CN114326299A - Photosensitive resin composition, optical filter and application - Google Patents
Photosensitive resin composition, optical filter and application Download PDFInfo
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- CN114326299A CN114326299A CN202011052759.6A CN202011052759A CN114326299A CN 114326299 A CN114326299 A CN 114326299A CN 202011052759 A CN202011052759 A CN 202011052759A CN 114326299 A CN114326299 A CN 114326299A
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Abstract
The invention provides a photosensitive resin composition, an optical filter and application. The photosensitive resin composition comprises: the photopolymerization compound, oxime ester photoinitiator and alkali soluble resin grafted with silane side chains, wherein the weight average molecular weight of the alkali soluble resin grafted with the silane side chains is 5000-30000, the acid value is 50-200 mgKOH/g, and the grafting rate of the silane side chains is 5-20%. The alkali-soluble resin having a specific silane group graft ratio, weight average molecular weight and acid value has good compatibility with other components, and is also advantageous for improving the adhesion of the photosensitive resin composition to a substrate. The alkali-soluble resin and the oxime ester photoinitiator are matched for use, so that the sensitivity of the photosensitive resin composition and the compatibility and stability of a reaction system are improved, and the development effect is improved in the development process.
Description
Technical Field
The invention relates to the field of photocuring, in particular to a photosensitive resin composition, an optical filter and application.
Background
Generally, the photosensitive resin composition generally contains an alkali-soluble resin, a polyfunctional acrylic monomer having 2 or more ethylenically unsaturated bonds, a photopolymerization initiator, and a solvent, and if necessary, an auxiliary agent for improving coating properties and adhesion to a substrate may be added. Such photosensitive resins are applied to a substrate to form a coating layer, and the unexposed portions are developed and removed by exposure and development to form a desired pattern. Therefore, in order to construct fine patterns, it is necessary to use not only a highly sensitive initiator but also various additives such as a silane-based adhesion promoter for increasing the adhesion of the film to the substrate. In order to obtain a high color contrast, an initiator or the like added to the color filter is required to have a good light transmittance and no noticeable color after decomposition.
The compound with oxime ester structure is widely used as a photoinitiator in the field of photocuring. Oxime ester photoinitiators have high sensitivity and are widely used in photopolymerizable compositions containing colorants for use in color filters, black matrices, and the like. The prior documents disclose different carbazole oxime ester and ketoxime ester photoinitiators, and the disclosed photoinitiators have good photosensitivity and storage stability and can meet the general application requirements of the photocuring fields of current display panels, color filters and the like to different degrees. However, in the photosensitive resin composition which requires high quality color properties, the addition of a large amount of pigment makes curing more difficult, and the sharpness, integrity, etc. of the cured image are reduced. Therefore, a photosensitive resin composition having higher photosensitivity, stronger adhesion and pattern fineness is required to achieve the above objects.
The alkali-soluble resin binder plays a basic supporting role in the photocuring resin, and can provide guarantee for pigment dispersion, film formation and the like. In order to obtain a good development fineness, it is necessary to add an auxiliary agent such as a silane-based adhesion promoter to the resin. However, as the amount of the auxiliary added increases, the stability of the photosensitive resin composition system tends to deteriorate and defects occur during development. Therefore, in order to obtain fine patterns, the adhesion of the alkali-soluble resin should be significantly enhanced and be able to have better compatibility with the corresponding high-sensitivity initiator.
Disclosure of Invention
The invention mainly aims to provide a photosensitive resin composition, an optical filter and application, and aims to solve the problems of poor stability and poor developing effect of the photosensitive resin composition with high requirements on color performance.
In order to achieve the above object, one aspect of the present invention provides a photosensitive resin composition comprising: the photopolymerization compound, oxime ester photoinitiator and alkali soluble resin grafted with silane side chains, wherein the weight average molecular weight of the alkali soluble resin grafted with the silane side chains is 5000-30000, the acid value is 50-200 mgKOH/g, and the grafting rate of the silane side chains is 5-20%.
Further, the alkali-soluble resin grafted with a silane side chain has a structure represented by formula i:
wherein each R is21Each independently represents H, methyl, C2～C20A straight or branched alkyl group of (a);
R22and R23Each independently represents C1～C30Alkyl of (C)3～C30Cycloalkyl of, C3～C20A heterocyclic group of, C6～C30Aryl of (a);
R24、R25、R26each independently represents H, deuterium, C1～C20Alkyl of (C)1～C20Cycloalkyl radical, C3～C20Heterocycloalkyl of (A), C6～C30Aryl of (C)6～C30Heteroaryl of (A), C3～C20Cycloalkyl of, or-Si- (R)28)3Each R28Independently represent C1～C10Linear or branched alkyl of (a);
R27represents a single bond, or is represented by R24、R25Or R26The resulting divalent group;
x, y, z and m independently represent an integer of 1 to 20.
Further, the alkali-soluble resin grafted with the silane side chain is obtained by copolymerizing a polymerizable monomer and a monomer containing a silane structure, wherein the polymerizable monomer is one or more selected from the group consisting of an alkenyl-containing polymerizable compound, an unsaturated oxetane carboxylate, a maleic anhydride-based compound, a maleimide-based compound, (meth) acrylamide-based compounds, (meth) acrylic compounds and (meth) acrylate-based compounds; the silyl group containing monomer is selected from one or more of trimethylsilyl methacrylate, triethylsilyl methacrylate, t-butyldimethylsilyl methacrylate, isopropyldimethylsilyl methacrylate, phenyldimethylsilyl methacrylate, di-t-butylmethylsilicyl methacrylate, triisopropylsilyl methacrylate, trimethylsilyl acrylate and triethylsilyl acrylate.
Further, the weight average molecular weight of the alkali-soluble resin grafted with the silane side chain is 8000 to 20000, preferably 8000 to 15000.
Further, the acid value of the alkali-soluble resin grafted with the silane side chain is 70 to 150mgKOH/g, preferably 90 to 120 mgKOH/g.
Further, the ratio of the weight average molecular weight to the number average molecular weight of the alkali-soluble resin grafted with the silane side chain is 1.5-4.0, preferably 1.8-3.5.
Further, the photosensitive resin composition comprises, based on 100 parts by weight of the photosensitive resin composition, 1 to 10 parts of a photopolymerizable compound, 5 to 30 parts of an alkali-soluble resin grafted with a silane side chain, and 0.1 to 5.0 parts of an oxime ester photoinitiator; preferably, the photosensitive resin composition comprises, based on 100 parts by weight of the photosensitive resin composition, 3 to 7 parts of a photopolymerizable compound, 10 to 20 parts of an alkali-soluble resin grafted with a silane side chain, and 0.5 to 3.0 parts of an oxime ester photoinitiator.
Further, the photoinitiator with oxime ester is selected from 1- (4-thiophenylphenyl) -n-octane-1, 2-diketone-2-benzoxy ester, 1- [6- (2-methylbenzoyl) -9-ethylcarbazole-3-yl ] -ethane-1-ketone-oxime acetate, 1- (6-thiophenecarbonyl-9-ethylcarbazole-3-yl) -3-cyclopentyl-propane-1-ketone-oxime acetate, 1- [6- [2[ (acetoxy) imino ] -3-cyclohexane-1-oxypropyl ] -9-ethyl-9H-carbazole-3-yl ] -1, 2-octanedione-2- (O-acetyloxime), 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate, 1- (6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl) -3-cyclopentyl-propan-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propan-1, 2-diketone-2-benzonate oxime ester, 1- (4-thiophenyl phenyl) - (3-cyclohexyl) -propane-1, 2-diketone-2-acetate oxime ester; preferably, the photoinitiator with oxime ester is selected from 1- (6- (2-methylbenzoyl) -9-ethylcarbazole-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazole-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate, 1- (4-thiophenylphenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-thiophenylphenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate.
The application also provides an optical filter, which comprises a color layer, wherein the color layer is formed by curing the photosensitive resin composition.
The application also provides an application of the photosensitive resin composition in the field of photocuring.
By applying the technical scheme of the invention, the alkali-soluble resin plays a role of basic support in the polymerization process of the photopolymerizable compound, and can be dissolved by an alkaline solution to realize development. The alkali-soluble resin having a specific silane group graft ratio, weight average molecular weight and acid value has good compatibility with other components, and is also advantageous for improving the adhesion of the photosensitive resin composition to a substrate. The alkali-soluble resin and the oxime ester photoinitiator are matched for use, so that the sensitivity of the photosensitive resin composition and the compatibility and stability of a reaction system are improved, and the development effect is improved in the development process. On the basis, the photosensitive resin composition with the composition has better system stability, adhesiveness and developing effect.
Detailed Description
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail with reference to examples.
As described in the background art, the conventional photosensitive resin compositions which require high color properties have problems of poor stability and poor developing effect. In order to solve the above technical problem, the present application provides a photosensitive resin composition comprising: the photopolymerization compound, oxime ester photoinitiator and alkali soluble resin grafted with silane side chains, wherein the weight average molecular weight of the alkali soluble resin grafted with the silane side chains is 5000-30000, the acid value is 50-200 mgKOH/g, and the grafting rate of the silane side chains is 5-20%.
The alkali-soluble resin plays a fundamental role in the polymerization process of the photopolymerizable compound, and at the same time, can be dissolved by an alkaline solution to effect development. The alkali-soluble resin having a specific silane group graft ratio, weight average molecular weight and acid value has good compatibility with other components, and is also advantageous for improving the adhesion of the photosensitive resin composition to a substrate. The alkali-soluble resin and the oxime ester photoinitiator are matched for use, so that the sensitivity of the photosensitive resin composition and the compatibility and stability of a reaction system are improved, and the development effect is improved in the development process. On the basis, the photosensitive resin composition with the composition has better system stability, adhesiveness and developing effect.
The alkali-soluble resin with the specific silane side chain grafting rate, the weight average molecular weight and the acid value has better compatibility with other components, and is beneficial to improving the adhesive force of the photosensitive resin composition on a base material, thereby improving the developing effect. In a preferred embodiment, the alkali-soluble resin grafted with silane side chains has the structure shown in formula I:
wherein each R is21Each independently represents H, methyl, C2～C20A straight or branched alkyl group of (a);
R22and R23Each independently represents C1～C30Alkyl of (C)3～C30Cycloalkyl of, C3～C20A heterocyclic group of, C6～C30Aryl of (a); r24、R25、R26Each independently represents H, deuterium, C1～C20Alkyl of (C)1～C20Cycloalkyl radical, C3～C20Heterocycloalkyl of (A), C6～C30Aryl of (C)6～C30Heteroaryl of (A), C3～C20Cycloalkyl of, or-Si- (R)28)3Each R28Independently represent C1～C10Linear or branched alkyl of (a); r27Represents a single bond, or is represented by R24、R25Or R26The resulting divalent group; x, y, z and m independently represent an integer of 1 to 20.
The alkali soluble resin with the structure has better alkali solubility, and has good dispersibility and emulsification effect on a reaction system, so that the alkali soluble resin is selected to be beneficial to further improving the system stability and the developing performance of the photosensitive resin.
In the development process, the above alkali-soluble resin grafted with a silane side chain is dissolved by an alkali developer to perform development. In a preferred embodiment, the alkali-soluble resin grafted with a silane side chain is obtained by copolymerizing a polymerizable monomer and a silane structure-containing monomer, wherein the polymerizable monomer includes, but is not limited to, one or more of the group consisting of an alkenyl-containing polymerizable compound, an unsaturated oxetane carboxylate, a maleic anhydride-based compound, a maleimide-based compound, (meth) acrylamide-based compounds, (meth) acrylic compounds, and (meth) acrylate-based compounds; the silane group-containing monomers include, but are not limited to, one or more of the group consisting of trimethylsilyl methacrylate, triethylsilyl methacrylate, t-butyldimethylsilyl methacrylate, isopropyldimethylsilyl methacrylate, phenyldimethylsilyl methacrylate, di-t-butylmethylsilicyl methacrylate, triisopropylsilyl methacrylate, trimethylsilyl acrylate, triethylsilyl acrylate.
In order to further improve the developing effect of the photosensitive resin composition, the types of the polymerizable monomer and the silane structure-containing monomer are preferable. In a preferred embodiment, the alkenyl polymerizable compound includes, but is not limited to, one or more of the group consisting of styrene compounds substituted at the α -position or on the aromatic ring, ether compounds of vinyl alcohol, N-vinylcaprolactam, N-vinylpyrrolidone, alkenyl acid compounds, and hydroxy substituted acid compounds.
Preferably, the styrenic compound substituted in the alpha-position or on the aromatic ring includes, but is not limited to, one or more of the group consisting of styrene, vinyltoluene, alpha-methylstyrene, p-ethylstyrene and p-chlorostyrene; ether derivatives of vinyl alcohol include, but are not limited to, acrylonitrile and/or vinyl n-butyl ether; the alkenyl acid compound includes, but is not limited to, one or more of the group consisting of fumaric acid (fumaric acid), cinnamic acid (β -cinnamic acid), α -cyanocinnamic acid, itaconic acid (itaconic acid), crotonic acid (crotonic acid); the hydroxy-substituted acid compound includes, but is not limited to, one or more of the group consisting of 2-hydroxypropionic acid, 2-hydroxyacrylic acid, and 2-hydroxybutyric acid.
In a preferred embodiment, the maleic anhydride-based compound includes, but is not limited to, one or more of the group consisting of maleic anhydride, monomethyl maleate, monoethyl maleate, and monoisopropyl maleate; (meth) acrylamide compounds include, but are not limited to, enamides and/or diacetone acrylamide. (meth) acrylic compounds include, but are not limited to, one or more of the group consisting of (meth) acrylic acid derivatives such as (meth) acrylic acid, α -bromo (meth) acrylic acid, α -chloro (meth) acrylic acid, β -furyl (meth) acrylic acid, and β -styryl (meth) acrylic acid; the (meth) acrylate-based compound includes, but is not limited to, one or more of the group consisting of alkyl (meth) acrylate, benzyl (meth) acrylate, phenoxyethyl methacrylate, tetrahydrofurfuryl (meth) acrylate, dimethylaminoethyl (meth) acrylate, diethylaminoethyl (meth) acrylate, glycidyl (meth) acrylate, 2,2, 2-trifluoroethyl (meth) acrylate, 2,2,3, 3-tetrafluoropropyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, dimethylaminoethyl (meth) acrylate, diethylaminoethyl (meth) acrylate, and glycidyl (meth) acrylate.
In the present application, the weight average molecular weight of the alkali-soluble polymer is measured by Gel Permeation Chromatography (GPC) and is obtained by conversion using a calibration curve of standard polystyrene.
In the photosensitive resin composition of the present invention, the weight average molecular weight of the alkali-soluble resin grafted with a silane side chain is not particularly limited, and it should be adapted to the specific application environment. When the weight average molecular weight is more than 30000, the product adhesive force can be improved to a certain extent, but the smoothness of exposure development can be obviously reduced, and the development time is long; when the weight average molecular weight is less than 5000, the developing time may be short and the adhesion of the pattern to the substrate may be significantly reduced, resulting in poor developing effect. In view of considering both the developing property and the adhesion to the substrate of the photosensitive resin composition, the weight average molecular weight of the alkali-soluble resin grafted with a silane side chain is preferably 8000 to 20000. Further, 8000 to 15000 is preferable for further improving the developability and the adhesion to the base material.
The acid value of the alkali-soluble resin is too low, the development difficulty is higher, and the development time is long; when the acid value is high, the development is too fast and the operation window is small. In order to ensure the stability of the alkali-soluble resin and improve the development effect and development time of the photosensitive resin composition, the acid value of the alkali-soluble resin grafted with the silane side chain is preferably 70 to 150mgKOH/g, and more preferably 90 to 120 mgKOH/g.
The alkali-soluble resin has too broad molecular weight distribution and poor development definition, and has narrow molecular weight distribution and poor adhesion of developed patterns. In a preferred embodiment, the ratio of the weight average molecular weight to the number average molecular weight of the alkali-soluble resin grafted with the silane side chain is 1.5 to 4.0. By limiting the ratio of the weight average molecular weight to the number average molecular weight (molecular weight distribution index) of the alkali-soluble resin to which the silane-based side chain is grafted to the above range, the developing effect of the photosensitive resin composition and the adhesion thereof to the substrate can be simultaneously achieved. In order to further improve the developing definition and the adhesion with the base material, more preferably, the ratio of the weight average molecular weight to the number average molecular weight of the alkali-soluble resin grafted with the silane side chain is 1.8-3.5.
In a preferred embodiment, the photosensitive resin composition comprises, based on 100 parts by weight of the photosensitive resin composition, 1 to 10 parts by weight of a photopolymerizable compound, 5 to 30 parts by weight of an alkali-soluble resin, and 0.1 to 5.0 parts by weight of an oxime ester photoinitiator. Limiting the amount of each component within the above range is advantageous for further improving the sensitivity, adhesion and development effect of the photosensitive resin composition. More preferably, the photosensitive resin composition comprises, based on 100 parts by weight of the photosensitive resin composition, 3 to 7 parts of a photopolymerizable compound, 10 to 20 parts of an alkali-soluble resin, and 0.5 to 3.0 parts of an oxime ester photoinitiator.
The photosensitive resin composition with the composition has better system stability and is convenient to store for a long time; the developing agent has good adhesion with a base material, and has the advantages of clear and complete developed patterns and the like. The oxime ester photoinitiator has a good photoinitiation effect, and the oxime ester photoinitiator in the photosensitive resin composition can be selected from the types commonly used in the field. In a preferred embodiment, photoinitiators having oxime esters include, but are not limited to, oxime 1- (4-phenylthiophenyl) -n-octane-1, 2-dione-2-benzoate, oxime 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -ethane-1-one-acetate, oxime 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -butane-1-one-acetate, oxime 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -propane-1-one-acetate, oxime ester, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -1-cyclohexyl-methane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propane-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime carboxylate, and mixtures thereof, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazol-3-yl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-benzoyldiphenyl sulfide) - (3-cyclopentylacetone) -1-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazol-3-yl) - (3-cyclopentylacetone) -1-oxime cyclohexanecarboxylate, and mixtures thereof, 1- (4-benzoyldiphenyl sulfide) -3- (cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (6-o-methylbenzoyl-9-ethylcarbazol-3-yl) - (3-cyclopentyl) -propane-1, 2-dione-2-o-methylbenzoate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-cyclohexanecarboxylate, 1- (4-thenoyl-diphenyl sulfide-4' -yl) -3-cyclopentyl-propane-1-one-oxime acetate, 1- (4-benzoyldiphenyl sulfide) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-nitro-9-ethylcarbazol-3-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazol-3-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (6-furylcarbazole-9-ethylcarbazol-3-yl) - (3-cyclopentylacetone) -1-oxime acetate, and mixtures thereof, 1, 4-diphenylpropane-1, 3-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-3-benzoates oxime esters, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-acetates oxime esters, 2- [ (benzoyloxy) imino ] -1-phenylpropan-1-one, 1-phenyl-1, 2-propanedione-2- (oxoacetyl) oxime, 1- (4-phenylthiophenyl) -2- (2-methylphenyl) -ethane-1, 2-dione-2-acetates oxime esters, 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propan-1-one-acetates oxime esters, oxime esters, 1- {4- [4- (thiophene-2-formyl) phenylthio ] phenyl } -3-cyclopentylpropane-1, 2-dione-2-oxime acetate, 1- [9, 9-dibutyl-2-yl ] -3-cyclohexylpropylpropane-1, 2-dione-2-oxime acetate, 1- [6- (2-benzoyloxyimino) -3-cyclohexylpropyl-9-ethylcarbazol-3-yl ] octane-1, 2-dione-2-oxime benzoate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate, methods of making and using these compounds, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -3-cyclopentyl-propane-1-one-oxime benzoate, 1- [7- (2-methylbenzoyl) -9, 9-dibutylfluoren-2-yl ] -3-cyclohexylpropane-1, 2-dione-2-oxime acetate or 1- [6- (furan-2-formyl) -9-ethylcarbazol-3-yl ] -3-cyclohexylpropane-1, 2-dione-2-ethoxycarbonyloxime ester; 1- (4-phenylthiophenyl) -n-octane-1, 2-dione-2-oxime benzoate, 1- (6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-benzoyldiphenyl sulfide) - (3-cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate, and mixtures thereof, 1- (4-thenoyl-diphenylsulfide-4' -yl) -3-cyclopentyl-propane-1-one-oxime acetate, 1- [6- [2[ (acetoxy) imino ] -3-cyclohexane-1-oxopropyl ] -9-ethyl-9H-carbazol-3-yl ] -1, 2-octanedione-2- (O-acetyloxime), 1- (6- (1-acetoxyimino) octyl) -1, 8-dinitro-9-ethylcarbazol-3-yl) octane-1-oxime acetate, 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propane-1-one -oxime acetate, 1- (9, 9-dibutyl-2-yl) -3-cyclohexylpropylpropane-1, 2-dione-2-oxime acetate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate and 1- (6- (furan-2-formyl) -9-ethylcarbazol-3-yl) -3-cyclohexylpropane-1, 2-dione-2-carboethoxy oxime ester. The oxime ester photoinitiator with the structure has better luminous efficiency, has better compatibility with the alkali-soluble resin, and is beneficial to improving the sensitivity of the photosensitive resin composition and the stability of a system when the oxime ester photoinitiator and the alkali-soluble resin are used together.
More preferably, photoinitiators having oxime ester groups include, but are not limited to, oxime 1- (4-phenylthiophenyl) -n-octane-1, 2-dione-2-benzoate, oxime 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -ethan-1-one-acetate, oxime 1- (6-thenoyl-9-ethylcarbazol-3-yl) -3-cyclopentyl-propane-1-one-acetate, oxime 1- [6- [2[ (acetoxy) imino ] -3-cyclohexane-1-oxopropyl ] -9-ethyl-9H-carbazol-3-yl ] -1, 2-octanedione-2- (O-acetyloxime), 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate, 1- (6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl) -3-cyclopentyl-propan-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propan-1, 2-diketone-2-benzonate oxime ester and 1- (4-thiophenyl phenyl) - (3-cyclohexyl) -propane-1, 2-diketone-2-acetoxime ester.
Further preferably, photoinitiators having oxime esters include, but are not limited to, 1- (6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl) -3-cyclopentyl-propan-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) -3-cyclopentyl-propan-1-one-oxime acetate, 1- (4-thiophenylphenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate and 1- (4-thiophenylphenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate.
The photopolymerizable compound used in the photosensitive resin composition is used to improve properties such as photosensitivity, mechanical strength, crosslinking property, and chemical resistance, if necessary. The polymerizable compound may be any compound having one or more unsaturated bonds in the molecule, and one or a combination of several of them may be selected as necessary. In a preferred embodiment, the photopolymerizable compounds include, but are not limited to, the following classes:
(meth) acrylic acid adducts of epoxy compounds include, but are not limited to, one or more of the group consisting of propylene glycol diglycidyl ether, dipropylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, tetrapropylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, sorbitol triglycidyl ether, glycerol triglycidyl ether;
(xii) unsaturated organic acids and anhydrides thereof including but not limited to maleic acid and/or maleic acid amides;
(iii) acrylamide based compounds including but not limited to one or more of the group consisting of N-methacrylamide, N-ethylacrylamide, N-isopropylacrylamide, N-methylolacrylamide, N-methacrylamide, N-ethylmethacrylamide, N-isopropylmethacrylamide, N-methylolmethacrylamide, N-dimethylacrylamide, N-diethylacrylamide, N-dimethylacrylamide and N, N-diethylmethacrylamide;
polyethylene glycol di (meth) acrylate (ethylene number 2 to 14);
the polyhydroxyacrylate compound includes, but is not limited to, one or more selected from the group consisting of trimethylolpropane di (meth) acrylate, trimethylolpropane tri (meth) acrylate, trimethylolpropane ethoxytri (meth) acrylate, trimethylolpropane propoxyttri (meth) acrylate, tetramethylolmethane tri (meth) acrylate, tetramethylolmethane tetra (meth) acrylate, polypropylene glycol di (meth) acrylate having a propylene number of 2 to 14, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol a polyoxyethylene di (meth) acrylate, bisphenol a dioxyethylene di (meth) acrylate, bisphenol a trioxethylene di (meth) acrylate, and bisphenol a oxyethylene di (meth) acrylate;
sixth, an esterified product of a polyvalent carboxylic acid (e.g., phthalic anhydride, etc.) with a compound having a hydroxyl group and an ethylenically unsaturated group (e.g., β -hydroxyethyl (meth) acrylate, etc.);
alkyl (meth) acrylates including, but not limited to, one or more of the group consisting of methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, and 2-ethylhexyl (meth) acrylate;
the glycerol ether compounds include but are not limited to one or more of the group consisting of ethylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, triethylene glycol diglycidyl ether, tetraethylene glycol diglycidyl ether and polyethylene glycol diglycidyl ether;
ninthly, styrenic compounds include, but are not limited to, styrene and/or hydroxystyrene;
r is one or more of N-vinyl pyrrolidone, N-vinyl formamide, N-vinyl acetamide and N-vinyl imidazole. The above-listed substances may be used alone or in combination of two or more.
In order to further improve the comprehensive performance of the photosensitive resin and meet the requirements of different customers on colors. Preferably, the photosensitive resin composition further includes a colorant. Any organic pigment and inorganic pigment commonly used in the art may be selectively used as the colorant of the present application. Such as water-soluble pigments, insoluble azo pigments, phthalocyanine pigments, quinacridone pigments, isoindoline pigments, indoleanthrone pigments, indanthrone pigments, diketopyrrolones pigments, and the like. The pigments can be used singly or after being mixed, and are determined according to specific requirements of products.
Further preferred organic raw materials include, but are not limited to, the following pigments: compounds with a color index (The Society of Dyers and Colorists) (C.I.) number are listed as follows:
pigment yellow 1,3, 11, 13, 14, 15, 16, 17, 20, 24, 3, 53, 55, 60, 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 100, 101, 106, 109, 120, 125, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 167, 175, 180, 183, 185.
Pigment orange 1, 13, 31, 36, 42, 43, 55, 59, 61, 65, 71.
C.i. pigment violet 1, 14, 19, 23, 29, 30, 36, 37, 38, 39, 40.
C.i. pigment red 1,2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 18, 19, 21, 23, 30, 31, 37, 38, 40, 42, 48, 53:1, 57:2, 60:1, 83, 97, 105, 122, 144, 166, 176, 180, 192, 202, 206, 207, 208, 215, 224, 242, 254, 255, 264, 265.
C.i. pigment blue 1,2, 15:3, 15:6, 16, 21, 22, 60, 64, 66. C.i. pigment green 7, 10, 15, 25, 36, 47, 48. C.i. pigment brown 23, 25, 26, 28. C.i. pigment black 1 and 7, etc.
When the photosensitive resin composition of the present invention is applied to a display material such as an optical filter, a solvent for dispersion is required. In a preferred embodiment, the above solvents include, but are not limited to: one or more of (poly) alkylene glycol monoalkyl ether compounds, aromatic hydrocarbon compounds, amide compounds, carboxylic ester compounds, ketone compounds, cyclic ether compounds and cyclic ester compounds.
Preferably, the (poly) alkylene glycol monoalkyl ether-based compound includes, but is not limited to, one or more of the group consisting of ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol n-propyl ether, ethylene glycol n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether and tripropylene glycol monoethyl ether.
Preferably, the aromatic hydrocarbon organic compound includes, but is not limited to, one or more of the group consisting of toluene, xylene and trimethylbenzene.
Preferably, the amide-based compound includes, but is not limited to, one or more of the group consisting of N-methylpyrrolidone, N-dimethylformamide, and N, N-dimethylacetamide;
preferably, the carboxylate-based compound includes, but is not limited to, ethyl 2-oxobutyrate, methyl acetoacetate, ethyl acetate, n-propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, n-pentyl formate, isopentyl acetate, butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl acetone, methyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl glycolate, methyl 2-hydroxy-3-methylbutyrate, 3-methyl-3-methoxybutyl acetate, methyl acetoacetate, ethyl acetoacetate, methyl propionate, ethyl butyrate, butyl propionate, isopropyl butyrate, butyl propionate, ethyl pyruvate, n-propyl acetone, methyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl 3-methyl-3-methoxybutyl acetate, ethyl propionate, 3-methyl-3-methoxybutyl propionate; preferably, the ketone compound includes, but is not limited to, one or more of the group consisting of methyl ethyl ketone, cyclohexanone, heptanone, and 3-heptanone; preferably, the cyclic ether compounds include, but are not limited to, tetrahydrofuran and/or tetrahydropyran; preferably, the cyclic ester-based compound includes, but is not limited to, gamma-butyrolactone.
In order to further improve the solubility of each component in the photosensitive resin composition, the solvent preferably includes, but is not limited to, one or more of the group consisting of propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether, and diethylene glycol methyl ethyl ether. The solvents have more excellent solvent type, so the selection of the solvents is beneficial to further improving the compatibility of each component, thereby improving the comprehensive performance of the photosensitive resin composition. More preferably, the solvent is propylene glycol monomethyl ether acetate and/or diethylene glycol methyl ethyl ether.
In order to further improve the overall performance of the photosensitive resin composition, the photosensitive resin composition preferably further comprises additives including, but not limited to, one or more of the group consisting of fillers, curing agents, leveling agents, adhesion promoters, antioxidants and ultraviolet absorbers.
In the photosensitive resin composition, the curing agent is used for improving deep curing performance and mechanical strength. Preferably, the curing agent includes, but is not limited to, one or more of the group consisting of epoxy compounds, polyfunctional isocyanate compounds, melamine compounds and oxetane compounds.
The leveling agent may use a commercially available surfactant including, but not limited to, one or more of the group consisting of an ionic surfactant, a non-ionic surfactant, and an amphoteric surfactant.
The adhesion promoter may use silane compounds including, but not limited to, one or more of the group consisting of vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -30 aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-isocyanatopropyltrimethoxysilane, 3-isocyanatopropyltriethoxysilane.
Antioxidants include, but are not limited to, one or more of the group consisting of 4,4 '-butylidenebis (6-tert-butyl-3-methylphenol), 2, 6-di-tert-butyl-4-methylphenol, 2,3' -thiobis (4-methyl-6-tert-butylphenol), and p-methoxyphenol.
Ultraviolet absorbers include, but are not limited to, 2- (3-tert-butyl-2 hydroxy-5-methylphenyl) -5-chlorobenzotriazole and/or alkoxybenzophenone.
Another aspect of the present disclosure also provides an optical filter, which includes a color layer, wherein the color layer is formed by curing the photosensitive resin composition provided by the present disclosure.
The alkali-soluble resin plays a fundamental role in the polymerization process of the photopolymerizable compound, and at the same time, can be dissolved by an alkaline solution to effect development. The alkali-soluble resin having a specific silane group graft ratio, weight average molecular weight and acid value has good compatibility with other components, and is also advantageous for improving the adhesion of the photosensitive resin composition to a substrate. The alkali-soluble resin and the oxime ester photoinitiator are matched for use, so that the sensitivity of the photosensitive resin composition and the compatibility and stability of a reaction system are improved, and the development effect is improved in the development process. On the basis, the photosensitive resin composition with the composition has better system stability, adhesiveness and developing effect.
In another aspect, the present application also provides a use of the photosensitive resin composition provided by the present application in the field of photocuring.
The alkali-soluble resin plays a fundamental role in the polymerization process of the photopolymerizable compound, and at the same time, can be dissolved by an alkaline solution to effect development. The alkali-soluble resin having a specific silane group graft ratio, weight average molecular weight and acid value has good compatibility with other components, and is also advantageous for improving the adhesion of the photosensitive resin composition to a substrate. The alkali-soluble resin and the oxime ester photoinitiator are matched for use, so that the sensitivity of the photosensitive resin composition and the compatibility and stability of a reaction system are improved, and the development effect is improved in the development process. On the basis, the photosensitive resin composition with the composition has better system stability, adhesiveness and developing effect.
The present application is described in further detail below with reference to specific examples, which should not be construed as limiting the scope of the invention as claimed.
Preparation of alkali soluble resins
Example 1: preparation of alkali-soluble resin B-1
Accurately weighing a certain amount of acrylic monomers and trimethylsilyl methacrylate, and uniformly mixing for later use; in addition, a certain amount of initiator (azobisisobutyronitrile) was accurately weighed and dissolved in 3 times the amount of Propylene Glycol Methyl Ether Acetate (PGMEA) solution, and the solution was sufficiently dissolved for use.
100g of Propylene Glycol Methyl Ether Acetate (PGMEA) is added into a 500mL four-neck flask provided with a stirring device, a condenser pipe, a constant-pressure dropping funnel, a thermometer and a nitrogen inlet, nitrogen is introduced, the mixture is heated to 70 ℃ under the stirring condition, a monomer mixture (the formula is shown in table 1) and an initiator solution are respectively dripped, the dripping time is controlled to be 2h, after the completion, the temperature is kept for 4h at the temperature, the system Mw is determined, the Mw is more than or equal to 8000 and less than or equal to 15000, and then the temperature is reduced and the filtration is carried out, so that the polyacrylate resin B-1 is obtained, the discharged material Mw is 19678, and the PDI is 1.93.
According to different monomers and proportions, alkali soluble resins B-2 to B-8 and comparative resin B are prepared. Specifically, the results are shown in Table 1.
TABLE 1
Evaluation of Performance
(1) Photocurable composition formulation
The application properties of the photosensitive resin composition composed of the photopolymerization initiator and the alkali-soluble resin given in the examples of the present invention were evaluated by formulating an exemplary photocurable composition. Including sensitivity, developability, pattern integrity, substrate adhesion, and the like. Referring to the formulations shown in examples 1 to 17 and comparative examples 1 to 4 in Table 2, the raw materials were uniformly mixed in the following proportions to form a photocurable composition:
according to the above formulation, different photocurable combinations were prepared using the initiator and modified alkali-soluble resin provided in the prior art, examples, comparative examples, and comparative examples, which employ commercially available 1173 and 184 as initiators, as shown in Table 2.
TABLE 2
Note: in the above table, the initiators corresponding to each code are illustrated as follows:
a-1: 1- (6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl) -3-cyclopentyl-propan-1-one-oxime acetate;
a-2: 1- (6-thenoyl-9-ethylcarbazol-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate;
a-3: 1- (4-thiophenylphenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-benzoxy oxime ester;
a-4: 1- (4-thiophenylphenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-acetic acid oxime ester;
a-5: 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -butane-1-one-oxime acetate.
Silane coupling agent: methyltriethoxysilane
(2) Exposure development
The photosensitive resin composition having the above composition was stirred under a yellow light, taken out on a glass substrate, and vacuum-dried at 90 ℃ for 2min by spin coating to obtain a coating film having a dry film thickness of 2 μm. The substrate on which the coating film was formed was cooled to room temperature, a mask plate was attached, and long-wavelength radiation was realized with a FWHM filter using a high-pressure mercury lamp 1PCS light source. Exposing the coating film by ultraviolet ray with the wavelength of 350-420nm through a 20-micron line width mask plate, then dipping in 2.5% sodium carbonate solution for 20s at 25 ℃, developing, washing with ultrapure water, air drying, and hard baking for 30min at 230 ℃ to fix the pattern.
(3) Evaluation of Performance
Sensitivity: the minimum exposure amount at which the residual film ratio after development of the light-irradiated region in the exposure step is 90% or more was evaluated as the exposure demand. A smaller exposure requirement indicates a higher sensitivity.
Development property: the substrate pattern was observed with a Scanning Electron Microscope (SEM) to evaluate developability and pattern integrity. And calculating the residual film rate of the development, wherein the residual film rate is calculated by adopting the following formula: the residual film ratio is the film thickness after post-baking treatment/the film thickness before post-baking × 100; the higher the residual film rate, the higher the development effect and pattern completion degree.
The developability was evaluated according to the following criteria:
o: the residual film rate is more than or equal to 95 percent;
and (delta): the residual film rate is more than or equal to 90 percent by 95 percent;
gamma rays: the residual film rate is less than 90 percent.
Pattern integrity was evaluated according to the following criteria:
o: no pattern defects were observed;
and (delta): a small part of the pattern was observed to have some defects;
gamma rays: many pattern defects were clearly observed.
③ adhesion test
The coating after full exposure was subjected to 1.5-fold over-development treatment, dried, cut every 1 mm on the substrate with a knife ten times, subjected to a peel test using a standard 3M 600 tape, and observed with a Scanning Electron Microscope (SEM) for the remaining amount of the pattern on the substrate, the more the remaining amount, the higher the adhesion force.
Adhesion of pattern to substrate:
o: the pattern is complete without peeling from the substrate;
and (delta): 1-5 squares are peeled off from the substrate;
gamma rays: more than 5 squares are peeled from the substrate.
The evaluation results are shown in table 3.
TABLE 3
As can be seen from the above evaluation Table 3, the photosensitive resin compositions containing the oxime ester photoinitiators provided by the present invention have high photosensitivity, and the exposure requirements are all less than 60mJ/cm2(ii) a In particular, examples using 1- (6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate or 1- (6-thenoyl-9-ethylcarbazol-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate initiators, which require lower exposure intensities, approaching 50 mJ; under the same conditions, when 1173 or 184 is used as an initiator, the exposure dose is more than 70mJ/cm2(ii) a The oxime ester photoinitiator provided by the invention is used in combination with alkali soluble resins B-1-B-8 obtained by copolymerization of the silicone grease-containing monomer provided by the invention, so that a better development effect, a finer development line width and a higher resolution can be obtained, as shown in the table above, examples 1-17 show better development performance and pattern integrity, and the line width is lower and the development fineness is higher.
In addition, adhesion tests show that the photocuring composition formed by combining the building soluble resin and the oxime ester photoinitiator has stronger adhesion to a substrate under the same conditions. The comparative example prepared by using the polymer B containing no silicone grease branched chain was evaluated to have poor developing effect, adhesion and the like. The polymer B without silane grafting and the silane coupling agent are directly added and matched with the oxime ester initiator for use, although the light sensitivity is higher, the developing effect, the adhesive force and the like of the composition are not good as those of the polymer containing the grafted silane.
In conclusion, the photocuring resin composition consisting of the oxime ester photoinitiator with the specific structural formula and the alkali-soluble resins B-1-B-8 with the silane side groups has higher sensitivity, better developability, good adhesion to a substrate, higher resolution and better application prospect.
It is noted that the terms first, second and the like in the description and in the claims of the present application are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the terms so used are interchangeable under appropriate circumstances such that the embodiments of the application described herein are, for example, capable of operation in sequences other than those described or illustrated herein.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A photosensitive resin composition, comprising: the light polymerization type organic light-emitting diode comprises a light polymerization compound, an oxime ester photoinitiator and alkali soluble resin grafted with a silane side chain, wherein the weight average molecular weight of the alkali soluble resin grafted with the silane side chain is 5000-30000, the acid value is 50-200 mgKOH/g, and the grafting rate of the silane side chain is 5-20%.
2. The photosensitive resin composition according to claim 1, wherein the alkali-soluble resin grafted with a silane side chain has a structure represented by formula i:
wherein each of R21Each independently represents H, methyl, C2～C20A straight or branched alkyl group of (a);
the R is22And said R23Each independently represents C1～C30Alkyl of (C)3～C30Cycloalkyl of, C3～C20A heterocyclic group of, C6～C30Aryl of (a);
the R is24The R is25The R is26Each independently represents H, deuterium, C1～C20Alkyl of (C)1～C20Cycloalkyl radical, C3～C20Heterocycloalkyl of (A), C6～C30Aryl of (C)6～C30Heteroaryl of (A), C3～C20Cycloalkyl of, or-Si- (R)28)3Each of said R28Independently represent C1～C10Linear or branched alkyl of (a);
the R is27Represents a single bond, or is represented by the formula R24The R is25Or said R26The resulting divalent group;
the x, the y, the z and the m respectively and independently represent an integer of 1-20.
3. The photosensitive resin composition according to claim 1 or 2, wherein the alkali-soluble resin having a silane side chain grafted thereon is obtained by copolymerizing a polymerizable monomer and a silane structure-containing monomer, wherein
The polymerizable monomer is selected from one or more of a group consisting of an alkenyl polymerizable compound, an unsaturated oxetane carboxylate, a maleic anhydride compound, a maleimide compound, (meth) acrylamide compounds, (meth) acrylic compounds and (meth) acrylate compounds;
the monomer containing the silane group is selected from one or more of the group consisting of trimethylsilyl methacrylate, triethylsilyl methacrylate, t-butyldimethylsilyl methacrylate, isopropyldimethylsilyl methacrylate, phenyldimethylsilyl methacrylate, di-t-butylmethylsilicyl methacrylate, triisopropylsilyl methacrylate, trimethylsilyl acrylate and triethylsilyl acrylate.
4. The photosensitive resin composition according to any one of claims 1 to 3, wherein the weight average molecular weight of the alkali-soluble resin grafted with a silane side chain is 8000 to 20000, preferably 8000 to 15000.
5. The photosensitive resin composition according to claim 6, wherein the alkali-soluble resin to which the silane side chain is grafted has an acid value of 70 to 150mgKOH/g, preferably 90 to 120 mgKOH/g.
6. The photosensitive resin composition according to claim 6 or 7, wherein the ratio of the weight average molecular weight to the number average molecular weight of the alkali-soluble resin grafted with a silane side chain is 1.5 to 4.0, preferably 1.8 to 3.5.
7. The photosensitive resin composition according to any one of claims 1 to 8, wherein the photosensitive resin composition comprises, based on 100 parts by weight of the photosensitive resin composition, 1 to 10 parts of the photopolymerizable compound, 5 to 30 parts of the alkali-soluble resin having a silane side chain grafted thereto, and 0.1 to 5.0 parts of the oxime ester photoinitiator;
preferably, the photosensitive resin composition comprises, based on 100 parts by weight, 3 to 7 parts of the photopolymerizable compound, 10 to 20 parts of the alkali-soluble resin grafted with a silane side chain, and 0.5 to 3.0 parts of the oxime ester photoinitiator.
8. The photosensitive resin composition according to claim 7, wherein the photoinitiator having an oxime ester group is selected from the group consisting of 1- (4-phenylthiophenyl) -n-octane-1, 2-dione-2-benzonate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -ethane-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate, 1- [6- [2[ (acetoxy) imino ] -3-cyclohexane-1-oxypropyl ] -9-ethyl-9H-carbazol-3-yl ] -1, 2-octanedione-2- (O-acetyloxime), 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate, 1- (6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl) -3-cyclopentyl-propan-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propan-1, 2-diketone-2-benzonate oxime ester, 1- (4-thiophenyl phenyl) - (3-cyclohexyl) -propane-1, 2-diketone-2-acetate oxime ester;
preferably, the photoinitiator with oxime ester is selected from 1- (6- (2-methylbenzoyl) -9-ethylcarbazole-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazole-3-yl) -3-cyclopentyl-propane-1-one-oxime acetate, 1- (4-thiophenylphenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-thiophenylphenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate.
9. An optical filter comprising a color layer cured by the photosensitive resin composition according to any one of claims 1 to 8.
10. Use of the photosensitive resin composition according to any one of claims 1 to 8 in the field of photocuring.
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