CN114477761B - Substrate glass for OLED display - Google Patents
Substrate glass for OLED display Download PDFInfo
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- CN114477761B CN114477761B CN202111597865.7A CN202111597865A CN114477761B CN 114477761 B CN114477761 B CN 114477761B CN 202111597865 A CN202111597865 A CN 202111597865A CN 114477761 B CN114477761 B CN 114477761B
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- 239000011521 glass Substances 0.000 title claims abstract description 55
- 239000000758 substrate Substances 0.000 title claims abstract description 24
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 17
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 7
- 229910006404 SnO 2 Inorganic materials 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims abstract description 4
- 238000000137 annealing Methods 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 238000002425 crystallisation Methods 0.000 abstract description 7
- 230000008025 crystallization Effects 0.000 abstract description 7
- 230000008569 process Effects 0.000 description 5
- 238000007496 glass forming Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 239000005347 annealed glass Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
Abstract
The invention relates to substrate glass for OLED display, which is characterized by being prepared from the following raw materials in percentage by mole: 67-69% SiO 2 13.5-14.5% of Al 2 O 3 1.41 to 1.92% of B 2 O 3 6-7% MgO,5-5.5% CaO,4-5% SrO and 0.08-0.09% SnO 2 The method comprises the steps of carrying out a first treatment on the surface of the Wherein SiO is 2 +Al 2 O 3 The total mole percentage of (C) is 81.5-82.5%, and SiO 2 With Al 2 O 3 The molar ratio of (2) is 4.62-5.11; the total mole percentage of MgO+CaO+SrO is 16.0-16.5%, and the mole ratio of CaO to MgO is 0.71-0.92; the molar ratio of SrO to MgO is 0.57-0.83. The invention has the advantages that: the glass does not contain ZrO 2 And P 2 O 5 ,Al 2 O 3 、SiO 2 The content of MgO+CaO+SrO is high, so that the strain point and the elastic modulus of the glass have higher values at the same time; the homogeneity of the glass is good, and the crystallization temperature is low.
Description
Technical Field
The invention belongs to the technical field of glass production, and relates to substrate glass for OLED display.
Background
OLED (Organic Light Emitting Display) is an organic light emitting display, which is a novel display device and is known as a dream display. The basic structure of an OLED is a sandwich structure of a thin transparent Indium Tin Oxide (ITO) with semiconductor properties, connected to the positive electrode of the power, plus another metal cathode. The whole structure layer comprises the following components: a Hole Transport Layer (HTL), a light Emitting Layer (EL), and an Electron Transport Layer (ETL). When power is supplied to a proper voltage, positive hole and cathode charges are combined in the light-emitting layer to generate light, and red, green and blue RGB three primary colors are generated according to the different formulas to form basic colors. Unlike TFT LCDs, OLEDs require backlight, and thus have high visibility and brightness, and secondly have low voltage requirements and high power saving efficiency, and additionally have fast response, light weight, thin thickness, simple structure, low cost, etc., which are regarded as one of the most promising products in the 21 st century.
Unlike conventional LCD display modes, OLED display technology does not require a backlight, and uses a very thin coating of organic material and a glass substrate or special plastic substrate, which emits light when a current is passed through them. Moreover, the OLED display screen can be made lighter and thinner, the visual angle is larger, and the electric energy can be remarkably saved. The temperature requirement of the OLED process is higher than that of the LCD process, so that the thermodynamic performance requirement of the OLED substrate glass is higher, and the strain point of the OLED substrate glass is about 730 ℃ and is far higher than about 670 ℃ of the LCD substrate glass.
An alkali-free aluminoborosilicate glass is provided in publication No. CN111606560A, which contains P 2 O 5 ,P 2 O 5 Is introduced into the glass structure, and is a 5-coordination structure, while the glass body SiO 2 Four coordination, the difference of the two network structures can inevitably lead to the increase of the turbulence degree of the glass network structure and the decrease of compactness; in addition, the application contains ZrO 2 The introduced effect is similar to Al 2 O 3 Acting to strengthen the network structure, but likewise, zrO 2 With Al 2 O 3 The coordination number is different, and the two are combined to be equivalent to increasing the disorder degree in the glass network structure, which is disadvantageous to obtaining a stable and compact glass network, so that the macroscopic appearance of the glass is that the performance of the glass is influenced, namely, the glass strain point and the elastic modulus in the application float greatly, and the use requirement of the OLED substrate glass cannot be met at the same time.
Disclosure of Invention
The invention aims to solve the problems that the strain point and the elastic modulus in the patent publication No. CN111606560A have larger floating (the elastic modulus can not meet the requirement when the strain point is higher, and the strain point can not meet the requirement when the elastic modulus is higher) and can not meet the use requirement of OLED substrate glass at the same time; provided is a substrate glass for OLED display.
In order to achieve the above purpose, the technical scheme adopted by the invention is as follows:
the substrate glass for OLED display is characterized by being prepared from the following raw materials in percentage by mole: 67-69% SiO 2 13.5-14.5% of Al 2 O 3 1.41 to 1.92% of B 2 O 3 6-7% MgO,5-5.5% CaO,4-5% of SrO, 0.08-0.09% of SnO 2 ;
Wherein SiO is 2 +Al 2 O 3 The total mole percentage of (C) is 81.5-82.5%, and SiO 2 With Al 2 O 3 The molar ratio of (2) is 4.62-5.11;
the total mole percentage of MgO+CaO+SrO is 16.0-16.5%, and the mole ratio of CaO to MgO is 0.71-0.92; the molar ratio of SrO to MgO is 0.57-0.83.
Further, the substrate glass for OLED display is characterized by being prepared from the following raw materials in percentage by mole: 67.5-68.5% SiO 2 14-14.5% of Al 2 O 3 1.50 to 1.80% of B 2 O 3 6.5 to 7 percent of MgO,5 to 5.3 percent of CaO,4.5 to 5 percent of SrO and 0.08 to 0.085 percent of SnO 2 ;
Wherein SiO is 2 +Al 2 O 3 The total mole percentage of (C) is 82.0-82.5%, and SiO 2 With Al 2 O 3 The molar ratio of (2) is 4.70-5.00;
the total mole percentage of MgO+CaO+SrO is 16.2-16.5%, and the mole ratio of CaO to MgO is 0.75-0.85; the molar ratio of SrO to MgO is 0.60-0.75.
The preparation method of the substrate glass for OLED display is characterized by comprising the following steps of:
(1) Mixing the components according to the proportion;
(2) Firstly, raising the temperature from room temperature to 1560 ℃ at the speed of 2 ℃/min, and preserving the temperature for 1 hour; then raising the temperature from 1560 ℃ to 1660 ℃ at the speed of 2 ℃/min, and preserving the temperature for 4 hours;
(3) Pouring the completely melted glass liquid on a copper plate for molding and annealing to obtain the substrate glass for OLED display.
Further, the elastic modulus of the substrate glass for OLED display is 84-86 GPa, and the strain point is 730-740 ℃.
The strain point and the elastic modulus of the glass in the patent publication No. CN111606560A are difficult to obtain good balance all the time, and in order to achieve the strain point and the elastic modulus of the glass and obtain the glass with better performance, the inventor researches and discovers that: zrO (ZrO) 2 Is added with (a)Although the elastic modulus can be improved, the density and the thermal expansion coefficient of the glass are increased, although the patent controls P 2 O 5 B, B 2 O 3 The contents of MgO, caO, srO are also balanced, but are not ideal from the practical viewpoint of use effect.
The inventors found through extensive studies that: without ZrO 2 And P 2 O 5 According to the technical scheme, the total percentage of the mol total amount of MgO+CaO+SrO in the components is controlled to be 16.0-16.5%, the mol ratio of CaO to MgO is controlled to be 0.71-0.92, and the mol ratio of SrO to MgO is controlled to be 0.57-0.83, so that the elastic modulus and the strain point of glass can be improved simultaneously; the main reason is that: the middle limit of the application is SiO 2 +Al 2 O 3 The content of the glass network is 81.5% -82.5%, the glass network is a main body forming a network body, and occupies more than 80% of a glass network structure, so that the compactness of the glass network structure can be basically determined to be more ideal, meanwhile, the total amount of the molar total amount percentage of the alkaline earth metal content MgO+CaO+SrO is controlled to be 16.0% -16.5%, the two factors are glass macroscopic properties, the strain point and the elastic modulus meet the main determinants of 730-740 ℃ and 84-86 GPa, the ratio of CaO to MgO and SrO to MgO is limited in the range of the application, and the glass forming process is mainly controlled based on the crystallization temperature in the glass melting process, because the crystallization temperature affects the glass forming process, the CaO, mgO, srO has different influences on the crystallization temperature of the glass, the ratio among the three is limited, the maximum reduction of the crystallization temperature can be realized, and the glass forming process is facilitated.
The invention has the advantages that: the glass does not contain ZrO 2 And P 2 O 5 ,Al 2 O 3 、SiO 2 The content of MgO+CaO+SrO is high, so that the strain point and the elastic modulus of the glass have higher values (the elastic modulus is 84-86 GPa, and the strain point is 730-740 ℃); the homogeneity of the glass is good, and the crystallization temperature is low.
Detailed Description
The substrate glass for OLED display comprises the following specific implementation steps:
(1) The components are mixed and stirred uniformly according to the following table 1;
(2) Firstly, raising the temperature from room temperature to 1560 ℃ at the speed of 2 ℃/min, and preserving the temperature for 1 hour; then raising the temperature from 1560 ℃ to 1660 ℃ at the speed of 2 ℃/min, and preserving the temperature for 4 hours;
(3) Pouring the completely melted glass liquid on a copper plate for molding and annealing to obtain the substrate glass for OLED display.
Specific operating conditions for the annealing according to the invention are well known to those skilled in the art and may include, for example: the temperature is 700-900 ℃ and the time is 4-8h; the specific annealing temperature and annealing time can be determined by a person skilled in the art according to the actual situation, and physical properties of the annealed glass substrate, such as density, thermal expansion coefficient, strain point, etc., can be tested. The invention is further described by the following examples, but the invention is not limited thereby.
For a 20 x 30mm sample, the glass composition was measured at different positions and was composed of SiO 2 (mol%) difference between maximum and minimum (. DELTA.SiO) 2 ) The homogeneity of the glass melt was evaluated as shown in table 2: delta SiO 2 Unmelted SiO 2 The amount is greatly reduced, which indicates that the glass composition provided by the invention has better melting homogeneity. As can be seen from Table 2, the glass compositions provided by the present invention have significantly lower crystallization temperatures than the comparative examples, which is advantageous for controlling the glass forming operation during production.
The preferred embodiments of the present invention have been described in detail above, but the present invention is not limited to the specific details of the above embodiments, and various simple modifications can be made to the technical solution of the present invention within the scope of the technical concept of the present invention, and all the simple modifications belong to the protection scope of the present invention. In addition, the specific features described in the above embodiments may be combined in any suitable manner, and in order to avoid unnecessary repetition, various possible combinations are not described further. Moreover, any combination of the various embodiments of the present invention can be made, as long as it does not depart from the gist of the present invention, which is also regarded as the content of the present invention.
Claims (2)
1. The substrate glass for OLED display is characterized by being prepared from the following raw materials in percentage by mole: 67.5-68.5% SiO 2 14-14.5% of Al 2 O 3 1.50 to 1.80% of B 2 O 3 6.5 to 7 percent of MgO,5 to 5.3 percent of CaO,4.5 to 5 percent of SrO and 0.08 to 0.085 percent of SnO 2 ;
Wherein SiO is 2 +Al 2 O 3 The total mole percentage of (C) is 82.0-82.5%, and SiO 2 With Al 2 O 3 The molar ratio of (2) is 4.70-5.00; the total mole percentage of MgO+CaO+SrO is 16.2-16.5%, and the mole ratio of CaO to MgO is 0.75-0.85; the molar ratio of SrO to MgO is 0.60-0.75;
the elastic modulus of the substrate glass for OLED display is 84.5-85.9 GPa, and the strain point is 730-740 ℃.
2. The method for preparing the substrate glass for the OLED display according to claim 1, which is characterized by comprising the following steps:
(1) Mixing the components according to the proportion;
(2) Firstly, raising the temperature from room temperature to 1560 ℃ at the speed of 2 ℃/min, and preserving the temperature for 1 hour; then raising the temperature from 1560 ℃ to 1660 ℃ at the speed of 2 ℃/min, and preserving the temperature for 4 hours;
(3) Pouring the completely melted glass liquid on a copper plate for molding and annealing to obtain the substrate glass for OLED display.
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CN202111597865.7A CN114477761B (en) | 2021-12-24 | 2021-12-24 | Substrate glass for OLED display |
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CN202111597865.7A CN114477761B (en) | 2021-12-24 | 2021-12-24 | Substrate glass for OLED display |
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CN114477761B true CN114477761B (en) | 2023-12-19 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11292563A (en) * | 1998-04-03 | 1999-10-26 | Nippon Electric Glass Co Ltd | Alkali-free glass substrate |
CN105859127A (en) * | 2016-04-01 | 2016-08-17 | 东旭科技集团有限公司 | Composition for glass, aluminum silicate glass and preparation method and application thereof |
CN109608039A (en) * | 2019-02-20 | 2019-04-12 | 武汉理工大学 | A kind of Aluminiu, boron silicate glass without alkali and its application |
-
2021
- 2021-12-24 CN CN202111597865.7A patent/CN114477761B/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11292563A (en) * | 1998-04-03 | 1999-10-26 | Nippon Electric Glass Co Ltd | Alkali-free glass substrate |
CN105859127A (en) * | 2016-04-01 | 2016-08-17 | 东旭科技集团有限公司 | Composition for glass, aluminum silicate glass and preparation method and application thereof |
CN109608039A (en) * | 2019-02-20 | 2019-04-12 | 武汉理工大学 | A kind of Aluminiu, boron silicate glass without alkali and its application |
Non-Patent Citations (1)
Title |
---|
《特种玻璃的Raman光谱分析及其浮法成型工艺研究》;崔介东等;硅酸盐通报;第38卷(第8期);2689页,第2.1-2.2节,表1 * |
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Address after: 233010 Tushan Road 1047, Yuhui District, Bengbu City, Anhui Province Applicant after: China Building Materials Glass New Materials Research Institute Group Co.,Ltd. Address before: 233010 Tushan Road 1047, Yuhui District, Bengbu City, Anhui Province Applicant before: CHINA BUILDING MATERIALS BENGBU GLASS INDUSTRY DESIGN & RESEARCH INSTITUTE Co.,Ltd. |
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