CN114452778B - Washing and absorbing device and method for removing hydrogen chloride gas with liquid - Google Patents
Washing and absorbing device and method for removing hydrogen chloride gas with liquid Download PDFInfo
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- CN114452778B CN114452778B CN202210133942.1A CN202210133942A CN114452778B CN 114452778 B CN114452778 B CN 114452778B CN 202210133942 A CN202210133942 A CN 202210133942A CN 114452778 B CN114452778 B CN 114452778B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1406—Multiple stage absorption
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1412—Controlling the absorption process
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1456—Removing acid components
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1493—Selection of liquid materials for use as absorbents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
- B01D53/185—Liquid distributors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2252/00—Absorbents, i.e. solvents and liquid materials for gas absorption
- B01D2252/10—Inorganic absorbents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
- B01D2257/2045—Hydrochloric acid
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Abstract
The invention relates to a washing and absorbing device and a method for removing hydrogen chloride gas entrained liquid. The method comprises the following steps: carrying out spray absorption on hydrogen chloride gas impurities obtained by hydrolyzing concentrated acid of a chlorosilane monomer by using a hot hydrochloric acid solution, and obtaining hot-washing hydrogen chloride gas after absorption, wherein the main components of the hydrogen chloride gas impurities are the chlorosilane monomer, hydrogen chloride and siloxane; the main components of the hot-washing hydrogen chloride gas are siloxane and hydrogen chloride; the hot washing hydrogen chloride gas is sprayed and absorbed by the cold hydrochloric acid solution to obtain hydrogen chloride gas after absorption, and siloxane in the hot washing hydrogen chloride gas is absorbed by the cold hydrochloric acid solution; the temperature of the hot hydrochloric acid solution is 30-50 ℃, and the temperature of the cold hydrochloric acid solution is not higher than-5 ℃. Acid oil droplets entrained in the hydrogen chloride are substantially completely removed.
Description
Technical Field
The invention belongs to the technical field of organic silicon hydrolysis, and particularly relates to a washing and absorbing device and method for removing hydrogen chloride gas with liquid.
Background
The information in this background section is only for enhancement of understanding of the general background of the invention and is not necessarily to be construed as an admission or any form of suggestion that this information forms the prior art that is already known to a person of ordinary skill in the art.
At present, two process technologies of constant boiling acid hydrolysis and concentrated acid hydrolysis (saturated acid hydrolysis) are generally adopted in the dimethyl dichlorosilane monomer hydrolysis process in the organosilicon monomer industry, wherein hydrogen chloride gas produced by constant waste acid hydrolysis is completely dissolved in water and then is supplied to other users by an analytic method, and the energy consumption required by the analysis is large. The concentrated acid hydrolysis is to add water with chemical equivalent into the circulating saturated hydrochloric acid under a certain pressure to react with the original dimethyldichlorosilane, and the generated hydrogen chloride gas cannot be dissolved in the saturated hydrochloric acid to directly obtain the hydrogen chloride gas, and then the generated hydrogen chloride is sent to a user under the pressure. However, the hydrogen chloride gas released by the hydrolysis of the concentrated acid contains a small amount of acid oil droplets, is difficult to treat cleanly, directly influences the operation quality of a subsequent using unit, and although most manufacturers also treat the gas phase liquid carrying problem in different modes such as washing, demisting and the like, the effect is not ideal. Thus, the problem of liquid carrying in the gas phase also becomes a difficult problem to be solved urgently in the current industry.
Disclosure of Invention
In view of the problems in the prior art, the present invention aims to provide a washing and absorbing device and a method for removing hydrogen chloride gas entrained liquid.
In order to solve the technical problems, the technical scheme of the invention is as follows:
in a first aspect, a washing and absorbing method for removing hydrogen chloride gas entrained liquid is as follows:
carrying out spray absorption on hydrogen chloride gas impurities obtained by hydrolyzing concentrated acid of a chlorosilane monomer by using a hot hydrochloric acid solution, and obtaining hot-washing hydrogen chloride gas after absorption, wherein the main components of the hydrogen chloride gas impurities are the chlorosilane monomer, hydrogen chloride and siloxane; the main components of the hot washing hydrogen chloride gas are siloxane and hydrogen chloride;
the hot washing hydrogen chloride gas is sprayed and absorbed by the cold hydrochloric acid solution to obtain hydrogen chloride gas after absorption, and siloxane in the hot washing hydrogen chloride gas is absorbed by the cold hydrochloric acid solution;
the temperature of the hot hydrochloric acid solution is 35-50 ℃, and the temperature of the cold hydrochloric acid solution is not higher than-5 ℃.
Taking a dimethyldichlorosilane monomer as an example, the main components of the mixed hydrogen chloride gas are a chlorosilane monomer, hydrogen chloride and siloxane, after the mixed hydrogen chloride gas is sprayed and absorbed by a hot hydrochloric acid solution, the chlorosilane monomer is continuously hydrolyzed under the action of a certain temperature to generate the siloxane and the hydrogen chloride, and hydrogen chloride drops in the mixed hydrogen chloride gas are absorbed by the hot hydrochloric acid solution;
and (2) obtaining hot-washing hydrogen chloride gas after hot washing, wherein the main components of the hot-washing hydrogen chloride gas are siloxane and hydrogen chloride, and under the cooling effect of a cold hydrochloric acid solution, the relative volatility of liquid drops carried in the hot-washing hydrogen chloride gas is reduced, and the gas phase partial pressure of acid water molecules and siloxane oil molecules in the gas is reduced, so that the acid oil liquid drops are absorbed by the cold acid solution, the siloxane in the hot-washing hydrogen chloride gas is removed, and the purer hydrogen chloride gas is obtained.
In the cold washing and spraying absorption process, the gas is upwards contacted with the spraying liquid, the temperature of the gas is gradually reduced under the action of the spraying liquid, and siloxane in the gas is gradually absorbed, so that acid oil liquid drops carried in the hydrogen chloride can be more thoroughly removed.
Compared with the existing washing and demisting modes, the content of siloxane in the finally obtained hydrogen chloride gas is lower, and the problem that acid oil droplets in the existing hydrogen chloride gas are difficult to treat is solved.
In some embodiments of the invention, the temperature of the entrained hydrogen chloride gas is between 30 ℃ and 50 ℃ and the gas pressure is between 0.01 MPa and 0.5 MPa. The hydrogen chloride gas is a gas product obtained by hydrolysis reaction of chlorosilane monomers, has certain temperature and pressure, and is matched with hot hydrochloric acid solution and cold hydrochloric acid solution in the hot washing process.
In some embodiments of the invention, the hot hydrochloric acid solution has a concentration of 25-45% and the cold hydrochloric acid solution has a concentration of 25-45%. The hot hydrochloric acid solution and the cold hydrochloric acid solution are both hydrochloric acid solutions with higher concentration, but are not saturated hydrochloric acid solutions, and have the function of absorbing some hydrogen chloride liquid drops in a hot washing section.
In some embodiments of the invention, the chlorosilane monomer is dimethyldichlorosilane, monomethyltrichlorosilane, or trimethylchlorosilane. The products of the hydrolysis of the organochlorosilane are hydrogen chloride gas and oil phase siloxane products. The hydrogen chloride gas released by the concentrated acid hydrolysis contains a small amount of acid oil liquid drops, and is difficult to treat cleanly.
In some embodiments of the invention, the temperature of the cold hydrochloric acid solution is between-6 ℃ and-10 ℃. If the temperature of the cold hydrochloric acid solution is higher than-5 ℃, siloxane is contained in the gas discharged after spray absorption in the cold washing section, and the temperature of the gas after cooling influences the process that the siloxane in the gas moves from the gas to the spray liquid, so that the siloxane is not completely absorbed by the spray.
In a second aspect, a washing and absorbing device for removing hydrogen chloride gas with liquid comprises an absorption tower,
the absorption tower comprises a cold washing section at the upper part and a hot washing section at the lower part, and the cold washing section is communicated with the hot washing section through air holes;
the lower part of the hot washing section is provided with a gas inlet; the upper parts of the cold washing section and the hot washing section are respectively provided with a spraying structure.
The absorption tower is arranged into a structure integrating a cold washing section and a hot washing section, and gas enters from the lower part of the hot washing section and then moves upwards to realize continuous hot washing and cold washing. The gas sprayed and absorbed by the hot washing section directly enters the cold washing section through the air holes, and the liquid in the cold washing section does not directly flow into the hot washing section.
In some embodiments of the invention, the height of the cold wash stage is from 4 to 10 meters; the height of the hot washing section is 4-10 m. The height of the hot wash stage facilitates complete hydrolysis of the chlorosilanes and the height of the cold wash stage enables the siloxane to be gradually moved from the gas into the sprayed cold hydrochloric acid solution.
In some embodiments of the invention, the cold washing section is internally provided with cold washing section filler, and the hot washing section is internally provided with hot washing section filler. Furthermore, the fillers arranged in the hot washing section and the cold washing section are graphite ring or plastic rosette ring fillers. Enhance the gas-liquid contact and enhance the washing and absorbing effect.
In some embodiments of the invention, the washing device further comprises a cold washing cooler, a cold washing circulating liquid outlet is arranged at the bottom of the cold washing section, the cold washing circulating liquid outlet is connected with the cold washing cooler, and a liquid outlet of the cold washing cooler is connected with the spraying structure of the cold washing section. And cooling the cold hydrochloric acid solution by using a cold washing cooler, and then introducing the cooled hydrochloric acid into an absorption tower for use. The silicone oil that accumulates in the cold acid is finally discharged to the phase separator. Further, still include the cold circulating pump of washing, the cold circulating pump setting is washed between circulating liquid export and the cold cooler of washing at the cold. The cold washing circulating pump provides power for cold acid circulating washing absorption.
In some embodiments of the invention, a gas lift baffle is disposed between the cold wash stage and the hot wash stage, and a gas lift tube is disposed above the gas lift baffle. The air lift partition plate plays a role in isolation, namely, gas in the hot washing section can enter the cold washing section, and liquid in the cold washing section cannot directly enter the hot washing section. The top of the riser is provided with a pipe cap. Further, the height of the riser is generally set to 200-1000mm, and preferably set to 400-800 mm. Prevent the liquid in the cold washing section from flowing downwards into the hot washing section through the riser.
In some embodiments of the invention, the bottom of the cold washing section is provided with an overflow port, and the height of the overflow port is lower than the height of the air outlet of the air lifting pipe. The washing device further comprises an overflow pipeline, an inlet of the overflow pipeline is connected with an overflow port of the cold washing section, and an outlet of the overflow pipeline is connected with the hot washing section. The overflow port can discharge the redundant liquid in the cold washing process. The cold hydrochloric acid solution after being sprayed and heated can be moved to the hot washing section through an overflow pipeline.
In some embodiments of the invention, the absorption tower further comprises a demister, and the top gas outlet of the absorption tower is connected with the demister.
One or more technical schemes of the invention have the following beneficial effects:
the invention provides a washing and absorbing device and a method for removing hydrogen chloride gas entrained liquid. According to the method, the unreacted gas phase carrying the dimethyldichlorosilane can be continuously and completely reacted through hot washing, and simultaneously acid oil droplets carried in part of gas can be washed and absorbed. The acid oil droplets entrained in the absorption gas can be washed with a low-temperature acid by cold washing. Acid oil drops carried in the hydrogen chloride are basically and completely removed, and the siloxane content in the finally obtained hydrogen chloride gas is less than 100 PPM.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description, serve to explain the invention and not to limit the invention.
FIG. 1 is a schematic diagram of a scrubbing and absorbing apparatus for removing entrained hydrogen chloride gas;
wherein, 1, the section is washed to the heat, 2, the section is washed to the cold, 3, the defroster, 4, the cooler is washed to the cold, 5, the circulating pump is washed to the cold, 6, the section is washed to the heat is packed, 7, the lift gas baffle, 8, the section is washed to the cold packs, 9, the demister, 10, the import of hot hydrochloric acid solution, 11, the import of cold hydrochloric acid solution, 12, the export of cold washing circulation liquid, 13, overflow pipeline, 14, gas inlet.
Detailed Description
It is to be understood that the following detailed description is exemplary and is intended to provide further explanation of the invention as claimed. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of exemplary embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.
Example 1
As shown in figure 1, the washing and absorbing device for removing the hydrogen chloride gas entrained liquid comprises an absorption tower,
the absorption tower comprises a cold washing section 2 at the upper part and a hot washing section 1 at the lower part, and the cold washing section 2 is communicated with the hot washing section 1 through air holes;
the lower part of the hot washing section 1 is provided with a gas inlet 14; the upper parts of the cold washing section 2 and the hot washing section 1 are respectively provided with a spraying structure.
The absorption tower is provided with a cold hydrochloric acid solution inlet 11, and the spraying structure of the cold washing section is connected with the cold hydrochloric acid solution inlet 11. The absorption tower is provided with a hot hydrochloric acid solution inlet 10, and the spraying structure of the hot washing section is connected with the hot hydrochloric acid solution inlet 10.
The inside of cold washing section 2 sets up cold washing section filler 8, and the inside of hot washing section 1 sets up hot washing section filler 6. The fillers arranged in the hot washing section 1 and the cold washing section 2 are graphite ring or plastic flower ring fillers.
Still including cold washing cooler 4, the bottom of cold washing section 2 sets up cold washing circulation liquid export 12, and cold washing circulation liquid export 12 is connected with cold washing cooler 4, and the liquid outlet of cold washing cooler 4 is connected with the spraying structure of cold washing section 2. The outlet of the cold washing circulating liquid is connected with the cold washing cooler through a cold washing circulating pump 5.
A gas lift clapboard 7 is arranged between the cold washing section 2 and the hot washing section 1, and a gas lift pipe is arranged on the gas lift clapboard 7. The top of the riser is provided with a pipe cap. The inner side of the upper pipe cap of the air-lift pipe is provided with an air-lift hole.
The bottom of the cold washing section 2 is provided with an overflow port, and the height of the overflow port is lower than the height of an air outlet of the air lift pipe. The inlet of the overflow pipeline 13 is connected with the overflow port of the cold washing section, and the outlet of the overflow pipeline 13 is connected with the hot washing section.
The device also comprises a demister 3, and a top gas outlet of the absorption tower is connected with the demister 3. The top of the cold washing section of the absorption tower is provided with a demister 9.
Example 2
As shown in figure 1: the liquid carrying gas is hydrogen chloride gas obtained by hydrolysis reaction of dimethyldichlorosilane, and part of liquid drops of hydrochloric acid, siloxane oil and the like are carried in the liquid carrying gas. The gas is at about 42 deg.C and 0.18MPa, and is first passed into hot washing section to contact with washing hydrochloric acid in the packing material, where the unreacted dimethyldichlorosilane in the gas is hydrolyzed completely and some liquid drops are washed and absorbed by the acid phase. The gas after washing and absorption enters a cold washing section through a riser and is in reverse contact with low-temperature hydrochloric acid in a filler, the temperature of the washing and absorption liquid inlet at the cold washing section is-7 ℃, and the circulation volume is 30m 3 H is used as the reference value. And the gas washed and absorbed by the cold washing section is discharged from the top, is further removed by mist foam through a demister and enters the next working procedure. The cold washing section is provided with an overflow pipeline towards the hot washing section, the height of an overflow port from the partition board is 400mm, and the height of the riser is 600 mm. In addition, the cold acid circulation is powered by a cold washing circulating pump, and the cold washing cooler is powered by glycol at the temperature of 15 ℃ below zero to provide cold energy of a refrigerant. Siloxane content in gas at outlet of top of absorption columnThe amount was 80 ppm. The siloxane content in the gas after the hot washing stage spray absorption was 512 ppm.
Example 3
As shown in figure 1: the liquid carrying gas is hydrogen chloride gas obtained by hydrolysis reaction of dimethyldichlorosilane, and part of liquid drops of hydrochloric acid, siloxane oil and the like are carried in the liquid carrying gas. The gas is at a temperature of about 32 ℃ and a pressure of 0.05MPa, and firstly enters a hot washing section to be in countercurrent contact with washing hydrochloric acid in a packing, unreacted dimethyldichlorosilane carried in the gas is completely hydrolyzed, and partial liquid drops in the gas are also washed and absorbed by an acid phase. The gas after washing and absorption enters a cold washing section through a riser, and is in reverse contact with low-temperature hydrochloric acid in a filler, the temperature of the washing and absorption liquid inlet in the cold washing section is-7 ℃, and the circulation amount is 80m 3/h. The gas washed and absorbed by the cold washing section is discharged from the top and enters the next working procedure. An overflow pipeline towards the hot washing section is arranged at the cold washing section, the height of an overflow port from the partition plate is 500mm, and the height of the riser is 650 mm. In addition, the cold acid circulation is powered by a cold washing circulating pump to provide internal circulation, the cold washing cooler is powered by glycol with the temperature of-15 ℃ to provide cold quantity of a refrigerant, and in order to ensure the stable operation of the cold washing circulation, a branch is branched from a hot washing feeding pipeline and is supplemented to a cold washing system. The siloxane content in the gas at the outlet of the top of the absorption column was 65 ppm. The siloxane content in the gas after the hot washing stage spray absorption was 456 ppm.
Comparative example 1
As shown in figure 1: the liquid carrying gas is hydrogen chloride gas obtained by hydrolysis reaction of dimethyldichlorosilane, and part of liquid drops of hydrochloric acid, siloxane oil and the like are carried in the liquid carrying gas. The difference from example 2 was that the temperature of the cold acid in the cold wash stage was-3 ℃ and the rest was the same as in example 2. The siloxane content in the gas at the outlet of the top of the absorption column was 105 ppm. The siloxane content in the gas after the hot washing stage spray absorption was 500 ppm.
It is shown that the higher temperature of the cold hydrochloric acid solution in the cold washing section causes incomplete absorption of the siloxane.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (7)
1. A washing and absorbing method for removing hydrogen chloride gas with liquid is characterized in that: the method comprises the following steps:
carrying out spray absorption on hydrogen chloride gas impurities obtained by hydrolyzing concentrated acid of a chlorosilane monomer by using a hot hydrochloric acid solution, and obtaining hot-washing hydrogen chloride gas after absorption, wherein the main components of the hydrogen chloride gas impurities are the chlorosilane monomer, hydrogen chloride and siloxane; the main components of the hot washing hydrogen chloride gas are siloxane and hydrogen chloride;
the hot washing hydrogen chloride gas is sprayed and absorbed by the cold hydrochloric acid solution to obtain hydrogen chloride gas after absorption, and siloxane in the hot washing hydrogen chloride gas is absorbed by the cold hydrochloric acid solution;
the temperature of the hot hydrochloric acid solution is 30-50 ℃, and the temperature of the cold hydrochloric acid solution is not higher than-5 ℃;
the concentration of the hot hydrochloric acid solution is 25-45%, and the concentration of the cold hydrochloric acid solution is 25-45%;
the equipment for realizing the washing and absorbing method comprises an absorption tower and a demister;
the absorption tower comprises a cold washing section at the upper part and a hot washing section at the lower part, and the cold washing section is communicated with the hot washing section through air holes;
the lower part of the hot washing section is provided with a gas inlet; the upper parts of the cold washing section and the hot washing section are respectively provided with a spraying structure;
the top gas outlet of the absorption tower is connected with a demister.
2. The scrubbing-absorbing process for removing hydrogen chloride gas carryover according to claim 1, wherein: the temperature of the mixed hydrogen chloride gas is 30-50 ℃, and the gas pressure is 0.01-0.5 MPa.
3. The scrubbing-absorbing process for removing hydrogen chloride gas carryover according to claim 1, wherein: the chlorosilane monomer is dimethyldichlorosilane, monomethyltrichlorosilane or trimethylchlorosilane.
4. The scrubbing-absorbing process for removing hydrogen chloride gas carryover according to claim 1, wherein: the temperature of the cold hydrochloric acid solution is-10 to-6 ℃.
5. The washing and absorption method for removing hydrogen chloride gas carryover according to claim 1, comprising: the height of the cold washing section is 4-10 m; the height of the hot washing section is 4-10 m.
6. The scrubbing-absorbing process for removing hydrogen chloride gas carryover according to claim 1, wherein: still including cold washing the cooler, the bottom of cold washing section sets up cold washing circulation liquid export, and cold washing circulation liquid export is connected with cold washing the cooler, and the liquid outlet of cold washing the cooler is connected with the spraying structure of cold washing section.
7. The scrubbing-absorbing process for removing hydrogen chloride gas carryover according to claim 1, wherein: a gas lift clapboard is arranged between the cold washing section and the hot washing section, and a gas lift pipe is arranged on the gas lift clapboard.
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| CN209554785U (en) * | 2019-01-16 | 2019-10-29 | 杭州东日节能技术有限公司 | Hydrolyzing chlorosilane prepares the device of hydrogen chloride |
| CN110467155A (en) * | 2019-09-18 | 2019-11-19 | 浙江新安化工集团股份有限公司 | A kind of system and technique of the hydrogen chloride that processing hydrolyzing chlorosilane generates |
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2022
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| JPS6136101A (en) * | 1984-07-27 | 1986-02-20 | Asahi Glass Co Ltd | Method of removing hydrogen fluoride contained in hydrogen chloride |
| CN101066521A (en) * | 2002-03-27 | 2007-11-07 | 英国氧气集团有限公司 | Exhaust gas treatment |
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| CN101628710A (en) * | 2009-08-03 | 2010-01-20 | 中国石化集团南京设计院 | Method for producing high-purity concentrated hydrochloric acid by adopting hydrogen chloride gas containing chlorosilane |
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| CN209554785U (en) * | 2019-01-16 | 2019-10-29 | 杭州东日节能技术有限公司 | Hydrolyzing chlorosilane prepares the device of hydrogen chloride |
| CN110467155A (en) * | 2019-09-18 | 2019-11-19 | 浙江新安化工集团股份有限公司 | A kind of system and technique of the hydrogen chloride that processing hydrolyzing chlorosilane generates |
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