CN114442377A - Film layer capable of eliminating LCD etching lines - Google Patents
Film layer capable of eliminating LCD etching lines Download PDFInfo
- Publication number
- CN114442377A CN114442377A CN202210081014.5A CN202210081014A CN114442377A CN 114442377 A CN114442377 A CN 114442377A CN 202210081014 A CN202210081014 A CN 202210081014A CN 114442377 A CN114442377 A CN 114442377A
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- China
- Prior art keywords
- film layer
- film
- layer
- liquid crystal
- rete
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000005530 etching Methods 0.000 title claims abstract description 26
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 26
- 239000011521 glass Substances 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000010030 laminating Methods 0.000 claims description 9
- 239000005357 flat glass Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 26
- 229910052681 coesite Inorganic materials 0.000 abstract description 13
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 13
- 239000000377 silicon dioxide Substances 0.000 abstract description 13
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 13
- 229910052682 stishovite Inorganic materials 0.000 abstract description 13
- 229910052905 tridymite Inorganic materials 0.000 abstract description 13
- 230000000694 effects Effects 0.000 abstract description 7
- 230000002950 deficient Effects 0.000 abstract description 4
- 238000010923 batch production Methods 0.000 abstract description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 description 110
- 239000000463 material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133723—Polyimide, polyamide-imide
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133502—Antiglare, refractive index matching layers
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polarising Elements (AREA)
Abstract
The invention discloses a film capable of eliminating LCD (liquid crystal display) etching lines, which comprises a polaroid film, a substrate glass layer, an ITO (indium tin oxide) film, a high-refractive-index PI film, a conventional PI film, a liquid crystal film and a frame, wherein the substrate glass layer is attached to the bottom surface of the polaroid film, the high-refractive-index PI film is attached to the bottom surface of the substrate glass layer, the conventional PI film is attached to the bottom surface of the high-refractive-index PI film, and the liquid crystal film is attached to the bottom surface of the conventional PI film. According to the invention, through the arranged polaroid film layer, the substrate glass layer, the ITO film layer, the high-refractive-index PI film layer, the conventional PI film layer, the liquid crystal film layer and the frame, the same shadow eliminating effect of the SiO2 film layer with the high refractive index can be achieved, the cost is lower, the cost is about one tenth of that of the SiO2 film layer, and the advantages of easiness in batch production and reworking of defective products are achieved.
Description
Technical Field
The invention relates to the technical field of LCDs, in particular to a film layer capable of eliminating LCD etching lines.
Background
The LCD is constructed by placing liquid crystal boxes between two parallel glass substrates, arranging a thin film transistor on a lower substrate glass layer, arranging a color filter on an upper substrate glass layer, and controlling the rotation direction of liquid crystal molecules by changing signals and voltages on the TFT, thereby achieving the purpose of controlling whether polarized light of each pixel point is emitted or not to achieve display.
The traditional mode of eliminating the etching line is that before the laminating of PI rete, at first laminate the material of a name SiO2 on ITO rete surface, normally laminate the PI rete after the high temperature curing again, because the refracting index of this material and ITO rete is more close to can reach better shadow effect that disappears, but SiO2 rete material has comparatively obvious shortcoming: (1) the cost is higher and is 10 times of that of the common PI film material; (2) after the SiO2 film is attached and cured, reworking cannot be performed, and therefore, a film capable of eliminating LCD etching lines is provided.
Disclosure of Invention
Therefore, the invention aims to provide a film layer capable of eliminating LCD etching lines, which can achieve the same shadow eliminating effect of a SiO2 film layer with a high refractive index by arranging a polarizer film layer, a substrate glass layer, an ITO film layer, a PI film layer with a high refractive index, a conventional PI film layer, a liquid crystal film layer and a frame, and has the advantages of low cost, high mass production and easy reworking of defective products, wherein the cost is about one tenth of that of a SiO2 film layer.
To solve the above technical problem, according to an aspect of the present invention, the present invention provides the following technical solutions:
the utility model provides a can eliminate rete of LCD etching line, includes polaroid rete, base plate glass layer, ITO rete, high refractive index PI rete, conventional PI rete, liquid crystal film layer and frame, the bottom surface laminating on polaroid rete has base plate glass layer to the bottom surface laminating on base plate glass layer has high refractive index PI rete, the bottom surface laminating on high refractive index PI rete has conventional PI rete, the bottom surface laminating on conventional PI rete has the liquid crystal film layer.
As a preferable scheme of the film layer capable of eliminating the LCD etching lines, the lengths of the polarizer film layer, the substrate glass layer and the ITO film layer are equal.
As a preferable embodiment of the film layer capable of eliminating LCD etching lines according to the present invention, the lengths of the high refractive index PI film layer, the normal PI film layer and the liquid crystal film layer are equal.
As a preferable scheme of the film layer capable of eliminating LCD etching lines, frames are disposed on two sides of the high refractive index PI film layer, the conventional PI film layer, and the liquid crystal film layer.
The preferred scheme of the film layer capable of eliminating the LCD etching lines is that the polarizer film layer, the substrate glass layer, the ITO film layer, the high-refractive-index PI film layer, the conventional PI film layer and the liquid crystal film layer are respectively provided with two, and the two polarizer film layers, the substrate glass layer, the ITO film layer, the high-refractive-index PI film layer, the conventional PI film layer and the liquid crystal film layer are symmetrically arranged at the central line position of the frame.
As a preferable scheme of the film layer capable of eliminating the LCD etching lines, the lengths of the polarizer film layer, the substrate glass layer and the ITO film layer are sequentially greater than those of the high-refractive-index PI film layer, the conventional PI film layer and the liquid crystal film layer.
Compared with the prior art, the invention has the beneficial effects that: the LCD panel has the advantages that through the arranged polaroid film layer, the substrate glass layer, the ITO film layer, the high-refractive-index PI film layer, the conventional PI film layer, the liquid crystal film layer and the frame, the same shadow eliminating effect of adhering the SiO2 film layer with the high refractive index can be achieved, the cost is lower, the cost is about one tenth of that of the SiO2 film layer, the batch production is easier, and defective products are easy to rework, when in specific use, after the ITO film layer in the front working section of an LCD is photoetched, the high-refractive-index PI film layer with low cost is adhered to the surface of the ITO film layer, the refractive index of the high-refractive-index PI film layer is close to that of the ITO film layer, the refractive index is 1.8, due to the close refractive index, the high-refractive-index PI film layer well eliminates etching lines of the ITO film layer, the shadow eliminating effect is achieved, after the high-refractive-index PI film layer is cured at high temperature, the surface of the high-refractive-index PI film layer is adhered to the conventional PI film layer which really achieves the orientation purpose, the conventional PI film layer is selected according to the product orientation requirement, namely a vertically oriented PI film layer, a horizontal PI film layer and an inclination angle oriented PI film layer, and in addition, the curing temperature of the high-refractive-index PI film layer is 250-260 ℃ which is far lower than that of the SiO2 film layer, so that the large-scale production is easy to realize.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the present invention will be described in detail below with reference to the accompanying drawings and detailed embodiments, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without inventive exercise. Wherein:
FIG. 1 is a diagram of a film layer for eliminating LCD etching lines according to the present invention;
FIG. 2 is a diagram of a polarizer film structure in FIG. 1 capable of eliminating LCD etching lines according to the present invention.
In the figure: 1. a polarizer film layer; 2. a substrate glass layer; 3. an ITO film layer; 4. a high refractive index PI film layer; 5. a conventional PI film layer; 6. a liquid crystal film layer; 7. and (5) a frame.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention, but the present invention may be practiced in other ways than those specifically described herein, and it will be apparent to those of ordinary skill in the art that the present invention may be practiced without departing from the spirit and scope of the present invention, and therefore the present invention is not limited to the specific embodiments disclosed below.
Next, the present invention will be described in detail with reference to the drawings, and in the detailed description of the embodiments of the present invention, the cross-sectional views illustrating the structure of the device are not enlarged partially according to the general scale for convenience of illustration, and the drawings are only examples, which should not limit the scope of the present invention. In addition, the three-dimensional dimensions of length, width and depth should be included in the actual fabrication.
In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
The invention provides a film layer capable of eliminating LCD etching lines, which can achieve the same shadow eliminating effect of a SiO2 film layer with a high refractive index by arranging a polaroid film layer, a substrate glass layer, an ITO film layer, a PI film layer with a high refractive index, a conventional PI film layer, a liquid crystal film layer and a frame, and has the advantages of lower cost, higher batch production and easy reworking of defective products, wherein the cost is about one tenth of that of the SiO2 film layer.
Fig. 1-2 are schematic diagrams illustrating an overall structure of an embodiment of a film capable of eliminating LCD etching lines according to the present invention, and please refer to fig. 1-2, including a polarizer film 1, a substrate glass layer 2, an ITO film layer 3, a high refractive index PI film layer 4, a conventional PI film layer 5, a liquid crystal film layer 6, and a frame 7.
Referring to fig. 1 again, the bottom surface of the polarizer film layer 1 is attached with the substrate glass layer 2, the bottom surface of the substrate glass layer 2 is attached with the high-refractive-index PI film layer 4, the bottom surface of the high-refractive-index PI film layer 4 is attached with the conventional PI film layer 5, and the bottom surface of the conventional PI film layer 5 is attached with the liquid crystal film layer 6.
With reference to fig. 1-2, in a specific use process of the film capable of eliminating LCD etching lines, after the ITO film 3 in the LCD front section is subjected to photolithography, a low-cost high-refractive-index PI film 4 is attached to the surface of the ITO film 3, the refractive index of the high-refractive-index PI film 4 is close to that of the ITO film 3, the refractive index is 1.8, and since the refractive indexes are close, the high-refractive-index PI film 4 well eliminates the etching lines of the ITO film 3, thereby achieving an image elimination effect, after the high-refractive-index PI film 4 is cured at a high temperature, a conventional PI film 5 really achieving orientation is attached to the surface of the high-refractive-index PI film 4, the conventional PI film 5 is selected according to the product orientation requirement, and a vertically oriented PI film, a horizontal PI film and a PI film oriented at an inclination angle, in addition, the curing temperature of the high-refractive-index PI film 4 is 250-260 ℃, is far lower than 300 ℃ required by SiO2 film layer curing, and is easy to realize in scale production.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
It will be appreciated by persons skilled in the art that the embodiments of the invention described above and shown in the drawings are given by way of example only and are not limiting of the invention. The advantages of the present invention have been fully and effectively realized. The functional and structural principles of the present invention have been shown and described in the embodiments, and any variations or modifications may be made to the embodiments of the present invention without departing from the principles.
Claims (6)
1. The utility model provides a can eliminate rete of LCD etching line, includes polaroid rete (1), base plate glass layer (2), ITO rete (3), high refractive index PI rete (4), conventional PI rete (5), liquid crystal film layer (6) and frame (7), its characterized in that, the bottom surface laminating of polaroid rete (1) has base plate glass layer (2) to the bottom surface laminating of base plate glass layer (2) has high refractive index PI rete (4), the bottom surface laminating of high refractive index PI rete (4) has conventional PI rete (5), the bottom surface laminating of conventional PI rete (5) has liquid crystal film layer (6).
2. A film capable of eliminating LCD etching lines according to claim 1, wherein the lengths of the polarizer film layer (1), the substrate glass layer (2) and the ITO film layer (3) are equal.
3. A film capable of eliminating LCD etching lines as claimed in claim 2, wherein the lengths of the high refractive index PI film layer (4), the normal PI film layer (5) and the liquid crystal film layer (6) are equal.
4. A film capable of eliminating LCD etching lines as claimed in claim 3, wherein the high refractive index PI film layer (4), the normal PI film layer (5) and the liquid crystal film layer (6) are provided with a frame (7) on both sides.
5. The film capable of eliminating LCD etching lines as claimed in claim 4, wherein the number of the polarizer film layers (1), the substrate glass layer (2), the ITO film layer (3), the high refractive index PI film layer (4), the conventional PI film layer (5) and the liquid crystal film layer (6) is two, and the two polarizer film layers (1), the substrate glass layer (2), the ITO film layer (3), the high refractive index PI film layer (4), the conventional PI film layer (5) and the liquid crystal film layer (6) are symmetrically arranged at the central line position of the frame (7).
6. The film capable of eliminating LCD etching lines as claimed in claim 5, wherein the lengths of the polarizer film layer (1), the substrate glass layer (2) and the ITO film layer (3) are sequentially longer than the lengths of the high-refractive-index PI film layer (4), the conventional PI film layer (5) and the liquid crystal film layer (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210081014.5A CN114442377A (en) | 2022-01-24 | 2022-01-24 | Film layer capable of eliminating LCD etching lines |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210081014.5A CN114442377A (en) | 2022-01-24 | 2022-01-24 | Film layer capable of eliminating LCD etching lines |
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| Publication Number | Publication Date |
|---|---|
| CN114442377A true CN114442377A (en) | 2022-05-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210081014.5A Pending CN114442377A (en) | 2022-01-24 | 2022-01-24 | Film layer capable of eliminating LCD etching lines |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11326953A (en) * | 1998-05-16 | 1999-11-26 | Semiconductor Energy Lab Co Ltd | Liquid crystal display device and its production |
| CN205157937U (en) * | 2015-11-19 | 2016-04-13 | 郴州市晶讯光电有限公司 | Stable liquid crystal cell structure |
| CN106353935A (en) * | 2016-09-30 | 2017-01-25 | 康惠（惠州）半导体有限公司 | LCD light valve structure and manufacturing process thereof |
| CN109559840A (en) * | 2017-09-27 | 2019-04-02 | 张家港康得新光电材料有限公司 | Transparent conductive film, preparation method and capacitive touch screen |
| WO2021205736A1 (en) * | 2020-04-10 | 2021-10-14 | 日産化学株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element |
-
2022
- 2022-01-24 CN CN202210081014.5A patent/CN114442377A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11326953A (en) * | 1998-05-16 | 1999-11-26 | Semiconductor Energy Lab Co Ltd | Liquid crystal display device and its production |
| CN205157937U (en) * | 2015-11-19 | 2016-04-13 | 郴州市晶讯光电有限公司 | Stable liquid crystal cell structure |
| CN106353935A (en) * | 2016-09-30 | 2017-01-25 | 康惠（惠州）半导体有限公司 | LCD light valve structure and manufacturing process thereof |
| CN109559840A (en) * | 2017-09-27 | 2019-04-02 | 张家港康得新光电材料有限公司 | Transparent conductive film, preparation method and capacitive touch screen |
| WO2021205736A1 (en) * | 2020-04-10 | 2021-10-14 | 日産化学株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element |
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