CN114410485A - Fungus strain for degrading polyurethane in soil and application thereof - Google Patents
Fungus strain for degrading polyurethane in soil and application thereof Download PDFInfo
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Abstract
The invention discloses a fungus strain for degrading polyurethane in soil and application thereof, belonging to the technical field of microorganisms. By utilizing the method, the strains separated and purified from the soil polluted by explosive substances are collected, the culture conditions are optimized, and the soil fungi with degraded polyurethane are screened out, so that the method can be applied to microbial degradation of waste polyurethane materials. The method has simple process, visual effect and reliable result, and can provide reference for degrading other high polymer materials. Can be applied to the microbial degradation of waste polyurethane materials.
Description
Technical Field
The invention belongs to the technical field of microorganisms. The utility model relates to a fungus for degrading polyurethane in soil and the application thereof.
Background
Polyurethane is a synthetic polymer produced by reacting polyol and polyisocyanate, and environmental pollution is caused by conventional disposal of waste polyurethane. Most fungi in nature realize degradation function by decomposing lignin and soil organic matters which are difficult to digest or consuming monosaccharide, and the fungi have higher level of biodegradation enzyme activity, and various enzymes play an important role in biodegradation of polymers, especially extracellular enzymes degrade polyurethane substrates by cutting ester bonds and actively participate in biodegradation of polymers. Therefore, people hope to directly separate the fungi with the capability of degrading polyurethane from the soil and solve the problem of environmental pollution caused by polyurethane waste treatment.
At present, no report is found in the prior art on a method for isolating a fungus having an ability to degrade polyurethane from soil.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide a method for degrading polyurethane in soil, which can separate, purify and screen fungi capable of degrading high molecular materials from soil and can degrade the polyurethane in the soil. And further on the basis of obtaining soil fungi by the method, analyzing a physiological and biochemical process mechanism in the microbial degradation process of the polyurethane through enzyme activity detection. Can effectively solve the problem of environmental pollution caused by the conventional treatment method of the polymer material waste.
The invention has two ideas, and the first is to provide a screening method of the fungus for degrading the polyurethane soil. The species name is determined by performing morphological and molecular biology identification on the strain by combining multi-gene sequence comparison and phylogenetic tree analysis. Secondly, on the basis of obtaining soil fungi by the method, the physiological and biochemical process mechanism in the microbial degradation process of polyurethane is analyzed through enzyme activity detection.
In order to achieve the above purpose of the present invention, the present invention provides the following technical solutions:
a fungus strain for degrading polyurethane in soil is fusarium (Fusarium)Fusarium solani) And is preserved in the Guangdong province culture Collection of microorganisms with the preservation number of GDMCC 62182.
The invention also provides application of the fungus strain for degrading the polyurethane in the soil in degrading the polyurethane in the soil.
According to the application, the application adopts the following steps:
(1) optimizing a culture medium: respectively taking SNA + polyurethane, improved PDA + polyurethane, MEA + polyurethane and WA + polyurethane culture media as matrixes, and measuring the weight change of a polyurethane film after culturing for 30 days at room temperature;
(2) optimizing the culture temperature: inoculating the strain of claim 1 into modified PDA + polyurethane matrix, and culturing at 15 deg.C, 25 deg.C, and 30 deg.C for 30 days, and measuring the weight change of polyurethane film;
(3) optimizing the pH value condition: inoculating the strain of claim 1 into a modified PDA + polyurethane matrix, adjusting the pH values of the culture media to 5, 6, 7 and 8 respectively, placing the culture media in a constant temperature incubator at 30 ℃ for 30 days, and measuring the change of the weight of a polyurethane film;
(4) and (3) degrading polyurethane in soil: the strain of claim 1, which is used for degrading polyurethane, the strain of claim 1 is inoculated in a modified PDA + polyurethane matrix with the pH value of 5, and is placed in a constant temperature incubator at 30 ℃ for 30 days, and the change of the weight of a polyurethane film is measured;
the culture medium in the step (4) is modified potato glucose agar, the culture temperature is 30 ℃, the pH value of the culture medium is 5, and the formula of the modified potato glucose agar culture medium is as follows: 150g of potato, 20g of glucose, 20g of agar, 1000mL of water and pH value of 5.
The invention also provides a method for degrading polyurethane in soil, which comprises the following steps: collecting soil polluted by explosive substances, separating and purifying to obtain the fungus strain with the capability of degrading polyurethane, optimizing culture conditions, and screening out soil fungus with degraded polyurethane for degrading polyurethane in soil.
The method for degrading the polyurethane in the soil comprises the following steps:
(1) sampling:
collecting soil samples polluted by explosive substances, drilling soil at a depth of 5cm from the surface layer by using a disinfection spiral, collecting 5 samples at each test point, putting the collected soil samples into a disinfection bag, thoroughly mixing, conveying to a laboratory, and storing in a refrigerator at 4 ℃;
(2) and (3) fungus separation:
1g of a soil sample was shaken in 9mL of sterile water for 1 hour and then centrifuged at 2000 rpm for 10 minutes, and the supernatant was serially diluted under sterile operating conditions, i.e.: suction 10-11mL of the fungal solution was put into a centrifuge tube containing 9mL of sterile water, and shaken up to obtain a solution with a concentration of 10-2The fungal solution of (4) was diluted sequentially in the same way, and the respective dilution was 10-1、10-2、10-3、10-4Finally, 20 mu L of diluent with each concentration is sucked by a pipette and is placed in a culture dish containing a Potato Dextrose Agar (PDA), a sterile glass rod is uniformly smeared on the surface of the culture dish, the culture dish is inverted and cultured in a dark incubator at 28 ℃ for 3-5 days, the cultured fungus colony is transferred to a new PDA culture dish for culturing for 3 days, and subculture and purification are carried out again to obtain a pure culture, namely a strain H14;
(3) screening of degrading strains:
picking a fungus culture with the diameter of about 2mm by using a disinfection needle, placing the fungus culture in a Malt Extract Agar (MEA) culture medium, covering a polyurethane film with the diameter of 80mm on the surface of the MEA culture medium, repeating the steps in parallel for 3 times, culturing the culture in a sterile culture chamber at room temperature (26 +/-2 ℃) for 30 days, collecting the polyurethane film, thoroughly washing the polyurethane film by using distilled water, drying the polyurethane film in the shade, weighing the polyurethane film, and calculating the weight loss condition of the polyurethane film according to the collected data, wherein the result shows that the obtained strain H14 has the highest degradation rate on the polyurethane film in the fungus separation step in the step (2);
and (3) degrading polyurethane in soil:
optimizing a culture medium: respectively taking SNA + polyurethane, improved PDA + polyurethane, MEA + polyurethane and WA + polyurethane culture media as matrixes, and measuring the weight change of a polyurethane film after culturing for 30 days at room temperature;
optimizing the culture temperature: inoculating the strain of claim 1 into modified PDA + polyurethane matrix, and culturing at 15 deg.C, 25 deg.C, and 30 deg.C for 30 days, and measuring the weight change of polyurethane film;
optimizing the pH value condition: inoculating the strain of claim 1 into a modified PDA + polyurethane matrix, adjusting the pH values of the culture media to 5, 6, 7 and 8 respectively, placing the culture media in a constant temperature incubator at 30 ℃ for 30 days, and measuring the change of the weight of a polyurethane film;
and (3) degrading polyurethane in soil: the strain of claim 1, for degrading polyurethane. The strain of claim 1 was inoculated into a modified PDA + polyurethane matrix having a pH of 5, and cultured in a 30 ℃ incubator for 30 days, and the change in weight of the polyurethane film was measured.
The method for degrading the polyurethane in the soil according to the step (4), wherein in the step of degrading the polyurethane in the soil, the culture medium is modified potato dextrose agar, the culture temperature is 30 ℃, and the pH value of the culture medium is 5.
The method for degrading the polyurethane in the soil according to the description, wherein in the step (4) of degrading the polyurethane in the soil, the formula of the improved potato dextrose agar culture medium is as follows: 150g of potato, 20g of glucose, 20g of agar, 1000mL of water and pH value of 5.
In addition, the present invention provides a method for degrading polyurethane in soil using the strain of claim 1, comprising the steps of:
(1) optimizing a culture medium: respectively taking SNA + polyurethane, improved PDA + polyurethane, MEA + polyurethane and WA + polyurethane culture media as matrixes, and measuring the weight change of a polyurethane film after culturing for 30 days at room temperature;
(2) optimizing the culture temperature: inoculating the strain of claim 1 into modified PDA + polyurethane matrix, and culturing at 15 deg.C, 25 deg.C, and 30 deg.C for 30 days, and measuring the weight change of polyurethane film;
(3) optimizing the pH value condition: inoculating the strain of claim 1 into a modified PDA + polyurethane matrix, adjusting the pH values of the culture media to 5, 6, 7 and 8 respectively, placing the culture media in a constant temperature incubator at 30 ℃ for 30 days, and measuring the change of the weight of a polyurethane film;
(4) and (3) degrading polyurethane in soil: the strain of claim 1, which is used for degrading polyurethane, the strain of claim 1 is inoculated in a modified PDA + polyurethane matrix with the pH value of 5, and is placed in a constant temperature incubator at 30 ℃ for 30 days, and the change of the weight of a polyurethane film is measured;
the culture medium in the above steps is modified potato glucose agar, the culture temperature is 30 ℃, and the pH value of the culture medium is 5;
in the step of degrading the polyurethane in the soil in the step (4), the formula of the improved potato glucose agar culture medium is as follows: 150g of potato, 20g of glucose, 20g of agar, 1000mL of water and pH value of 5.
Compared with the prior art, the invention has the following advantages:
1. the invention provides a fungus strain which is not reported in the prior art and has the capability of degrading polyurethane and is separated from soil for the first time and a method thereof, and fills the technical blank.
2. The separation method provided by the invention is simple and feasible, convenient to operate, high in yield, environment-friendly, safe and high in feasibility.
3. The fungus with the capability of degrading polyurethane obtained by the method has the capability of degrading the polyurethane in soil, the strain is inoculated in an improved PDA + polyurethane matrix with the pH value of 5 and is placed in a constant temperature incubator at the temperature of 30 ℃ for culturing for 30 days, the degradation rate of the polyurethane reaches 25.8 percent, and the method has great advantages!
4. The method of the invention can effectively solve the problem of environmental pollution caused by the conventional treatment method of the polymer material waste.
Drawings
FIG. 1 shows the present invention strain H14 (Fusarium solani) In the figure, the a-d strains are on PDA medium; e-g of hyphae; h-k spore-forming cells and conidia; l-q conidia. Scale bar e ‒ k =20 μm, l ‒ q =15 μm;
FIG. 2 is a graph based on LSU, ITS,tef1-alpha andrpb2 data were subjected to a phylogenetic tree generated by Bayesian Inference analysis (Bayesian Inference analysis). In the figure, the support value of the maximum likelihood (maximum likelihood) is equal to or greater than 80%, the Bayesian posterior probability (Bayesian predictor) is greater than or equal to 0.95, and the value is placed above the node. Strain H14 (of the invention)Fusariumsolani) Indicated in bold.
Detailed Description
Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The present embodiment is implemented on the premise of the technical solution of the present invention, and a detailed implementation manner and a specific operation process are given, but the protection scope of the present invention is not limited to the following embodiments. The following specific examples further illustrate the essence of the present invention, but do not limit the present invention. The experimental procedures, in which specific conditions are not specified, in the following examples are generally carried out according to the conditions conventional in the art or according to the conditions recommended by the manufacturers.
Example 1
1. The screening method of the fungus strain comprises the following steps:
the fungal strains of the invention are screened by a dilution coating plate method. 1g of a soil sample was shaken in 9mL of sterile water for 1 hour and then centrifuged at 2000 rpm for 10 minutes, and the supernatant was serially diluted under sterile operating conditions, i.e.: suction 10-11mL of the fungal solution was put into a centrifuge tube containing 9mL of sterile water, and shaken up to obtain a solution with a concentration of 10-2The fungal solution of (4) was diluted sequentially in the same way, and the respective dilution was 10-1、10-2、10-3、10-4Finally, 20. mu.L of each dilution was pipetted and placed in agar medium containing Potato Dextrose (PDA)) The culture dish is evenly smeared on the surface of the culture dish by using a sterile glass rod, the culture dish is inverted and cultured for 3 to 5 days in a dark incubator at the temperature of 28 ℃, the cultured fungus colony is transferred to a new PDA culture dish to be cultured for 3 days, and subculture and purification are carried out again to obtain a pure culture, namely the strain H14 (the invention) of the inventionFusarium solani）。
Selecting a pure fungus culture with the diameter of about 2mm by using a disinfection needle, placing the pure fungus culture in a malt extract agar Medium (MEA), covering a polyurethane film with the diameter of 80mm on the surface of the MEA, repeating the steps in parallel for 3 times, culturing the culture in a sterile culture chamber at room temperature (26 +/-2 ℃) for 30 days, collecting the polyurethane film, thoroughly washing the polyurethane film by using distilled water, drying the polyurethane film in the shade, weighing the polyurethane film, and calculating the weight loss condition of the polyurethane film according to the collected data, wherein the result shows that the obtained strain H14 has the highest degradation rate on the polyurethane film in the step of obtaining the pure fungus culture through fungus separation;
2. identification of the fungal strains of the present invention.
The identification of the fungus strain adopts a method combining morphological identification and molecular identification.
2.1 morphological identification. Inoculating the strain H14 on a PDA culture medium, culturing in a dark incubator at 28 ℃ for 30 days, and performing species identification according to the morphology, color and size of spore-forming cells and conidia generated by hyphae and the morphological characteristics of the strain on the culture medium. The morphological characteristics of the strain are as follows: the hyphae are white, dense, radial, round, conical in the center, full-edged in the edge, smooth in texture, and orange-yellow in the back. The spore-forming cells are single cells, are placed on the top of hyphae and are transparent. Conidia, 14-25 × 3.5-6(x ̅ =18.6 × 5.1, n =30) μm in size, apical, oval or kidney-shaped, colorless, upright or curved, with 2-3 septa, see fig. 1. FIG. 1 shows the present invention strain H14 (Fusarium solani) A-d strain on PDA medium; e-g of hyphae; h-k spore-forming cells and conidia; l-q conidia. Scale bar e ‒ k =20 μm, l ‒ q =15 μm.
2.2 molecular identification. A little hypha is taken, and DNA is extracted by using a Biospin fungal genomic DNA extraction kit (BioFlux). Using genes ITS (ITS4/ITS5), LSU (LR0R/LR5),tef1-α(983F/2218R) andrpb2 (fRPB 2-5F/fRPB2-7 cR) the corresponding gene region was PCR amplified and sequenced. Downloading related sequences from GenBank (http:// www.ncbi.nlm.nih.gov /), processing the data by using software such as BioEdit7.2.3, MAFFTv.7.110, and the like, and performing Maximum Likehood (ML) and Bayesian temporal probabilities (BYPP) analysis by combining multiple genes, thereby constructing species phylogenetic tree, wherein the strain H14 is shown as the phylogenetic treeFusarium solaniSee fig. 2. FIG. 2 is based on the LSU, ITS,tef1-alpha andrpb2 data were subjected to a phylogenetic tree generated by Bayesian Inference analysis (Bayesian Inference analysis). The support value of the maximum likelihood (maximum likelihood) is equal to or greater than 80%, the Bayesian posterior probability (Bayesian predictor) is greater than or equal to 0.95, and the value is placed above the node. Strain H14 (of the invention)Fusariumsolani) Indicated in bold.
3. The preservation condition, time, place, unit and number of the strain.
H14（Fusarium solani) Is preserved in Guangdong province microorganism culture collection with the preservation number of GDMCC 62182 at 1/4/2022.
In view of the fact that the strain may be altered or modified by (spontaneous, physical or chemical) mutation, protoplast fusion, transformation or other means by biotechnology, any mutant of the strain is within the scope of this patent.
Example 2
A method for degrading polyurethane in soil. The method comprises the following steps:
(1) sampling
Soil samples contaminated with explosive materials were collected in the middle of china. Soil collection soil was drilled using a sterile auger to 5cm depth from the surface and 5 samples were collected at each test point. The collected soil samples were placed in a sterile bag, thoroughly mixed, transported to the laboratory and stored in a refrigerator at 4 ℃.
(2) Fungus isolation
A1 g sample of the soil was shaken in 9mL of sterile water for 1 hour and then centrifuged at 2000 rpm for 10 minutes, continuously operating under sterile conditionsDiluting the supernatant, namely: suction 10-11mL of the fungal solution was put into a centrifuge tube containing 9mL of sterile water, and shaken up to obtain a solution with a concentration of 10-2The fungal solution of (4) was diluted sequentially in the same way, and the respective dilution was 10-1、10-2、10-3、10-4Finally, 20. mu.L of each concentration of the dilution was pipetted, placed in a petri dish containing Potato Dextrose Agar (PDA) medium, and uniformly applied to the surface of the petri dish using a sterile glass rod. The plates were inverted and incubated in a dark incubator at 28 ℃ for 3-5 days. Transferring the cultured fungus colony to a new PDA culture dish for 3 days, subculturing and purifying again to obtain a pure culture, namely the strain H14 (of the invention)Fusarium solani）。
(3) Screening of degrading strains
Approximately 2mm of the fungal culture was picked up with a sterile needle, placed in malt extract agar Medium (MEA), and a polyurethane film 80mm in diameter was applied to the MEA surface (3 replicates in parallel). The cultures were incubated for 30 days at room temperature (26. + -. 2 ℃) in a sterile incubator. Collecting the polyurethane film, thoroughly washing with distilled water, drying in the shade, and weighing. The results showed that in the step (2) of fungus isolation, the strain H14 (E) was obtainedFusarium solani) The degradation rate of the polyurethane reaches 22.1 percent.
(4) Degradation of polyurethane in soil
And (4) optimizing the culture medium. Respectively taking SNA + polyurethane, modified PDA + polyurethane, MEA + polyurethane and WA + polyurethane culture media as matrixes, and measuring the weight change of the polyurethane membrane after culturing for 30 days at room temperature. The result shows that the improved PDA culture medium has the greatest influence on the degradation rate of polyurethane, and the degradation rate can reach 12.6%.
And (4) optimizing the culture temperature. Strain H14 (Fusarium solani) Inoculating into modified PDA + polyurethane matrix, culturing at 15 deg.C, 25 deg.C and 30 deg.C for 30 days, and measuring the weight change of polyurethane film. The result shows that the highest degradation rate of the polyurethane can reach 19.1% when the temperature is 30 ℃.
And (4) optimizing the pH value condition. Strain H14 (Fusarium solani) Inoculating to modified PDA + polyurethaneIn the ester matrix, the pH values of the culture media are respectively adjusted to be 5, 6, 7 and 8, and after the culture media are placed in an incubator at 30 ℃ for 30 days, the result shows that the highest degradation rate of the polyurethane can be up to 25.8% when the pH value is 5.
And (3) degrading the polyurethane in the soil.Fusarium solaniThe optimal laboratory conditions for degrading polyurethane (screened species with degraded polyurethane) are: modified potato dextrose agar medium (pH 5) at 30 ℃. The formula of the improved potato glucose agar culture medium comprises: 150g of potato, 20g of glucose, 20g of agar, 1000mL of water and pH value of 5.
The fungus with the capability of degrading polyurethane obtained by the method has the capability of degrading polyurethane in soil, and the strain H14 (A) (B)Fusarium solani) The modified PDA + polyurethane is inoculated into a modified PDA + polyurethane matrix with the pH value of 5 and is placed in a constant temperature incubator at the temperature of 30 ℃ for 30 days, and the degradation rate of the polyurethane reaches 25.8 percent, thereby proving that the method has great benefits.
Claims (8)
1. A fungus strain for degrading polyurethane in soil is characterized in that the strain is fusarium (Fusarium sp.) (Fusarium solani) And is preserved in the Guangdong province culture Collection of microorganisms with the preservation number of GDMCC 62182.
2. Use of a fungal strain according to claim 1 for degrading polyurethane in soil.
3. The use of a fungal strain capable of degrading polyurethane in soil according to claim 1 for degrading polyurethane in soil by the steps of:
(1) optimizing a culture medium: respectively taking SNA + polyurethane, improved PDA + polyurethane, MEA + polyurethane and WA + polyurethane culture media as matrixes, and measuring the weight change of a polyurethane film after culturing for 30 days at room temperature;
(2) optimizing the culture temperature: inoculating the strain of claim 1 into modified PDA + polyurethane matrix, and culturing at 15 deg.C, 25 deg.C, and 30 deg.C for 30 days, and measuring the weight change of polyurethane film;
(3) optimizing the pH value condition: inoculating the strain of claim 1 into a modified PDA + polyurethane matrix, adjusting the pH values of the culture media to 5, 6, 7 and 8 respectively, placing the culture media in a constant temperature incubator at 30 ℃ for 30 days, and measuring the change of the weight of a polyurethane film;
(4) and (3) degrading polyurethane in soil: the strain of claim 1, which is used for degrading polyurethane, the strain of claim 1 is inoculated in a modified PDA + polyurethane matrix with the pH value of 5, and is placed in a constant temperature incubator at 30 ℃ for 30 days, and the change of the weight of a polyurethane film is measured;
the culture medium in the step (4) is modified potato glucose agar, the culture temperature is 30 ℃, and the pH value of the culture medium is 5; the formula of the improved potato glucose agar culture medium comprises: 150g of potato, 20g of glucose, 20g of agar, 1000mL of water and pH value of 5.
4. A method of degrading polyurethane in soil, comprising the steps of: collecting soil polluted by explosive substances, separating and purifying to obtain the fungus strain with the capability of degrading polyurethane according to claim 1, optimizing culture conditions, and screening out soil fungi with degraded polyurethane for degrading polyurethane in soil.
5. The method of claim 4, wherein the method comprises the steps of:
sampling:
collecting soil samples polluted by explosive substances, drilling soil at a depth of 5cm from the surface layer by using a disinfection spiral, collecting 5 samples at each test point, putting the collected soil samples into a disinfection bag, thoroughly mixing, conveying to a laboratory, and storing in a refrigerator at 4 ℃;
and (3) fungus separation:
1g of a soil sample was shaken in 9mL of sterile water for 1 hour and then centrifuged at 2000 rpm for 10 minutes, and the supernatant was serially diluted under sterile operating conditions, i.e.: suction 10-11mL of the fungal solution was put into a centrifuge tube containing 9mL of sterile water, and shaken up to obtain a solution with a concentration of 10-2The fungal solution of (4) was diluted sequentially in the same way, and the respective dilution was 10-1、10-2、10-3、10-4Finally, 20 mu L of diluent with each concentration is sucked by a pipette and is placed in a culture dish containing a Potato Dextrose Agar (PDA), a sterile glass rod is uniformly smeared on the surface of the culture dish, the culture dish is inverted and cultured in a dark incubator at 28 ℃ for 3-5 days, the cultured fungus colony is transferred to a new PDA culture dish for culturing for 3 days, and subculture and purification are carried out again to obtain a pure culture, namely a strain H14;
screening of degrading strains:
picking a fungus culture with the diameter of about 2mm by using a disinfection needle, placing the fungus culture in a Malt Extract Agar (MEA) culture medium, covering a polyurethane film with the diameter of 80mm on the surface of the MEA culture medium, repeating the steps in parallel for 3 times, culturing the culture in a sterile culture chamber at room temperature (26 +/-2 ℃) for 30 days, collecting the polyurethane film, thoroughly washing the polyurethane film by using distilled water, drying the polyurethane film in the shade, weighing the polyurethane film, and calculating the weight loss condition of the polyurethane film according to the collected data, wherein the result shows that the obtained strain H14 has the highest degradation rate on the polyurethane film in the fungus separation step in the step (2);
and (3) degrading polyurethane in soil:
optimizing a culture medium: respectively taking SNA + polyurethane, improved PDA + polyurethane, MEA + polyurethane and WA + polyurethane culture media as matrixes, and measuring the weight change of a polyurethane film after culturing for 30 days at room temperature;
optimizing the culture temperature: inoculating the strain of claim 1 into modified PDA + polyurethane matrix, and culturing at 15 deg.C, 25 deg.C, and 30 deg.C for 30 days, and measuring the weight change of polyurethane film;
optimizing the pH value condition: inoculating the strain of claim 1 into a modified PDA + polyurethane matrix, adjusting the pH values of the culture media to 5, 6, 7 and 8 respectively, placing the culture media in a constant temperature incubator at 30 ℃ for 30 days, and measuring the change of the weight of a polyurethane film;
and (3) degrading polyurethane in soil: the strain of claim 1, for degrading polyurethane;
the strain of claim 1 was inoculated into a modified PDA + polyurethane matrix with a pH of 5 and placed in a 30 ℃ incubator for 30 days.
6. The method for degrading polyurethane in soil according to claim 5, wherein in the step of degrading polyurethane in soil in step (4), the culture medium is modified potato dextrose agar, the culture temperature is 30 ℃, and the pH value of the culture medium is 5.
7. The method for degrading polyurethane in soil according to claim 5, wherein in the step of degrading polyurethane in soil in step (4), the formula of the modified potato dextrose agar medium is as follows: 150g of potato, 20g of glucose, 20g of agar, 1000mL of water and pH value of 5.
8. A method for degrading polyurethane in soil by using the strain of claim 1, comprising the steps of:
(1) optimizing a culture medium: respectively taking SNA + polyurethane, improved PDA + polyurethane, MEA + polyurethane and WA + polyurethane culture media as matrixes, and measuring the weight change of a polyurethane film after culturing for 30 days at room temperature;
(2) optimizing the culture temperature: inoculating the strain of claim 1 into modified PDA + polyurethane matrix, and culturing at 15 deg.C, 25 deg.C, and 30 deg.C for 30 days, and measuring the weight change of polyurethane film;
(3) optimizing the pH value condition: inoculating the strain of claim 1 into a modified PDA + polyurethane matrix, adjusting the pH values of the culture media to 5, 6, 7 and 8 respectively, placing the culture media in a constant temperature incubator at 30 ℃ for 30 days, and measuring the change of the weight of a polyurethane film;
(4) and (3) degrading polyurethane in soil: the strain of claim 1, which is used for degrading polyurethane, the strain of claim 1 is inoculated in a modified PDA + polyurethane matrix with the pH value of 5, and is placed in a constant temperature incubator at 30 ℃ for 30 days, and the change of the weight of a polyurethane film is measured;
the culture medium in the step (4) is modified potato glucose agar, the culture temperature is 30 ℃, and the pH value of the culture medium is 5; the formula of the improved potato glucose agar culture medium comprises: 150g of potato, 20g of glucose, 20g of agar, 1000mL of water and pH value of 5.
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