CN114397302A - Wafer cleaning and detecting device - Google Patents
Wafer cleaning and detecting device Download PDFInfo
- Publication number
- CN114397302A CN114397302A CN202111597453.3A CN202111597453A CN114397302A CN 114397302 A CN114397302 A CN 114397302A CN 202111597453 A CN202111597453 A CN 202111597453A CN 114397302 A CN114397302 A CN 114397302A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 15
- 238000001514 detection method Methods 0.000 claims abstract description 18
- 238000003825 pressing Methods 0.000 claims abstract description 15
- 244000309464 bull Species 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 230000002349 favourable effect Effects 0.000 description 8
- 239000013078 crystal Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- -1 polyethylene Polymers 0.000 description 4
- 229920000915 polyvinyl chloride Polymers 0.000 description 4
- 239000004800 polyvinyl chloride Substances 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
Abstract
The invention relates to the technical field of wafer detection, in particular to a wafer cleaning and detecting device, which comprises a workbench, a side plate and a pressing detector, wherein the pressing detector comprises a detector shell, the top of the detector shell is provided with a detection hole, one side of the detector shell is provided with a first sliding chute, a sliding block is connected in the first sliding chute in a sliding manner, one side of the sliding block is fixedly connected with a limiting block, one side of the limiting block, which is far away from the sliding block, is fixedly connected with a sliding rod, one side of the sliding block, which is far away from the limiting block, is fixedly connected with a separating rod, the other side of the detector shell is internally provided with a second sliding chute, a limiting sliding block is connected in the second sliding chute in a sliding manner, and one end, which is far away from the sliding block, of the separating rod is fixedly connected with the limiting sliding block, the method can be quickly and visually judged, is low in cost and can be repeatedly used.
Description
Technical Field
The invention relates to the technical field of wafer detection, in particular to a wafer cleaning and detecting device.
Background
The wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, is called a wafer because the shape of the wafer is circular, various circuit element structures can be manufactured on the silicon wafer, and an IC product with a specific electric function is formed, the original material of the wafer is silicon, the surface of the earth crust has inexhaustible silicon dioxide, silicon dioxide ore is refined by an electric arc furnace, chloridized by hydrochloric acid and distilled to manufacture high-purity polysilicon with the purity of 99.9999999 percent, a wafer manufacturer melts a plurality of crystal silicon, seeds are planted in the melt liquid, and then the crystal silicon is slowly pulled out to form a cylindrical single crystal rod, as the silicon rod is gradually generated in the molten silicon raw material by the seeds with the crystal plane orientation, the process is called as crystal growth, the silicon rod is cut, rolled, sliced, chamfered, polished, laser-etched and packaged, the silicon wafer becomes the basic material of the integrated circuit factory, which is the "wafer"; the PVC is mainly composed of polyvinyl chloride, is yellowish and semitransparent, has luster, has transparency superior to that of polyethylene and polypropylene and is inferior to that of polystyrene, is divided into soft and hard polyvinyl chloride according to different using amounts of additives, soft and tough products are soft and sticky in hand feeling, the hardness of the hard products is higher than that of low-density polyethylene and lower than that of polypropylene, and a whitening phenomenon can occur at a folding part, so that the PVC is a high polymer material using one chlorine atom to replace one hydrogen atom in the polyethylene; the wafer is after wasing, whether have the mar above need be looked over, the burr, and present technique is exactly to see under the searchlight with the people's eye, and the searchlight is equivalent to the headlight of car, uses the searchlight to look over to the wafer for a long time and detects and to the injury of eyes big very much, and is inefficient moreover, and the precision of detection is not high, and uses the formation of image detector cost of using the high accuracy high, and is with high costs.
Accordingly, there is a need to design a wafer cleaning and inspection apparatus that solves one or more of the above-mentioned problems.
Disclosure of Invention
In order to solve one or more problems in the prior art, the invention provides a wafer cleaning and detecting device.
The technical scheme adopted by the invention to achieve the aim is as follows: the utility model provides a wafer washs detection device, includes workstation, curb plate and presses the detector, press the detector including the detector shell, the inspection hole has been seted up at the top of detector shell, first spout has been seted up to one side of detector shell, sliding connection has the sliding block in the first spout, one side fixedly connected with stopper of sliding block, one side fixedly connected with slide bar of sliding block is kept away from to the stopper, one side fixedly connected with spacer bar that the stopper was kept away from to the sliding block, the second spout has been seted up inside the opposite side of detector shell, sliding connection has spacing slider in the second spout, the one end and the spacing slider fixed connection of sliding block are kept away from to the spacer bar.
Preferably, the interior bottom fixedly connected with bottom plate of detector shell, the third spout has been seted up to the inside symmetry in both sides of detector shell, every the equal symmetrical a plurality of second springs of fixedly connected with in bottom of third spout, every equal sliding connection has the buffer block in the third spout, every the bottom of buffer block all with a plurality of second spring fixed connection that correspond, two common fixedly connected with pvc colored fluorescence mantle between the buffer block.
Preferably, the top fixedly connected with curb plate of workstation, the swing groove has been seted up to the inside of curb plate, the interior bottom fixedly connected with fixed plate in swing groove, one side of fixed plate is rotated through the pivot and is connected with third connecting rod and first connecting rod, one side of fixed plate that is close to the third connecting rod is rotated and is connected with the dwang, the one end that the fixed plate was kept away from to the dwang runs through the other end of first connecting rod, one side that the fixed plate was kept away from to first connecting rod is equipped with the second connecting rod, the one end and the dwang rotation of second connecting rod are connected.
Preferably, the other end of the second connecting rod and the other end of the third connecting rod are connected with a fourth connecting rod through a rotating shaft in a rotating mode, one end, far away from the side plate, of the fourth connecting rod is fixedly connected with a connecting plate, and one side, far away from the fourth connecting rod, of the connecting plate is fixedly connected with the bottom of the pressing detector.
Preferably, the one end that the fixed plate was kept away from to the dwang runs through the curb plate and rotates and be connected with the carousel, one side fixedly connected with bull stick that the curb plate was kept away from to the carousel.
Preferably, the top of the workbench is fixedly connected with a first guide plate, a second guide plate, a third guide plate and a limiting groove plate.
Preferably, a placing groove is formed in the workbench, a first fixing block is fixedly connected to the inner bottom of the placing groove, a first spring is fixedly connected to the top of the first fixing block, a sliding plate is fixedly connected to the top of the first spring, and the sliding plate is slidably connected with the placing groove.
Preferably, the top fixedly connected with fixing base of workstation, the top of fixing base is rotated and is connected with the rotation post, the rotation post is close to one side fixedly connected with kelly of standing groove.
Preferably, the top of the workbench is fixedly connected with a case, a second fixed block is fixedly connected to the inner side wall of the case, an air cylinder is fixedly connected to the other side of the second fixed block, and a push rod is fixedly connected to a telescopic rod of the air cylinder.
The invention has the beneficial effects that: the invention can place a wafer to be detected through a placing groove, keep a state to be detected under the action of a first spring and a clamping rod, push the wafer to be detected out through a cylinder to drive a push rod to push the wafer to be detected out to a detection area when the wafer is required to be detected, drive a pressing detector to detect through rotating a rotating rod, the pressing detector consists of a pvc color fluorescent soft film and a bottom plate, the pvc color fluorescent soft film is contacted with the bottom plate to obviously develop color when the pressing detector is pressed down, a shape image of a pressed object is formed, if the surface of the wafer is uneven and has burrs and the like, a corresponding light spot image can be formed on the image, whether the surface of the wafer is flat or not can be rapidly judged, and the pvc color fluorescent soft film can be rapidly separated from the bottom plate through pushing a separating rod to facilitate next detection, compared with the existing observation of a polishing person, the pvc color fluorescent soft film is contacted with the bottom plate to form an image through pressing, the method can be quickly and visually judged, is low in cost and can be repeatedly used.
Drawings
FIG. 1 is a schematic perspective view of the present invention;
FIG. 2 is a side view of the internal structure of the present invention;
FIG. 3 is a schematic side view of the present invention;
FIG. 4 is a schematic view of the internal structure of the workbench according to the present invention;
FIG. 5 is a schematic perspective view of a push detector according to the present invention;
FIG. 6 is a schematic top view of the inner structure of the push detector of the present invention;
FIG. 7 is a side view of the internal structure of the pressing detector of the present invention.
Description of reference numerals: 1. a work table; 2. a side plate; 3. a press detector; 4. a connecting plate; 5. a turntable; 6. a rotating rod; 7. a chassis; 8. a fixed seat; 9. rotating the column; 10. a clamping rod; 11. a first guide plate; 12. a second guide plate; 13. a third guide plate; 14. a limiting groove plate; 15. a placement groove; 16. a fixing plate; 17. a first link; 18. rotating the rod; 19. a second link; 20. a third link; 21. a fourth link; 22. a swing groove; 23. a first fixed block; 24. a first spring; 25. a slide plate; 26. a second fixed block; 27. a cylinder; 28. a push rod; 30. a first chute; 31. a limiting block; 32. a slide bar; 33. pvc color fluorescent soft film; 34. a slider; 35. a spacer bar; 36. a limiting slide block; 37. a second chute; 38. a base plate; 39. a third chute; 40. a buffer block; 41. a second spring; 42. a detector housing; 43. and (6) detecting holes.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
As shown in fig. 1-7, the invention provides a wafer cleaning and detecting device, which comprises a workbench 1, a side plate 2 and a pressing detector 3, wherein the pressing detector 3 comprises a detector housing 42, a detecting hole 43 is formed at the top of the detector housing 42, a first sliding groove 30 is formed at one side of the detector housing 42, a sliding block 34 is slidably connected in the first sliding groove 30, a limit block 31 is fixedly connected at one side of the sliding block 34, a sliding rod 32 is fixedly connected at one side of the limit block 31 away from the sliding block 34, a separating rod 35 is fixedly connected at one side of the sliding block 34 away from the limit block 31, a second sliding groove 37 is formed in the other side of the detector housing 42, a limit sliding block 36 is slidably connected in the second sliding groove 37, one end of the separating rod 35 away from the limit sliding block 34 is fixedly connected with the limit sliding block 36, the separating rod 35 is favorable for separating a pvc color fluorescent soft film 33 from a bottom plate 38, the detection is convenient to carry out next time.
Further, detector shell 42's interior bottom fixedly connected with bottom plate 38, third spout 39 has been seted up to detector shell 42's the inside symmetry in both sides, every a plurality of second springs 41 of the equal symmetrical fixedly connected with in bottom of third spout 39, every equal sliding connection has buffer block 40 in the third spout 39, every the bottom of buffer block 40 all with a plurality of second spring 41 fixed connection that correspond, two common fixedly connected with pvc colored fluorescence mantle 33 between the buffer block 40, buffer block 40 and the cooperation of second spring 41 are favorable to pressing detector 3 to detect time measuring messenger pvc colored fluorescence mantle 33 and bottom plate 38 and carry out the contact.
Further, top fixedly connected with curb plate 2 of workstation 1, swing groove 22 has been seted up to the inside of curb plate 2, swing groove 22's interior bottom fixedly connected with fixed plate 16, one side of fixed plate 16 is rotated through the pivot and is connected with third connecting rod 20 and first connecting rod 17, one side of fixed plate 16 that is close to third connecting rod 20 is rotated and is connected with dwang 18, the one end that fixed plate 16 was kept away from to dwang 18 runs through the other end of first connecting rod 17, one side that fixed plate 16 was kept away from to first connecting rod 17 is equipped with second connecting rod 19, second connecting rod 19's one end is rotated with dwang 18 and is connected, and swing groove 22 is favorable to swinging.
Further, the other end of second connecting rod 19 and the other end of third connecting rod 20 all rotate jointly through the pivot and are connected with fourth connecting rod 21, the one end fixedly connected with connecting plate 4 of curb plate 2 is kept away from to fourth connecting rod 21, one side that fourth connecting rod 21 was kept away from to connecting plate 4 and the bottom fixed connection who presses detector 3, connecting plate 4 is favorable to connecting to press detector 3 to make its stable.
Further, the one end that fixed plate 16 was kept away from to dwang 18 runs through curb plate 2 and rotates and be connected with carousel 5, one side fixedly connected with bull stick 6 of curb plate 2 is kept away from to carousel 5, and the cooperation of carousel 5 and bull stick 6 is favorable to rotating carousel 5 through bull stick 6 and drives dwang 18 and rotate and make and press detector 3 and swing, makes it press the detection, and the swing is the vertical state when shifting up and conveniently observes.
Further, the top of the workbench 1 is fixedly connected with a first guide plate 11, a second guide plate 12, a third guide plate 13 and a limiting groove plate 14, and the limiting groove plate 14 and the guide plate are matched to facilitate the stable movement of the wafer to the detection position.
Further, a placing groove 15 has been seted up to the inside of workstation 1, the first fixed block 23 of the interior bottom fixedly connected with of placing groove 15, the first spring 24 of the top fixedly connected with of first fixed block 23, the top fixedly connected with slide 25 of first spring 24, slide 25 and placing groove 15 sliding connection, first spring 24 and the cooperation of slide 25 are favorable to making the wafer of placing shift up, and after a wafer delivered to the detection zone, next one moved and conveniently transferred next time to the below.
Further, top fixedly connected with fixing base 8 of workstation 1, the top of fixing base 8 is rotated and is connected with and rotates post 9, rotate one side fixedly connected with kelly 10 that post 9 is close to standing groove 15, kelly 10 is favorable to spacing to the wafer, makes the wafer be in the position of the propelling movement of being convenient for.
Further, top fixedly connected with machine case 7 of workstation 1, fixedly connected with second fixed block 26 on the inside wall of machine case 7, the opposite side fixedly connected with cylinder 27 of second fixed block 26, fixedly connected with push rod 28 on cylinder 27's the telescopic link, push rod 28 is favorable to pushing out the wafer and transfers to the detection zone.
The working principle is as follows: firstly, a wafer to be detected is placed in a placing groove 15, the state to be detected is kept under the action of a first spring 24 and a clamping rod 10, when the detection is needed, a push rod 28 is driven by an air cylinder 27 to push the wafer to be detected out and send the wafer to a detection area, then a pressing detector 3 is driven by a rotating rod 6 to detect, the pressing detector 3 consists of a pvc color fluorescent soft film 33 and a bottom plate 38, when the pressing detector is pressed down, the pvc color fluorescent soft film 33 is contacted with the bottom plate 38 to enable the pvc color fluorescent soft film 33 to obviously develop color, a shape image of a pressed object is formed, whether the surface of the wafer is flat or not can be quickly judged, after the detection is finished, the pvc color fluorescent soft film 33 can be quickly separated from the bottom plate 38 by pushing a separating rod 35 to facilitate next detection, after one surface is detected, the wafer is overturned to detect the other surface, if the pvc color fluorescent soft film 33 quickly forms a light spot with the bottom plate 38, or blank traces show that the surface is not flat and burrs exist, and if the image is clear, the surface of the wafer is flat and smooth.
The above-described embodiments are merely illustrative of one or more embodiments of the present invention, and the description is specific and detailed, but not intended to limit the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (9)
1. The utility model provides a wafer washs detection device, includes workstation (1), curb plate (2) and presses detector (3), its characterized in that: the pressing detector (3) comprises a detector shell (42), the top of the detector shell (42) is provided with a detection hole (43), a first sliding groove (30) is formed in one side of the detector shell (42), a sliding block (34) is connected in the first sliding groove (30) in a sliding manner, one side of the sliding block (34) is fixedly connected with a limiting block (31), one side of the limiting block (31) far away from the sliding block (34) is fixedly connected with a sliding rod (32), a separating rod (35) is fixedly connected on one side of the sliding block (34) far away from the limiting block (31), a second sliding chute (37) is arranged inside the other side of the detector shell (42), and a limiting sliding block (36) is connected in the second sliding groove (37) in a sliding manner, and one end, far away from the sliding block (34), of the separating rod (35) is fixedly connected with the limiting sliding block (36).
2. The wafer cleaning and detecting device according to claim 1, wherein: interior bottom fixedly connected with bottom plate (38) of detector shell (42), third spout (39), every have been seted up to the inside symmetry in both sides of detector shell (42) the equal symmetrical a plurality of second springs (41) of bottom of third spout (39), every equal sliding connection has buffer block (40), every in third spout (39 the bottom of buffer block (40) all with a plurality of second spring (41) fixed connection that correspond, two common fixedly connected with pvc colored fluorescence mantle (33) between buffer block (40).
3. The wafer cleaning and detecting device according to claim 1, wherein: top fixedly connected with curb plate (2) of workstation (1), swing groove (22) have been seted up to the inside of curb plate (2), interior bottom fixedly connected with fixed plate (16) of swing groove (22), one side of fixed plate (16) is rotated through the pivot and is connected with third connecting rod (20) and first connecting rod (17), one side of being close to third connecting rod (20) of fixed plate (16) is rotated and is connected with dwang (18), the one end that fixed plate (16) were kept away from in dwang (18) runs through the other end of first connecting rod (17), one side that fixed plate (16) were kept away from in first connecting rod (17) is equipped with second connecting rod (19), the one end and dwang (18) of second connecting rod (19) rotate and are connected.
4. The wafer cleaning and detecting device according to claim 3, wherein: the other end of second connecting rod (19) and the other end of third connecting rod (20) all rotate jointly through the pivot and are connected with fourth connecting rod (21), the one end fixedly connected with connecting plate (4) of curb plate (2) are kept away from in fourth connecting rod (21), one side that fourth connecting rod (21) were kept away from in connecting plate (4) with press the bottom fixed connection of detector (3).
5. The wafer cleaning and detecting device according to claim 3, wherein: the one end that fixed plate (16) were kept away from in dwang (18) runs through curb plate (2) and rotates and be connected with carousel (5), one side fixedly connected with bull stick (6) of curb plate (2) are kept away from in carousel (5).
6. The wafer cleaning and detecting device according to claim 3, wherein: the top of the workbench (1) is fixedly connected with a first guide plate (11), a second guide plate (12), a third guide plate (13) and a limiting groove plate (14).
7. The wafer cleaning and detecting device according to claim 6, wherein: the novel workbench is characterized in that a placing groove (15) is formed in the workbench (1), a first fixing block (23) is fixedly connected to the inner bottom of the placing groove (15), a first spring (24) is fixedly connected to the top of the first fixing block (23), a sliding plate (25) is fixedly connected to the top of the first spring (24), and the sliding plate (25) is in sliding connection with the placing groove (15).
8. The wafer cleaning and detecting device according to claim 7, wherein: the top fixedly connected with fixing base (8) of workstation (1), the top of fixing base (8) is rotated and is connected with and is rotated post (9), rotate one side fixedly connected with kelly (10) that post (9) is close to standing groove (15).
9. The wafer cleaning and detecting device according to claim 8, wherein: the top fixedly connected with quick-witted case (7) of workstation (1), fixedly connected with second fixed block (26) on the inside wall of machine case (7), opposite side fixedly connected with cylinder (27) of second fixed block (26), fixedly connected with push rod (28) on the telescopic link of cylinder (27).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111597453.3A CN114397302A (en) | 2021-12-24 | 2021-12-24 | Wafer cleaning and detecting device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111597453.3A CN114397302A (en) | 2021-12-24 | 2021-12-24 | Wafer cleaning and detecting device |
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| CN114397302A true CN114397302A (en) | 2022-04-26 |
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| CN202111597453.3A Pending CN114397302A (en) | 2021-12-24 | 2021-12-24 | Wafer cleaning and detecting device |
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