CN114327104A - Contact area structure - Google Patents

Abstract

Providing a contact region structure comprising: an organic substrate, an inorganic conductive layer, an organic adhesive layer, and a transparent conductive layer. The organic substrate comprises at least one lap joint area, and the lap joint area comprises a first block and a second block adjacent to the first block. The inorganic conductive layer is arranged on the organic substrate, wherein the inorganic conductive layer is partially arranged on the first block, and the second block is exposed out of the upper surface of the organic substrate. The organic adhesion layer covers the inorganic conductive layer and the upper surface of the organic substrate. The transparent conductive layer is arranged on the organic adhesion layer to enhance the adhesive force of the transparent conductive layer attached to the inorganic conductive layer.

Description

Contact area structure

technical field

The present disclosure relates to a structure of a contact region, and in particular, to the structure of organic and inorganic conductors in the contact region.

Background technique

In the prior art, in the contact area where the touch electrode and the transmission line meet, the material of the transmission line is mostly a solid metal layer, and the touch electrode is adhered to the transmission line by using an organic material. Therefore, the larger the contact area, the smaller the resistance of the contact. However, organic materials cannot form bonds with inorganic materials such as metals, resulting in poor adhesion and thus the touch electrodes falling off. In view of this, the existing technology needs to be improved.

SUMMARY OF THE INVENTION

An embodiment of the present disclosure aims to provide a contact area structure that significantly enhances the adhesion of the transparent conductive layer to the inorganic conductive layer and avoids peeling off due to the photoresist film being stripped.

An embodiment of the present disclosure provides a contact area structure including: an organic substrate, an inorganic conductive layer, an organic adhesive layer, and a transparent conductive layer. The organic substrate includes at least one contact pad area, and the contact pad area includes a first area and a second area adjacent to the first area. The inorganic conductive layer is disposed on the organic substrate, wherein the inorganic conductive layer is partially disposed in the first block, and the second block exposes the upper surface of the organic substrate. The organic adhesive layer covers the inorganic conductive layer and the upper surface of the organic substrate. The transparent conductive layer is arranged on the organic adhesive layer.

In some embodiments, the inorganic conductive layer is a metal layer.

In some embodiments, the metal layer is a copper layer.

In some embodiments, the inorganic conductive layer has a linear structure in plan view.

In some embodiments, the line-like structures have a width of 10 microns to 50 microns.

In some embodiments, the thickness of the inorganic conductive layer is 0.1 micron to 1 micron.

In some embodiments, the inorganic conductive layers are spaced apart in the cross-sectional view of the overlapping area.

In some embodiments, the inorganic conductive layer is in a mesh-like, dendritic-like, honeycomb-like, or grid-like structure.

In some embodiments, the inorganic conductive layer has an area of 10,000 square micrometers to 1,000,000 square micrometers.

In some embodiments, the organic substrate further includes a plurality of overlapping regions, and the multiple overlapping regions are electrically connected through the inorganic conductive layer.

Description of drawings

The various aspects of the present disclosure will be best understood when the following detailed description is read in conjunction with the accompanying drawings. It should be noted that in accordance with industry standard operating procedures, the various features may not be drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or decreased for clarity of discussion.

FIG. 1 is a schematic diagram of a contact area structure according to a first embodiment of the present disclosure;

FIG. 2 is a partial cross-sectional view of FIG. 1;

3 is a schematic diagram illustrating a contact area structure according to a second embodiment of the present disclosure;

4 is a schematic diagram illustrating a contact area structure according to a third embodiment of the present disclosure;

FIG. 5 is a partial cross-sectional view of FIG. 4;

FIG. 6 is a schematic diagram illustrating a contact area structure according to a fourth embodiment of the present disclosure.

【Symbol Description】

10: Contact area structure

100: Organic substrate

110: Overlap area

111: The first block

112: Second block

200: Inorganic conductive layer

300: organic adhesive layer

400: transparent conductive layer

Detailed ways

In order to make the description of the present disclosure more detailed and complete, the following provides an illustrative description of the implementation aspects and specific embodiments of the present disclosure, but this is not the only form of implementing or using the specific embodiments of the present disclosure. The embodiments disclosed below can be combined or substituted with each other under beneficial circumstances, and other embodiments can also be added to one embodiment without further description or explanation. In the following description, numerous specific details are set forth in detail to enable the reader to fully understand the following embodiments. However, embodiments of the present disclosure may be practiced without these specific details.

In addition, spatially relative terms, such as "lower", "upper", etc., are used to conveniently describe the relative relationship of one element or feature to other elements or features in the drawings. These spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation shown in the figures. The device may be otherwise oriented (eg, rotated 90 degrees or at other orientations) and the spatially relative descriptions used herein interpreted accordingly.

As used herein, "a" and "the" can generally refer to a single one or a plurality unless the context of the article specifically limits them. It will be further understood that "comprising", "including", "having" and similar words used herein designate the recited features, regions, integers, steps, operations, elements and/or components, but do not exclude Other features, regions, integers, steps, operations, elements, components, and/or groups thereof.

Several embodiments and experimental examples are listed below to describe the structure of the contact area of the present disclosure in more detail. However, they are only used for illustration and are not intended to limit the present disclosure. The protection scope of the present disclosure should be defined by the appended claims. The defined range shall prevail.

In some embodiments of the present disclosure, please refer to FIGS. 1 and 2 , the contact area structure 10 includes an organic substrate 100 , an inorganic conductive layer 200 , an organic adhesive layer 300 , and a transparent conductive layer 400 .

In one embodiment, the contact region structure 10 of the present disclosure can be widely used in the places where the organic material and the inorganic material are in contact with each other, including but not limited to the position where the nano-silver contacts the metal layer. For example, the contact area structure 10 is the intersection or overlap of the touch electrodes and the signal transmission lines in the touch panel, so that the signals of the touch electrodes can be transmitted to the signal transmission lines.

In one embodiment, the organic substrate 100 refers to a non-conductive material. The substrate can be rigid or flexible. The substrate may be transparent or opaque. Suitable rigid substrates include, for example, polycarbonates, acrylics, and the like. Suitable flexible substrates include, but are not limited to: polyesters (eg, polyethylene terephthalate (PET), polyethylene naphthalate, and polycarbonate), polyolefins (eg, linear, branched chain and cyclic polyolefins), polyethylene (eg, polyvinyl chloride, polyvinylidene chloride, polyvinyl acetal, polystyrene, polyacrylates, and the like), cellulose ester substrates (eg, triacetate cellulose) cellulose acetate), polysulfones (eg, polyethersulfone), polyimides, polysiloxanes, and other conventional polymeric membranes. Additional examples of suitable substrates can be found in, eg, US Pat. No. 6,975,067.

In one embodiment, the organic substrate 100 includes at least one overlapping area 110 , and the overlapping area 110 includes a first block 111 and a second block 112 adjacent to the first block 111 . In some embodiments, the overlapping area 110 is in the form of a continuous plane, or a block shape.

In one embodiment, the organic substrate 100 includes a plurality of overlapping regions 110 . In some embodiments, the overlapping regions 110 are not connected to each other. In some embodiments, the overlapping regions 110 are electrically connected through the inorganic conductive layer 200 .

In one embodiment, the inorganic conductive layer 200 is disposed on the organic substrate 100 , wherein the inorganic conductive layer 200 is partially disposed on the first block 111 , and the second block 112 exposes the upper surface of the organic substrate 100 . In the partial cross-sectional view of FIG. 2 , the organic adhesive layer 300 covers the organic substrate 100 on both sides of the inorganic conductive layer 200 to form an arrangement of organic, inorganic, and organic materials at intervals, so that the transparent conductive layer 400 has strong adhesion and is not easily affected by light. The stripping film will sometimes cause peeling off. In one embodiment, the inorganic conductive layer 200 is a metal layer. In some embodiments, the material of the metal layer includes, but is not limited to, indium tin oxide, silver, zinc, copper, gold, platinum, tungsten, aluminum, or the aforementioned metal alloys. In some embodiments, the inorganic conductive layer 200 is used as a transmission line. In some embodiments, the inorganic conductive layer 200 is part of a flexible circuit board.

聚苯乙烯、聚乙烯甲苯、聚乙烯二甲苯、聚酰亚胺、聚酰胺、聚酰胺酰亚胺、聚醚酰亚胺、聚硫化物、聚砜、聚苯及聚苯基醚、聚胺基甲酸酯(PU)、环氧树脂、聚烯烃(例如聚丙烯、聚甲基戊烯及环状烯烃)、丙烯腈-丁二烯-苯乙烯共聚物(ABS)、纤维素、聚硅氧及其他含硅聚合物(例如聚硅倍半氧烷及聚硅烷)、聚氯乙烯(PVC)、聚乙酸酯、聚降莰烯、合成橡胶(例如，EPR、SBR、EPDM)及氟聚合物(例如，聚二氟亚乙烯、聚四氟乙烯(TFE)或聚六氟丙烯)、氟-烯烃与烃烯烃的共聚物(例如，

)及非晶型氟碳聚合物或共聚物(例如，Asahi Glass公司的

或DuPont的

AF)。In one embodiment, the organic adhesive layer 300 may help to adhere the transparent conductive layer 400 to the inorganic conductive layer 200 and the organic substrate 100 . The organic adhesion layer 300 includes a suitable adhesive, such as an optically clear polymer, including, but not limited to: polyacrylics such as polymethacrylates (eg, poly(methyl methacrylate)), poly(methyl methacrylate) Acrylates and polyacrylonitrile; polyvinyl alcohol; polyesters (eg, polyethylene terephthalate (PET), polyethylene terephthalate, and polycarbonate); polymers with a high degree of aromatization, e.g. phenolic or cresol-formaldehyde

Polystyrene, polyethylene toluene, polyethylene xylene, polyimide, polyamide, polyamideimide, polyetherimide, polysulfide, polysulfone, polyphenylene and polyphenyl ether, polyamine Urethanes (PU), epoxy resins, polyolefins (such as polypropylene, polymethylpentene, and cyclic olefins), acrylonitrile-butadiene-styrene (ABS), cellulose, polysilicon Oxygen and other silicon-containing polymers (eg, polysilsesquioxane and polysilane), polyvinyl chloride (PVC), polyacetate, polynorbornene, synthetic rubbers (eg, EPR, SBR, EPDM), and fluorine Polymers (eg, polyvinylidene fluoride, polytetrafluoroethylene (TFE), or polyhexafluoropropylene), copolymers of fluoro-olefins and hydrocarbon olefins (eg,

) and amorphous fluorocarbon polymers or copolymers (eg, Asahi Glass'

or DuPont

AF).

In one embodiment, the transparent conductive layer 400 is prepared by coating a nanostructure-containing coating composition. To form coating compositions, metal nanowires are typically dispersed in a volatile liquid to aid in the coating process. It should be understood that, as used herein, any non-corrosive volatile liquid in which the metal nanowires can form a stable dispersion can be used. Preferably, the metal nanowires are dispersed in water, alcohol, ketone, ether, hydrocarbon or aromatic solvent (benzene, toluene, xylene, etc.). More preferably, the liquid is volatile and its boiling point is no greater than 200°C, no greater than 150°C or no greater than 100°C.

)。In addition, the metal nanowire dispersion may contain additives and binders to control viscosity, corrosion, adhesion, and nanowire dispersion. Examples of suitable additives and binders include, but are not limited to, carboxymethyl cellulose (CMC), 2-hydroxyethyl cellulose (HEC), hydroxypropyl methyl cellulose (HPMC), methyl cellulose ( MC), polyvinyl alcohol (PVA), tripropylene glycol (TPG), and xanthan gum (XG); and surfactants such as ethoxylates, alkoxylates, ethylene oxide and propylene oxide and their Copolymers, sulfonates, sulfates, disulfonates, sulfosuccinates, phosphates, and fluorosurfactants (eg, DuPont's

).

FSO-100的较佳范围是0.0025％至0.05％)、0.02％至4％的粘度改质剂(例如，HPMC的较佳范围是0.02％至0.5％)、94.5％至99.0％的溶剂及0.05％至1.4％的金属纳米线。适宜表面活性剂的代表性实例包含

FSN、

FSO、

FSH、Triton(x100、x114、x45)、Dynol(604、607)、正十二烷基b-D-麦芽糖苷及Novek。适宜粘度改质剂的实例包含羟丙基甲基纤维素(HPMC)、甲基纤维素、黄原胶、聚乙烯醇、羧甲基纤维素及羟乙基纤维素。适宜溶剂的实例包含水及异丙醇。In some embodiments, the nanowire dispersion or "ink" comprises 0.0025% to 0.1% by weight of a surfactant (eg,

The preferred range for FSO-100 is 0.0025% to 0.05%), 0.02% to 4% viscosity modifier (eg, the preferred range for HPMC is 0.02% to 0.5%), 94.5% to 99.0% solvent and 0.05% % to 1.4% metal nanowires. Representative examples of suitable surfactants include

FSN,

FSO,

FSH, Triton (x100, x114, x45), Dynol (604, 607), n-dodecyl bD-maltoside and Novek. Examples of suitable viscosity modifiers include hydroxypropyl methylcellulose (HPMC), methylcellulose, xanthan gum, polyvinyl alcohol, carboxymethylcellulose, and hydroxyethylcellulose. Examples of suitable solvents include water and isopropanol.

The nanowire concentration in the dispersion can affect or determine the parameters of the nanowire network layer, such as thickness, electrical conductivity (including surface electrical conductivity), optical transparency, and mechanical properties. The solvent percentage can be adjusted to provide the desired concentration of nanowires in the dispersion. However, in preferred embodiments, the relative ratios of the other components may remain unchanged. Specifically, the ratio of surfactant to viscosity modifier is preferably in the range of about 80 to about 0.01; the ratio of viscosity modifier to metal nanowire is preferably in the range of about 5 to about 0.000625; and the metal nanowire The ratio to surfactant is preferably in the range of about 560 to about 5. The ratio of the components in the dispersion can vary depending on the substrate used and the method of application. The preferred viscosity range for nanowire dispersions is between about 1 cP and 100 cP.

After coating, the volatile liquid is removed by evaporation. Evaporation can be accelerated by heating (eg baking). The resulting nanowire network layer may require post-processing to make it conductive. As set forth below, post-processing may be process steps involving exposure to heat, plasma, corona discharge, UV-ozone, or pressure.

In one embodiment, the optical transparency or clarity of the transparent conductive layer 400 (ie, the conductive network on the non-conductive substrate) can be quantitatively defined by parameters including light transmittance and haze. "Light transmittance" (or "light transmittance") refers to the percentage of incident light transmitted through a medium. In various embodiments, the light transmittance of the conductive layer is at least 80% and can be as high as 98%. Performance enhancing layers such as adhesion layers, anti-reflection layers or anti-glare layers can further help reduce the overall light transmittance of the transparent conductor. In various embodiments, the transmittance (T%) of the transparent conductor may be at least 50%, at least 60%, at least 70%, or at least 80%, and may be as high as at least 91% to 92% or at least 95%.

The organic substrate 100, the inorganic conductive layer 200, the organic adhesion layer 300, and the transparent conductive layer 400 are described in more detail in the following non-limiting examples.

Example 1

FIG. 1 is a schematic diagram of a contact area structure according to a first embodiment of the disclosure, and FIG. 2 is a partial cross-sectional view of FIG. 1 . The contact area structure 10 of an embodiment of the present disclosure includes an organic substrate 100 , an inorganic conductive layer 200 , an organic adhesive layer 300 , and a transparent conductive layer 400 .

The organic substrate 100 includes at least one overlapping area 110 , and the overlapping area 110 includes a first block 111 and a second block 112 adjacent to the first block 111 .

The inorganic conductive layer 200 is disposed on the organic substrate 100 , wherein the inorganic conductive layer 200 is partially disposed on the first block 111 , and the second block 112 exposes the upper surface 101 of the organic substrate 100 . The inorganic conductive layer 200 is a metal layer, such as a copper layer. The inorganic conductive layer 200 is a linear structure in plan view, wherein the width of the linear structure is about 10 microns to 50 microns, for example: about 15 microns, about 20 microns, about 25 microns, about 30 microns, about 35 microns, about 40 microns microns, about 45 microns, or any value in between any of these values. The thickness of the inorganic conductive layer 200 is about 0.1 micrometer to 1 micrometer, for example: about 0.2 micrometer, about 0.3 micrometer, about 0.4 micrometer, about 0.5 micrometer, about 0.6 micrometer, about 0.7 micrometer, about 0.8 micrometer, about 0.9 micrometer, or these Any of the values in between. The inorganic conductive layer 200 has an area of about 10,000 square microns to about 1,000,000 square microns, for example: about 50,000 square microns, about 100,000 square microns, about 200,000 square microns, about 500,000 square microns, about 700,000 square microns, about 900,000 square microns, or these Any value between any two of the values will facilitate the adhesion between the transparent conductive layer 400 and the inorganic conductive layer 200 .

The organic adhesive layer 300 covers the inorganic conductive layer 200 and the upper surface 101 of the organic substrate 100 . In other words, the organic substrate 100 is covered by the inorganic conductive layer 200 and part of the organic adhesive layer 300 .

The transparent conductive layer 400 is disposed on the organic adhesive layer 300 . The transparent conductive layer 400 includes nano silver. The organic substrate 100 is covered by the inorganic conductive layer 200 and part of the organic adhesive layer 300 , so that the transparent conductive layer 400 has strong adhesion and is not easily peeled off when the photoresist is peeled off.

Example 2

FIG. 3 is a schematic diagram of a contact area structure according to a second embodiment of the present disclosure. The difference between Example 2 and Example 1 is that the pattern of the inorganic conductive layer 200 in Example 2 under a plane is a curved linear structure. 2 , both sides of the inorganic conductive layer 200 are covered by the organic adhesive layer 300 on the organic substrate 100, so that the transparent conductive layer 400 has strong adhesion and is not easily peeled off due to the photoresist stripping.

Example 3

FIG. 4 is a schematic diagram of a contact area structure according to a third embodiment of the present disclosure, and FIG. 5 is a partial cross-sectional view of FIG. 4 . The difference between Embodiment 3 and Embodiment 1 is that the inorganic conductive layers 200 are arranged at intervals in the cross-sectional view of the overlap region 110 , and the overlap region 110 has a plurality of first blocks 111 and a plurality of second blocks 112 . In detail, the inorganic conductive layer 200 has a grid-like structure, and the hollows of the inorganic conductive layer 200 are the second blocks 112 , and the upper surface of the organic substrate 100 is exposed. In the partial cross-sectional view of FIG. 5 , two sides of the inorganic conductive layer 200 are the organic adhesive layers 300 covering the organic substrate 100 to form a spaced arrangement of organic, inorganic, organic, inorganic and organic materials, so that the transparent conductive layer 400 has strong adhesion , it is not easy to fall off when the photoresist is stripped.

Example 4

FIG. 6 is a schematic diagram illustrating a contact area structure according to a fourth embodiment of the present disclosure. The difference between Example 4 and Example 3 is that the inorganic conductive layer 200 in the cross-sectional view of the overlapping region 110 has a honeycomb-like structure. Similar to FIG. 5 in the partial cross-sectional view, the organic adhesive layers 300 on both sides of the inorganic conductive layer 200 cover the organic substrate 100 to form an interval arrangement of organic, inorganic, organic, inorganic, and organic materials, so that the transparent conductive layer 400 has an adhesive force. Strong, not easy to fall off due to photoresist stripping.

The organic adhesive layer 300 which is also an organic material and the organic substrate 100 are chemically bonded to each other, which has stronger adhesion than the bonding between the inorganic conductive layer 200 of an inorganic material and the organic substrate 100 of an organic material by Van der Waals force. Therefore, in an embodiment of the present disclosure, the strength of the transparent conductive layer 400 to adhere to the inorganic conductive layer 200 is significantly enhanced, so as to avoid peeling off when the photoresist is peeled off.

An embodiment of the present disclosure is to cut a traditional whole continuous piece of nano-silver and metal layer into small pieces of special-shaped joints in the overlapping area. After the metal layer in the overlapping area is partially hollowed out, the nano-silver with good adhesion can be adhered The agent adheres to the organic substrate, while the metal layer with poor adhesion is adhered by the adhesive on both sides. In some embodiments, due to the material properties of the nano-silver, the hollowing of the nano-silver and the metal layer in the overlapping area will not cause a proportional increase in the contact area to the resistance.

Although the present disclosure has been disclosed as above in embodiments, it is not intended to limit the present disclosure. Anyone familiar with the art can make various changes and modifications without departing from the spirit and scope of the present disclosure. Therefore, the present disclosure The scope of protection shall be subject to the scope defined by the appended claims.

Claims (10)

1. A contact structure, comprising:

an organic substrate, comprising at least one lap joint area, wherein the lap joint area comprises a first block and a second block adjacent to the first block;

an inorganic conductive layer disposed on the organic substrate, wherein the inorganic conductive layer is partially disposed in the first block, and the second block exposes an upper surface of the organic substrate;

an organic adhesion layer covering the inorganic conductive layer and the upper surface of the organic substrate; and

a transparent conductive layer disposed on the organic adhesion layer.

2. The contact structure of claim 1 wherein the inorganic conductive layer is a metal layer.

3. The contact structure of claim 2 wherein said metal layer is a copper layer.

4. The contact region structure of claim 1, wherein the inorganic conductive layer has a line structure in plan view.

5. The contact region structure of claim 4 wherein the line feature has a width of 10 microns to 50 microns.

6. The contact region structure of claim 4, wherein the inorganic conductive layer has a thickness of 0.1 to 1 μm.

7. The contact structure of claim 1 wherein said inorganic conductive layers are spaced apart in a cross-sectional view of said landing area.

8. The contact region structure of claim 7, wherein the inorganic conductive layer is in a mesh, dendritic, honeycomb, or grid structure.

9. The contact structure of claim 1 wherein the inorganic conductive layer has an area of 10,000 square microns to 1,000,000 square microns.

10. The contact region structure of claim 1, wherein the organic substrate further comprises a plurality of landing regions electrically connected via the inorganic conductive layer.

Images