CN114401580B - Low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system - Google Patents
Low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system Download PDFInfo
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- CN114401580B CN114401580B CN202210191897.5A CN202210191897A CN114401580B CN 114401580 B CN114401580 B CN 114401580B CN 202210191897 A CN202210191897 A CN 202210191897A CN 114401580 B CN114401580 B CN 114401580B
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- frequency electrode
- ion beam
- electrode plates
- focusing system
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- 238000010884 ion-beam technique Methods 0.000 title claims abstract description 15
- 230000006978 adaptation Effects 0.000 claims abstract description 6
- 239000000919 ceramic Substances 0.000 claims abstract description 6
- 239000003990 capacitor Substances 0.000 claims abstract 3
- 239000000178 monomer Substances 0.000 claims description 16
- 238000011144 upstream manufacturing Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 150000002500 ions Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000009471 action Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000003044 adaptive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H15/00—Methods or devices for acceleration of charged particles not otherwise provided for, e.g. wakefield accelerators
Abstract
The invention discloses a focusing system of a low-vacuum cluster and heavy ion beam radio frequency annular electrode group, which comprises a fixed seat plate, wherein a plurality of structure fixing parts are arranged on the fixed seat plate along the axial direction of the fixed seat plate, a plurality of radio frequency electrode plates are arranged on the fixed seat plate at equal intervals along the axial direction of the structure fixing parts, inlets are arranged on the fixed seat plate, through holes are arranged on the inner sides of the radio frequency electrode plates, a resistor is connected between every two adjacent radio frequency electrode plates, a high-voltage ceramic chip capacitor is connected between every two radio frequency electrode plates in sequence and between every two radio frequency motor plates in sequence along the overlapping direction of the radio frequency electrode plates and connected in parallel, a vacuum cavity is further arranged on the fixed seat plate, the focusing system of the low-vacuum cluster and heavy ion beam radio frequency annular electrode group has strong adaptation to vacuum, the application range of the high-vacuum is up to 100 Pa, the ion beam radio frequency annular electrode group has an optimal design with the charge-to mass ratio of more than 3000 Da, and the passing rate of over 73.5 percent by adopting special materials. The formation of plasmons is prevented under a low vacuum.
Description
Technical Field
The invention relates to the technical field of low-vacuum cluster beam focusing systems, in particular to a low-vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system.
Background
The atomic-level material produced by the common physical method is zero-dimensional (dot-like) or one-dimensional (linear). In a cluster beam source, charged particles are generated under a low vacuum and then need to be transferred to be manipulated and analyzed in a high vacuum environment, and as charged clusters are shuttled from a low vacuum region to a higher vacuum region due to a transport process caused by an adiabatic expansion phenomenon called "free jet expansion", the charged clusters will expand with the background carrier gas flow to create a divergence angle, which in turn causes the clusters to expand outwards, eventually resulting in the loss of these target charged clusters. This phenomenon limits the transfer efficiency and therefore fewer ions are analyzed. Therefore, we propose a focusing system for low vacuum cluster and heavy ion beam RF ring electrode set.
Disclosure of Invention
The present invention aims to provide a device for manipulating focus clusters (heavy ions) in a low vacuum range using ring electrodes in a stacked configuration, to solve the problems set forth in the background art described above.
In order to achieve the above purpose, the present invention provides the following technical solutions: the utility model provides a low vacuum cluster and heavy ion beam radio frequency ring electrode group focusing system, includes the fixed bedplate, be equipped with a plurality of structure mounting along its axial on the fixed bedplate, the fixed bedplate sets up a plurality of radio frequency electrode plates along the outside equidistance interval of structure mounting axial, the entry has been seted up on the fixed bedplate, the through-hole has been seted up to the inboard of radio frequency electrode plate, on each radio frequency electrode plate the through-hole is whole toper to radio frequency electrode plate stack direction in the entrance, every adjacent two be connected with a resistor between the radio frequency electrode plate, along between the radio frequency electrode plate stack direction every single order radio frequency electrode plate and between every double-order radio frequency motor plate all be connected a high voltage porcelain piece electric capacity and parallelly connected, still be equipped with the vacuum cavity on the fixed bedplate.
Preferably, the radio frequency electrode plates are provided with plates, each plate has a thickness of 1mm, an outer diameter of 45mm, a distance between every two adjacent radio frequency electrode plates is 2.5mm, an inlet at the end of the fixed seat plate is an upstream of a cluster inlet, the other end of the fixed seat plate is a downstream, the inner diameters of the radio frequency electrode plates from the upstream to the other end are 25mm, the inner diameters of the radio frequency electrode plates from the first to the second are reduced by 1.05mm, the inner diameters of the electrode plates at the downstream end are 3mm, the capacitance value of the high-voltage ceramic plate is 100pF, the withstand voltage is 10kV, and the resistance value of the resistor is 1MΩ.
Preferably, the structure fixing part is composed of a plurality of single connecting parts, the single connecting parts are in a stepped shaft shape, a first thread section is arranged on the outer side wall of one end of each single connecting part, a groove is formed in the other end of each single connecting part, the side wall of each groove is arranged in an adaptive mode with the first thread section, and the single connecting parts adjacent to the fixing seat plate are fixedly connected to the fixing seat plate.
Preferably, a through groove is formed in the axial center line of the single connecting piece, a second thread section is arranged in the through groove, a screw rod matched with the second thread section is commonly connected between the single connecting pieces, the threads on the second thread section and the first thread section are identical in rotation direction, and the other parameters are different.
Preferably, the outer surface thread discontinuous threads of the screw rod are circumferentially divided into a plurality of blank areas and thread areas on the end surface of the screw rod, the thread areas and the blank areas are alternately distributed, the second thread sections are arranged in a matched mode on the surface of the screw rod, and the circumferential angle of a single thread area is not larger than that of a single blank area.
Preferably, the bottom surface of the groove on the single connecting piece connected with the fixed seat board is connected with an elastic piece.
Preferably, a non-circular protruding block or a non-circular groove is arranged at the top of the screw rod.
Preferably, the bottom side wall of the single connecting piece is provided with a weight-reducing cavity.
Compared with the prior art, the invention has the beneficial effects that:
1. the invention has stronger vacuum application range up to 100 Pa;
2. the method has strong adaptability to heavy ions, and has the advantages that the method optimizes the design of the ions with the charge-to-mass ratio of more than 3000 Da, and the passing rate exceeds 73.5%;
3. adopting special materials to prevent the formation of plasmons under low vacuum;
4. the structure fixing piece is connected in a single connecting piece mode, the radio frequency electrode plate can be quickly installed and effectively positioned, after the radio frequency electrode plate is installed, the second thread section is different from the first thread section on the single connecting piece in thread parameters, so that the radio frequency electrode plate cannot synchronously rotate, and the radio frequency electrode plate is effectively locked to prevent loosening;
5. the partition of second screw thread section sets up, can need not whole precession when the installation, and convenient quick installation.
Drawings
FIG. 1 is a schematic diagram of the overall structure of the present invention;
FIG. 2 is a schematic diagram of a half-section structure of a radio frequency electrode plate according to the present invention;
FIG. 3 is a schematic cross-sectional view of a structural fastener of the present invention;
FIG. 4 is an enlarged schematic view of the structure of the area A in FIG. 3;
FIG. 5 is a schematic diagram of the top end face structure of the single connector and the lead screw in a connected state;
FIG. 6 is a schematic view of the structure of the bottom end face of the single connector and the lead screw in the connected state;
fig. 7 is an overall circuit schematic.
In the figure: 1-fixing a seat board; 2-structural fixtures; 3-a radio frequency electrode plate; 4-inlet; 5-through holes; 6-monomer connection; 7-a first thread segment; 8-grooves; 9-through grooves; 10-a second thread segment; 11-screw rod; 12-blank area; 13-threaded zone; 14-an elastic member; 15-weight-reducing chamber.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 1-7, the present invention provides a technical solution: the utility model provides a low vacuum cluster and heavy ion beam radio frequency ring electrode group focusing system, includes fixed bedplate 1, be equipped with a plurality of structure mounting 2 along its axial on the fixed bedplate 1, fixed bedplate 1 is equipped with a plurality of radio frequency electrode plates 3 along the outside equidistance interval of structure mounting 2 axial, inlet 4 has been seted up on the fixed bedplate 1, through-hole 5 has been seted up to the inboard of radio frequency electrode plates 3, on each radio frequency electrode plate 3 the through-hole 5 is whole toper to radio frequency electrode plate 3 stack direction in inlet 4 department, every adjacent two be connected with a resistor between the radio frequency electrode plates 3, along the radio frequency electrode plate 3 stack direction every single-order radio frequency electrode plate 3 between and every double-order radio frequency motor plate all be connected a high voltage ceramic chip electric capacity and parallelly connected, still be equipped with the vacuum chamber body on the fixed bedplate 1, the vacuum chamber is with the structure that fixed base 1 and radio frequency electrode plate 3 constitute is whole contained in to fix on fixed base 1 through the flange, vacuum chamber and flange are used for maintaining intracavity vacuum degree and are responsible for super high vacuum connection with upper and lower level structure, and are responsible for applying radio frequency potential constraint group/heavy alternating current voltage and are applied on regulation and control circuit element.
The radio-frequency electrode plates 3 are provided with 36 plates, the thickness of each plate is 1mm, the outer diameter is 45mm, the distance between every two adjacent radio-frequency electrode plates 3 is 2.5mm, an inlet 4 at the end part of the fixed seat plate 1 is the upstream of the entrance of a cluster, the other end of the fixed seat plate is the downstream, the radio-frequency electrode plates 3 from the upstream to the other end are 25mm, the inner diameter of each plate from the 1 st to 15 th is reduced by 1.05mm, the inner diameter of each plate at the downstream end is 3mm, the capacitance value of each high-voltage ceramic plate is 100pF, the withstand voltage is 10kV, the resistance value of the resistor is 1MΩ, an inert gas carrier gas flow with the flow rate of less than 1000 sccm is generated at the upstream end of a focusing system, the space background air pressure of the focusing system is less than 100 Pa, the focusing device is in a multi-layer disc electrode structure, the applied voltages are divided into two types, and the voltage flowing from the ion transmission of the device to the upstream side to the downstream side (the conical small hole is contracted). Each radio frequency electrode plate 3 is applied with a direct current potential which is uniformly increased, the electric field intensity is set to 1000-23000V/m according to different background air pressures, and an alternating current oscillating potential is applied between the odd-numbered radio frequency electrode plates 3 and the even-numbered radio frequency electrode plates 3 by using an alternating current power supply on a multi-layer disc-shaped structure of the focusing device. The shaking voltage (Vpp) is 100 to 5000V, the frequency is fixed at 0.7 MHz, and the focused cluster material is collected at the downstream exit or directed into other ion manipulation devices after entry.
The structure mounting 2 comprises a plurality of monomer connecting pieces 6, the monomer connecting pieces 6 are the step shaft form, and its whole cross-section is protruding word structure, and the step shaft between two adjacent monomer connecting pieces 6 is used for installing and spacing radio frequency electrode plate 3, and its one end lateral wall is equipped with first screw thread section 7, the other end of monomer connecting pieces 6 is equipped with recess 8, recess 8's lateral wall and first screw thread section 7 adaptation setting, with fixed bedplate 1 adjacent monomer connecting pieces 6 fixed connection is on fixed bedplate 1, first screw thread section 7 and recess 8 threaded connection, and is directly used for fixed both, and simultaneously with the radio frequency electrode plate 3 clamp, for other modes, this mode can one layer of fixed, and is more convenient, the bottom lateral wall of monomer connecting pieces 6 is equipped with the weight-reducing chamber 15, and the weight-reducing chamber 15 is with alleviateing its quality, and produces the structure frame simultaneously, when not influencing intensity, reduces the contact surface between bottom surface and the radio frequency 3, effectively improves the coincidence.
The top of the screw 11 is provided with a non-circular protruding block or a non-circular groove, the non-circular protruding block or the non-circular groove is convenient for a tool to rotate from the top to screw in, and the non-circular protruding block or the non-circular groove is preferably of a regular hexagonal structure and can be the same standard as an inner hexagonal screw/a hexagonal screw and the like, so that the tool such as a standard hexagonal spanner can be conveniently used.
For the structure that connects through the monomer connecting piece 6, because threaded connection will loosen after a certain time, loosen and influence holistic stability, thereby influence cluster/heavy ion's gathering effect, consequently set up logical groove 9 on the axial central line of monomer connecting piece 6, be equipped with second screw thread section 10 in the logical inslot 9, each be connected with the lead screw 11 with second screw thread section 10 adaptation jointly between the monomer connecting piece 6, second screw thread section 10 is the same with the screw thread on the first screw thread section 7, all other parameters are different, lead screw 11 is the connection that is used for locking between each monomer connecting piece 6 to loosen with second screw thread section 10, because the screw thread parameter of both is different, the difference of parameter is mainly with can synchronous rotation as the standard, different screw journey just lead to both can not synchronous rotation, also can change screw thread size or other parameters to realize, only when the state after the screw thread connection is released, the screw connection between two adjacent monomer connecting pieces 6 just can rotate and break away from the connection state, and even the screw thread 11 is that the relative rotation angle can not make between two adjacent screw thread sections 6 rotate with the first screw thread section 10.
The outer surface thread discontinuous threads of the screw rod 11 are circumferentially divided into a plurality of blank areas 12 and thread areas 13 at the end face of the screw rod 11, the thread areas 13 and the blank areas 12 are alternately distributed, the second thread sections 10 are arranged in a surface adaptation mode with the screw rod 11, the circumference angle of each single thread area 13 is not larger than that of each single blank area 12, when the surface of the screw rod 11 is in a continuous thread, in the vertical state after all single connecting pieces 6 are connected, the screw rod 11 needs to be integrally screwed in, namely, the length of each single structure fixing piece 2 is the screwing length of the screw rod 11, so that the screw rod 11 is difficult to screw in along with the larger screwing distance, time and labor are wasted, the blank areas 12 and the thread areas 13 are arranged to be conveniently and directly fed in a mode corresponding to the thread areas in the grooves 8 through the blank areas 12 on the screw rod 11 in a longer range, the screw rod 11 starts to rotate to screw in the mode when the bottom end of the screw rod 11 is just contacted with the lowest single connecting piece 6, the time and effort are reduced, the base plate is connected with the bottom surface of each single connecting piece 6 connected with the fixing piece 1, namely, the elastic piece 14 is connected with the bottom surface of the groove 8 in the single connecting piece 6, and the elastic piece 14 is screwed in the position of the bottom connecting piece is just contacting the bottom connecting piece 6, and the single connecting piece is placed into the bottom connecting piece 11, and is convenient to place at the bottom connecting piece, and is placed into the bottom connecting piece 11.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (6)
1. The utility model provides a low vacuum cluster and heavy ion beam radio frequency ring electrode group focusing system, includes fixed bedplate (1), its characterized in that: a plurality of structure fixing pieces (2) are arranged on the fixing seat board (1) along the axial direction of the fixing seat board, a plurality of radio frequency electrode plates (3) are arranged on the fixing seat board (1) along the axial direction of the structure fixing pieces (2) at equal intervals outwards, an inlet (4) is formed in the fixing seat board (1), a through hole (5) is formed in the inner side of each radio frequency electrode plate (3), the through holes (5) on each radio frequency electrode plate (3) are integrally conical in the overlapping direction of the radio frequency electrode plates (3) at the inlet (4), a resistor is connected between every two adjacent radio frequency electrode plates (3), a high-voltage ceramic chip capacitor is connected between every two radio frequency electrode plates (3) along the overlapping direction of the radio frequency electrode plates (3) and between every two radio frequency motor plates, and the fixing seat board (1) is also provided with a vacuum cavity;
the radio frequency electrode plates (3) are provided with 36 pieces, each piece has a thickness of 1mm and an outer diameter of 45mm, the distance between every two adjacent radio frequency electrode plates (3) is 2.5mm, an inlet (4) at the end part of the fixed seat plate (1) is the upstream of a cluster entrance, the other end of the fixed seat plate is the downstream, the inside diameter of each of the radio frequency electrode plates (3) from the 1 st piece to the 15 th piece is 25mm from the upstream to the other end, the inside diameter size of each of the 16 th piece is reduced by 1.05mm in a descending way, the inside diameter of the electrode plate at the downstream port is 3mm, the capacitance value of the capacitor of the high-voltage ceramic piece is 100pF, the withstand voltage is 10kV, and the resistance value of the resistor is 1MΩ;
the bottom surface of the groove (8) on the single connecting piece (6) connected with the fixed seat board (1) is connected with an elastic piece (14).
2. The focusing system for a low vacuum cluster and heavy ion beam rf ring electrode set of claim 1, wherein: the structure mounting (2) comprises a plurality of monomer connecting pieces (6), monomer connecting pieces (6) are the step shaft form, and its one end lateral wall is equipped with first screw thread section (7), the other end of monomer connecting pieces (6) is equipped with recess (8), the lateral wall and the first screw thread section (7) adaptation of recess (8) set up, with fixed bedplate (1) are adjacent monomer connecting pieces (6) fixed connection is on fixed bedplate (1).
3. The focusing system of the low vacuum cluster and heavy ion beam rf ring electrode set of claim 2, wherein: a through groove (9) is formed in the axial center line of the single connecting piece (6), a second thread section (10) is arranged in the through groove (9), a screw rod (11) matched with the second thread section (10) is connected between the single connecting pieces (6), the threads on the second thread section (10) and the threads on the first thread section (7) are identical in rotation direction, and the other parameters are different.
4. A focusing system for a low vacuum cluster and heavy ion beam rf ring electrode set according to claim 3, wherein: the outer surface thread discontinuous threads of the screw rod (11) are circumferentially divided into a plurality of blank areas (12) and thread areas (13) on the end surface of the screw rod (11), the thread areas (13) and the blank areas (12) are alternately distributed, the second thread sections (10) are arranged in a surface adaptation mode with the screw rod (11), and the circumferential angle of a single thread area (13) is not larger than that of a single blank area (12).
5. A focusing system for a low vacuum cluster and heavy ion beam rf ring electrode set according to claim 3, wherein: the top of the screw rod (11) is provided with a non-circular convex block or a non-circular groove.
6. The focusing system of the low vacuum cluster and heavy ion beam rf ring electrode set of claim 2, wherein: the bottom side wall of the single connecting piece (6) is provided with a weight-reducing cavity (15).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210191897.5A CN114401580B (en) | 2022-03-01 | 2022-03-01 | Low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210191897.5A CN114401580B (en) | 2022-03-01 | 2022-03-01 | Low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system |
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| Publication Number | Publication Date |
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| CN114401580A CN114401580A (en) | 2022-04-26 |
| CN114401580B true CN114401580B (en) | 2023-12-19 |
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| CN202210191897.5A Active CN114401580B (en) | 2022-03-01 | 2022-03-01 | Low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4879518A (en) * | 1987-10-13 | 1989-11-07 | Sysmed, Inc. | Linear particle accelerator with seal structure between electrodes and insulators |
| JPH09213498A (en) * | 1996-02-05 | 1997-08-15 | Hitachi Ltd | Quadrupole ion accumulating ring |
| US5811944A (en) * | 1996-06-25 | 1998-09-22 | The United States Of America As Represented By The Department Of Energy | Enhanced dielectric-wall linear accelerator |
| TW200908057A (en) * | 2007-04-10 | 2009-02-16 | Sen Corp An Shi And Axcelis Company | Ion implantation apparatus and method of converging/shaping ion beam used therefor |
| CN203242597U (en) * | 2012-10-20 | 2013-10-16 | 应用材料公司 | Segmental type focus ring assembly |
| JP5686453B1 (en) * | 2014-04-23 | 2015-03-18 | 株式会社京都ニュートロニクス | Charged particle accelerator |
| CN110828022A (en) * | 2018-08-14 | 2020-02-21 | 华为技术有限公司 | Ion optical cavity coupling system and method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0028586D0 (en) * | 2000-11-23 | 2001-01-10 | Univ Warwick | An ion focussing and conveying device |
| WO2015101824A1 (en) * | 2014-01-02 | 2015-07-09 | Dh Technologies Development Pte. Ltd. | Homogenization of the pulsed electric field created in a ring stack ion accelerator |
-
2022
- 2022-03-01 CN CN202210191897.5A patent/CN114401580B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4879518A (en) * | 1987-10-13 | 1989-11-07 | Sysmed, Inc. | Linear particle accelerator with seal structure between electrodes and insulators |
| JPH09213498A (en) * | 1996-02-05 | 1997-08-15 | Hitachi Ltd | Quadrupole ion accumulating ring |
| US5811944A (en) * | 1996-06-25 | 1998-09-22 | The United States Of America As Represented By The Department Of Energy | Enhanced dielectric-wall linear accelerator |
| TW200908057A (en) * | 2007-04-10 | 2009-02-16 | Sen Corp An Shi And Axcelis Company | Ion implantation apparatus and method of converging/shaping ion beam used therefor |
| CN203242597U (en) * | 2012-10-20 | 2013-10-16 | 应用材料公司 | Segmental type focus ring assembly |
| JP5686453B1 (en) * | 2014-04-23 | 2015-03-18 | 株式会社京都ニュートロニクス | Charged particle accelerator |
| CN110828022A (en) * | 2018-08-14 | 2020-02-21 | 华为技术有限公司 | Ion optical cavity coupling system and method |
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| CN114401580A (en) | 2022-04-26 |
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