration and deceleration field, and the focusing of the acceleration field and the defocusing of the deceleration field are carried out by referring to the design of an optical retrofocus objective so as to increase the focal length of the lens. And shielding outer eaves with the outer diameter of 80mm and the inner diameter of 40mm and the outer diameter of 50mm and the inner diameter of 30mm and the gap of 40mm are respectively added at the positions 2mm and 2mm away from the two sides of the sealing baffle plates of V1 and V2 to shield the influence of the ground on the beam current electric field. Finally, after the beam passes through the unit, the kinetic energy is improved to 5KeV, the beam cluster length is controlled to be below 200mm, and the beam spot size is controlled to be below 8 mm.
The cluster ion beam cluster length control section shown in fig. 9 is composed of a Wiley-Mclaren lens WM, a dc accelerating lens group 1, an electrostatic focusing lens 3, an electrostatic focusing lens 4, an electrostatic deflecting lens 2, a long focusing lens, and an electrostatic focusing lens 5 in this order. The electrostatic focusing lens 4 is used for compensating the focusing effect of the electrostatic focusing lens 3, the overall outer diameter is 58mm, the thickness of the middle focusing electrode is 26mm, and the lengths of the two ends are 160 mm. The cluster ion beam flow can control the same parallel mode of the sections.
Referring to fig. 10, the storage ring unit is composed of four groups of 90 ° deflectors 1, 2, 3, 4 and four groups of microchannel plate multipliers 1, 2, 3, 4, each group of deflectors is composed of 90 ° electrostatic quadrupole deflectors and electrostatic focusing lenses, wherein a cylinder with an outer diameter of 90mm and a length of 150mm is cut by mutually perpendicular central lines to form a square center with a side length of 120mm, each lobe is surrounded by an L-shaped shielding electrode with a side length of 51mm, a thickness of 6mm, a height of 160mm and a distance of 7mm, a position 6mm away from the shielding electrode is 65mm, a thickness of 8mm, a height of 190mm and an L-shaped grounding plate, the side lengths are matched with 180mm, and upper and lower plates with a thickness of 18mm form a group of electrostatic quadrupole deflectors. The electrostatic focusing lens is composed of two side electrodes with the outer diameter of 74mm, the inner diameter of 72mm and the length of 20mm and a central electrode with the outer diameter of 74mm, the inner diameter of 72mm and the length of 120mm, the whole electrostatic focusing lens is positioned in a 100-mesh shielding sieve with the inner diameter of 100mm, and a 90-degree deflector is used for restraining the periodic motion track of cluster ion beam current and ensuring that the electrostatic focusing lens can be stored for a long time (second magnitude). The four groups of detectors respectively consist of a front/back polar plate (MCP fixed) with the outer diameter of 60mm, the inner diameter of 27mm and the thickness of 2mm and a conical anode with the outer diameter of 60mm, the thickness of 10mm and the angle of 45 degrees and the distance from the back polar plate of 1mm, and are respectively used for detecting the beam intensity injected into the storage ring and the beam intensity in the moving direction in the process of circular movement.
Variations and modifications to the above-described embodiments may also occur to those skilled in the art, which fall within the scope of the invention as disclosed and taught herein. Therefore, the present invention is not limited to the above-mentioned embodiments, and any obvious improvement, replacement or modification made by those skilled in the art based on the present invention is within the protection scope of the present invention. Furthermore, although specific terms are employed herein, they are used in a generic and descriptive sense only and not for purposes of limitation.
Claims (9)
1. A deep energy level photoelectron spectroscopy research device based on an electrostatic storage ring is characterized by comprising:
the magnetron sputtering source is used for providing a high-current-intensity and temperature-controllable metal/semiconductor cluster ion beam;
the quadrupole rod mass selector is used for performing mass screening on the cluster ion beam emitted by the magnetron sputtering source;
the low-temperature ion trap is used for carrying out temperature control on the cluster ion beam with the mass screened by the quadrupole rod mass selector;
the beam optical shaping section is used for accelerating and shaping cluster ion beams with certain mass and temperature emitted from the low-temperature ion trap and injecting the cluster ion beams into the electrostatic storage ring;
the electrostatic storage ring is used for restraining the beam to do annular motion and simultaneously improving the beam intensity in an order of magnitude;
a vertical distribution electric field compensation type speed image photoelectron spectrometer is used for measuring angle-resolved laser photoelectron spectrums and enabling the measurement of the photoelectron spectrums not to influence the annular motion of beam current through compensation electrodes arranged in the vertical direction.
2. The device for researching deep energy level photoelectron spectroscopy based on the electrostatic storage ring as claimed in claim 1, wherein: the vacuum environment of the magnetron sputtering source is 10-6Pa, the vacuum environment of the quadrupole mass selector is 10-6Pa, the square cavity where the low-temperature ion trap is located is 10-6Pa, the vacuum environment of the beam optical shaping section is 10-7Pa, the vacuum chamber of the electrostatic storage ring is 10-9Pa。
3. The device for researching deep energy level photoelectron spectroscopy based on the electrostatic storage ring as claimed in claim 1, wherein: the magnetron sputtering source is a source outlet diaphragm, has a deflection angle of 15 degrees with the axis and is used for separating charged ions and neutral particles.
4. The electrostatic storage ring-based deep level photoelectron spectroscopy apparatus of claim 1, wherein: the quadrupole rod mass selector is provided with ion guide and mass screening, the ion guide is provided with a stainless steel electrode plate for extracting beam current, and the mass screening is provided with a front guide rod, a rear guide rod and a mass analysis rod.
5. The device for researching deep energy level photoelectron spectroscopy based on the electrostatic storage ring as claimed in claim 1, wherein: the low-temperature ion trap is provided with an injection section, a temperature control section and a leading-out section, wherein the injection section comprises a group of electrostatic focusing lenses, a group of electrostatic deflection lenses, a group of electrostatic focusing lenses and a group of electrostatic quadrupole deflection lenses which are sequentially arranged, and is used for accelerating and shaping cluster ion beams emitted from the quadrupole rod mass selector and then injecting the cluster ion beams into the temperature control section; the temperature control section comprises a quadrupole rod and an end cover electrode, the quadrupole rod is used for limiting radial movement of the cluster ion beam, and the end cover electrode is used for limiting axial movement of the cluster ion beam; the extraction section comprises an accelerating lens group and an end cover electrode and is used for storing the rapid extraction of the cluster ion beam current and controlling the extraction kinetic energy distribution and the spatial distribution of the cluster ion beam current.
6. The device for researching deep energy level photoelectron spectroscopy based on the electrostatic storage ring as claimed in claim 1, wherein: the vacuum chamber of the electrostatic storage ring is a stainless steel square chamber.
7. The device for researching deep energy level photoelectron spectroscopy based on the electrostatic storage ring as claimed in claim 1, wherein: the electrostatic storage ring comprises a four-stage vacuum serial pumping module for realizing extremely high vacuum degree.
8. The device for researching deep energy level photoelectron spectroscopy based on the electrostatic storage ring as claimed in claim 1, wherein: the inner elements of the electrostatic storage ring are distributed into square structures and used for restraining cluster ion beam current to perform periodic motion, and the electrostatic storage ring is provided with four micro-channel detectors which are respectively used for detecting beam current intensity injected in each direction.
9. The device for researching deep energy level photoelectron spectroscopy based on the electrostatic storage ring as claimed in claim 1, wherein: the vertical distribution electric field compensation type speed image photoelectron spectrometer is provided with a compensation electrode in the vertical direction, so that the measurement of the photoelectron spectrometer does not influence the annular motion of beam current.
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| JP3663716B2 (en) * | 1996-02-05 | 2005-06-22 | 株式会社日立製作所 | Quadrupole ion storage ring |
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| US9867272B2 (en) * | 2012-10-17 | 2018-01-09 | Cornell University | Generation and acceleration of charged particles using compact devices and systems |
| CN105632873B (en) * | 2014-10-28 | 2018-03-27 | 中国科学院大连化学物理研究所 | One kind is used for mass spectrographic ion optical path electrostatic convergence deviation device |
| CN107768230B (en) * | 2017-10-31 | 2023-12-19 | 天津智谱仪器有限公司 | Second-order proton transfer reaction ion source device and application method thereof |
| CN109887817A (en) * | 2019-04-03 | 2019-06-14 | 郭盘林 | A kind of beam bending device of electrostatic multi-path |
| CN110534385A (en) * | 2019-09-09 | 2019-12-03 | 中国科学院合肥物质科学研究院 | A kind of electric quadrupole lens group with integrated membrane-electrode stick |
| CN112951702B (en) * | 2019-12-10 | 2023-01-03 | 中国科学院大连化学物理研究所 | Ion control and transmission device for mass spectrometer |
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| US5451783A (en) * | 1993-03-26 | 1995-09-19 | Fisons Plc | Charged-particle analyser |
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| DE102016125585A1 (en) * | 2016-12-23 | 2018-06-28 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Optics for electrons from an object, use thereof in a spectrometer for X-ray photoelectron spectroscopy for electrons from an object and spectrometer |
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