CN114481040A - Laser pulse deposition system and method capable of monitoring laser process parameters in vacuum in situ - Google Patents
Laser pulse deposition system and method capable of monitoring laser process parameters in vacuum in situ Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Abstract
The invention discloses a laser pulse deposition system and a laser pulse deposition method capable of monitoring laser process parameters in a vacuum in-situ manner, wherein the system comprises a pulse laser light source, a light path structure, a vacuum in-situ laser energy monitoring module and a vacuum deposition module; the vacuum deposition module comprises a vacuum chamber, the vacuum chamber is provided with an incidence barrel, one end of the incidence barrel is communicated with the vacuum chamber, and the other end of the incidence barrel is provided with an incidence window; laser emitted by the pulse laser source is incident into the vacuum chamber through the incident window and the incident cylinder through the light path structure; the vacuum in-situ laser energy monitoring module is used for monitoring laser process parameters according to requirements. The vacuum energy monitoring probe in the vacuum chamber is controlled by the vacuum cable penetrating piece and the magnetic transmission rod to monitor the technological parameters such as laser energy, frequency, wavelength, average power and the like in the vacuum chamber in situ, so that the same vacuum energy of the laser in the same system processing in different time and batch processing processes is ensured, and the stable and reliable processing and the technological stability of the epitaxial film are realized.
Description
Technical Field
The invention relates to the technical field of laser technology and thin film deposition, in particular to a laser pulse deposition system and a laser pulse deposition method capable of monitoring laser process parameters in a vacuum in-situ manner.
Background
The thin film material is a component which is widely applied and occupies an important position in the fields of electronic devices, information devices, photoelectric devices and the like at present. The Pulse Laser Deposition (PLD) technology is one of the important processing technologies for preparing semiconductor, superconductive, ferroelectric, multiferroic, magnetic, photoelectric and other thin films, and has the features of being capable of preparing heterojunction, superlattice and other complicated structure thin film material, high melting point, complicated component, precisely regulated stoichiometric ratio, wide technological parameter regulating range, no limitation on the target material components and kinds, capacity of preparing high quality thin film, etc. The main principle of the pulsed laser deposition technology for preparing the film is that a pulsed light source generated by a pulsed laser is focused on a target material for bombardment ablation, and the surface of the target material is rapidly heated and melted and generates a high-temperature high-pressure plasma plume above an evaporation temperature. The plasma adiabatically expands and diffuses to the substrate surface, depositing a thin film on the substrate.
Despite the obvious process advantages of pulsed laser deposition techniques, there are still some problems to be solved in the large-scale application of thin film industrial techniques. The method specifically comprises the following steps: because the laser is positioned outside the vacuum deposition chamber, the pulse laser generated by the laser needs to be guided by an optical path such as a reflector and a focusing mirror to enter the chamber from the entrance window and be focused on the surface of the target, and finally the film preparation process is finished. The existence of the coating increases the reflection of the incident window to the laser beam, absorbs part of the incident laser, greatly attenuates the laser energy value actually reaching the surface of the target, and the attenuation is continuously deteriorated and difficult to predict along with the increase of the service time and frequency of the equipment.
Because the laser energy and the energy density of the laser reaching the surface of the target are core process parameters of the pulse laser deposition process, the laser energy and the energy density directly influence the internal distribution, the components and the existing form of plasma plume, when the laser energy is too low, the serious problems that the film forming speed is too slow or even the film cannot be formed, the plume and the components of the film deviate from the designed proportion, uncontrollable large-particle liquid drops are easy to generate and the like exist, and the film forming quality, the chemical proportion and the deposition rate are directly influenced. In the actual operation process, the problems are generally solved to a certain extent by adopting an indirect method of regularly replacing the entrance window or polishing the vacuum side of the entrance window, but the problems that the process cost is increased, the vacuum is frequently destroyed, the operation is complicated, the production efficiency is influenced and the like are difficult to solve exist.
Disclosure of Invention
The invention provides a laser pulse deposition system and a laser pulse deposition method capable of monitoring laser process parameters in a vacuum in-situ manner, and aims to solve the technical problems that in the current pulse laser deposition film preparation process, because plasma diffuses to an incidence window to generate a coating to absorb or reflect part of laser, the energy of laser beams in vacuum is further attenuated, the preparation process is unstable, the film deposition quality is reduced along with the use time, and the preparation process repeatability is poor.
In order to solve the technical problems, the invention provides the following technical scheme:
on one hand, the invention provides a laser pulse deposition system capable of monitoring laser process parameters in a vacuum in-situ manner, which comprises a pulse laser light source, a light path structure, a vacuum in-situ laser energy monitoring module and a vacuum deposition module;
the vacuum deposition module comprises a vacuum chamber, the vacuum chamber is provided with an incident tube, one end of the incident tube is communicated with the vacuum chamber, and the other end of the incident tube is provided with an incident window; laser emitted by the pulse laser source passes through the light path structure and is incident into the vacuum chamber through the incident window and the incident cylinder;
the vacuum in-situ laser energy monitoring module comprises a storage barrel, an energy monitoring probe, a magnetic force transmission rod and an energy meter; one end of the storage cylinder is communicated with the incident cylinder, the other end of the storage cylinder is connected with a magnetic force transmission rod and a vacuum cable penetrating piece, the energy monitoring probe is positioned in the storage cylinder, and the energy meter is positioned outside the storage cylinder; the vacuum side of the magnetic force transmission rod is mechanically connected with the energy monitoring probe, and the energy monitoring probe is electrically connected with the energy meter;
the storage cylinder, the incident cylinder and the vacuum chamber form a vacuum structure; when laser energy needs to be monitored, the magnetic transmission rod drives the energy monitoring probe to extend into the injection cylinder, so that laser passing through the injection cylinder is irradiated to the surface of the energy monitoring probe to monitor laser process parameters; after the monitoring is finished, the magnetic force transmission rod drives the energy monitoring probe to slide out of the injection cylinder and enter the storage cylinder.
Furthermore, a target material is arranged in the vacuum chamber, and a substrate is arranged opposite to the target material;
and laser emitted by the pulse laser source passes through the light path structure, passes through the incidence window and the incidence cylinder, and is obliquely incident on the surface of the target, so that the surface of the target is ablated to generate high-temperature and high-pressure plasma plume, and the plasma plume is adiabatically expanded and diffused to the surface of the substrate to form a film.
Further, the optical path structure comprises two reflecting mirrors and a focusing mirror; wherein the content of the first and second substances,
the two reflectors are arranged at an angle of 45 degrees, and laser emitted by the pulse laser source is reflected by the two reflectors in sequence and then obliquely incident to the surface of the target through the focusing mirror.
Furthermore, the storage cylinder is fixed on the cylinder wall of the injection cylinder and is in the same vacuum environment with the vacuum chamber.
Furthermore, one end of the storage cylinder, which is far away from the injection cylinder, is connected with a sealing blind flange; the sealing blind flange plate is provided with a flange port for connecting the magnetic force transmission rod and the vacuum cable penetrating piece, and a vacuum sealing environment is completed after the magnetic force transmission rod and the vacuum cable penetrating piece are connected; the magnetic force transmission rod comprises a magnetic force transmission rod, a driving sliding block, a transmission rod and a transmission rod sleeve, wherein the vacuum inner end of the transmission rod is connected with the energy monitoring probe, the magnetic force transmission rod is connected with a corresponding flange port of the sealing blind flange disc through a flange port of the transmission rod sleeve, and the transmission rod is positioned in a vacuum environment; the position of the driving slide block is moved, the transmission rod in the transmission rod sleeve is driven to move through the magnetic interaction force, and the transmission rod moves to further drive the energy monitoring probe to move.
Further, a vacuum cable penetrating piece is connected to the sealing blind flange; the energy monitoring probe is connected with the energy meter through the vacuum cable penetrating piece through a cable, so that power supply and data transmission are realized.
Further, an observation window is arranged on the injection cylinder and used for observing the moving position of the energy monitoring probe.
On the other hand, the invention also provides a laser pulse deposition method capable of monitoring laser process parameters in vacuum in situ, which comprises the following steps:
setting up the laser pulse deposition system capable of monitoring the laser energy in situ in vacuum, and setting target laser process parameters according to the process requirements of growing a thin film and using a target material;
driving the energy monitoring probe to extend into the injection cylinder through the driving mechanism, so that laser passing through the injection cylinder is irradiated to the surface of the energy monitoring probe to monitor whether laser process parameters meet requirements, and if not, readjusting the laser process parameters and monitoring again until the laser process parameters meet the requirements;
and (3) processing the film, using the vacuum in-situ laser energy monitoring module to monitor the laser energy in the vacuum chamber in real time before or during processing at different times or in different batches, checking whether the laser energy is attenuated, resetting the laser energy to meet the process requirement if the laser energy is attenuated, ensuring that the laser energy in the vacuum is kept at a stable value in the processing processes at different processing times and in different batches, and realizing the stable processing of the laser pulse deposition film.
The technical scheme provided by the invention has the beneficial effects that at least:
1. the pulse laser deposition system and the method provided by the invention can conveniently complete the in-situ real-time monitoring of the laser energy in the vacuum chamber required before the coating process and in the processing process by embedding the energy monitoring probe in the vacuum chamber and controlling the position of the probe by using the magnetic transmission rod, and can change the process parameters of the laser according to the energy fluctuation to stabilize the laser energy in the vacuum, thereby reducing the production cost of the prior art and improving the production efficiency.
2. The components of the pulse laser deposition system and the method provided by the invention are all mechanical parts convenient to process or products commonly available in the market, and the pulse laser deposition system can be newly built, and the vacuum in-situ energy monitoring can be realized by upgrading and reconstructing the existing pulse laser deposition system.
3. The pulse laser deposition system and the method provided by the invention do not depend on the selection of the type of the laser and the limitation of the wavelength, can conveniently replace the corresponding energy meter and the energy monitoring probe according to the different laser parameters, realize the in-situ real-time monitoring of the laser energy in the vacuum chamber, and complete the processing and preparation of the film under different process requirements.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic diagram of a laser pulse deposition system capable of vacuum in-situ monitoring laser energy according to an embodiment of the present invention;
FIGS. 2(a) and 2(b) are schematic structural diagrams of a vacuum in-situ laser energy monitoring module provided by an embodiment of the present invention; fig. 2(a) is a schematic diagram of an initial state of the vacuum in-situ laser energy monitoring module, and fig. 2(b) is a schematic diagram of a state of the vacuum in-situ laser energy monitoring module during laser energy monitoring.
Description of reference numerals:
1. a pulsed laser light source; 2. a mirror; 3. a focusing mirror;
4. a vacuum in-situ laser energy monitoring module; 5. a vacuum chamber; 6. an entrance window; 7. a substrate;
8. plasma plume; 9. a target material; 11. an injection cylinder; 12. a storage drum; 13. sealing the blind flange;
14. a transfer rod sleeve; 15. driving the slide block; 16. an observation window; 17. an energy monitoring probe;
18. a transfer lever; 19. a cable; 20. a vacuum cable penetration; 21. an energy meter.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
First embodiment
Referring to fig. 1 and fig. 2, the present embodiment provides a laser pulse deposition system capable of vacuum in-situ monitoring laser energy, which includes a pulse laser light source 1, a light path structure, a vacuum in-situ laser energy monitoring module 4 and a vacuum deposition module; the vacuum deposition module comprises a vacuum chamber 5, the vacuum chamber is provided with an incident tube 11, one end of the incident tube 11 is communicated with the vacuum chamber 5, and the other end of the incident tube is provided with an incident window 6; a target 9 is arranged in the vacuum chamber 5, and a substrate 7 is arranged above the target 9; the light path structure comprises two reflecting mirrors 2 and a focusing mirror 3; the two reflectors 2 are arranged at an angle of 45 degrees, and laser emitted by the pulse laser source 1 is reflected by the two reflectors 2 in sequence and then is incident into the vacuum chamber 5 through the focusing mirror 3, the incident window 6 and the incident cylinder 11 in sequence; and finally, obliquely irradiating the surface of the target 9, so that the surface of the target 9 is ablated to generate a high-temperature and high-pressure plasma plume 8, and the plasma plume 8 is adiabatically expanded and diffused to the surface of the substrate 7 to form a thin film.
The vacuum in-situ laser energy monitoring module 4 comprises a storage barrel 12, a sealing blind flange 13, a transmission rod sleeve 14, a driving slide block 15, an energy monitoring probe 17 and a transmission rod 18; one end of the storage cylinder 12, which is far away from the injection cylinder 11, is connected with a blind sealing flange 13, the blind sealing flange 13 is provided with a flange port for connecting a transmission rod sleeve 14 and a vacuum cable penetrating piece 20, and a vacuum sealing environment is completed after the transmission rod sleeve 14 and the vacuum cable penetrating piece 20 are connected; the magnetic force transmission rod comprises a transmission rod sleeve 14, a driving slide block 15 and a transmission rod 18, wherein the vacuum inner tail end of the transmission rod 18 is connected with an energy monitoring probe 17, the magnetic force transmission rod is connected with a corresponding flange port of the sealing blind flange 13 through a flange interface of the transmission rod sleeve 14, and the transmission rod 18 is in a vacuum environment; by moving the position of the driving slide block 15, the transmission rod 18 in the transmission rod sleeve 14 is driven to move through the magnetic interaction force, and the transmission rod 18 moves to drive the energy monitoring probe 17 to move.
One end of the storage barrel 12 is communicated with the injection barrel 11, the other end of the storage barrel is connected with a sealing blind flange 13, the energy monitoring probe 17 is positioned in the storage barrel 12, and the energy meter 21 is positioned outside the storage barrel 12; the energy monitoring probe 17 is electrically connected with the energy meter 21; the storage cylinder 12, the incident cylinder 11 and the vacuum chamber 5 form a vacuum structure; when laser energy needs to be monitored, the magnetic transmission rod drives the energy monitoring probe 17 to extend into the injection cylinder 11, so that laser passing through the injection cylinder 11 is irradiated onto the surface of the energy monitoring probe 17 to monitor laser process parameters, as shown in (b) of fig. 2; after the monitoring is completed, the magnetic transmission rod drives the energy monitoring probe 17 to slide out of the shooting pot 11 and enter the storage pot 12, as shown in fig. 2 (a).
The vacuum in-situ laser energy monitoring module 4 can monitor the technological parameters such as pulse laser energy in vacuum, and accordingly, the laser energy is adjusted by taking the required target technological parameters as the standard to be stabilized at the target laser energy technological parameters, and finally, the laser is focused on the surface of the target 9 of the vacuum deposition module by constant pulse energy in the processing process, particularly different processing batches and processing time, so that the stable high-quality deposition of the film is realized.
Wherein, the pulse laser light source 1 is an excimer laser, a solid-state laser or other pulse lasers. The target 9 is a ceramic target, a metal target or other targets. The vacuum in-situ laser energy monitoring module 4 can conveniently replace the adaptive energy monitoring probe 17 and the energy meter 21 according to different types, wavelengths, energy ranges and the like of the used pulse laser source, and the laser energy monitoring and calibration in vacuum chambers of different light sources are met. The energy monitoring probe 17 and the energy meter 21 may select different detector types as required to detect single pulse laser energy, continuous pulse average power, pulse frequency, laser wavelength, or other laser process parameters.
When energy detection is needed, the energy meter 21 is opened, the energy monitoring probe 17 is pushed to the light path to read the current process parameters such as laser energy and frequency in the vacuum chamber, the energy value of the laser is set according to the energy requirement needed by preparing the target material, or the laser process parameters in the vacuum chamber are monitored in situ in the processing process, and the process consistency and stability in the processing process are ensured. After the energy detection is finished, the energy monitoring probe 17 is moved out of the light path in time, so that the laser beam is prevented from being blocked. By detecting the vacuum in-situ laser energy and reversely setting the energy value of the laser, the laser energy can be focused on the surface of the target 9 with stable energy in different processing batches, different time and processing processes, the processing period of the vacuum side of the incidence window is greatly prolonged, the process stability and repeatability are improved, and the problem of uncontrollable attenuation of the laser energy is avoided.
The connection mode of the connecting piece can be flexibly designed and processed according to the connection mode of the vacuum inner tail end of the commercial magnetic transmission rod and the connection mode of the energy monitoring probe.
The transmission rod 18 can drive the energy monitoring probe 17 to move linearly in one dimension, and can also drive the energy monitoring probe 17 to move in multiple degrees of freedom, and the transmission rod depends on the specific geometric position of the vacuum in-situ laser energy monitoring module 4 relative to the optical path, so that the transmission rod can be used as a basis for selecting the dimension of the required magnetic transmission rod. Specifically, in this embodiment, the energy monitoring probe 17 can reciprocate in a direction perpendicular to the beam path, the driving slider 15 and the energy monitoring probe 17 are located in the beam path when moving to the position shown in fig. 2(b), laser is irradiated on the surface of the probe to monitor laser process parameters such as energy, frequency, power and the like, after the monitoring is completed, the energy monitoring probe 17 slides out of the incident cylinder 11 by controlling the position of the driving slider 15, and enters the storage cylinder 12, so as to prevent the pollution of the probe caused by the diffusion of plasma plume in the film preparation process and the possible temperature influence in the cavity of the deposition process, that is, the position shown in fig. 2 (a).
Furthermore, the injection cylinder 11 is also provided with an observation window 16, and the observation window 16 is used for assisting in observing the moving position and energy monitoring of the probe in the vacuum. The vacuum cable penetration piece 20 is connected with a corresponding flange opening on the vacuum blind flange 13; the energy monitoring probe 17 is connected with the energy meter 21 through a vacuum cable penetrating piece 20 through a cable 19 so as to supply power to the energy monitoring probe 17 and transmit data to the energy meter 21, and the normal work of the energy meter 21 and the probe is realized together. Wherein, the vacuum cable penetration piece 20 selects the corresponding vacuum inner and outer cable interfaces of the vacuum cable penetration piece 20 according to the power supply and data cable interfaces of the energy meter 21 and the energy monitoring probe 17.
The vacuum cable penetration piece can realize the connection of the cable inside and outside the vacuum chamber without influencing the vacuum environment in the chamber, and can be conveniently purchased or designed and processed by the market according to the type of the cable required by power supply and data transmission.
In summary, the present embodiment provides a laser pulse deposition system capable of in-situ monitoring laser energy in vacuum, which can conveniently complete in-situ real-time monitoring of laser energy in a vacuum chamber before and during a coating process by embedding an energy monitoring probe in the vacuum chamber and controlling the position of the probe by using a magnetic transmission rod, and can change process parameters of a laser according to energy fluctuation to stabilize laser energy in vacuum, thereby reducing production cost in the prior art and improving production efficiency. And does not depend on the selection of the type of the laser and the limitation of the wavelength, corresponding energy meters and energy monitoring probes can be conveniently replaced according to different laser parameters, the in-situ real-time monitoring of the laser energy in the vacuum chamber is realized, and the processing and preparation of the film under different process requirements are completed.
Second embodiment
The embodiment provides a laser pulse deposition method capable of monitoring laser energy in situ in vacuum, which comprises the following steps:
s1, constructing the laser pulse deposition system capable of monitoring the laser energy in situ in vacuum according to the first embodiment, and setting target laser process parameters according to the process requirements of growing a film and using a target;
the system in S1 can be directly built, and a vacuum in-situ energy monitoring module can be added on the basis of the existing system to realize a corresponding laser pulse deposition system capable of monitoring the laser energy in situ.
S2, driving the energy monitoring probe to extend into the injection cylinder through the magnetic force transmission rod, so that laser passing through the injection cylinder is irradiated to the surface of the energy monitoring probe to monitor whether the laser process parameters meet the requirements, and if not, readjusting the laser process parameters and monitoring again until the laser process parameters meet the requirements;
and S3, processing the film, monitoring the laser energy in the vacuum chamber in real time by using the vacuum in-situ laser energy monitoring module at different times or before or during processing in different batches, checking whether the laser energy is attenuated, resetting the laser energy to meet the process requirements if the laser energy is attenuated, ensuring that the laser energy in the vacuum is kept at a stable value in the processing process of different processing times and batches, and realizing the stable processing of the laser pulse deposition film.
Further, it should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or terminal apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or terminal apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other like elements in a process, method, article, or terminal that comprises the element.
Finally, it should be noted that while the above describes a preferred embodiment of the invention, it will be appreciated by those skilled in the art that, once the basic inventive concepts have been learned, numerous changes and modifications may be made without departing from the principles of the invention, which shall be deemed to be within the scope of the invention. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all such alterations and modifications as fall within the scope of the embodiments of the invention.
Claims (8)
1. A laser pulse deposition system capable of monitoring laser process parameters in a vacuum in-situ manner is characterized by comprising a pulse laser light source, a light path structure, a vacuum in-situ laser energy monitoring module and a vacuum deposition module; wherein the content of the first and second substances,
the vacuum deposition module comprises a vacuum chamber, the vacuum chamber is provided with an incident tube, one end of the incident tube is communicated with the vacuum chamber, and the other end of the incident tube is provided with an incident window; laser emitted by the pulse laser source passes through the light path structure and is incident into the vacuum chamber through the incident window and the incident cylinder;
the vacuum in-situ laser energy monitoring module comprises a storage barrel, an energy monitoring probe, a magnetic force transmission rod and an energy meter; one end of the storage cylinder is communicated with the incident cylinder, the other end of the storage cylinder is connected with a magnetic force transmission rod and a vacuum cable penetrating piece, the energy monitoring probe is positioned in the storage cylinder, and the energy meter is positioned outside the storage cylinder; the vacuum side of the magnetic force transmission rod is mechanically connected with the energy monitoring probe, and the energy monitoring probe is electrically connected with the energy meter;
the storage cylinder, the incident cylinder and the vacuum chamber form a vacuum structure; when laser energy needs to be monitored, the magnetic transmission rod drives the energy monitoring probe to extend into the injection cylinder, so that laser passing through the injection cylinder is irradiated to the surface of the energy monitoring probe to monitor laser process parameters; after the monitoring is finished, the magnetic force transmission rod drives the energy monitoring probe to slide out of the injection cylinder and enter the storage cylinder.
2. The laser pulse deposition system capable of in-situ vacuum monitoring of laser process parameters of claim 1, wherein a target is disposed within the vacuum chamber, and a substrate is disposed opposite the target;
and laser emitted by the pulse laser source passes through the light path structure, passes through the incidence window and the incidence cylinder, and is obliquely incident on the surface of the target, so that the surface of the target is ablated to generate high-temperature and high-pressure plasma plume, and the plasma plume is adiabatically expanded and diffused to the surface of the substrate to form a film.
3. The laser pulse deposition system capable of vacuum in-situ monitoring of laser process parameters according to claim 1, wherein said optical path structure comprises two mirrors and a focusing mirror; wherein the content of the first and second substances,
the two reflectors are arranged at an angle of 45 degrees, and laser emitted by the pulse laser source is reflected by the two reflectors in sequence and then obliquely incident to the surface of the target through the focusing mirror.
4. The laser pulse deposition system capable of vacuum in-situ monitoring of laser process parameters of claim 1, wherein the storage canister is secured to the canister wall of the injection canister in the same vacuum environment as the vacuum chamber.
5. The laser pulse deposition system capable of vacuum in-situ monitoring of laser process parameters according to claim 4, wherein a blind sealing flange is attached to an end of the storage cylinder remote from the injection cylinder; the sealing blind flange plate is provided with a flange port for connecting the magnetic force transmission rod and the vacuum cable penetrating piece, and a vacuum sealing environment is completed after the magnetic force transmission rod and the vacuum cable penetrating piece are connected; the magnetic force transmission rod comprises a magnetic force transmission rod, a driving sliding block, a transmission rod and a transmission rod sleeve, wherein the vacuum inner end of the transmission rod is connected with the energy monitoring probe, the magnetic force transmission rod is connected with a corresponding flange port of the sealing blind flange disc through a flange port of the transmission rod sleeve, and the transmission rod is positioned in a vacuum environment; the position of the driving slide block is moved, the transmission rod in the transmission rod sleeve is driven to move through the magnetic interaction force, and the transmission rod moves to further drive the energy monitoring probe to move.
6. The laser pulse deposition system capable of vacuum in-situ monitoring of laser process parameters according to claim 5, wherein a vacuum cable penetration is provided on the vacuum flange; the energy monitoring probe is connected with the energy meter through the vacuum cable penetrating piece through a cable, so that power supply and data transmission are realized.
7. The laser pulse deposition system capable of vacuum in-situ monitoring of laser process parameters according to claim 1, wherein an observation window is provided on the injection cylinder for observing the moving position of the energy monitoring probe.
8. A laser pulse deposition method capable of monitoring laser process parameters in situ in vacuum is characterized by comprising the following steps:
setting up a laser pulse deposition system capable of monitoring laser process parameters in situ in vacuum according to any one of claims 1 to 7, and setting target laser process parameters according to process requirements of growing a thin film and using a target;
driving the energy monitoring probe to extend into the injection cylinder through the magnetic force transmission rod, so that laser passing through the injection cylinder is irradiated to the surface of the energy monitoring probe to monitor whether laser process parameters meet requirements, and if not, readjusting the laser process parameters and monitoring again until the laser process parameters meet the requirements;
and (3) processing the film, using the vacuum in-situ laser energy monitoring module to monitor the laser energy in the vacuum chamber in real time before or during processing at different times or in different batches, checking whether the laser energy is attenuated, resetting the laser energy to meet the process requirement if the laser energy is attenuated, ensuring that the laser energy in the vacuum is kept at a stable value in the processing processes at different processing times and in different batches, and realizing the stable processing of the laser pulse deposition film.
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