CN114401580A - Low-vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system - Google Patents
Low-vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system Download PDFInfo
- Publication number
- CN114401580A CN114401580A CN202210191897.5A CN202210191897A CN114401580A CN 114401580 A CN114401580 A CN 114401580A CN 202210191897 A CN202210191897 A CN 202210191897A CN 114401580 A CN114401580 A CN 114401580A
- Authority
- CN
- China
- Prior art keywords
- radio frequency
- focusing system
- fixed seat
- seat plate
- thread section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 title claims abstract description 9
- 239000000919 ceramic Substances 0.000 claims abstract description 7
- 239000000178 monomer Substances 0.000 claims description 15
- 230000006978 adaptation Effects 0.000 claims description 4
- 239000013585 weight reducing agent Substances 0.000 claims description 2
- 230000007423 decrease Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 abstract description 10
- 239000000463 material Substances 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000003990 capacitor Substances 0.000 abstract description 2
- 230000003044 adaptive effect Effects 0.000 abstract 2
- 238000005457 optimization Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 5
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000037427 ion transport Effects 0.000 description 1
- 210000001503 joint Anatomy 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H15/00—Methods or devices for acceleration of charged particles not otherwise provided for, e.g. wakefield accelerators
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system, which comprises a fixed seat plate, wherein a plurality of structure fixing pieces are arranged on the fixed seat plate along the axial direction of the fixed seat plate, a plurality of radio frequency electrode plates are arranged on the fixed seat plate along the structure fixing pieces axially outwards at equal intervals, an inlet is arranged on the fixed seat plate, through holes are arranged on the inner sides of the radio frequency electrode plates, a resistor is connected between every two adjacent radio frequency electrode plates, a high voltage ceramic chip capacitor is connected between every two odd radio frequency electrode plates and every two even radio frequency motor plates in the stacking direction of the radio frequency electrode plates and connected in parallel, a vacuum cavity is also arranged on the fixed seat plate, the low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system has a strong adaptive range to vacuum, the maximum pressure is 100 Pa, the adaptive capacity to heavy ions is strong, and the ion optimization design of the charge-mass ratio larger than 3000 Da is realized, the passing rate exceeds 73.5 percent, and special materials are adopted. The formation of plasmons is prevented under low vacuum.
Description
Technical Field
The invention relates to the technical field of low vacuum cluster beam focusing systems, in particular to a low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system.
Background
The atomic-scale material produced by the general physical method is zero-dimensional (dot-shaped) or one-dimensional (linear). In the cluster beam source, charged particles are generated under low vacuum and then need to be transferred to a high vacuum environment for manipulation and analysis, and due to a transmission process caused by an adiabatic expansion phenomenon called free jet expansion, when the charged clusters shuttle from a low vacuum region to a higher vacuum region, the charged clusters expand along with background carrier airflow to generate a divergence angle, so that the clusters expand outwards, and finally the target charged clusters are lost. This phenomenon limits the transfer efficiency and therefore fewer ions are analyzed. Therefore, a low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system is provided.
Disclosure of Invention
An object of the present invention is to provide a device for manipulating a focused cluster (heavy ions) using ring electrodes arranged in a stacked manner in a low vacuum range, so as to solve the problems suggested in the background art described above.
In order to achieve the purpose, the invention provides the following technical scheme: the utility model provides a low vacuum cluster and heavy ion beam current radio frequency ring electrode group focus system, includes fixed bedplate, be equipped with a plurality of structural fixing spare along its axial on the fixed bedplate, fixed bedplate sets up a plurality of radio frequency plate electrodes along the outside equidistance interval of structural fixing spare axial, the entry has been seted up on the fixed bedplate, and the through-hole has been seted up to the inboard of radio frequency plate electrode, on each radio frequency plate electrode the through-hole is whole to be the toper, per adjacent two to radio frequency plate electrode stack orientation in the entrance be connected with a resistor between the radio frequency plate electrode, all connect a high-pressure ceramic chip electric capacity and parallelly connected between every two series radio frequency motor boards between every single series radio frequency plate electrode and on the radio frequency plate stack orientation, still be equipped with the vacuum cavity on the fixed bedplate.
Preferably, the radio frequency electrode board is equipped with the piece, and every thickness is 1mm, and the external diameter is 45mm, adjacent two interval between the radio frequency electrode board is 2.5mm, fixing base board end entry is the upper reaches that the cluster got into, and the other end is low reaches, plays to the other end by the upper reaches, and the first radio frequency electrode board internal diameter is 25mm to the second, and the second piece plays every piece of its internal diameter size and dwindles 1.05mm progressively, and the internal diameter of low reaches port department electrode board is 3mm, high-pressure ceramic chip capacitance value is 100pF, and withstand voltage 10kV, the resistor resistance is 1M omega.
Preferably, the structure mounting comprises a plurality of monomer connecting pieces, the monomer connecting piece is the step shaft form, and its one end lateral wall is equipped with first screw thread section, the other end of monomer connecting piece is equipped with the recess, the lateral wall and the first screw thread section adaptation setting of recess, adjacent with fixed bedplate monomer connecting piece fixed connection is on fixed bedplate.
Preferably, a through groove is formed in the axial center line of the single connecting pieces, a second thread section is arranged in the through groove, a lead screw matched with the second thread section is connected between the single connecting pieces, the thread turning directions of the second thread section and the first thread section are the same, and other parameters are different.
Preferably, the outer surface screw thread non-continuity screw thread of lead screw, it divide into a plurality of blank regions and screw thread district in lead screw terminal surface circumference, and screw thread district and blank region alternate distribution, the second screw thread section sets up with lead screw surface adaptation, and the circumference angle of single screw thread district is not more than single blank region circumference angle.
Preferably, the bottom surface of the groove on the single connecting piece connected with the fixed seat plate is connected with an elastic piece.
Preferably, the top of the screw rod is provided with a non-circular bump or a non-circular groove.
Preferably, the side wall of the bottom end of the single connecting piece is provided with a weight reduction cavity.
Compared with the prior art, the invention has the beneficial effects that:
1. the invention has stronger application range to vacuum, and the maximum pressure is 100 Pa;
2. the adaptability to heavy ions is strong, the passing rate exceeds 73.5 percent for the optimized design of ions with the charge-mass ratio of more than 3000 Da;
3. special materials are adopted, and plasmon formation is prevented under low vacuum;
4. the structure fixing piece is connected in a single connecting piece mode, the radio-frequency electrode plate can be quickly installed and effectively positioned, and after the radio-frequency electrode plate is installed, the thread parameters of the second thread section are different from those of the first thread section on the single connecting piece, so that the radio-frequency electrode plate cannot synchronously rotate, and the radio-frequency electrode plate is effectively locked and prevented from loosening;
5. the second thread section is arranged in a partitioning mode, so that the whole process screwing-in is not needed during installation, and the installation is convenient and rapid.
Drawings
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic diagram of a half-section structure of the RF electrode plate of the present invention;
FIG. 3 is a schematic cross-sectional view of a structural fastener of the present invention;
FIG. 4 is an enlarged view of the structure of the area A in FIG. 3;
FIG. 5 is a schematic view of the top end face structure of the single connecting piece connected with the lead screw;
FIG. 6 is a schematic view of the bottom end face structure of the single connecting piece and the lead screw in a connecting state;
fig. 7 is an overall circuit schematic.
In the figure: 1-fixing the seat board; 2-structural fixing members; 3-radio frequency electrode plate; 4-an inlet; 5-a through hole; 6-a single connection; 7-a first thread segment; 8-a groove; 9-through groove; 10-a second thread segment; 11-a lead screw; 12-blank area; 13-a threaded zone; 14-an elastic member; weight loss lumen 15.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-7, the present invention provides a technical solution: a low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system comprises a fixed seat plate 1, wherein a plurality of structure fixing pieces 2 are arranged on the fixed seat plate 1 along the axial direction of the fixed seat plate, a plurality of radio frequency electrode plates 3 are arranged on the fixed seat plate 1 along the structure fixing pieces 2 axially outwards at equal intervals, an inlet 4 is arranged on the fixed seat plate 1, through holes 5 are arranged on the inner sides of the radio frequency electrode plates 3, the through holes 5 on each radio frequency electrode plate 3 are integrally conical towards the superposition direction of the radio frequency electrode plates 3 at the inlet 4, a resistor is connected between every two adjacent radio frequency electrode plates 3, a high-voltage ceramic chip capacitor is connected between every two radio frequency electrode plates 3 and between every two radio frequency motor plates in the superposition direction of the radio frequency electrode plates 3 and connected in parallel, a vacuum cavity is further arranged on the fixed seat plate 1, and the vacuum cavity contains the structure formed by the fixed base 1 and the radio frequency electrode plates 3, the vacuum chamber and the flange are used for maintaining the vacuum degree in the chamber and are connected with the upper and lower stage structures in an ultrahigh vacuum manner, the radio frequency electrode plate 3 is responsible for applying radio frequency potential to restrain clusters/heavy ions, and the circuit element is responsible for regulating and controlling direct current and alternating current voltage applied to the electrode plate.
The radio frequency electrode plates 3 are provided with 36 pieces, each piece is 1mm in thickness, the outer diameter is 45mm, the distance between every two adjacent radio frequency electrode plates 3 is 2.5mm, an inlet 4 at the end part of the fixed seat plate 1 is the upstream where clusters enter, the other end is the downstream, the distance from the upstream to the other end, the inner diameters of the radio frequency electrode plates 3 from the 1 st to the 15 th pieces are 25mm, the inner diameter size of the radio frequency electrode plates from the 16 th piece is reduced by 1.05mm in a descending manner, the inner diameter of the electrode plates at the downstream port is 3mm, the capacitance value of the high-voltage ceramic chip is 100pF, the withstand voltage is 10kV, the resistance value of the resistor is 1M omega, an inert gas carrier airflow with the flow rate of less than 1000 sccm is generated at the upstream end of the focusing system, target cluster ions to be focused are contained in the airflow, the background air pressure of the space where the focusing system is located is less than 100 Pa, the focusing device is of a multilayer disc-shaped electrode structure, and the voltages applied to the two types are divided into two types, from the upstream side to the downstream side (the tapered orifice constriction) of the ion transport flow of the device in the axial direction. Each radio-frequency electrode plate 3 is applied with a uniformly and progressively increased direct current potential, the adjustment is carried out according to different background air pressures, the electric field intensity is set to be 1000 to 23000V/m, and an alternating current oscillation potential is applied between the odd-numbered radio-frequency electrode plates 3 and the even-numbered radio-frequency electrode plates 3 on the multilayer disc-shaped structure of the focusing device by using an alternating current power supply. The vibration voltage (Vpp) is 100 to 5000V, fixed at 0.7 MHz, and collects the focused cluster material at the downstream exit or directs it to other ion manipulation devices after it has entered.
The structure fixing part 2 is composed of a plurality of single connecting pieces 6, each single connecting piece 6 is in a stepped shaft shape, the whole section of each single connecting piece 6 is in a convex structure, the stepped shaft between two adjacent single connecting pieces 6 is used for installing and limiting the radio-frequency electrode plate 3, the outer side wall of one end of each single connecting piece is provided with a first thread section 7, the other end of each single connecting piece 6 is provided with a groove 8, the side wall of each groove 8 is matched with the first thread section 7, the single connecting pieces 6 adjacent to the fixed seat plate 1 are fixedly connected to the fixed seat plate 1, the first thread sections 7 are in threaded connection with the grooves 8 and are directly used for fixing the two single connecting pieces, and the radio-frequency electrode plates 3 are clamped simultaneously, compared with other modes, the mode can be fixed layer by layer and layer, is more convenient, the side wall of the bottom end of each single connecting piece 6 is provided with a weight reducing cavity 15 for reducing the mass of the single connecting piece, and a structure frame is generated at the same time, the contact surface between the bottom surface and the radio-frequency electrode plate 3 is reduced while the strength is not influenced, and the contact ratio is effectively improved.
The top of the screw rod 11 is provided with a non-circular lug or a non-circular groove, the non-circular lug or the non-circular groove facilitates the rotation of a tool from the top for screwing, the non-circular lug or the non-circular groove is preferably of a regular hexagon structure and can be in the same standard as an inner hexagon screw/a hexagon screw and the like, and therefore the tool such as a standard hexagon wrench and the like is convenient to use.
For the structure connected by the single connecting pieces 6, the thread connection can be loosened after a certain time, the looseness affects the overall stability, and the cluster/heavy ion gathering effect is affected, therefore, a through groove 9 is formed on the axial central line of the single connecting pieces 6, a second thread section 10 is arranged in the through groove 9, a lead screw 11 matched with the second thread section 10 is commonly connected between the single connecting pieces 6, the thread turning directions of the second thread section 10 and the first thread section 7 are the same, other parameters are different, the lead screw 11 and the second thread section 10 are used for locking and preventing the connection between the single connecting pieces 6 from loosening, because the thread parameters of the two are different, whether the two can be synchronously rotated is mainly taken as a standard, namely, the two can not be synchronously rotated due to different threads, only one parameter is needed, the size of the thread or other parameters can be changed to realize the purpose, only when the screw rod is in a state after the threaded connection is released, the threaded connection between the two adjacent single body connecting pieces 6 can be rotated to be separated from the connection state, and the screw rod 11 is in threaded connection with the second threaded section 10, so that the two adjacent single body connecting pieces 6 can not be rotated relatively even if the screw rod is rotated at a small angle.
The outer surface thread discontinuous thread of the screw rod 11 is divided into a plurality of blank areas 12 and thread areas 13 in the circumferential direction of the end surface of the screw rod 11, the thread areas 13 and the blank areas 12 are alternately distributed, the second thread section 10 is matched with the surface of the screw rod 11, and the circumferential angle of each single thread area 13 is not larger than the circumferential angle of each single blank area 12, when the surface of the screw rod 11 is a continuous thread and is in a vertical state after all the monomer connecting pieces 6 are connected, the screw rod 11 needs to be screwed in integrally, namely the length of each single structure fixing piece 2 is the screwing length of the screw rod 11, so that the screw rod is more difficult to screw in along with the larger screwing distance, time and labor are wasted, the blank areas 12 and the thread areas 13 are set to be convenient for being directly fed in a longer range through the blank areas 12 on the screw rod 11 and the corresponding mode of the thread areas in the grooves 8, and the screw rod 11 starts to rotate to screw in when the bottom end of the screw rod 11 contacts the lowermost monomer connecting piece 6, realize fixed connection, reduce time and laborsaving, with the bottom surface of recess 8 is connected on the monomer connecting piece 6 that fixed bedplate 1 is connected has elastic component 14, elastic component 14 for with the monomer connecting piece 6 of below for bear the weight of the lead screw 11 of putting into, make lead screw 11 stop when putting into its tip just contact the position of the monomer connecting piece 6 of below to make things convenient for the butt joint of screw precession.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (8)
1. The utility model provides a low vacuum cluster and heavy ion beam current radio frequency ring electrode group focusing system, includes fixed bedplate (1), its characterized in that: be equipped with a plurality of structure mounting (2) along its axial on fixed bedplate (1), fixed bedplate (1) sets up a plurality of radio frequency plate electrode (3) along the outside equidistance interval of structure mounting (2) axial, seted up entry (4) on fixed bedplate (1), through-hole (5) have been seted up to the inboard of radio frequency plate electrode (3), on each radio frequency plate electrode (3) through-hole (5) are located to radio frequency plate electrode (3) stack orientation at entry (4) and wholly are the toper, every adjacent two be connected with a resistor between radio frequency plate electrode (3), all connect a high-pressure ceramic chip electric capacity and parallelly connected between every two order radio frequency plate electrode (3) and on the stack orientation of radio frequency plate electrode (3), still be equipped with the vacuum cavity on fixed bedplate (1).
2. The system of claim 1, wherein the focusing system comprises: radio frequency electrode board (3) are equipped with 36, and every thickness is 1mm, and the external diameter is 45mm, adjacent two interval between radio frequency electrode board (3) is 2.5mm, fixed bedplate (1) tip entry (4) are the upper reaches that the cluster got into, and the other end is the low reaches, plays to the other end by the upper reaches, and 1 st to 15 th radio frequency electrode board (3) internal diameter is 25mm, and 16 th piece plays every piece of its internal diameter size and reduces 1.05mm that decreases progressively, and the internal diameter of low reaches port department electrode board is 3mm, high-voltage ceramic chip capacitance value is 100pF, withstand voltage 10kV, the resistor resistance is 1M omega.
3. The system of claim 1, wherein the focusing system comprises: the structure mounting (2) comprises a plurality of monomer connecting pieces (6), monomer connecting piece (6) are the step shaft form, and its one end lateral wall is equipped with first screw thread section (7), the other end of monomer connecting piece (6) is equipped with recess (8), the lateral wall and the first screw thread section (7) adaptation setting of recess (8) are adjacent with fixed bedplate (1) monomer connecting piece (6) fixed connection is on fixed bedplate (1).
4. The system of claim 3, wherein the focusing system comprises: the screw thread connecting structure is characterized in that a through groove (9) is formed in the axial central line of the monomer connecting pieces (6), a second thread section (10) is arranged in the through groove (9), a screw rod (11) matched with the second thread section (10) is connected between the monomer connecting pieces (6) together, the thread direction of the second thread section (10) is the same as that of the first thread section (7), and other parameters are different.
5. The system of claim 4, wherein the focusing system comprises: the outer surface screw thread non-continuity screw thread of lead screw (11), it is at lead screw (11) terminal surface circumference to being divided into a plurality of blank regions (12) and threaded area (13), and threaded area (13) and blank region (12) alternate distribution, second screw thread section (10) and lead screw (11) surface adaptation setting, and the circumference angle of single threaded area (13) is not more than single blank region (12) circumference angle.
6. The system of claim 2, wherein the focusing system comprises: the bottom surface of the groove (8) on the single connecting piece (6) connected with the fixed seat board (1) is connected with an elastic piece (14).
7. The system of claim 4, wherein the focusing system comprises: the top of the lead screw (11) is provided with a non-circular lug or a non-circular groove.
8. The system of claim 3, wherein the focusing system comprises: and a weight reduction cavity (15) is arranged on the side wall of the bottom end of the single connecting piece (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210191897.5A CN114401580B (en) | 2022-03-01 | 2022-03-01 | Low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210191897.5A CN114401580B (en) | 2022-03-01 | 2022-03-01 | Low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114401580A true CN114401580A (en) | 2022-04-26 |
| CN114401580B CN114401580B (en) | 2023-12-19 |
Family
ID=81234159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210191897.5A Active CN114401580B (en) | 2022-03-01 | 2022-03-01 | Low vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114401580B (en) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4879518A (en) * | 1987-10-13 | 1989-11-07 | Sysmed, Inc. | Linear particle accelerator with seal structure between electrodes and insulators |
| JPH09213498A (en) * | 1996-02-05 | 1997-08-15 | Hitachi Ltd | Quadrupole ion accumulating ring |
| US5811944A (en) * | 1996-06-25 | 1998-09-22 | The United States Of America As Represented By The Department Of Energy | Enhanced dielectric-wall linear accelerator |
| US20040046124A1 (en) * | 2000-11-23 | 2004-03-11 | Derrick Peter John | Ion focussing and conveying device and a method of focussing the conveying ions |
| TW200908057A (en) * | 2007-04-10 | 2009-02-16 | Sen Corp An Shi And Axcelis Company | Ion implantation apparatus and method of converging/shaping ion beam used therefor |
| CN203242597U (en) * | 2012-10-20 | 2013-10-16 | 应用材料公司 | Segmental type focus ring assembly |
| JP5686453B1 (en) * | 2014-04-23 | 2015-03-18 | 株式会社京都ニュートロニクス | Charged particle accelerator |
| US20160329201A1 (en) * | 2014-01-02 | 2016-11-10 | Dh Technologies Development Pte. Ltd. | Homogenization of the pulsed electric field created in a ring stack ion accelerator |
| CN110828022A (en) * | 2018-08-14 | 2020-02-21 | 华为技术有限公司 | Ion optical cavity coupling system and method |
-
2022
- 2022-03-01 CN CN202210191897.5A patent/CN114401580B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4879518A (en) * | 1987-10-13 | 1989-11-07 | Sysmed, Inc. | Linear particle accelerator with seal structure between electrodes and insulators |
| JPH09213498A (en) * | 1996-02-05 | 1997-08-15 | Hitachi Ltd | Quadrupole ion accumulating ring |
| US5811944A (en) * | 1996-06-25 | 1998-09-22 | The United States Of America As Represented By The Department Of Energy | Enhanced dielectric-wall linear accelerator |
| US20040046124A1 (en) * | 2000-11-23 | 2004-03-11 | Derrick Peter John | Ion focussing and conveying device and a method of focussing the conveying ions |
| TW200908057A (en) * | 2007-04-10 | 2009-02-16 | Sen Corp An Shi And Axcelis Company | Ion implantation apparatus and method of converging/shaping ion beam used therefor |
| CN203242597U (en) * | 2012-10-20 | 2013-10-16 | 应用材料公司 | Segmental type focus ring assembly |
| US20160329201A1 (en) * | 2014-01-02 | 2016-11-10 | Dh Technologies Development Pte. Ltd. | Homogenization of the pulsed electric field created in a ring stack ion accelerator |
| JP5686453B1 (en) * | 2014-04-23 | 2015-03-18 | 株式会社京都ニュートロニクス | Charged particle accelerator |
| CN110828022A (en) * | 2018-08-14 | 2020-02-21 | 华为技术有限公司 | Ion optical cavity coupling system and method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114401580B (en) | 2023-12-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11684874B2 (en) | Tangential flow filtration module and tangential flow filtration assembly | |
| US8870100B2 (en) | Nozzle plate and atomizing module using the same | |
| US20050151310A1 (en) | Spring washer | |
| CN114401580A (en) | Low-vacuum cluster and heavy ion beam radio frequency annular electrode group focusing system | |
| US9475245B2 (en) | Honeycomb extrusion apparatus and methods | |
| WO2017123895A1 (en) | Noise attenuation apparatus for fluid devices | |
| CN107716668A (en) | A kind of sheet material ring ripple drawing severe deformation mould and processing method repeatedly | |
| CN109751214B (en) | micro-Newton-level fast response field emission thruster with continuously adjustable thrust in large range | |
| CN111627793A (en) | Two-stage differential ion funnel for transmitting emergent ions | |
| CN106624892A (en) | Pressing device for turning quick to mount and dismount | |
| CN215008131U (en) | Ion source | |
| CN109876935B (en) | Coating gasket, coating machine and pole piece coating process | |
| CN201913041U (en) | Ultrasonic atomizer | |
| DE4325041B4 (en) | Aetz or plasma CVD system | |
| CN208772931U (en) | A kind of portable elevation angle fine tuning structure | |
| CN113362793B (en) | Bidirectional rough parallel-arrangement micro-channel porous sound absorption structure | |
| CN106271373B (en) | Knurling tool and annular knurl system | |
| WO2023024357A1 (en) | New-type support plate self-locking nut having excellent locking performance | |
| EP1791402A2 (en) | Plasma lineation electrode | |
| WO2019061896A1 (en) | Polygonal cutting blade having circular arc-shaped groove in hole and cutting tool | |
| US20070154288A1 (en) | Laminated nut with center tension sleeve | |
| CN1843635A (en) | Gas supply nozzle with improved homogeneity of air current | |
| CN110150350B (en) | Mould sleeve connecting mechanism of non-fried instant noodle extruder | |
| CN116745036A (en) | Electric field unit, electric field adsorption device and electric field device | |
| CN112846202A (en) | Circular seam type spray disc capable of adjusting seam width and atomization device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |