CN114385040A

CN114385040A - Transparent conductive electrode of touch panel

Info

Publication number: CN114385040A
Application number: CN202011123685.0A
Authority: CN
Inventors: 庄志成; 王雅萍; 刘涛
Original assignee: TPK Glass Solutions Xiamen Inc
Current assignee: TPK Glass Solutions Xiamen Inc
Priority date: 2020-10-20
Filing date: 2020-10-20
Publication date: 2022-04-22

Abstract

The application discloses a transparent conductive electrode of a touch panel, which comprises a first electrode pattern. The edge of the first electrode pattern is provided with a first outer etching line and a second outer etching line which are parallel to each other and extend. A plurality of first inner etching lines are arranged between two adjacent first electrode patterns. The first outer etching line and the second outer etching line have a first distance therebetween. The second outer etching lines and the adjacent and parallel first inner etching lines have a second distance. The second pitch is greater than or equal to 1.5 times the first pitch. And the second pitch is less than or equal to 15 times the first pitch. The distance between the first outer etching lines and the second outer etching lines is smaller than the distance between any two first inner etching lines.

Description

Transparent conductive electrode of touch panel

Technical Field

The present disclosure relates to a transparent conductive electrode of a touch panel, and more particularly, to a transparent conductive electrode of a touch panel having an etching pattern between adjacent electrodes.

Background

First, the touch panel is widely used in an image display panel used for a television, a mobile phone, a mobile information terminal, and other optical display devices. Touch panels are classified into two common types, namely resistive type and capacitive type.

The touch panel has a basic structure in which transparent conductive electrodes in different directions are disposed on upper and lower sides or the same side of a substrate. The transparent conductive electrode is formed by etching a layer of transparent conductive material, such as metal mesh, indium oxide or nano silver, on line by means of, for example, laser etching to form an etched line, i.e., a trench, and filling the trench with a transparent insulating material. The transparent conductive electrodes are contoured by the design of the etched line pattern, and the etched lines are used as insulating lines to separate adjacent transparent conductive electrodes.

In the manufacturing process of the transparent conductive electrode, it is generally required to satisfy both conditions of high conductivity and low visibility. When the conductivity is high, the touch sensor can generate sufficiently sensitive mutual capacitance or self capacitance sensing, and can also have sufficient sensitivity. In addition, the visibility of the edge profile of the transparent conductive electrode must be low enough (or the overall transparency of the transparent conductive electrode is high enough) so that the etching trace at the edge of the transparent conductive electrode is not visible to the naked eye, thereby reducing the overall visual effect of the screen.

However, the degree of conductivity has some correlation with visibility. When the content (concentration, loading) of the conductive material or the thickness of the coating is increased for the purpose of increasing the conductivity (i.e., reducing the resistance), the etching lines (trenches) between the transparent conductive electrodes need to be widened and deepened to avoid short circuit caused by the contact of the conductive material of the adjacent transparent conductive electrodes. However, this makes the trace of the etching line, i.e., the groove, more conspicuous (i.e., the contour of the transparent conductive electrode becomes conspicuous) and more easily visible to the naked eye. In order to make the touch screen more invisible, the content (concentration, loading) of the conductive material or the thickness of the coating layer is often reduced, and the resistance is too high to achieve a sufficient touch sensing function.

The above problems are more pronounced in large or oversized products. Since the area and length of the large-sized or oversized product are larger than those of the medium-sized or small-sized product, the length of the transparent conductive electrode is relatively longer, and the electrode resistance is often higher, so that it is not easy to consider the low conductivity and visibility at the same time.

Therefore, the problem to be solved by the present application is how to obtain good visibility (i.e. less visible to the naked eye) and simultaneously consider the conductivity of the transparent electrode by the arrangement and design of the etching lines.

Disclosure of Invention

The present disclosure provides a transparent conductive electrode of a touch panel, which includes a plurality of first electrode patterns. The edge of each first electrode pattern is provided with a first outer etching line and a second outer etching line which are parallel to each other and extend. A plurality of first inner etching lines are arranged between two adjacent first electrode patterns. A first distance is formed between the first outer etching lines and the second outer etching lines, and a second distance is formed between the second outer etching lines and the adjacent and parallel first inner etching lines. The second pitch is greater than or equal to 1.5 times the first pitch and the second pitch is less than or equal to 15 times the first pitch.

Further, the first distance is between 0.2 and 0.6 mm.

Further, the second pitch is between 0.3 and 3.0 mm.

Furthermore, the line widths of the first outer etching line, the second outer etching line and the first inner etching line are all between 25 microns and 65 microns.

Furthermore, the plurality of first inner etching lines are vertically staggered with each other to form a mesh structure.

Furthermore, the first inner etching lines are vertically staggered with each other in a vertical and transverse manner to form a net structure.

Furthermore, the plurality of first inner etching lines, the first outer etching lines and the second outer etching lines are parallel to each other to form a mesh structure.

Furthermore, one part of the first inner etching lines, the first outer etching lines and the second outer etching lines are parallel to each other, and the other part of the first inner etching lines is vertically staggered with each other, so that a net-shaped structure is formed.

In order to solve the above technical problem, one of the technical solutions adopted in the present application is to provide a transparent conductive electrode of a touch panel, which includes a plurality of first electrode patterns. The edge of each first electrode pattern is provided with a first outer etching line and a second outer etching line which are parallel to each other and extend. A plurality of first inner etching lines are arranged between two adjacent first electrode patterns. The distance between the first outer etching lines and the second outer etching lines is smaller than the distance between any two first inner etching lines.

Furthermore, the plurality of first inner etching lines are mutually staggered to form a net structure.

One of the benefits of the present disclosure is that the transparent conductive electrode of the touch panel provided by the present disclosure can include a first outer etching line and a second outer etching line that are parallel to each other and extend through an edge of the first electrode pattern. The two adjacent first electrode patterns comprise a plurality of first inner etching lines, a plurality of first outer etching lines and a plurality of second outer etching lines, a first distance is formed between the first outer etching lines and the adjacent and parallel first inner etching lines, and a second distance is formed between the first outer etching lines and the adjacent and parallel first inner etching lines, and the second distance is larger than or equal to 1.5 times of the first distance and smaller than or equal to 15 times of the first distance, so that the effects of high conductivity and low visibility are achieved.

Another advantage of the present invention is that the transparent conductive electrode of the touch panel provided in the present application can achieve the effects of high conductivity and low visibility through the technical solutions of "the edge of the first electrode pattern has the first outer etching line and the second outer etching line which are parallel and extend," the two adjacent first electrode patterns include the first inner etching line, "and" the distance between the first outer etching line and the second outer etching line is smaller than the distance between any two first inner etching lines.

For a better understanding of the nature and technical content of the present application, reference should be made to the following detailed description and accompanying drawings which are provided for purposes of illustration and description and are not intended to limit the present application.

Drawings

FIG. 1 is a schematic view of a transparent conductive electrode layer A according to a first embodiment of the present application;

FIG. 2 is a schematic view of a transparent conductive electrode layer B according to a first embodiment of the present application;

FIG. 3 is a schematic view of a first electrode pattern according to a first embodiment of the present application;

FIG. 4 is a schematic diagram of a second electrode pattern according to a first embodiment of the present application;

FIG. 5 is a schematic view of a first electrode pattern according to a second embodiment of the present application;

FIG. 6 is a schematic diagram of a second electrode pattern according to a second embodiment of the present application;

FIG. 7 is a schematic view of a first electrode pattern according to a third embodiment of the present application;

FIG. 8 is a schematic view of a second electrode pattern according to a third embodiment of the present application;

FIG. 9 is a schematic view of a first electrode pattern according to a fourth embodiment of the present application;

FIG. 10 is a schematic view of a second electrode pattern according to a fourth embodiment of the present application;

FIG. 11 is a schematic view of a first electrode pattern according to a fifth embodiment of the present application;

FIG. 12 is a schematic view of a second electrode pattern according to a fifth embodiment of the present application;

FIG. 13 is a schematic view of a first electrode pattern according to a sixth embodiment of the present application;

fig. 14 is a schematic view of a second electrode pattern according to a sixth embodiment of the present application.

Detailed Description

The following description is provided for the embodiments of the transparent conductive electrode of the touch panel disclosed in the present application with specific embodiments, and those skilled in the art can understand the advantages and effects of the present application from the disclosure of the present application. The present application is capable of other and different embodiments and its several details are capable of modifications and variations in various respects, all without departing from the present application. The drawings in the present application are for illustrative purposes only and are not intended to be drawn to scale. The following embodiments will further explain the related art of the present application in detail, but the disclosure is not intended to limit the scope of the present application.

It will be understood that, although the terms first, second, third, etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used primarily to distinguish one element from another. In addition, the term "or" as used herein should be taken to include any one or combination of more of the associated listed items as the case may be.

First embodiment

Referring to fig. 1 to 2, a first embodiment of the present invention provides a transparent conductive electrode of a touch panel, and fig. 1 and 2 respectively show two transparent conductive electrode layers a and B of the touch panel, and both the transparent conductive electrode layer a and the transparent conductive electrode layer B have a grid pattern formed by a plurality of extension lines and line segments. The extending direction of the grid pattern of the transparent conductive electrode layer a is perpendicular to the extending direction of the grid pattern of the transparent conductive electrode layer B, and when the touch panel is assembled later, the transparent conductive electrode layer a and the transparent conductive electrode layer B are overlapped up and down.

In the transparent conductive electrode layer a, the plurality of extension lines and the plurality of line segments are etching lines, the grid pattern formed by the plurality of extension lines and the plurality of line segments is an etching pattern, and the blank region between the etching pattern and the etching pattern is a transparent conductive electrode. Similarly, in the transparent conductive electrode layer B, the plurality of extension lines and the plurality of line segments are etching lines, the grid pattern formed by the plurality of extension lines and the plurality of line segments is an etching pattern, and the blank region between the etching pattern and the etching pattern is a transparent conductive electrode. In other words, the transparent conductive electrode of the touch panel includes a plurality of first electrode patterns TX on the transparent conductive electrode layer a and a plurality of second electrode patterns RX on the transparent conductive electrode layer B, and the plurality of second electrode patterns RX are perpendicular to the plurality of first electrode patterns TX.

As shown in fig. 3, fig. 3 is an enlarged region of the dashed frame portion III of fig. 1. The edges of the first electrode pattern TX have two first outer etching lines 11 and second outer etching lines 12 extending parallel to each other. More specifically, each of the first electrode patterns TX has two side edges, and each side has two first outer etching lines 11 and two second outer etching lines 12 extending in parallel, so that the two side edges of the first electrode patterns TX have four outer etching lines in total, that is, two first outer etching lines 11 close to the first electrode patterns TX and two second outer etching lines 12 far from the first electrode patterns TX. It should be noted that the four outer etching lines do not intersect, so that the four outer etching lines extend continuously without intersecting, and the first electrode pattern TX also extends without interruption.

A plurality of first inner etch lines 13 are included between two adjacent first electrode patterns TX. Specifically, the spaced region between two adjacent first outer etch lines 11 of two adjacent first electrode patterns TX forms a first etch pattern 10, and the first etch pattern 10 includes a plurality of first inner etch lines 13. More specifically, the first and second

outer etching lines

11 and 12 at the edge of one first electrode pattern TX and the first and second

outer etching lines

11 and 12 at the edge of another adjacent first electrode pattern TX form the first etching pattern 10. Therefore, the adjacent first outer etching lines 11 between two adjacent first electrode patterns TX are actually outlines forming the first etching patterns 10, and the plurality of first inner etching lines 13 are pattern contents forming the first etching patterns 10. As shown in fig. 1, the plurality of first inner etching lines 13 are formed in a mesh structure in a vertically staggered manner. In other words, the pattern content of the first etching patterns 10 is a mesh structure vertically staggered with each other.

As shown in fig. 4, fig. 4 is an enlarged region of the dashed frame portion IV of fig. 2. Each of the second electrode patterns RX has two third outer etching lines 21 and four outer etching lines 22 extending in parallel to each other at an edge thereof. More specifically, each second electrode pattern RX has two side edges, and each side has two third outer etching lines 21 and four fourth outer etching lines 22 extending parallel to each other, so that two side edges of each second electrode pattern RX have four outer etching lines, that is, two third outer etching lines 21 close to the second electrode pattern RX and two fourth outer etching lines 22 far from the second electrode pattern RX. It should be noted that the four outer etching lines do not intersect, so that the four outer etching lines extend continuously without intersecting, and the second electrode pattern RX also extends continuously without interruption.

The spaced region between two adjacent third outer etching lines 21 of two adjacent second electrode patterns RX forms a second etching pattern 20, and the second etching pattern 20 includes a plurality of second inner etching lines 23. More specifically, the third outer etching line 21 and the fourth outer etching line 22 at the edge of one second electrode pattern RX and the third outer etching line 21 and the fourth outer etching line 22 at the edge of another adjacent second electrode pattern RX form the second etching pattern 20. Therefore, the adjacent third outer etching lines 21 between two adjacent second electrode patterns RX actually form the outline of the second etching pattern 20, and the plurality of second inner etching lines 23 form the pattern content of the second etching pattern 20. As shown in fig. 2, the second inner etching lines 23 are formed in a mesh structure in a vertically staggered manner. In other words, the pattern content of the second etching patterns 20 is a mesh structure vertically staggered with each other.

Further, a first distance D1 is provided between the first outer etching line 11 and the second outer etching line 12, a second distance D2 is provided between the second outer etching line 12 and the adjacent and parallel first inner etching line 13, and the first distance D1 and the second distance D2 satisfy 1.5D1 ≦ D2 ≦ 15D 1. A third distance D3 is provided between the third outer etching line 21 and the fourth outer etching line 22, a fourth distance D4 is provided between the fourth outer etching line 22 and the adjacent and parallel second inner etching line 23, the third distance D3 is smaller than the fourth distance D4, and the third distance D3 and the fourth distance D4 satisfy 1.5D3 ≦ D4 ≦ 15D 3.

In the present embodiment, the first distance D1 and the third distance D3 are both between 0.2 and 0.5 millimeters (mm). Preferably, the first distance D1 and the third distance D3 are both between 0.255 and 0.35 millimeters.

In the present embodiment, the second distance D2 and the fourth distance D4 are both between 0.3 and 3.0 millimeters (mm).

In the present embodiment, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching line 13, the third outer etching line 21, the fourth outer etching line 22 and the second inner etching line 23 are all between 25 micrometers and 65 micrometers. Preferably, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching line 13, the third outer etching line 21, the fourth outer etching line 22 and the second inner etching line 23 are 35 ± 3 micrometers.

In the present embodiment, the visibility of the etching line is good, that is, the existence of the etching line and the etching pattern is not easily perceived by naked eyes; and the sheet resistance (sheet resistance) of the first electrode pattern TX and the second electrode pattern RX is 30 ohm/square, when the touch sensor is applied to a touch sensor of a medium-small size panel and a large size panel, a touch sensing signal meeting a specification range can be obtained.

Meanwhile, in the embodiment, all the etching lines can be manufactured by a yellow light process, and can also be manufactured by a laser ablation or laser etching method; the conductive material is removed by laser ablation or laser etching to form an insulating line, also referred to as an etching line, that separates adjacent transparent conductive electrodes.

However, the above-mentioned examples are only one possible embodiment and are not intended to limit the present disclosure.

[ second embodiment ]

Referring to fig. 5 and 6, the biggest difference between fig. 5 and 3 and between fig. 6 and 4 is that the pattern content of the first etched pattern 10 and the second etched pattern 20 is different, i.e., the direction between the etched-in lines is different.

Specifically, as shown in fig. 5, in the first etched pattern 10, a plurality of first inner etched lines 14 vertically staggered with each other are not present in a straight and lateral manner. In addition, as shown in fig. 6, in the second etched pattern 20, a plurality of second inner etched lines 24 vertically staggered with each other are not present in a straight direction and a lateral direction.

Further, a first distance D1 is provided between the first outer etching line 11 and the second outer etching line 12, a second distance D2 is provided between the second outer etching line 12 and the adjacent and parallel first inner etching line 14, the first distance D1 is smaller than the second distance D2, and the first distance D1 and the second distance D2 satisfy 1.5D1 ≦ D2 ≦ 15D 1. A third distance D3 is provided between the third outer etching line 21 and the fourth outer etching line 22, a fourth distance D4 is provided between the fourth outer etching line 22 and the adjacent and parallel second inner etching line 24, the third distance D3 is smaller than the fourth distance D4, and the third distance D3 and the fourth distance D4 satisfy 1.5D3 ≦ D4 ≦ 15D 3.

In this embodiment, the first distance D1 and the third distance D3 are both between 0.2 mm and 0.6 mm. Preferably, the first distance D1 and the third distance D3 are both between 0.3 and 0.5 millimeters.

In the present embodiment, the second distance D2 and the fourth distance D4 are both between 0.45 mm and 4.5 mm at minimum.

In the present embodiment, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching line 14, the third outer etching line 21, the fourth outer etching line 22 and the second inner etching line 24 are all between 25 micrometers and 65 micrometers. Preferably, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching line 14, the third outer etching line 21, the fourth outer etching line 22 and the second inner etching line 24 are 35 ± 3 micrometers.

[ third embodiment ]

Referring to fig. 7 and 8, the biggest difference between fig. 7 and 3 and 5 and between fig. 8 and 4 and 6 is that the pattern content of the first etched pattern 10 and the second etched pattern 20, i.e., the direction between the etched-in lines, is different.

Specifically, as shown in fig. 7, in the first etched pattern 10, there is another first inner etched line 14 vertically staggered with each other in addition to the first inner etched lines 13 vertically staggered with each other. It should be noted that the first inner etching lines 13 are vertically staggered in a vertical direction and a lateral direction, and the first inner etching lines 14 are not vertically staggered in a vertical direction and a lateral direction. The first inner etched lines 13 are alternately arranged with the first inner etched lines 14 in the first etched pattern 10 to form a mesh structure.

Specifically, as shown in fig. 8, in the second etched pattern 20, in addition to the second inner etched lines 23 vertically staggered with each other, there are another second inner etched lines 24 vertically staggered with each other. It should be noted, however, that the second inner etching lines 23 are vertically staggered in a straight and transverse manner, and the second inner etching lines 24 are not vertically staggered in a straight and transverse manner. The second inner etch lines 23 and the second inner etch lines 24 are alternately arranged in the second etch pattern 20 to form a mesh structure.

Further, a first distance D1 exists between the first outer etching line 11 and the second outer etching line 12, a second distance D2 exists between the second outer etching line 12 and a parallel line segment between the adjacent and parallel first

inner etching lines

13, 14, the first distance D1 is smaller than the second distance D2, and the first distance D1 and the second distance D2 satisfy 1.5D1 ≦ D2 ≦ 15D 1. A third distance D3 is provided between the third outer etching line 21 and the fourth outer etching line 22, a fourth distance D4 is provided between the fourth outer etching line 22 and the adjacent and parallel second

inner etching lines

23, 24, the third distance D3 is smaller than the fourth distance D4, and 1.5D3 ≦ D4 ≦ 15D3 is satisfied between the third distance D3 and the fourth distance D4.

In the present embodiment, the second distance D2 and the fourth distance D4 are both between 0.3 and 3.0 mm.

In the present embodiment, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching lines (13, 14), the third outer etching line 21, the fourth outer etching line 22 and the second inner etching lines (23, 24) are all between 25 micrometers and 65 micrometers. Preferably, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching lines (13, 14), the third outer etching line 21, the fourth outer etching line 22 and the second inner etching lines (23, 24) are 35 ± 3 micrometers.

[ fourth embodiment ]

Referring to fig. 9 and 10, the biggest difference between fig. 9 and fig. 3, 5 and 7, and between fig. 10 and fig. 4, 6 and 8, is that the pattern content of the first etched pattern 10 and the second etched pattern 20 is different, i.e. the direction between the etched lines is different.

Specifically, as shown in fig. 9, in the first etched pattern 10, the plurality of first inner etched lines 15 are parallel to the first outer etched lines 11 and the second outer etched lines 12 to form a mesh structure.

Specifically, as shown in fig. 10, in the second etched pattern 20, the plurality of second inner etched lines 25, the third outer etched lines 21 and the fourth outer etched lines 22 are parallel to each other to form a mesh structure.

Further, a first distance D1 exists between the first outer etching line 11 and the second outer etching line 12, a second distance D2 exists between the second outer etching line 12 and the adjacent and parallel first inner etching line 15, the first distance D1 is smaller than the second distance D2, and the first distance D1 and the second distance D2 satisfy 1.5D1 ≦ D2 ≦ 15D 1. A third distance D3 is provided between the third outer etching line 21 and the fourth outer etching line 22, a fourth distance D4 is provided between the fourth outer etching line 22 and the adjacent and parallel second inner etching line 25, the third distance D3 is smaller than the fourth distance D4, and the third distance D3 and the fourth distance D4 satisfy 1.5D3 ≦ D4 ≦ 15D 3.

In the present embodiment, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching line 15, the third outer etching line 21, the fourth outer etching line 22 and the second inner etching line 25 are all between 25 micrometers and 65 micrometers. Preferably, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching line 15, the third outer etching line 21, the fourth outer etching line 22 and the second inner etching line 25 are 35 ± 3 micrometers.

[ fifth embodiment ]

Referring to fig. 11 and 12, the biggest difference between fig. 11 and fig. 3, 5, 7, and 9, and between fig. 12 and fig. 4, 6, 8, and 10 is that the pattern content of the first etched pattern 10 and the second etched pattern 20 is different, i.e., the direction between the etched-in lines is different. One part of the plurality of first inner etching lines (14, 15) is parallel to the first outer etching lines 11 and the second outer etching lines 12, and the other part (14, 15) of the plurality of first inner etching lines is vertically staggered with each other to form a mesh structure. One part of the second inner etching lines (24, 25) is parallel to the third outer etching lines 21 and the fourth outer etching lines 22, and the other part of the second inner etching lines (24, 25) is vertically staggered to form a net structure.

Specifically, as shown in fig. 11, in the first etched pattern 10, in addition to a plurality of first inner etched lines 14 vertically staggered with each other (not arranged in a straight and lateral manner), two first inner etched lines 15 parallel to the first outer etched lines 11 and the second outer etched lines 12 are arranged therein to form a mesh structure.

Specifically, as shown in fig. 12, in the second etched pattern 20, in addition to a plurality of second inner etched lines 24 vertically staggered with each other (not arranged in a straight and lateral manner), two second inner etched lines 25 parallel to the third outer etched lines 21 and the fourth outer etched lines 22 are arranged therein to form a mesh structure.

In the present embodiment, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching line (14, 15), the third outer etching line 21, the fourth outer etching line 22 and the second inner etching line (24, 25) are all between 25 micrometers and 65 micrometers. Preferably, the line widths of the first outer etching line 11, the second outer etching line 12, the first inner etching line (14, 15), the third outer etching line 21, the fourth outer etching line 22 and the second inner etching line (24, 25) are 35 ± 3 micrometers.

[ sixth embodiment ]

Referring to fig. 13 and 14, the biggest difference between fig. 13 and fig. 3, 5, 7, 9, and 11, and between fig. 14 and fig. 4, 6, 8, 10, and 12, is that the pattern content of the first etching pattern 10 and the second etching pattern 20 is different, i.e., the direction between the inner etching lines is different. The plurality of first internal etching lines are mutually staggered to form a net structure, and the plurality of second internal etching lines are mutually staggered to form the net structure.

Specifically, as shown in fig. 13, in the first etched pattern 10, a plurality of first inner etched lines 16 are staggered with each other to form a mesh structure. It should be noted that, in the present embodiment, the plurality of first inner etching lines 16 are not vertically staggered.

Specifically, as shown in fig. 14, in the second etched pattern 20, a plurality of second inner etched lines 26 are staggered with each other to form a mesh structure. It should be noted that, in the present embodiment, the plurality of second inner etching lines 26 are not vertically staggered.

Further, the interval between the first outer etching line 11 and the second outer etching line 12 is smaller than the interval between any two first inner etching lines 16, and the interval between the third outer etching line 21 and the fourth outer etching line 22 is smaller than the interval between any two second inner etching lines 26.

In this embodiment, the visibility of the etching line is good, that is, the existence of the etching line and the etching pattern is not easily perceived by naked eyes; and the sheet resistance (sheet resistance) of the first electrode pattern TX and the second electrode pattern RX is 30 ohm/square, when the touch sensor is applied to a touch sensor of a medium-small size panel and a large size panel, a touch sensing signal meeting a specification range can be obtained.

[ advantageous effects of the embodiments ]

One of the advantages of the present disclosure is that the transparent conductive electrode of the touch panel provided by the present disclosure can have a first outer etching line 11 and a second outer etching line 12 that are parallel to and extend from each other through "the edge of the first electrode pattern TX. The two adjacent first electrode patterns TX include a plurality of first inner etching lines (13-15) ", a first distance D1 is provided between the first outer etching lines 11 and the second outer etching lines 12, a parallel line segment between the first outer etching line 11 and the first inner etching lines (13-15) of the adjacent second outer etching lines 12 has a second distance D2", and the first distance D1 is smaller than the second distance D2, and the first distance D1 and the second distance D2 satisfy a technical scheme of 1.5D1 ≦ D2 ≦ 15D1 ", so as to achieve the effects of high electrical conductivity and low visibility.

Another advantageous effect of the present invention is that the transparent conductive electrode of the touch panel provided in the present invention can achieve the effects of high conductivity and low visibility by the technical solutions that "the edge of the first electrode pattern TX has the first outer etching line 11 and the second outer etching line 12 that are parallel and extend," two adjacent first outer etching lines 11 of two adjacent first electrode patterns TX include the plurality of first inner etching lines 16, "and" the distance between the first outer etching line 11 and the second outer etching line 12 is smaller than the distance between any two first inner etching lines 26.

Furthermore, since the single etching line (trench) at the edge of the transparent conductive electrode in the prior art needs to be widened and deepened to avoid short circuit caused by contact of conductive materials of adjacent transparent conductive electrodes, so that the trace of the etching line is more obvious, the present application changes the etching line at the edge of the electrode pattern from the single etching line in the prior art to two etching lines, namely, the first outer etching line 11 and the second outer etching line 12. Through the structural design, the two outer etching lines do not need to be widened and deepened intentionally, and the short circuit caused by the contact of the conductive substances of the adjacent transparent conductive electrodes can be effectively prevented.

In addition, although the structural design of the two outer etching lines has improved the disadvantage of only a single outer etching line, the close proximity of the two outer etching lines also results in a relatively visible outline of the transparent conductive electrode. Therefore, the application further adjusts the distance (between 0.2 and 0.6 mm, and the optimal value is 0.3 mm) between the two outer etching lines at the edge of the transparent conductive electrode, so that the transparency of the outline of the transparent conductive electrode can be optimal, that is, the visibility of the two outer etching lines is the lowest, and further, the optimization effects of high conductivity, difficulty in short circuit and low visibility are achieved.

The disclosure is only a preferred embodiment of the present application and is not intended to limit the scope of the claims of the present application, so that all technical equivalents and modifications made by the disclosure of the present application and the drawings are included in the scope of the claims of the present application.

Claims

1. A transparent conductive electrode of a touch panel, comprising:

a plurality of first electrode patterns, wherein the edge of each first electrode pattern is provided with a first outer etching line and a second outer etching line which are parallel to each other and extend, and a plurality of first inner etching lines are arranged between two adjacent first electrode patterns;

the first outer etching lines and the second outer etching lines have a first distance therebetween, the second outer etching lines and the adjacent and parallel first inner etching lines have a second distance therebetween, the second distance is greater than or equal to 1.5 times the first distance, and the second distance is less than or equal to 15 times the first distance.

2. The transparent conductive electrode of the touch panel as claimed in claim 1, wherein the first distance is between 0.2 mm and 0.6 mm.

3. The transparent conductive electrode of the touch panel as claimed in claim 1, wherein the second pitch is between 0.3 mm and 3.0 mm.

4. The transparent conductive electrode of the touch panel according to claim 1, wherein the line widths of the first outer etching line, the second outer etching line and the first inner etching line are all between 25 micrometers and 65 micrometers.

5. The transparent conductive electrode of the touch panel as claimed in claim 1, wherein the first etched lines are vertically crossed to form a mesh structure.

6. The transparent conductive electrode of the touch panel as claimed in claim 1, wherein the first inner etching lines are vertically staggered with respect to each other in a vertical direction and a horizontal direction to form a mesh structure.

7. The transparent conductive electrode of the touch panel as recited in claim 1, wherein the first inner etching lines and the first and second outer etching lines are parallel to each other to form a mesh structure.

8. The transparent conductive electrode of the touch panel as recited in claim 1, wherein a portion of the first inner etching lines and the first and second outer etching lines are parallel to each other and another portion of the first inner etching lines are vertically staggered to each other to form a mesh structure.

9. A transparent conductive electrode of a touch panel, comprising:

a plurality of first electrode patterns, wherein the edge of each first electrode pattern is provided with a first outer etching line and a second outer etching line which are parallel to each other and extend, and a plurality of first inner etching lines are arranged between two adjacent first electrode patterns; and

wherein, the interval between the first outer etching line and the second outer etching line is smaller than the interval between any two first inner etching lines.

10. The transparent conductive electrode of the touch panel as claimed in claim 9, wherein the first etched lines are interlaced to form a mesh structure.